JP2671241B2 - ガラス板の異物検出装置 - Google Patents

ガラス板の異物検出装置

Info

Publication number: JP2671241B2
Authority: JP; Japan
Prior art keywords: laser beam; foreign matter; light receiving; light; receiving system
Prior art date: 1990-12-27
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

JP3353230A

Other languages

English (en)

Japanese (ja)

Other versions

JPH0552762A (ja

Inventor

昇加藤

泉雄蓬莱

俊宏木村

光義小泉

Original Assignee

日立電子エンジニアリング株式会社

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1990-12-27

Filing date

1991-12-17

Publication date

1997-10-29

1991-12-17 Application filed by 日立電子エンジニアリング株式会社 filed Critical 日立電子エンジニアリング株式会社

1993-03-02 Publication of JPH0552762A publication Critical patent/JPH0552762A/ja

1997-10-29 Application granted granted Critical

1997-10-29 Publication of JP2671241B2 publication Critical patent/JP2671241B2/ja

2012-10-29 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

Classifications

- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/94—Investigating contamination, e.g. dust
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/47—Scattering, i.e. diffuse reflection
- G01N2021/4792—Polarisation of scatter light
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
- G01N2021/8867—Grading and classifying of flaws using sequentially two or more inspection runs, e.g. coarse and fine, or detecting then analysing
- G01N2021/887—Grading and classifying of flaws using sequentially two or more inspection runs, e.g. coarse and fine, or detecting then analysing the measurements made in two or more directions, angles, positions
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N2021/9513—Liquid crystal panels
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/9501—Semiconductor wafers

Landscapes

Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Life Sciences & Earth Sciences (AREA)
Chemical & Material Sciences (AREA)
Analytical Chemistry (AREA)
Biochemistry (AREA)
General Health & Medical Sciences (AREA)
General Physics & Mathematics (AREA)
Immunology (AREA)
Pathology (AREA)
Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Length Measuring Devices By Optical Means (AREA)

JP3353230A 1990-12-27 1991-12-17 ガラス板の異物検出装置 Expired - Lifetime JP2671241B2 (ja)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP41497990		1990-12-27
JP2-414979		1990-12-27

Publications (2)

Publication Number	Publication Date
JPH0552762A JPH0552762A (ja)	1993-03-02
JP2671241B2 true JP2671241B2 (ja)	1997-10-29

Family

ID=18523394

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP3353230A Expired - Lifetime JP2671241B2 (ja)	1990-12-27	1991-12-17	ガラス板の異物検出装置

Country Status (5)

Country	Link
US (1)	US5245403A (de)
EP (1)	EP0493815B1 (de)
JP (1)	JP2671241B2 (de)
KR (1)	KR0159290B1 (de)
DE (1)	DE69117714T2 (de)

Families Citing this family (41)

