US8664370B2 - Process for preparing silicon-containing azodicarbamides - Google Patents
Process for preparing silicon-containing azodicarbamides Download PDFInfo
- Publication number
- US8664370B2 US8664370B2 US13/580,780 US201113580780A US8664370B2 US 8664370 B2 US8664370 B2 US 8664370B2 US 201113580780 A US201113580780 A US 201113580780A US 8664370 B2 US8664370 B2 US 8664370B2
- Authority
- US
- United States
- Prior art keywords
- aminopropyl
- general formula
- producing silicon
- reaction
- dicarbamides
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active, expires
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- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims abstract description 21
- 229910052710 silicon Inorganic materials 0.000 title claims abstract description 21
- 239000010703 silicon Substances 0.000 title claims abstract description 21
- 238000004519 manufacturing process Methods 0.000 title abstract description 4
- 150000001875 compounds Chemical class 0.000 claims abstract description 31
- 238000006243 chemical reaction Methods 0.000 claims abstract description 13
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical class [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 claims abstract description 10
- 238000000034 method Methods 0.000 claims description 31
- 239000002904 solvent Substances 0.000 claims description 15
- 239000003381 stabilizer Substances 0.000 claims description 13
- 125000003118 aryl group Chemical group 0.000 claims description 6
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 claims description 5
- 125000001931 aliphatic group Chemical group 0.000 claims description 4
- 125000000217 alkyl group Chemical group 0.000 claims description 4
- 230000007717 exclusion Effects 0.000 claims description 4
- 229920006395 saturated elastomer Polymers 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 3
- 125000006702 (C1-C18) alkyl group Chemical group 0.000 claims description 2
- GOCRPOKWZIVUQG-UHFFFAOYSA-N 3-(diethoxymethylsilyl)propan-1-amine Chemical compound CCOC(OCC)[SiH2]CCCN GOCRPOKWZIVUQG-UHFFFAOYSA-N 0.000 claims description 2
- ROSGJZYJHLVCJU-UHFFFAOYSA-N 3-(dimethoxymethylsilyl)propan-1-amine Chemical compound COC(OC)[SiH2]CCCN ROSGJZYJHLVCJU-UHFFFAOYSA-N 0.000 claims description 2
- GLISOBUNKGBQCL-UHFFFAOYSA-N 3-[ethoxy(dimethyl)silyl]propan-1-amine Chemical compound CCO[Si](C)(C)CCCN GLISOBUNKGBQCL-UHFFFAOYSA-N 0.000 claims description 2
- MCLXOMWIZZCOCA-UHFFFAOYSA-N 3-[methoxy(dimethyl)silyl]propan-1-amine Chemical compound CO[Si](C)(C)CCCN MCLXOMWIZZCOCA-UHFFFAOYSA-N 0.000 claims description 2
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 claims description 2
- XUZVALKTSQQLCH-UHFFFAOYSA-N 3-tripropoxysilylpropan-1-amine Chemical compound CCCO[Si](CCCN)(OCCC)OCCC XUZVALKTSQQLCH-UHFFFAOYSA-N 0.000 claims description 2
- 239000004721 Polyphenylene oxide Substances 0.000 claims description 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims description 2
- 229920000570 polyether Polymers 0.000 claims description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 2
- 125000004400 (C1-C12) alkyl group Chemical group 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 12
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 10
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 10
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- 230000001476 alcoholic effect Effects 0.000 description 6
- 229920001971 elastomer Polymers 0.000 description 6
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 229960004592 isopropanol Drugs 0.000 description 5
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 5
- 150000001335 aliphatic alkanes Chemical class 0.000 description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 4
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 4
- 238000001644 13C nuclear magnetic resonance spectroscopy Methods 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 125000005910 alkyl carbonate group Chemical group 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 238000007254 oxidation reaction Methods 0.000 description 3
- VVWRJUBEIPHGQF-UHFFFAOYSA-N propan-2-yl n-propan-2-yloxycarbonyliminocarbamate Chemical compound CC(C)OC(=O)N=NC(=O)OC(C)C VVWRJUBEIPHGQF-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- 239000005864 Sulphur Substances 0.000 description 2
