TWI397494B - Substrate lift transfer device and substrate processing transfer system - Google Patents
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Description
本發明，是有關於清淨搬運(Clean Material Handling)等的領域所使用的基板昇降移送裝置及基板處理移送系統。The present invention relates to a substrate lifting and transferring device and a substrate processing transfer system used in the field of clean material handling (Clean Material Handling) and the like.
在清淨搬運的領域，有使用在被配設在下階樓層的第1基板處理裝置及被配設在上階樓層的第2基板處理裝置之間，進行玻璃基板等的基板的昇降移送的基板昇降移送裝置。一般的基板昇降移送裝置的結構等，是如以下者。In the field of clean transportation, there is a substrate lift that is used for lifting and lowering the substrate such as a glass substrate between the first substrate processing apparatus disposed on the lower floor and the second substrate processing apparatus disposed on the upper floor. Transfer device. The structure and the like of a general substrate lifting and lowering device are as follows.
即，在第1基板處理裝置的附近，設有朝上下方向延伸的昇降導引，在此昇降導引中，將基板支撐的昇降載置台是可昇降地被設置。且，在昇降導引的適宜位置中，設有將昇降載置台昇降的昇降用馬達。在此，昇降載置台，是在對應第1基板處理裝置的高度，對於第1基板處理裝置可將基板拉出及送出。且，昇降載置台，是在對應第2基板處理裝置的高度，對於第2基板處理裝置可將基板拉出及送出。In other words, in the vicinity of the first substrate processing apparatus, an elevation guide that extends in the vertical direction is provided, and in this elevation guidance, the elevation mounting table that supports the substrate is provided to be movable up and down. Further, in a suitable position for lifting and lowering, a lifting motor for raising and lowering the lifting platform is provided. Here, the elevation mounting table is at a height corresponding to the first substrate processing apparatus, and the substrate can be pulled out and sent out by the first substrate processing apparatus. Further, the elevation mounting table is at a height corresponding to the second substrate processing apparatus, and the substrate can be pulled out and sent out by the second substrate processing apparatus.
因此，藉由昇降用馬達的驅動使昇降體下降，使昇降體位於對應第1基板處理裝置的高度。接著，基板是從第1基板處理裝置朝昇降載置台被拉出。且，藉由昇降用馬達的驅動使昇降體上昇，使昇降體位於對應第2基板處理裝置的高度。進一步，使基板從昇降載置台朝第2基板處理裝置被送出。Therefore, the elevating body is lowered by the driving of the elevating motor, and the elevating body is positioned at a height corresponding to the first substrate processing apparatus. Next, the substrate is pulled out from the first substrate processing apparatus toward the elevation mounting table. Then, the elevating body is raised by the driving of the elevating motor, and the elevating body is positioned at a height corresponding to the second substrate processing apparatus. Further, the substrate is sent out from the elevating mount to the second substrate processing apparatus.
如此，進行從第1基板處理裝置朝第2基板處理裝置的基板的昇降移送。且，藉由使基板昇降移送裝置進行前述動作的相反的動作，進行從前述第2基板處理裝置朝前述第1基板處理裝置的基板的昇降移送。In this manner, the lifting and lowering of the substrate from the first substrate processing apparatus to the second substrate processing apparatus is performed. Further, the substrate lifting and lowering device performs the reverse operation of the above operation, and the substrate transfer from the second substrate processing device to the substrate of the first substrate processing device is performed.
又，關連於本發明的先行技術，是如下述專利文獻1。Further, the prior art related to the present invention is as disclosed in Patent Document 1 below.
[專利文獻1]日本特開平1-318247號公報[Patent Document 1] Japanese Patent Laid-Open No. 1-318247
但是，在上述的一般的基板昇降移送裝置中，將基板支撐的昇降載置台因為是可昇降地被設置在昇降導引，所以成為將基板保持呈倒伏(水平)姿勢的方式進行昇降。因此，基板昇降移送裝置的占有平面積(設置平面積)是成為需要至少基板一枚分的平面積以上。因此，基板昇降移送裝置的占有平面積增大，工場內空間的有效利用是有困難。特別是，近年來，基板的大型化急速進行，此問題更顯著。However, in the above-described general substrate lifting and lowering device, since the elevating table supported by the substrate is provided on the elevating guide so as to be movable up and down, the elevating table is lifted and lowered in a posture in which the substrate is held in a vertical (horizontal) posture. Therefore, the flat area (the flat area to be set) of the substrate lifting and lowering device is required to be at least one flat area of the substrate. Therefore, the occupied flat area of the substrate lifting and lowering device is increased, and it is difficult to effectively utilize the space in the worksite. In particular, in recent years, the size of the substrate has been rapidly increased, and this problem has become more remarkable.
在此，本發明的目的是提供一種新穎構成的基板昇降移送裝置及基板處理移送系統，可以解決前述的問題。SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a substrate lift transfer device and a substrate process transfer system which are novel in construction and which solve the aforementioned problems.
