KR950019953A - 투영노광장치 - Google Patents

투영노광장치 Download PDF

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KR950019953A
KR950019953A KR1019940035903A KR19940035903A KR950019953A KR 950019953 A KR950019953 A KR 950019953A KR 1019940035903 A KR1019940035903 A KR 1019940035903A KR 19940035903 A KR19940035903 A KR 19940035903A KR 950019953 A KR950019953 A KR 950019953A
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South Korea
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optical system
projection
optical
exposure apparatus
projection exposure
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KR1019940035903A
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English (en)
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KR100396872B1 (ko
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토시히로 사사야
카주마사 엔도
카주오 우시다
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오노 시게오
가부시끼가이샤 니콘
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Publication of KR950019953A publication Critical patent/KR950019953A/ko
Priority to KR1020020044967A priority Critical patent/KR100422824B1/ko
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Publication of KR100396872B1 publication Critical patent/KR100396872B1/ko

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21V—FUNCTIONAL FEATURES OR DETAILS OF LIGHTING DEVICES OR SYSTEMS THEREOF; STRUCTURAL COMBINATIONS OF LIGHTING DEVICES WITH OTHER ARTICLES, NOT OTHERWISE PROVIDED FOR
    • F21V5/00—Refractors for light sources
    • F21V5/04—Refractors for light sources of lens shape
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0025—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for optical correction, e.g. distorsion, aberration
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B3/00—Simple or compound lenses
    • G02B3/02—Simple or compound lenses with non-spherical faces
    • G02B3/06—Simple or compound lenses with non-spherical faces with cylindrical or toric faces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21W—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO USES OR APPLICATIONS OF LIGHTING DEVICES OR SYSTEMS
    • F21W2131/00—Use or application of lighting devices or systems not provided for in codes F21W2102/00-F21W2121/00
    • F21W2131/10—Outdoor lighting
    • F21W2131/103—Outdoor lighting of streets or roads
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F21—LIGHTING
    • F21Y—INDEXING SCHEME ASSOCIATED WITH SUBCLASSES F21K, F21L, F21S and F21V, RELATING TO THE FORM OR THE KIND OF THE LIGHT SOURCES OR OF THE COLOUR OF THE LIGHT EMITTED
    • F21Y2101/00—Point-like light sources

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Lenses (AREA)

Abstract

본 발명은 투영광학계에서 잔존하고 투영 광학계의 광축에 대하여 회전 비대칭인 광학적 특성을 조정할 수 있는 내구성 및 재생성이 우수한 고성능 투영 노광 장치에 관한 것이다.본 발명의 투영 노광장치는 조명 광학계, 투영광학계 및 광학 수단으로 이루어진다. 조명 광학계는 제1물체를 조명하고 투영 광학계는 제1물체의 상을 소정의 배율로 제2물체에 투영한다. 광학 수단은 제1물체와 제2물체 사이에 배치되며 투영 광학계의 광축에 대하여 회전 비대칭 파워를 갖는다. 결과적으로 광학 수단은 투영광학계에 잔존하는, 투영광학계의 광축에 대하여 회전 광학 특성을 조정할 수 있다.

Description

투영노광장치
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음
제12도는 본 발명에 의한 실시예의 전체구성을 나타내는 도면이다.

Claims (16)

