SG111184A1 - Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases - Google Patents

Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases

Info

Publication number
SG111184A1
SG111184A1 SG200402960A SG200402960A SG111184A1 SG 111184 A1 SG111184 A1 SG 111184A1 SG 200402960 A SG200402960 A SG 200402960A SG 200402960 A SG200402960 A SG 200402960A SG 111184 A1 SG111184 A1 SG 111184A1
Authority
SG
Singapore
Prior art keywords
reagent
containing chlorine
chlorine trifluoride
halogenated gases
emissions containing
Prior art date
Application number
SG200402960A
Other languages
English (en)
Inventor
Mori Yoichi
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of SG111184A1 publication Critical patent/SG111184A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/685—Halogens or halogen compounds by treating the gases with solids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
    • B01J20/10—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
    • B01J20/16—Alumino-silicates
    • B01J20/18—Synthetic zeolitic molecular sieves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J29/00—Catalysts comprising molecular sieves
    • B01J29/04—Catalysts comprising molecular sieves having base-exchange properties, e.g. crystalline zeolites
    • B01J29/06—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof
    • B01J29/70—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof of types characterised by their specific structure not provided for in groups B01J29/08 - B01J29/65
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Inorganic Chemistry (AREA)
  • Treating Waste Gases (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Catalysts (AREA)
  • Drying Of Semiconductors (AREA)
SG200402960A 2003-05-30 2004-05-21 Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases SG111184A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003154219A JP4564242B2 (ja) 2003-05-30 2003-05-30 三フッ化塩素を含む無機ハロゲン化ガス含有排ガスの処理方法、処理剤及び処理装置

Publications (1)

Publication Number Publication Date
SG111184A1 true SG111184A1 (en) 2005-05-30

Family

ID=34048944

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200402960A SG111184A1 (en) 2003-05-30 2004-05-21 Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases

Country Status (4)

Country Link
JP (1) JP4564242B2 (ja)
KR (1) KR101178179B1 (ja)
SG (1) SG111184A1 (ja)
TW (1) TWI361104B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4553705B2 (ja) * 2004-12-02 2010-09-29 大陽日酸株式会社 除害装置及びその管理方法
MY151251A (en) 2007-10-26 2014-04-30 Asahi Kasei Chemicals Corp Supported composite particle material, production process of same and process for producing compounds using supported composite particle material as catalyst for chemical synthesis
JP5471313B2 (ja) * 2008-12-11 2014-04-16 セントラル硝子株式会社 三フッ化塩素の除害方法
JP5626849B2 (ja) * 2010-05-07 2014-11-19 学校法人 関西大学 ゼオライトによるフッ素系ガスの分解処理方法
JP2015112546A (ja) * 2013-12-12 2015-06-22 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP6252153B2 (ja) * 2013-12-12 2017-12-27 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP2015112545A (ja) * 2013-12-12 2015-06-22 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP2015112544A (ja) * 2013-12-12 2015-06-22 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP2016221428A (ja) * 2015-05-28 2016-12-28 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP7253132B2 (ja) * 2018-07-30 2023-04-06 クラリアント触媒株式会社 ハロゲンガス除去剤とその製造方法、及び除去剤の消費状態をモニターする方法
CN112919419B (zh) * 2021-01-29 2022-08-23 福建德尔科技股份有限公司 电子级三氟化氯的精馏纯化***控制方法
CN116902922B (zh) * 2023-09-13 2023-12-05 福建省巨颖高能新材料有限公司 一种制备工业级五氟化氯的装置及制备方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0441236A1 (en) * 1990-02-05 1991-08-14 Ebara Corporation Process for treating waste gases containing ClF3
JPH10290920A (ja) * 1997-04-22 1998-11-04 Hitachi Ltd 高耐食排気体分解装置および半導体製造装置
JPH1170319A (ja) * 1997-06-20 1999-03-16 Ebara Corp 無機ハロゲン化ガスを含有する排ガスの処理方法及び処理装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03217217A (ja) * 1990-01-19 1991-09-25 Central Glass Co Ltd 三フッ化塩素を含む排ガスの処理方法
JPH0716583B2 (ja) * 1990-08-10 1995-03-01 セントラル硝子株式会社 フッ化塩素を含む排ガスの乾式処理方法
JPH10263367A (ja) * 1997-03-27 1998-10-06 Aiwa Co Ltd 脱臭装置
JP2000117053A (ja) * 1998-10-16 2000-04-25 Tomoe Shokai:Kk ＣｌＦ３処理筒、及びＣｌＦ３を含む被処理ガスの処理方法
JP4913271B2 (ja) * 1999-07-07 2012-04-11 ズードケミー触媒株式会社 ハロゲンガス用処理剤
JP3600073B2 (ja) 1999-07-14 2004-12-08 セントラル硝子株式会社 改良された微生物農薬製剤

