SE0300138D0 - Electromagnetic radiation pulse timing control - Google Patents
Electromagnetic radiation pulse timing controlInfo
- Publication number
- SE0300138D0 SE0300138D0 SE0300138A SE0300138A SE0300138D0 SE 0300138 D0 SE0300138 D0 SE 0300138D0 SE 0300138 A SE0300138 A SE 0300138A SE 0300138 A SE0300138 A SE 0300138A SE 0300138 D0 SE0300138 D0 SE 0300138D0
- Authority
- SE
- Sweden
- Prior art keywords
- time
- period
- electromagnetic radiation
- timing control
- pulse timing
- Prior art date
Links
- 230000005670 electromagnetic radiation Effects 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70283—Mask effects on the imaging process
- G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/102—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/10069—Memorized or pre-programmed characteristics, e.g. look-up table [LUT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/13—Stabilisation of laser output parameters, e.g. frequency or amplitude
- H01S3/131—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation
- H01S3/134—Stabilisation of laser output parameters, e.g. frequency or amplitude by controlling the active medium, e.g. by controlling the processes or apparatus for excitation in gas lasers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Optics & Photonics (AREA)
- Electromagnetism (AREA)
- Lasers (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0300138A SE0300138D0 (sv) | 2003-01-22 | 2003-01-22 | Electromagnetic radiation pulse timing control |
KR1020057012553A KR20050094425A (ko) | 2003-01-22 | 2004-01-22 | 전자기복사 펄스 타이밍 제어 |
JP2006500757A JP2006518098A (ja) | 2003-01-22 | 2004-01-22 | 電磁放射パルスのタイミング制御 |
EP04704375A EP1586147A1 (en) | 2003-01-22 | 2004-01-22 | Electromagnetic radiation pulse timing control |
CNB2004800024636A CN100349335C (zh) | 2003-01-22 | 2004-01-22 | 电磁辐射脉冲定时控制 |
US10/542,695 US20080059096A1 (en) | 2003-01-22 | 2004-01-22 | Electromagnetic Radiation Pulse Timing Control |
PCT/SE2004/000069 WO2004066459A1 (en) | 2003-01-22 | 2004-01-22 | Electromagnetic radiation pulse timing control |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SE0300138A SE0300138D0 (sv) | 2003-01-22 | 2003-01-22 | Electromagnetic radiation pulse timing control |
Publications (1)
Publication Number | Publication Date |
---|---|
SE0300138D0 true SE0300138D0 (sv) | 2003-01-22 |
Family
ID=20290171
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SE0300138A SE0300138D0 (sv) | 2003-01-22 | 2003-01-22 | Electromagnetic radiation pulse timing control |
Country Status (7)
Country | Link |
---|---|
US (1) | US20080059096A1 (sv) |
EP (1) | EP1586147A1 (sv) |
JP (1) | JP2006518098A (sv) |
KR (1) | KR20050094425A (sv) |
CN (1) | CN100349335C (sv) |
SE (1) | SE0300138D0 (sv) |
WO (1) | WO2004066459A1 (sv) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20090303452A1 (en) * | 2005-04-15 | 2009-12-10 | Micronic Laser Systems Ab | Image Enhancement Technique |
DE102009020320A1 (de) * | 2008-11-19 | 2010-05-20 | Heidelberg Instruments Mikrotechnik Gmbh | Verfahren und Vorrichtung zur Steigerung der Auflösung und/oder der Geschwindigkeit von Belichtungssystemen |
KR101698141B1 (ko) * | 2009-12-08 | 2017-01-19 | 삼성전자 주식회사 | 마스크리스 노광장치 및 그 제어방법 |
JP2013519211A (ja) | 2010-02-09 | 2013-05-23 | エナジェティック・テクノロジー・インコーポレーテッド | レーザー駆動の光源 |
BE1020625A4 (nl) * | 2012-04-23 | 2014-02-04 | Agfa Healthcare | Werkwijze voor het bepalen van de standaard instelwaarde voor de vertragingstijd van een radiografische generator. |
KR101545849B1 (ko) * | 2014-04-28 | 2015-08-24 | 에스엔유 프리시젼 주식회사 | 간섭계의 스캐닝 동기화 방법 |
KR101705843B1 (ko) * | 2015-03-04 | 2017-02-22 | 주식회사 이오테크닉스 | 레이저 시스템의 제어방법 및 레이저 시스템의 제어장치 |
JP7208162B2 (ja) * | 2017-05-11 | 2023-01-18 | シューラット テクノロジーズ,インク. | 付加製造最適化のためのパターン化された光の固体ルーティング |
US11587781B2 (en) | 2021-05-24 | 2023-02-21 | Hamamatsu Photonics K.K. | Laser-driven light source with electrodeless ignition |
CN113518219B (zh) * | 2021-07-09 | 2022-11-22 | 中国人民解放军63660部队 | 一种基于标校灯的相机曝光时间偏差检测方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6348907B1 (en) * | 1989-08-22 | 2002-02-19 | Lawson A. Wood | Display apparatus with digital micromirror device |
US6005880A (en) * | 1997-02-14 | 1999-12-21 | Lambda Physik Gmbh | Precision variable delay using saturable inductors |
SE9800665D0 (sv) * | 1998-03-02 | 1998-03-02 | Micronic Laser Systems Ab | Improved method for projection printing using a micromirror SLM |
JP3734204B2 (ja) * | 1998-04-01 | 2006-01-11 | 株式会社小松製作所 | パルスレーザの発光タイミング制御装置 |
US6618421B2 (en) * | 1998-07-18 | 2003-09-09 | Cymer, Inc. | High repetition rate gas discharge laser with precise pulse timing control |
US6327163B1 (en) * | 1999-04-27 | 2001-12-04 | Science Research Laboratory, Inc. | Solid state pulsed power supply |
CN2453580Y (zh) * | 2000-12-08 | 2001-10-10 | 中国科学院上海光学精密机械研究所 | 多路激光脉冲同步触发装置 |
-
2003
- 2003-01-22 SE SE0300138A patent/SE0300138D0/sv unknown
-
2004
- 2004-01-22 CN CNB2004800024636A patent/CN100349335C/zh not_active Expired - Fee Related
- 2004-01-22 JP JP2006500757A patent/JP2006518098A/ja active Pending
- 2004-01-22 US US10/542,695 patent/US20080059096A1/en not_active Abandoned
- 2004-01-22 EP EP04704375A patent/EP1586147A1/en not_active Withdrawn
- 2004-01-22 WO PCT/SE2004/000069 patent/WO2004066459A1/en active Application Filing
- 2004-01-22 KR KR1020057012553A patent/KR20050094425A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP1586147A1 (en) | 2005-10-19 |
CN1739224A (zh) | 2006-02-22 |
JP2006518098A (ja) | 2006-08-03 |
CN100349335C (zh) | 2007-11-14 |
WO2004066459A1 (en) | 2004-08-05 |
KR20050094425A (ko) | 2005-09-27 |
US20080059096A1 (en) | 2008-03-06 |
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