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JP3259331B2 (ja) *	1992-05-29	2002-02-25	キヤノン株式会社	表面状態検査装置
JPH0682239A (ja) *	1992-09-04	1994-03-22	Matsushita Electric Ind Co Ltd	液晶材料のプレチルト角測定方法及びその装置
DE4300169A1 (de) *	1993-01-07	1994-07-14	Alfill Getraenketechnik	Verfahren und Vorrichtung zum Prüfen von Flaschen
ES2076083B1 (es) *	1993-06-04	1996-06-01	Fuesca Sl	Aparato y metodo de medida y control de la densidad de reticulacion de los tratamientos en caliente y frio del vidrio aligerado.
JPH07190942A (ja) *	1993-12-24	1995-07-28	Nec Corp	鏡面上の異物検査装置
JPH07209202A (ja) *	1994-01-21	1995-08-11	Canon Inc	表面状態検査装置、該表面状態検査装置を備える露光装置及び該露光装置を用いてデバイスを製造する方法
US6271916B1 (en) *	1994-03-24	2001-08-07	Kla-Tencor Corporation	Process and assembly for non-destructive surface inspections
US5412221A (en) *	1994-04-26	1995-05-02	The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration	Particle fallout/activity sensor
US5903342A (en) *	1995-04-10	1999-05-11	Hitachi Electronics Engineering, Co., Ltd.	Inspection method and device of wafer surface
US5929981A (en) *	1996-06-18	1999-07-27	Ohmeda Inc.	System for monitoring contamination of optical elements in a Raman gas analyzer
JP3373367B2 (ja) *	1996-08-09	2003-02-04	松下電器産業株式会社	３次元計測装置及び３次元計測方法
MY120950A (en) *	1996-09-10	2005-12-30	Hitachi High Tech Corp	Apparatus and method for inspecting disks
JP2001505303A (ja) *	1996-10-16	2001-04-17	ステリスコーポレイション	医療用及び歯科用器具の清浄度及び完全性評価のためのスキャン装置
JPH10221268A (ja) *	1997-02-05	1998-08-21	Advantest Corp	ウェーハの表面状態検出方法および装置
US6034776A (en) *	1997-04-16	2000-03-07	The United States Of America As Represented By The Secretary Of Commerce	Microroughness-blind optical scattering instrument
US5870186A (en) *	1997-07-15	1999-02-09	The United States Of America As Represented By The Administrator National Aeronautics And Space Administration	Detector for particle surface contamination
US6956644B2 (en) *	1997-09-19	2005-10-18	Kla-Tencor Technologies Corporation	Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination
US20040057045A1 (en) *	2000-12-21	2004-03-25	Mehdi Vaez-Iravani	Sample inspection system
US6201601B1 (en)	1997-09-19	2001-03-13	Kla-Tencor Corporation	Sample inspection system
US5923432A (en) *	1997-12-18	1999-07-13	Steris Corporation	Cleaning efficacy real time indicator
JP3544323B2 (ja) *	1998-08-31	2004-07-21	セントラル硝子株式会社	透明板の表面粗さ検査方法および装置
US20050134841A1 (en) *	1998-09-18	2005-06-23	Mehdi Vacz-Iravani	Sample inspection system
US6577389B2 (en) *	2001-06-25	2003-06-10	Kla-Tencor Technologies Corporation	System and methods for inspection of transparent mask substrates
JP2003004663A (ja) *	2001-06-27	2003-01-08	Hitachi Electronics Eng Co Ltd	表面検査装置
DE10146583A1 (de) *	2001-09-21	2003-04-17	Siemens Ag	Vorrichtung und Verfahren zum optischen Abtasten einer Substratscheibe
WO2004001816A1 (en) *	2002-06-21	2003-12-31	Applied Materials, Inc.	Angled sensors for detecting substrates
GB2415776B (en) *	2004-06-28	2009-01-28	Carglass Luxembourg Sarl Zug	Investigation of vehicle glazing panels
JP4988223B2 (ja) *	2005-06-22	2012-08-01	株式会社日立ハイテクノロジーズ	欠陥検査装置およびその方法
US7567344B2 (en) *	2006-05-12	2009-07-28	Corning Incorporated	Apparatus and method for characterizing defects in a transparent substrate
JP4875936B2 (ja)	2006-07-07	2012-02-15	株式会社日立ハイテクノロジーズ	異物・欠陥検出方法および異物・欠陥検査装置
KR100953204B1 (ko) *	2008-05-19	2010-04-15	(주)쎄미시스코	기판의 품질 검사장치 및 그 검사방법
US8823935B1 (en) *	2008-09-10	2014-09-02	Kla-Tencor Corporation	Detecting and classifying surface defects with multiple radiation collectors
KR101177299B1 (ko) *	2010-01-29	2012-08-30	삼성코닝정밀소재 주식회사	평판 유리 표면 이물질 검사 장치
US9140655B2 (en) *	2012-12-27	2015-09-22	Shenzhen China Star Optoelectronics Technology Co., Ltd.	Mother glass inspection device and mother glass inspection method
US9588056B2 (en) *	2014-05-29	2017-03-07	Corning Incorporated	Method for particle detection on flexible substrates
CN104034734B (zh) *	2014-06-25	2017-01-25	深圳市云特科技有限公司	一种卷扬机钢缆检测装置及其方法
KR101952617B1 (ko) *	2014-07-03	2019-02-28	(주)엘지하우시스	유리 기판의 부식 검출 방법
TWI585395B (zh) *	2015-01-27	2017-06-01	政美應用股份有限公司	面板檢測裝置與方法
TWI598785B (zh) *	2015-01-29	2017-09-11	政美應用股份有限公司	觸控面板之檢測方法及裝置
CN112166316A (zh)	2018-04-18	2021-01-01	泽农公司	保护uv-透射窗
DE102020133397A1 (de)	2020-12-14	2022-06-15	Isra Vision Ag	Vorrichtung zur Inspektion der Oberfläche eines transparenten Gegenstands sowie entsprechendes Verfahren

