JP5893537B2 - 露光装置の除塵装置及び除塵方法 - Google Patents

露光装置の除塵装置及び除塵方法 Download PDF

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Publication number
JP5893537B2
JP5893537B2 JP2012205315A JP2012205315A JP5893537B2 JP 5893537 B2 JP5893537 B2 JP 5893537B2 JP 2012205315 A JP2012205315 A JP 2012205315A JP 2012205315 A JP2012205315 A JP 2012205315A JP 5893537 B2 JP5893537 B2 JP 5893537B2
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Japan
Prior art keywords
dust
dust removal
roller
dust removing
exposure apparatus
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Expired - Fee Related
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JP2012205315A
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English (en)
Japanese (ja)
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JP2014059494A (ja
Inventor
政昭 松田
政昭 松田
森田　亮
亮 森田
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Orc Manufacturing Co Ltd
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Orc Manufacturing Co Ltd
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Filing date
Publication date
Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd
Priority to JP2012205315A priority Critical patent/JP5893537B2/ja
Priority to TW102123760A priority patent/TWI603159B/zh
Priority to KR1020157002557A priority patent/KR102062419B1/ko
Priority to CN201380040503.5A priority patent/CN104508561B/zh
Priority to PCT/JP2013/073938 priority patent/WO2014045885A1/ja
Publication of JP2014059494A publication Critical patent/JP2014059494A/ja
Application granted granted Critical
Publication of JP5893537B2 publication Critical patent/JP5893537B2/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

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  • Epidemiology (AREA)
  • Health & Medical Sciences (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Cleaning In General (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP2012205315A 2012-09-19 2012-09-19 露光装置の除塵装置及び除塵方法 Expired - Fee Related JP5893537B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2012205315A JP5893537B2 (ja) 2012-09-19 2012-09-19 露光装置の除塵装置及び除塵方法
TW102123760A TWI603159B (zh) 2012-09-19 2013-07-03 Dust removing device and dust removing method of exposure device
KR1020157002557A KR102062419B1 (ko) 2012-09-19 2013-09-05 노광 장치의 제진장치 및 제진방법
CN201380040503.5A CN104508561B (zh) 2012-09-19 2013-09-05 曝光装置的除尘装置和除尘方法
PCT/JP2013/073938 WO2014045885A1 (ja) 2012-09-19 2013-09-05 露光装置の除塵装置及び除塵方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012205315A JP5893537B2 (ja) 2012-09-19 2012-09-19 露光装置の除塵装置及び除塵方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2016032769A Division JP6215986B2 (ja) 2016-02-24 2016-02-24 除塵装置を備えた露光装置

Publications (2)

Publication Number Publication Date
JP2014059494A JP2014059494A (ja) 2014-04-03
JP5893537B2 true JP5893537B2 (ja) 2016-03-23

Family

ID=50341202

Family Applications (1)

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JP2012205315A Expired - Fee Related JP5893537B2 (ja) 2012-09-19 2012-09-19 露光装置の除塵装置及び除塵方法

Country Status (5)

Country Link
JP (1) JP5893537B2 (zh)
KR (1) KR102062419B1 (zh)
CN (1) CN104508561B (zh)
TW (1) TWI603159B (zh)
WO (1) WO2014045885A1 (zh)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI553424B (zh) * 2014-11-11 2016-10-11 Beac Co Ltd Exposure device
TWI553423B (zh) * 2014-11-11 2016-10-11 Beac Co Ltd Exposure device
CN104716795B (zh) * 2015-03-28 2017-08-08 东莞市森江机电科技有限公司 除尘单元
CN105093854B (zh) * 2015-09-09 2017-04-12 合肥芯碁微电子装备有限公司 一种用于激光直写曝光机的自动粘尘装置
CN105470150B (zh) * 2015-12-21 2018-07-10 中国电子科技集团公司第五十五研究所 一种硅台面二极管的玻璃钝化方法
JP6811015B2 (ja) * 2016-02-02 2021-01-13 株式会社アドテックエンジニアリング ロールツーロール両面露光装置
JP6215986B2 (ja) * 2016-02-24 2017-10-18 株式会社オーク製作所 除塵装置を備えた露光装置
JP6865609B2 (ja) * 2017-03-26 2021-04-28 株式会社アドテックエンジニアリング 露光装置
CN107024842B (zh) * 2017-06-16 2018-11-13 深圳市前海野马自动化设备有限公司 一种自动对位装置和曝光设备及其曝光方法
CN108255029A (zh) * 2018-03-09 2018-07-06 广东华恒智能科技有限公司 一种双面曝光机及其曝光方法
CN109739071A (zh) * 2019-01-30 2019-05-10 广东华恒智能科技有限公司 一种卷对卷全自动曝光机
CN112269302B (zh) * 2020-09-16 2023-05-30 上海光起电子设备有限公司 曝光机除尘装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3275990B2 (ja) * 1994-09-29 2002-04-22 ノーリツ鋼機株式会社 除塵装置
JP3478075B2 (ja) * 1997-08-13 2003-12-10 富士電機ホールディングス株式会社 レーザ加工用クリーナ
JP3533380B2 (ja) * 2000-09-12 2004-05-31 誠一郎 豊田 露光機の除塵装置及び除塵方法
JP2002169145A (ja) * 2000-11-30 2002-06-14 Minolta Co Ltd 表示パネルの製造方法及び可撓性基板の加工装置
JP2004017362A (ja) * 2002-06-13 2004-01-22 Fuji Photo Film Co Ltd 平面記録装置のクリーニング方法及び平面記録装置
JP2004327485A (ja) * 2003-04-21 2004-11-18 Canon Inc 露光用マスクの異物除去方法
JP2005334836A (ja) * 2004-05-31 2005-12-08 Renesas Technology Corp 搬送台車、およびそれを用いた軌道清掃方法、走行検査方法並びに半導体装置の製造方法
JP2007025436A (ja) * 2005-07-20 2007-02-01 Adtec Engineeng Co Ltd 露光装置
JP2007212765A (ja) * 2006-02-09 2007-08-23 Nsk Ltd 近接露光装置の手動式クリーナ及びクリーナ装置
JP2007306382A (ja) * 2006-05-12 2007-11-22 Pentax Corp 撮像素子用清掃器具
JP2008040287A (ja) * 2006-08-09 2008-02-21 Adtec Engineeng Co Ltd 露光装置
JP2008241987A (ja) * 2007-03-27 2008-10-09 Mitsubishi Paper Mills Ltd 連続露光装置
JP2009157249A (ja) 2007-12-27 2009-07-16 Orc Mfg Co Ltd 露光装置
JP2009157247A (ja) * 2007-12-27 2009-07-16 Orc Mfg Co Ltd 露光装置
JP2009300542A (ja) * 2008-06-10 2009-12-24 Orc Mfg Co Ltd 露光描画装置
KR101686609B1 (ko) * 2009-11-25 2016-12-14 엘지디스플레이 주식회사 필름 제진 장치
JP2011133724A (ja) * 2009-12-25 2011-07-07 Nikon Corp 流体静圧軸受、移動体装置、露光装置、デバイス製造方法、及び清掃装置

Also Published As

Publication number Publication date
TWI603159B (zh) 2017-10-21
KR102062419B1 (ko) 2020-01-03
JP2014059494A (ja) 2014-04-03
WO2014045885A1 (ja) 2014-03-27
KR20150056526A (ko) 2015-05-26
TW201413397A (zh) 2014-04-01
CN104508561B (zh) 2016-09-21
CN104508561A (zh) 2015-04-08

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