SG111184A1 - Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases - Google Patents

Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases

Info

Publication number
SG111184A1
SG111184A1 SG200402960A SG200402960A SG111184A1 SG 111184 A1 SG111184 A1 SG 111184A1 SG 200402960 A SG200402960 A SG 200402960A SG 200402960 A SG200402960 A SG 200402960A SG 111184 A1 SG111184 A1 SG 111184A1
Authority
SG
Singapore
Prior art keywords
reagent
containing chlorine
chlorine trifluoride
halogenated gases
emissions containing
Prior art date
Application number
SG200402960A
Inventor
Mori Yoichi
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Publication of SG111184A1 publication Critical patent/SG111184A1/en

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/46—Removing components of defined structure
    • B01D53/68—Halogens or halogen compounds
    • B01D53/685—Halogens or halogen compounds by treating the gases with solids
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J20/00—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof
    • B01J20/02—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material
    • B01J20/10—Solid sorbent compositions or filter aid compositions; Sorbents for chromatography; Processes for preparing, regenerating or reactivating thereof comprising inorganic material comprising silica or silicate
    • B01J20/16—Alumino-silicates
    • B01J20/18—Synthetic zeolitic molecular sieves
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J29/00—Catalysts comprising molecular sieves
    • B01J29/04—Catalysts comprising molecular sieves having base-exchange properties, e.g. crystalline zeolites
    • B01J29/06—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof
    • B01J29/70—Crystalline aluminosilicate zeolites; Isomorphous compounds thereof of types characterised by their specific structure not provided for in groups B01J29/08 - B01J29/65
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2258/00—Sources of waste gases
    • B01D2258/02—Other waste gases
    • B01D2258/0216—Other waste gases from CVD treatment or semi-conductor manufacturing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Health & Medical Sciences (AREA)
  • Biomedical Technology (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Inorganic Chemistry (AREA)
  • Treating Waste Gases (AREA)
  • Exhaust Gas Treatment By Means Of Catalyst (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Catalysts (AREA)
  • Drying Of Semiconductors (AREA)
SG200402960A 2003-05-30 2004-05-21 Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases SG111184A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003154219A JP4564242B2 (en) 2003-05-30 2003-05-30 Treatment method, treatment agent and treatment apparatus for exhaust gas containing inorganic halogenated gas containing chlorine trifluoride

Publications (1)

Publication Number Publication Date
SG111184A1 true SG111184A1 (en) 2005-05-30

Family

ID=34048944

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200402960A SG111184A1 (en) 2003-05-30 2004-05-21 Method, reagent and apparatus for treating emissions containing chlorine trifluoride and other inorganic halogenated gases

Country Status (4)

Country Link
JP (1) JP4564242B2 (en)
KR (1) KR101178179B1 (en)
SG (1) SG111184A1 (en)
TW (1) TWI361104B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4553705B2 (en) * 2004-12-02 2010-09-29 大陽日酸株式会社 Abatement device and its management method
MY151251A (en) 2007-10-26 2014-04-30 Asahi Kasei Chemicals Corp Supported composite particle material, production process of same and process for producing compounds using supported composite particle material as catalyst for chemical synthesis
JP5471313B2 (en) * 2008-12-11 2014-04-16 セントラル硝子株式会社 Methods for removing chlorine trifluoride
JP5626849B2 (en) * 2010-05-07 2014-11-19 学校法人 関西大学 Method for decomposing fluorine gas with zeolite
JP2015112546A (en) * 2013-12-12 2015-06-22 宇部興産株式会社 Gas treatment device and gas treatment cartridge
JP6252153B2 (en) * 2013-12-12 2017-12-27 宇部興産株式会社 Gas processing apparatus and gas processing cartridge
JP2015112545A (en) * 2013-12-12 2015-06-22 宇部興産株式会社 Gas treatment device and gas treatment cartridge
JP2015112544A (en) * 2013-12-12 2015-06-22 宇部興産株式会社 Gas treatment device and gas treatment cartridge
JP2016221428A (en) * 2015-05-28 2016-12-28 宇部興産株式会社 Gas processing device and gas processing cartridge
JP7253132B2 (en) * 2018-07-30 2023-04-06 クラリアント触媒株式会社 Halogen gas remover, method for producing same, and method for monitoring consumption of remover
CN112919419B (en) * 2021-01-29 2022-08-23 福建德尔科技股份有限公司 Control method of rectification purification system of electronic-grade chlorine trifluoride
CN116902922B (en) * 2023-09-13 2023-12-05 福建省巨颖高能新材料有限公司 Device and method for preparing industrial grade chlorine pentafluoride

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0441236A1 (en) * 1990-02-05 1991-08-14 Ebara Corporation Process for treating waste gases containing ClF3
JPH10290920A (en) * 1997-04-22 1998-11-04 Hitachi Ltd Highly corrosion-resisting waste gas decomposition device and semiconductor manufacturing device
JPH1170319A (en) * 1997-06-20 1999-03-16 Ebara Corp Treatment of exhaust gas containing inorganic halogenated gas and treatment device

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03217217A (en) * 1990-01-19 1991-09-25 Central Glass Co Ltd Treatment of waste gas containing chlorine trifluoride
JPH0716583B2 (en) * 1990-08-10 1995-03-01 セントラル硝子株式会社 Method for dry treatment of exhaust gas containing chlorine fluoride
JPH10263367A (en) * 1997-03-27 1998-10-06 Aiwa Co Ltd Deodorization device
JP2000117053A (en) * 1998-10-16 2000-04-25 Tomoe Shokai:Kk Chlorine trifluoride treating cylinder and treatment of gas to be treated containing chlorine trifluoride
JP4913271B2 (en) * 1999-07-07 2012-04-11 ズードケミー触媒株式会社 Halogen gas treatment agent
JP3600073B2 (en) 1999-07-14 2004-12-08 セントラル硝子株式会社 Improved microbial pesticide formulation

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0441236A1 (en) * 1990-02-05 1991-08-14 Ebara Corporation Process for treating waste gases containing ClF3
JPH03229618A (en) * 1990-02-05 1991-10-11 Ebara Res Co Ltd Treatment of exhaust gas containing clf3
JPH10290920A (en) * 1997-04-22 1998-11-04 Hitachi Ltd Highly corrosion-resisting waste gas decomposition device and semiconductor manufacturing device
JPH1170319A (en) * 1997-06-20 1999-03-16 Ebara Corp Treatment of exhaust gas containing inorganic halogenated gas and treatment device

Also Published As

Publication number Publication date
KR101178179B1 (en) 2012-08-29
JP2004351364A (en) 2004-12-16
TW200503823A (en) 2005-02-01
JP4564242B2 (en) 2010-10-20
KR20040103406A (en) 2004-12-08
TWI361104B (en) 2012-04-01

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