USD940670S1 - Retainer ring for chemical mechanical polishing device - Google Patents
Retainer ring for chemical mechanical polishing device Download PDFInfo
- Publication number
- USD940670S1 USD940670S1 US29/728,917 US202029728917F USD940670S US D940670 S1 USD940670 S1 US D940670S1 US 202029728917 F US202029728917 F US 202029728917F US D940670 S USD940670 S US D940670S
- Authority
- US
- United States
- Prior art keywords
- mechanical polishing
- chemical mechanical
- retainer ring
- polishing device
- view
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
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Description
The broken lines in the figures depict portions of the retainer ring for chemical mechanical polishing device which form no part of the claimed design.
Claims (1)
- I claim the ornamental design for a retainer ring for chemical mechanical polishing device, as shown and described.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR30-2019-0046507 | 2019-09-26 | ||
KR20190046507 | 2019-09-26 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD940670S1 true USD940670S1 (en) | 2022-01-11 |
Family
ID=79168095
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/728,917 Active USD940670S1 (en) | 2019-09-26 | 2020-03-23 | Retainer ring for chemical mechanical polishing device |
Country Status (1)
Country | Link |
---|---|
US (1) | USD940670S1 (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD962184S1 (en) * | 2019-07-11 | 2022-08-30 | Kokusai Electric Corporation | Retainer plate of top heater for wafer processing furnace |
USD962183S1 (en) * | 2019-07-11 | 2022-08-30 | Kokusai Electric Corporation | Retainer plate of top heater for wafer processing furnace |
USD981459S1 (en) * | 2021-06-16 | 2023-03-21 | Ebara Corporation | Retaining ring for substrate |
Citations (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040065412A1 (en) * | 2002-10-02 | 2004-04-08 | Ensinger Kunststofftechnologie Gbr | Retaining ring for holding semiconductor wafers in a chemical mechanical polishing apparatus |
US20040077167A1 (en) * | 2002-10-11 | 2004-04-22 | Willis George D. | Retaining ring for use on a carrier of a polishing apparatus |
US20080171500A1 (en) * | 2007-01-16 | 2008-07-17 | Tokyo Seimitsu Co., Ltd | Retainer ring for polishing head |
US20110065368A1 (en) * | 2009-09-16 | 2011-03-17 | SPM Technology, Inc. | Retaining ring for chemical mechanical polishing |
US20120309276A1 (en) * | 2011-05-31 | 2012-12-06 | Kim Choon-Goang | Retainer rings of chemical mechanical polishing apparatus and methods of manufacturing the same |
USD716742S1 (en) * | 2013-09-13 | 2014-11-04 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
US20150050870A1 (en) * | 2013-08-13 | 2015-02-19 | Cnus Co., Ltd. | Retainer ring structure for chemical-mechanical polishing machine |
USD724553S1 (en) * | 2013-09-13 | 2015-03-17 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
US9227297B2 (en) * | 2013-03-20 | 2016-01-05 | Applied Materials, Inc. | Retaining ring with attachable segments |
USD766849S1 (en) * | 2013-05-15 | 2016-09-20 | Ebara Corporation | Substrate retaining ring |
USD767234S1 (en) * | 2015-03-02 | 2016-09-20 | Entegris, Inc. | Wafer support ring |
USD783922S1 (en) * | 2014-12-08 | 2017-04-11 | Entegris, Inc. | Wafer support ring |
USD794585S1 (en) * | 2015-10-06 | 2017-08-15 | Ebara Corporation | Retainer ring for substrate |
USD799437S1 (en) * | 2015-08-25 | 2017-10-10 | Ebara Corporation | Substrate retaining ring |
USD815385S1 (en) * | 2016-10-13 | 2018-04-10 | Entegris, Inc. | Wafer support ring |
US20180264621A1 (en) * | 2014-12-08 | 2018-09-20 | Hyun Jeong Yoo | Retainer ring for carrier head for chemical polishing apparatus and carrier head comprising same |
