JP2009033190A - ステッチング誤差防止用改良型パターン・ジェネレータ - Google Patents
ステッチング誤差防止用改良型パターン・ジェネレータ Download PDFInfo
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/03—Observing, e.g. monitoring, the workpiece
- B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
- B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
- B23K26/064—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms
- B23K26/0648—Shaping the laser beam, e.g. by masks or multi-focusing by means of optical elements, e.g. lenses, mirrors or prisms comprising lenses
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/465—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using masks, e.g. light-switching masks
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
- G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
- G02B27/0037—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements
- G02B27/0043—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration with diffracting elements in projection exposure systems, e.g. microlithographic systems
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/42—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect
- G02B27/4205—Diffraction optics, i.e. systems including a diffractive element being designed for providing a diffractive effect having a diffractive optical element [DOE] contributing to image formation, e.g. whereby modulation transfer function MTF or optical aberrations are relevant
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
- G03F7/70475—Stitching, i.e. connecting image fields to produce a device field, the field occupied by a device such as a memory chip, processor chip, CCD, flat panel display
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- G—PHYSICS
- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/34—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
- G09G3/3433—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices
- G09G3/346—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using light modulating elements actuated by an electric field and being other than liquid crystal devices and electrochromic devices based on modulation of the reflection angle, e.g. micromirrors
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N1/00—Scanning, transmission or reproduction of documents or the like, e.g. facsimile transmission; Details thereof
- H04N1/04—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa
- H04N1/19—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using multi-element arrays