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- 239000000470 constituent Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 150000002429 hydrazines Chemical class 0.000 description 2
- 150000002430 hydrocarbons Chemical group 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- 229920003049 isoprene rubber Polymers 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- VVWRJUBEIPHGQF-MDZDMXLPSA-N propan-2-yl (ne)-n-propan-2-yloxycarbonyliminocarbamate Chemical compound CC(C)OC(=O)\N=N\C(=O)OC(C)C VVWRJUBEIPHGQF-MDZDMXLPSA-N 0.000 description 2
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
- ARKBFSWVHXKMSD-UHFFFAOYSA-N trimethoxysilylmethanamine Chemical compound CO[Si](CN)(OC)OC ARKBFSWVHXKMSD-UHFFFAOYSA-N 0.000 description 2
- UKRYCCPPSVICGB-UHFFFAOYSA-N 2,2-diethoxy-2-silyloxyethanamine Chemical compound NCC(O[SiH3])(OCC)OCC UKRYCCPPSVICGB-UHFFFAOYSA-N 0.000 description 1
- WOAQORXZRIWPSZ-UHFFFAOYSA-N 2,2-dipropoxy-2-silyloxyethanamine Chemical compound NCC(O[SiH3])(OCCC)OCCC WOAQORXZRIWPSZ-UHFFFAOYSA-N 0.000 description 1
- XSMNZIUZPHLNRK-UHFFFAOYSA-N 2-(14,14-didodecoxytetradecoxysilyl)ethanamine Chemical compound NCC[SiH2]OCCCCCCCCCCCCCC(OCCCCCCCCCCCC)OCCCCCCCCCCCC XSMNZIUZPHLNRK-UHFFFAOYSA-N 0.000 description 1
- XCHJISWYSPDMBP-UHFFFAOYSA-N 2-(diethoxymethoxysilyl)ethanamine Chemical compound CCOC(OCC)O[SiH2]CCN XCHJISWYSPDMBP-UHFFFAOYSA-N 0.000 description 1
- LZZQMRLAPHTEHN-UHFFFAOYSA-N 2-(diethoxymethylsilyl)ethanamine Chemical compound CCOC(OCC)[SiH2]CCN LZZQMRLAPHTEHN-UHFFFAOYSA-N 0.000 description 1
- XZKCIRNUKJQNJW-UHFFFAOYSA-N 2-(dipropoxymethoxysilyl)ethanamine Chemical compound CCCOC(OCCC)O[SiH2]CCN XZKCIRNUKJQNJW-UHFFFAOYSA-N 0.000 description 1
- ZUEDWJVWAZWJLC-UHFFFAOYSA-N 2-(dodecoxy-hexadecoxy-tetradecoxysilyl)ethanamine Chemical compound CCCCCCCCCCCCCCCCO[Si](CCN)(OCCCCCCCCCCCC)OCCCCCCCCCCCCCC ZUEDWJVWAZWJLC-UHFFFAOYSA-N 0.000 description 1
- AODXMQANELHRIX-UHFFFAOYSA-N 2-[ethoxy(dimethyl)silyl]ethanamine Chemical compound CCO[Si](C)(C)CCN AODXMQANELHRIX-UHFFFAOYSA-N 0.000 description 1
- PYTNYCJPQQTENF-UHFFFAOYSA-N 2-[methoxy(dimethyl)silyl]ethanamine Chemical compound CO[Si](C)(C)CCN PYTNYCJPQQTENF-UHFFFAOYSA-N 0.000 description 1
- JMDWVAHOWFLJKG-UHFFFAOYSA-N 2-dimethylsilyloxyethanamine Chemical compound C[SiH](C)OCCN JMDWVAHOWFLJKG-UHFFFAOYSA-N 0.000 description 1
- TYGVAZQPJREAGH-UHFFFAOYSA-N 2-dimethylsilyloxypropan-1-amine Chemical compound NCC(C)O[SiH](C)C TYGVAZQPJREAGH-UHFFFAOYSA-N 0.000 description 1
- KKRBBCINLBXBRM-UHFFFAOYSA-N 2-methyl-3-tri(tetradecoxy)silylpropan-1-amine Chemical compound CCCCCCCCCCCCCCO[Si](CC(C)CN)(OCCCCCCCCCCCCCC)OCCCCCCCCCCCCCC KKRBBCINLBXBRM-UHFFFAOYSA-N 0.000 description 1
- RBSZDYUXQQEJGO-UHFFFAOYSA-N 2-methyl-3-tridodecoxysilylpropan-1-amine Chemical compound CCCCCCCCCCCCO[Si](CC(C)CN)(OCCCCCCCCCCCC)OCCCCCCCCCCCC RBSZDYUXQQEJGO-UHFFFAOYSA-N 0.000 description 1
- DYIUKVBALLNLGQ-UHFFFAOYSA-N 2-methyl-3-triethoxysilylpropan-1-amine Chemical compound CCO[Si](OCC)(OCC)CC(C)CN DYIUKVBALLNLGQ-UHFFFAOYSA-N 0.000 description 1
- OZMMBSLIAQBLAQ-UHFFFAOYSA-N 2-methyl-3-trihexadecoxysilylpropan-1-amine Chemical compound CCCCCCCCCCCCCCCCO[Si](CC(C)CN)(OCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCC OZMMBSLIAQBLAQ-UHFFFAOYSA-N 0.000 description 1
- FWTMTMVDOPTMQB-UHFFFAOYSA-N 2-methyl-3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CC(C)CN FWTMTMVDOPTMQB-UHFFFAOYSA-N 0.000 description 1
- OQYSMTGPKPJNIX-UHFFFAOYSA-N 2-methyl-3-trioctadecoxysilylpropan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCO[Si](CC(C)CN)(OCCCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCCCC OQYSMTGPKPJNIX-UHFFFAOYSA-N 0.000 description 1
- IFEXTUXFLDNRJN-UHFFFAOYSA-N 2-methyl-3-tripropoxysilylpropan-1-amine Chemical compound CCCO[Si](CC(C)CN)(OCCC)OCCC IFEXTUXFLDNRJN-UHFFFAOYSA-N 0.000 description 1
- SNFWPEPWWPXQRL-UHFFFAOYSA-N 2-tri(tetradecoxy)silylethanamine Chemical compound CCCCCCCCCCCCCCO[Si](CCN)(OCCCCCCCCCCCCCC)OCCCCCCCCCCCCCC SNFWPEPWWPXQRL-UHFFFAOYSA-N 0.000 description 1
- QLJOHACZAPTJPE-UHFFFAOYSA-N 2-tridodecoxysilylethanamine Chemical compound CCCCCCCCCCCCO[Si](CCN)(OCCCCCCCCCCCC)OCCCCCCCCCCCC QLJOHACZAPTJPE-UHFFFAOYSA-N 0.000 description 1
