JP6056770B2 - 基板処理装置、デバイス製造システム、及びデバイス製造方法 - Google Patents

基板処理装置、デバイス製造システム、及びデバイス製造方法 Download PDF

Info

Publication number
JP6056770B2
JP6056770B2 JP2013550164A JP2013550164A JP6056770B2 JP 6056770 B2 JP6056770 B2 JP 6056770B2 JP 2013550164 A JP2013550164 A JP 2013550164A JP 2013550164 A JP2013550164 A JP 2013550164A JP 6056770 B2 JP6056770 B2 JP 6056770B2
Authority
JP
Japan
Prior art keywords
illumination
projection
optical system
substrate
light beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2013550164A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO2013094286A1 (ja
Inventor
加藤　正紀
正紀 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of JPWO2013094286A1 publication Critical patent/JPWO2013094286A1/ja
Application granted granted Critical
Publication of JP6056770B2 publication Critical patent/JP6056770B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/22—Telecentric objectives or lens systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/008—Systems specially adapted to form image relays or chained systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/24—Curved surfaces

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lenses (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2013550164A 2011-12-20 2012-10-11 基板処理装置、デバイス製造システム、及びデバイス製造方法 Active JP6056770B2 (ja)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2011278290 2011-12-20
JP2011278290 2011-12-20
JP2012024058 2012-02-07
JP2012024058 2012-02-07
PCT/JP2012/076326 WO2013094286A1 (ja) 2011-12-20 2012-10-11 基板処理装置、デバイス製造システム、及びデバイス製造方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2016236579A Division JP6323542B2 (ja) 2011-12-20 2016-12-06 基板処理装置及びデバイス製造方法

Publications (2)

Publication Number Publication Date
JPWO2013094286A1 JPWO2013094286A1 (ja) 2015-04-27
JP6056770B2 true JP6056770B2 (ja) 2017-01-11

Family

ID=48668190

Family Applications (6)

Application Number Title Priority Date Filing Date
JP2013550164A Active JP6056770B2 (ja) 2011-12-20 2012-10-11 基板処理装置、デバイス製造システム、及びデバイス製造方法
JP2016236579A Active JP6323542B2 (ja) 2011-12-20 2016-12-06 基板処理装置及びデバイス製造方法
JP2017221825A Active JP6436216B2 (ja) 2011-12-20 2017-11-17 投影露光装置
JP2017221826A Active JP6512265B2 (ja) 2011-12-20 2017-11-17 投影露光装置及びデバイス製造方法
JP2019071211A Active JP6677333B2 (ja) 2011-12-20 2019-04-03 円筒マスク露光装置
JP2020035758A Active JP6927348B2 (ja) 2011-12-20 2020-03-03 パターン形成方法

Family Applications After (5)

Application Number Title Priority Date Filing Date
JP2016236579A Active JP6323542B2 (ja) 2011-12-20 2016-12-06 基板処理装置及びデバイス製造方法
JP2017221825A Active JP6436216B2 (ja) 2011-12-20 2017-11-17 投影露光装置
JP2017221826A Active JP6512265B2 (ja) 2011-12-20 2017-11-17 投影露光装置及びデバイス製造方法
JP2019071211A Active JP6677333B2 (ja) 2011-12-20 2019-04-03 円筒マスク露光装置
JP2020035758A Active JP6927348B2 (ja) 2011-12-20 2020-03-03 パターン形成方法

Country Status (5)

Country Link
JP (6) JP6056770B2 (zh)
KR (5) KR101961605B1 (zh)
CN (3) CN105425553B (zh)
TW (5) TWI648601B (zh)
WO (1) WO2013094286A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019113867A (ja) * 2011-12-20 2019-07-11 株式会社ニコン 円筒マスク露光装置

