JP6840978B2 - スクリーン印刷装置、及び印刷層付き基材の製造方法 - Google Patents

スクリーン印刷装置、及び印刷層付き基材の製造方法 Download PDF

Info

Publication number: JP6840978B2
Authority: JP; Japan
Prior art keywords: printing; screen; base material; density portion; pattern
Prior art date: 2015-11-18
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Active

Application number

JP2016196607A

Other languages

English (en)

Japanese (ja)

Other versions

JP2017094720A (ja

Inventor

伊藤　淳

淳伊藤

知也渡部

英伸渡辺

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

AGC Inc

Original Assignee

Asahi Glass Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2015-11-18

Filing date

2016-10-04

Publication date

2021-03-10

2016-10-04 Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd

2017-06-01 Publication of JP2017094720A publication Critical patent/JP2017094720A/ja

2021-03-10 Application granted granted Critical

2021-03-10 Publication of JP6840978B2 publication Critical patent/JP6840978B2/ja

Status Active legal-status Critical Current

2036-10-04 Anticipated expiration legal-status Critical

Links

238000007639 printing Methods 0.000 title claims description 227
238000007650 screen-printing Methods 0.000 title claims description 113
239000000463 material Substances 0.000 title claims description 100
238000004519 manufacturing process Methods 0.000 title claims description 25
238000012937 correction Methods 0.000 claims description 64
NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 28
238000000034 method Methods 0.000 claims description 18
238000011144 upstream manufacturing Methods 0.000 claims description 14
238000003825 pressing Methods 0.000 claims description 7
230000005489 elastic deformation Effects 0.000 claims description 5
238000010586 diagram Methods 0.000 description 14
230000002093 peripheral effect Effects 0.000 description 11
239000000758 substrate Substances 0.000 description 6
229920005989 resin Polymers 0.000 description 5
239000011347 resin Substances 0.000 description 5
230000000740 bleeding effect Effects 0.000 description 4
230000007423 decrease Effects 0.000 description 4
238000013459 approach Methods 0.000 description 3
238000013461 design Methods 0.000 description 3
238000012545 processing Methods 0.000 description 3
238000000926 separation method Methods 0.000 description 3
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
239000004677 Nylon Substances 0.000 description 2
238000005452 bending Methods 0.000 description 2
229910052799 carbon Inorganic materials 0.000 description 2
230000005611 electricity Effects 0.000 description 2
229920001778 nylon Polymers 0.000 description 2
230000003068 static effect Effects 0.000 description 2
229920001342 Bakelite® Polymers 0.000 description 1
229920005177 Duracon® POM Polymers 0.000 description 1
IDCBOTIENDVCBQ-UHFFFAOYSA-N TEPP Chemical compound CCOP(=O)(OCC)OP(=O)(OCC)OCC IDCBOTIENDVCBQ-UHFFFAOYSA-N 0.000 description 1
BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
239000000853 adhesive Substances 0.000 description 1
230000001070 adhesive effect Effects 0.000 description 1
239000004637 bakelite Substances 0.000 description 1
230000008602 contraction Effects 0.000 description 1
230000003247 decreasing effect Effects 0.000 description 1
230000006866 deterioration Effects 0.000 description 1
239000000428 dust Substances 0.000 description 1
238000005530 etching Methods 0.000 description 1
238000010021 flat screen printing Methods 0.000 description 1
-1 for example Polymers 0.000 description 1
239000007769 metal material Substances 0.000 description 1
229920002120 photoresistant polymer Polymers 0.000 description 1
229920000728 polyester Polymers 0.000 description 1
229910001220 stainless steel Inorganic materials 0.000 description 1
239000010935 stainless steel Substances 0.000 description 1
239000000126 substance Substances 0.000 description 1
238000012546 transfer Methods 0.000 description 1

Images

Classifications

- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F15/00—Screen printers
- B41F15/14—Details
- B41F15/44—Squeegees or doctors
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41F—PRINTING MACHINES OR PRESSES
- B41F15/00—Screen printers
- B41F15/14—Details
- B41F15/34—Screens, Frames; Holders therefor
- B41F15/36—Screens, Frames; Holders therefor flat

Landscapes

Engineering & Computer Science (AREA)
Mechanical Engineering (AREA)
Screen Printers (AREA)
Printing Methods (AREA)
Printing Plates And Materials Therefor (AREA)
Manufacturing Of Printed Wiring (AREA)