- BHWUCEATHBXPOV-UHFFFAOYSA-N 2-triethoxysilylethanamine Chemical compound CCO[Si](CCN)(OCC)OCC BHWUCEATHBXPOV-UHFFFAOYSA-N 0.000 description 1
- RVNUGCGTQLBNTH-UHFFFAOYSA-N 2-trihexadecoxysilylethanamine Chemical compound CCCCCCCCCCCCCCCCO[Si](CCN)(OCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCC RVNUGCGTQLBNTH-UHFFFAOYSA-N 0.000 description 1
- QHQNYHZHLAAHRW-UHFFFAOYSA-N 2-trimethoxysilylethanamine Chemical compound CO[Si](OC)(OC)CCN QHQNYHZHLAAHRW-UHFFFAOYSA-N 0.000 description 1
- MJVXRTMKLCNGEV-UHFFFAOYSA-N 2-trioctadecoxysilylethanamine Chemical compound CCCCCCCCCCCCCCCCCCO[Si](CCN)(OCCCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCCCC MJVXRTMKLCNGEV-UHFFFAOYSA-N 0.000 description 1
- UNKZGKRGTGCFKH-UHFFFAOYSA-N 2-tripropoxysilylethanamine Chemical compound CCCO[Si](CCN)(OCCC)OCCC UNKZGKRGTGCFKH-UHFFFAOYSA-N 0.000 description 1
- QFQYQKAIVBAWIE-UHFFFAOYSA-N 3-(14,14-didodecoxytetradecoxysilyl)-2-methylpropan-1-amine Chemical compound NCC(C[SiH2]OCCCCCCCCCCCCCC(OCCCCCCCCCCCC)OCCCCCCCCCCCC)C QFQYQKAIVBAWIE-UHFFFAOYSA-N 0.000 description 1
- BPOHTCOEKLQELF-UHFFFAOYSA-N 3-(14,14-didodecoxytetradecoxysilyl)propan-1-amine Chemical compound NCCC[SiH2]OCCCCCCCCCCCCCC(OCCCCCCCCCCCC)OCCCCCCCCCCCC BPOHTCOEKLQELF-UHFFFAOYSA-N 0.000 description 1
- WXEOLMQAAJLESW-UHFFFAOYSA-N 3-(dibutoxymethylsilyl)-2-methylpropan-1-amine Chemical compound CCCCOC(OCCCC)[SiH2]CC(C)CN WXEOLMQAAJLESW-UHFFFAOYSA-N 0.000 description 1
- MCAKKROLTDGMBJ-UHFFFAOYSA-N 3-(dibutoxymethylsilyl)propan-1-amine Chemical compound CCCCOC(OCCCC)[SiH2]CCCN MCAKKROLTDGMBJ-UHFFFAOYSA-N 0.000 description 1
- JCJFWZVSTXENQP-UHFFFAOYSA-N 3-(didodecoxymethylsilyl)-2-methylpropan-1-amine Chemical compound CCCCCCCCCCCCOC([SiH2]CC(C)CN)OCCCCCCCCCCCC JCJFWZVSTXENQP-UHFFFAOYSA-N 0.000 description 1
- UOORLDCWABMMRS-UHFFFAOYSA-N 3-(didodecoxymethylsilyl)propan-1-amine Chemical compound CCCCCCCCCCCCOC([SiH2]CCCN)OCCCCCCCCCCCC UOORLDCWABMMRS-UHFFFAOYSA-N 0.000 description 1
- SXUIYLIYZBSTEL-UHFFFAOYSA-N 3-(diethoxymethoxysilyl)-2-methylpropan-1-amine Chemical compound CCOC(OCC)O[SiH2]CC(C)CN SXUIYLIYZBSTEL-UHFFFAOYSA-N 0.000 description 1
- RBYPITAQIDKLCJ-UHFFFAOYSA-N 3-(diethoxymethoxysilyl)propan-1-amine Chemical compound CCOC(OCC)O[SiH2]CCCN RBYPITAQIDKLCJ-UHFFFAOYSA-N 0.000 description 1
- YGUBEMPHQIRVBO-UHFFFAOYSA-N 3-(diethoxymethylsilyl)-2-methylpropane-1-thiol Chemical compound CCOC(OCC)[SiH2]CC(C)CS YGUBEMPHQIRVBO-UHFFFAOYSA-N 0.000 description 1
- ARQOPKAQIOCSOD-UHFFFAOYSA-N 3-(dimethoxymethylsilyl)-2-methylpropan-1-amine Chemical compound COC(OC)[SiH2]CC(C)CN ARQOPKAQIOCSOD-UHFFFAOYSA-N 0.000 description 1
- WXZRJZMDXRKOBP-UHFFFAOYSA-N 3-(dipropoxymethoxysilyl)-2-methylpropan-1-amine Chemical compound CCCOC(OCCC)O[SiH2]CC(C)CN WXZRJZMDXRKOBP-UHFFFAOYSA-N 0.000 description 1
- BVKRRIWPHZUPIT-UHFFFAOYSA-N 3-(dipropoxymethoxysilyl)propan-1-amine Chemical compound CCCOC(OCCC)O[SiH2]CCCN BVKRRIWPHZUPIT-UHFFFAOYSA-N 0.000 description 1
- WYZYIDCEVFJCRO-UHFFFAOYSA-N 3-(dipropoxymethylsilyl)propan-1-amine Chemical compound CCCOC(OCCC)[SiH2]CCCN WYZYIDCEVFJCRO-UHFFFAOYSA-N 0.000 description 1
- PJLDGIMCPLCXND-UHFFFAOYSA-N 3-(dodecoxy-hexadecoxy-tetradecoxysilyl)propan-1-amine Chemical compound CCCCCCCCCCCCCCCCO[Si](CCCN)(OCCCCCCCCCCCC)OCCCCCCCCCCCCCC PJLDGIMCPLCXND-UHFFFAOYSA-N 0.000 description 1
- XLVFWRXXBWLROX-UHFFFAOYSA-N 3-[14-dodecoxytetradecoxy(hexadecoxy)silyl]-2-methylpropan-1-amine Chemical compound NCC(C[SiH](OCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCOCCCCCCCCCCCC)C XLVFWRXXBWLROX-UHFFFAOYSA-N 0.000 description 1
- YPCNPHIGPGISKC-UHFFFAOYSA-N 3-[butoxy(dimethyl)silyl]-2-methylpropan-1-amine Chemical compound CCCCO[Si](C)(C)CC(C)CN YPCNPHIGPGISKC-UHFFFAOYSA-N 0.000 description 1
- RWWSGKAKVIHPHX-UHFFFAOYSA-N 3-[butoxy(dimethyl)silyl]propan-1-amine Chemical compound CCCCO[Si](C)(C)CCCN RWWSGKAKVIHPHX-UHFFFAOYSA-N 0.000 description 1
- UHWNLDGYWPCNQJ-UHFFFAOYSA-N 3-[di(propan-2-yloxy)methylsilyl]-2-methylpropan-1-amine Chemical compound CC(C)OC(OC(C)C)[SiH2]CC(C)CN UHWNLDGYWPCNQJ-UHFFFAOYSA-N 0.000 description 1
- SZLXUROTBTYRDB-UHFFFAOYSA-N 3-[di(propan-2-yloxy)methylsilyl]propan-1-amine Chemical compound CC(C)OC(OC(C)C)[SiH2]CCCN SZLXUROTBTYRDB-UHFFFAOYSA-N 0.000 description 1
- JVHBJEVMLHNEQR-UHFFFAOYSA-N 3-[di(tetradecoxy)methylsilyl]-2-methylpropan-1-amine Chemical compound CCCCCCCCCCCCCCOC([SiH2]CC(C)CN)OCCCCCCCCCCCCCC JVHBJEVMLHNEQR-UHFFFAOYSA-N 0.000 description 1