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0441236A1 (en) * 1990-02-05 1991-08-14 Ebara Corporation Process for treating waste gases containing ClF3
JPH03229618A (ja) * 1990-02-05 1991-10-11 Ebara Res Co Ltd Ｃ１ｆ▲下３▼を含有する排ガスの処理方法
JPH10290920A (ja) * 1997-04-22 1998-11-04 Hitachi Ltd 高耐食排気体分解装置および半導体製造装置
JPH1170319A (ja) * 1997-06-20 1999-03-16 Ebara Corp 無機ハロゲン化ガスを含有する排ガスの処理方法及び処理装置

Also Published As

Publication number Publication date
KR101178179B1 (ko) 2012-08-29
JP2004351364A (ja) 2004-12-16
TW200503823A (en) 2005-02-01
JP4564242B2 (ja) 2010-10-20
KR20040103406A (ko) 2004-12-08
TWI361104B (en) 2012-04-01

Similar Documents

Publication Publication Date Title
TWI370011B (en) Method and apparatus for treating gas containing fluorine-containing compounds
AU2001234668A1 (en) Apparatus and method for mixing gases
IL154814A0 (en) Sternal closure system, method and apparatus therefor
HK1074416A1 (en) Hazardous waste treatment method and apparatus
EP1544425A4 (en) DEVICE FOR TREATING EXHAUST GAS
EP1450936A4 (en) METHOD AND DEVICE FOR TREATMENT OF EXHAUST GAS
GB2431155B (en) Method and apparatus for processing mixed organic waste
PL1673214T3 (pl) Urządzenie i metoda służąca do przeróbki osadu ściekowego
EP1103297A4 (en) Method and device for the treatment of gases containing perfluoros components
AU2003263040A8 (en) Method and apparatus for multi-level security implementation
SG111184A1 (en) Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases
AU2003281501A1 (en) Method and apparatus for chemical analysis
AU2002357586A1 (en) Method for treating exhaust gas containing volatile hydrocarbon, and apparatus for practicing said method
PL1781406T3 (pl) Sposób i układ do przetwarzania odpadów chemicznych
MXPA03009339A (es) Metodo y aparato para aserrar o taladrar concreto.
EP1623183A4 (en) SYSTEM AND METHOD FOR THE TREATMENT OF HAZARDOUS MATERIALS, FOR EXAMPLE UNEXPLODED AMMUNITION IN CHEMICAL WARRIOR
EP1664474A4 (en) DEVICE, METHOD AND SYSTEM FOR DRILLING
HK1092297A1 (en) Method and apparatus for multi-algorithm detection
GB0412870D0 (en) Safety apparatus for portable gas range and method thereof
GB2399422B (en) Method and apparatus for measuring the permeation of gases and vapours through materials
EP1610883A4 (en) METHOD AND APPARATUS FOR TREATING EXHAUST GAS
EP1440725A4 (en) FLUE GAS TREATMENT DEVICE AND DECOILING METHOD
EP1608961A4 (en) METHOD AND DEVICE FOR ENHANCING GAS DETECTION
TWI372074B (en) Method and apparatus for treating gas containing fluorine-containing compounds
MXPA00002210A (es) Metodo y aparato para el analisis fotometrico de soluciones de dioxido de cloro.