WO2010009297A3 - Hybrid heterojunction solar cell fabrication using a doping layer mask - Google Patents

Hybrid heterojunction solar cell fabrication using a doping layer mask Download PDF

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Publication number
WO2010009297A3
WO2010009297A3 PCT/US2009/050811 US2009050811W WO2010009297A3 WO 2010009297 A3 WO2010009297 A3 WO 2010009297A3 US 2009050811 W US2009050811 W US 2009050811W WO 2010009297 A3 WO2010009297 A3 WO 2010009297A3
Authority
WO
WIPO (PCT)
Prior art keywords
substrate
doping layer
solar cell
back surface
layer
Prior art date
Application number
PCT/US2009/050811
Other languages
French (fr)
Other versions
WO2010009297A2 (en
Inventor
Timothy W. Weidman
Rohit Mishra
Michael P. Stewart
Yonghwa Chris Cha
Kapila P. Wijekoon
Hongbin Fang
Original Assignee
Applied Materials, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials, Inc. filed Critical Applied Materials, Inc.
Priority to CN2009801301963A priority Critical patent/CN102113132B/en
Publication of WO2010009297A2 publication Critical patent/WO2010009297A2/en
Publication of WO2010009297A3 publication Critical patent/WO2010009297A3/en

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Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67155Apparatus for manufacturing or treating in a plurality of work-stations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0236Special surface textures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876Particular processes or apparatus for batch treatment of the devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Abstract

Embodiments of the invention contemplate the formation of a high efficiency solar cell using a novel processing sequence to form a solar cell device. In one embodiment, the methods include forming a doping layer on a back surface of a substrate, heating the doping layer and substrate to cause the doping layer diffuse into the back surface of the substrate, texturing a front surface of the substrate after heating the doping layer and the substrate, forming a dielectric layer on the back surface of the substrate, removing portions of the dielectric layer from the back surface to from a plurality of exposed regions of the substrate, and depositing a metal layer over the back surface of the substrate, wherein the metal layer is in electrical communication with at least one of the plurality of exposed regions on the substrate, and at least one of the exposed regions has dopant atoms provided from the doping layer.
PCT/US2009/050811 2008-07-16 2009-07-16 Hybrid heterojunction solar cell fabrication using a doping layer mask WO2010009297A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN2009801301963A CN102113132B (en) 2008-07-16 2009-07-16 Hybrid heterojunction solar cell fabrication using a doping layer mask

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US8136208P 2008-07-16 2008-07-16
US61/081,362 2008-07-16
US12153708P 2008-12-10 2008-12-10
US61/121,537 2008-12-10

Publications (2)

Publication Number Publication Date
WO2010009297A2 WO2010009297A2 (en) 2010-01-21
WO2010009297A3 true WO2010009297A3 (en) 2011-02-24

Family

ID=41530646

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/US2009/050811 WO2010009297A2 (en) 2008-07-16 2009-07-16 Hybrid heterojunction solar cell fabrication using a doping layer mask
PCT/US2009/050808 WO2010009295A2 (en) 2008-07-16 2009-07-16 Hybrid heterojunction solar cell fabrication using a metal layer mask

Family Applications After (1)

Application Number Title Priority Date Filing Date
PCT/US2009/050808 WO2010009295A2 (en) 2008-07-16 2009-07-16 Hybrid heterojunction solar cell fabrication using a metal layer mask

Country Status (4)

Country Link
US (2) US8183081B2 (en)
CN (1) CN102113132B (en)
TW (2) TWI390756B (en)
WO (2) WO2010009297A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104911595A (en) * 2015-06-23 2015-09-16 西安空间无线电技术研究所 Corrosion solution for TiW films and corrosion method thereof

