FR2779870B1 - Detecteur d'images cmos, photodiode pour un detecteur de ce type, et procede pour la fabrication de ce detecteur et de cette photodiode - Google Patents
Detecteur d'images cmos, photodiode pour un detecteur de ce type, et procede pour la fabrication de ce detecteur et de cette photodiodeInfo
- Publication number
- FR2779870B1 FR2779870B1 FR9910601A FR9910601A FR2779870B1 FR 2779870 B1 FR2779870 B1 FR 2779870B1 FR 9910601 A FR9910601 A FR 9910601A FR 9910601 A FR9910601 A FR 9910601A FR 2779870 B1 FR2779870 B1 FR 2779870B1
- Authority
- FR
- France
- Prior art keywords
- detector
- photodiode
- manufacturing
- type
- cmos image
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/792—Field effect transistors with field effect produced by an insulated gate with charge trapping gate insulator, e.g. MNOS-memory transistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14609—Pixel-elements with integrated switching, control, storage or amplification elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/1443—Devices controlled by radiation with at least one potential jump or surface barrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/148—Charge coupled imagers
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Electromagnetism (AREA)
- Ceramic Engineering (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR19980006687 | 1998-02-28 |
Publications (2)
Publication Number | Publication Date |
---|---|
FR2779870A1 FR2779870A1 (fr) | 1999-12-17 |
FR2779870B1 true FR2779870B1 (fr) | 2005-05-13 |
Family
ID=19534037
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9902509A Expired - Lifetime FR2775541B1 (fr) | 1998-02-28 | 1999-03-01 | Detecteur d'images cmos, photodiode pour un detecteur de ce type, et procedes pour la fabrication de ce detecteur et de cette photodiode |
FR9910601A Expired - Fee Related FR2779870B1 (fr) | 1998-02-28 | 1999-08-18 | Detecteur d'images cmos, photodiode pour un detecteur de ce type, et procede pour la fabrication de ce detecteur et de cette photodiode |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR9902509A Expired - Lifetime FR2775541B1 (fr) | 1998-02-28 | 1999-03-01 | Detecteur d'images cmos, photodiode pour un detecteur de ce type, et procedes pour la fabrication de ce detecteur et de cette photodiode |
Country Status (9)
Country | Link |
---|---|
US (2) | US6180969B1 (fr) |
JP (1) | JP4390896B2 (fr) |
KR (1) | KR100278285B1 (fr) |
CN (2) | CN100377362C (fr) |
DE (1) | DE19908457B4 (fr) |
FR (2) | FR2775541B1 (fr) |
GB (1) | GB2334817B (fr) |
NL (2) | NL1011381C2 (fr) |
TW (1) | TW457644B (fr) |
Families Citing this family (149)
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JP4200545B2 (ja) | 1998-06-08 | 2008-12-24 | ソニー株式会社 | 固体撮像素子およびその駆動方法、並びにカメラシステム |
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JP3457551B2 (ja) | 1998-11-09 | 2003-10-20 | 株式会社東芝 | 固体撮像装置 |
TW484235B (en) * | 1999-02-25 | 2002-04-21 | Canon Kk | Light-receiving element and photoelectric conversion device |
US6388243B1 (en) * | 1999-03-01 | 2002-05-14 | Photobit Corporation | Active pixel sensor with fully-depleted buried photoreceptor |
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JP3576033B2 (ja) * | 1999-03-31 | 2004-10-13 | 株式会社東芝 | 固体撮像装置 |
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KR100359770B1 (ko) * | 2000-03-02 | 2002-11-04 | 주식회사 하이닉스반도체 | 씨모스 이미지 센서의 액티브 픽셀 회로 |
US6465846B1 (en) * | 2000-03-22 | 2002-10-15 | Seiko Instruments Inc. | Semiconductor integrated circuit device having trench-type photodiode |
JP2001298663A (ja) * | 2000-04-12 | 2001-10-26 | Semiconductor Energy Lab Co Ltd | 半導体装置およびその駆動方法 |
JP3664939B2 (ja) * | 2000-04-14 | 2005-06-29 | 富士通株式会社 | Cmosイメージセンサ及びその製造方法 |
KR100386609B1 (ko) * | 2000-04-28 | 2003-06-02 | 주식회사 하이닉스반도체 | 씨모스 이미지 센서 및 그의 제조 방법 |
US6429499B1 (en) * | 2000-05-18 | 2002-08-06 | International Business Machines Corporation | Method and apparatus for a monolithic integrated MESFET and p-i-n optical receiver |
JP3688980B2 (ja) * | 2000-06-28 | 2005-08-31 | 株式会社東芝 | Mos型固体撮像装置及びその製造方法 |
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JP3781672B2 (ja) * | 2001-12-14 | 2006-05-31 | 株式会社東芝 | 固体撮像装置 |
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- 1999-02-24 NL NL1011381A patent/NL1011381C2/nl not_active IP Right Cessation
- 1999-02-26 US US09/258,307 patent/US6180969B1/en not_active Expired - Lifetime
- 1999-02-26 US US09/258,814 patent/US6184055B1/en not_active Expired - Lifetime
- 1999-02-26 DE DE19908457A patent/DE19908457B4/de not_active Expired - Lifetime
- 1999-02-28 CN CNB2003101044884A patent/CN100377362C/zh not_active Expired - Lifetime
- 1999-02-28 CN CNB991055888A patent/CN1171315C/zh not_active Expired - Lifetime
- 1999-03-01 GB GB9904689A patent/GB2334817B/en not_active Expired - Lifetime
- 1999-03-01 JP JP05323499A patent/JP4390896B2/ja not_active Expired - Fee Related
- 1999-03-01 FR FR9902509A patent/FR2775541B1/fr not_active Expired - Lifetime
- 1999-03-22 TW TW088104492A patent/TW457644B/zh not_active IP Right Cessation
- 1999-08-18 FR FR9910601A patent/FR2779870B1/fr not_active Expired - Fee Related
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2000
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JP4390896B2 (ja) | 2009-12-24 |
CN1231516A (zh) | 1999-10-13 |
NL1011381A1 (nl) | 1999-09-01 |
KR100278285B1 (ko) | 2001-01-15 |
US6184055B1 (en) | 2001-02-06 |
KR19990072885A (ko) | 1999-09-27 |
FR2775541A1 (fr) | 1999-09-03 |
GB9904689D0 (en) | 1999-04-21 |
DE19908457A1 (de) | 1999-09-02 |
TW457644B (en) | 2001-10-01 |
US6180969B1 (en) | 2001-01-30 |
CN1534790A (zh) | 2004-10-06 |
NL1011381C2 (nl) | 2000-02-15 |
FR2779870A1 (fr) | 1999-12-17 |
GB2334817B (en) | 2003-07-30 |
DE19908457B4 (de) | 2013-11-28 |
NL1014309C2 (nl) | 2004-01-27 |
GB2334817A (en) | 1999-09-01 |
CN100377362C (zh) | 2008-03-26 |
JPH11317512A (ja) | 1999-11-16 |
CN1171315C (zh) | 2004-10-13 |
NL1014309A1 (nl) | 2000-02-29 |
FR2775541B1 (fr) | 2002-08-02 |
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