- GWIZLWPQQHAKMS-UHFFFAOYSA-N 3-[di(tetradecoxy)methylsilyl]propan-1-amine Chemical compound CCCCCCCCCCCCCCOC([SiH2]CCCN)OCCCCCCCCCCCCCC GWIZLWPQQHAKMS-UHFFFAOYSA-N 0.000 description 1
- SHNBXQUWZHZRMV-UHFFFAOYSA-N 3-[dimethyl(2-methylpropoxy)silyl]-2-methylpropan-1-amine Chemical compound CC(C)CO[Si](C)(C)CC(C)CN SHNBXQUWZHZRMV-UHFFFAOYSA-N 0.000 description 1
- IWGMYNYRSKLTTL-UHFFFAOYSA-N 3-[dimethyl(2-methylpropoxy)silyl]propan-1-amine Chemical compound CC(C)CO[Si](C)(C)CCCN IWGMYNYRSKLTTL-UHFFFAOYSA-N 0.000 description 1
- PCLFJJVWDDPWJH-UHFFFAOYSA-N 3-[dimethyl(propan-2-yloxy)silyl]-2-methylpropan-1-amine Chemical compound CC(C)O[Si](C)(C)CC(C)CN PCLFJJVWDDPWJH-UHFFFAOYSA-N 0.000 description 1
- MPJAUUSADXIOMO-UHFFFAOYSA-N 3-[dimethyl(propan-2-yloxy)silyl]propan-1-amine Chemical compound CC(C)O[Si](C)(C)CCCN MPJAUUSADXIOMO-UHFFFAOYSA-N 0.000 description 1
- JMUGSSAKTMHXDU-UHFFFAOYSA-N 3-[dimethyl(propoxy)silyl]-2-methylpropan-1-amine Chemical compound CCCO[Si](C)(C)CC(C)CN JMUGSSAKTMHXDU-UHFFFAOYSA-N 0.000 description 1
- ZCSHOZYCEVDECE-UHFFFAOYSA-N 3-[dimethyl(propoxy)silyl]propan-1-amine Chemical compound CCCO[Si](C)(C)CCCN ZCSHOZYCEVDECE-UHFFFAOYSA-N 0.000 description 1
- BNDBRDXUFRSGDM-UHFFFAOYSA-N 3-[dimethyl(tetradecoxy)silyl]-2-methylpropan-1-amine Chemical compound CCCCCCCCCCCCCCO[Si](C)(C)CC(C)CN BNDBRDXUFRSGDM-UHFFFAOYSA-N 0.000 description 1
- WZCYHCAMLDAAOD-UHFFFAOYSA-N 3-[dimethyl(tetradecoxy)silyl]propan-1-amine Chemical compound CCCCCCCCCCCCCCO[Si](C)(C)CCCN WZCYHCAMLDAAOD-UHFFFAOYSA-N 0.000 description 1
- AXVFJSYNFCENPI-UHFFFAOYSA-N 3-[dodecoxy(dimethyl)silyl]-2-methylpropan-1-amine Chemical compound CCCCCCCCCCCCO[Si](C)(C)CC(C)CN AXVFJSYNFCENPI-UHFFFAOYSA-N 0.000 description 1
- VVSAJWUAWDYSFZ-UHFFFAOYSA-N 3-[dodecoxy(dimethyl)silyl]propan-1-amine Chemical compound CCCCCCCCCCCCO[Si](C)(C)CCCN VVSAJWUAWDYSFZ-UHFFFAOYSA-N 0.000 description 1
- HNTNRVGWCBSRKJ-UHFFFAOYSA-N 3-[ethoxy(dimethyl)silyl]-2-methylpropane-1-thiol Chemical compound CCO[Si](C)(C)CC(C)CS HNTNRVGWCBSRKJ-UHFFFAOYSA-N 0.000 description 1
- SWSFFEMOWAUAEN-UHFFFAOYSA-N 3-[hydroxy(dimethyl)silyl]propan-1-amine Chemical compound C[Si](C)(O)CCCN SWSFFEMOWAUAEN-UHFFFAOYSA-N 0.000 description 1
- GDLUMOCAKHCCMR-UHFFFAOYSA-N 3-[methoxy(dimethyl)silyl]-2-methylpropan-1-amine Chemical compound CO[Si](C)(C)CC(C)CN GDLUMOCAKHCCMR-UHFFFAOYSA-N 0.000 description 1
- NBPUZLUZTOLBGQ-UHFFFAOYSA-N 3-tri(tetradecoxy)silylpropan-1-amine Chemical compound CCCCCCCCCCCCCCO[Si](CCCN)(OCCCCCCCCCCCCCC)OCCCCCCCCCCCCCC NBPUZLUZTOLBGQ-UHFFFAOYSA-N 0.000 description 1
- BDXWLDAWNPNRDH-UHFFFAOYSA-N 3-tridodecoxysilylpropan-1-amine Chemical compound CCCCCCCCCCCCO[Si](CCCN)(OCCCCCCCCCCCC)OCCCCCCCCCCCC BDXWLDAWNPNRDH-UHFFFAOYSA-N 0.000 description 1
- SBQOHDOYXQFKNG-UHFFFAOYSA-N 3-trihexadecoxysilylpropan-1-amine Chemical compound CCCCCCCCCCCCCCCCO[Si](CCCN)(OCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCC SBQOHDOYXQFKNG-UHFFFAOYSA-N 0.000 description 1
- YPTRSHCIQKIDHU-UHFFFAOYSA-N 3-trioctadecoxysilylpropan-1-amine Chemical compound CCCCCCCCCCCCCCCCCCO[Si](CCCN)(OCCCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCCCC YPTRSHCIQKIDHU-UHFFFAOYSA-N 0.000 description 1
- DAHZIQDUTNTRKL-UHFFFAOYSA-N 4-(14,14-didodecoxytetradecoxysilyl)butan-2-amine Chemical compound NC(CC[SiH2]OCCCCCCCCCCCCCC(OCCCCCCCCCCCC)OCCCCCCCCCCCC)C DAHZIQDUTNTRKL-UHFFFAOYSA-N 0.000 description 1
- PORCZNIMJGJZRI-UHFFFAOYSA-N 4-(diethoxymethoxysilyl)butan-2-amine Chemical compound CCOC(OCC)O[SiH2]CCC(C)N PORCZNIMJGJZRI-UHFFFAOYSA-N 0.000 description 1
- WYIUZERYPCAKFT-UHFFFAOYSA-N 4-(diethoxymethylsilyl)butan-2-amine Chemical compound CCOC(OCC)[SiH2]CCC(C)N WYIUZERYPCAKFT-UHFFFAOYSA-N 0.000 description 1
- DIKOMQIHOAUFJV-UHFFFAOYSA-N 4-(dimethoxymethylsilyl)butan-2-amine Chemical compound COC(OC)[SiH2]CCC(C)N DIKOMQIHOAUFJV-UHFFFAOYSA-N 0.000 description 1
- HJCBZJWWIKJKRH-UHFFFAOYSA-N 4-(dipropoxymethoxysilyl)butan-2-amine Chemical compound CCCOC(OCCC)O[SiH2]CCC(C)N HJCBZJWWIKJKRH-UHFFFAOYSA-N 0.000 description 1
- UFSVNVHAMQWAFT-UHFFFAOYSA-N 4-(dodecoxy-hexadecoxy-tetradecoxysilyl)butan-2-amine Chemical compound CCCCCCCCCCCCCCCCO[Si](CCC(C)N)(OCCCCCCCCCCCC)OCCCCCCCCCCCCCC UFSVNVHAMQWAFT-UHFFFAOYSA-N 0.000 description 1