Families Citing this family (116)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL2000999C2 (en) * 2007-11-13 2009-05-14 Stichting Energie Process for the production of crystalline silicon solar cells using co-diffusion of boron and phosphorus.
WO2010009297A2 (en) * 2008-07-16 2010-01-21 Applied Materials, Inc. Hybrid heterojunction solar cell fabrication using a doping layer mask
EP2351097A2 (en) 2008-10-23 2011-08-03 Alta Devices, Inc. Photovoltaic device
EP2365534A4 (en) * 2008-12-02 2014-04-02 Mitsubishi Electric Corp Method for manufacturing solar battery cell
IT1394647B1 (en) * 2009-06-22 2012-07-05 Applied Materials Inc IMPROVED VISION SYSTEM FOR ALIGNMENT OF A SCREEN PRINTING SCHEME
KR20110105382A (en) 2008-12-10 2011-09-26 어플라이드 머티어리얼스, 인코포레이티드 Enhanced vision system for screen printing pattern alignment
CN101958361A (en) * 2009-07-13 2011-01-26 无锡尚德太阳能电力有限公司 Method for etching transparent thin-film solar cell component
GB2472608B (en) * 2009-08-12 2013-09-04 M Solv Ltd Method and Apparatus for making a solar panel that is partially transparent
US9691921B2 (en) 2009-10-14 2017-06-27 Alta Devices, Inc. Textured metallic back reflector
US20170141256A1 (en) 2009-10-23 2017-05-18 Alta Devices, Inc. Multi-junction optoelectronic device with group iv semiconductor as a bottom junction
US20150380576A1 (en) 2010-10-13 2015-12-31 Alta Devices, Inc. Optoelectronic device with dielectric layer and method of manufacture
US9502594B2 (en) 2012-01-19 2016-11-22 Alta Devices, Inc. Thin-film semiconductor optoelectronic device with textured front and/or back surface prepared from template layer and etching
US11271128B2 (en) 2009-10-23 2022-03-08 Utica Leaseco, Llc Multi-junction optoelectronic device
US9768329B1 (en) 2009-10-23 2017-09-19 Alta Devices, Inc. Multi-junction optoelectronic device
US9136422B1 (en) 2012-01-19 2015-09-15 Alta Devices, Inc. Texturing a layer in an optoelectronic device for improved angle randomization of light
US8614115B2 (en) * 2009-10-30 2013-12-24 International Business Machines Corporation Photovoltaic solar cell device manufacture
US9012766B2 (en) 2009-11-12 2015-04-21 Silevo, Inc. Aluminum grid as backside conductor on epitaxial silicon thin film solar cells
TW201120942A (en) * 2009-12-08 2011-06-16 Ind Tech Res Inst Method for depositing microcrystalline silicon and monitor device of a plasma enhanced deposition
EP2510550A4 (en) 2009-12-09 2014-12-24 Solexel Inc High-efficiency photovoltaic back-contact solar cell structures and manufacturing methods using three-dimensional semiconductor absorbers
US9123470B2 (en) 2009-12-18 2015-09-01 Cardiac Pacemakers, Inc. Implantable energy storage device including a connection post to connect multiple electrodes
TW201133905A (en) * 2010-03-30 2011-10-01 E Ton Solar Tech Co Ltd Method of forming solar cell
US8524524B2 (en) * 2010-04-22 2013-09-03 General Electric Company Methods for forming back contact electrodes for cadmium telluride photovoltaic cells
KR101114239B1 (en) * 2010-05-31 2012-03-05 한국철강 주식회사 Method for cleaning a substrate of solar cell
US9214576B2 (en) 2010-06-09 2015-12-15 Solarcity Corporation Transparent conducting oxide for photovoltaic devices
TWI509695B (en) 2010-06-10 2015-11-21 Asm Int Method for selectively depositing film on substrate
TWI416625B (en) * 2010-06-25 2013-11-21 Inventec Solar Energy Corp Plasma-etching apparatus and method for doping or contact region definition on surface layer of semiconductor by using the same
US8377738B2 (en) * 2010-07-01 2013-02-19 Sunpower Corporation Fabrication of solar cells with counter doping prevention
KR20120009562A (en) * 2010-07-19 2012-02-02 삼성전자주식회사 Solar cell and method of manufacturing the same
MY158500A (en) 2010-08-05 2016-10-14 Solexel Inc Backplane reinforcement and interconnects for solar cells
US9773928B2 (en) * 2010-09-10 2017-09-26 Tesla, Inc. Solar cell with electroplated metal grid
US8809097B1 (en) * 2010-09-22 2014-08-19 Crystal Solar Incorporated Passivated emitter rear locally patterned epitaxial solar cell
JP5622231B2 (en) * 2010-10-06 2014-11-12 三菱重工業株式会社 Method for manufacturing photoelectric conversion device
US9800053B2 (en) 2010-10-08 2017-10-24 Tesla, Inc. Solar panels with integrated cell-level MPPT devices
CN103237745B (en) * 2010-11-01 2016-05-04 因特瓦克公司 On silicon wafer, form the dry etching method of superficial makings
DE102010054370A1 (en) * 2010-12-13 2012-06-14 Centrotherm Photovoltaics Ag Process for the preparation of silicon solar cells with front-sided texture and smooth back surface
WO2012129184A1 (en) 2011-03-18 2012-09-27 Crystal Solar, Inc. Insitu epitaxial deposition of front and back junctions in single crystal silicon solar cells
TWI447927B (en) * 2011-03-18 2014-08-01 Big Sun Energy Technology Inc Method of manufacturing solar cell having partially etched front side using resist material
CN103477450A (en) * 2011-04-21 2013-12-25 应用材料公司 Method of forming P-N junction in solar cell substrate