本發明的基板昇降移送裝置，是一種基板昇降移送裝置，是在：被配設在下階供進行對於基板的處理的第1基板處理裝置、及被配設在上階供進行對於在與基板的處理的第2基板處理裝置之間，進行基板的昇降移送，其特徵為，具備：第1姿勢切換構件，在前述第1基板處理裝置的一側朝水平的軸心周圍可擺動地被設置，具備將基板保持用的第1姿勢切換用保持具，將基板的姿勢切換至倒伏姿勢及立起姿勢；及第1姿勢切換用致動器，供將前述第1姿勢切換構件擺動用；及第2姿勢切換構件，在前述第2基板處理裝置的一側朝水平的軸心周圍可擺動地被設置，具備將基板保持的第2姿勢切換用保持具，將基板的姿勢切換至倒伏姿勢及立起姿勢；及第2姿勢切換用致動器，供將前述第2姿勢切換構件擺動用；及環形狀構件，朝上下方向延伸且可循環行走地被設置在被立設於前述第1姿勢切換構件的一側的支撐框架；及行走用致動器，使前述環形狀構件循環行走；及複數昇降用保持具，在周方向隔有間隔被設置在前述環形狀構件，保持立起姿勢的基板。The substrate lifting and lowering device of the present invention is a substrate lifting and lowering device which is disposed in a lower stage for performing processing on a substrate, and is disposed on the upper stage for performing on the substrate The first substrate processing device is provided with the first posture switching member, and the first posture processing member is swingably provided around the horizontal axis around the first substrate processing device. a first posture switching holder for holding a substrate, switching the posture of the substrate to a falling posture and a standing posture; and a first posture switching actuator for swinging the first posture switching member; The posture switching member is provided so as to be swingable around the horizontal axis of the second substrate processing apparatus, and includes a second posture switching holder for holding the substrate, and switches the posture of the substrate to the lodging posture and the standing posture. And a second posture switching actuator for swinging the second posture switching member; and the ring-shaped member extending in the vertical direction and being circulated a support frame provided on one side of the first posture switching member; and a traveling actuator that circulates the ring-shaped member; and a plurality of lifting and lowering holders are provided at intervals in the circumferential direction of the ring-shaped member , the substrate that remains in the upright position.
又，在此，「設置」，是指直接地設置的情況以外，也包含透過介在構件間接地設置的情況。同樣地，「配設」，是指直接地設置的情況以外，也包含透過介在構件間接地設置的情況。且，「基板的處理」，是包含基板的搬運處理、基板的程序處理、基板的保管處理等，在程序處理中包含蝕刻處理、CVD處理、PVD處理等。Here, "setting" means that the setting is directly provided, and the case where the transmission is indirectly provided in the member. Similarly, the term "arrangement" refers to a case where the device is directly disposed, and the case where the device is disposed indirectly through the member. In addition, the "processing of the substrate" includes a substrate transport processing, a substrate processing, a substrate storage process, and the like, and the program processing includes an etching process, a CVD process, a PVD process, and the like.
依據本發明的基板昇降移送裝置，位於前述第1基板處理裝置的預定位置的基板，是藉由前述第1姿勢切換用保持具被保持。接著，使前述第1姿勢切換用致動器被驅動使前述第1姿勢切換構件被擺動，使基板的姿勢從倒伏姿勢朝立起姿勢切換。且，立起姿勢的基板，是藉由位於對應前述第1基板處理裝置的高度的前述昇降用保持具被保持，使由前述第1姿勢切換用保持具所產生的保持狀態被解除。進一步，使前述行走致動器被驅動使前述環形狀構件朝一方向循環行走，保持在立起姿勢且使基板上昇。前述的動作是藉由被反覆進行，使複數基板從前述第1基板處理裝置朝前述基板昇降移送裝置被送出。According to the substrate lifting and lowering device of the present invention, the substrate located at a predetermined position of the first substrate processing apparatus is held by the first posture switching holder. Then, the first posture switching actuator is driven to swing the first posture switching member, and the posture of the substrate is switched from the lodging posture to the standing posture. In addition, the substrate for standing up is held by the lifting and lowering holder at a height corresponding to the first substrate processing apparatus, and the holding state by the first posture switching holder is released. Further, the traveling actuator is driven to circulate the ring-shaped member in one direction, and is held in the standing posture to raise the substrate. The above operation is performed by repeating, and the plurality of substrates are sent out from the first substrate processing apparatus to the substrate lifting and lowering device.
將基板保持的前述昇降用保持具是位於對應前述第2基板處理裝置的高度之後，藉由前述第2姿勢切換用保持具使基板被保持，使由前述昇降用保持具所產生的保持狀態被解除。且，將前述第2姿勢切換用致動器驅動使前述第2姿勢切換構件被擺動，從立起姿勢朝倒伏姿勢切換基板的姿勢，使由前述第2姿勢切換用保持具所產生的保持狀態被解除。前述的動作是藉由被反覆進行，使複數基板從前述基板昇降移送裝置朝前述第2基板處理裝置被送出。After the height of the second substrate processing apparatus is maintained, the substrate for holding the substrate is held by the second posture switching holder, and the holding state by the lifting holder is Lifted. The second posture switching actuator is driven to swing the second posture switching member, and the posture of the substrate is switched from the standing posture to the falling posture to maintain the holding state by the second posture switching holder. Was released. The above operation is performed by repeating, and the plurality of substrates are sent out from the substrate lifting and lowering device toward the second substrate processing device.
如此，進行從前述第1基板處理裝置朝前述第2基板處理裝置的基板的昇降移送。且，進行藉由前述動作的相反的動作，進行從前述第2基板處理裝置朝前述第1基板處理裝置的基板的昇降移送。In this manner, the lifting and lowering of the substrate from the first substrate processing apparatus to the second substrate processing apparatus is performed. Then, the lifting operation of the substrate from the second substrate processing apparatus to the first substrate processing apparatus is performed by the reverse operation of the above operation.
總而言之，在本發明中，因為具有前述第1姿勢切換用保持具的前述第1姿勢切換構件，是朝水平的軸心周圍可擺動地設在前述第1基板處理裝置的一側；具有前述第2姿勢切換用保持具的前述第2姿勢切換構件，是朝水平的軸心周圍可擺動地設在前述第2基板處理裝置的一側；複數前述昇降用保持具，是在周方向隔有間隔被設置在前述環形狀構件，所以如上述，可以將立起姿勢保持且將基板昇降，可以將前述基板昇降移送裝置的占有平面積抑制在基板一枚分的平面積未滿。In the present invention, the first posture switching member having the first posture switching holder is provided on one side of the first substrate processing apparatus so as to be swingable around a horizontal axis; The second posture switching member of the posture switching holder is provided on one side of the second substrate processing apparatus so as to be swingable around a horizontal axis, and the plurality of lifting holders are spaced apart in the circumferential direction. Since it is provided in the ring-shaped member, as described above, the standing posture can be maintained and the substrate can be raised and lowered, and the flat area occupied by the substrate lifting and lowering device can be suppressed from being less than the flat area of one portion of the substrate.