- JFMGYULNQJPJCY-UHFFFAOYSA-N 4-(hydroxymethyl)-1,3-dioxolan-2-one Chemical compound OCC1COC(=O)O1 JFMGYULNQJPJCY-UHFFFAOYSA-N 0.000 description 1
- ODEVQYMJZARYQM-UHFFFAOYSA-N 4-[ethoxy(dimethyl)silyl]butan-2-amine Chemical compound CCO[Si](C)(C)CCC(C)N ODEVQYMJZARYQM-UHFFFAOYSA-N 0.000 description 1
- FVYASADCJXNDTP-UHFFFAOYSA-N 4-[methoxy(dimethyl)silyl]butan-2-amine Chemical compound CO[Si](C)(C)CCC(C)N FVYASADCJXNDTP-UHFFFAOYSA-N 0.000 description 1
- OOFIGRUDYXFLJF-UHFFFAOYSA-N 4-tri(tetradecoxy)silylbutan-2-amine Chemical compound CCCCCCCCCCCCCCO[Si](CCC(C)N)(OCCCCCCCCCCCCCC)OCCCCCCCCCCCCCC OOFIGRUDYXFLJF-UHFFFAOYSA-N 0.000 description 1
- IIIQXKNGTXUJDN-UHFFFAOYSA-N 4-tridodecoxysilylbutan-2-amine Chemical compound CCCCCCCCCCCCO[Si](CCC(C)N)(OCCCCCCCCCCCC)OCCCCCCCCCCCC IIIQXKNGTXUJDN-UHFFFAOYSA-N 0.000 description 1
- BHTZPJXABISXPB-UHFFFAOYSA-N 4-triethoxysilylbutan-2-amine Chemical compound CCO[Si](OCC)(OCC)CCC(C)N BHTZPJXABISXPB-UHFFFAOYSA-N 0.000 description 1
- YLFSOKODTGMVCU-UHFFFAOYSA-N 4-trihexadecoxysilylbutan-2-amine Chemical compound CCCCCCCCCCCCCCCCO[Si](CCC(C)N)(OCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCC YLFSOKODTGMVCU-UHFFFAOYSA-N 0.000 description 1
- QAPHWZATUFXMGN-UHFFFAOYSA-N 4-trimethoxysilylbutan-2-amine Chemical compound CO[Si](OC)(OC)CCC(C)N QAPHWZATUFXMGN-UHFFFAOYSA-N 0.000 description 1
- ONPDPADPZNBIDE-UHFFFAOYSA-N 4-tripropoxysilylbutan-2-amine Chemical compound CCCO[Si](CCC(C)N)(OCCC)OCCC ONPDPADPZNBIDE-UHFFFAOYSA-N 0.000 description 1
- IYHXKQJUGSMKOK-UHFFFAOYSA-N CCCOC(OCCC)[SiH2]CC(C)CS Chemical compound CCCOC(OCCC)[SiH2]CC(C)CS IYHXKQJUGSMKOK-UHFFFAOYSA-N 0.000 description 1
- ADQDTIAWIXUACV-UHFFFAOYSA-N CCCc1ccc(CC)cc1 Chemical compound CCCc1ccc(CC)cc1 ADQDTIAWIXUACV-UHFFFAOYSA-N 0.000 description 1
- DXNZYHPFQVXMHF-UHFFFAOYSA-N COC(OC)[SiH2]CCN Chemical compound COC(OC)[SiH2]CCN DXNZYHPFQVXMHF-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- 229940123457 Free radical scavenger Drugs 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000012963 UV stabilizer Substances 0.000 description 1
- 150000001449 anionic compounds Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000001767 cationic compounds Chemical class 0.000 description 1
- PBAYDYUZOSNJGU-UHFFFAOYSA-N chelidonic acid Natural products OC(=O)C1=CC(=O)C=C(C(O)=O)O1 PBAYDYUZOSNJGU-UHFFFAOYSA-N 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- NEHMKBQYUWJMIP-UHFFFAOYSA-N chloromethane Chemical compound ClC NEHMKBQYUWJMIP-UHFFFAOYSA-N 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- -1 cyclic alcohols Chemical class 0.000 description 1
- 150000005676 cyclic carbonates Chemical class 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- NBBQQQJUOYRZCA-UHFFFAOYSA-N diethoxymethylsilane Chemical compound CCOC([SiH3])OCC NBBQQQJUOYRZCA-UHFFFAOYSA-N 0.000 description 1
- XYYQWMDBQFSCPB-UHFFFAOYSA-N dimethoxymethylsilane Chemical compound COC([SiH3])OC XYYQWMDBQFSCPB-UHFFFAOYSA-N 0.000 description 1
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 1
- JMPVESVJOFYWTB-UHFFFAOYSA-N dipropan-2-yl carbonate Chemical compound CC(C)OC(=O)OC(C)C JMPVESVJOFYWTB-UHFFFAOYSA-N 0.000 description 1
- 239000000806 elastomer Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 125000005842 heteroatom Chemical group 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 239000003607 modifier Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229940078552 o-xylene Drugs 0.000 description 1
- OXUCOTSGWGNWGC-UHFFFAOYSA-N octane Chemical compound CCCCCCC[CH2-] OXUCOTSGWGNWGC-UHFFFAOYSA-N 0.000 description 1
- 150000005684 open-chain carbonates Chemical class 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical group CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 238000005979 thermal decomposition reaction Methods 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 125000005270 trialkylamine group Chemical group 0.000 description 1
- ROWWCTUMLAVVQB-UHFFFAOYSA-N triethoxysilylmethanamine Chemical compound CCO[Si](CN)(OCC)OCC ROWWCTUMLAVVQB-UHFFFAOYSA-N 0.000 description 1
- OJDWSXMZWYSCDJ-UHFFFAOYSA-N tripropoxysilylmethanamine Chemical compound CCCO[Si](CN)(OCCC)OCCC OJDWSXMZWYSCDJ-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
Definitions
- the invention relates to a process for producing silicon-containing azodicarbamides.
