KR101969192B1 - 지문 부착 방지제 및 그 제조 방법, 하드 코트용 조성물, 하드 코트층을 갖는 기재 그리고 터치 패널 - Google Patents
지문 부착 방지제 및 그 제조 방법, 하드 코트용 조성물, 하드 코트층을 갖는 기재 그리고 터치 패널 Download PDFInfo
- Publication number
- KR101969192B1 KR101969192B1 KR1020147019644A KR20147019644A KR101969192B1 KR 101969192 B1 KR101969192 B1 KR 101969192B1 KR 1020147019644 A KR1020147019644 A KR 1020147019644A KR 20147019644 A KR20147019644 A KR 20147019644A KR 101969192 B1 KR101969192 B1 KR 101969192B1
- Authority
- KR
- South Korea
- Prior art keywords
- silane compound
- hard coat
- hydrolyzable silane
- group
- mass
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F230/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
- C08F230/04—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
- C08F230/08—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon
- C08F230/085—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon the monomer being a polymerisable silane, e.g. (meth)acryloyloxy trialkoxy silanes or vinyl trialkoxysilanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F299/00—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers
- C08F299/02—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates
- C08F299/08—Macromolecular compounds obtained by interreacting polymers involving only carbon-to-carbon unsaturated bond reactions, in the absence of non-macromolecular monomers from unsaturated polycondensates from polysiloxanes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/22—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen
- C08G77/24—Polysiloxanes containing silicon bound to organic groups containing atoms other than carbon, hydrogen and oxygen halogen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/18—Coatings for keeping optical surfaces clean, e.g. hydrophobic or photo-catalytic films
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Wood Science & Technology (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Paints Or Removers (AREA)
- Silicon Polymers (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Macromonomer-Based Addition Polymer (AREA)
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2012-017605 | 2012-01-31 | ||
JP2012017605 | 2012-01-31 | ||
JP2012245498 | 2012-11-07 | ||
JPJP-P-2012-245498 | 2012-11-07 | ||
PCT/JP2013/051923 WO2013115191A1 (ja) | 2012-01-31 | 2013-01-29 | 指紋付着防止剤およびその製造方法、ハードコート用組成物、ハードコート層を有する基材ならびにタッチパネル |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20140119025A KR20140119025A (ko) | 2014-10-08 |
KR101969192B1 true KR101969192B1 (ko) | 2019-04-15 |
Family
ID=48905226
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020147019644A KR101969192B1 (ko) | 2012-01-31 | 2013-01-29 | 지문 부착 방지제 및 그 제조 방법, 하드 코트용 조성물, 하드 코트층을 갖는 기재 그리고 터치 패널 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP6206188B2 (zh) |
KR (1) | KR101969192B1 (zh) |
CN (1) | CN104080877B (zh) |
TW (1) | TWI598418B (zh) |
WO (1) | WO2013115191A1 (zh) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160135254A (ko) | 2014-03-18 | 2016-11-25 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 처리된 물품 및 그의 제조 방법 |
US10858540B2 (en) | 2015-09-23 | 2020-12-08 | 3M Innovative Properties Company | Composition including silanes and methods of making a treated article |