且，因為朝上下方向延伸的前述環形狀構件，是可循環行走地設在前述支撐框架；複數前述昇降用保持具，是在周方向隔有間隔被設置在前述環形狀構件，所以可以從前述第1基板處理裝置朝前述第2基板處理裝置，或是從前述第2基板處理裝置朝前述第1基板處理裝置，將複數基板連續地昇降移送。Further, since the ring-shaped member extending in the vertical direction is rotatably provided in the support frame, the plurality of lifting and lowering holders are provided in the ring-shaped member at intervals in the circumferential direction, so that the above-described ring-shaped member can be provided. The first substrate processing apparatus continuously and vertically transports the plurality of substrates toward the second substrate processing apparatus or the second substrate processing apparatus toward the first substrate processing apparatus.
本發明的基板昇降移送裝置，是進行對於基板的處理及基板的昇降移送，具備：被配設在下階，進行對於基板的處理的第1基板處理裝置；及被配設在上階，進行對於基板的處理的第2基板處理裝置；及在前述第1基板處理裝置及前述第2基板處理裝置之間進行基板的昇降移送的上述基板昇降移送裝置。In the substrate lifting and lowering device of the present invention, the substrate is processed and the substrate is lifted and transferred, and the first substrate processing device is disposed on the lower stage to perform processing on the substrate, and is disposed on the upper stage to perform A second substrate processing apparatus for processing the substrate; and the substrate lifting and transferring device for performing the lifting and lowering of the substrate between the first substrate processing device and the second substrate processing device.
依據本發明的基板昇降移送裝置，就可達成與由上述基板昇降移送裝置所產生的作用同樣的作用。According to the substrate lifting and lowering device of the present invention, the same effect as that produced by the substrate lifting and lowering device can be achieved.
依據本發明，可以將前述基板昇降移送裝置的占有平面積抑制在基板一枚分的平面積未滿，可以將前述基板昇降移送裝置的占有平面積充分地削減，可以達成工場內空間的有效利用。According to the present invention, the flat area of the substrate lifting and lowering device can be suppressed from being less than the flat area of the substrate, and the flat area of the substrate lifting and lowering device can be sufficiently reduced, and the space in the work space can be effectively utilized. .
且，因為可以從前述第1基板處理裝置朝前述第2基板處理裝置，或是從前述第2基板處理裝置朝前述第1基板處理裝置，將複數基板連續地昇降移送，所以基板的昇降移送的周期時間(節拍時間(tact time))可以縮短，可以提高有關於基板的一連的作業能率。In addition, since the plurality of substrates can be continuously moved up and down from the first substrate processing apparatus to the second substrate processing apparatus or the second substrate processing apparatus to the first substrate processing apparatus, the substrate can be transferred up and down. The cycle time (tact time) can be shortened, and the operating energy rate with respect to the substrate can be improved.
一邊參照第1圖~第7圖一邊說明本發明的一實施例。又，圖面中，「FF」是前方向，「FR」是後方向，「L」是左方向，「R」是指示右方向。An embodiment of the present invention will be described with reference to Figs. 1 to 7 . Further, in the drawing, "FF" is the front direction, "FR" is the rear direction, "L" is the left direction, and "R" is the right direction.
如第1圖所示，本實施例的基板處理移送系統1，是進行對於玻璃基板等的基板W的搬運處理(基板的處理)及昇降移送的系統。且，基板處理移送系統1，是具備：被配設在下階樓層LF(下階)，進行基板W的搬運處理的第1基板搬運處理裝置(第1基板處理裝置)3；及被配設在上階樓層UF(上階)，對於基板W進行搬運處理的第2基板搬運處理裝置(第2基板處理裝置)5；及在第1基板搬運處理裝置3及第2基板搬運處理裝置5之間進行基板W的昇降移送的基板昇降移送裝置7。As shown in FIG. 1, the substrate processing transfer system 1 of the present embodiment is a system for performing a transfer process (process of a substrate) and a lift transfer of a substrate W such as a glass substrate. In addition, the substrate processing transfer system 1 includes a first substrate transfer processing device (first substrate processing device) 3 that is disposed on the lower floor LF (lower order) and transports the substrate W; The upper substrate UF (upper stage), the second substrate transfer processing device (second substrate processing device) 5 that performs the transfer processing on the substrate W, and the first substrate transfer processing device 3 and the second substrate transfer processing device 5 A substrate lift transfer device 7 that performs lift transfer of the substrate W.
說明第1基板搬運處理裝置3的結構。The configuration of the first substrate transfer processing device 3 will be described.
如第1圖所示，在下階樓層LF中，設有第1處理裝置本體9。第1處理裝置本體9，是構成第1基板搬運處理裝置3的基座。且，如第4圖所示，在第1處理裝置本體9中，設有藉由空氣的壓力將基板W浮上用的複數第1浮上組件11。在各第1浮上組件11的上面，形成有將空氣噴出的框狀的噴嘴11n。各噴嘴11n，是如日本國日本特開2006-182563號公報所示，對於鉛直方向朝組件中心側傾斜的方式構成。As shown in FIG. 1, the first processing apparatus main body 9 is provided in the lower floor LF. The first processing apparatus main body 9 is a susceptor that constitutes the first substrate transport processing apparatus 3. Further, as shown in FIG. 4, the first processing apparatus main body 9 is provided with a plurality of first floating upper assemblies 11 for floating the substrate W by the pressure of air. A frame-shaped nozzle 11n that ejects air is formed on the upper surface of each of the first floating assemblies 11. Each of the nozzles 11n is configured such that the vertical direction is inclined toward the center of the module as shown in Japanese Laid-Open Patent Publication No. 2006-182563.
