JP2020004763A - 半導体装置 - Google Patents
半導体装置 Download PDFInfo
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- JP2020004763A JP2020004763A JP2018119819A JP2018119819A JP2020004763A JP 2020004763 A JP2020004763 A JP 2020004763A JP 2018119819 A JP2018119819 A JP 2018119819A JP 2018119819 A JP2018119819 A JP 2018119819A JP 2020004763 A JP2020004763 A JP 2020004763A
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- 238000010586 diagram Methods 0.000 description 36
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- 229910017052 cobalt Inorganic materials 0.000 description 5
- 239000010941 cobalt Substances 0.000 description 5
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- 101100258032 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) STE24 gene Proteins 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- 229910052715 tantalum Inorganic materials 0.000 description 2
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 2
- MZLGASXMSKOWSE-UHFFFAOYSA-N tantalum nitride Chemical compound [Ta]#N MZLGASXMSKOWSE-UHFFFAOYSA-N 0.000 description 2
- 101000647095 Homo sapiens Transcriptional protein SWT1 Proteins 0.000 description 1
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- 102100025094 Transcriptional protein SWT1 Human genes 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
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Abstract
Description
先ず、第1の実施形態について説明する。図1は、第1の実施形態に係る半導体装置のレイアウトを示す図である。図2は、スタンダードセル領域の一部を拡大して示す図である。
次に、第2の実施形態について説明する。第2の実施形態は、バッファBU2用の領域RBU2の配置の点で第1の実施形態と相違する。図13は、平面視における第2の実施形態におけるウェルの構成を示す図である。図14は、平面視における第2の実施形態におけるアクティブ領域と素子分離領域との関係を示す図である。図15は、平面視における第2の実施形態におけるフィン、ゲート電極及びローカル配線の構成を示す図である。図16は、平面視における第2の実施形態における第1の配線層とゲート電極及びローカル配線との関係を示す図である。図17は、平面視における第2の実施形態における第2の配線層と第1の配線層との関係を示す図である。図18は、第2の実施形態に係る半導体装置の構成を示す断面図である。図18は、図13〜図17中のI−I線に沿った断面図に相当する。図13〜図18には、Y方向で隣り合う2本のVVdd配線間の領域を示す。
次に、第3の実施形態について説明する。第3の実施形態は、領域RSW2に含まれるアクティブ領域ASW21及びASW22の配置の点で第2の実施形態と相違する。図19は、平面視における第3の実施形態におけるフィン、ゲート電極及びローカル配線の構成を示す図である。図20は、平面視における第3の実施形態における第1の配線層とゲート電極及びローカル配線との関係を示す図である。図21は、平面視における第3の実施形態における第2の配線層と第1の配線層との関係を示す図である。図22は、第3の実施形態に係る半導体装置の構成を示す断面図である。図22は、図19〜図21中のI−I線に沿った断面図に相当する。図19〜図22には、Y方向で隣り合う2本のVVdd配線間の領域を示す。
次に、第4の実施形態について説明する。第4の実施形態は、領域RSW2に含まれるゲートがローカル配線113で共通接続されている点で第3の実施形態と相違する。図23は、平面視における第4の実施形態におけるフィン、ゲート電極及びローカル配線の構成を示す図である。図24は、平面視における第4の実施形態における第1の配線層とゲート電極及びローカル配線との関係を示す図である。図25は、平面視における第4の実施形態における第2の配線層と第1の配線層との関係を示す図である。図26は、第4の実施形態に係る半導体装置の構成を示す断面図である。図26は、図23〜図25中のI−I線に沿った断面図に相当する。図23〜図26には、Y方向で隣り合う2本のVVdd配線間の領域を示す。
2:入出力(I/O)セル領域
11:スタンダードセル
12:電源スイッチ回路
100:半導体装置
