IT1394647B1 - IMPROVED VISION SYSTEM FOR ALIGNMENT OF A SCREEN PRINTING SCHEME - Google Patents

IMPROVED VISION SYSTEM FOR ALIGNMENT OF A SCREEN PRINTING SCHEME

Info

Publication number
IT1394647B1
IT1394647B1 ITUD2009A000119A ITUD20090119A IT1394647B1 IT 1394647 B1 IT1394647 B1 IT 1394647B1 IT UD2009A000119 A ITUD2009A000119 A IT UD2009A000119A IT UD20090119 A ITUD20090119 A IT UD20090119A IT 1394647 B1 IT1394647 B1 IT 1394647B1
Authority
IT
Italy
Prior art keywords
alignment
screen printing
vision system
improved vision
printing scheme
Prior art date
Application number
ITUD2009A000119A
Other languages
Italian (it)
Inventor
Marco Galiazzo
Andrea Baccini
Timothy W Weidman
Sunhome Steve Paak
Hongbin Fang
Zhenhua Zhang
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to ITUD2009A000119A priority Critical patent/IT1394647B1/en
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to PCT/US2009/059453 priority patent/WO2010068331A1/en
Priority to KR1020117016082A priority patent/KR20110105382A/en
Priority to KR1020137019376A priority patent/KR101445625B1/en
Priority to EP09832274.6A priority patent/EP2359410A4/en
Priority to US13/133,919 priority patent/US8673679B2/en
Priority to CN2009801499419A priority patent/CN102318078B/en
Priority to JP2011540726A priority patent/JP5615837B2/en
Priority to TW099120279A priority patent/TWI451585B/en
Publication of ITUD20090119A1 publication Critical patent/ITUD20090119A1/en
Priority to US13/282,219 priority patent/US20120100666A1/en
Application granted granted Critical
Publication of IT1394647B1 publication Critical patent/IT1394647B1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02—Details
    • H01L31/0224—Electrodes
    • H01L31/022408—Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425—Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
    • H01L31/068—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PN homojunction type, e.g. bulk silicon PN homojunction solar cells or thin film polycrystalline silicon PN homojunction solar cells
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1804—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof comprising only elements of Group IV of the Periodic System
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41M—PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M1/00—Inking and printing with a printer's forme
    • B41M1/12—Stencil printing; Silk-screen printing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N1/00—Printing plates or foils; Materials therefor
    • B41N1/24—Stencils; Stencil materials; Carriers therefor
    • B41N1/248—Mechanical details, e.g. fixation holes, reinforcement or guiding means; Perforation lines; Ink holding means; Visually or otherwise detectable marking means; Stencil units
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/547—Monocrystalline silicon PV cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
ITUD2009A000119A 2008-12-10 2009-06-22 IMPROVED VISION SYSTEM FOR ALIGNMENT OF A SCREEN PRINTING SCHEME IT1394647B1 (en)

Priority Applications (10)

Application Number Priority Date Filing Date Title
ITUD2009A000119A IT1394647B1 (en) 2009-06-22 2009-06-22 IMPROVED VISION SYSTEM FOR ALIGNMENT OF A SCREEN PRINTING SCHEME
KR1020117016082A KR20110105382A (en) 2008-12-10 2009-10-02 Enhanced vision system for screen printing pattern alignment
KR1020137019376A KR101445625B1 (en) 2008-12-10 2009-10-02 Enhanced vision system for screen printing pattern alignment
EP09832274.6A EP2359410A4 (en) 2008-12-10 2009-10-02 Enhanced vision system for screen printing pattern alignment
PCT/US2009/059453 WO2010068331A1 (en) 2008-12-10 2009-10-02 Enhanced vision system for screen printing pattern alignment
US13/133,919 US8673679B2 (en) 2008-12-10 2009-10-02 Enhanced vision system for screen printing pattern alignment
CN2009801499419A CN102318078B (en) 2008-12-10 2009-10-02 Enhanced vision system for screen printing pattern alignment
JP2011540726A JP5615837B2 (en) 2008-12-10 2009-10-02 Enhanced visual system for screen printing pattern alignment
TW099120279A TWI451585B (en) 2009-06-22 2010-06-22 Enhanced vision system for screen printing pattern alignment
US13/282,219 US20120100666A1 (en) 2008-12-10 2011-10-26 Photoluminescence image for alignment of selective-emitter diffusions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ITUD2009A000119A IT1394647B1 (en) 2009-06-22 2009-06-22 IMPROVED VISION SYSTEM FOR ALIGNMENT OF A SCREEN PRINTING SCHEME

Publications (2)

Publication Number Publication Date
ITUD20090119A1 ITUD20090119A1 (en) 2010-12-23
IT1394647B1 true IT1394647B1 (en) 2012-07-05

Family

ID=42110952

Family Applications (1)

Application Number Title Priority Date Filing Date
ITUD2009A000119A IT1394647B1 (en) 2008-12-10 2009-06-22 IMPROVED VISION SYSTEM FOR ALIGNMENT OF A SCREEN PRINTING SCHEME

Country Status (2)

