JP5329661B2 - インプリント用モールドおよびその製造方法 - Google Patents

インプリント用モールドおよびその製造方法 Download PDF

Info

Publication number
JP5329661B2
JP5329661B2 JP2011518202A JP2011518202A JP5329661B2 JP 5329661 B2 JP5329661 B2 JP 5329661B2 JP 2011518202 A JP2011518202 A JP 2011518202A JP 2011518202 A JP2011518202 A JP 2011518202A JP 5329661 B2 JP5329661 B2 JP 5329661B2
Authority
JP
Japan
Prior art keywords
mold
crystalline polymer
fine pattern
surface layer
chain crystalline
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2011518202A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2010143321A1 (ja
Inventor
真一 仲野
伸一郎 河原
真二 松井
真 岡田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitta Corp
Hyogo Prefectural Government
Original Assignee
Nitta Corp
Hyogo Prefectural Government
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitta Corp, Hyogo Prefectural Government filed Critical Nitta Corp
Priority to JP2011518202A priority Critical patent/JP5329661B2/ja
Publication of JPWO2010143321A1 publication Critical patent/JPWO2010143321A1/ja
Application granted granted Critical
Publication of JP5329661B2 publication Critical patent/JP5329661B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02—Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00—Moulds or cores; Details thereof or accessories therefor
    • B29C33/38—Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842—Manufacturing moulds, e.g. shaping the mould surface by machining
    • B29C33/3857—Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts
    • B29C33/3878—Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts used as masters for making successive impressions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
JP2011518202A 2009-06-08 2009-10-27 インプリント用モールドおよびその製造方法 Active JP5329661B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2011518202A JP5329661B2 (ja) 2009-06-08 2009-10-27 インプリント用モールドおよびその製造方法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2009137553 2009-06-08
JP2009137553 2009-06-08
JP2011518202A JP5329661B2 (ja) 2009-06-08 2009-10-27 インプリント用モールドおよびその製造方法
PCT/JP2009/068383 WO2010143321A1 (ja) 2009-06-08 2009-10-27 インプリント用モールドおよびその製造方法

Publications (2)

Publication Number Publication Date
JPWO2010143321A1 JPWO2010143321A1 (ja) 2012-11-22
JP5329661B2 true JP5329661B2 (ja) 2013-10-30

Family

ID=43308585

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2011518202A Active JP5329661B2 (ja) 2009-06-08 2009-10-27 インプリント用モールドおよびその製造方法

Country Status (5)

Country Link
JP (1) JP5329661B2 (ko)
KR (1) KR101355036B1 (ko)
CN (1) CN102458800B (ko)
TW (1) TWI461277B (ko)
WO (1) WO2010143321A1 (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5463072B2 (ja) * 2009-05-12 2014-04-09 ニッタ株式会社 微細構造の製造方法
JP5463087B2 (ja) * 2009-06-22 2014-04-09 ニッタ株式会社 微細構造の製造方法
JP2012143915A (ja) * 2011-01-10 2012-08-02 Scivax Kk インプリント用型
JP6304735B2 (ja) * 2013-05-10 2018-04-04 ニッタ株式会社 インプリント用レジスト材およびそれを用いた微細構造の製造方法
JP7245973B2 (ja) * 2019-02-04 2023-03-27 パナソニックＩｐマネジメント株式会社 パターンの形成方法および装置
CN110316694B (zh) * 2019-07-09 2022-03-15 嘉兴学院 一种具有微纳米形态模具的加工方法
CN113189840A (zh) * 2021-04-16 2021-07-30 深圳先进技术研究院 微纳结构制作方法及微纳结构制作装置

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4944076A (ko) * 1972-09-01 1974-04-25
JPS63202685A (ja) * 1987-02-18 1988-08-22 Nitto Electric Ind Co Ltd アクリル系剥離剤
JPS6422907A (en) * 1987-07-17 1989-01-25 Dainippon Printing Co Ltd Heat mold release agent
JP2001001402A (ja) * 1999-04-23 2001-01-09 Dainippon Printing Co Ltd 賦型シート及びその製造方法
JP2006272947A (ja) * 2005-03-29 2006-10-12 Lee Bing Huan ナノシートの製造方法
JP2006523728A (ja) * 2003-04-14 2006-10-19 ミヌタ・テクノロジー・カンパニー・リミテッド 微細パターンの形成に用いられるモールド用樹脂組成物およびそれからの有機モールドの製作方法
JP2009001002A (ja) * 2007-05-24 2009-01-08 Univ Waseda モールド、その製造方法および転写微細パターンを有する基材の製造方法
JP2009119695A (ja) * 2007-11-14 2009-06-04 Hitachi High-Technologies Corp ナノプリント用樹脂スタンパ