又，可取代框狀的噴嘴11n，使複數圓孔狀的噴嘴形成於各第1浮上組件11的上面也可以。Further, instead of the frame-shaped nozzle 11n, a plurality of nozzles having a circular hole shape may be formed on the upper surface of each of the first floating members 11.
在第1處理裝置本體9中，朝搬運方向(左右方向)延伸的一對的第1滾子支撐構件13，是在搬運寬度方向(前後方向)隔離地被設置。在各第1滾子支撐構件13中，將基板W可搬運地支撐的複數第1搬運滾子15，是在搬運方向隔有間隔地被設置。各第1搬運滾子15，是朝水平的軸心周圍可旋轉。且，在各第1滾子支撐構件13的適宜位置中，各別設有將複數第1搬運滾子15旋轉的第1搬運用馬達17。各第1搬運用馬達17的輸出軸(圖示省略)，是透過由蝸輪及滾輪(worm screw and worm gear wheel)等所構成的連動機構(圖示省略)，與複數第1搬運滾子15的旋轉軸(圖示省略)連動連結。In the first processing apparatus main body 9, a pair of first roller supporting members 13 extending in the conveying direction (left-right direction) are provided in isolation in the conveying width direction (front-rear direction). In each of the first roller support members 13, a plurality of first transport rollers 15 that supportably transport the substrate W are provided at intervals in the transport direction. Each of the first conveyance rollers 15 is rotatable around a horizontal axis. Further, a first transport motor 17 that rotates the plurality of first transport rollers 15 is provided at each of the appropriate positions of the respective first roller support members 13. The output shaft (not shown) of each of the first transport motors 17 passes through a linkage mechanism (not shown) including a worm screw and a worm gear wheel, and a plurality of first transport rollers 15 The rotation axis (not shown) is linked in series.
說明第2基板搬運處理裝置5的結構。The configuration of the second substrate transfer processing device 5 will be described.
如第1圖所示，在上階樓層UF中，設有第2處理裝置本體19。第2處理裝置本體19，是構成第2基板搬運處理裝置5的基座。且，如第5圖所示，在第2處理裝置本體19中，設有藉由空氣的壓力將基板W浮上的複數第2浮上組件21。在各第2浮上組件21的上面，與第1浮上組件11同樣地，形成有將空氣噴出的框狀的噴嘴21n。As shown in Fig. 1, the second processing apparatus main body 19 is provided in the upper floor UF. The second processing apparatus main body 19 is a susceptor that constitutes the second substrate transport processing apparatus 5. Further, as shown in FIG. 5, the second processing apparatus main body 19 is provided with a plurality of second floating assemblies 21 that float the substrate W by the pressure of air. On the upper surface of each of the second floating upper assemblies 21, a frame-shaped nozzle 21n that ejects air is formed in the same manner as the first floating upper assembly 11.
在第2處理裝置本體19中，朝搬運方向延伸的一對的第2滾子支撐構件23，是在搬運寬度方向隔離地被設置。在各第2滾子支撐構件23中，將基板W可搬運地支撐的複數第2搬運滾子25，是在搬運方向隔有間隔地被設置。各第2搬運滾子25，是朝水平的軸心周圍可旋轉。且，在各第2滾子支撐構件23的適宜位置中，各別設有將複數第2搬運滾子25旋轉的第2搬運用馬達27。各第2搬運用馬達27的輸出軸(圖示省略)，是透過由蝸輪及滾輪等所構成的連動機構(圖示省略)，與複數第2搬運滾子25的旋轉軸(圖示省略)連動連結。In the second processing apparatus main body 19, a pair of second roller supporting members 23 that extend in the conveying direction are provided in isolation in the conveying width direction. In each of the second roller supporting members 23, the plurality of second transport rollers 25 that supportably transport the substrate W are provided at intervals in the transport direction. Each of the second conveyance rollers 25 is rotatable around a horizontal axis. Further, in a suitable position of each of the second roller supporting members 23, a second transport motor 27 that rotates the plurality of second transport rollers 25 is provided. The output shaft (not shown) of each of the second transport motors 27 is a linkage mechanism (not shown) that is formed by a worm wheel or a roller, and a rotation shaft (not shown) of the plurality of second transport rollers 25 Linked links.
說明基板昇降移送裝置7的具體的構成。A specific configuration of the substrate lifting and lowering device 7 will be described.
