SG11201401560VA - Double-side polishing method - Google Patents

Double-side polishing method

Info

Publication number
SG11201401560VA
SG11201401560VA SG11201401560VA SG11201401560VA SG11201401560VA SG 11201401560V A SG11201401560V A SG 11201401560VA SG 11201401560V A SG11201401560V A SG 11201401560VA SG 11201401560V A SG11201401560V A SG 11201401560VA SG 11201401560V A SG11201401560V A SG 11201401560VA
Authority
SG
Singapore
Prior art keywords
double
polishing method
side polishing
polishing
Prior art date
Application number
SG11201401560VA
Other languages
English (en)
Inventor
Kazuaki Aoki
Shigeru Oba
Original Assignee
Shinetsu Handotai Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Handotai Kk filed Critical Shinetsu Handotai Kk
Publication of SG11201401560VA publication Critical patent/SG11201401560VA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/08Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/02Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
    • B24B49/03Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent according to the final size of the previously ground workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/10Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/10Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
    • B24B49/105Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means using eddy currents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002Preparing wafers
    • H01L21/02005Preparing bulk and homogeneous wafers
    • H01L21/02008Multistep processes
    • H01L21/0201Specific process step
    • H01L21/02024Mirror polishing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
SG11201401560VA 2011-11-07 2012-10-04 Double-side polishing method SG11201401560VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011243342A JP5614397B2 (ja) 2011-11-07 2011-11-07 両面研磨方法
PCT/JP2012/006374 WO2013069198A1 (ja) 2011-11-07 2012-10-04 両面研磨方法

Publications (1)

Publication Number Publication Date
SG11201401560VA true SG11201401560VA (en) 2014-09-26

Family

ID=48288996

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201401560VA SG11201401560VA (en) 2011-11-07 2012-10-04 Double-side polishing method

Country Status (8)

Country Link
US (1) US9156123B2 (de)
JP (1) JP5614397B2 (de)
KR (1) KR101835414B1 (de)
CN (1) CN103889655B (de)
DE (1) DE112012004211B4 (de)
SG (1) SG11201401560VA (de)
TW (1) TWI523094B (de)
WO (1) WO2013069198A1 (de)

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US9459597B2 (en) 2012-03-06 2016-10-04 DPTechnologies, Inc. Method and apparatus to provide an improved sleep experience by selecting an optimal next sleep state for a user
JP5896884B2 (ja) * 2012-11-13 2016-03-30 信越半導体株式会社 両面研磨方法
US9474876B1 (en) 2012-12-14 2016-10-25 DPTechnologies, Inc. Sleep aid efficacy
US9594354B1 (en) 2013-04-19 2017-03-14 Dp Technologies, Inc. Smart watch extended system
JP6146213B2 (ja) * 2013-08-30 2017-06-14 株式会社Sumco ワークの両面研磨装置及び両面研磨方法
US11963792B1 (en) 2014-05-04 2024-04-23 Dp Technologies, Inc. Sleep ecosystem
JP6389660B2 (ja) * 2014-07-04 2018-09-12 株式会社ディスコ 研削方法
US11883188B1 (en) 2015-03-16 2024-01-30 Dp Technologies, Inc. Sleep surface sensor based sleep analysis system
JP6383700B2 (ja) * 2015-04-07 2018-08-29 光洋機械工業株式会社 薄板状ワークの製造方法及び両頭平面研削装置
CN107398780B (zh) * 2016-05-18 2020-03-31 上海新昇半导体科技有限公司 一种晶圆的双面抛光方法
JP6605395B2 (ja) * 2016-05-20 2019-11-13 スピードファム株式会社 断面形状測定方法
CN106078492A (zh) * 2016-06-15 2016-11-09 江苏吉星新材料有限公司 一种蓝宝石矩形件双面研磨方法
JP6635003B2 (ja) * 2016-11-02 2020-01-22 株式会社Sumco 半導体ウェーハの両面研磨方法
JP6743746B2 (ja) * 2017-03-31 2020-08-19 株式会社Sumco ウェーハの両面研磨装置および両面研磨方法
CN107263278A (zh) * 2017-07-03 2017-10-20 适新科技(苏州)有限公司 双面研磨机及研磨工艺
JP6451825B1 (ja) * 2017-12-25 2019-01-16 株式会社Sumco ウェーハの両面研磨方法
CN108326727A (zh) * 2018-04-12 2018-07-27 新乡日升数控轴承装备股份有限公司 用于双面研磨机的尺寸控制***及安全研磨检测方法
JP7031491B2 (ja) * 2018-05-22 2022-03-08 株式会社Sumco ワークの両面研磨装置および両面研磨方法
JP7010166B2 (ja) * 2018-07-24 2022-01-26 株式会社Sumco ワークの両面研磨装置および両面研磨方法
TWI704978B (zh) * 2018-09-26 2020-09-21 禾璟科技有限公司 可應用於硏磨機的電腦程式產品
US11471097B1 (en) 2018-10-15 2022-10-18 Dp Technologies, Inc. Hardware sensor system for improved sleep detection
CN110193775B (zh) * 2019-03-12 2021-09-17 上海新昇半导体科技有限公司 化学机械抛光方法以及化学抛光***
JP6683277B1 (ja) * 2019-03-13 2020-04-15 信越半導体株式会社 半導体ウェーハの厚み測定方法及び半導体ウェーハの両面研磨装置
JP7081544B2 (ja) * 2019-03-22 2022-06-07 株式会社Sumco ワークの両面研磨方法及びワークの両面研磨装置
CN110640621B (zh) * 2019-07-31 2021-03-19 华灿光电(浙江)有限公司 双面研磨机及双面研磨方法
CN113001379A (zh) * 2021-03-17 2021-06-22 天津中环领先材料技术有限公司 一种大尺寸硅片双面抛光方法
JP2023167038A (ja) * 2022-05-11 2023-11-24 信越半導体株式会社 両面研磨方法
JP7296161B1 (ja) * 2022-06-27 2023-06-22 不二越機械工業株式会社 両面研磨装置

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Also Published As

Publication number Publication date
US20140256227A1 (en) 2014-09-11
DE112012004211T5 (de) 2014-09-11
US9156123B2 (en) 2015-10-13
KR20140099232A (ko) 2014-08-11
JP2013094954A (ja) 2013-05-20
DE112012004211B4 (de) 2023-08-31
JP5614397B2 (ja) 2014-10-29
TW201334051A (zh) 2013-08-16
CN103889655B (zh) 2016-07-20
TWI523094B (zh) 2016-02-21
KR101835414B1 (ko) 2018-03-08
CN103889655A (zh) 2014-06-25
WO2013069198A1 (ja) 2013-05-16

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