102P1、102P2:Pウェル
102N:Nウェル
112:ゲート電極
113:ローカル配線
ABU11〜ABU14、ABU21〜ABU24:バッファ内のアクティブ領域
ASC11〜ASC14、ASC21〜ASC24:スタンダードセル内のアクティブ領域
ASW1、ASW21〜ASW22:スイッチトランジスタ内のアクティブ領域
AWT11〜AWT13、AWT21〜AWT22:ウェルタップ内のアクティブ領域
BU1、BU2:バッファ
IV1a、IV1b、IV2a、IV2b:インバータ
M1、M2:配線層
M1001、M1002、M2001、M2002:配線
RBU1、RBU2:バッファ用の領域
RIV1a、RIV1b、RIV2a、RIV2b:インバータ用の領域
RSW1、RSW2:スイッチトランジスタ用の領域
RWT1、RWT2:ウェルタップ用の領域
SC1、SC2、SC51、SC52:スタンダードセル
SW1、SW2:スイッチトランジスタ
Claims (10)
- 半導体基板と、
第1のアクティブ領域及び第2のアクティブ領域を備えた第1のスタンダードセルと、
前記半導体基板上に形成された第1の配線と第2の配線との間に電気的に接続された第1のスイッチトランジスタと、前記第1のスイッチトランジスタのゲートに接続され、第3のアクティブ領域及び第4のアクティブ領域を備えた第1のバッファを備えた電源スイッチ回路と、
を有し、
前記第1のバッファと前記第1のスタンダードセルは、平面視で第1の方向に隣接し、
前記第1の方向とは異なる第2の方向において前記第1のアクティブ領域の配置と前記第3のアクティブ領域の配置とが互いに一致し、
前記第2の方向において前記第2のアクティブ領域の配置と前記第4のアクティブ領域の配置とが互いに一致していることを特徴とする半導体装置。 - 前記電源スイッチ回路は、前記第1のバッファに基板電位を供給する第1のウェルタップを有し、
平面視で、前記第1のウェルタップと前記第1のスタンダードセルとの間に前記第1のバッファが配置されていることを特徴とする請求項1に記載の半導体装置。 - 前記第1のアクティブ領域と前記第2のアクティブ領域は、平面視で前記第2の方向に並んで配置され、
前記第3のアクティブ領域と前記第4のアクティブ領域は、平面視で前記第2の方向に並んで配置されることを特徴とする請求項1又は2に記載の半導体装置。 - 第5のアクティブ領域及び第6のアクティブ領域を備えた第2のスタンダードセルを有し、
前記電源スイッチ回路は、平面視で前記第1のスタンダードセルと前記第2のスタンダードセルとの間に位置し、
前記電源スイッチ回路は、前記第1の配線と前記第2の配線との間に接続された第2のスイッチトランジスタと、前記第2のスイッチトランジスタのゲートに接続され、第7のアクティブ領域及び第8のアクティブ領域を備えた第2のバッファと、を備え、
前記第2のバッファと前記第2のスタンダードセルは、平面視で前記第1の方向に隣接し、
前記第2の方向において、前記第5のアクティブ領域の配置と前記第7のアクティブ領域の配置とが互いに一致し、
前記第2の方向において、前記第6のアクティブ領域の配置と前記第8のアクティブ領域の配置とが互いに一致していることを特徴とする請求項1乃至3のいずれか一項に記載の半導体装置。 - 前記電源スイッチ回路は、前記第2のバッファに基板電位を供給する第2のウェルタップを有し、
平面視で、前記第2のウェルタップと前記第2のスタンダードセルとの間に前記第2のバッファが配置されていることを特徴とする請求項4に記載の半導体装置。 - 前記第5のアクティブ領域と前記第6のアクティブ領域は、平面視で前記第2の方向に並んで配置され、
前記第7のアクティブ領域と前記第8のアクティブ領域は、平面視で前記第2の方向に並んで配置されることを特徴とする請求項4又は5に記載の半導体装置。 - 平面視で前記第2の方向に配列された、複数の前記第1の配線と、
前記半導体基板上に形成され、前記第1の配線とは異なる電位が供給され、平面視で複数の前記第1の配線の間に配置された、第3の配線と、
前記半導体基板上に形成され、前記第1のスイッチトランジスタのゲート電極に電気的に接続し、前記第3の配線と同じ配線層に形成された第4の配線と、
を有し、
前記第3の配線は、前記電源スイッチ回路と重なる位置において、平面視で前記第2の方向に延在する2つの第1の部分と、前記第1の方向に延在して前記2つの第1の部分を接続し、前記電源スイッチ回路と重ならない位置における部分よりも前記第2の方向にずれて配置される第2の部分と、を有し、
前記第4の配線の少なくとも一部は、平面視で前記2つの第1の部分の間に位置することを特徴とする請求項1乃至6のいずれか1項に記載の半導体装置。 - 平面視で前記第2の方向に配列された、複数の前記第1の配線と、
前記半導体基板上に形成され、前記第1の配線とは異なる電位が供給され、平面視で複数の前記第1の配線の間に配置された、第3の配線と、
前記半導体基板上であって前記第3の配線の下の配線層に形成され、平面視で前記第3の配線と重なった位置で、前記第1のスイッチトランジスタのゲート電極に接続する部分を有する第4の配線と、
を有することを特徴とする請求項1乃至6のいずれか1項に記載の半導体装置。 - 前記第1のスイッチトランジスタは、平面視で前記第2の方向に並んで位置する第9のアクティブ領域及び第10のアクティブ領域を有し、
前記第2の方向における前記第9のアクティブ領域の寸法は、平面視で前記第2の方向における前記第10のアクティブ領域の寸法と一致していることを特徴とする請求項7又は8に記載の半導体装置。 - 前記第4の配線のうち前記第1のスイッチトランジスタの前記ゲート電極と平面視で重なる部分は、前記第2の方向において平面視で前記第9のアクティブ領域と前記第10のアクティブ領域との間に位置することを特徴とする請求項9に記載の半導体装置。
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