JP2016196607A 2015-11-18 2016-10-04 スクリーン印刷装置、及び印刷層付き基材の製造方法 Active JP6840978B2 (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP2015226118		2015-11-18
JP2015226118		2015-11-18

Publications (2)

Publication Number	Publication Date
JP2017094720A JP2017094720A (ja)	2017-06-01
JP6840978B2 true JP6840978B2 (ja)	2021-03-10

Family

ID=58803058

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP2016196607A Active JP6840978B2 (ja)	2015-11-18	2016-10-04	スクリーン印刷装置、及び印刷層付き基材の製造方法

Country Status (3)

Country	Link
JP (1)	JP6840978B2 (zh)
CN (1)	CN107031176B (zh)
TW (1)	TWI701151B (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2019018384A (ja) *	2017-07-12	2019-02-07	サカエ理研工業株式会社	スクリーン印刷機
JP6959636B2 (ja) *	2017-08-22	2021-11-02	マイクロ・テック株式会社	スクリーン印刷装置及びスクリーン印刷方法
CN107498987A (zh) *	2017-08-31	2017-12-22	广东星弛光电科技有限公司	一种弧面块体丝网印刷冶具及其使用方法
WO2020121395A1 (ja) *	2018-12-11	2020-06-18	マイクロ・テック株式会社	印刷製版、印刷機、印刷製版の製造方法、及び、印刷方法
CN110695811B (zh) *	2019-10-28	2021-05-04	瑞安市联胜科技有限公司	一种减轻眼镜框体受压变形程度的夹持制造设备
CN110641171A (zh) *	2019-10-29	2020-01-03	广州柳川智能装备有限公司	一种针对异形瓶的印刷补偿工艺
CN110641172B (zh) *	2019-10-29	2021-07-20	广州柳川智能装备有限公司	一种异形瓶印刷的智能控制***及其丝印方法
CN110757945B (zh) *	2019-12-02	2021-08-20	信利（惠州）智能显示有限公司	印刷丝网及印刷装置
CN111559161A (zh) *	2020-04-07	2020-08-21	苏州腾晖光伏技术有限公司	一种选择性发射极太阳能电池片的正面电极网版
CN112078262B (zh) *	2020-08-27	2022-04-08	金邦达有限公司	丝网印刷品的制作方法及智能卡制作方法
CN116529583A (zh) *	2020-11-19	2023-08-01	株式会社岛津制作所	应力发光材料的制造方法、应力发光体的制造方法、应变测定方法、应力发光体、应力发光涂料和应力发光体的制造装置
CN112937086B (zh) *	2021-02-23	2023-04-28	珠海市鑫时代科技有限公司	一种高效纸质打印设备
KR20240053212A (ko) *	2022-10-17	2024-04-24	한국기계연구원	인공지능을 이용한 스크린 프린팅 패턴 학습 및 보정 방법과 이를 수행하는 시스템 및 프로그램

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JP2717707B2 (ja) *	1989-07-14	1998-02-25	株式会社村田製作所	スクリーン印刷方法、印刷版の製造方法及びそれらのための装置
JPH0395236U (zh) *	1990-01-18	1991-09-27
JPH06340054A (ja) *	1993-06-01	1994-12-13	Tokyo Process Service Kk	スクリーン印刷方法
JP3310540B2 (ja) *	1996-05-22	2002-08-05	松下電器産業株式会社	スクリーン印刷方法とその装置
JP3072830B2 (ja) *	1996-07-06	2000-08-07	アオイ電子株式会社	印刷用メッシュスクリーン
JP2002154281A (ja) *	2000-11-21	2002-05-28	Tdk Corp	スクリーン印刷版及び印刷方法
US7182019B2 (en) *	2004-01-23	2007-02-27	Exatec, Llc	Screen printing apparatus
JP4893056B2 (ja) *	2006-03-28	2012-03-07	株式会社日立プラントテクノロジー	スクリーン印刷装置
JP5084174B2 (ja) *	2006-05-25	2012-11-28	株式会社村田製作所	スクリーン印刷装置
JP5126170B2 (ja) *	2009-07-08	2013-01-23	パナソニック株式会社	スクリーン印刷装置およびスクリーン印刷方法
TW201125734A (en) *	2010-01-27	2011-08-01	Ming Sheng Net Plate Printing Machinery Co Ltd	Screen plate and manufacturing method thereof
US8561535B2 (en) *	2010-02-27	2013-10-22	Corning Incorporated	Method of screen printing on 3D glass articles
CN102615953B (zh) *	2012-04-11	2014-02-12	上海与德通讯技术有限公司	单曲面和近似单曲面类产品表面的丝网印刷网版及工艺
DE202012102726U1 (de) *	2012-07-20	2013-10-22	Joachim Sonneberger	Geschwungene Möbelverbundbauplatte
TWM504010U (zh) *	2015-03-31	2015-07-01	Brave C & H Supply Co Ltd	網版印刷結構改良