US9054256B2 (en) 2011-06-02 2015-06-09 Solarcity Corporation Tunneling-junction solar cell with copper grid for concentrated photovoltaic application
CN102231412A (en) * 2011-07-21 2011-11-02 友达光电股份有限公司 Solar cell manufacturing method
CN103918088B (en) * 2011-08-09 2017-07-04 速力斯公司 Using the high-efficiency solar photovoltaic battery and module of fine grain semiconductor absorber
WO2013026177A1 (en) * 2011-08-22 2013-02-28 Honeywell International Inc. Phosphorous-comprising dopants, methods for forming phosphorous-doped regions in semiconductor substrates using such phosphorous-comprising dopants, and methods for forming such phosphorous-comprising dopants
JP5957835B2 (en) * 2011-09-28 2016-07-27 株式会社Sumco Method for producing solar cell wafer, method for producing solar cell, and method for producing solar cell module
JP5917082B2 (en) * 2011-10-20 2016-05-11 株式会社半導体エネルギー研究所 Method for manufacturing photoelectric conversion device
WO2013062727A1 (en) * 2011-10-24 2013-05-02 Applied Materials, Inc. Method and apparatus of removing a passivation film and improving contact resistance in rear point contact solar cells
US9112003B2 (en) 2011-12-09 2015-08-18 Asm International N.V. Selective formation of metallic films on metallic surfaces
KR101902887B1 (en) * 2011-12-23 2018-10-01 엘지전자 주식회사 Method for manufacturing the same
US11038080B2 (en) 2012-01-19 2021-06-15 Utica Leaseco, Llc Thin-film semiconductor optoelectronic device with textured front and/or back surface prepared from etching
KR20130096822A (en) * 2012-02-23 2013-09-02 엘지전자 주식회사 Solar cell and method for manufacturing the same
US9054255B2 (en) 2012-03-23 2015-06-09 Sunpower Corporation Solar cell having an emitter region with wide bandgap semiconductor material
US9184333B2 (en) * 2012-04-26 2015-11-10 Applied Materials, Inc. Contact and interconnect metallization for solar cells
WO2014025863A1 (en) * 2012-08-09 2014-02-13 Shell Oil Company System for producing and separating oil
AU2013326971B2 (en) 2012-10-04 2016-06-30 Tesla, Inc. Photovoltaic devices with electroplated metal grids
US9865754B2 (en) 2012-10-10 2018-01-09 Tesla, Inc. Hole collectors for silicon photovoltaic cells
US9281436B2 (en) 2012-12-28 2016-03-08 Solarcity Corporation Radio-frequency sputtering system with rotary target for fabricating solar cells
US9412884B2 (en) 2013-01-11 2016-08-09 Solarcity Corporation Module fabrication of solar cells with low resistivity electrodes
NL2010116C2 (en) * 2013-01-11 2014-07-15 Stichting Energie Method of providing a boron doped region in a substrate and a solar cell using such a substrate.
US9219174B2 (en) 2013-01-11 2015-12-22 Solarcity Corporation Module fabrication of solar cells with low resistivity electrodes
US10074755B2 (en) 2013-01-11 2018-09-11 Tesla, Inc. High efficiency solar panel
US8735204B1 (en) 2013-01-17 2014-05-27 Alliance For Sustainable Energy, Llc Contact formation and gettering of precipitated impurities by multiple firing during semiconductor device fabrication
US8895416B2 (en) 2013-03-11 2014-11-25 Alliance For Sustainable Energy, Llc Semiconductor device PN junction fabrication using optical processing of amorphous semiconductor material
US9082925B2 (en) 2013-03-13 2015-07-14 Sunpower Corporation Methods for wet chemistry polishing for improved low viscosity printing in solar cell fabrication
KR101613843B1 (en) * 2013-04-23 2016-04-20 엘지전자 주식회사 Solar cell and method for manufacturing the same
WO2014179366A1 (en) * 2013-04-29 2014-11-06 Soiexel, Inc. Annealing for damage free laser processing for high efficiency solar cells
US9624595B2 (en) 2013-05-24 2017-04-18 Solarcity Corporation Electroplating apparatus with improved throughput
US9178082B2 (en) * 2013-09-23 2015-11-03 Siva Power, Inc. Methods of forming thin-film photovoltaic devices with discontinuous passivation layers
US9577134B2 (en) * 2013-12-09 2017-02-21 Sunpower Corporation Solar cell emitter region fabrication using self-aligned implant and cap
US9059341B1 (en) * 2014-01-23 2015-06-16 E I Du Pont De Nemours And Company Method for manufacturing an interdigitated back contact solar cell
US9895715B2 (en) * 2014-02-04 2018-02-20 Asm Ip Holding B.V. Selective deposition of metals, metal oxides, and dielectrics
US10047435B2 (en) 2014-04-16 2018-08-14 Asm Ip Holding B.V. Dual selective deposition
US10309012B2 (en) 2014-07-03 2019-06-04 Tesla, Inc. Wafer carrier for reducing contamination from carbon particles and outgassing
US9899546B2 (en) 2014-12-05 2018-02-20 Tesla, Inc. Photovoltaic cells with electrodes adapted to house conductive paste
US9947822B2 (en) 2015-02-02 2018-04-17 Tesla, Inc. Bifacial photovoltaic module using heterojunction solar cells
US9490145B2 (en) 2015-02-23 2016-11-08 Asm Ip Holding B.V. Removal of surface passivation
US10428421B2 (en) 2015-08-03 2019-10-01 Asm Ip Holding B.V. Selective deposition on metal or metallic surfaces relative to dielectric surfaces