如第1圖所示，在第1基板搬運處理裝置3的第1處理裝置本體9的左側附近中，設有將基板W的姿勢切換至立起(垂直)姿勢(第1圖中假想線所示的姿勢)及倒伏(水平)姿勢(第1圖中實線所示的姿勢)的第1姿勢切換構件(第1姿勢切換用致動器)29。第1姿勢切換構件29，是透過一對的托架31朝水平的軸心周圍可擺動(可轉動)。且，如第4圖所示，第1姿勢切換構件29，是具備：第1擺動軸33、及平行地延伸的一對的第1擺動 臂35、及將基板W的背面吸著的複數第1姿勢切換用吸著墊片(第1姿勢切換用保持具)37。第1擺動軸33，是在第1處理裝置本體9的左側附近透過一對的托架31可旋轉地被設置。一對的第1擺動臂35，是與第1擺動軸33的外周面一體地形成。複數第1姿勢切換用吸著墊片37，是在長度方向隔有間隔被設置在各第1擺動臂35。As shown in Fig. 1, in the vicinity of the left side of the first processing apparatus main body 9 of the first substrate transport processing apparatus 3, the posture of the substrate W is switched to the vertical (vertical) posture (the imaginary line in Fig. 1). The first posture switching member (first posture switching actuator) 29 of the posture (the posture shown) and the posture of the vertical (horizontal) posture (the posture shown by the solid line in Fig. 1). The first posture switching member 29 is swingable (rotatable) around the horizontal axis through the pair of brackets 31. In addition, as shown in FIG. 4, the first posture switching member 29 includes a first swing shaft 33 and a pair of first swings extending in parallel. The arm 35 and the plurality of first posture switching suction pads (the first posture switching holder) 37 that suck the back surface of the substrate W. The first swing shaft 33 is rotatably provided through a pair of brackets 31 in the vicinity of the left side of the first processing apparatus main body 9. The pair of first swing arms 35 are integrally formed with the outer peripheral surface of the first swing shaft 33. The plurality of first posture switching suction pads 37 are provided in the respective first swing arms 35 at intervals in the longitudinal direction.
且，在一方的托架31中，設有將第1姿勢切換構件29擺動的第1姿勢切換用馬達(第1姿勢切換用致動器)39。第1姿勢切換用馬達39的輸出軸(圖示省略)，是透過聯接器(接頭、圖示省略)等，與第1擺動軸33連動連結。在此，第1姿勢切換構件29即使擺動。一對的第1擺動臂35也不會與第1浮上組件11干渉。In the one bracket 31, a first posture switching motor (first posture switching actuator) 39 that swings the first posture switching member 29 is provided. The output shaft (not shown) of the first posture switching motor 39 is connected to the first swing shaft 33 via a coupling (joint, not shown). Here, the first posture switching member 29 swings. The pair of first swing arms 35 do not dry up with the first floating upper assembly 11.
又，可取代第1擺動臂35上的第1姿勢切換用吸著墊片37，第1姿勢切換用保持具，是設有：將基板W的背面由非接觸保持的第1姿勢切換用柏努利挾盤(Bernoulli chuck)(圖示省略)、和將基板W的端部把持(保持)的第1姿勢切換用夾具(圖示省略)也可以。In addition, in place of the first posture switching absorbing pad 37 on the first oscillating arm 35, the first posture switching holder is provided with a cypress that switches the first posture of the substrate W by non-contact. The Bernoulli chuck (not shown) and the first posture switching jig (not shown) for holding (holding) the end portion of the substrate W may be used.
如第1圖及第3圖所示，在第2基板搬運處理裝置5的第2處理裝置本體19的左側附近中，設有將基板W的姿勢切換至立起姿勢(第3圖前假想線所示的姿勢)及倒伏姿勢(第3圖中實線所示的姿勢)的第2姿勢切換構件(第2姿勢切換用致動器)41。第2姿勢切換構件41，是透過一對的托架43朝水平的軸心周圍可擺動(可轉動)。且，如第5圖所示，第2姿勢切換構件41，是具備：第2擺動軸45、及平行地延伸的一對的第2擺動臂47、及將基板W的背面吸著的複數第2姿勢切換用吸著墊片(第2姿勢切換用保持具)49。第2擺動軸45，是透過一對的托架43可旋轉地被設置在第2處理裝置本體19的左側附近。一對的第2擺動臂47，是在第2擺動軸45的外周面一體形成。複數第2姿勢切換用吸著墊片49，是在長度方向隔有間隔被設置在各第2擺動臂47。As shown in FIG. 1 and FIG. 3, in the vicinity of the left side of the second processing apparatus main body 19 of the second substrate transport processing apparatus 5, the posture of the substrate W is switched to the standing posture (the imaginary line before the third drawing). The second posture switching member (second posture switching actuator) 41 of the posture shown and the posture of the lodging (the posture shown by the solid line in FIG. 3). The second posture switching member 41 is swingable (rotatable) around the horizontal axis through the pair of brackets 43. In addition, as shown in FIG. 5, the second posture switching member 41 includes a second swing shaft 45 and a pair of second swing arms 47 that extend in parallel, and a plurality of the second swing arm 47 that sucks the back surface of the substrate W. (2) Positional switching suction pad (second posture switching holder) 49. The second swing shaft 45 is rotatably provided in the vicinity of the left side of the second processing apparatus main body 19 through the pair of brackets 43. The pair of second swing arms 47 are integrally formed on the outer peripheral surface of the second swing shaft 45. The second posture switching suction pad 49 is provided in each of the second swing arms 47 at intervals in the longitudinal direction.
且，在一方的托架43中，設有將第2姿勢切換構件41擺動的第2姿勢切換用馬達(第2姿勢切換用致動器)51。第2姿勢切換用馬達51的輸出軸(圖示省略)，是透過聯接器(圖示省略)等，與第2擺動軸45連動連結。在此，第2姿勢切換構件41即使擺動，一對的第2擺動臂47也不會與第2浮上組件21干渉。In addition, the second posture switching motor (the second posture switching actuator) 51 that swings the second posture switching member 41 is provided in one of the brackets 43. An output shaft (not shown) of the second posture switching motor 51 is coupled to the second swing shaft 45 via a coupler (not shown). Here, even if the second posture switching member 41 is swung, the pair of second swing arms 47 do not dry up with the second floating upper assembly 21.
又，可取代第2擺動臂47上的第2姿勢切換用吸著墊片49，第2姿勢切換用保持具，是設有：將基板W的背面由非接觸保持的第2姿勢切換用柏努利挾盤(圖示省略)、和將基板W的端部把持(保持)的第2姿勢切換用夾具(圖示省略)也可以。In addition, the second posture switching absorbing pad 49 on the second oscillating arm 47 is provided, and the second posture switching holder is provided with a cypress for switching the second posture of the back surface of the substrate W by non-contact. The Nuoli disk (not shown) and the second posture switching jig (not shown) for holding (holding) the end portion of the substrate W may be used.
