JP5106858B2 - 高開口数と平面状端面とを有する投影対物レンズ - Google Patents
高開口数と平面状端面とを有する投影対物レンズ Download PDFInfo
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- JP5106858B2 JP5106858B2 JP2006543484A JP2006543484A JP5106858B2 JP 5106858 B2 JP5106858 B2 JP 5106858B2 JP 2006543484 A JP2006543484 A JP 2006543484A JP 2006543484 A JP2006543484 A JP 2006543484A JP 5106858 B2 JP5106858 B2 JP 5106858B2
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- projection objective
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/18—Optical objectives specially designed for the purposes specified below with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B13/00—Measuring arrangements characterised by the use of fluids
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B17/00—Measuring arrangements characterised by the use of infrasonic, sonic or ultrasonic vibrations
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/082—Catadioptric systems using three curved mirrors
- G02B17/0828—Catadioptric systems using three curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/7035—Proximity or contact printers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
- G03F7/70966—Birefringence
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
Claims (13)
- 投影対物レンズの物体平面内に配置されるパターンを投影対物レンズの像平面上に結像させる、マイクロリソグラフィー投影露光装置に適する投影対物レンズにおいて:
投影対物レンズの動作波長での放射に対して透明性を有する複数個の光学素子からなり、少なくとも1個の光学素子は、前記動作波長において屈折率n≧1.6を有する高屈折率材料により製作される高屈折率光学素子であり、
前記像面に最も近い最後の光学素子を有し、 収差に関して、最後の光学素子と像平面との間における像側作動距離が、1を超える屈折率を有する浸漬媒質によって満たされるように適合せしめられる浸漬対物レンズとして設計され、
前記最後の光学素子は、分割界面に沿って互いに光学的に接触する少なくとも2個の光学素子によって構成され、分割面は、湾曲せしめられ、
前記最後の光学素子を形成する前記光学素子の少なくとも1個は、屈折率n>1.6を有する高屈折率材料によって構成される投影対物レンズ。 - 前記高屈折率材料は、前記動作波長において屈折率n≧1.8を有する請求項1に記載の投影対物レンズ。
- 前記高屈折率材料は、サファイアである請求項1または2に記載の投影対物レンズ。
- 前記高屈折率材料は、二酸化ゲルマニウムである請求項1または2に記載の投影対物レンズ。
- 第1の高屈折率光学素子と、第1の高屈折率光学素子と同一の材料の少なくとも1個の第2の高屈折率光学素子とを有し、前記第1の高屈折率光学素子と前記第2の高屈折率光学素子との各々は、各光学素子の複屈折の配向を定義する複屈折を示す高屈折率材料により製作され、前記第1および第2の高屈折率光学素子は、前記複屈折の前記配向に関して相違して配設されて、前記高屈折率光学素子によりもたらされる複屈折の効果が少なくとも部分的に補償される前記請求項1〜4の1項に記載の投影対物レンズ。
- 前記最後の光学素子は、平凸レンズとして整形され、分割面は、該分割面において接触する両光学素子が同様の屈折力を有するレンズ部分となるように湾曲せしめられる請求項1に記載の投影対物レンズ。
- 前記動作波長において1.4を超える屈折率を有する浸漬液に適合せしめられる請求項1に記載の投影対物レンズ。
- 193nmの動作波長用に設計され、前記浸漬液は、シクロヘキサンである請求項7に記載の投影対物レンズ。
- 像側開口数NAが1.3を超える先行する請求項1〜8の1項に記載の投影対物レンズ。
- 前記像平面に最も近い位置に配置される瞳面は、前記像平面に最も近い極大ビーム直径の領域と前記像平面との間において収束ビームの領域内に配置される先行する請求項1〜9の1項に記載の投影対物レンズ。
- 投影対物レンズの物体平面内に配置されるマスク上に設けられたパターンを前記投影対物レンズの像平面内に配置される基板上に結像させるマイクロリソグラフィー投影露光方法であって、先行する請求項1〜10のいずれかの1項に記載のマイクロリソグラフィー投影対物レンズが用いられ、浸漬液が、前記マイクロリソグラフィー投影対物レンズの最後のレンズと露光対象の前記基板との間において導入される方法。
- 前記投影対物レンズの動作波長において1.4を超える屈折率を有する浸漬液が用いられる請求項11に記載の方法。
- 前記浸漬液は、前記動作波長において1.5を超える屈折率を有する請求項12に記載の方法。
Applications Claiming Priority (25)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/734,623 US6995930B2 (en) | 1999-12-29 | 2003-12-15 | Catadioptric projection objective with geometric beam splitting |
US10/734,623 | 2003-12-15 | ||
US53062303P | 2003-12-19 | 2003-12-19 | |
US60/530,623 | 2003-12-19 | ||
US53097803P | 2003-12-22 | 2003-12-22 | |
US60/530,978 | 2003-12-22 | ||
US53624804P | 2004-01-14 | 2004-01-14 | |
US60/536,248 | 2004-01-14 | ||
US54496704P | 2004-02-13 | 2004-02-13 | |
US60/544,967 | 2004-02-13 | ||
US56800604P | 2004-05-04 | 2004-05-04 | |
US60/568,006 | 2004-05-04 | ||
US58750404P | 2004-07-14 | 2004-07-14 | |
US60/587,504 | 2004-07-14 | ||
US59177504P | 2004-07-27 | 2004-07-27 | |
US60/591,775 | 2004-07-27 | ||
US59220804P | 2004-07-29 | 2004-07-29 | |
US60/592,208 | 2004-07-29 | ||
US61282304P | 2004-09-24 | 2004-09-24 | |
US60/612,823 | 2004-09-24 | ||
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US60/617,674 | 2004-10-13 | ||
DE102004051730.4 | 2004-10-22 | ||
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PCT/EP2004/014062 WO2005059617A2 (en) | 2003-12-15 | 2004-12-10 | Projection objective having a high aperture and a planar end surface |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007514192A JP2007514192A (ja) | 2007-05-31 |
JP5106858B2 true JP5106858B2 (ja) | 2012-12-26 |
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Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006543484A Expired - Fee Related JP5106858B2 (ja) | 2003-12-15 | 2004-12-10 | 高開口数と平面状端面とを有する投影対物レンズ |
Country Status (4)
Country | Link |
---|---|
EP (1) | EP1697798A2 (ja) |
JP (1) | JP5106858B2 (ja) |
KR (1) | KR101200654B1 (ja) |
WO (1) | WO2005059617A2 (ja) |
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