SG11201401560VA - Double-side polishing method - Google Patents

Double-side polishing method

Info

Publication number
SG11201401560VA
SG11201401560VA SG11201401560VA SG11201401560VA SG11201401560VA SG 11201401560V A SG11201401560V A SG 11201401560VA SG 11201401560V A SG11201401560V A SG 11201401560VA SG 11201401560V A SG11201401560V A SG 11201401560VA SG 11201401560V A SG11201401560V A SG 11201401560VA
Authority
SG
Singapore
Prior art keywords
double
polishing method
side polishing
polishing
Prior art date
Application number
SG11201401560VA
Inventor
Kazuaki Aoki
Shigeru Oba
Original Assignee
Shinetsu Handotai Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Handotai Kk filed Critical Shinetsu Handotai Kk
Publication of SG11201401560VA publication Critical patent/SG11201401560VA/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304Mechanical treatment, e.g. grinding, polishing, cutting
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/042Lapping machines or devices; Accessories designed for working plane surfaces operating processes therefor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces
    • B24B37/07Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool
    • B24B37/08Lapping machines or devices; Accessories designed for working plane surfaces characterised by the movement of the work or lapping tool for double side lapping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/02Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent
    • B24B49/03Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation according to the instantaneous size and required size of the workpiece acted upon, the measuring or gauging being continuous or intermittent according to the final size of the previously ground workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/10Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/10Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
    • B24B49/105Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means using eddy currents
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/12Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving optical means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02002Preparing wafers
    • H01L21/02005Preparing bulk and homogeneous wafers
    • H01L21/02008Multistep processes
    • H01L21/0201Specific process step
    • H01L21/02024Mirror polishing
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
SG11201401560VA 2011-11-07 2012-10-04 Double-side polishing method SG11201401560VA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011243342A JP5614397B2 (en) 2011-11-07 2011-11-07 Double-side polishing method
PCT/JP2012/006374 WO2013069198A1 (en) 2011-11-07 2012-10-04 Double-sided polishing method

Publications (1)

Publication Number Publication Date
SG11201401560VA true SG11201401560VA (en) 2014-09-26

Family

ID=48288996

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201401560VA SG11201401560VA (en) 2011-11-07 2012-10-04 Double-side polishing method

Country Status (8)

Country Link
US (1) US9156123B2 (en)
JP (1) JP5614397B2 (en)
KR (1) KR101835414B1 (en)
CN (1) CN103889655B (en)
DE (1) DE112012004211B4 (en)
SG (1) SG11201401560VA (en)
TW (1) TWI523094B (en)
WO (1) WO2013069198A1 (en)