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP0075689A1 (de) *	1981-09-28	1983-04-06	International Business Machines Corporation	Optische Geräte zur Beobachtung einer Probenoberfläche
JPS58162038A (ja) *	1982-03-23	1983-09-26	Canon Inc	面状態検査装置
US4669875A (en) *	1982-11-04	1987-06-02	Hitachi, Ltd.	Foreign particle detecting method and apparatus
USRE33991E (en) *	1982-11-04	1992-07-14	Hitachi, Ltd.	Foreign particle detecting method and apparatus
JPS59186324A (ja) *	1983-04-07	1984-10-23	Nippon Kogaku Kk <Nikon>	異物検査装置
JPS60220940A (ja) *	1983-05-20	1985-11-05	Hitachi Ltd	異物自動検査装置
JPS6038827A (ja) *	1983-08-12	1985-02-28	Hitachi Ltd	自動異物検査装置の感度校正方法
US4672196A (en) *	1984-02-02	1987-06-09	Canino Lawrence S	Method and apparatus for measuring properties of thin materials using polarized light
US4893932A (en) *	1986-05-02	1990-01-16	Particle Measuring Systems, Inc.	Surface analysis system and method
JP2661913B2 (ja) *	1986-05-02	1997-10-08	パ−テイクル、メジユアリング、システムズインコ−ポレ−テツド	表面分析方法および表面分析装置
DE3619208A1 (de) *	1986-06-07	1987-12-10	Bosch Gmbh Robert	Vorrichtung zum optischen erfassen von fremdkoerpern
JPS6312249A (ja) *	1986-07-04	1988-01-19	Morinaga Milk Ind Co Ltd	泡沫性を有する含塩水中油型乳化物の製造法
JPS6341038A (ja) *	1986-08-06	1988-02-22	Hitachi Electronics Eng Co Ltd	ウエハ異物検査装置
US4889998A (en) *	1987-01-29	1989-12-26	Nikon Corporation	Apparatus with four light detectors for checking surface of mask with pellicle
DE3882905T2 (de) *	1987-05-27	1994-03-10	Nippon Sheet Glass Co Ltd	Fühler zur unterscheidung von fehlern in lichtdurchlassendem bahnförmigem material.
JPS6410355A (en) *	1987-07-03	1989-01-13	Sumitomo Electric Industries	Video memory device
JPH0259244A (ja) *	1988-08-23	1990-02-28	Kitamura Mach Co Ltd	工作機械
JPH03188491A (ja) *	1989-12-18	1991-08-16	Hitachi Electron Eng Co Ltd	液晶パネルの表面欠陥検査方式

1991
- 1991-12-17 JP JP3353230A patent/JP2671241B2/ja not_active Expired - Lifetime
- 1991-12-27 DE DE69117714T patent/DE69117714T2/de not_active Expired - Lifetime
- 1991-12-27 US US07/813,837 patent/US5245403A/en not_active Expired - Lifetime
- 1991-12-27 KR KR1019910024709A patent/KR0159290B1/ko not_active IP Right Cessation
- 1991-12-27 EP EP91122311A patent/EP0493815B1/de not_active Expired - Lifetime

Also Published As

Publication number	Publication date
DE69117714T2 (de)	1996-10-02
US5245403A (en)	1993-09-14
KR0159290B1 (ko)	1999-05-01
EP0493815B1 (de)	1996-03-06
JPH0552762A (ja)	1993-03-02
KR920012907A (ko)	1992-07-28
EP0493815A2 (de)	1992-07-08
DE69117714D1 (de)	1996-04-11
EP0493815A3 (en)	1992-10-14

