TWI421969B - A substrate alignment device and a substrate storage unit - Google Patents

A substrate alignment device and a substrate storage unit Download PDF

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Publication number
TWI421969B
TWI421969B TW095132616A TW95132616A TWI421969B TW I421969 B TWI421969 B TW I421969B TW 095132616 A TW095132616 A TW 095132616A TW 95132616 A TW95132616 A TW 95132616A TW I421969 B TWI421969 B TW I421969B
Authority
TW
Taiwan
Prior art keywords
substrate
pressing
pushable
piston
sliding member
Prior art date
Application number
TW095132616A
Other languages
English (en)
Chinese (zh)
Other versions
TW200721361A (en
Inventor
Yoshiyuki Hadachi
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200721361A publication Critical patent/TW200721361A/zh
Application granted granted Critical
Publication of TWI421969B publication Critical patent/TWI421969B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
TW095132616A 2005-09-05 2006-09-04 A substrate alignment device and a substrate storage unit TWI421969B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005257165A JP4642610B2 (ja) 2005-09-05 2005-09-05 基板位置合わせ装置および基板収容ユニット

Publications (2)

Publication Number Publication Date
TW200721361A TW200721361A (en) 2007-06-01
TWI421969B true TWI421969B (zh) 2014-01-01

Family

ID=37859001

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095132616A TWI421969B (zh) 2005-09-05 2006-09-04 A substrate alignment device and a substrate storage unit

Country Status (4)

Country Link
JP (1) JP4642610B2 (ko)
KR (2) KR100860143B1 (ko)
CN (1) CN100446215C (ko)
TW (1) TWI421969B (ko)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5501688B2 (ja) * 2009-07-30 2014-05-28 東京エレクトロン株式会社 基板位置合わせ機構、それを用いた真空予備室および基板処理システム
JP5582895B2 (ja) * 2010-07-09 2014-09-03 キヤノンアネルバ株式会社 基板ホルダーストッカ装置及び基板処理装置並びに該基板ホルダーストッカ装置を用いた基板ホルダー移動方法
TW201514516A (zh) * 2013-10-03 2015-04-16 Chips Best Technology Co Ltd 晶片自動檢測系統
TW201514502A (zh) * 2013-10-03 2015-04-16 Chips Best Technology Co Ltd 晶片檢測座
WO2017066418A1 (en) * 2015-10-15 2017-04-20 Applied Materials, Inc. Substrate carrier system
CN106773157B (zh) * 2016-12-06 2018-08-31 友达光电（昆山）有限公司 位置校正装置及位置校正方法
JP2019102721A (ja) * 2017-12-06 2019-06-24 エスペック株式会社 基板用位置決め装置
KR102186594B1 (ko) * 2020-04-08 2020-12-03 백철호 인쇄회로기판의 자동정렬장치

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0927536A (ja) * 1995-07-10 1997-01-28 Nissin Electric Co Ltd ロ−ドロック室内に基板位置合わせ機構を有するイオン注入装置
TW297911B (ko) * 1995-04-14 1997-02-11 Tokyo Electron Co Ltd
JP2000306980A (ja) * 1993-02-26 2000-11-02 Tokyo Electron Ltd Ｌｃｄ用ガラス基板の位置合わせ機構及び真空処理装置
JP2001291758A (ja) * 2000-11-27 2001-10-19 Tokyo Electron Ltd 真空処理装置
JP2002057205A (ja) * 1991-09-10 2002-02-22 Tokyo Electron Ltd ロードロック室内の位置合わせ機構及び処理装置及び位置合わせ方法及び搬送方法
TW200424093A (en) * 2002-11-21 2004-11-16 Hitachi Int Electric Inc Method for positioning a substrate and inspecting apparatus using same
JP2005116878A (ja) * 2003-10-09 2005-04-28 Toshiba Corp 基板支持方法および基板支持装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3260427B2 (ja) * 1991-09-10 2002-02-25 東京エレクトロン株式会社 真空処理装置及び真空処理装置における基板搬送方法
JPH0751229Y2 (ja) * 1990-09-29 1995-11-22 大日本スクリーン製造株式会社 基板の位置整合装置
JP3468430B2 (ja) * 1994-02-15 2003-11-17 東京エレクトロン株式会社 位置検出案内装置、位置検出案内方法及び真空処理装置
JP4030654B2 (ja) * 1998-06-02 2008-01-09 大日本スクリーン製造株式会社 基板搬送装置
JP2003086659A (ja) * 2001-09-11 2003-03-20 Hirata Corp 基板の移載装置
US20030072639A1 (en) * 2001-10-17 2003-04-17 Applied Materials, Inc. Substrate support
JP2003282684A (ja) * 2002-03-22 2003-10-03 Olympus Optical Co Ltd ガラス基板保持具
KR101018909B1 (ko) * 2002-10-25 2011-03-02 도쿄엘렉트론가부시키가이샤 기판 얼라이먼트장치, 기판처리장치 및 기판반송장치
JP4479881B2 (ja) * 2003-09-19 2010-06-09 株式会社日立ハイテクノロジーズ 基板スピン処理装置及び基板スピン処理方法

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002057205A (ja) * 1991-09-10 2002-02-22 Tokyo Electron Ltd ロードロック室内の位置合わせ機構及び処理装置及び位置合わせ方法及び搬送方法
JP2000306980A (ja) * 1993-02-26 2000-11-02 Tokyo Electron Ltd Ｌｃｄ用ガラス基板の位置合わせ機構及び真空処理装置
TW297911B (ko) * 1995-04-14 1997-02-11 Tokyo Electron Co Ltd
JPH0927536A (ja) * 1995-07-10 1997-01-28 Nissin Electric Co Ltd ロ−ドロック室内に基板位置合わせ機構を有するイオン注入装置
JP2001291758A (ja) * 2000-11-27 2001-10-19 Tokyo Electron Ltd 真空処理装置
TW200424093A (en) * 2002-11-21 2004-11-16 Hitachi Int Electric Inc Method for positioning a substrate and inspecting apparatus using same
JP2005116878A (ja) * 2003-10-09 2005-04-28 Toshiba Corp 基板支持方法および基板支持装置

Also Published As

Publication number Publication date
JP4642610B2 (ja) 2011-03-02
JP2007073646A (ja) 2007-03-22
TW200721361A (en) 2007-06-01
KR100860143B1 (ko) 2008-09-24
KR20070026274A (ko) 2007-03-08
KR20080059118A (ko) 2008-06-26
KR100952524B1 (ko) 2010-04-12
CN1929109A (zh) 2007-03-14
CN100446215C (zh) 2008-12-24

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