US10566185B2 (en) 2015-08-05 2020-02-18 Asm Ip Holding B.V. Selective deposition of aluminum and nitrogen containing material
US10121699B2 (en) 2015-08-05 2018-11-06 Asm Ip Holding B.V. Selective deposition of aluminum and nitrogen containing material
US10814349B2 (en) 2015-10-09 2020-10-27 Asm Ip Holding B.V. Vapor phase deposition of organic films
US10695794B2 (en) 2015-10-09 2020-06-30 Asm Ip Holding B.V. Vapor phase deposition of organic films
US10343186B2 (en) 2015-10-09 2019-07-09 Asm Ip Holding B.V. Vapor phase deposition of organic films
CN106601862A (en) * 2015-10-15 2017-04-26 钧石(中国)能源有限公司 Texturing method for reducing reflectivity of monocrystalline silicon heterojunction solar cell
CN106601835A (en) * 2015-10-15 2017-04-26 福建金石能源有限公司 Control method for controlling suede dimension of monocrystalline silicon heterojunction solar battery cell
US9761744B2 (en) 2015-10-22 2017-09-12 Tesla, Inc. System and method for manufacturing photovoltaic structures with a metal seed layer
US9842956B2 (en) * 2015-12-21 2017-12-12 Tesla, Inc. System and method for mass-production of high-efficiency photovoltaic structures
US9496429B1 (en) 2015-12-30 2016-11-15 Solarcity Corporation System and method for tin plating metal electrodes
US9981286B2 (en) 2016-03-08 2018-05-29 Asm Ip Holding B.V. Selective formation of metal silicides
US10551741B2 (en) 2016-04-18 2020-02-04 Asm Ip Holding B.V. Method of forming a directed self-assembled layer on a substrate
US10204782B2 (en) 2016-04-18 2019-02-12 Imec Vzw Combined anneal and selective deposition process
US10115838B2 (en) 2016-04-19 2018-10-30 Tesla, Inc. Photovoltaic structures with interlocking busbars
US11081342B2 (en) 2016-05-05 2021-08-03 Asm Ip Holding B.V. Selective deposition using hydrophobic precursors
US10373820B2 (en) 2016-06-01 2019-08-06 Asm Ip Holding B.V. Deposition of organic films
US10453701B2 (en) 2016-06-01 2019-10-22 Asm Ip Holding B.V. Deposition of organic films
US9803277B1 (en) 2016-06-08 2017-10-31 Asm Ip Holding B.V. Reaction chamber passivation and selective deposition of metallic films
US10014212B2 (en) 2016-06-08 2018-07-03 Asm Ip Holding B.V. Selective deposition of metallic films
CN106057932B (en) * 2016-07-14 2017-09-19 江苏万邦微电子有限公司 Flouride-resistani acid phesphatase preparation method of solar battery
US10236399B2 (en) * 2016-08-09 2019-03-19 Ablic Inc. Method of manufacturing a semiconductor device
US11430656B2 (en) 2016-11-29 2022-08-30 Asm Ip Holding B.V. Deposition of oxide thin films
JP7169072B2 (en) 2017-02-14 2022-11-10 エーエスエム アイピー ホールディング ビー.ブイ. Selective passivation and selective deposition
US11501965B2 (en) 2017-05-05 2022-11-15 Asm Ip Holding B.V. Plasma enhanced deposition processes for controlled formation of metal oxide thin films
US11170993B2 (en) 2017-05-16 2021-11-09 Asm Ip Holding B.V. Selective PEALD of oxide on dielectric
US10900120B2 (en) 2017-07-14 2021-01-26 Asm Ip Holding B.V. Passivation against vapor deposition
NL2019558B1 (en) * 2017-09-15 2019-03-28 Tno Method for producing modules of thin film photovoltaic cells in a roll-to-roll process and apparatus configured for using such a method.
US10672919B2 (en) 2017-09-19 2020-06-02 Tesla, Inc. Moisture-resistant solar cells for solar roof tiles
US11190128B2 (en) 2018-02-27 2021-11-30 Tesla, Inc. Parallel-connected solar roof tile modules
JP7146690B2 (en) 2018-05-02 2022-10-04 エーエスエム アイピー ホールディング ビー.ブイ. Selective layer formation using deposition and removal
JP2020056104A (en) 2018-10-02 2020-04-09 エーエスエム アイピー ホールディング ビー.ブイ. Selective passivation and selective deposition
US11393938B2 (en) * 2019-04-02 2022-07-19 Utica Leaseco, Llc Laser-textured thin-film semiconductors by melting and ablation
JP2022545188A (en) * 2019-08-12 2022-10-26 アリゾナ ボード オブ リージェンツ オン ビハーフ オブ アリゾナ ステート ユニバーシティ Perovskite/silicon tandem photovoltaic device
US11139163B2 (en) 2019-10-31 2021-10-05 Asm Ip Holding B.V. Selective deposition of SiOC thin films
CN110943144A (en) * 2019-11-29 2020-03-31 晋能清洁能源科技股份公司 Texturing and cleaning method for heterojunction battery
TW202140833A (en) 2020-03-30 2021-11-01 荷蘭商Asm Ip私人控股有限公司 Selective deposition of silicon oxide on dielectric surfaces relative to metal surfaces
TW202140832A (en) 2020-03-30 2021-11-01 荷蘭商Asm Ip私人控股有限公司 Selective deposition of silicon oxide on metal surfaces
TW202204658A (en) 2020-03-30 2022-02-01 荷蘭商Asm Ip私人控股有限公司 Simultaneous selective deposition of two different materials on two different surfaces
CN112366252B (en) * 2020-11-25 2021-06-04 深圳市中科创想科技有限责任公司 Polycrystalline silicon wafer texturing clamping strip assembling, detecting and packaging process
CN114959781B (en) * 2022-04-25 2023-11-07 江苏理工学院 NiS (nickel-zinc sulfide) 2 @V 2 O 5 /VS 2 Ternary heterojunction material and preparation method and application thereof
CN116053358A (en) * 2023-02-09 2023-05-02 安徽华晟新能源科技有限公司 Preparation method of heterojunction battery

