DE221563C
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1980-10-06 |
1982-08-24 |
Werner Tabarelli |
Photolithographic method for the manufacture of integrated circuits
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JPS57117238A
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1981-01-14 |
1982-07-21 |
Nippon Kogaku Kk <Nikon> |
Exposing and baking device for manufacturing integrated circuit with illuminometer
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JPS57153433A
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1981-03-18 |
1982-09-22 |
Hitachi Ltd |
Manufacturing device for semiconductor
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JPS58202448A
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1982-05-21 |
1983-11-25 |
Hitachi Ltd |
露光装置
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JPS5919912A
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1982-07-26 |
1984-02-01 |
Hitachi Ltd |
液浸距離保持装置
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1985-04-24 |
Mikroelektronik Zt Forsch Tech |
Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur
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1984-03-01 |
1985-07-03 |
Zeiss Jena Veb Carl |
Einrichtung zur fotolithografischen strukturuebertragung
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JPS6265326A
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1985-09-18 |
1987-03-24 |
Hitachi Ltd |
露光装置
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JPS62221130A
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1986-03-24 |
1987-09-29 |
Toshiba Corp |
真空チヤツク装置
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JPS6394627A
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1986-10-09 |
1988-04-25 |
Nec Corp |
半導体の製造装置
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JPS63157419A
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1986-12-22 |
1988-06-30 |
Toshiba Corp |
微細パタ−ン転写装置
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Nikon Corp |
密着型露光装置
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Hitachi Ltd |
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2013-04-30 |
Nikon Corp |
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2004-10-26 |
2013-02-28 |
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2004-11-18 |
2007-06-12 |
International Business Machines Corporation |
Method and apparatus for immersion lithography
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JP2006270057A
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2005-02-28 |
2006-10-05 |
Canon Inc |
露光装置
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2005-04-25 |
2013-12-23 |
가부시키가이샤 니콘 |
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US20070177119A1
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*
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2006-02-02 |
2007-08-02 |
Keiko Chiba |
Exposure apparatus and device manufacturing method
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