CN102458800B - 压印用模具及其制造方法 - Google Patents

压印用模具及其制造方法 Download PDF

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Publication number
CN102458800B
CN102458800B CN200980159699.3A CN200980159699A CN102458800B CN 102458800 B CN102458800 B CN 102458800B CN 200980159699 A CN200980159699 A CN 200980159699A CN 102458800 B CN102458800 B CN 102458800B
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CN
China
Prior art keywords
superficial layer
mould
side chain
micro pattern
imprint mold
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CN200980159699.3A
Other languages
English (en)
Chinese (zh)
Other versions
CN102458800A (zh
Inventor
仲野真一
河原伸一郎
松井真二
冈田真
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BING KUXIAN
XINTIAN HOLDING CO Ltd
Nitta Corp
Original Assignee
BING KUXIAN
XINTIAN HOLDING CO Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BING KUXIAN, XINTIAN HOLDING CO Ltd filed Critical BING KUXIAN
Publication of CN102458800A publication Critical patent/CN102458800A/zh
Application granted granted Critical
Publication of CN102458800B publication Critical patent/CN102458800B/zh
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/02Surface shaping of articles, e.g. embossing; Apparatus therefor by mechanical means, e.g. pressing
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/38Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C33/00Moulds or cores; Details thereof or accessories therefor
    • B29C33/38Moulds or cores; Details thereof or accessories therefor characterised by the material or the manufacturing process
    • B29C33/3842Manufacturing moulds, e.g. shaping the mould surface by machining
    • B29C33/3857Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts
    • B29C33/3878Manufacturing moulds, e.g. shaping the mould surface by machining by making impressions of one or more parts of models, e.g. shaped articles and including possible subsequent assembly of the parts used as masters for making successive impressions
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00Manufacture or treatment of nanostructures
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04Homopolymers or copolymers of esters
    • C08L33/06Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Moulds For Moulding Plastics Or The Like (AREA)
CN200980159699.3A 2009-06-08 2009-10-27 压印用模具及其制造方法 Expired - Fee Related CN102458800B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009-137553 2009-06-08
JP2009137553 2009-06-08
PCT/JP2009/068383 WO2010143321A1 (ja) 2009-06-08 2009-10-27 インプリント用モールドおよびその製造方法

Publications (2)

Publication Number Publication Date
CN102458800A CN102458800A (zh) 2012-05-16
CN102458800B true CN102458800B (zh) 2014-04-23

Family

ID=43308585

Family Applications (1)

Application Number Title Priority Date Filing Date
CN200980159699.3A Expired - Fee Related CN102458800B (zh) 2009-06-08 2009-10-27 压印用模具及其制造方法

Country Status (5)

Country Link
JP (1) JP5329661B2 (ko)
KR (1) KR101355036B1 (ko)
CN (1) CN102458800B (ko)
TW (1) TWI461277B (ko)
WO (1) WO2010143321A1 (ko)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5463072B2 (ja) * 2009-05-12 2014-04-09 ニッタ株式会社 微細構造の製造方法
JP5463087B2 (ja) * 2009-06-22 2014-04-09 ニッタ株式会社 微細構造の製造方法
JP2012143915A (ja) * 2011-01-10 2012-08-02 Scivax Kk インプリント用型
JP6304735B2 (ja) * 2013-05-10 2018-04-04 ニッタ株式会社 インプリント用レジスト材およびそれを用いた微細構造の製造方法
JP7245973B2 (ja) * 2019-02-04 2023-03-27 パナソニックIpマネジメント株式会社 パターンの形成方法および装置
CN110316694B (zh) * 2019-07-09 2022-03-15 嘉兴学院 一种具有微纳米形态模具的加工方法
CN113189840A (zh) * 2021-04-16 2021-07-30 深圳先进技术研究院 微纳结构制作方法及微纳结构制作装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1917999A (zh) * 2004-02-04 2007-02-21 住友重机械工业株式会社 加压成形装置、模具及加压成形方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5139676B2 (ko) * 1972-09-01 1976-10-29
JPS63202685A (ja) * 1987-02-18 1988-08-22 Nitto Electric Ind Co Ltd アクリル系剥離剤
JP2904786B2 (ja) * 1987-07-17 1999-06-14 大日本印刷株式会社 熱離型剤
TW440519B (en) * 1999-04-23 2001-06-16 Dainippon Printing Co Ltd Shaped sheet and method for producing the same
JP4394248B2 (ja) * 1999-04-23 2010-01-06 大日本印刷株式会社 賦型シート及びその製造方法
KR100568581B1 (ko) * 2003-04-14 2006-04-07 주식회사 미뉴타텍 미세패턴 형성 몰드용 조성물 및 이로부터 제작된 몰드
TWI280159B (en) * 2005-03-29 2007-05-01 Li Bing Huan Method for fabricating nano-adhesive
JP2009001002A (ja) * 2007-05-24 2009-01-08 Univ Waseda モールド、その製造方法および転写微細パターンを有する基材の製造方法
JP5002422B2 (ja) * 2007-11-14 2012-08-15 株式会社日立ハイテクノロジーズ ナノプリント用樹脂スタンパ

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1917999A (zh) * 2004-02-04 2007-02-21 住友重机械工业株式会社 加压成形装置、模具及加压成形方法

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
JP特开2001-1402A 2001.01.09
JP特开2006-27294A 2006.10.12

Also Published As

Publication number Publication date
TWI461277B (zh) 2014-11-21
WO2010143321A1 (ja) 2010-12-16
JP5329661B2 (ja) 2013-10-30
JPWO2010143321A1 (ja) 2012-11-22
TW201043427A (en) 2010-12-16
KR20120014022A (ko) 2012-02-15
KR101355036B1 (ko) 2014-01-24
CN102458800A (zh) 2012-05-16

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Granted publication date: 20140423

Termination date: 20191027