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05308148A (en) * 1992-03-05 1993-11-19 Tdk Corp Solar cell
JPH11274538A (en) * 1998-01-20 1999-10-08 Sharp Corp Substrate for forming high-strength thin semiconductor element, high-strength thin semiconductor element and manufacture thereof
KR20040042209A (en) * 2002-11-13 2004-05-20 삼성에스디아이 주식회사 Silicon solar battery of thin film type
KR20080003623A (en) * 2006-07-03 2008-01-08 엘지전자 주식회사 High efficiency solar cell and manufacturing method thereof

Family Cites Families (127)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3849880A (en) 1969-12-12 1974-11-26 Communications Satellite Corp Solar cell array
US3979241A (en) 1968-12-28 1976-09-07 Fujitsu Ltd. Method of etching films of silicon nitride and silicon dioxide
US4084985A (en) * 1977-04-25 1978-04-18 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Method for producing solar energy panels by automation
US4104091A (en) 1977-05-20 1978-08-01 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Application of semiconductor diffusants to solar cells by screen printing
US4152824A (en) 1977-12-30 1979-05-08 Mobil Tyco Solar Energy Corporation Manufacture of solar cells
US4219448A (en) 1978-06-08 1980-08-26 Bernd Ross Screenable contact structure and method for semiconductor devices
US4234352A (en) * 1978-07-26 1980-11-18 Electric Power Research Institute, Inc. Thermophotovoltaic converter and cell for use therein
DE2933686A1 (en) 1979-08-20 1981-03-26 Merck Patent Gmbh, 64293 Darmstadt CORROSIVE METHOD AND METHOD FOR CORRECTING CHROMED PRINTING PRESSURE CYLINDERS
US4315097A (en) * 1980-10-27 1982-02-09 Mcdonnell Douglas Corporation Back contacted MIS photovoltaic cell
JPS59103383A (en) 1982-12-03 1984-06-14 Sanyo Electric Co Ltd Manufacture for photovoltaic force generating device
US4478879A (en) 1983-02-10 1984-10-23 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Screen printed interdigitated back contact solar cell
US4717591A (en) 1983-06-30 1988-01-05 International Business Machines Corporation Prevention of mechanical and electronic failures in heat-treated structures
US5698451A (en) 1988-06-10 1997-12-16 Mobil Solar Energy Corporation Method of fabricating contacts for solar cells
US4927770A (en) * 1988-11-14 1990-05-22 Electric Power Research Inst. Corp. Of District Of Columbia Method of fabricating back surface point contact solar cells
US5011782A (en) 1989-03-31 1991-04-30 Electric Power Research Institute Method of making passivated antireflective coating for photovoltaic cell
DE3935798A1 (en) * 1989-10-27 1991-05-02 Basf Ag METHOD FOR OBTAINING RUTHENIUM TETROXIDE BY OXIDATION OF AQUEOUS SOLUTIONS OF ALKALI RUTHENATES
US5057439A (en) * 1990-02-12 1991-10-15 Electric Power Research Institute Method of fabricating polysilicon emitters for solar cells
DK170189B1 (en) * 1990-05-30 1995-06-06 Yakov Safir Process for the manufacture of semiconductor components, as well as solar cells made therefrom
US5198385A (en) * 1991-01-11 1993-03-30 Harris Corporation Photolithographic formation of die-to-package airbridge in a semiconductor device
JP2754100B2 (en) 1991-07-25 1998-05-20 シャープ株式会社 Solar cell manufacturing method
US5705828A (en) * 1991-08-10 1998-01-06 Sanyo Electric Co., Ltd. Photovoltaic device
KR950002233B1 (en) * 1992-08-14 1995-03-15 김태환 Glass etching composition and method for etching glass surface therewith
JPH0697153A (en) 1992-09-11 1994-04-08 Hitachi Ltd Etching liquid and etching method
JP3203078B2 (en) * 1992-12-09 2001-08-27 三洋電機株式会社 Photovoltaic element
DE69424759T2 (en) * 1993-12-28 2001-02-08 Applied Materials Inc Vapor deposition process in a single chamber for thin film transistors
JP3032422B2 (en) 1994-04-28 2000-04-17 シャープ株式会社 Solar cell and method of manufacturing the same
US5583368A (en) * 1994-08-11 1996-12-10 International Business Machines Corporation Stacked devices
DE19508712C2 (en) * 1995-03-10 1997-08-07 Siemens Solar Gmbh Solar cell with back surface field and manufacturing process
JP3070489B2 (en) 1996-10-09 2000-07-31 トヨタ自動車株式会社 Concentrating solar cell element
JPH10117004A (en) 1996-10-09 1998-05-06 Toyota Motor Corp Converging type solar battery element
JP3512959B2 (en) * 1996-11-14 2004-03-31 株式会社東芝 Semiconductor device and manufacturing method thereof
US6552414B1 (en) * 1996-12-24 2003-04-22 Imec Vzw Semiconductor device with selectively diffused regions
