KR101969192B1 - 지문 부착 방지제 및 그 제조 방법, 하드 코트용 조성물, 하드 코트층을 갖는 기재 그리고 터치 패널 - Google Patents

지문 부착 방지제 및 그 제조 방법, 하드 코트용 조성물, 하드 코트층을 갖는 기재 그리고 터치 패널 Download PDF

Info

Publication number
KR101969192B1
KR101969192B1 KR1020147019644A KR20147019644A KR101969192B1 KR 101969192 B1 KR101969192 B1 KR 101969192B1 KR 1020147019644 A KR1020147019644 A KR 1020147019644A KR 20147019644 A KR20147019644 A KR 20147019644A KR 101969192 B1 KR101969192 B1 KR 101969192B1
Authority
KR
South Korea
Prior art keywords
silane compound
hard coat
hydrolyzable silane
group
mass
Prior art date
Application number
KR1020147019644A
Other languages
English (en)
Korean (ko)
Other versions
KR20140119025A (ko
Inventor
고타로 야마다
히데유키 다카하시
유타카 후루카와
Original Assignee
에이지씨 가부시키가이샤
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 에이지씨 가부시키가이샤 filed Critical 에이지씨 가부시키가이샤
Publication of KR20140119025A publication Critical patent/KR20140119025A/ko
Application granted granted Critical
Publication of KR101969192B1 publication Critical patent/KR101969192B1/ko

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04Polysiloxanes
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00Layered products comprising a layer of synthetic resin
    • B32B27/06Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F230/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F230/04Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F230/08Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
    • C08F230/085Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F299/00Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
    • C08F299/02Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
    • C08F299/08Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polysiloxanes
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/20Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04Polysiloxanes
    • C08G77/22Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
    • C08G77/24Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/0427Coating with only one layer of a composition containing a polymer binder
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/04Coating
    • C08J7/046Forming abrasion-resistant coatings; Forming surface-hardening coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14Protective coatings, e.g. hard coatings
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/18Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Paints Or Removers (AREA)
  • Silicon Polymers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
KR1020147019644A 2012-01-31 2013-01-29 지문 부착 방지제 및 그 제조 방법, 하드 코트용 조성물, 하드 코트층을 갖는 기재 그리고 터치 패널 KR101969192B1 (ko)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JPJP-P-2012-017605 2012-01-31
JP2012017605 2012-01-31
JP2012245498 2012-11-07
JPJP-P-2012-245498 2012-11-07
PCT/JP2013/051923 WO2013115191A1 (ja) 2012-01-31 2013-01-29 指紋付着防止剤およびその製造方法、ハードコート用組成物、ハードコート層を有する基材ならびにタッチパネル

Publications (2)

Publication Number Publication Date
KR20140119025A KR20140119025A (ko) 2014-10-08
KR101969192B1 true KR101969192B1 (ko) 2019-04-15

Family

ID=48905226

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020147019644A KR101969192B1 (ko) 2012-01-31 2013-01-29 지문 부착 방지제 및 그 제조 방법, 하드 코트용 조성물, 하드 코트층을 갖는 기재 그리고 터치 패널

Country Status (5)

Country Link
JP (1) JP6206188B2 (zh)
KR (1) KR101969192B1 (zh)
CN (1) CN104080877B (zh)
TW (1) TWI598418B (zh)
WO (1) WO2013115191A1 (zh)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160135254A (ko) 2014-03-18 2016-11-25 쓰리엠 이노베이티브 프로퍼티즈 컴파니 처리된 물품 및 그의 제조 방법
US10858540B2 (en) 2015-09-23 2020-12-08 3M Innovative Properties Company Composition including silanes and methods of making a treated article
JP6741074B2 (ja) * 2016-10-31 2020-08-19 Agc株式会社 含フッ素エーテル組成物、コーティング液および物品
CN106927690B (zh) * 2017-02-21 2019-06-07 陕西科技大学 一种使触摸屏玻璃表面防污防指纹的方法
KR20200070810A (ko) 2018-12-10 2020-06-18 삼성전자주식회사 조성물, 이의 경화물을 포함하는 필름, 상기 필름을 포함하는 적층체 및 디스플레이 소자
CN116529308A (zh) * 2020-12-16 2023-08-01 住友电气工业株式会社 树脂组合物、光纤的次级被覆材料、光纤以及光纤的制造方法
CN112940236A (zh) * 2021-02-01 2021-06-11 浙江巨化技术中心有限公司 一种高耐磨抗指纹剂的制备方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000275403A (ja) * 1999-03-19 2000-10-06 Fuji Photo Film Co Ltd 反射防止膜およびそれを配置した表示装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62119141A (ja) * 1985-11-19 1987-05-30 Shin Etsu Chem Co Ltd 放射線硬化性光フアイバ−用被覆剤
JP3222386B2 (ja) * 1996-07-12 2001-10-29 信越化学工業株式会社 コーティング剤組成物及びそのコーティング組成物で処理してなる物品
JP3284947B2 (ja) * 1997-10-17 2002-05-27 信越化学工業株式会社 表面処理剤
JP3876961B2 (ja) * 2000-06-29 2007-02-07 信越化学工業株式会社 表面処理剤及び撥水・撥油性物品
KR20040044062A (ko) 2002-11-20 2004-05-27 김낙주 저농도산과, 초음파를 이용한 다공성 굴패각 분말 제조방법
TW200634084A (en) * 2004-12-28 2006-10-01 Jsr Corp Antireflective film
WO2006109528A1 (ja) * 2005-03-31 2006-10-19 Jsr Corporation 液状硬化性組成物、硬化膜及び帯電防止用積層体
JP4671338B2 (ja) * 2005-06-27 2011-04-13 日本化薬株式会社 フッ素含有ポリシロキサン、それを用いる感光性樹脂組成物及びその硬化物
JP4711080B2 (ja) 2006-07-25 2011-06-29 信越化学工業株式会社 被膜形成用組成物用フロロオルガノポリシロキサン樹脂の製造方法
JPWO2008032722A1 (ja) * 2006-09-14 2010-01-28 東レ株式会社 コーティング材料及びそれを用いた光学物品並びに光学物品の製造方法
JP5067525B2 (ja) * 2006-09-15 2012-11-07 信越化学工業株式会社 光硬化性コーティング組成物及びこの組成物の硬化被膜が形成された物品
JP4400751B2 (ja) * 2006-10-24 2010-01-20 信越化学工業株式会社 光及び熱硬化性コーティング剤組成物及びその硬化皮膜を有する物品
JP2008248239A (ja) * 2007-03-08 2008-10-16 Toray Ind Inc シロキサン樹脂組成物、それを用いた硬化膜および光学デバイス
WO2010013816A1 (ja) * 2008-08-01 2010-02-04 旭硝子株式会社 ネガ型感光性組成物、それを用いた光学素子用隔壁および該隔壁を有する光学素子
JP4709272B2 (ja) * 2008-12-11 2011-06-22 信越化学工業株式会社 含フッ素アクリレート
JP2011187558A (ja) * 2010-03-05 2011-09-22 Adeka Corp 有機薄膜トランジスタ
WO2013058386A1 (ja) * 2011-10-21 2013-04-25 旭硝子株式会社 撥インク剤の製造方法、ネガ型感光性樹脂組成物、隔壁および光学素子