- H04N1/195—Scanning arrangements, i.e. arrangements for the displacement of active reading or reproducing elements relative to the original or reproducing medium, or vice versa using multi-element arrays the array comprising a two-dimensional array or a combination of two-dimensional arrays
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- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N5/00—Details of television systems
- H04N5/74—Projection arrangements for image reproduction, e.g. using eidophor
- H04N5/7416—Projection arrangements for image reproduction, e.g. using eidophor involving the use of a spatial light modulator, e.g. a light valve, controlled by a video signal
- H04N5/7458—Projection arrangements for image reproduction, e.g. using eidophor involving the use of a spatial light modulator, e.g. a light valve, controlled by a video signal the modulator being an array of deformable mirrors, e.g. digital micromirror device [DMD]
-
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- G09—EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
- G09G—ARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
- G09G3/00—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
- G09G3/20—Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
- G09G3/2007—Display of intermediate tones
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- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N2201/00—Indexing scheme relating to scanning, transmission or reproduction of documents or the like, and to details thereof
- H04N2201/04—Scanning arrangements
- H04N2201/0402—Arrangements not specific to a particular one of the scanning methods covered by groups H04N1/04 - H04N1/207
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Abstract
【解決手段】加工品にパターンを形成する装置および方法。この装置は、超紫外線から赤外線までの波長範囲の光を放射する光源と、精密ステージに装架され、多数の変調素子を有し、放射された光によって照射されるように構成された空間光変調装置と、加工品に空間光変調装置の画像を形成する投射系と、書き込まれるべきパターンのデジタル表現を受け取り、パターンを変調信号に変換し、変調信号を空間光変調装置に供給する電子データ処理および伝送系と、加工品及び/又は投射系を相互に位置決めする高精度機械系と、加工品の位置、空間光変調装置への変調信号の供給、および放射の強度の調整の制御を行い、それによりパターンを加工品に印刷するようにさせる電子制御系と、印刷されるべきパターンの座標系を、位置付けステージ上の加工品の座標系に対して回転させる手段とを含む。
【選択図】図6
Description
本発明による装置は、
超紫外線(EUV)から赤外線(IR)までの波長範囲にあるエネルギー量を有する光パルスの源と、
前記放射パルスによって照射される複数の変調素子を有する空間光変調装置と、
加工品に該変調装置の放射パルス画像を作成する投射系と、
書き込まれたパターンのデジタル表現を受信し、連続する部分的パターンをデジタル・パターン表現から抽出し、前記部分的パターンを変調装置電圧に変換し、さらに、前記電圧を該変調装置に供給する電子データ伝送システムと、
前記投射系に対して前記加工品を移動する高精度機械システムと、
該加工品の動作と、該変調装置への電圧の供給と、放射パルスを調整し、大型のパターンを前記連続した放射パルスによって作成された複数の部分的画像からつぎ合わせて作成する電子制御システムとから成り、