US6103393A (en) 1998-02-24 2000-08-15 Superior Micropowders Llc Metal-carbon composite powders, methods for producing powders and devices fabricated from same
US6082610A (en) * 1997-06-23 2000-07-04 Ford Motor Company Method of forming interconnections on electronic modules
JP4058777B2 (en) * 1997-07-31 2008-03-12 日鉱金属株式会社 High purity ruthenium sintered compact sputtering target for thin film formation and thin film formed by sputtering the target
US5965465A (en) * 1997-09-18 1999-10-12 International Business Machines Corporation Etching of silicon nitride
US5897368A (en) * 1997-11-10 1999-04-27 General Electric Company Method of fabricating metallized vias with steep walls
DE19813188A1 (en) * 1998-03-25 1999-10-07 Siemens Solar Gmbh Method for one-sided doping of a semiconductor body
US6137178A (en) 1998-06-17 2000-10-24 Siemens Aktiengesellschaft Semiconductor metalization system and method
US5939336A (en) * 1998-08-21 1999-08-17 Micron Technology, Inc. Aqueous solutions of ammonium fluoride in propylene glycol and their use in the removal of etch residues from silicon substrates
US6328913B1 (en) 1998-09-02 2001-12-11 Peter T. B. Shaffer Composite monolithic elements and methods for making such elements
US6537461B1 (en) * 2000-04-24 2003-03-25 Hitachi, Ltd. Process for treating solid surface and substrate surface
SG79292A1 (en) * 1998-12-11 2001-03-20 Hitachi Ltd Semiconductor integrated circuit and its manufacturing method
DE19910816A1 (en) * 1999-03-11 2000-10-05 Merck Patent Gmbh Doping pastes for producing p, p + and n, n + regions in semiconductors
US7210931B1 (en) 1999-07-07 2007-05-01 Ronald E. Huffman Dental model base assembly
US6391785B1 (en) 1999-08-24 2002-05-21 Interuniversitair Microelektronica Centrum (Imec) Method for bottomless deposition of barrier layers in integrated circuit metallization schemes
TW490756B (en) * 1999-08-31 2002-06-11 Hitachi Ltd Method for mass production of semiconductor integrated circuit device and manufacturing method of electronic components
US6458183B1 (en) 1999-09-07 2002-10-01 Colonial Metals, Inc. Method for purifying ruthenium and related processes
WO2001037357A2 (en) 1999-11-17 2001-05-25 Neah Power Systems, Inc. Fuel cells having silicon substrates and/or sol-gel derived support structures
US20020041991A1 (en) 1999-11-17 2002-04-11 Chan Chung M. Sol-gel derived fuel cell electrode structures and fuel cell electrode stack assemblies
US6290880B1 (en) 1999-12-01 2001-09-18 The United States Of America As Represented By The Secretary Of The Navy Electrically conducting ruthenium dioxide-aerogel composite
JP3676958B2 (en) 1999-12-28 2005-07-27 株式会社日立製作所 Manufacturing method of semiconductor integrated circuit device
KR20020004313A (en) 2000-07-04 2002-01-16 이재영 System and method for inspecting marks on semiconductor device using optical character recognition
US6429460B1 (en) * 2000-09-28 2002-08-06 United Epitaxy Company, Ltd. Highly luminous light emitting device
KR100377302B1 (en) * 2000-10-25 2003-03-26 김광범 The method of manufacturing a electrode of hydrous ruthenium oxide thin film electrode and the installation thereof
JP2002164556A (en) 2000-11-27 2002-06-07 Kyocera Corp Back electrode type solar battery element
DE10104726A1 (en) 2001-02-02 2002-08-08 Siemens Solar Gmbh Process for structuring an oxide layer applied to a carrier material
JP2002280360A (en) 2001-03-16 2002-09-27 Nec Corp Manufacturing method for semiconductor device
US20020176927A1 (en) * 2001-03-29 2002-11-28 Kodas Toivo T. Combinatorial synthesis of material systems
US20020184969A1 (en) 2001-03-29 2002-12-12 Kodas Toivo T. Combinatorial synthesis of particulate materials
US6524880B2 (en) * 2001-04-23 2003-02-25 Samsung Sdi Co., Ltd. Solar cell and method for fabricating the same
KR100406534B1 (en) 2001-05-03 2003-11-20 주식회사 하이닉스반도체 Method for fabricating ruthenium thin film
US6841728B2 (en) * 2002-01-04 2005-01-11 G.T. Equipment Technologies, Inc. Solar cell stringing machine
JP2003209169A (en) 2002-01-17 2003-07-25 Matsushita Electric Ind Co Ltd Manufacturing method of semiconductor device
US6649211B2 (en) 2002-02-28 2003-11-18 The United States Of America As Represented By The Secretary Of The Navy Selective deposition of hydrous ruthenium oxide thin films
EP1514189A1 (en) 2002-06-20 2005-03-16 Tokyo Electron Device Limited Memory device, memory managing method and program