- DE 2704506 discloses compounds of the general formula Y—X—CO—N ⁇ N—CO—X 1 —Z and use thereof in filled rubber mixtures.
- US 20090234066 A1 moreover discloses compounds of the A-CO—N ⁇ N—CO—Z-G type, which are used together with sulphur-containing silanes in rubber mixtures comprising isoprene rubber.
- US 20090186961 A1 discloses compounds of the A-CO—N ⁇ N—CO—Z-G type, which are used together with coating materials in rubber mixtures comprising isoprene rubber.
- the invention provides a process for producing silicon-containing azodicarbamides of the general formula I (R 1 ) 3-a (R 2 ) a Si—R I —NH—C(O)—N ⁇ N—C(O)—NH—R I —Si(R 1 ) 3-a (R 2 ) a (I), via reaction of azobiscarboxy compounds of the general formula II R 3 —X 1 —C(O)—N ⁇ N—C(O)—X 1 —R 4 (II) with aminosilanes of the general formula III (R 1 ) 3-a (R 2 ) a Si—R I —NH 2 (III),
- Silicon-containing azobiscarbamides can be mixtures of silicon-containing azobiscarbamides of the general formula I.
- the product of the process can comprise oligomers produced via hydrolysis and condensation of the alkoxysilane functions of the silicon-containing azobiscarbamides of the general formula I.
- the azobiscarboxy compound used as starting material can be a mixture of azobiscarboxy compounds of the general formula II.
- the aminosilane used as starting material can be a mixture of aminosilanes of the general formula III.
- the aminosilanes used can comprise oligomers produced via hydrolysis and condensation of the alkoxysilane functions of the aminosilanes of the general formula III.
- the product obtainable via the process according to the invention can comprise silicon-containing azobis-carbamides of the general formula I in a purity greater than 30 mol %, preferably greater than 50 mol %, particularly preferably greater than 75 mol %, very particularly preferably greater than 85 mol %.
- the relative percentage contents of the compounds of the general formula I in the product obtained via the process according to the invention are determined via integration of the 13 C NMR integrals of the target product of the general formula I and comparison with the totality of the 13 C NMR integrals.
- the reaction can be carried out in solvents or with no solvent.
- the amount of solvent as a ratio to the amounts used of the compounds of the general formula II, can be from 1% by weight to 5000% by weight, preferably from 1% by weight to 1000% by weight, particularly preferably from 50% by weight to 1000% by weight, particularly preferably from 50% by weight to 500% by weight.
- the amount of solvent as a ratio to the amounts used of the compounds of the general formula II, can be more than 1% by weight, preferably more than 10% by weight, particularly preferably more than 50% by weight and very particularly preferably more than 100% by weight.
- the boiling point of the solvent can be from ⁇ 100° C. to 250° C., preferably from 0 to 150° C., particularly preferably from 20 to 100° C.
- Solvents used can comprise an alcoholic or non-alcoholic compound.
- Solvents used can comprise mixtures of alcoholic and non-alcoholic compounds.
- Non-alcoholic solvents can be halogen-containing or halogen-free solvents.
- Halogen-containing solvents can preferably be CCl 4 , CHCl 3 , CH 2 Cl 2 , CH 3 Cl, CCl 3 —CCl 3 , CHCl 2 —CCl 3 , CHCl 2 —CHCl 2 or CH 2 Cl—CH 2 Cl.
- Non-alcoholic, halogen-free solvents used can comprise alkanes, alkyl carbonates, aromatics, substituted aromatics, preferably alkyl-substituted aromatics, particularly preferably toluene, p-xylene, m-xylene or o-xylene, ethers, mercaptans, dialkyl sulphides, trialkylamines, alkylphosphanes or arylphosphanes.
- Alkanes used can preferably comprise pure alkanes or a mixture of alkanes, examples being pentane, hexane, cyclohexane, heptane or octane.
- Alkyl carbonates used can comprise open-chain or cyclic carbonates.
- Open-chain alkyl carbonates used can preferably comprise dimethyl carbonate, diisopropyl carbonate or diethyl carbonate.
- Cyclic alkyl carbonates used can preferably comprise ethylene carbonate, 1-methylethylene carbonate, propylene carbonate or glycerol carbonate.
- Alcoholic solvents used can comprise straight-chain, branched or else cyclic alcohols.
- Alcohols used can also comprise mixtures of alcohols.
- alcohols which correspond to the respective alkoxy substituents on the silicon in the compounds of the formulae I and III, and also isopropanol and tert-butanol.
- Alcoholic solvent used can very particularly preferably comprise methanol, ethanol and isopropanol.
- the reaction can preferably be carried out with exclusion of air and/or with exclusion of water.
