DE69421982D1 - Positiv arbeitende Photoresistzusammensetzung - Google Patents

Positiv arbeitende Photoresistzusammensetzung

Info

Publication number
DE69421982D1
DE69421982D1 DE69421982T DE69421982T DE69421982D1 DE 69421982 D1 DE69421982 D1 DE 69421982D1 DE 69421982 T DE69421982 T DE 69421982T DE 69421982 T DE69421982 T DE 69421982T DE 69421982 D1 DE69421982 D1 DE 69421982D1
Authority
DE
Germany
Prior art keywords
photoresist composition
positive working
working photoresist
positive
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69421982T
Other languages
English (en)
Other versions
DE69421982T2 (de
Inventor
Yasumasa Kawabe
Kenichiro Satoh
Toshiaki Aoai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP25178193A external-priority patent/JPH07104465A/ja
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of DE69421982D1 publication Critical patent/DE69421982D1/de
Application granted granted Critical
Publication of DE69421982T2 publication Critical patent/DE69421982T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
    • C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
    • C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
    • C08G8/20—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with polyhydric phenols
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE1994621982 1993-09-20 1994-09-19 Positiv arbeitende Photoresistzusammensetzung Expired - Lifetime DE69421982T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP23353893 1993-09-20
JP23353793 1993-09-20
JP25178193A JPH07104465A (ja) 1993-10-07 1993-10-07 ポジ型フオトレジスト組成物
JP25178093 1993-10-07

Publications (2)

Publication Number Publication Date
DE69421982D1 true DE69421982D1 (de) 2000-01-13
DE69421982T2 DE69421982T2 (de) 2000-03-30

Family

ID=27477535

Family Applications (1)

Application Number Title Priority Date Filing Date
DE1994621982 Expired - Lifetime DE69421982T2 (de) 1993-09-20 1994-09-19 Positiv arbeitende Photoresistzusammensetzung

Country Status (2)

Country Link
EP (1) EP0644460B1 (de)
DE (1) DE69421982T2 (de)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5529880A (en) * 1995-03-29 1996-06-25 Shipley Company, L.L.C. Photoresist with a mixture of a photosensitive esterified resin and an o-naphthoquinone diazide compound
KR101720717B1 (ko) * 2014-04-10 2017-03-28 제일모직 주식회사 포지티브형 감광성 수지 조성물, 감광성 수지막, 및 이를 이용한 표시 소자
MA52119A (fr) 2015-10-19 2018-08-29 Ncyte Corp Composés hétérocycliques utilisés comme immunomodulateurs
US20170145025A1 (en) 2015-11-19 2017-05-25 Incyte Corporation Heterocyclic compounds as immunomodulators
UA126113C2 (uk) 2015-12-22 2022-08-17 Інсайт Корпорейшн Гетероциклічні сполуки як імуномодулятори
MA44860A (fr) 2016-05-06 2019-03-13 Incyte Holdings Corp Composés hétérocycliques utilisés comme immunomodulateurs
MA45116A (fr) 2016-05-26 2021-06-02 Incyte Corp Composés hétérocycliques comme immunomodulateurs
CA3028685A1 (en) 2016-06-20 2017-12-28 Incyte Corporation Heterocyclic compounds as immunomodulators
MA45669A (fr) 2016-07-14 2019-05-22 Incyte Corp Composés hétérocycliques utilisés comme immunomodulateurs
US20180057486A1 (en) 2016-08-29 2018-03-01 Incyte Corporation Heterocyclic compounds as immunomodulators
ES2899402T3 (es) 2016-12-22 2022-03-11 Incyte Corp Derivados de piridina como inmunomoduladores
HUE060233T2 (hu) 2016-12-22 2023-02-28 Incyte Corp Tetrahidro imidazo[4,5-c]piridin-származékok mint a PD-L1 internalizációját indukáló szerek
WO2018119266A1 (en) 2016-12-22 2018-06-28 Incyte Corporation Benzooxazole derivatives as immunomodulators
US20180179201A1 (en) 2016-12-22 2018-06-28 Incyte Corporation Heterocyclic compounds as immunomodulators
IL313101A (en) 2018-03-30 2024-07-01 Incyte Corp Heterocyclic compounds as immunomodulators
TWI821288B (zh) 2018-05-11 2023-11-11 美商英塞特公司 作為免疫調節劑之雜環化合物
EP4010342A1 (de) 2019-08-09 2022-06-15 Incyte Corporation Salze eines pd-1/pd-l1-inhibitors
AR120109A1 (es) 2019-09-30 2022-02-02 Incyte Corp Compuestos de pirido[3,2-d]pirimidina como inmunomoduladores
CN114829366A (zh) 2019-11-11 2022-07-29 因赛特公司 Pd-1/pd-l1抑制剂的盐及结晶形式
CN116670114A (zh) 2020-11-06 2023-08-29 因赛特公司 用于制备pd-1/pd-l1抑制剂以及其盐和结晶形式的方法
TW202233615A (zh) 2020-11-06 2022-09-01 美商英塞特公司 Ｐｄ—１／ｐｄ—ｌ１抑制劑之結晶形式
WO2022099018A1 (en) 2020-11-06 2022-05-12 Incyte Corporation Process of preparing a pd-1/pd-l1 inhibitor

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2700918B2 (ja) * 1989-04-26 1998-01-21 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JP2631744B2 (ja) * 1989-05-11 1997-07-16 日本ゼオン株式会社 ポジ型レジスト組成物
JP2761786B2 (ja) * 1990-02-01 1998-06-04 富士写真フイルム株式会社 ポジ型フオトレジスト組成物
JPH03242650A (ja) * 1990-02-20 1991-10-29 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物

Also Published As

Publication number Publication date
EP0644460B1 (de) 1999-12-08
EP0644460A1 (de) 1995-03-22
DE69421982T2 (de) 2000-03-30

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: FUJIFILM CORP., TOKIO/TOKYO, JP