KR101178179B1 - 3불화염소를 함유하는 무기할로겐화 가스함유 배기가스의처리방법, 처리제 및 처리장치 - Google Patents

3불화염소를 함유하는 무기할로겐화 가스함유 배기가스의처리방법, 처리제 및 처리장치 Download PDF

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KR101178179B1
KR101178179B1 KR1020040038115A KR20040038115A KR101178179B1 KR 101178179 B1 KR101178179 B1 KR 101178179B1 KR 1020040038115 A KR1020040038115 A KR 1020040038115A KR 20040038115 A KR20040038115 A KR 20040038115A KR 101178179 B1 KR101178179 B1 KR 101178179B1
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South Korea
Prior art keywords
chlorine
gas
clf
exhaust gas
trifluoride
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KR1020040038115A
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English (en)
Korean (ko)
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KR20040103406A (ko
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모리요이치
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가부시키가이샤 에바라 세이사꾸쇼
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/685—Halogens or halogen compounds by treating the gases with solids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
    • B01J20/10—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
    • B01J20/16—Alumino-silicates
    • B01J20/18—Synthetic zeolitic molecular sieves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J29/00—Catalysts comprising molecular sieves
    • B01J29/04—Catalysts comprising molecular sieves having base-exchange properties, e.g. crystalline zeolites
    • B01J29/06—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof
    • B01J29/70—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof of types characterised by their specific structure not provided for in groups B01J29/08 - B01J29/65
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Inorganic Chemistry (AREA)
  • Treating Waste Gases (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Catalysts (AREA)
  • Drying Of Semiconductors (AREA)
KR1020040038115A 2003-05-30 2004-05-28 3불화염소를 함유하는 무기할로겐화 가스함유 배기가스의처리방법, 처리제 및 처리장치 KR101178179B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003154219A JP4564242B2 (ja) 2003-05-30 2003-05-30 三フッ化塩素を含む無機ハロゲン化ガス含有排ガスの処理方法、処理剤及び処理装置
JPJP-P-2003-00154219 2003-05-30

Publications (2)

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KR20040103406A KR20040103406A (ko) 2004-12-08
KR101178179B1 true KR101178179B1 (ko) 2012-08-29

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KR1020040038115A KR101178179B1 (ko) 2003-05-30 2004-05-28 3불화염소를 함유하는 무기할로겐화 가스함유 배기가스의처리방법, 처리제 및 처리장치

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JP (1) JP4564242B2 (ja)
KR (1) KR101178179B1 (ja)
SG (1) SG111184A1 (ja)
TW (1) TWI361104B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4553705B2 (ja) * 2004-12-02 2010-09-29 大陽日酸株式会社 除害装置及びその管理方法
MY151251A (en) 2007-10-26 2014-04-30 Asahi Kasei Chemicals Corp Supported composite particle material, production process of same and process for producing compounds using supported composite particle material as catalyst for chemical synthesis
JP5471313B2 (ja) * 2008-12-11 2014-04-16 セントラル硝子株式会社 三フッ化塩素の除害方法
JP5626849B2 (ja) * 2010-05-07 2014-11-19 学校法人 関西大学 ゼオライトによるフッ素系ガスの分解処理方法
JP2015112546A (ja) * 2013-12-12 2015-06-22 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP6252153B2 (ja) * 2013-12-12 2017-12-27 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP2015112545A (ja) * 2013-12-12 2015-06-22 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP2015112544A (ja) * 2013-12-12 2015-06-22 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP2016221428A (ja) * 2015-05-28 2016-12-28 宇部興産株式会社 ガスの処理装置及びガスの処理カートリッジ
JP7253132B2 (ja) * 2018-07-30 2023-04-06 クラリアント触媒株式会社 ハロゲンガス除去剤とその製造方法、及び除去剤の消費状態をモニターする方法
CN112919419B (zh) * 2021-01-29 2022-08-23 福建德尔科技股份有限公司 电子级三氟化氯的精馏纯化***控制方法
CN116902922B (zh) * 2023-09-13 2023-12-05 福建省巨颖高能新材料有限公司 一种制备工业级五氟化氯的装置及制备方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000117053A (ja) 1998-10-16 2000-04-25 Tomoe Shokai:Kk ＣｌＦ３処理筒、及びＣｌＦ３を含む被処理ガスの処理方法
JP2001031513A (ja) 1999-07-14 2001-02-06 Central Glass Co Ltd 改良された微生物農薬製剤

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03217217A (ja) * 1990-01-19 1991-09-25 Central Glass Co Ltd 三フッ化塩素を含む排ガスの処理方法
JPH06177B2 (ja) * 1990-02-05 1994-01-05 株式会社荏原総合研究所 Ｃ１ｆ▲下３▼を含有する排ガスの処理方法
JPH0716583B2 (ja) * 1990-08-10 1995-03-01 セントラル硝子株式会社 フッ化塩素を含む排ガスの乾式処理方法
JPH10263367A (ja) * 1997-03-27 1998-10-06 Aiwa Co Ltd 脱臭装置
JPH10290920A (ja) * 1997-04-22 1998-11-04 Hitachi Ltd 高耐食排気体分解装置および半導体製造装置
JP3981206B2 (ja) * 1997-06-20 2007-09-26 株式会社荏原製作所 無機ハロゲン化ガスを含有する排ガスの処理方法及び処理装置
JP4913271B2 (ja) * 1999-07-07 2012-04-11 ズードケミー触媒株式会社 ハロゲンガス用処理剤

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000117053A (ja) 1998-10-16 2000-04-25 Tomoe Shokai:Kk ＣｌＦ３処理筒、及びＣｌＦ３を含む被処理ガスの処理方法
JP2001031513A (ja) 1999-07-14 2001-02-06 Central Glass Co Ltd 改良された微生物農薬製剤

Also Published As

Publication number Publication date
JP2004351364A (ja) 2004-12-16
SG111184A1 (en) 2005-05-30
TW200503823A (en) 2005-02-01
JP4564242B2 (ja) 2010-10-20
KR20040103406A (ko) 2004-12-08
TWI361104B (en) 2012-04-01

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