Legal Events

Date	Code	Title	Description
2004-04-13	S533	Written request for registration of change of name	Free format text: JAPANESE INTERMEDIATE CODE: R313533
2004-04-21	R350	Written notification of registration of transfer	Free format text: JAPANESE INTERMEDIATE CODE: R350
2006-05-24	S111	Request for change of ownership or part of ownership	Free format text: JAPANESE INTERMEDIATE CODE: R313111
2006-06-01	R350	Written notification of registration of transfer	Free format text: JAPANESE INTERMEDIATE CODE: R350
2006-09-26	R250	Receipt of annual fees	Free format text: JAPANESE INTERMEDIATE CODE: R250
2007-11-27	FPAY	Renewal fee payment (event date is renewal date of database)	Free format text: PAYMENT UNTIL: 20090711 Year of fee payment: 12
2009-04-28	FPAY	Renewal fee payment (event date is renewal date of database)	Free format text: PAYMENT UNTIL: 20100711 Year of fee payment: 13
2010-02-25	FPAY	Renewal fee payment (event date is renewal date of database)	Free format text: PAYMENT UNTIL: 20100711 Year of fee payment: 13
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2011-06-16	FPAY	Renewal fee payment (event date is renewal date of database)	Free format text: PAYMENT UNTIL: 20110711 Year of fee payment: 14
2011-06-21	FPAY	Renewal fee payment (event date is renewal date of database)	Free format text: PAYMENT UNTIL: 20120711 Year of fee payment: 15
2011-12-17	EXPY	Cancellation because of completion of term
2012-03-07	FPAY	Renewal fee payment (event date is renewal date of database)	Free format text: PAYMENT UNTIL: 20120711 Year of fee payment: 15

Publication	Publication Date	Title
JP2671241B2 (ja)	1997-10-29	ガラス板の異物検出装置
US4342515A (en)	1982-08-03	Method of inspecting the surface of an object and apparatus therefor
US6144446A (en)	2000-11-07	Method and apparatus for inspecting foreign substance
JP2004170495A (ja)	2004-06-17	表示用基板の検査方法及び装置
JP4104924B2 (ja)	2008-06-18	光学的測定方法およびその装置
JP2010169453A (ja)	2010-08-05	異物検査装置及び検査方法
JP3480176B2 (ja)	2003-12-15	ガラス基板の表裏欠陥識別方法
JPH05100413A (ja)	1993-04-23	異物検査装置
JP2013140061A (ja)	2013-07-18	透明平板基板の表裏異物の検出方法及びその方法を用いた異物検査装置
JPH01245136A (ja)	1989-09-29	異物有無検査装置
JP2004219119A (ja)	2004-08-05	欠陥検査方法および装置
JP3280742B2 (ja)	2002-05-13	ガラス基板用欠陥検査装置
JPH07318500A (ja)	1995-12-08	物体表面近傍の検査装置
JPH07270326A (ja)	1995-10-20	異物検査装置
JP2000171228A (ja)	2000-06-23	斜入射干渉計
JPH05273137A (ja)	1993-10-22	表面欠陥検査装置
CN111007077A (zh)	2020-04-14	超薄板透明基板上表面异物检测装置
JPH07225195A (ja)	1995-08-22	微細パターンの欠陥測定方法
JPH08101404A (ja)	1996-04-16	Ｔｆｔ基板の欠陥検出方法および欠陥検査装置
JP2987007B2 (ja)	1999-12-06	カラーフィルタの異物検出光学系
JP3266217B2 (ja)	2002-03-18	液晶基板の異物検査装置
JPS6423144A (en)	1989-01-25	Method for detecting flaw in thin film layer of crystal substrate
JP2002350284A (ja)	2002-12-04	液晶表示装置の検査方法および検査装置
JP4358955B2 (ja)	2009-11-04	異物検査装置
JPS61180128A (ja)	1986-08-12	物体表面検査装置