EP1378947A1 (en) 2002-07-01 2004-01-07 Interuniversitair Microelektronica Centrum Vzw Semiconductor etching paste and the use thereof for localised etching of semiconductor substrates
US7042035B2 (en) 2002-08-02 2006-05-09 Unity Semiconductor Corporation Memory array with high temperature wiring
DE10239845C1 (en) 2002-08-29 2003-12-24 Day4 Energy Inc Electrode for photovoltaic cells, photovoltaic cell and photovoltaic module
DE10241300A1 (en) * 2002-09-04 2004-03-18 Merck Patent Gmbh Etching for silicon surfaces and layers, used in photovoltaic, semiconductor and high power electronics technology, for producing photodiode, circuit, electronic device or solar cell, is thickened alkaline liquid
DE10251446B4 (en) 2002-11-05 2004-11-11 Day4 Energy Inc. Cooling arrangement for light-bundling photovoltaic systems
US7825516B2 (en) 2002-12-11 2010-11-02 International Business Machines Corporation Formation of aligned capped metal lines and interconnections in multilevel semiconductor structures
JP2004193350A (en) * 2002-12-11 2004-07-08 Sharp Corp Solar battery cell and its manufacturing method
US6855453B2 (en) * 2002-12-30 2005-02-15 Utc Fuel Cells, Llc Fuel cell having a corrosion resistant and protected cathode catalyst layer
US7339110B1 (en) * 2003-04-10 2008-03-04 Sunpower Corporation Solar cell and method of manufacture
US7388147B2 (en) * 2003-04-10 2008-06-17 Sunpower Corporation Metal contact structure for solar cell and method of manufacture
US6983872B2 (en) 2003-06-03 2006-01-10 Asm Assembly Automation Ltd. Substrate alignment method and apparatus
US7265037B2 (en) 2003-06-20 2007-09-04 The Regents Of The University Of California Nanowire array and nanowire solar cells and methods for forming the same
JP2005032800A (en) 2003-07-08 2005-02-03 Renesas Technology Corp Method of manufacturing semiconductor device
US7455787B2 (en) * 2003-08-01 2008-11-25 Sunpower Corporation Etching of solar cell materials
US6998288B1 (en) * 2003-10-03 2006-02-14 Sunpower Corporation Use of doped silicon dioxide in the fabrication of solar cells
KR100571818B1 (en) 2003-10-08 2006-04-17 삼성전자주식회사 light emitting device and method of manufacturing the same
US7095104B2 (en) 2003-11-21 2006-08-22 International Business Machines Corporation Overlap stacking of center bus bonded memory chips for double density and method of manufacturing the same
WO2005083799A1 (en) * 2004-02-24 2005-09-09 Bp Corporation North America Inc Process for manufacturing photovoltaic cells
US7208344B2 (en) * 2004-03-31 2007-04-24 Aptos Corporation Wafer level mounting frame for ball grid array packaging, and method of making and using the same
US7419846B2 (en) * 2004-04-13 2008-09-02 The Trustees Of Princeton University Method of fabricating an optoelectronic device having a bulk heterojunction
JP2005314713A (en) 2004-04-27 2005-11-10 L'air Liquide Sa Pour L'etude & L'exploitation Des Procede S Georges Claude Method for manufacturing ruthenium film or ruthenium oxide film
EP1747595A1 (en) * 2004-05-18 2007-01-31 MERCK PATENT GmbH Formulation for ink-jet printing comprising semiconducting polymers
US20060174933A1 (en) 2005-02-09 2006-08-10 Debra Rolison TiO2 aerogel-based photovoltaic electrodes and solar cells
EP1696492B1 (en) * 2005-02-25 2012-04-11 Sanyo Electric Co., Ltd. Photovoltaic cell
US8334058B2 (en) 2005-04-14 2012-12-18 Merck Patent Gmbh Compounds for organic electronic devices
US7375378B2 (en) 2005-05-12 2008-05-20 General Electric Company Surface passivated photovoltaic devices
EP1734589B1 (en) 2005-06-16 2019-12-18 Panasonic Intellectual Property Management Co., Ltd. Method for manufacturing photovoltaic module
DE102005031469A1 (en) 2005-07-04 2007-01-11 Merck Patent Gmbh Medium for the etching of oxidic, transparent, conductive layers
US7468485B1 (en) * 2005-08-11 2008-12-23 Sunpower Corporation Back side contact solar cell with doped polysilicon regions
US20070099806A1 (en) * 2005-10-28 2007-05-03 Stewart Michael P Composition and method for selectively removing native oxide from silicon-containing surfaces
CN101305454B (en) 2005-11-07 2010-05-19 应用材料股份有限公司 Method for forming photovoltaic contact and wiring
EP1958242A4 (en) 2005-11-24 2010-02-24 Newsouth Innovations Pty Ltd High efficiency solar cell fabrication
CN102420271B (en) * 2005-12-21 2016-07-06 太阳能公司 Back side contact solar cell structures and manufacture method
