TWD179095S - 基板保持環 - Google Patents

基板保持環

Info

Publication number
TWD179095S
TWD179095S TW105300718F TW105300718F TWD179095S TW D179095 S TWD179095 S TW D179095S TW 105300718 F TW105300718 F TW 105300718F TW 105300718 F TW105300718 F TW 105300718F TW D179095 S TWD179095 S TW D179095S
Authority
TW
Taiwan
Prior art keywords
view
retaining ring
substrate
substrate retaining
same
Prior art date
Application number
TW105300718F
Other languages
English (en)
Inventor
Osamu Nabeya
Hozumi Yasuda
Makoto Fukushima
Shingo Togashi
Keisuke Namiki
Satoru Yamaki
Original Assignee
荏原製作所股份有限公司
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荏原製作所股份有限公司, Ebara Corp filed Critical 荏原製作所股份有限公司
Publication of TWD179095S publication Critical patent/TWD179095S/zh

Links

Abstract

【物品用途】;本設計的物品是基板保持環，例如：如「使用狀態之參考圖」所示，應用於半導體等製造時的基板研磨工程中，將晶圓等基板保持在環內，來研磨基板的單面。;【設計說明】;後視圖與前視圖相同，後視圖省略。;左側視圖與右側視圖相同，左側視圖省略。
TW105300718F 2015-08-25 2016-02-17 基板保持環 TWD179095S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2015018612 2015-08-25

Publications (1)

Publication Number Publication Date
TWD179095S true TWD179095S (zh) 2016-10-21

Family

ID=59981668

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105300718F TWD179095S (zh) 2015-08-25 2016-02-17 基板保持環

Country Status (2)

Country Link
US (1) USD799437S1 (zh)
TW (1) TWD179095S (zh)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1544543S (zh) * 2015-05-14 2019-02-18
JP1584784S (zh) * 2017-01-31 2017-08-28
USD861449S1 (en) * 2018-02-05 2019-10-01 QuickCinch, LLC Wire repair and refurbishment tool
USD949116S1 (en) * 2019-05-03 2022-04-19 Lumileds Holding B.V. Flexible circuit board with connectors
USD940670S1 (en) * 2019-09-26 2022-01-11 Willbe S&T Co., Ltd. Retainer ring for chemical mechanical polishing device
USD998575S1 (en) * 2020-04-07 2023-09-12 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber
USD1013841S1 (en) * 2020-04-20 2024-02-06 Reliance Worldwide Corporation Retaining ring
JP1671171S (zh) * 2020-05-22 2020-10-26
USD981459S1 (en) * 2021-06-16 2023-03-21 Ebara Corporation Retaining ring for substrate
USD997111S1 (en) * 2021-12-15 2023-08-29 Applied Materials, Inc. Collimator for use in a physical vapor deposition (PVD) chamber

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6068548A (en) * 1997-12-17 2000-05-30 Intel Corporation Mechanically stabilized retaining ring for chemical mechanical polishing
US6186880B1 (en) * 1999-09-29 2001-02-13 Semiconductor Equipment Technology Recyclable retaining ring assembly for a chemical mechanical polishing apparatus
JP4605853B2 (ja) * 2000-04-20 2011-01-05 東京エレクトロン株式会社 熱処理装置、熱処理システム及び熱処理方法
US20030070757A1 (en) * 2001-09-07 2003-04-17 Demeyer Dale E. Method and apparatus for two-part CMP retaining ring
DE10247179A1 (de) * 2002-10-02 2004-04-15 Ensinger Kunststofftechnologie Gbr Haltering zum Halten von Halbleiterwafern in einer chemisch-mechanischen Poliervorrichtung
WO2004033152A1 (en) * 2002-10-11 2004-04-22 Semplastics, L.L.C. Retaining ring for use on a carrier of a polishing apparatus
WO2005049274A2 (en) * 2003-11-13 2005-06-02 Applied Materials, Inc. Retaining ring with shaped surface
US7029386B2 (en) * 2004-06-10 2006-04-18 R & B Plastics, Inc. Retaining ring assembly for use in chemical mechanical polishing
EP1899110A2 (en) * 2005-05-24 2008-03-19 Entegris, Inc. Cmp retaining ring
US7789736B2 (en) * 2006-10-13 2010-09-07 Applied Materials, Inc. Stepped retaining ring
USD605206S1 (en) * 2008-05-07 2009-12-01 Komatsu Ltd. Fan shroud for construction machinery
US8298046B2 (en) * 2009-10-21 2012-10-30 SPM Technology, Inc. Retaining rings
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD638951S1 (en) * 2009-11-13 2011-05-31 3M Innovative Properties Company Sample processing disk cover
US8491267B2 (en) * 2010-08-27 2013-07-23 Pratt & Whitney Canada Corp. Retaining ring arrangement for a rotary assembly
USD703160S1 (en) * 2011-01-27 2014-04-22 Hitachi High-Technologies Corporation Grounded electrode for a plasma processing apparatus
USD699200S1 (en) * 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode member for a plasma processing apparatus
USD709536S1 (en) * 2011-09-30 2014-07-22 Tokyo Electron Limited Focusing ring
KR101328411B1 (ko) * 2012-11-05 2013-11-13 한상효 웨이퍼 연마용 리테이너 링 제조 방법
USD766849S1 (en) * 2013-05-15 2016-09-20 Ebara Corporation Substrate retaining ring
KR101455311B1 (ko) * 2013-07-11 2014-10-27 주식회사 윌비에스엔티 화학적 기계 연마 장치의 리테이너 링
JP6403981B2 (ja) 2013-11-13 2018-10-10 株式会社荏原製作所 基板保持装置、研磨装置、研磨方法、およびリテーナリング
JP6475518B2 (ja) * 2015-03-03 2019-02-27 株式会社ディスコ ウエーハの加工方法
JP1546800S (zh) * 2015-06-12 2016-03-28

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Publication number Publication date
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