SE0300138D0 - Electromagnetic radiation pulse timing control - Google Patents

Electromagnetic radiation pulse timing control

Info

Publication number
SE0300138D0
SE0300138D0 SE0300138A SE0300138A SE0300138D0 SE 0300138 D0 SE0300138 D0 SE 0300138D0 SE 0300138 A SE0300138 A SE 0300138A SE 0300138 A SE0300138 A SE 0300138A SE 0300138 D0 SE0300138 D0 SE 0300138D0
Authority
SE
Sweden
Prior art keywords
time
period
electromagnetic radiation
timing control
pulse timing
Prior art date
Application number
SE0300138A
Other languages
English (en)
Inventor
Pontus Stenstroem
Stefan Gullstrand
Original Assignee
Micronic Laser Systems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Micronic Laser Systems Ab filed Critical Micronic Laser Systems Ab
Priority to SE0300138A priority Critical patent/SE0300138D0/sv
Publication of SE0300138D0 publication Critical patent/SE0300138D0/sv
Priority to KR1020057012553A priority patent/KR20050094425A/ko
Priority to JP2006500757A priority patent/JP2006518098A/ja
Priority to EP04704375A priority patent/EP1586147A1/en
Priority to CNB2004800024636A priority patent/CN100349335C/zh
Priority to US10/542,695 priority patent/US20080059096A1/en
Priority to PCT/SE2004/000069 priority patent/WO2004066459A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/10069—Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
    • H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
    • H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SE0300138A 2003-01-22 2003-01-22 Electromagnetic radiation pulse timing control SE0300138D0 (sv)

Priority Applications (7)

Application Number Priority Date Filing Date Title
SE0300138A SE0300138D0 (sv) 2003-01-22 2003-01-22 Electromagnetic radiation pulse timing control
KR1020057012553A KR20050094425A (ko) 2003-01-22 2004-01-22 전자기복사 펄스 타이밍 제어
JP2006500757A JP2006518098A (ja) 2003-01-22 2004-01-22 電磁放射パルスのタイミング制御
EP04704375A EP1586147A1 (en) 2003-01-22 2004-01-22 Electromagnetic radiation pulse timing control
CNB2004800024636A CN100349335C (zh) 2003-01-22 2004-01-22 电磁辐射脉冲定时控制
US10/542,695 US20080059096A1 (en) 2003-01-22 2004-01-22 Electromagnetic Radiation Pulse Timing Control
PCT/SE2004/000069 WO2004066459A1 (en) 2003-01-22 2004-01-22 Electromagnetic radiation pulse timing control

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SE0300138A SE0300138D0 (sv) 2003-01-22 2003-01-22 Electromagnetic radiation pulse timing control

Publications (1)

Publication Number Publication Date
SE0300138D0 true SE0300138D0 (sv) 2003-01-22

Family

ID=20290171

Family Applications (1)

Application Number Title Priority Date Filing Date
SE0300138A SE0300138D0 (sv) 2003-01-22 2003-01-22 Electromagnetic radiation pulse timing control

Country Status (7)