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000275403A (ja) * 1999-03-19 2000-10-06 Fuji Photo Film Co Ltd 反射防止膜およびそれを配置した表示装置

Also Published As

Publication number Publication date
CN104080877B (zh) 2016-08-17
JP6206188B2 (ja) 2017-10-04
JPWO2013115191A1 (ja) 2015-05-11
CN104080877A (zh) 2014-10-01
WO2013115191A1 (ja) 2013-08-08
TW201341483A (zh) 2013-10-16
KR20140119025A (ko) 2014-10-08
TWI598418B (zh) 2017-09-11

Similar Documents

Publication Publication Date Title
KR101969192B1 (ko) 지문 부착 방지제 및 그 제조 방법, 하드 코트용 조성물, 하드 코트층을 갖는 기재 그리고 터치 패널
JP5752947B2 (ja) ハードコート用樹脂組成物の製造方法、及びハードコート用樹脂組成物
JP4517590B2 (ja) 耐汚染性付与剤及びそれを用いた耐汚染性物品
EP1389634B1 (en) Surface-treating agent comprising inorganic/organic composite material
KR101828809B1 (ko) 불소-함유 고분지 중합체를 포함하는 코팅용 경화성 조성물
KR102385524B1 (ko) 함불소 아크릴 조성물 및 그 제조 방법, 함불소 활성 에너지선 경화성 조성물 및 물품
TWI402297B (zh) A siloxane compound containing a photo-reactive group, a method for producing the same, and a photohardenable resin composition, an article having the hardened film
KR20180045814A (ko) 함불소 아크릴 화합물 및 그 제조 방법, 경화성 조성물, 및 물품
EP1878772B1 (en) Photocurable resin composition and article having a coating formed by curing such composition
JP5584989B2 (ja) 表面修飾シリカ粒子及びそれを用いた活性エネルギー線硬化型樹脂組成物
JP2013249395A (ja) 硬化性組成物及びその硬化成形品、その硬化皮膜が形成されてなる物品並びに該硬化性組成物の硬化方法
JPWO2005092991A1 (ja) 活性エネルギ線硬化性被覆用組成物及び成形品
JP2015187205A (ja) 硬化性樹脂組成物、並びにこれを用いて得られる硬化物及び積層体
KR20100033361A (ko) 불소계 화합물 및 이를 포함하는 코팅 조성물
JP5015549B2 (ja) 樹脂組成物の製造方法
WO2010073445A1 (ja) 活性エネルギー線硬化型組成物、活性エネルギー線硬化型コーティング材及び成形品
KR20070117610A (ko) 액상 경화성 조성물, 경화막 및 대전 방지용 적층체
CN110591490A (zh) 防指纹涂料组合物
JP5124892B2 (ja) コーティング用低屈折率組成物およびその組成物からなる光学多層膜
JP2008038086A (ja) 活性エネルギー線硬化性組成物及び積層体
JP2022019575A (ja) 含フッ素アクリル組成物、含フッ素活性エネルギー線硬化性組成物並びに物品
JP2005255718A (ja) 活性エネルギー線硬化性コーティング用組成物および保護被膜形成方法
JP5466461B2 (ja) 積層体
JP2018053068A (ja) ハードコート用樹脂組成物の製造方法、ハードコート用樹脂組成物、及びハードコート付基材の製造方法
CN111574663B (zh) 固化性组合物、固化物及层叠体

Legal Events

Date Code Title Description
A201 Request for examination
E701 Decision to grant or registration of patent right
GRNT Written decision to grant