TWD167109S - 基板保持環 - Google Patents
基板保持環Info
- Publication number
- TWD167109S TWD167109S TW102307326F TW102307326F TWD167109S TW D167109 S TWD167109 S TW D167109S TW 102307326 F TW102307326 F TW 102307326F TW 102307326 F TW102307326 F TW 102307326F TW D167109 S TWD167109 S TW D167109S
- Authority
- TW
- Taiwan
- Prior art keywords
- retaining ring
- view
- substrate
- substrate retaining
- usage
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 5
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 238000005498 polishing Methods 0.000 abstract 1
- 238000007517 polishing process Methods 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Abstract
【物品用途】;本設計的物品是基板保持環,如「使用狀態參考圖」所示,應用於半導體等製造時的基板研磨工程中,將晶圓等基板保持在環內,用以研磨基板的單面。;【設計說明】;後視圖、右側視圖及左側視圖均與前視圖相同,皆予省略。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPD2013-10671F JP1494712S (zh) | 2013-05-15 | 2013-05-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
TWD167109S true TWD167109S (zh) | 2015-04-11 |
Family
ID=58418545
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW102307326F TWD167109S (zh) | 2013-05-15 | 2013-11-14 | 基板保持環 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP1494712S (zh) |
TW (1) | TWD167109S (zh) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11049760B2 (en) | 2016-03-04 | 2021-06-29 | Applied Materials, Inc. | Universal process kit |
USD931241S1 (en) | 2019-08-28 | 2021-09-21 | Applied Materials, Inc. | Lower shield for a substrate processing chamber |
USD933725S1 (en) | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD942516S1 (en) | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
US11996315B2 (en) | 2020-11-18 | 2024-05-28 | Applied Materials, Inc. | Thin substrate handling via edge clamping |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD981459S1 (en) | 2021-06-16 | 2023-03-21 | Ebara Corporation | Retaining ring for substrate |
-
2013
- 2013-05-15 JP JPD2013-10671F patent/JP1494712S/ja active Active
- 2013-11-14 TW TW102307326F patent/TWD167109S/zh unknown
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11049760B2 (en) | 2016-03-04 | 2021-06-29 | Applied Materials, Inc. | Universal process kit |
USD933725S1 (en) | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD942516S1 (en) | 2019-02-08 | 2022-02-01 | Applied Materials, Inc. | Process shield for a substrate processing chamber |
USD931241S1 (en) | 2019-08-28 | 2021-09-21 | Applied Materials, Inc. | Lower shield for a substrate processing chamber |
USD971167S1 (en) | 2019-08-28 | 2022-11-29 | Applied Materials, Inc. | Lower shield for a substrate processing chamber |
US11996315B2 (en) | 2020-11-18 | 2024-05-28 | Applied Materials, Inc. | Thin substrate handling via edge clamping |
Also Published As
Publication number | Publication date |
---|---|
JP1494712S (zh) | 2017-04-03 |
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