  1. 제1물체를 조명하는 조명 광학계;상기 조명 광학계에 의해 조명된 상기 제1물체의 상을 소정의 배율하에서 제2물체에 투영하는 투영 광학계;및 상기 제1물체와 상기 제2물체 사이에 배치되어 상기 투영 광학계의 광축에 대하여 회전 비대칭의 파워를 지니고, 상기 투영광학계에 잔존하는 상기 투영 광학계의 광축에 대해 회전 비대칭의 광학 특성을 보정하기 위한 광학 수단으로 이루어짐을 특징으로 하는 투영 노광 장치.
  2. 제1항에 있어서, 광학 수단이 상기 투영 광학계의 광측 주위를 회전할 수 있도록 배치됨을 특징으로 하는 투영 노광 장치.
  3. 제1항에 있어서, 광학 수단이 상기 투영 광학계의 광측을 따라 이동할 수 있도록 배치됨을 특징으로 하는 투영 노광 장치.
  4. 제1항에 있어서, 광학 수단이 직각인 방향으로 상이한 파워를 갖는 토릭형 광학 부재로 이루어짐을 특징으로 하는 투영 노광 장치.
  5. 제4항에 있어서, 토릭형 광학 부재가 수직인 방향으로 상이한 파워를 갖는 제1및 제2토릭형 광학소자로 이루어지며, 상기 제1및 제2토릭형 광학소자는 상기 투영 광학계의 광축 주위를 서로 회전할수 있도록 배열됨을 특징으로 하는 투영 노광 장치.
  6. 제4항에 있어서, 토릭형 광학 부재가 수직인 방향으로 상이한 파워를 갖는 제1및 제2토릭형 광학소자로 이루어지며, 상기 제1및 제2토릭형 광학소자는 상기 투영 광학계의 광축을 따라 서로 이동할 수 있도록 배열됨을 특징으로 하는 투영 노광 장치.
  7. 제1항에 있어서, 광학 수단이 상기 제1및 제2 투영광학계 사이, 상기 투영 광학계 내부, 또는 상기 투영광학계와 상기 제2물체 사이에 배치됨을 특징으로 하는 투영 노광 장치.
  8. 제1항에 있어서, 광학 수단이 상기 투영 광학계의 동공면 또는 그 근처에 배치됨을 특징으로 하는 투영 노광 장치.
  9. 제4항에 있어서, 제1물체가 투영된 패턴이 그위에 형성되는 레티클임을 특징으로 하는 투영 노광 장치.
  10. 제1항에 있어서, 제2물체가 반도체 웨이퍼임을 특징으로 하는 투영 노광 장치.
  11. 제1물체를 조명하는 조명 광학계; 및 상기 조명 광학계에 의해 조명된 상기 제1물체의 상을 소정의 배율하에서 제2물체에 투영하는 투영 광학계로 이루어진 투영 노광 장치에 있어서, 상기 투영 광학계가 표면이 상기 투영 광학계의 결상 성능에 기여하는 렌즈로 이루어지며,상기 투영 광학계의 광축에 대하여 회전 비대칭 광학 특성을 보정하기 위한, 상기 투영 광학계의 광축에 대하여 회전 비대칭 파워를 갖는 회전 비대칭 영역을 가짐을 특징으로 하는 투영 노광 장치.
  12. 제11항에 있어서, 렌즈가 상기 투영 광학계의 광축 주위를 회전할 수 있도록 배열됨을 특징으로 하는 투영 노광 장치.
  13. 제11항에 있어서, 렌즈가 상기 투영 광학계의 광축을 따라서 이동할 수 있돌고 배열됨을 특징으로 하는 투영 노광 장치.
  14. 제11항에 있어서, 렌즈가 직각인 방향으로 각각 상이한 파워를 갖는 제1및 제2렌즈 소자로 이루어짐을 특징으로 하는 투영 노광 장치.
  15. 제11항에 있어서, 제1물체가 투영되는 패턴이 그위에 형성되는 레티클임을 특징으로 하는 투영 노광 장치.
  16. 제11항에 있어서, 제2물체가 반도체 웨이퍼임을 특징으로 하는 투영 노광 장치.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019940035903A 1993-12-22 1994-12-22 투영노광장치 KR100396872B1 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020020044967A KR100422824B1 (ko) 1993-12-22 2002-07-30 전사방법 및 노광방법

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP323721/1993 1993-12-22
JP93-323721 1993-12-22
JP32372193A JP3341269B2 (ja) 1993-12-22 1993-12-22 投影露光装置、露光方法、半導体の製造方法及び投影光学系の調整方法

Related Child Applications (2)

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KR1020020044967A Division KR100422824B1 (ko) 1993-12-22 2002-07-30 전사방법 및 노광방법
KR1020020044969A Division KR100508215B1 (ko) 1993-12-22 2002-07-30 보정부재 및 보정부재의 제조방법

Publications (2)

Publication Number Publication Date
KR950019953A true KR950019953A (ko) 1995-07-24
KR100396872B1 KR100396872B1 (ko) 2004-05-17

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ID=18157870

Family Applications (4)

Application Number Title Priority Date Filing Date
KR1019940035903A KR100396872B1 (ko) 1993-12-22 1994-12-22 투영노광장치
KR1020020044967A KR100422824B1 (ko) 1993-12-22 2002-07-30 전사방법 및 노광방법
KR1020020044969A KR100508215B1 (ko) 1993-12-22 2002-07-30 보정부재 및 보정부재의 제조방법
KR1020030066105A KR100487003B1 (ko) 1993-12-22 2003-09-24 투영노광장치

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Application Number Title Priority Date Filing Date
KR1020020044967A KR100422824B1 (ko) 1993-12-22 2002-07-30 전사방법 및 노광방법
KR1020020044969A KR100508215B1 (ko) 1993-12-22 2002-07-30 보정부재 및 보정부재의 제조방법
KR1020030066105A KR100487003B1 (ko) 1993-12-22 2003-09-24 투영노광장치

Country Status (5)

Country Link
US (3) US6262793B1 (ko)
EP (1) EP0660169B1 (ko)
JP (1) JP3341269B2 (ko)
KR (4) KR100396872B1 (ko)
DE (1) DE69424138T2 (ko)

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US20020054282A1 (en) 2002-05-09
DE69424138D1 (de) 2000-05-31
US6262793B1 (en) 2001-07-17
EP0660169A1 (en) 1995-06-28
EP0660169B1 (en) 2000-04-26
US6958803B2 (en) 2005-10-25
DE69424138T2 (de) 2000-09-28
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KR100508215B1 (ko) 2005-08-17
US20040046950A1 (en) 2004-03-11

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