如第1圖、第4圖及第5圖所示，在第1姿勢切換構件29的左側附近，立設有朝上下方向延伸的一對的支撐框架53。一對的支撐框架53，是前後遠離地位置，且，與一體的連結。在各支撐框架53的上部中，上部帶輪或是上部鏈輪等的一對的上部旋轉車55，是透過共通的上部旋轉軸57可旋轉地被設置。且，在各支撐框架53的下部中，下部帶輪或是下部鏈輪等的一對的下部旋轉車59，是透過共通的下部旋轉軸61可旋轉地被設置。As shown in FIG. 1, FIG. 4, and FIG. 5, a pair of support frames 53 extending in the vertical direction are provided in the vicinity of the left side of the first posture switching member 29. The pair of support frames 53 are located forward and backward away from each other and are integrally connected. In the upper portion of each of the support frames 53, a pair of upper rotating carts 55 such as an upper pulley or an upper sprocket are rotatably provided through a common upper rotating shaft 57. Further, in the lower portion of each of the support frames 53, a pair of lower rotating vehicles 59 such as a lower pulley or a lower sprocket are rotatably provided through the common lower rotating shaft 61.
進一步，朝上下方向延伸的可循環行走的環形皮帶或是環形鏈條等的環形狀構件63，是從對應關係中的上部旋轉車55橫跨下部旋轉車59捲繞。換言之，一對的環形狀構件63，是透過上部旋轉車55及下部旋轉車59，在一對的支撐框架53之間可循環行走地被設置。且，將一對的環形狀構件63循環行走的行走用馬達(行走用致動器)65，是設在一方的支撐框架53的上部的適宜位置。行走用馬達65的輸出軸(圖示省略)，是透過聯接器(圖示省略)，與上部旋轉軸57連動連結。Further, the loop-shaped endless belt extending in the up-and-down direction or the ring-shaped member 63 such as an endless chain is wound around the lower rotating cart 59 from the upper rotating cart 55 in the corresponding relationship. In other words, the pair of ring-shaped members 63 are rotatably provided between the pair of support frames 53 through the upper rotating car 55 and the lower rotating car 59. Further, a traveling motor (traveling actuator) 65 that circulates the pair of ring-shaped members 63 is provided at an appropriate position on the upper portion of one of the support frames 53. An output shaft (not shown) of the traveling motor 65 is coupled to the upper rotating shaft 57 via a coupling (not shown).
如第1圖、第6圖及第7圖所示，朝前後方向延伸的複數連結桿67，是將一對的環形狀構件63連結的方式，在環形狀構件63的周方向隔有間隔被設置。在各連結桿67的兩端部中，設有將立起姿勢的基板W的端部把持的昇降用夾具(昇降用保持具)69。即，複數昇降用夾具69，是透過複數連結桿67，在周方向隔有間隔地設有一對的環形狀構件63。As shown in FIG. 1 , FIG. 6 , and FIG. 7 , the plurality of connecting rods 67 extending in the front-rear direction are connected to each other by a pair of ring-shaped members 63 , and are spaced apart from each other in the circumferential direction of the ring-shaped member 63 . Settings. In the both end portions of the connecting rods 67, a lifting jig (elevating holder) 69 for holding the end portion of the substrate W in the standing posture is provided. In other words, the plurality of lifting jigs 69 are provided with a pair of ring-shaped members 63 that are spaced apart in the circumferential direction through the plurality of connecting rods 67.
各昇降用夾具69，是具備：夾具本體71、及固定挾持爪(一對的挾持爪的其中之一)73、及可動挾持爪(一對的挾持爪的其中另一)77、及作動操作桿79、及彈簧81。夾具本體71，是設在連結桿67。固定挾持爪73，是與夾具本體71一體設置(形成)。可動挾持爪77，是設在夾具本體71，透過挾持銷75朝挾持方向/鬆開方向可擺動( 轉動)。且，可動挾持爪77，是與固定挾持爪73協動將基板W的端部把持。作動操作桿79，是與可動挾持爪77的基部一體設置。彈簧81，是位於連結桿67及作動操作桿79之間的方式，設在夾具本體71。且，彈簧81，是將可動挾持爪77朝挾持方向推迫。Each of the lifting jigs 69 includes a jig main body 71 and a fixed holding claw (one of the pair of gripping claws) 73 and a movable gripping claw (one of the pair of gripping claws) 77, and an operation operation Rod 79, and spring 81. The jig body 71 is provided on the connecting rod 67. The fixing claws 73 are integrally provided (formed) with the jig body 71. The movable gripping claw 77 is provided on the jig body 71 and is swingable by the gripping pin 75 in the holding/releasing direction ( Turn). Further, the movable grip claws 77 are engaged with the fixed grip claws 73 to hold the end portions of the substrate W. The actuating lever 79 is integrally provided with the base of the movable grip claw 77. The spring 81 is provided between the connecting rod 67 and the actuating operating lever 79, and is provided in the jig body 71. Further, the spring 81 urges the movable gripping claw 77 in the holding direction.
