SG87893A1 - Anodizing method and apparatus for performing the same - Google Patents

Anodizing method and apparatus for performing the same

Info

Publication number
SG87893A1
SG87893A1 SG200002682A SG200002682A SG87893A1 SG 87893 A1 SG87893 A1 SG 87893A1 SG 200002682 A SG200002682 A SG 200002682A SG 200002682 A SG200002682 A SG 200002682A SG 87893 A1 SG87893 A1 SG 87893A1
Authority
SG
Singapore
Prior art keywords
same
anodizing method
anodizing
Prior art date
Application number
SG200002682A
Other languages
English (en)
Inventor
Omasa Ryushin
Original Assignee
Japan Techno Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP11096832A priority Critical patent/JP3046594B1/ja
Priority to CA002302916A priority patent/CA2302916C/en
Priority to US09/536,844 priority patent/US6322689B1/en
Priority to EP00106614A priority patent/EP1041178B1/en
Priority to CNB001055062A priority patent/CN1163639C/zh
Application filed by Japan Techno Co Ltd filed Critical Japan Techno Co Ltd
Priority to SG200002682A priority patent/SG87893A1/en
Publication of SG87893A1 publication Critical patent/SG87893A1/en

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01FMIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
    • B01F31/00Mixers with shaking, oscillating, or vibrating mechanisms
    • B01F31/44Mixers with shaking, oscillating, or vibrating mechanisms with stirrers performing an oscillatory, vibratory or shaking movement
    • B01F31/441Mixers with shaking, oscillating, or vibrating mechanisms with stirrers performing an oscillatory, vibratory or shaking movement performing a rectilinear reciprocating movement
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/005Apparatus specially adapted for electrolytic conversion coating
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/008Current shielding devices
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D21/00Processes for servicing or operating cells for electrolytic coating
    • C25D21/10Agitating of electrolytes; Moving of racks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemical Treatment Of Metals (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
SG200002682A 1999-04-02 2000-05-16 Anodizing method and apparatus for performing the same SG87893A1 (en)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP11096832A JP3046594B1 (ja) 1999-04-02 1999-04-02 振動流動攪拌を活用した金属の陽極酸化処理システム
CA002302916A CA2302916C (en) 1999-04-02 2000-03-23 Anodizing method and apparatus for performing the same
US09/536,844 US6322689B1 (en) 1999-04-02 2000-03-28 Anodizing method and apparatus for performing the same
EP00106614A EP1041178B1 (en) 1999-04-02 2000-03-28 Anodizing method and apparatus for performing the same
CNB001055062A CN1163639C (zh) 1999-04-02 2000-03-29 阳极氧化方法和该方法的操作装置
SG200002682A SG87893A1 (en) 1999-04-02 2000-05-16 Anodizing method and apparatus for performing the same

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP11096832A JP3046594B1 (ja) 1999-04-02 1999-04-02 振動流動攪拌を活用した金属の陽極酸化処理システム
SG200002682A SG87893A1 (en) 1999-04-02 2000-05-16 Anodizing method and apparatus for performing the same

Publications (1)

Publication Number Publication Date
SG87893A1 true SG87893A1 (en) 2002-04-16

Family

ID=26437994

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200002682A SG87893A1 (en) 1999-04-02 2000-05-16 Anodizing method and apparatus for performing the same

Country Status (6)

Country Link
US (1) US6322689B1 (ja)
EP (1) EP1041178B1 (ja)
JP (1) JP3046594B1 (ja)
CN (1) CN1163639C (ja)
CA (1) CA2302916C (ja)
SG (1) SG87893A1 (ja)