2016
- 2016-10-04 JP JP2016196607A patent/JP6840978B2/ja active Active
- 2016-11-18 CN CN201611035486.8A patent/CN107031176B/zh active Active
- 2016-11-18 TW TW105137802A patent/TWI701151B/zh active

Also Published As

Publication number	Publication date
JP2017094720A (ja)	2017-06-01
CN107031176B (zh)	2020-07-14
CN107031176A (zh)	2017-08-11
TWI701151B (zh)	2020-08-11
TW201731701A (zh)	2017-09-16

Legal Events

Date	Code	Title	Description
2019-08-07	A621	Written request for application examination	Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20190807
2020-07-03	A977	Report on retrieval	Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20200703
2020-07-14	A131	Notification of reasons for refusal	Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20200714
2020-09-11	A521	Request for written amendment filed	Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20200911
2021-01-06	TRDD	Decision of grant or rejection written
2021-01-19	A01	Written decision to grant a patent or to grant a registration (utility model)	Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20210119
2021-02-22	A61	First payment of annual fees (during grant procedure)	Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20210201
2021-02-22	R150	Certificate of patent or registration of utility model	Ref document number: 6840978 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150
2024-01-24	R250	Receipt of annual fees	Free format text: JAPANESE INTERMEDIATE CODE: R250

Publication	Publication Date	Title
JP6840978B2 (ja)	2021-03-10	スクリーン印刷装置、及び印刷層付き基材の製造方法
JP6487271B2 (ja)	2019-03-20	三次元プリント装置
US20180342410A1 (en)	2018-11-29	Amelioration of global wafer distortion based on determination of localized distortions of a semiconductor wafer
CN106017313B (zh)	2020-08-07	边缘检测偏差校正值计算、边缘检测偏差校正方法及设备
JP6392395B1 (ja)	2018-09-19	平面度測定方法及びピン高さ調整方法
CN1664697A (zh)	2005-09-07	掩模基板信息生成方法和掩模基板的制造方法
JP2016213458A (ja)	2016-12-15	インプリント装置、基板搬送装置、インプリント方法および物品の製造方法
CN107732012B (zh)	2019-06-25	张网设备
JP2016201455A (ja)	2016-12-01	インプリント装置、および物品の製造方法
JP6600391B2 (ja)	2019-10-30	ナノインプリントリソグラフィにおけるテンプレートの歪みのリアルタイム補正
WO2021072681A1 (zh)	2021-04-22	掩模板及其制作方法、显示基板的制作方法
US20190033709A1 (en)	2019-01-31	Overlay improvement in nanoimprint lithography
JP2007512551A (ja)	2007-05-17	パターン生成装置及び表面の物理特性を測定するための装置
JP2012132786A (ja)	2012-07-12	ひずみ計測方法及びひずみ計測システム
JP2018041802A (ja)	2018-03-15	電子部品の実装方法及び実装装置
WO2019062547A1 (zh)	2019-04-04	刮刀、包括刮刀的装置以及印刷玻璃胶的方法
TWI492792B (zh)	2015-07-21	Substrate manufacturing method and substrate manufacturing apparatus
JP6838393B2 (ja)	2021-03-03	ガラス基板の検査方法および製造方法
JP6375718B2 (ja)	2018-08-22	インプリントモールド用基材、インプリントモールド及びそれらの製造方法、並びにインプリントモールド用基材の評価方法
JP6580407B2 (ja)	2019-09-25	位置計測装置、データ補正装置、位置計測方法、およびデータ補正方法
JP2009503820A (ja)	2009-01-29	型および物品を整合配置する方法
JP2019054099A (ja)	2019-04-04	インプリント装置、インプリント方法および半導体装置の製造方法
JP6225594B2 (ja)	2017-11-08	ハイトデータ処理装置、ハイトデータ処理方法、プログラム、記憶媒体、エンボス版製造方法、シート製造方法
CN109957503B (zh)	2022-05-31	一种用于高通量基因测序设备的工艺芯片及其应用
JP2019024089A (ja)	2019-02-14	インプリント方法、インプリント装置および物品の製造方法