第1鬆開用氣壓缸(第1鬆開用致動器)83，是透過下部安裝臂85，設在各支撐框架53的下部的適宜位置。第1鬆開用氣壓缸83，是將位於對應第1基板搬運處理裝置3的高度的昇降用夾具69的作動操作桿79推壓，抵抗彈簧81的推迫力將可動挾持爪77朝鬆開方向擺動(移動)。同樣地，第2鬆開用氣壓缸(第2鬆開用致動器)87，是透過上部安裝臂89，設在各支撐框架53的上部的適宜位置。第2鬆開用氣壓缸87，是將位於對應第2基板搬運處理裝置5的高度的昇降用夾具69的作動操作桿79推壓，抵抗彈簧81的推迫力將可動挾持爪77朝鬆開方向擺動。The first release pneumatic cylinder (first release actuator) 83 is provided at a suitable position in the lower portion of each support frame 53 through the lower attachment arm 85. The first release pneumatic cylinder 83 presses the actuating operation lever 79 of the elevating jig 69 corresponding to the height of the first substrate transport processing device 3, and moves the movable gripping claw 77 toward the loosening direction against the biasing force of the spring 81. Swing (move). Similarly, the second release pneumatic cylinder (second release actuator) 87 is transmitted through the upper attachment arm 89 at an appropriate position on the upper portion of each support frame 53. The second release pneumatic cylinder 87 presses the actuating operation lever 79 of the elevating jig 69 corresponding to the height of the second substrate transport processing device 5, and moves the movable gripping claw 77 toward the loosening direction against the biasing force of the spring 81. swing.
又，可取代昇降用夾具69透過連結桿67設於一對的環形狀構件63，其他的昇降用保持具，是使將基板W的表面吸著的昇降用吸著墊片(圖示省略)透過連結桿67等設置也可以。Further, instead of the lifting jig 69, the pair of ring-shaped members 63 are provided through the connecting rod 67, and the other lifting and lowering holders are lifting and lowering suction pads for absorbing the surface of the substrate W (not shown). It can also be set by the connecting rod 67 or the like.
接著，說明本實施例的作用及效果。Next, the action and effect of the present embodiment will be described.
藉由從複數第1浮上組件11的噴嘴11n將空氣噴出，且將一對的第1搬運用馬達17驅動將複數第1搬運滾子15旋轉，將基板W朝左方向浮上搬運，使基板W位在待機的一對的第1擺動臂35的上側(第1基板搬運處理裝置3的預定位置)(第4圖參照)。The air is ejected from the nozzles 11n of the plurality of first floating assemblies 11 and the first transport rollers 17 are driven to rotate the plurality of first transport rollers 15 to transport the substrate W in the left direction to transport the substrate W. It is located on the upper side of the pair of first swing arms 35 (predetermined position of the first substrate conveyance processing device 3) (see FIG. 4).
將基板W位在待機的一對的第1擺動臂35的上側之後，由複數第1姿勢切換用吸著墊片37將基板W的背面吸著。且，如第1圖所示，將第1鬆開用氣壓缸83驅動將位於對應第1基板搬運處理裝置3的高度的昇降用夾具69的可動挾持爪77抵抗彈簧81的推迫力朝鬆開方向擺動(第7圖參照)。接著，如第1圖所示，將第1姿勢切換用馬達39驅動將第1姿勢切換構件29擺動，將基板W的姿勢從倒伏姿勢朝立起姿勢切換。After the substrate W is positioned on the upper side of the pair of standby first swing arms 35, the back surface of the substrate W is sucked by the plurality of first posture switching suction pads 37. As shown in Fig. 1, the first release pneumatic cylinder 83 drives the movable gripping claws 77 of the elevating jig 69 located at the height corresponding to the first substrate transporting processing device 3 against the biasing force of the spring 81. Direction swing (refer to Figure 7). Then, as shown in FIG. 1, the first posture switching motor 39 is driven to swing the first posture switching member 29, and the posture of the substrate W is switched from the lodging posture to the standing posture.
且，停止各第1鬆開用氣壓缸83的驅動將立起姿勢的基板W的端部由昇降用夾具69把持，將由複數第1姿勢切換用吸著墊片37所產生的吸著狀態解除。進一步，如第2圖所示，將行走用馬達65驅動使環形狀構件63朝一方向循環行走，將立起姿勢保持且將基板W上昇。藉由反覆進行前述的動作，可以將複數基板W從第1基板搬運處理裝置3朝基板昇降移送裝置7依序送出。The end of the substrate W in which the driving of each of the first release cylinders 83 is stopped in the upright position is gripped by the lifting/lowering jig 69, and the suction state by the plurality of first posture switching suction pads 37 is released. . Further, as shown in FIG. 2, the traveling motor 65 is driven to circulate the ring-shaped member 63 in one direction, and the substrate W is raised while holding the standing posture. By repeating the above-described operations, the plurality of substrates W can be sequentially sent from the first substrate transfer processing device 3 to the substrate lift transfer device 7.
如第3圖所示，將基板W的端部把持的昇降用夾具69是上昇直到對應第2基板搬運處理裝置5的高度為止的話，停止環形狀構件63的循環行走。接著，由複數第2姿勢切換用吸著墊片49將基板W的背面吸著。將各第2鬆開用氣壓缸87驅動將位於對應第2基板搬運處理裝置5的高度的昇降用夾具69的可動挾持爪77抵抗彈簧81的推迫力朝鬆開方向擺動，將由昇降用夾具69所產生的把持狀態解除(第7圖參照)。As shown in FIG. 3, the lifting jig 69 for holding the end portion of the substrate W is raised until the height of the second substrate conveyance processing device 5 is reached, and the circulation of the ring-shaped member 63 is stopped. Next, the back surface of the substrate W is sucked by the plurality of second posture switching suction pads 49. The second gripping cylinders 87 drive the movable gripping claws 77 of the elevating jig 69 located at the height corresponding to the second substrate transporting processing device 5 to swing in the loosening direction against the biasing force of the spring 81, and the lifting jig 69 is lifted. The generated grip state is released (refer to Fig. 7).
