DE69130125D1 - Positiv arbeitende Photolackzusammensetzung - Google Patents
Positiv arbeitende PhotolackzusammensetzungInfo
- Publication number
- DE69130125D1 DE69130125D1 DE69130125T DE69130125T DE69130125D1 DE 69130125 D1 DE69130125 D1 DE 69130125D1 DE 69130125 T DE69130125 T DE 69130125T DE 69130125 T DE69130125 T DE 69130125T DE 69130125 D1 DE69130125 D1 DE 69130125D1
- Authority
- DE
- Germany
- Prior art keywords
- photoresist composition
- positive working
- working photoresist
- positive
- composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C309/00—Sulfonic acids; Halides, esters, or anhydrides thereof
- C07C309/63—Esters of sulfonic acids
- C07C309/72—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton
- C07C309/76—Esters of sulfonic acids having sulfur atoms of esterified sulfo groups bound to carbon atoms of six-membered aromatic rings of a carbon skeleton containing nitrogen atoms, not being part of nitro or nitroso groups, bound to the carbon skeleton
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2602/00—Systems containing two condensed rings
- C07C2602/02—Systems containing two condensed rings the rings having only two atoms in common
- C07C2602/04—One of the condensed rings being a six-membered aromatic ring
- C07C2602/10—One of the condensed rings being a six-membered aromatic ring the other ring being six-membered, e.g. tetraline
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Materials For Photolithography (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2022679A JP2761786B2 (ja) | 1990-02-01 | 1990-02-01 | ポジ型フオトレジスト組成物 |
Publications (3)
Publication Number | Publication Date |
---|---|
DE69130125D1 true DE69130125D1 (de) | 1998-10-15 |
DE69130125T2 DE69130125T2 (de) | 1999-05-06 |
DE69130125T3 DE69130125T3 (de) | 2003-01-16 |
Family
ID=12089548
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69130125T Expired - Fee Related DE69130125T3 (de) | 1990-02-01 | 1991-01-31 | Positiv arbeitende Photolackzusammensetzung |
Country Status (5)
Country | Link |
---|---|
US (1) | US5565300A (de) |
EP (1) | EP0440238B2 (de) |
JP (1) | JP2761786B2 (de) |
KR (1) | KR0170399B1 (de) |
DE (1) | DE69130125T3 (de) |
Families Citing this family (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4137325A1 (de) * | 1991-11-13 | 1993-05-19 | Hoechst Ag | Lichtempfindliches gemisch auf der basis von o-naphthochinondiaziden und daraus hergestelltes lichtempfindliches material |
US5221592A (en) * | 1992-03-06 | 1993-06-22 | Hoechst Celanese Corporation | Diazo ester of a benzolactone ring compound and positive photoresist composition and element utilizing the diazo ester |
JP3094652B2 (ja) * | 1992-05-18 | 2000-10-03 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
JP3466218B2 (ja) * | 1992-06-04 | 2003-11-10 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
JP2744557B2 (ja) * | 1992-09-11 | 1998-04-28 | 富士写真フイルム株式会社 | 感光性樹脂組成物 |
DE69421982T2 (de) * | 1993-09-20 | 2000-03-30 | Fuji Photo Film Co Ltd | Positiv arbeitende Photoresistzusammensetzung |
EP0658807B1 (de) * | 1993-12-17 | 2000-04-05 | Fuji Photo Film Co., Ltd. | Positiv-arbeitende Fotolackzusammensetzung |
JP3503839B2 (ja) | 1994-05-25 | 2004-03-08 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
JP3278306B2 (ja) | 1994-10-31 | 2002-04-30 | 富士写真フイルム株式会社 | ポジ型フォトレジスト組成物 |