Country Link
IT (1) IT1394647B1 (en)
TW (1) TWI451585B (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI476874B (en) * 2011-07-29 2015-03-11 Hon Hai Prec Ind Co Ltd Glass pad with circuit trace and method of making the same
TWI424584B (en) * 2011-11-30 2014-01-21 Au Optronics Corp Method of forming solar cell
CN108674010A (en) * 2018-06-28 2018-10-19 无锡奥特维科技股份有限公司 Screen printing apparatus, laminating machine and method for printing screen
CN113905561B (en) * 2021-10-11 2023-02-24 Oppo广东移动通信有限公司 Shell with texture pattern, processing method thereof and electronic equipment

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5709905A (en) * 1997-01-28 1998-01-20 Motorola, Inc. Apparatus and method for automatic monitoring and control of stencil printing
JPH10284359A (en) * 1997-04-11 1998-10-23 Mitsubishi Electric Corp Device and method for recognizing wafer
JP4541560B2 (en) * 1999-02-08 2010-09-08 キヤノン株式会社 Electronic device, electron source, and method of manufacturing image forming apparatus
DE10146879A1 (en) * 2001-09-26 2003-04-17 Thermosensorik Gmbh Method for non-destructive detection of cracks in silicon wafers and solar cells involves placement of the test item between a light source and an electronic camera so that light transmitted through any cracks can be detected
JP3838911B2 (en) * 2001-12-25 2006-10-25 京セラ株式会社 Method for manufacturing solar cell element
KR100700176B1 (en) * 2002-12-18 2007-03-27 엘지.필립스 엘시디 주식회사 Dispenser of liquid crystal display panel and method for controlling gap between substrate and nozzle using the same
US7171897B2 (en) * 2003-06-05 2007-02-06 Georgia Tech Research Corporation System and methods for data-driven control of manufacturing processes
JP2005011886A (en) * 2003-06-17 2005-01-13 Sharp Corp Solar cell and manufacturing method therefor
DE102005061785B4 (en) * 2005-12-23 2008-04-03 Basler Ag Method and apparatus for detecting cracks in silicon wafers
TW200818526A (en) * 2006-10-04 2008-04-16 Gigastorage Corp Method for forming a solar cell
TWI401810B (en) * 2006-10-04 2013-07-11 Gigastorage Corp Solar cell
JP2008139251A (en) * 2006-12-05 2008-06-19 Toshiba Corp Ion implantation pattern detecting technique
DE102007006525B4 (en) * 2007-02-06 2009-05-14 Basler Ag Method and device for detecting defects
KR20080100057A (en) * 2007-05-11 2008-11-14 주성엔지니어링(주) Manufacturing method of crystalline silicon solar cell and manufacturing apparatus and system for the same
DE102007057011B4 (en) * 2007-11-23 2011-04-28 Pi Photovoltaik-Institut Berlin Ag Detecting device and method for detecting damage of a solar cell by means of photoluminescence
US8215473B2 (en) * 2008-05-21 2012-07-10 Applied Materials, Inc. Next generation screen printing system
WO2010009297A2 (en) * 2008-07-16 2010-01-21 Applied Materials, Inc. Hybrid heterojunction solar cell fabrication using a doping layer mask

Also Published As

Publication number Publication date
TWI451585B (en) 2014-09-01
ITUD20090119A1 (en) 2010-12-23
TW201121086A (en) 2011-06-16

Similar Documents

Publication Publication Date Title
GB2483184B (en) Negative pixel compensation
FR2953940B1 (en) METHOD FOR GEO-REFERENCING AN IMAGE AREA
GB2474337B (en) Negative pixel compensation
GB0900867D0 (en) Image compensation apparatus
HK1191780A1 (en) Auto-focus image system
EP2118849A4 (en) Method for attaching tag to image of person
BRPI1009211A2 (en) "image sensor"
GB0920349D0 (en) Apparatus for attaching to spectacles
HK1176447A1 (en) Generating column offset corrections for image sensors
BR112012008066A2 (en) recovery of volatile carboxylic acids by a puller-puller system
BR112013011835A2 (en) offset compensation system
EP2286370A4 (en) System for using image alignment to map objects across disparate images
HK1175912A1 (en) Generating column offset corrections for image sensors
EP2034897A4 (en) Registering brain images by aligning reference ellipses
GB2461757B (en) Image display system
IT1394647B1 (en) IMPROVED VISION SYSTEM FOR ALIGNMENT OF A SCREEN PRINTING SCHEME
FR2947265B1 (en) PROCESS FOR THE PREPARATION OF ALKYLALCANOLAMINES
FR2953593B1 (en) PROCESS FOR PREPARING A CARROT OF CHARCOAL
FR2964336B1 (en) METHOD FOR DISTRESSING AN OPHTHALMIC LENS
GB0920129D0 (en) Correct scaling for superimposed images
FR2946451B1 (en) DISPLAY MODULE FOR VEHICLES
FR2950707B1 (en) METHOD FOR ADJUSTING A POSITION OF A TRANSPARENT ELEMENT
TWM390525U (en) Multi-color full image synthesis device and optical offset compensation device
FR2951159B1 (en) PROCESS FOR INERTING IMPURITIES
FR2943628B1 (en) METHOD FOR TAKING A RETRACTABLE SLEEVE