つぎ合わされた少なくとも2つの隣接する画像が共通の境界でオーバラップし、該オーバラップ画像が、該オーバラップ領域において本質的に同じパターンとより低い輝度を有することを特徴としている。
超紫外線から赤外線までの波長範囲の光を放射する光源と、
精密ステージに装架された空間光変調装置であって、空間光変調装置は、多数の変調素子を有し、放射された光によって照射されるように構成された、空間光変調装置と、
加工品に空間光変調装置の画像を形成する投射系と、
書き込まれるべきパターンのデジタル表現を受け取り、パターンを変調信号に変換し、変調信号を空間光変調装置に供給する電子データ処理および伝送系と、
加工品及び/又は投射系を相互に位置決めする高精度機械系と、
加工品の位置、空間光変調装置への変調信号の供給、および放射の強度の調整の制御を行い、それによりパターンを加工品に印刷するようにさせる電子制御系と、
印刷されるべきパターンの座標系を、位置付けステージ上の加工品の座標系に対して回転させる手段と
を含む、加工品にパターンを形成する装置が提供される。
超紫外線から赤外線までの波長範囲の光を放射する段階と、
多数の変調素子を有する空間光変調装置によって、放射された光を変調する段階と、
加工品上に空間光変調装置の画像を投射する投射段階であって、書き込まれるべきパターンのデジタル表現に基づいて、放射、空間光変調装置、および投射される画像に対する加工品の位置を制御して、それによりパターンを加工品に印刷する投射段階とを含む方法であって、
印刷されるべきパターンの座標系を、加工品の座標系に対して回転させる段階を含む、加工品にパターンを形成する方法が提供される。
従来技術で使用されているようなクローバー型ミラーは、オン状態とオフ状態の間の中間状態にすることが可能である。しかし、積分複素振幅が偏向関数として作図された場合、完全に0になることは決してなく、0の周りに複数の円を描くことから、位相角が変化する非ゼロの最低反射率を有することが理解される。中間状態に設定された数個の画素を有する画像を綿密に分析すると、エッジ画素の積分位相角がゼロでない場合、最終的な画像のエッジ位置が、焦点に到るまで安定していないことが明らかである。本発明の好適な実施例では、旋回素子を有する新型の画素を使用している。各素子が旋回すると、片方の端部が光源方向に移動し、もう片方の端部が別の方向を向くことから、ゼロに近い平均的位相が維持される。さらに、このクローバー型設計には、製造中に残留内部応力が発生するという問題がある。この応力は、印加された電場を利用しなくても、部分的な変形を発生させる傾向がある。この内部変形は、製造中の不完全性によることから、すべての画素で全く同様に発生するとは限らない。クローバー型設計では、この画素ごとの相違によって、反射率の一次的偏差が生じる。旋回素子により形成された画素セルによっても同様の結果が得られるが、さらに、二次的な効果が発生する。したがって、投射において均一性が向上する。
旋回設計には第3の利点がある。クローバー型は、完全な吸光には至らないが、旋回型セルは、より簡単に、完全な吸光を実現する幾何学的形状寸法が得られ、あるいは、ゼロを通過して、非ゼロのわずかな反射に戻ることもあり、その場合は逆相になる。吸光が良好に行なわれることによって、重なり合った露光を印刷する自由度が大きくなり、低い負の値を設計することにより、吸光に近いさらに良好な線形性が実現する。暗い領域において約5%の弱い露光で逆相にした印刷では、15〜30%の高いエッジ鮮鋭度が得られ、一定のレンズを使用して、より小型のフィーチャーを印刷することができる。これは、半導体業界で利用されている、いわゆる、減衰移相マスク(attenuating phase−shifting mask)によく似ている。エッジ鮮鋭度を高める関連方法として、フィーチャー内部の画素に低い値を設定し、エッジ付近の画素に高い値を設定する方法がある。これにより、現在のマスクからのパターン投射や、ネルソンおよびクックによる投射機の使用では不可能な新型の画像高画質化が実現する。背景に非ゼロの負の振幅を使用しエッジに沿って露光を強くすることは、エッジ画素を中間値にして微細なアドレス・グリッドを生成することと矛盾しない。これは、それぞれの効果が付加的、あるいは、少なくとも計算可能なことによるものである。また、画素が印刷されるフィーチャーよりも実質的に小さい場合、すべての効果が同時に得られるような画素値の組み合わせがある。これらの画素を検出するためには、微細なアドレス・グリッドを作成するだけでなく、さらに、コンピュータi9.計算が必要になるが、本発明の一部の利用法においては、より小さいフィーチャーの印刷ができれば、多大な努力に見合うだけの高い値が得られる。
第1の好適な実施例は、2048×512マイクロミラーから成るSLMを使用したフォトマスクの深紫外線パターン・ジェネレータである。光源は、248ナノメートルのパルス出力と、約10nsのパルス長と、500Hzの反復度を有するKrFエキシマ・レーザである。SLMは、90%を上回る光を反射するアルミニウム面を有している。SLMは、ビーム・スクランブリング・イルミネータ(beam−scrambling illuminator)を通じてレーザにより照射され、反射光は、投射レンズ方向に向けられるとともに、さらに、感光面に向けられる。イルミネータからの入射ビームとレンズへの出射ビームは、半透明のビーム・スプリッタ・ミラー(beamsplitter mirror)によって分離される。好ましくは、このミラーは偏光選択型であり、イルミネータは偏光を使用し、その偏光方向は、SLMの正面にある1/4波長板によって切り換えられる。高い開口数(NA)でx軸およびy軸に対して対称性を有するためには、画像は、対称的に偏光されなければならず、ビーム・スプリッタと投射レンズの間にある第2の1/4波長板によって、円形に偏光された画像が生成される。レーザ・パルスのエネルギーによって可能な場合のさらに簡単な構成は、非偏光ビーム・スプリッタを使用することである。ビーム・スプリッタの第2の通過後も、1/4波長板は、なお利点を有しているが、それは、該プレートによって、ビーム・スプリット・コーティング(beam−splitting coating)の設計が影響を受けにくくなるためである。全体の最も簡単な構成は、SLMにおける斜めの入射を利用して、イルミネータからのビームと投射レンズに達するビームが、図1に示されるように、幾何学的に離れるようにしたものである。