USD917825S1 (en) * | 2019-07-16 | 2021-04-27 | Entegris, Inc. | Wafer support ring |
-
2020
- 2020-03-23 US US29/728,917 patent/USD940670S1/en active Active
Patent Citations (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040065412A1 (en) * | 2002-10-02 | 2004-04-08 | Ensinger Kunststofftechnologie Gbr | Retaining ring for holding semiconductor wafers in a chemical mechanical polishing apparatus |
US20040077167A1 (en) * | 2002-10-11 | 2004-04-22 | Willis George D. | Retaining ring for use on a carrier of a polishing apparatus |
US20080171500A1 (en) * | 2007-01-16 | 2008-07-17 | Tokyo Seimitsu Co., Ltd | Retainer ring for polishing head |
US20110065368A1 (en) * | 2009-09-16 | 2011-03-17 | SPM Technology, Inc. | Retaining ring for chemical mechanical polishing |
US8517803B2 (en) * | 2009-09-16 | 2013-08-27 | SPM Technology, Inc. | Retaining ring for chemical mechanical polishing |
US20120309276A1 (en) * | 2011-05-31 | 2012-12-06 | Kim Choon-Goang | Retainer rings of chemical mechanical polishing apparatus and methods of manufacturing the same |
US9227297B2 (en) * | 2013-03-20 | 2016-01-05 | Applied Materials, Inc. | Retaining ring with attachable segments |
USD766849S1 (en) * | 2013-05-15 | 2016-09-20 | Ebara Corporation | Substrate retaining ring |
USD793976S1 (en) * | 2013-05-15 | 2017-08-08 | Ebara Corporation | Substrate retaining ring |
US20150050870A1 (en) * | 2013-08-13 | 2015-02-19 | Cnus Co., Ltd. | Retainer ring structure for chemical-mechanical polishing machine |
USD724553S1 (en) * | 2013-09-13 | 2015-03-17 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
USD716742S1 (en) * | 2013-09-13 | 2014-11-04 | Asm Ip Holding B.V. | Substrate supporter for semiconductor deposition apparatus |
USD783922S1 (en) * | 2014-12-08 | 2017-04-11 | Entegris, Inc. | Wafer support ring |
US20180264621A1 (en) * | 2014-12-08 | 2018-09-20 | Hyun Jeong Yoo | Retainer ring for carrier head for chemical polishing apparatus and carrier head comprising same |
USD767234S1 (en) * | 2015-03-02 | 2016-09-20 | Entegris, Inc. | Wafer support ring |
USD799437S1 (en) * | 2015-08-25 | 2017-10-10 | Ebara Corporation | Substrate retaining ring |
USD794585S1 (en) * | 2015-10-06 | 2017-08-15 | Ebara Corporation | Retainer ring for substrate |
USD815385S1 (en) * | 2016-10-13 | 2018-04-10 | Entegris, Inc. | Wafer support ring |
USD917825S1 (en) * | 2019-07-16 | 2021-04-27 | Entegris, Inc. | Wafer support ring |
Non-Patent Citations (2)
Title |
---|
"Kyodo International CMP Retaining Ring", Aug. 27, 2015, Kyodo-Inc.co.jp, site visited Nov. 1, 2021: https://web.archive.org/web/20150827052115/http://www.kyodo-inc.co.jp/english/electronics/parts/index.html (Year: 2015). * |
"Novellus Wafer Retaining Ring CMP Polishing", Apr. 17, 2017, Ebay.com, site visited Nov. 1, 2021: https://www.ebay.com/itm/301515679216 (Year: 2017). * |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD962184S1 (en) * | 2019-07-11 | 2022-08-30 | Kokusai Electric Corporation | Retainer plate of top heater for wafer processing furnace |
USD962183S1 (en) * | 2019-07-11 | 2022-08-30 | Kokusai Electric Corporation | Retainer plate of top heater for wafer processing furnace |
USD981459S1 (en) * | 2021-06-16 | 2023-03-21 | Ebara Corporation | Retaining ring for substrate |
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Legal Events
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Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: SMALL ENTITY |
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FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO SMALL (ORIGINAL EVENT CODE: SMAL); ENTITY STATUS OF PATENT OWNER: SMALL ENTITY |