US20070144577A1 (en) 2005-12-23 2007-06-28 Rubin George L Solar cell with physically separated distributed electrical contacts
US7291869B2 (en) 2006-02-06 2007-11-06 Infieon Technologies A.G. Electronic module with stacked semiconductors
JP4827550B2 (en) 2006-02-14 2011-11-30 シャープ株式会社 Manufacturing method of solar cell
CN101062612A (en) * 2006-04-29 2007-10-31 明基电通股份有限公司 Fluid ejecting device and method for making the same
US7737357B2 (en) * 2006-05-04 2010-06-15 Sunpower Corporation Solar cell having doped semiconductor heterojunction contacts
JP4568254B2 (en) * 2006-07-20 2010-10-27 三洋電機株式会社 Solar cell module
US8008575B2 (en) * 2006-07-24 2011-08-30 Sunpower Corporation Solar cell with reduced base diffusion area
FR2906404B1 (en) 2006-09-21 2008-12-19 Commissariat Energie Atomique PROCESS FOR METALLIZING MULTIPLE RECOVERED PHOTOVOLTAIC CELLS
FR2906405B1 (en) * 2006-09-22 2008-12-19 Commissariat Energie Atomique METHOD OF MAKING DOPED REGIONS IN A SUBSTRATE AND PHOTOVOLTAIC CELL
KR20090107494A (en) * 2006-12-05 2009-10-13 나노 테라 인코포레이티드 Method for patterning a surface
WO2008098407A1 (en) 2007-02-08 2008-08-21 Suntech Power Co., Ltd Hybrid silicon solar cells and method of fabricating same
JP2010527146A (en) * 2007-05-07 2010-08-05 ジョージア テック リサーチ コーポレイション Formation of high quality back contact with screen printed local back surface field
KR20080100057A (en) 2007-05-11 2008-11-14 주성엔지니어링(주) Manufacturing method of crystalline silicon solar cell and manufacturing apparatus and system for the same
US20090056797A1 (en) 2007-08-28 2009-03-05 Blue Square Energy Incorporated Photovoltaic Thin-Film Solar Cell and Method Of Making The Same
EP2198367A1 (en) * 2007-08-31 2010-06-23 Applied Materials, Inc. Photovoltaic production line
WO2009029900A1 (en) 2007-08-31 2009-03-05 Applied Materials, Inc. Improved methods of emitter formation in solar cells
CN101889348B (en) * 2007-11-19 2013-03-27 应用材料公司 Solar cell contact formation process using a patterned etchant material
TW200939509A (en) * 2007-11-19 2009-09-16 Applied Materials Inc Crystalline solar cell metallization methods
CN102017176A (en) * 2008-03-25 2011-04-13 应用材料股份有限公司 Surface cleaning and texturing process for crystalline solar cells
US8207444B2 (en) * 2008-07-01 2012-06-26 Sunpower Corporation Front contact solar cell with formed electrically conducting layers on the front side and backside
WO2010009297A2 (en) * 2008-07-16 2010-01-21 Applied Materials, Inc. Hybrid heterojunction solar cell fabrication using a doping layer mask
US8053867B2 (en) * 2008-08-20 2011-11-08 Honeywell International Inc. Phosphorous-comprising dopants and methods for forming phosphorous-doped regions in semiconductor substrates using phosphorous-comprising dopants
US20100051085A1 (en) * 2008-08-27 2010-03-04 Weidman Timothy W Back contact solar cell modules
TW201027766A (en) * 2008-08-27 2010-07-16 Applied Materials Inc Back contact solar cells using printed dielectric barrier
WO2011071937A2 (en) * 2009-12-07 2011-06-16 Applied Materials, Inc. Method of cleaning and forming a negatively charged passivation layer over a doped region
DE112011101134T5 (en) * 2010-03-30 2013-01-10 Applied Materials, Inc. A method of forming a negatively charged passivation layer over a distributed p-doped region
US20110272024A1 (en) * 2010-04-13 2011-11-10 Applied Materials, Inc. MULTI-LAYER SiN FOR FUNCTIONAL AND OPTICAL GRADED ARC LAYERS ON CRYSTALLINE SOLAR CELLS
WO2011140355A2 (en) * 2010-05-07 2011-11-10 Applied Materials, Inc. Oxide nitride stack for backside reflector of solar cell

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05308148A (en) * 1992-03-05 1993-11-19 Tdk Corp Solar cell
JPH11274538A (en) * 1998-01-20 1999-10-08 Sharp Corp Substrate for forming high-strength thin semiconductor element, high-strength thin semiconductor element and manufacture thereof
KR20040042209A (en) * 2002-11-13 2004-05-20 삼성에스디아이 주식회사 Silicon solar battery of thin film type
KR20080003623A (en) * 2006-07-03 2008-01-08 엘지전자 주식회사 High efficiency solar cell and manufacturing method thereof

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104911595A (en) * 2015-06-23 2015-09-16 西安空间无线电技术研究所 Corrosion solution for TiW films and corrosion method thereof
CN104911595B (en) * 2015-06-23 2018-02-09 西安空间无线电技术研究所 A kind of TiW film layers caustic solution

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