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101880792B1 (ko) * 2012-07-13 2018-07-20 가부시키가이샤 니콘 기판 처리 장치 및 디바이스 제조 방법
JP6160620B2 (ja) * 2012-08-06 2017-07-12 株式会社ニコン 処理装置およびデバイス製造方法
CN104885012B (zh) * 2012-11-06 2017-07-28 株式会社尼康 偏振光分束器、基板处理装置、器件制造***及器件制造方法
JP6217651B2 (ja) * 2012-12-18 2017-10-25 株式会社ニコン 基板処理装置、デバイス製造システム及びデバイス製造方法
CN110451316B (zh) * 2014-09-04 2021-01-05 株式会社尼康 基板处理装置
TW201624142A (zh) * 2014-09-26 2016-07-01 Orc Mfg Co Ltd 直接曝光裝置
CN106292187A (zh) * 2015-05-13 2017-01-04 鸿富锦精密工业（深圳）有限公司 曝光方法
US10983389B2 (en) 2016-03-04 2021-04-20 Applied Materials, Inc. Wire grid polarizer manufacturing method
JP6700936B2 (ja) * 2016-04-25 2020-05-27 キヤノン株式会社 インプリント装置、インプリント方法、および物品の製造方法
EP3485322A4 (en) * 2016-07-15 2020-08-19 Light Field Lab, Inc. SELECTIVE PROPAGATION OF ENERGY IN A LUMINOUS FIELD AND HOLOGRAPHIC WAVE GUIDE NETWORKS
KR101856500B1 (ko) * 2016-07-26 2018-06-21 재단법인 대구경북첨단의료산업진흥재단 레이저 가공된 포토마스크를 이용한 미세유체칩 제조방법
AU2019206621A1 (en) 2018-01-14 2020-07-30 Light Field Lab, Inc. Systems and methods for transverse energy localization in energy relays using ordered structures
DE102019128198B3 (de) * 2019-10-18 2021-02-25 Laser Imaging Systems Gmbh Vorrichtung zur Mustereinbringung mittels Strahlung an einem aufgewickelten Endlossubstrat
TWI730831B (zh) * 2020-07-02 2021-06-11 光群雷射科技股份有限公司 增亮膜的轉印式製造方法及增亮膜
JP2022023357A (ja) 2020-07-27 2022-02-08 デンカ株式会社 シグナルの低下を改善した検査試薬

