TWI361104B - Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases - Google Patents

Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases Download PDF

Info

Publication number
TWI361104B
TWI361104B TW093113633A TW93113633A TWI361104B TW I361104 B TWI361104 B TW I361104B TW 093113633 A TW093113633 A TW 093113633A TW 93113633 A TW93113633 A TW 93113633A TW I361104 B TWI361104 B TW I361104B
Authority
TW
Taiwan
Prior art keywords
gas
agent
processing unit
treatment
exhaust gas
Prior art date
Application number
TW093113633A
Other languages
English (en)
Chinese (zh)
Other versions
TW200503823A (en
Inventor
Yoichi Mori
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of TW200503823A publication Critical patent/TW200503823A/zh
Application granted granted Critical
Publication of TWI361104B publication Critical patent/TWI361104B/zh

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/685—Halogens or halogen compounds by treating the gases with solids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
    • B01J20/10—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
    • B01J20/16—Alumino-silicates
    • B01J20/18—Synthetic zeolitic molecular sieves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J29/00—Catalysts comprising molecular sieves
    • B01J29/04—Catalysts comprising molecular sieves having base-exchange properties, e.g. crystalline zeolites
    • B01J29/06—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof
    • B01J29/70—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof of types characterised by their specific structure not provided for in groups B01J29/08 - B01J29/65
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Inorganic Chemistry (AREA)
  • Treating Waste Gases (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Catalysts (AREA)
  • Drying Of Semiconductors (AREA)
TW093113633A 2003-05-30 2004-05-14 Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases TWI361104B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003154219A JP4564242B2 (ja) 2003-05-30 2003-05-30 三フッ化塩素を含む無機ハロゲン化ガス含有排ガスの処理方法、処理剤及び処理装置

Publications (2)

Publication Number Publication Date
TW200503823A TW200503823A (en) 2005-02-01
TWI361104B true TWI361104B (en) 2012-04-01

Family

ID=34048944

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093113633A TWI361104B (en) 2003-05-30 2004-05-14 Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases

Country Status (4)

Country Link
JP (1) JP4564242B2 (ja)
KR (1) KR101178179B1 (ja)
SG (1) SG111184A1 (ja)
TW (1) TWI361104B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4553705B2 (ja) * 2004-12-02 2010-09-29 大陽日酸株式会社 除害装置及びその管理方法
MY151251A (en) 2007-10-26 2014-04-30 Asahi Kasei Chemicals Corp Supported composite particle material, production process of same and process for producing compounds using supported composite particle material as catalyst for chemical synthesis
JP5471313B2 (ja) * 2008-12-11 2014-04-16 セントラル硝子株式会社 三フッ化塩素の除害方法
JP5626849B2 (ja) * 2010-05-07 2014-11-19 学校法人 関西大学 ゼオライトによるフッ素系ガスの分解処理方法
JP2015112546A (ja) * 2013-12-12 2015-06-22 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP6252153B2 (ja) * 2013-12-12 2017-12-27 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP2015112545A (ja) * 2013-12-12 2015-06-22 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP2015112544A (ja) * 2013-12-12 2015-06-22 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP2016221428A (ja) * 2015-05-28 2016-12-28 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP7253132B2 (ja) * 2018-07-30 2023-04-06 クラリアント触媒株式会社 ハロゲンガス除去剤とその製造方法、及び除去剤の消費状態をモニターする方法
CN112919419B (zh) * 2021-01-29 2022-08-23 福建德尔科技股份有限公司 电子级三氟化氯的精馏纯化***控制方法
CN116902922B (zh) * 2023-09-13 2023-12-05 福建省巨颖高能新材料有限公司 一种制备工业级五氟化氯的装置及制备方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03217217A (ja) * 1990-01-19 1991-09-25 Central Glass Co Ltd 三フッ化塩素を含む排ガスの処理方法
JPH06177B2 (ja) * 1990-02-05 1994-01-05 株式会社荏原総合研究所 Ｃ１ｆ▲下３▼を含有する排ガスの処理方法
JPH0716583B2 (ja) * 1990-08-10 1995-03-01 セントラル硝子株式会社 フッ化塩素を含む排ガスの乾式処理方法
JPH10263367A (ja) * 1997-03-27 1998-10-06 Aiwa Co Ltd 脱臭装置
JPH10290920A (ja) * 1997-04-22 1998-11-04 Hitachi Ltd 高耐食排気体分解装置および半導体製造装置
JP3981206B2 (ja) * 1997-06-20 2007-09-26 株式会社荏原製作所 無機ハロゲン化ガスを含有する排ガスの処理方法及び処理装置
JP2000117053A (ja) * 1998-10-16 2000-04-25 Tomoe Shokai:Kk ＣｌＦ３処理筒、及びＣｌＦ３を含む被処理ガスの処理方法
JP4913271B2 (ja) * 1999-07-07 2012-04-11 ズードケミー触媒株式会社 ハロゲンガス用処理剤
JP3600073B2 (ja) 1999-07-14 2004-12-08 セントラル硝子株式会社 改良された微生物農薬製剤

Also Published As

Publication number Publication date
KR101178179B1 (ko) 2012-08-29
JP2004351364A (ja) 2004-12-16
SG111184A1 (en) 2005-05-30
TW200503823A (en) 2005-02-01
JP4564242B2 (ja) 2010-10-20
KR20040103406A (ko) 2004-12-08

Similar Documents

Publication Publication Date Title
TWI361104B (en) Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases
TW492891B (en) A scrubbing system and method for point-of-use treatment of effluent gas streams using an aqueous medium and/or gas/liquid contacting article
TW450831B (en) Apparatus and method for treating the effluent fluid stream from one or more semiconductor manufacturing process tools, thermal oxidation reactor for abatement of oxidizable halogen components in an effluent gas
TW200533412A (en) Method and apparatus for treating gas containing fluorine-containing compounds
JP2002239343A5 (ja)
EP1637211A1 (en) Exhaust gas decomposition processor and method for processing exhaust gas
JP5318919B2 (ja) 排ガス吸着剤及びそれを利用した排ガス処理方法
JP6867581B2 (ja) フッ素ガスの精製方法
WO2003069228A1 (fr) Procede de traitement de gaz d'echappement
US5707595A (en) Method and apparatus for use in photochemically oxidizing gaseous volatile or semi-volatile organic compounds
Tsai Environmental and health risks of chlorine trifluoride (ClF3), an alternative to potent greenhouse gases in the semiconductor industry
TW567088B (en) Process and apparatus for treating gas containing fluorine-containing compounds and CO
JP6343120B2 (ja) 過弗化物の処理装置、過弗化物の処理方法およびプログラム
TWI322030B (en) Exhaust gas treating agent, process for treating exhaust gas and treating apparatus of exhaust gas
JP4037475B2 (ja) ハロゲン系化合物を含有する排ガスの処理方法
JP4400067B2 (ja) ハロゲン耐食性部材及びパーフルオロコンパウンド分解処理装置
JPH0716582B2 (ja) ガス状酸性ハロゲン化合物の除去方法
JPS6190726A (ja) 除去剤
JP5651306B2 (ja) フッ素回収方法およびその装置
JP3216868B2 (ja) ハロゲン化物ガスの分解方法
JP5318336B2 (ja) Ｐｆｃガスの濃縮方法
JP5498660B2 (ja) シランの除害剤及び除害方法
JP2001029742A (ja) 金属ハロゲン排ガスの処理剤とその処理方法
KR100415328B1 (ko) 반도체 공정 배출 가스중 유해성분 처리 약제 용기
JP2608394B2 (ja) 除去剤