Country Link
US (1) US20080059096A1 (sv)
EP (1) EP1586147A1 (sv)
JP (1) JP2006518098A (sv)
KR (1) KR20050094425A (sv)
CN (1) CN100349335C (sv)
SE (1) SE0300138D0 (sv)
WO (1) WO2004066459A1 (sv)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090303452A1 (en) * 2005-04-15 2009-12-10 Micronic Laser Systems Ab Image Enhancement Technique
DE102009020320A1 (de) * 2008-11-19 2010-05-20 Heidelberg Instruments Mikrotechnik Gmbh Verfahren und Vorrichtung zur Steigerung der Auflösung und/oder der Geschwindigkeit von Belichtungssystemen
KR101698141B1 (ko) * 2009-12-08 2017-01-19 삼성전자 주식회사 마스크리스 노광장치 및 그 제어방법
JP2013519211A (ja) 2010-02-09 2013-05-23 エナジェティック・テクノロジー・インコーポレーテッド レーザー駆動の光源
BE1020625A4 (nl) * 2012-04-23 2014-02-04 Agfa Healthcare Werkwijze voor het bepalen van de standaard instelwaarde voor de vertragingstijd van een radiografische generator.
KR101545849B1 (ko) * 2014-04-28 2015-08-24 에스엔유 프리시젼 주식회사 간섭계의 스캐닝 동기화 방법
KR101705843B1 (ko) * 2015-03-04 2017-02-22 주식회사 이오테크닉스 레이저 시스템의 제어방법 및 레이저 시스템의 제어장치
JP7208162B2 (ja) * 2017-05-11 2023-01-18 シューラット テクノロジーズ，インク． 付加製造最適化のためのパターン化された光の固体ルーティング
US11587781B2 (en) 2021-05-24 2023-02-21 Hamamatsu Photonics K.K. Laser-driven light source with electrodeless ignition
CN113518219B (zh) * 2021-07-09 2022-11-22 中国人民解放军63660部队 一种基于标校灯的相机曝光时间偏差检测方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6348907B1 (en) * 1989-08-22 2002-02-19 Lawson A. Wood Display apparatus with digital micromirror device
US6005880A (en) * 1997-02-14 1999-12-21 Lambda Physik Gmbh Precision variable delay using saturable inductors
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
JP3734204B2 (ja) * 1998-04-01 2006-01-11 株式会社小松製作所 パルスレーザの発光タイミング制御装置
US6618421B2 (en) * 1998-07-18 2003-09-09 Cymer, Inc. High repetition rate gas discharge laser with precise pulse timing control
US6327163B1 (en) * 1999-04-27 2001-12-04 Science Research Laboratory, Inc. Solid state pulsed power supply
CN2453580Y (zh) * 2000-12-08 2001-10-10 中国科学院上海光学精密机械研究所 多路激光脉冲同步触发装置

Also Published As

Publication number Publication date
EP1586147A1 (en) 2005-10-19
CN1739224A (zh) 2006-02-22
JP2006518098A (ja) 2006-08-03
CN100349335C (zh) 2007-11-14
WO2004066459A1 (en) 2004-08-05
KR20050094425A (ko) 2005-09-27
US20080059096A1 (en) 2008-03-06

Similar Documents

Publication Publication Date Title
JP2013541844A5 (sv)
SE0300138D0 (sv) Electromagnetic radiation pulse timing control
TW200834252A (en) Laser produced plasma EUV light source
WO2003082508A3 (en) Luminescence sensing system for welding
ATE523284T1 (de) Auslösung von ereignissen in einer schweissvorrichtung mittels einer echtzeituhr
WO2007028119A3 (en) Control system and apparatus for use with ultra-fast laser
ATE459016T1 (de) Lidar-system und verfahren
EP2033279A4 (en) METHOD AND APPARATUS FOR CONTROLLING THE CARRIER ENVELOPE PHASE
DE60308286D1 (de) Generator zur Erzeugung eines Taktsignals mit geringem Jitter
WO2009088453A3 (en) Method and apparatus for reducing optical signal speckle
CA2618526A1 (en) Fiber pulse laser apparatus and method of control the same
FR2868558B1 (fr) Procede de generation d'un signal d'horloge atomique a piegeage coherent de population et horloge atomique correspondante
TW201130229A (en) Delay locked loop and method of driving delay locked loop
JP2011229660A5 (ja) 被検体情報取得装置
WO2010033436A3 (en) Techniques for generating fractional clock signals
WO2005030429A3 (de) Verfahren und vorrichtung zum schweissen von bauteilen
DE60039308D1 (de) Multipuls-farbstofflaser
TW200607991A (en) Apparatus and method for joint and time delayed measurements of components of conjugated quadratures of fields of reflected/scattered and transmitted/scattered beams by an object in interferometry
HRP20230759T1 (hr) Medicinski laserski sistem
WO2003040738A1 (fr) Generateur de synchronisation et appareil d'essai
ATE523290T1 (de) Werkzeugeinstell- und -analysevorrichtung
WO2015067998A3 (en) Adaptive laser joining of stator and rotor laminations
WO2003007522A3 (en) Optical pulse train generator
WO2018011306A3 (de) Verfahren zur erzeugung eines laserpulses und anordnung zur erzeugung eines treiberansteuersignals
ATE388415T1 (de) Lasertransponder zum deaktivieren einer lasergest tzten geschwindigkeits berwachungsvorrichtung