Family Cites Families (46)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE159457T1 (de) * 1992-06-11 1997-11-15 Zed Instr Ltd Druckkopf
JP3724517B2 (ja) * 1995-01-18 2005-12-07 株式会社ニコン 露光装置
JP3287698B2 (ja) * 1994-06-23 2002-06-04 キヤノン株式会社 走査映像装置
JP3359127B2 (ja) * 1993-10-08 2002-12-24 キヤノン株式会社 眼底カメラ
JP3448663B2 (ja) * 1994-05-13 2003-09-22 株式会社ニコン 投影露光装置
JPH0864497A (ja) * 1994-08-23 1996-03-08 Nikon Corp 投影露光装置
JPH11219892A (ja) * 1998-02-04 1999-08-10 Nikon Corp 走査型露光装置及びその視野絞り位置の測定方法
US6274294B1 (en) * 1999-02-03 2001-08-14 Electroformed Stents, Inc. Cylindrical photolithography exposure process and apparatus
JP3376961B2 (ja) 1999-06-08 2003-02-17 ウシオ電機株式会社 マスクを移動させて位置合わせを行う露光装置
WO2001075501A1 (fr) * 2000-03-31 2001-10-11 Nikon Corporation Procede et dispositif de soutien d'un element optique, dispositif optique, appareil d'exposition, et procede de fabrication d'un dispositif
TW556044B (en) 2001-02-15 2003-10-01 Sipix Imaging Inc Process for roll-to-roll manufacture of a display by synchronized photolithographic exposure on a substrate web
DE10233491B4 (de) 2002-07-24 2012-12-20 Heidelberger Druckmaschinen Ag Kompakte Einrichtung zur Bebilderung einer Druckform
JP4218418B2 (ja) * 2003-05-23 2009-02-04 ウシオ電機株式会社 帯状ワークの両面投影露光装置
JP4665759B2 (ja) * 2003-06-06 2011-04-06 株式会社ニコン 光学素子保持装置、鏡筒、露光装置、及びデバイスの製造方法
US9307648B2 (en) * 2004-01-21 2016-04-05 Microcontinuum, Inc. Roll-to-roll patterning of transparent and metallic layers
KR101101493B1 (ko) * 2004-03-30 2012-01-03 칼 짜이스 에스엠티 게엠베하 투영 대물렌즈, 투영 노광 장치 및 마이크로리소그래피용반사형 레티클
JP2006098719A (ja) * 2004-09-29 2006-04-13 Fuji Photo Film Co Ltd 露光装置
SG149819A1 (en) * 2004-09-30 2009-02-27 Nikon Corp Projection optical device and exposure apparatus
US7375795B2 (en) * 2004-12-22 2008-05-20 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US8383330B2 (en) * 2005-09-07 2013-02-26 Fujifilm Corporation Pattern exposure method and pattern exposure apparatus
JP5025157B2 (ja) * 2005-09-29 2012-09-12 大日本スクリーン製造株式会社 画像記録装置および画像記録方法
FR2893610B1 (fr) * 2005-11-23 2008-07-18 Saint Gobain Procede de structuration de surface d'un produit verrier, produit verrier a surface structuree et utilisations
JP2007227438A (ja) * 2006-02-21 2007-09-06 Nikon Corp 露光装置及び方法並びに光露光用マスク
JP4952182B2 (ja) * 2006-03-20 2012-06-13 株式会社ニコン 走査型露光装置、マイクロデバイスの製造方法、走査露光方法、及びマスク
JP5114061B2 (ja) * 2006-04-26 2013-01-09 株式会社オーク製作所 投影露光装置
CN100529970C (zh) * 2006-04-26 2009-08-19 株式会社Orc制作所 投影曝光装置
JP4984631B2 (ja) * 2006-04-28 2012-07-25 株式会社ニコン 露光装置及び方法、露光用マスク、並びにデバイス製造方法
TWI457723B (zh) * 2006-09-08 2014-10-21 尼康股份有限公司 A mask, an exposure device, and an element manufacturing method
JP5059382B2 (ja) 2006-11-20 2012-10-24 ディップ株式会社 職務経歴書自動作成システム及び方法
EP1950594A1 (de) * 2007-01-17 2008-07-30 Carl Zeiss SMT AG Abbildende Optik, Projektionsbelichtunsanlage für die Mikrolithographie mit einer derartigen abbildenden Optik, Verfahren zur Herstellung eines mikrostrukturierten Bauteils mit einer derartigen Projektionsbelichtungsanlage, durch das Herstellungsverfahren gefertigtes mikrostrukturiertes Bauelement sowie Verwendung einer derartigen abbildenden Optik
DE102008002377A1 (de) * 2007-07-17 2009-01-22 Carl Zeiss Smt Ag Beleuchtungssystem sowie Projektionsbelichtungsanlage für die Mikrolithografie mit einem derartigen Beleuchtungssystem
JP2009032749A (ja) * 2007-07-24 2009-02-12 Nikon Corp 露光装置およびデバイス製造方法
DE102007035387A1 (de) * 2007-07-26 2009-01-29 Leibnitz-Institut für neue Materialien Gemeinnützige GmbH Verfahren und Vorrichtung zur Herstellung von strukturierten optischen Materialien
JP2009099939A (ja) * 2007-09-25 2009-05-07 Dainippon Screen Mfg Co Ltd アライメントマーク形成装置
JP2009163133A (ja) * 2008-01-09 2009-07-23 Nikon Corp 露光方法及び露光装置
US8192920B2 (en) * 2008-04-26 2012-06-05 Rolith Inc. Lithography method
US8034540B2 (en) * 2008-07-31 2011-10-11 Eastman Kodak Company System and method employing secondary back exposure of flexographic plate
US8486593B2 (en) * 2008-12-23 2013-07-16 3M Innovative Properties Company Roll-to-roll digital photolithography
US8339573B2 (en) * 2009-05-27 2012-12-25 3M Innovative Properties Company Method and apparatus for photoimaging a substrate
TW201118509A (en) * 2009-08-26 2011-06-01 Nikon Corp Exposure device, exposure method and manufacturing method for device
JP2011203311A (ja) * 2010-03-24 2011-10-13 Nikon Corp マスクホルダ、円筒型マスク、露光装置、基板処理装置及びデバイス製造方法
US20130027684A1 (en) * 2010-04-13 2013-01-31 Tohru Kiuchi Exposure apparatus, substrate processing apparatus, and device manufacturing method
JP2011221536A (ja) * 2010-04-13 2011-11-04 Nikon Corp マスク移動装置、露光装置、基板処理装置及びデバイス製造方法
JP5724564B2 (ja) * 2010-04-13 2015-05-27 株式会社ニコン マスクケース、マスクユニット、露光装置、基板処理装置及びデバイス製造方法
KR101961605B1 (ko) * 2011-12-20 2019-03-22 가부시키가이샤 니콘 기판 처리 장치, 디바이스 제조 시스템 및 디바이스 제조 방법
JP6217651B2 (ja) * 2012-12-18 2017-10-25 株式会社ニコン 基板処理装置、デバイス製造システム及びデバイス製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2019113867A (ja) * 2011-12-20 2019-07-11 株式会社ニコン 円筒マスク露光装置