US5541033A (en) * | 1995-02-01 | 1996-07-30 | Ocg Microelectronic Materials, Inc. | Selected o-quinonediazide sulfonic acid esters of phenolic compounds and their use in radiation-sensitive compositions |
DE69604114T2 (de) * | 1995-04-10 | 2000-03-02 | Shipley Co | Gemische von photoaktiven Zusammensetzungen enthaltendes Fotoresist |
US5750310A (en) * | 1995-04-27 | 1998-05-12 | Fuji Photo Film Co., Ltd. | Positive photoresist composition |
JP2002207291A (ja) * | 2001-01-11 | 2002-07-26 | Toyo Gosei Kogyo Kk | ナフトキノンジアジド系感光剤溶液の製造方法 |
WO2006014674A2 (en) * | 2004-07-23 | 2006-02-09 | Polnox Corporation | Anti-oxidant macromonomers and polymers and methods of making and using the same |
WO2006039810A1 (en) * | 2004-10-13 | 2006-04-20 | St-Jean Photochimie Inc. | Photoactive compositions and preparation thereof |
WO2006060800A1 (en) | 2004-12-03 | 2006-06-08 | Polnox Corporation | Synthesis of aniline and phenol-based antioxidant macromonomers and corresponding polymers |
WO2006091705A2 (en) | 2005-02-22 | 2006-08-31 | Polnox Corporation | Nitrogen and hindered phenol containing dual functional macromolecular antioxidants: synthesis , performances and applications |
WO2006104957A2 (en) | 2005-03-25 | 2006-10-05 | Polnox Corporation | Alkylated and polymeric macromolecular antioxidants and methods of making and using the same |
WO2007050991A1 (en) | 2005-10-27 | 2007-05-03 | Polnox Corporation | Stabilized polyolefin compositions |
US7705176B2 (en) | 2005-10-27 | 2010-04-27 | Polnox Corporation | Macromolecular antioxidants based on sterically hindered phenols and phosphites |
EP1963468A1 (de) | 2005-12-02 | 2008-09-03 | Polnox Corporation | Schmierölzusammensetzungen |
WO2008005358A2 (en) | 2006-07-06 | 2008-01-10 | Polnox Corporation | Novel macromolecular antioxidants comprising differing antioxidant moieties: structures, methods of making and using the same |
US7767853B2 (en) | 2006-10-20 | 2010-08-03 | Polnox Corporation | Antioxidants and methods of making and using the same |
WO2015077635A2 (en) | 2013-11-22 | 2015-05-28 | Polnox Corporation | Macromolecular antioxidants based on dual type moiety per molecule: structures methods of making and using the same |
SG11201607443XA (en) * | 2014-03-13 | 2016-10-28 | Mitsubishi Gas Chemical Co | Resist composition and method for forming resist pattern |
SG11201607444VA (en) | 2014-03-13 | 2016-10-28 | Mitsubishi Gas Chemical Co | Compound, resin, material for forming underlayer film for lithography, underlayer film for lithography, pattern forming method, and method for purifying the compound or resin |
CN107533290B (zh) | 2015-03-30 | 2021-04-09 | 三菱瓦斯化学株式会社 | 抗蚀基材、抗蚀剂组合物及抗蚀图案形成方法 |
US10747112B2 (en) | 2015-03-30 | 2020-08-18 | Mitsubishi Gas Chemical Company, Inc. | Compound, resin, and purification method thereof, material for forming underlayer film for lithography, composition for forming underlayer film, and underlayer film, as well as resist pattern forming method and circuit pattern forming method |
US20180251695A1 (en) | 2017-03-01 | 2018-09-06 | Polnox Corporation | Macromolecular Corrosion (McIn) Inhibitors: Structures, Methods Of Making And Using The Same |
Family Cites Families (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3100856A1 (de) * | 1981-01-14 | 1982-08-12 | Hoechst Ag, 6000 Frankfurt | Lichtempfindliches gemisch auf basis von o-napthochinondiaziden und daraus hergestelltes lichtempfindliches kopiermaterial |