第2の好適な実施例において、レーザは、193nmの波長と500Hzパルスの周波数を有するArFエキシマ・レーザである。SLMは、20*20μmの3072×1024画素を有しており、レンズは、0.06μmの投射画素が得られる333Xの縮小変倍率を有している。また、60個の中間値があり、アドレス・グリッドは、1ナノメートルである。ポイント・スプレッド関数は、0.13μmであり、最小ラインは0.2μmである。データ・フローは、1572メガバイト/秒であり、230mm長さの1列のデータは、11.8Gbである。
エキシマ・レーザには2つの不利な特性、つまり、フラッシュ対フラッシュの5%のエネルギー変化量と、フラッシュ対フラッシュの100nsの時間的変動がある。好適な実施例では、いずれも同じ方法によって補償されている。最初の露光は、90%の倍率での全体のパターンにより形成されている。各フラッシュについての実際のフラッシュのエネルギーと時間の状態が記録される。第2の露光は、公称10%の露光によって形成され、アナログ変調により、第1露光の実際の値しだいでは、第2の露光を5〜15%にする。同様に、第2の露光において意図的に時間を相殺することにより、第1の露光の時間的変動を補正できる。第2の露光は、第1の露光で生じた誤差を完全に補償できるが、それ自体が同じ種類の新たな誤差を発生する。露光全体の平均がわずか10%であることから、両者の誤差は、10だけ事実上減少する。実際に、レーザは、100nsよりもはるかに大きい時間的な不確定性を有している。この不確定性は、光のパルスが、トリガ・パルスからの遅延にしたがって発生し、この遅延が、時折、数マイクロ秒分、変化することによるものである。短時間の間に、遅延はより安定することから、継続的に遅延を測定し、適当にフィルタリングした最終遅延値を使用して、次のパルス遅延を予測するとともに、トリガ・パルスの位置付けを行なう。
エキシマ・レーザは、レーザの波長と種類に依存した500〜1000Hzの限定的なパルス繰返し周波数(prf)を有している。そのため、x軸およびy軸の両方において、エッジをステッチングした大型のフィールドを与える。他の2つの好適な実施例では、SLMがprfがはるかに高いパルス・レーザ、例えば、Qスイッチ・アップコンバート固体レーザや、SLMの表面上で走査された連続レーザ源から照射されることにより、SLMのある部分が新規データで書き換えられる一方で、別の部分が印刷される。どちらの場合も、レーザのコヒーレンス特性がエキシマ・レーザとは異なっており、例えば、異なる光路長を有する複数の平行な光路などの、より大規模なビーム・スクランブリングおよびコヒーレンス制御が必要である。本発明の一部の実施例では、フラッシュ・ランプからの光の出力が充分であり、光源として使用可能である。その利点として、低コストであり、コヒーレンス特性が優れていることである。
EUVの光源は、粒子加速装置、磁気プラズマ・ピンチ・マシンからの放射、または、高電力レーザ・パルスによる物質の小滴を極端な温度に加熱することによるものである。いずれの場合も、放射はパルス振動している。EUV放射は、真空のみで伝搬し、反射光学器械でしか焦点を合わせることができない。SLMを使用する代表的なパターン・ジェネレータは、光パワーのさほど高くない要件である、小さい露光フィールドを有している。したがって、光学系の設計は、EUVステッパに比べて緩やかであることから、より多くのミラーを使用でき、ステッパよりも高い開口数(NA)を実現できる。開口数(NA)が高いレンズは、リング形露光フィールドを有することが予想され、SLMの形状をそのようなフィールドに合わせることが充分に可能である。13nmの波長と0.25の開口数(NA)では、わずか25nm幅のラインを露光することが可能であり、さらに、下記の通り、画像の高画質化を利用すれば、20nmを下回ることも可能である。このような解像度と、同時に、SLMの同様の特徴によって可能な書込み速度を実現できる周知の書込み技術も他にはない。
各フラッシュごとに、2次元フィールドが印刷されるとともに、各フィールドのエッジとエッジをつぎ合わせることから、ステッチングは極めて重要である。わずか数ナノメートルの1フィールドを置き換えることにより、エッジに沿って目に見えるパターン誤差が発生し、マスクによって生成される電子回路の機能に悪影響を及ぼす可能性がある。このような不必要なステッチングの影響を減少させる効果的な方法として、数本の経路に同じパターンを印刷し、このような経路間にあるステッチング境界を置き換える方法があげられる。パターンが4回印刷された場合、ステッチング誤差が4箇所で発生することが予想されるが、その規模にして僅か四分の一にすぎない。本発明の好適な実施例では、フィールド間のオーバラップ・バンドとともに、中間露光を発生する機能が使用される。ラスタライス゛化している間、上記の値がコンピュータで計算されるが、圧縮データを解凍している間でもこの計算は実行できる。エッジ・オーバラップにより、ステッチング誤差が減少し、マルチパス印刷に比べてスループットの不利益がはるかに減少する。
第1の好適な実施例において、SLMの照射は、エキシマ・レーザや、フライアイ・レンズなどの光スクランブラーによって行なわれ、イルミネータのひとみ面の円形自発光面からの照射とよく似た照射が生成される。ある特定の投射系による印刷時に解像度を高める場合、修正照射法を利用することができる。最も簡単な例では、イルミネータのひとみ面に、例えば、四重極形または環状の透過領域を有するひとみフィルタを導入する方法がある。さらに複雑な例では、同じフィールドを数回印刷する。露光と露光の間で数個のパラメータ、例えば、画像面の焦点、照射パターン、SLMに印加されるデータ、投射レンズのひとみ面のひとみフィルタなどを変化させることが可能である。特に、照射の同期した変化やひとみフィルタによって、解像度を高めることができ、このことは、ひとみが扇形透過領域を有しているとともに、非回折光が該扇形の先端付近の吸収絞りをさえぎるように照射が一直線に並んでいる場合に、特に顕著である。
データからエッジ配置までの伝達関数の線形化を図るうえで、本明細書で行なう基本的に次の3つの方法がある。
−データ変換装置において非線形性を考慮し、データ変換装置に8ビット(例)の画素値を生成し、同じ解像度を有するDACを使用してSLMを駆動する。
−より少ない値(例えば、5ビット、すなわち、最高32個の値)でデジタル値を生成し、ルックアップ・テーブル(LUT)で8ビット値に変換した後に、この8ビット値をDACに供給する。
−5ビット値と半導体スイッチを使用して、1台または数台の高解像度DACにより生成されたDC電圧を選択する。
図6を参照すると、パターン・ジェネレータは、単数および複数の値を持つ画素アドレス指定方式によるSLM601と、光源602と、照射ビーム・スクランブル装置603と、結像光学系604と、干渉計位置制御系606を備えた微細位置付け基板ステージ605と、SLM用ハードウェアおよびソフトウェア・データ処理システム607とから構成されている。また、さらに、適正な機能を提供し操作を簡易化するために、前記パターン・ジェネレータは、温度制御を備えた周囲環境チャンバ、基板荷重システム、最適なパターン配置精度を実現するためのステージ移動および露光レーザ・トリガーのタイミングをとるためのソフトウェア、およびソフトウェア・ユーザ・インタフェースも具備している。
Claims (10)
- 位置付けステージ上の加工品にパターンを形成する装置において、該装置は、
超紫外線から赤外線までの波長範囲の光を放射する光源と、
精密ステージに装架された空間光変調装置であって、前記空間光変調装置は、多数の変調素子を有し、前記放射された光によって照射されるように構成された、空間光変調装置と、
前記加工品に前記空間光変調装置の画像を形成する投射系と、
書き込まれるべきパターンのデジタル表現を受け取り、前記パターンを変調信号に変換し、前記変調信号を前記空間光変調装置に供給する電子データ処理および伝送系と、
前記加工品及び/又は前記投射系を相互に位置決めする高精度機械系と、
前記加工品の位置、前記空間光変調装置への前記変調信号の供給、および前記放射の強度の調整の制御を行い、それにより前記パターンを前記加工品に印刷するようにさせる電子制御系と、
印刷されるべき前記パターンの座標系を、前記位置付けステージ上の前記加工品の座標系に対して回転させる手段と
を含む、加工品にパターンを形成する装置。 - 印刷されるべき前記パターンの座標系を前記位置付けステージ上の前記加工品の座標系に対して回転させる手段が、前記加工品の位置を回転させるための前記高精度機械系のステージ・サーボ系内の手段を含む請求項1に記載された加工品にパターンを形成する装置。
- 印刷されるべき前記パターンの座標系を前記位置付けステージ上の前記加工品の座標系に対して回転させる手段が、前記空間光変調装置の位置を回転させるための精密ステージ内の手段を含む請求項1に記載された加工品にパターンを形成する装置。
- 印刷されるべき前記パターンの座標系を前記位置付けステージ上の前記加工品の座標系に対して回転させる手段が、前記高精度機械系のステージ・サーボ系および前記空間光変調装置の装架された前記精密ステージの両方により構成される請求項1に記載された加工品にパターンを形成する装置。
- 前記空間光変調装置が、2次元マイクロミラー・マトリクスである請求項1から請求項4までのいずれか1項に記載された加工品にパターンを形成する装置。
- 前記空間光変調装置が、1次元マイクロミラー・マトリクスである請求項1から請求項4までのいずれか1項に記載された加工品にパターンを形成する装置。
- 加工品にパターンを形成する方法において、
超紫外線から赤外線までの波長範囲の光を放射する段階と、
多数の変調素子を有する空間光変調装置によって、前記放射された光を変調する段階と、
前記加工品上に前記空間光変調装置の画像を投射する投射段階であって、書き込まれるべきパターンのデジタル表現に基づいて、前記放射、前記空間光変調装置、および前記投射される画像に対する前記加工品の位置を制御して、それにより前記パターンを前記加工品に印刷する投射段階と
を含む方法において、
印刷されるべき前記パターンの座標系を、前記加工品の座標系に対して回転させる段階を含む、加工品にパターンを形成する方法。 - 印刷されるべき前記パターンの座標系を前記加工品の座標系に対して回転させる段階が、前記空間光変調装置の装架された精密ステージを回転させることによって行われる請求項7に記載された加工品にパターンを形成する方法。
- 印刷されるべき前記パターンの座標系を前記加工品の座標系に対して回転させる段階が、前記加工品が位置付けられた位置付けステージを回転させることによって行われる請求項7に記載された加工品にパターンを形成する方法。
- 印刷されるべき前記パターンの座標系を前記加工品の座標系に対して回転させる段階が、前記空間光変調装置の装架された精密ステージおよび前記加工品が位置付けられた位置付けステージの両方を回転させることによって行われる請求項7に記載された加工品にパターンを形成する方法。
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JP2009235543A Pending JP2010016404A (ja) | 1998-03-02 | 2009-10-09 | ステッチング誤差防止用改良型パターン・ジェネレータ |
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Family Applications Before (8)
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JP2000534916A Pending JP2002506231A (ja) | 1998-03-02 | 1999-03-02 | ステッチング誤差防止用改良型パターン・ジェネレータ |
JP2000534918A Pending JP2002506233A (ja) | 1998-03-02 | 1999-03-02 | 高画質パターン作成方法 |
JP2000534919A Withdrawn JP2002506234A (ja) | 1998-03-02 | 1999-03-02 | 改良型パターン・ジェネレータ |
JP2000534920A Pending JP2002506235A (ja) | 1998-03-02 | 1999-03-02 | アドレス・レゾリューションが改善されたパターン・ジェネレータ |
JP2000534915A Pending JP2002506230A (ja) | 1998-03-02 | 1999-03-02 | 精度改良型パターン・ジェネレータ |
JP2000534917A Pending JP2002506232A (ja) | 1998-03-02 | 1999-03-02 | Euvを使用するパターン・ジェネレータ |
JP2000534921A Pending JP2002506236A (ja) | 1998-03-02 | 1999-03-02 | 変調装置の設計を改良したパターン・ジェネレータ |
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Family Applications After (3)
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JP2009235543A Pending JP2010016404A (ja) | 1998-03-02 | 2009-10-09 | ステッチング誤差防止用改良型パターン・ジェネレータ |
JP2010137427A Pending JP2010267978A (ja) | 1998-03-02 | 2010-06-16 | 改良型パターン・ジェネレータ |
Country Status (12)
Country | Link |
---|---|
US (16) | US6747783B1 (ja) |
EP (6) | EP1060439B1 (ja) |
JP (12) | JP2002506231A (ja) |
KR (2) | KR100474121B1 (ja) |
CN (3) | CN1550902A (ja) |
AT (5) | ATE491971T1 (ja) |
AU (7) | AU2755699A (ja) |
DE (6) | DE69943041D1 (ja) |
ES (1) | ES2357473T3 (ja) |
RU (2) | RU2257603C2 (ja) |
SE (1) | SE9800665D0 (ja) |
WO (7) | WO1999045440A1 (ja) |
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- 1999-03-02 WO PCT/SE1999/000311 patent/WO1999045440A1/en active Application Filing
- 1999-03-02 CN CNA2004100353616A patent/CN1550902A/zh active Pending
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- 1999-03-02 US US09/623,195 patent/US6747783B1/en not_active Expired - Lifetime
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- 1999-03-02 JP JP2000534916A patent/JP2002506231A/ja active Pending
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- 1999-03-02 KR KR10-2000-7009717A patent/KR100451026B1/ko not_active IP Right Cessation
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