- the reaction can be carried out under an inert gas atmosphere, for example under argon or nitrogen, preferably under nitrogen.
- the process according to the invention can be carried out at atmospheric pressure, at elevated pressure or at reduced pressure.
- Preference is given to atmospheric pressure and to reduced pressure.
- Elevated pressure can be a pressure of from 1.1 bar to 100 bar, preferably from 1.5 bar to 50 bar, particularly preferably from 2 bar to 20 bar and very particularly preferably from 2 bar to 10 bar.
- Reduced pressure can be a pressure from 1 mbar to 1000 mbar, preferably from 1 mbar to 500 mbar, particularly preferably from 1 mbar to 250 mbar, very particularly preferably from 5 mbar to 100 mbar.
- the process according to the invention can be carried out at from ⁇ 50° C. to +200° C., preferably from ⁇ 25° C. to 150° C., particularly preferably from ⁇ 10° C. to 100° C., very particularly preferably from ⁇ 10° C. to 50° C.
- the azobiscarboxy compounds of the general formula II can be added to aminosilanes of the general formula III in a molar ratio of from 1:1.80 to 1:2.25, preferably from 1:1.90 to 1:2.15, and particularly preferably in a ratio of from 1:1.95 to 1:2.05.
- stabilizers can be added prior to, during or after the reaction.
- Stabilizers can be monomers, oligomers or polymers.
- Stabilizers can inhibit or delay the thermal decomposition of azo compounds.
- Stabilizers can be free-radical scavengers.
- Stabilizers can inhibit or delay the light-induced decomposition of azo compounds.
- Stabilizers can be UV stabilizers.
- Stabilizers can inhibit or delay oxidation reactions.
- Stabilizers can be anionic or cationic compounds.
- Stabilizers can comprise heteroatoms, such as oxygen, sulphur, nitrogen or phosphorus.
- the amount of stabilizers that can be used in the process according to the invention is from 0.001 to 100% by weight, preferably from 0.01 to 50% by weight, particularly preferably from 0.01 to 10% by weight, very particularly preferably from 0.1 to 5% by weight, based on the mass of the material used of the general formula II.
- the amount of stabilizers used in the process according to the invention can be more than 0.001% by weight, preferably more than 0.01% by weight, particularly preferably more than 0.1% by weight, very particularly preferably more than 1% by weight, based on the mass of the material used of the general formula II.
- the amount of stabilizers used in the process according to the invention can be less than 100% by weight, preferably less than 25% by weight, particularly preferably less than 10% by weight, but very particularly preferably more than 1% by weight, based on the mass of the material used of the general formula II.
- the residual content of compounds of the general formula II in the product produced by the process according to the invention can be less than 25 mol %, preferably less than 10 mol %, particularly preferably less than 5 mol %, very particularly preferably less than 3 mol %.
- the relative mol % values for the compounds of the general formula II in the product produced by the process according to the invention are determined via integration of the carbonyl C atoms in the 13 C NMR, with respect to the mol % values for the compounds of the general formula I.
- the residual content of compounds of the general formula III in the product produced by the process according to the invention can be less than 25 mol %, preferably less than 10 mol %, particularly preferably less than 5 mol %, very particularly preferably less than 3 mol %.
- Relative mol % values for compounds of the formula III (integral of all of the C atoms of R I of the formula III adjacent to N)/((integral of all of the C atoms of R I of the formula III adjacent to N)+(integral of all of the C atoms of R I of the formula I adjacent to N)).
- the product produced by the process according to the invention can comprise compounds of the general formula IV, V and/or VI R 3 —X 1 —C(O)—NH—NH—C(O)—X 1 —R 4 (IV), (R 1 ) 3-a (R 2 ) a Si—R I —NH—C(O)—NH—NH—C(O)—NH—R I —Si(R 1 ) 3-a (R 2 ) a (V), (R 1 ) 3-a (R 2 ) a Si—R I —NH—CO—NH—NH—CO—X 1 —R 3 (VI).
- the silicon-containing azodicarbamides of the general formula I can be used as coupling agents between inorganic materials, e.g. glass beads, glass fragments, glass surfaces, glass fibres, or oxidic fillers, preferably silicas, e.g. precipitated silicas and fumed silicas,
- thermosets e.g. thermosets, thermoplastics or elastomers, or, respectively, as crosslinking agents and surface-modifiers for oxidic surfaces.
- organic polymers e.g. thermosets, thermoplastics or elastomers, or, respectively, as crosslinking agents and surface-modifiers for oxidic surfaces.
- the silicon-containing azodicarbamides of the general formula I can be used as coupling reagents in filled rubber mixtures, e.g. tyre treads, technical rubber items or shoe soles.
- An advantage of the process according to the invention is that it is possible to produce silicon-containing azodicarbamides of the general formula I in a single synthetic step from synthetic units familiar in industry.
- Another advantage of the process according to the invention is that there is no requirement for the oxidation of hydrazine derivatives, and high yields are achieved, as also are high purities.