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JP3921074B2 (ja) * 2001-11-05 2007-05-30 株式会社日立製作所 陽極酸化処理方法および装置
JP4599387B2 (ja) * 2001-12-03 2010-12-15 日本テクノ株式会社 水素−酸素ガス発生装置及びそれを用いた水素−酸素ガス発生方法
US6875333B2 (en) * 2002-02-14 2005-04-05 Electroplating Engineers Of Japan Limited Plating apparatus for wafer
GB2386907B (en) 2002-03-27 2005-10-26 Isle Coat Ltd Process and device for forming ceramic coatings on metals and alloys, and coatings produced by this process
US6866945B2 (en) * 2003-01-06 2005-03-15 General Motors Corporation Magnesium containing aluminum alloys and anodizing process
JP4868020B2 (ja) 2008-12-26 2012-02-01 株式会社デンソー アルミニウムの陽極酸化方法、および陽極酸化アルミニウム
JP5696351B2 (ja) * 2009-04-15 2015-04-08 トヨタ自動車株式会社 エンジン燃焼室構造
US10392718B2 (en) * 2009-09-04 2019-08-27 Apple Inc. Anodization and polish surface treatment
IT1398287B1 (it) * 2009-09-18 2013-02-22 Unical A G S P A Metodo di anodizzazione di leghe metalliche, particolarmente per scambiatori di calore in leghe di alluminio e simili per caldaie a condensazione.
TWI412459B (zh) * 2009-12-08 2013-10-21 Univ Nat Taiwan The method of forming a roller for embossing
CN103608493B (zh) * 2011-06-24 2016-06-08 苹果公司 减少阳极化部件的外表缺陷
TWI449812B (zh) * 2011-08-10 2014-08-21 Chenming Mold Ind Corp 漸層陽極表面處理方法
CN103320833A (zh) * 2012-03-22 2013-09-25 富泰华工业(深圳)有限公司 金属工件的阳极氧化染色方法
US20130248374A1 (en) * 2012-03-23 2013-09-26 Apple Inc. Chemical polishing of aluminum
CN104117572A (zh) * 2013-04-23 2014-10-29 汉达精密电子(昆山)有限公司 金属图案的制作方法及其产品
AT514447B1 (de) * 2013-06-28 2015-10-15 Pramer Gerhard Dipl Ing Fh Verfahren zur elektrochemischen Herstellung spektral selektiver Absorberschichten auf einem Aluminiumsubstrat
CN103469277B (zh) * 2013-08-15 2016-06-22 嘉兴兴禾汽车零部件有限公司 一种汽车用铝或铝合金部件的阳极氧化封孔方法
CN105382674A (zh) * 2013-11-27 2016-03-09 天广消防股份有限公司 一种铝制品工件的表面处理工艺
CN104630792B (zh) * 2015-02-13 2017-11-14 广东欧珀移动通信有限公司 具有金属光泽的壳体外观件加工工艺
JP2017147292A (ja) 2016-02-16 2017-08-24 レノボ・シンガポール・プライベート・リミテッド 筐体用部材の製造方法
EP3421645A1 (en) * 2017-06-28 2019-01-02 Pratt & Whitney Rzeszow S.A. Method of forming corrosion resistant coating and related apparatus
CN107488872B (zh) * 2017-08-28 2023-02-03 南方科技大学 一种电化学抛光方法与电化学抛光装置
CN108546973B (zh) * 2018-05-11 2019-05-31 江苏礼德铝业有限公司 一种铝镁合金桥架的制造方法
CN108315794B (zh) * 2018-05-11 2019-06-07 江苏华美特金属科技有限公司 一种铝镁合金阳极氧化表面处理设备
CN110385241A (zh) * 2019-07-23 2019-10-29 东华大学 一种铝合金表面双层共聚型聚酰亚胺复合涂层及其制备
TWI765806B (zh) * 2021-08-13 2022-05-21 顏振益 扇出型面板級封裝電鍍之電鍍設備構造
CN113957503A (zh) * 2021-11-08 2022-01-21 陕西飞机工业有限责任公司 一种用于阳极化导电板的降温装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3983014A (en) * 1974-12-16 1976-09-28 The Scionics Corporation Anodizing means and techniques
DE3842600A1 (de) * 1988-12-17 1990-06-28 Linde Ag Verfahren zur anodischen oxidation und anschliessenden einfaerbung
US5785838A (en) * 1993-02-26 1998-07-28 Nikon Corporation By Hiroyuki Sugimura Method for producing an oxide film

Family Cites Families (15)

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DE2064354C3 (de) 1970-12-30 1979-09-27 Hoechst Ag, 6000 Frankfurt Verfahren und Vorrichtung zum kontinuierlichen Vorbehandeln eines insbesondere zur Herstellung von lithographischen Flachdruckplatten dienenden Metallfolienbandes
JPS5159729A (en) * 1974-03-13 1976-05-25 Mitsubishi Electric Corp Denkimetsukiho oyobi sochi
JPS609600B2 (ja) * 1977-12-19 1985-03-11 日本碍子株式会社 陽極酸化処理法
DE3321285C2 (de) 1983-06-13 1985-06-20 Anton 8240 Berchtesgaden Stigler Verfahren zum Herstellen eines Profils aus trockenem Pulvermaterial sowie Vorrichtung hierzu
JPH0671544B2 (ja) 1990-03-26 1994-09-14 日本テクノ株式会社 液槽における液体の攪拌方法および装置
JPH05211384A (ja) * 1991-11-20 1993-08-20 Nec Corp 印刷配線板のめっき方法
JP2762388B2 (ja) 1992-09-14 1998-06-04 日本テクノ株式会社 流体の混合分散機
DE4238242C2 (de) 1992-09-17 2003-04-24 Rieger Franz Metallveredelung Verfahren zur Vorbehandlung von Leichtmetallen nach Patent DE 4231052 C2
JP2707530B2 (ja) 1992-12-28 1998-01-28 日本テクノ株式会社 めっき方法
JP3142417B2 (ja) 1993-04-20 2001-03-07 日本テクノ株式会社 撹拌装置
JP2992177B2 (ja) 1993-05-17 1999-12-20 日本テクノ株式会社 クロムのバレルめっき装置
BR9400839A (pt) * 1994-03-08 1995-10-24 Copax Ind Ltda Processo de anodização dura de alumínio ligas de alumínio e de ligas de alumínio com alto silício
JP2852878B2 (ja) 1994-12-26 1999-02-03 日本テクノ株式会社 撹拌装置
JP2911393B2 (ja) 1995-07-25 1999-06-23 日本テクノ株式会社 無電解ニッケルめっき廃液から肥料水溶液を製造する方法と装置
US6261435B1 (en) * 1997-10-21 2001-07-17 Nihon Techno Kabushiki Kaisha Plating method

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3983014A (en) * 1974-12-16 1976-09-28 The Scionics Corporation Anodizing means and techniques
DE3842600A1 (de) * 1988-12-17 1990-06-28 Linde Ag Verfahren zur anodischen oxidation und anschliessenden einfaerbung
US5785838A (en) * 1993-02-26 1998-07-28 Nikon Corporation By Hiroyuki Sugimura Method for producing an oxide film

Also Published As

Publication number Publication date
CA2302916A1 (en) 2000-10-02
JP2000282293A (ja) 2000-10-10
JP3046594B1 (ja) 2000-05-29
CA2302916C (en) 2005-11-22
EP1041178B1 (en) 2004-05-12
CN1269432A (zh) 2000-10-11
CN1163639C (zh) 2004-08-25
EP1041178A2 (en) 2000-10-04
EP1041178A3 (en) 2000-10-11
US6322689B1 (en) 2001-11-27

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