Also Published As

Publication number Publication date
TW201333638A (zh) 2013-08-16
TW201921163A (zh) 2019-06-01
JP2019113867A (ja) 2019-07-11
KR101924309B1 (ko) 2018-11-30
JPWO2013094286A1 (ja) 2015-04-27
KR101849508B1 (ko) 2018-05-28
KR20170046189A (ko) 2017-04-28
KR20180038586A (ko) 2018-04-16
KR101737680B1 (ko) 2017-05-18
TW202024810A (zh) 2020-07-01
JP6677333B2 (ja) 2020-04-08
TW201921162A (zh) 2019-06-01
JP2017045074A (ja) 2017-03-02
JP6927348B2 (ja) 2021-08-25
JP6323542B2 (ja) 2018-05-16
TWI691805B (zh) 2020-04-21
KR20170045389A (ko) 2017-04-26
KR20140109892A (ko) 2014-09-16
CN107255858A (zh) 2017-10-17
JP6436216B2 (ja) 2018-12-12
WO2013094286A1 (ja) 2013-06-27
TW201727387A (zh) 2017-08-01
JP2018028697A (ja) 2018-02-22
KR101961605B1 (ko) 2019-03-22
CN104011597A (zh) 2014-08-27
TWI668526B (zh) 2019-08-11
TWI709830B (zh) 2020-11-11
CN105425553B (zh) 2018-08-28
KR101848590B1 (ko) 2018-04-12
CN107255858B (zh) 2020-05-29
KR20180128523A (ko) 2018-12-03
JP2020126241A (ja) 2020-08-20
TWI585541B (zh) 2017-06-01
CN104011597B (zh) 2017-05-10
JP2018049286A (ja) 2018-03-29
CN105425553A (zh) 2016-03-23
JP6512265B2 (ja) 2019-05-15
TWI648601B (zh) 2019-01-21

Similar Documents

Publication Publication Date Title
JP6436216B2 (ja) 投影露光装置
JP6128240B2 (ja) 露光方法および露光装置
JP6635167B2 (ja) 投影露光装置及びデバイス製造方法
JP6451826B2 (ja) デバイス製造方法及び露光方法
KR101949117B1 (ko) 주사 노광 장치 및 디바이스 제조 방법
JP6028350B2 (ja) 基板処理装置、デバイス製造システム及びデバイス製造方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20150915

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20150915

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20160614

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20160809

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20161108

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20161121

R150 Certificate of patent or registration of utility model

Ref document number: 6056770

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250