TWD179918S - 基板洗淨用滾子之部分 - Google Patents

基板洗淨用滾子之部分

Info

Publication number
TWD179918S
TWD179918S TW105301322F TW105301322F TWD179918S TW D179918 S TWD179918 S TW D179918S TW 105301322 F TW105301322 F TW 105301322F TW 105301322 F TW105301322 F TW 105301322F TW D179918 S TWD179918 S TW D179918S
Authority
TW
Taiwan
Prior art keywords
design
case
substrate
cleaning
article
Prior art date
Application number
TW105301322F
Other languages
English (en)
Inventor
Tomoatsu Ishibashi
Original Assignee
荏原製作所股份有限公司
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 荏原製作所股份有限公司, Ebara Corp filed Critical 荏原製作所股份有限公司
Publication of TWD179918S publication Critical patent/TWD179918S/zh

Links

Abstract

【物品用途】;本設計的物品是基板洗淨用滾子，是對施以研磨處理後之基板(半導體晶圓等)的表面附著的研磨屑等洗淨之用。例如：使一對本物品於洗淨裝置中上下對向配置，該間隙配置基板，使本物品一邊迴轉、基板於水平面上迴轉來進行洗淨處理。;【設計說明】;後視圖與前視圖對稱、仰視圖與俯視圖對稱，均省略之。;圖式所揭露之實線部分，為本案主張設計之部分，虛線部分為本案不主張設計之部分。;圖式所揭露之一點鏈線，係界定本案所欲主張之範圍，該一點鏈線本身為本案不主張設計之部分。
TW105301322F 2015-09-24 2016-03-15 基板洗淨用滾子之部分 TWD179918S (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-21002F JP1556809S (zh) 2015-09-24 2015-09-24

Publications (1)

Publication Number Publication Date
TWD179918S true TWD179918S (zh) 2016-12-01

Family

ID=56687127

Family Applications (1)

Application Number Title Priority Date Filing Date
TW105301322F TWD179918S (zh) 2015-09-24 2016-03-15 基板洗淨用滾子之部分

Country Status (3)

Country Link
US (1) USD799768S1 (zh)
JP (1) JP1556809S (zh)
TW (1) TWD179918S (zh)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD811454S1 (en) * 2016-08-25 2018-02-27 Sancilio & Company, Inc. Mold for a medical dosage form

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS596974A (ja) * 1982-07-05 1984-01-14 カネボウ株式会社 洗浄方法
ES2002406A6 (es) * 1985-09-20 1988-08-01 Uni Charm Corp Procedimiento para la fabricacion de generos no tejidos dotados de aberturas
US5401231A (en) * 1993-08-23 1995-03-28 Hebert; Jacques O. Texturing roller
US6027573A (en) * 1994-10-06 2000-02-22 Xomed Surgical Products, Inc. Industrial cleaning sponge apparatus and method for extracting residue from a sponge material
US6080092A (en) * 1994-10-06 2000-06-27 Xomed Surgical Products, Inc. Industrial cleaning sponge
US6004402A (en) * 1994-10-06 1999-12-21 Xomed Surgical Products, Inc. Method of cleaning silicon material with a sponge
US5675856A (en) * 1996-06-14 1997-10-14 Solid State Equipment Corp. Wafer scrubbing device
US5745945A (en) * 1996-06-28 1998-05-05 International Business Machines Corporation Brush conditioner for a semiconductor cleaning brush
DE69737926T2 (de) * 1996-10-21 2008-04-10 Ebara Corp. Reinigungsvorrichtung
US6502273B1 (en) * 1996-11-08 2003-01-07 Kanebo, Ltd. Cleaning sponge roller
JPH11179646A (ja) * 1997-12-19 1999-07-06 Speedfam Co Ltd 洗浄装置
US6070284A (en) * 1998-02-04 2000-06-06 Silikinetic Technology, Inc. Wafer cleaning method and system
US6182323B1 (en) * 1998-03-27 2001-02-06 Rippey Corporation Ultraclean surface treatment device
US6247197B1 (en) * 1998-07-09 2001-06-19 Lam Research Corporation Brush interflow distributor
US6299698B1 (en) * 1998-07-10 2001-10-09 Applied Materials, Inc. Wafer edge scrubber and method
US6202658B1 (en) * 1998-11-11 2001-03-20 Applied Materials, Inc. Method and apparatus for cleaning the edge of a thin disc
US6405399B1 (en) * 1999-06-25 2002-06-18 Lam Research Corporation Method and system of cleaning a wafer after chemical mechanical polishing or plasma processing
US6557202B1 (en) * 1999-12-03 2003-05-06 Lam Research Corporation Wafer scrubbing brush core having an internal motor and method of making the same
US6240588B1 (en) * 1999-12-03 2001-06-05 Lam Research Corporation Wafer scrubbing brush core
USD456667S1 (en) * 2001-01-12 2002-05-07 World Kitchen, Inc. Handle sleeve
US20020100132A1 (en) * 2001-01-30 2002-08-01 Mcmullen Daniel T. Porous polymeric substrate treatment device and method
US20020121289A1 (en) * 2001-03-05 2002-09-05 Applied Materials, Inc. Spray bar
US7955693B2 (en) * 2001-04-20 2011-06-07 Tolland Development Company, Llc Foam composition roller brush with embedded mandrel
USD482566S1 (en) * 2001-05-21 2003-11-25 Mr. Bar-B-Q-, Inc. Hand grip for barbecue tool
US6904637B2 (en) * 2001-10-03 2005-06-14 Applied Materials, Inc. Scrubber with sonic nozzle
US6616516B1 (en) * 2001-12-13 2003-09-09 Lam Research Corporation Method and apparatus for asymmetric processing of front side and back side of semiconductor substrates
US20050109371A1 (en) * 2003-10-27 2005-05-26 Applied Materials, Inc. Post CMP scrubbing of substrates
JP4813185B2 (ja) * 2006-01-17 2011-11-09 富士通セミコンダクター株式会社 ウェハの洗浄装置及び洗浄方法
US7735177B1 (en) * 2006-02-10 2010-06-15 Lam Research Corporation Brush core assembly
USD622920S1 (en) * 2007-05-02 2010-08-31 Entegris Corporation Cleaning sponge roller
USD682497S1 (en) * 2010-12-21 2013-05-14 Entegris, Inc. Substrate cleaning brush
TWD147969S (zh) * 2011-04-20 2012-07-01 荏原製作所股份有限公司 半導體晶圓洗淨用滾子

Also Published As

Publication number Publication date
USD799768S1 (en) 2017-10-10
JP1556809S (zh) 2016-08-22

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