DE69132694D1 - Positiv arbeitende Photolackzusammensetzung - Google Patents

Positiv arbeitende Photolackzusammensetzung

Info

Publication number
DE69132694D1
DE69132694D1 DE69132694T DE69132694T DE69132694D1 DE 69132694 D1 DE69132694 D1 DE 69132694D1 DE 69132694 T DE69132694 T DE 69132694T DE 69132694 T DE69132694 T DE 69132694T DE 69132694 D1 DE69132694 D1 DE 69132694D1
Authority
DE
Germany
Prior art keywords
photoresist composition
positive working
working photoresist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69132694T
Other languages
English (en)
Other versions
DE69132694T2 (de
Inventor
Yasumasa Kawabe
Kazuya Uenishi
Shiro Tan
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP5765890A external-priority patent/JPH03259149A/ja
Priority claimed from JP8002890A external-priority patent/JPH03279958A/ja
Priority claimed from JP8002990A external-priority patent/JPH03279959A/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69132694D1 publication Critical patent/DE69132694D1/de
Application granted granted Critical
Publication of DE69132694T2 publication Critical patent/DE69132694T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
    • C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/12—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings
    • C07C39/15—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring polycyclic with no unsaturation outside the aromatic rings with all hydroxy groups on non-condensed rings, e.g. phenylphenol
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C39/00—Compounds having at least one hydroxy or O-metal group bound to a carbon atom of a six-membered aromatic ring
    • C07C39/24—Halogenated derivatives
    • C07C39/367—Halogenated derivatives polycyclic non-condensed, containing only six-membered aromatic rings as cyclic parts, e.g. halogenated poly-hydroxyphenylalkanes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
DE1991632694 1990-03-08 1991-03-07 Positiv arbeitende Photolackzusammensetzung Expired - Fee Related DE69132694T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP5765890A JPH03259149A (ja) 1990-03-08 1990-03-08 ポジ型フオトレジスト組成物
JP8002890A JPH03279958A (ja) 1990-03-28 1990-03-28 ポジ型フオトレジスト組成物
JP8002990A JPH03279959A (ja) 1990-03-28 1990-03-28 ポジ型フオトレジスト組成物

Publications (2)

Publication Number Publication Date
DE69132694D1 true DE69132694D1 (de) 2001-09-27
DE69132694T2 DE69132694T2 (de) 2002-06-20

Family

ID=27296333

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1991632694 Expired - Fee Related DE69132694T2 (de) 1990-03-08 1991-03-07 Positiv arbeitende Photolackzusammensetzung

Country Status (2)

Country Link
EP (1) EP0445819B1 (de)
DE (1) DE69132694T2 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5376497A (en) * 1991-04-26 1994-12-27 Nippon Zeon Co., Ltd. Positive quinone diazide sulfonic acid ester resist composition containing select hydroxy compound additive
JPH05204144A (ja) * 1991-08-21 1993-08-13 Sumitomo Chem Co Ltd ポジ型レジスト組成物
JP2655384B2 (ja) * 1991-11-08 1997-09-17 富士写真フイルム株式会社 ポジ型レジスト組成物
EP0550893A1 (de) * 1992-01-10 1993-07-14 Minnesota Mining And Manufacturing Company Lichtempfindliche Schicht für positiv/negativ Kopiermaterial
JP3391471B2 (ja) * 1992-02-25 2003-03-31 住友化学工業株式会社 ポジ型レジスト組成物
JP2935223B2 (ja) * 1992-04-14 1999-08-16 東京応化工業株式会社 レジストパターン形成用材料の製造方法及びタンタルのパターン形成方法
US5275911A (en) * 1993-02-01 1994-01-04 Ocg Microelectronic Materials, Inc. Sesamol/aldehyde condensation products as sensitivity enhancers for radiation sensitive mixtures
KR100334484B1 (ko) * 1994-12-28 2002-12-06 제온 코포레이션 포지티브형레지스트조성물
US9428482B2 (en) * 2011-01-27 2016-08-30 Sphaera Pharma Pte. Ltd. Process for synthesis of polyphenols

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6197278A (ja) * 1984-10-16 1986-05-15 Mitsubishi Chem Ind Ltd ナフトキノンジアジド系化合物及び該化合物を含有するポジ型フオトレジスト組成物
JPS6210646A (ja) * 1985-07-09 1987-01-19 Kanto Kagaku Kk ポジ型フオトレジスト組成物
JPS63261256A (ja) * 1987-04-20 1988-10-27 Nippon Zeon Co Ltd ポジ型フオトレジスト組成物
DE3718416A1 (de) * 1987-06-02 1988-12-15 Hoechst Ag Lichtempfindliches gemisch auf basis von 1,2-naphthochinondiaziden, daraus hergestelltes aufzeichnungsmaterial und dessen verwendung
JP2625882B2 (ja) * 1988-05-17 1997-07-02 住友化学工業株式会社 ポジ型レジスト用組成物
EP0346871B1 (de) * 1988-06-15 1994-09-21 Fuji Photo Film Co., Ltd. Automatisches Entwicklungsgerät für lichtempfindliche Platten
JPH063544B2 (ja) * 1988-07-07 1994-01-12 住友化学工業株式会社 ポジ型感放射線性レジスト組成物

Also Published As

Publication number Publication date
EP0445819A3 (en) 1991-12-11
EP0445819B1 (de) 2001-08-22
DE69132694T2 (de) 2002-06-20
EP0445819A2 (de) 1991-09-11

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP

8339 Ceased/non-payment of the annual fee