JP6741074B2 (ja) * | 2016-10-31 | 2020-08-19 | Agc株式会社 | 含フッ素エーテル組成物、コーティング液および物品 |
CN106927690B (zh) * | 2017-02-21 | 2019-06-07 | 陕西科技大学 | 一种使触摸屏玻璃表面防污防指纹的方法 |
KR20200070810A (ko) | 2018-12-10 | 2020-06-18 | 삼성전자주식회사 | 조성물, 이의 경화물을 포함하는 필름, 상기 필름을 포함하는 적층체 및 디스플레이 소자 |
CN116529308A (zh) * | 2020-12-16 | 2023-08-01 | 住友电气工业株式会社 | 树脂组合物、光纤的次级被覆材料、光纤以及光纤的制造方法 |
CN112940236A (zh) * | 2021-02-01 | 2021-06-11 | 浙江巨化技术中心有限公司 | 一种高耐磨抗指纹剂的制备方法 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000275403A (ja) * | 1999-03-19 | 2000-10-06 | Fuji Photo Film Co Ltd | 反射防止膜およびそれを配置した表示装置 |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
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JPS62119141A (ja) * | 1985-11-19 | 1987-05-30 | Shin Etsu Chem Co Ltd | 放射線硬化性光フアイバ−用被覆剤 |
JP3222386B2 (ja) * | 1996-07-12 | 2001-10-29 | 信越化学工業株式会社 | コーティング剤組成物及びそのコーティング組成物で処理してなる物品 |
JP3284947B2 (ja) * | 1997-10-17 | 2002-05-27 | 信越化学工業株式会社 | 表面処理剤 |
JP3876961B2 (ja) * | 2000-06-29 | 2007-02-07 | 信越化学工業株式会社 | 表面処理剤及び撥水・撥油性物品 |
KR20040044062A (ko) | 2002-11-20 | 2004-05-27 | 김낙주 | 저농도산과, 초음파를 이용한 다공성 굴패각 분말 제조방법 |
TW200634084A (en) * | 2004-12-28 | 2006-10-01 | Jsr Corp | Antireflective film |
WO2006109528A1 (ja) * | 2005-03-31 | 2006-10-19 | Jsr Corporation | 液状硬化性組成物、硬化膜及び帯電防止用積層体 |
JP4671338B2 (ja) * | 2005-06-27 | 2011-04-13 | 日本化薬株式会社 | フッ素含有ポリシロキサン、それを用いる感光性樹脂組成物及びその硬化物 |
JP4711080B2 (ja) | 2006-07-25 | 2011-06-29 | 信越化学工業株式会社 | 被膜形成用組成物用フロロオルガノポリシロキサン樹脂の製造方法 |
JPWO2008032722A1 (ja) * | 2006-09-14 | 2010-01-28 | 東レ株式会社 | コーティング材料及びそれを用いた光学物品並びに光学物品の製造方法 |
JP5067525B2 (ja) * | 2006-09-15 | 2012-11-07 | 信越化学工業株式会社 | 光硬化性コーティング組成物及びこの組成物の硬化被膜が形成された物品 |
JP4400751B2 (ja) * | 2006-10-24 | 2010-01-20 | 信越化学工業株式会社 | 光及び熱硬化性コーティング剤組成物及びその硬化皮膜を有する物品 |
JP2008248239A (ja) * | 2007-03-08 | 2008-10-16 | Toray Ind Inc | シロキサン樹脂組成物、それを用いた硬化膜および光学デバイス |
WO2010013816A1 (ja) * | 2008-08-01 | 2010-02-04 | 旭硝子株式会社 | ネガ型感光性組成物、それを用いた光学素子用隔壁および該隔壁を有する光学素子 |
JP4709272B2 (ja) * | 2008-12-11 | 2011-06-22 | 信越化学工業株式会社 | 含フッ素アクリレート |
JP2011187558A (ja) * | 2010-03-05 | 2011-09-22 | Adeka Corp | 有機薄膜トランジスタ |
WO2013058386A1 (ja) * | 2011-10-21 | 2013-04-25 | 旭硝子株式会社 | 撥インク剤の製造方法、ネガ型感光性樹脂組成物、隔壁および光学素子 |
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2013
- 2013-01-29 CN CN201380007252.0A patent/CN104080877B/zh not_active Expired - Fee Related
- 2013-01-29 KR KR1020147019644A patent/KR101969192B1/ko active IP Right Grant
- 2013-01-29 WO PCT/JP2013/051923 patent/WO2013115191A1/ja active Application Filing
- 2013-01-29 JP JP2013556418A patent/JP6206188B2/ja not_active Expired - Fee Related
- 2013-01-30 TW TW102103512A patent/TWI598418B/zh active
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000275403A (ja) * | 1999-03-19 | 2000-10-06 | Fuji Photo Film Co Ltd | 反射防止膜およびそれを配置した表示装置 |
Also Published As
Publication number | Publication date |
---|---|
CN104080877B (zh) | 2016-08-17 |
JP6206188B2 (ja) | 2017-10-04 |
JPWO2013115191A1 (ja) | 2015-05-11 |
CN104080877A (zh) | 2014-10-01 |
WO2013115191A1 (ja) | 2013-08-08 |
TW201341483A (zh) | 2013-10-16 |
KR20140119025A (ko) | 2014-10-08 |
TWI598418B (zh) | 2017-09-11 |
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