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US10335060B1 (en) 2010-06-19 2019-07-02 Dp Technologies, Inc. Method and apparatus to provide monitoring
US9192326B2 (en) 2011-07-13 2015-11-24 Dp Technologies, Inc. Sleep monitoring system
US9459597B2 (en) 2012-03-06 2016-10-04 DPTechnologies, Inc. Method and apparatus to provide an improved sleep experience by selecting an optimal next sleep state for a user
JP5896884B2 (en) * 2012-11-13 2016-03-30 信越半導体株式会社 Double-side polishing method
US9474876B1 (en) 2012-12-14 2016-10-25 DPTechnologies, Inc. Sleep aid efficacy
US9594354B1 (en) 2013-04-19 2017-03-14 Dp Technologies, Inc. Smart watch extended system
JP6146213B2 (en) * 2013-08-30 2017-06-14 株式会社Sumco Double-side polishing apparatus and double-side polishing method for work
US11963792B1 (en) 2014-05-04 2024-04-23 Dp Technologies, Inc. Sleep ecosystem
JP6389660B2 (en) * 2014-07-04 2018-09-12 株式会社ディスコ Grinding method
US11883188B1 (en) 2015-03-16 2024-01-30 Dp Technologies, Inc. Sleep surface sensor based sleep analysis system
JP6383700B2 (en) * 2015-04-07 2018-08-29 光洋機械工業株式会社 Thin plate workpiece manufacturing method and double-head surface grinding apparatus
CN107398780B (en) * 2016-05-18 2020-03-31 上海新昇半导体科技有限公司 Double-side polishing method for wafer
JP6605395B2 (en) * 2016-05-20 2019-11-13 スピードファム株式会社 Sectional shape measurement method
CN106078492A (en) * 2016-06-15 2016-11-09 江苏吉星新材料有限公司 A kind of sapphire rectangular-shaped piece double-side grinding method
JP6635003B2 (en) * 2016-11-02 2020-01-22 株式会社Sumco Method for polishing both sides of semiconductor wafer
JP6743746B2 (en) * 2017-03-31 2020-08-19 株式会社Sumco Wafer double-side polishing apparatus and double-side polishing method
CN107263278A (en) * 2017-07-03 2017-10-20 适新科技(苏州)有限公司 Twin grinder and grinding technics
JP6451825B1 (en) * 2017-12-25 2019-01-16 株式会社Sumco Wafer double-side polishing method
CN108326727A (en) * 2018-04-12 2018-07-27 新乡日升数控轴承装备股份有限公司 Size Control system and safety grinding detection method for twin grinder
JP7031491B2 (en) * 2018-05-22 2022-03-08 株式会社Sumco Work double-sided polishing device and double-sided polishing method
JP7010166B2 (en) * 2018-07-24 2022-01-26 株式会社Sumco Work double-sided polishing device and double-sided polishing method
TWI704978B (en) * 2018-09-26 2020-09-21 禾璟科技有限公司 Computer programming products that can be applied to the grinder
US11471097B1 (en) 2018-10-15 2022-10-18 Dp Technologies, Inc. Hardware sensor system for improved sleep detection
CN110193775B (en) * 2019-03-12 2021-09-17 上海新昇半导体科技有限公司 Chemical mechanical polishing method and chemical polishing system
JP6683277B1 (en) * 2019-03-13 2020-04-15 信越半導体株式会社 Method for measuring thickness of semiconductor wafer and double-sided polishing apparatus for semiconductor wafer
JP7081544B2 (en) * 2019-03-22 2022-06-07 株式会社Sumco Work double-sided polishing method and work double-sided polishing device
CN110640621B (en) * 2019-07-31 2021-03-19 华灿光电(浙江)有限公司 Double-side grinding machine and double-side grinding method
CN113001379A (en) * 2021-03-17 2021-06-22 天津中环领先材料技术有限公司 Large-size silicon wafer double-side polishing method
JP2023167038A (en) * 2022-05-11 2023-11-24 信越半導体株式会社 Double-sided polishing method
JP7296161B1 (en) * 2022-06-27 2023-06-22 不二越機械工業株式会社 Double-sided polishing machine

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JP2000271859A (en) * 1999-03-24 2000-10-03 Mitsubishi Materials Corp Polishing device for stabilizing polishing rate
JP2002057131A (en) * 2000-08-10 2002-02-22 Super Silicon Kenkyusho:Kk Mechanism for controlling shape of surface table for wafer polishing
DE10132504C1 (en) * 2001-07-05 2002-10-10 Wacker Siltronic Halbleitermat Method for simultaneously polishing both sides of semiconductor wafer mounted on cogwheel between central cogwheel and annulus uses upper and lower polishing wheel
JP2004014780A (en) * 2002-06-06 2004-01-15 Renesas Technology Corp Method of evaluating flattening process and manufacturing semiconductor device
JP2007268679A (en) * 2006-03-31 2007-10-18 Speedfam Co Ltd Correction implement for polishing pad for double-sided polishing device and double-sided polishing device equipped therewith
JP2008142802A (en) 2006-12-06 2008-06-26 Ohara Inc Manufacturing method for substrate and substrate
JP5076723B2 (en) * 2007-08-09 2012-11-21 富士通株式会社 Polishing apparatus, substrate and method for manufacturing electronic apparatus
JP4605233B2 (en) * 2008-02-27 2011-01-05 信越半導体株式会社 Carrier for double-side polishing apparatus, double-side polishing apparatus and double-side polishing method using the same
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CN102054894A (en) * 2009-11-10 2011-05-11 均豪精密工业股份有限公司 Method for controlling etching process of photovoltaic device
DE112011101518B4 (en) * 2010-04-30 2019-05-09 Sumco Corporation Method for polishing silicon wafers

Also Published As

Publication number Publication date
US20140256227A1 (en) 2014-09-11
DE112012004211T5 (en) 2014-09-11
US9156123B2 (en) 2015-10-13
KR20140099232A (en) 2014-08-11
JP2013094954A (en) 2013-05-20
DE112012004211B4 (en) 2023-08-31
JP5614397B2 (en) 2014-10-29
TW201334051A (en) 2013-08-16
CN103889655B (en) 2016-07-20
TWI523094B (en) 2016-02-21
KR101835414B1 (en) 2018-03-08
CN103889655A (en) 2014-06-25
WO2013069198A1 (en) 2013-05-16

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