TW200721361A - Substrate positioner and substrate containing unit - Google Patents

Substrate positioner and substrate containing unit

Info

Publication number
TW200721361A
TW200721361A TW095132616A TW95132616A TW200721361A TW 200721361 A TW200721361 A TW 200721361A TW 095132616 A TW095132616 A TW 095132616A TW 95132616 A TW95132616 A TW 95132616A TW 200721361 A TW200721361 A TW 200721361A
Authority
TW
Taiwan
Prior art keywords
substrate
press
positioner
pair
positioners
Prior art date
Application number
TW095132616A
Other languages
Chinese (zh)
Other versions
TWI421969B (en
Inventor
Yoshiyuki Hadachi
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200721361A publication Critical patent/TW200721361A/en
Application granted granted Critical
Publication of TWI421969B publication Critical patent/TWI421969B/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67201—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the construction of the load-lock chamber
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

The invention provides a substrate positioner which positions a substrate while making a space around the substrate as small as possible in a container for containing the substrate such as a load lock chamber or the like. The substrate positioner comprises: a pair of positioners 7 which press a pair of ends S1 perpendicular to a transfer direction of a substrate S; and a pair of positioners 8 which press a pair of ends S2 along the transfer direction of the substrate S. The first and second positioners 7, 8 have pressers 70, 80 which press the ends S1, S2 by advance of cylinder mechanisms 71, 81 and pistons 74, 84 of the cylinder mechanisms 71, 81. The first positioner 7 further comprises a driving force conversion mechanism 72 which moves the presser 70 between an evacuation position of evacuating the presser 70 to an outside of a transfer route of the substrate S, and a press position to press the substrate S by advance of the piston 74, and also moves the presser 70 to a press direction at the press position.
TW095132616A 2005-09-05 2006-09-04 A substrate alignment device and a substrate storage unit TWI421969B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005257165A JP4642610B2 (en) 2005-09-05 2005-09-05 Substrate alignment device and substrate accommodation unit

Publications (2)

Publication Number Publication Date
TW200721361A true TW200721361A (en) 2007-06-01
TWI421969B TWI421969B (en) 2014-01-01

Family

ID=37859001

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095132616A TWI421969B (en) 2005-09-05 2006-09-04 A substrate alignment device and a substrate storage unit

Country Status (4)

Country Link
JP (1) JP4642610B2 (en)
KR (2) KR100860143B1 (en)
CN (1) CN100446215C (en)
TW (1) TWI421969B (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5501688B2 (en) * 2009-07-30 2014-05-28 東京エレクトロン株式会社 Substrate alignment mechanism, vacuum prechamber and substrate processing system using the same
JP5582895B2 (en) * 2010-07-09 2014-09-03 キヤノンアネルバ株式会社 Substrate holder stocker apparatus, substrate processing apparatus, and substrate holder moving method using the substrate holder stocker apparatus
TW201514516A (en) * 2013-10-03 2015-04-16 Chips Best Technology Co Ltd Automatic chip inspection system
TW201514502A (en) * 2013-10-03 2015-04-16 Chips Best Technology Co Ltd Chip inspection base
WO2017066418A1 (en) * 2015-10-15 2017-04-20 Applied Materials, Inc. Substrate carrier system
CN106773157B (en) * 2016-12-06 2018-08-31 友达光电（昆山）有限公司 Position correction apparatus and method for correcting position
JP2019102721A (en) * 2017-12-06 2019-06-24 エスペック株式会社 Substrate positioning device
KR102186594B1 (en) * 2020-04-08 2020-12-03 백철호 Automatic alignment device for PCB

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3260427B2 (en) * 1991-09-10 2002-02-25 東京エレクトロン株式会社 Vacuum processing apparatus and substrate transfer method in vacuum processing apparatus
JPH0751229Y2 (en) * 1990-09-29 1995-11-22 大日本スクリーン製造株式会社 Substrate alignment device
JP3426222B2 (en) * 1991-09-10 2003-07-14 東京エレクトロン株式会社 Alignment mechanism, processing device and alignment method in load lock chamber
JP3468430B2 (en) * 1994-02-15 2003-11-17 東京エレクトロン株式会社 Position detection guide device, position detection guide method, and vacuum processing device
JP3335983B2 (en) * 1993-02-26 2002-10-21 東京エレクトロン株式会社 LCD glass substrate alignment mechanism and vacuum processing device
JPH08288368A (en) * 1995-04-14 1996-11-01 Tokyo Electron Ltd Substrate aligning device and method therefor
JPH0927536A (en) * 1995-07-10 1997-01-28 Nissin Electric Co Ltd Ion implanting device with substrate-aligning mechanism in load-lock room
JP4030654B2 (en) * 1998-06-02 2008-01-09 大日本スクリーン製造株式会社 Substrate transfer device
JP4841035B2 (en) * 2000-11-27 2011-12-21 東京エレクトロン株式会社 Vacuum processing equipment
JP2003086659A (en) * 2001-09-11 2003-03-20 Hirata Corp Substrate transfer device
US20030072639A1 (en) * 2001-10-17 2003-04-17 Applied Materials, Inc. Substrate support
JP2003282684A (en) * 2002-03-22 2003-10-03 Olympus Optical Co Ltd Glass board supporting jig
KR101018909B1 (en) * 2002-10-25 2011-03-02 도쿄엘렉트론가부시키가이샤 Substrate alignment apparatus, substrate processing apparatus and substrate transfer apparatus
KR100582695B1 (en) * 2002-11-21 2006-05-23 가부시키가이샤 히다치 고쿠사이 덴키 Method for positioning a substrate and inspecting apparatus using same
JP4479881B2 (en) * 2003-09-19 2010-06-09 株式会社日立ハイテクノロジーズ Substrate spin processing apparatus and substrate spin processing method
JP2005116878A (en) * 2003-10-09 2005-04-28 Toshiba Corp Method and device for supporting substrate

Also Published As

Publication number Publication date
TWI421969B (en) 2014-01-01
JP4642610B2 (en) 2011-03-02
JP2007073646A (en) 2007-03-22
KR100860143B1 (en) 2008-09-24
KR20070026274A (en) 2007-03-08
KR20080059118A (en) 2008-06-26
KR100952524B1 (en) 2010-04-12
CN1929109A (en) 2007-03-14
CN100446215C (en) 2008-12-24

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees