SE0104238D0 - Method and apparatus for patterning a workpiece - Google Patents

Method and apparatus for patterning a workpiece

Info

Publication number
SE0104238D0
SE0104238D0 SE0104238A SE0104238A SE0104238D0 SE 0104238 D0 SE0104238 D0 SE 0104238D0 SE 0104238 A SE0104238 A SE 0104238A SE 0104238 A SE0104238 A SE 0104238A SE 0104238 D0 SE0104238 D0 SE 0104238D0
Authority
SE
Sweden
Prior art keywords
workpiece
computer controlled
pixels
relates
controlled reticle
Prior art date
Application number
SE0104238A
Other languages
English (en)
Inventor
Torbjoern Sandstroem
Original Assignee
Micronic Laser Systems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems Ab filed Critical Micronic Laser Systems Ab
Priority to SE0104238A priority Critical patent/SE0104238D0/sv
Publication of SE0104238D0 publication Critical patent/SE0104238D0/sv
Priority to AU2002359127A priority patent/AU2002359127A1/en
Priority to JP2003553341A priority patent/JP4360914B2/ja
Priority to KR1020047008908A priority patent/KR100904823B1/ko
Priority to CNB028250346A priority patent/CN1288503C/zh
Priority to EP02793638A priority patent/EP1454194B1/en
Priority to PCT/SE2002/002310 priority patent/WO2003052516A1/en
Priority to US10/498,713 priority patent/US7405414B2/en
Priority to US10/410,874 priority patent/US20030233630A1/en
Priority to US10/462,010 priority patent/US7106490B2/en
Priority to US11/272,925 priority patent/US7158280B2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G03F7/2057—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using an addressed light valve, e.g. a liquid crystal device
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
    • G03F7/70433—Layout for increasing efficiency or for compensating imaging errors, e.g. layout of exposure fields for reducing focus errors; Use of mask features for increasing efficiency or for compensating imaging errors
    • G03F7/70441—Optical proximity correction [OPC]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70491—Information management, e.g. software; Active and passive control, e.g. details of controlling exposure processes or exposure tool monitoring processes
    • G03F7/70508—Data handling in all parts of the microlithographic apparatus, e.g. handling pattern data for addressable masks or data transfer to or from different components within the exposure apparatus

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Facsimile Heads (AREA)
  • Facsimile Scanning Arrangements (AREA)
  • Electron Beam Exposure (AREA)
SE0104238A 2001-12-14 2001-12-14 Method and apparatus for patterning a workpiece SE0104238D0 (sv)

Priority Applications (11)

Application Number Priority Date Filing Date Title
SE0104238A SE0104238D0 (sv) 2001-12-14 2001-12-14 Method and apparatus for patterning a workpiece
US10/498,713 US7405414B2 (en) 2001-12-14 2002-12-11 Method and apparatus for patterning a workpiece
CNB028250346A CN1288503C (zh) 2001-12-14 2002-12-11 工件构图方法和装置
JP2003553341A JP4360914B2 (ja) 2001-12-14 2002-12-11 加工物にパターンを形成するための方法及び装置
KR1020047008908A KR100904823B1 (ko) 2001-12-14 2002-12-11 패턴 생성, 이미징, 기록 방법 및 패턴 생성 장치, 마스크, 반도체 웨이퍼
AU2002359127A AU2002359127A1 (en) 2001-12-14 2002-12-11 Method and apparatus for patterning a workpiece
EP02793638A EP1454194B1 (en) 2001-12-14 2002-12-11 Method and apparatus for patterning a workpiece
PCT/SE2002/002310 WO2003052516A1 (en) 2001-12-14 2002-12-11 Method and apparatus for patterning a workpiece
US10/410,874 US20030233630A1 (en) 2001-12-14 2003-04-10 Methods and systems for process control of corner feature embellishment
US10/462,010 US7106490B2 (en) 2001-12-14 2003-06-12 Methods and systems for improved boundary contrast
US11/272,925 US7158280B2 (en) 2001-12-14 2005-11-14 Methods and systems for improved boundary contrast

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0104238A SE0104238D0 (sv) 2001-12-14 2001-12-14 Method and apparatus for patterning a workpiece

Publications (1)

Publication Number Publication Date
SE0104238D0 true SE0104238D0 (sv) 2001-12-14

Family

ID=20286340

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0104238A SE0104238D0 (sv) 2001-12-14 2001-12-14 Method and apparatus for patterning a workpiece

Country Status (8)

Country Link
US (1) US7405414B2 (sv)
EP (1) EP1454194B1 (sv)
JP (1) JP4360914B2 (sv)
KR (1) KR100904823B1 (sv)
CN (1) CN1288503C (sv)
AU (1) AU2002359127A1 (sv)
SE (1) SE0104238D0 (sv)
WO (1) WO2003052516A1 (sv)

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Also Published As

Publication number Publication date
KR100904823B1 (ko) 2009-06-25
US7405414B2 (en) 2008-07-29
CN1288503C (zh) 2006-12-06
KR20040065243A (ko) 2004-07-21
US20050084766A1 (en) 2005-04-21
JP4360914B2 (ja) 2009-11-11
EP1454194B1 (en) 2012-06-27
AU2002359127A1 (en) 2003-06-30
JP2005513770A (ja) 2005-05-12
CN1605046A (zh) 2005-04-06
WO2003052516A1 (en) 2003-06-26
EP1454194A1 (en) 2004-09-08

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