US4587196A (en) * | 1981-06-22 | 1986-05-06 | Philip A. Hunt Chemical Corporation | Positive photoresist with cresol-formaldehyde novolak resin and photosensitive naphthoquinone diazide |
US4499171A (en) * | 1982-04-20 | 1985-02-12 | Japan Synthetic Rubber Co., Ltd. | Positive type photosensitive resin composition with at least two o-quinone diazides |
JPS61185741A (ja) * | 1985-02-13 | 1986-08-19 | Mitsubishi Chem Ind Ltd | ポジ型フオトレジスト組成物 |
US4626492A (en) * | 1985-06-04 | 1986-12-02 | Olin Hunt Specialty Products, Inc. | Positive-working o-quinone diazide photoresist composition containing a dye and a trihydroxybenzophenone compound |
US5215857A (en) * | 1985-08-07 | 1993-06-01 | Japan Synthetic Rubber Co., Ltd. | 1,2-quinonediazide containing radiation-sensitive resin composition utilizing methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate or methyl 3-methoxypropionate as the solvent |
EP0227487B1 (de) * | 1985-12-27 | 1992-07-15 | Japan Synthetic Rubber Co., Ltd. | Strahlungsempfindliche positiv arbeitende Kunststoffzusammensetzung |
JPS6343134A (ja) * | 1986-08-11 | 1988-02-24 | Mitsubishi Chem Ind Ltd | ポジ型フオトレジスト組成物 |
JPS63178228A (ja) * | 1987-01-20 | 1988-07-22 | Fuji Photo Film Co Ltd | ポジ型フオトレジスト組成物 |
JPH0814696B2 (ja) * | 1987-09-17 | 1996-02-14 | 富士写真フイルム株式会社 | 感光性樹脂組成物 |
JP2552891B2 (ja) * | 1988-01-26 | 1996-11-13 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
JP2552900B2 (ja) * | 1988-06-07 | 1996-11-13 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
JP2629356B2 (ja) * | 1988-06-13 | 1997-07-09 | 住友化学工業株式会社 | ポジ型レジスト組成物 |
JP2800186B2 (ja) * | 1988-07-07 | 1998-09-21 | 住友化学工業株式会社 | 集積回路製作用ポジ型レジスト組成物の製造方法 |
US5001040A (en) * | 1988-07-11 | 1991-03-19 | Olin Hunt Specialty Products Inc. | Process of forming resist image in positive photoresist with thermally stable phenolic resin |
JP2715480B2 (ja) * | 1988-10-13 | 1998-02-18 | 住友化学工業株式会社 | ポジ型レジスト用組成物 |
US4957846A (en) * | 1988-12-27 | 1990-09-18 | Olin Hunt Specialty Products Inc. | Radiation sensitive compound and mixtures with trinuclear novolak oligomer with o-naphthoquinone diazide sulfonyl group |
JP2700918B2 (ja) * | 1989-04-26 | 1998-01-21 | 富士写真フイルム株式会社 | ポジ型フオトレジスト組成物 |
US5019478A (en) * | 1989-10-30 | 1991-05-28 | Olin Hunt Specialty Products, Inc. | Selected trihydroxybenzophenone compounds and their use in photoactive compounds and radiation sensitive mixtures |
-
1990
- 1990-02-01 JP JP2022679A patent/JP2761786B2/ja not_active Expired - Lifetime
-
1991
- 1991-01-30 US US07/647,904 patent/US5565300A/en not_active Expired - Lifetime
- 1991-01-31 DE DE69130125T patent/DE69130125T3/de not_active Expired - Fee Related
- 1991-01-31 EP EP91101307A patent/EP0440238B2/de not_active Expired - Lifetime
- 1991-02-01 KR KR1019910001749A patent/KR0170399B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR0170399B1 (ko) | 1999-03-20 |
EP0440238B2 (de) | 2002-06-05 |
US5565300A (en) | 1996-10-15 |
JP2761786B2 (ja) | 1998-06-04 |
JPH03228057A (ja) | 1991-10-09 |
EP0440238A3 (en) | 1991-12-11 |
EP0440238B1 (de) | 1998-09-09 |
EP0440238A2 (de) | 1991-08-07 |
DE69130125T3 (de) | 2003-01-16 |
DE69130125T2 (de) | 1999-05-06 |
KR920000008A (ko) | 1992-01-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8366 | Restricted maintained after opposition proceedings | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP |
|
8339 | Ceased/non-payment of the annual fee |