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW440519B (en) * 1999-04-23 2001-06-16 Dainippon Printing Co Ltd Shaped sheet and method for producing the same
KR20080031514A (ko) * 2004-02-04 2008-04-08 스미도모쥬기가이고교 가부시키가이샤 가압성형장치, 금형 및 가압성형방법

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4944076A (ko) * 1972-09-01 1974-04-25
JPS63202685A (ja) * 1987-02-18 1988-08-22 Nitto Electric Ind Co Ltd アクリル系剥離剤
JPS6422907A (en) * 1987-07-17 1989-01-25 Dainippon Printing Co Ltd Heat mold release agent
JP2001001402A (ja) * 1999-04-23 2001-01-09 Dainippon Printing Co Ltd 賦型シート及びその製造方法
JP2006523728A (ja) * 2003-04-14 2006-10-19 ミヌタ・テクノロジー・カンパニー・リミテッド 微細パターンの形成に用いられるモールド用樹脂組成物およびそれからの有機モールドの製作方法
JP2006272947A (ja) * 2005-03-29 2006-10-12 Lee Bing Huan ナノシートの製造方法
JP2009001002A (ja) * 2007-05-24 2009-01-08 Univ Waseda モールド、その製造方法および転写微細パターンを有する基材の製造方法
JP2009119695A (ja) * 2007-11-14 2009-06-04 Hitachi High-Technologies Corp ナノプリント用樹脂スタンパ

Also Published As

Publication number Publication date
TWI461277B (zh) 2014-11-21
WO2010143321A1 (ja) 2010-12-16
JPWO2010143321A1 (ja) 2012-11-22
TW201043427A (en) 2010-12-16
CN102458800B (zh) 2014-04-23
KR20120014022A (ko) 2012-02-15
KR101355036B1 (ko) 2014-01-24
CN102458800A (zh) 2012-05-16

Similar Documents

Publication Publication Date Title
JP5329661B2 (ja) インプリント用モールドおよびその製造方法
US9744715B2 (en) Method for producing patterned materials
TWI461504B (zh) 模具固定用黏著片及模具固定用黏著帶、以及微細構造之製造方法
WO2011034123A1 (ja) 光硬化性転写シート、及びこれを用いた凹凸パターンの形成方法
TW202003194A (zh) 用於將浮凸結構轉移至塗層表面之方法及包含該塗層之複合物
TW202005776A (zh) 用於將浮凸結構轉移至塗層組合物表面之方法及可使用作為壓花模之複合物
JP5463087B2 (ja) 微細構造の製造方法
JP5698958B2 (ja) インプリント用モールドの製造方法
JP2014162185A (ja) フィルム状モールドの製造方法
JP5693925B2 (ja) 樹脂型、成形体、及び成形体の製造方法
Almanza-Workman et al. Fabrication of three-dimensional imprint lithography templates by colloidal dispersions
Youn et al. Fabrication of micro mold for hot-embossing of polyimide microfluidic platform by using electron beam lithography combined with inductively coupled plasma
JP5512153B2 (ja) 微細構造の製造方法
JP5463072B2 (ja) 微細構造の製造方法
JP6531898B2 (ja) インプリント用モールドおよびその製造方法、並びに微細構造の製造方法
JP5371286B2 (ja) 樹脂製モールド作製用積層体および樹脂製モールドの製造方法
CN114521167B (zh) 将压纹结构转印到涂层表面的方法以及可以用作压纹模具的复合物
JP2011136459A (ja) 光硬化性転写シート、及びこれを用いた凹凸パターンの形成方法
JP6304735B2 (ja) インプリント用レジスト材およびそれを用いた微細構造の製造方法
TW201627139A (zh) 保護貼片及其製造方法
JP2014073682A (ja) 凹凸構造体の製造方法、パターン形成用モールドの製造方法、及びパターン形成用モールド

Legal Events

Date Code Title Description
TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20130716

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20130724

R150 Certificate of patent or registration of utility model

Ref document number: 5329661

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150