- Another advantage of the process according to the invention is that there is no requirement for any complicated purification of the products obtained.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE102010003387A DE102010003387A1 (de) | 2010-03-29 | 2010-03-29 | Verfahren zur Herstellung von siliciumhaltigen Azodicarbamiden |
DE102010003387.1 | 2010-03-29 | ||
DE102010003387 | 2010-03-29 | ||
PCT/EP2011/053824 WO2011120792A1 (de) | 2010-03-29 | 2011-03-15 | Verfahren zur herstellung von siliciumhaltigen azodicarbamiden |
Publications (2)
Publication Number | Publication Date |
---|---|
US20130012691A1 US20130012691A1 (en) | 2013-01-10 |
US8664370B2 true US8664370B2 (en) | 2014-03-04 |
Family
ID=44021969
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/580,780 Active 2031-05-14 US8664370B2 (en) | 2010-03-29 | 2011-03-11 | Process for preparing silicon-containing azodicarbamides |
Country Status (16)
Country | Link |
---|---|
US (1) | US8664370B2 (de) |
EP (1) | EP2552925B1 (de) |
JP (1) | JP5744173B2 (de) |
KR (1) | KR101761965B1 (de) |
CN (1) | CN102822183B (de) |
BR (1) | BR112012024805B1 (de) |
CA (1) | CA2794944C (de) |
DE (1) | DE102010003387A1 (de) |
ES (1) | ES2505498T3 (de) |
MX (1) | MX2012010262A (de) |
MY (1) | MY156704A (de) |
PL (1) | PL2552925T3 (de) |
RU (1) | RU2559876C2 (de) |
UA (1) | UA105843C2 (de) |
WO (1) | WO2011120792A1 (de) |
ZA (1) | ZA201207291B (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9981995B2 (en) | 2014-04-22 | 2018-05-29 | Evonik Degussa Gmbh | Azocarbonyl-functionalized silanes |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2444782T3 (es) | 2011-04-01 | 2014-02-26 | Evonik Degussa Gmbh | Mixturas de caucho |
US8741994B1 (en) * | 2012-12-13 | 2014-06-03 | Toyo Tire & Rubber Co., Ltd. | Alkoxysilyl group-containing azo compound and rubber composition using the same |
TWI591848B (zh) * | 2013-11-28 | 2017-07-11 | 晶元光電股份有限公司 | 發光元件及其製造方法 |
FR3020066B1 (fr) | 2014-04-22 | 2016-04-01 | Michelin & Cie | Composition de caoutchouc pour pneumatique comportant un agent de couplage azosilane |
EP3181571B1 (de) * | 2015-12-17 | 2019-07-24 | Evonik Degussa GmbH | Silizium-enthaltende azodicarboxamide, deren herstellung und verwendung |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2704506A1 (de) | 1976-02-06 | 1977-08-11 | Malaysian Rubber Producers | Substituierte azosilane, verfahren zu ihrer herstellung und ihre verwendung |
US20090186961A1 (en) | 2005-05-26 | 2009-07-23 | Michelin Recherche Et Technique S.A. | Rubber Composition for Tire Comprising an Organosilicon Coupling Agent and an Inorganic Filler Covering Agent |
US20090221751A1 (en) | 2006-01-28 | 2009-09-03 | Evonik Degussa Gmbh | Rubber Mixtures |
US20090234066A1 (en) | 2005-05-26 | 2009-09-17 | Jose Carlos Araujo Da Silva | Rubber composition for tire comprising an organosilicon coupling system |
US7777063B2 (en) | 2005-08-17 | 2010-08-17 | Evonik Degussa Gmbh | Organosilicon compounds their preparation and their use |
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US3171851A (en) | 1961-12-06 | 1965-03-02 | Union Carbide Corp | Amino methylphenyl silicon compounds |
JP2787343B2 (ja) * | 1989-09-08 | 1998-08-13 | 大塚化学株式会社 | アゾ化合物 |
JP2510345B2 (ja) * | 1990-08-30 | 1996-06-26 | 積水化学工業株式会社 | アルコキシシリル基含有アゾ化合物及びその製造方法 |
FR2886294B1 (fr) * | 2005-05-26 | 2007-07-20 | Rhodia Chimie Sa | Procede de preparation de composes organosiliciques |
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2010
- 2010-03-29 DE DE102010003387A patent/DE102010003387A1/de not_active Withdrawn
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2011
- 2011-03-11 US US13/580,780 patent/US8664370B2/en active Active
- 2011-03-15 KR KR1020127025562A patent/KR101761965B1/ko active IP Right Grant
- 2011-03-15 CN CN201180016708.0A patent/CN102822183B/zh active Active
- 2011-03-15 ES ES11708247.9T patent/ES2505498T3/es active Active
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- 2011-03-15 JP JP2013501723A patent/JP5744173B2/ja active Active
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- 2011-03-15 WO PCT/EP2011/053824 patent/WO2011120792A1/de active Application Filing
- 2011-03-15 MX MX2012010262A patent/MX2012010262A/es active IP Right Grant
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DE2704506A1 (de) | 1976-02-06 | 1977-08-11 | Malaysian Rubber Producers | Substituierte azosilane, verfahren zu ihrer herstellung und ihre verwendung |
US4118367A (en) | 1976-02-06 | 1978-10-03 | The Malaysian Rubber Producers Research Association | Reinforced rubber |
US20090186961A1 (en) | 2005-05-26 | 2009-07-23 | Michelin Recherche Et Technique S.A. | Rubber Composition for Tire Comprising an Organosilicon Coupling Agent and an Inorganic Filler Covering Agent |
US20090234066A1 (en) | 2005-05-26 | 2009-09-17 | Jose Carlos Araujo Da Silva | Rubber composition for tire comprising an organosilicon coupling system |
US7777063B2 (en) | 2005-08-17 | 2010-08-17 | Evonik Degussa Gmbh | Organosilicon compounds their preparation and their use |
US20090221751A1 (en) | 2006-01-28 | 2009-09-03 | Evonik Degussa Gmbh | Rubber Mixtures |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9981995B2 (en) | 2014-04-22 | 2018-05-29 | Evonik Degussa Gmbh | Azocarbonyl-functionalized silanes |
Also Published As
Publication number | Publication date |
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EP2552925A1 (de) | 2013-02-06 |
WO2011120792A1 (de) | 2011-10-06 |
RU2012145738A (ru) | 2014-05-10 |
ZA201207291B (en) | 2013-06-26 |
BR112012024805B1 (pt) | 2018-05-15 |
US20130012691A1 (en) | 2013-01-10 |
JP5744173B2 (ja) | 2015-07-01 |
CA2794944C (en) | 2017-05-09 |
CN102822183A (zh) | 2012-12-12 |
MX2012010262A (es) | 2012-11-23 |
EP2552925B1 (de) | 2014-07-23 |
ES2505498T3 (es) | 2014-10-10 |
KR101761965B1 (ko) | 2017-07-26 |
JP2013523671A (ja) | 2013-06-17 |
DE102010003387A1 (de) | 2011-09-29 |
KR20130034014A (ko) | 2013-04-04 |
UA105843C2 (uk) | 2014-06-25 |
MY156704A (en) | 2016-03-15 |
PL2552925T3 (pl) | 2014-12-31 |
CN102822183B (zh) | 2015-11-25 |
CA2794944A1 (en) | 2011-10-06 |
RU2559876C2 (ru) | 2015-08-20 |
BR112012024805A2 (pt) | 2016-06-07 |
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