且，如第3圖所示，將第2姿勢切換用馬達51驅動將第2姿勢切換構件41擺動使基板W的姿勢從立起姿勢朝倒伏姿勢切換，將由複數第2姿勢切換用吸著墊片49所產生的吸著狀態解除。藉由反覆進行前述的動作，可以將複數基板W從基板昇降移送裝置7朝第2基板搬運處理裝置5依序送出。As shown in FIG. 3, the second posture switching motor 51 is driven to swing the second posture switching member 41 to switch the posture of the substrate W from the standing posture to the falling posture, and the second posture switching suction pad is used. The absorbing state generated by the sheet 49 is released. By performing the above-described operations in reverse, the plurality of substrates W can be sequentially sent from the substrate lifting and lowering device 7 to the second substrate transfer processing device 5.
解除由複數第2姿勢切換用吸著墊片49所產生的吸著狀態之後，從複數第2浮上組件21的噴嘴21n將空氣噴出，且藉由將一對的第2搬運用馬達27驅動將複數第2搬運滾子25旋轉使基板W朝右方向浮上搬運，使基板W位在第2基板搬運處理裝置5的預定置位置(第5圖參照)。After the suction state by the plurality of second posture switching suction pads 49 is released, the air is ejected from the nozzles 21n of the plurality of second floating assemblies 21, and the pair of second transport motors 27 are driven. When the plurality of second transport rollers 25 rotate, the substrate W is transported in the right direction, and the substrate W is placed at a predetermined position of the second substrate transport processing device 5 (see FIG. 5).
如以上說明，由第1基板搬運處理裝置3所產生的基板W的搬運處理、及從第1基板搬運處理裝置3朝第2基板搬運處理裝置5的基板W的昇降移送、及由第2基板搬運處理裝置5所產生的基板W的搬運處理，可以依序地進行。且，藉由前述動作的相反的動作，由第2基板搬運處理裝置5所產生的基板W的搬運處理、及從第2基板搬運處理裝置5朝第1基板搬運處理裝置3的基板W的昇降移送、及由第1基板搬運處理裝置3將所產生的基板W的搬運處理可以依序進行。As described above, the conveyance process of the substrate W by the first substrate transfer processing device 3 and the transfer of the substrate W from the first substrate transfer processing device 3 to the second substrate transfer processing device 5 and the second substrate are performed. The conveyance process of the substrate W by the conveyance processing apparatus 5 can be performed sequentially. In addition, the transport processing of the substrate W by the second substrate transport processing device 5 and the lifting and lowering of the substrate W from the second substrate transport processing device 5 to the first substrate transport processing device 3 are performed by the reverse operation of the above-described operation. The transfer and the conveyance processing of the generated substrate W by the first substrate transfer processing device 3 can be sequentially performed.
總而言之，在本實施例中，因為：i)具有複數第1姿勢切換用吸著墊片37的第1姿勢切換構件29，是朝水平的軸心周圍可擺動地設在第1基板搬運處理裝置3的左側附近，ii)具有複數第2姿勢切換用吸著墊片49的第2姿勢切換構件41，是朝水平的軸心周圍可擺動地設在第2基板搬運處理裝置5的左側附近，iii)複數昇降用夾具69，是在周方向隔有間隔被設置在一對的環形狀構件63，所以如上述，可以將立起姿勢保持且將基板W昇降，可以將基板昇降移送裝置7的占有平面積抑制在基板W一枚分的平面積未滿。In the present embodiment, the first posture switching member 29 having the plurality of first posture switching suction pads 37 is swingably provided around the horizontal axis center in the first substrate conveyance processing device. In the vicinity of the left side of the third substrate, the second posture switching member 41 having the plurality of second posture switching suction pads 49 is provided in the vicinity of the left side of the second substrate conveyance processing device 5 so as to be swingable around the horizontal axis. Iii) The plurality of lifting jigs 69 are provided in a pair of ring-shaped members 63 at intervals in the circumferential direction. Therefore, as described above, the standing posture can be maintained and the substrate W can be moved up and down, and the substrate lifting and lowering device 7 can be moved. The occupied flat area suppresses the flat area of one portion of the substrate W from being insufficient.
且，在本實施例中，因為：iV)朝上下方向延伸的一對的環形狀構件63，是可循環行走地設在一對的支撐框架53，v)複數昇降用夾具69，是在周方向隔有間隔被設置在一對的環形狀構件63，所以可以從第1基板搬運處理裝置3朝第2基板搬運處理裝置5，或是從第2基板搬運處理裝置5朝第1基板搬運處理裝置3，將複數基板W連續地昇降移送。Further, in the present embodiment, the pair of ring-shaped members 63 extending in the vertical direction are: iV) are provided in a pair of support frames 53 so as to be rotatable, v) the plurality of lifting jigs 69 are in the week Since the direction is provided in the pair of ring-shaped members 63 at intervals, the first substrate transfer processing device 3 can be transported from the second substrate transfer processing device 5 to the first substrate transfer processing device 5 to the first substrate. The device 3 continuously lifts and transports the plurality of substrates W.
因此，因為可以將基板昇降移送裝置7的占有平面積抑制在基板W一枚分的平面積未滿，所以可以將基板昇降移送裝置7的占有平面積充分地削減，可以達成工場內空間的有效利用。Therefore, since the flat area of the substrate lifting/lowering device 7 can be suppressed, the flat area of one portion of the substrate W is not sufficient, so that the occupied flat area of the substrate lifting and lowering device 7 can be sufficiently reduced, and the space in the work space can be effectively achieved. use.
且，因為從第1基板搬運處理裝置3朝第2基板搬運處理裝置5，或是從第2基板搬運處理裝置5朝第1基板搬運處理裝置3將複數基板W連續地昇降移送，所以基板W的昇降移送的周期時間可以縮短，可以提高有關於基板W的一連的作業能率。In addition, since the plurality of substrates W are continuously moved up and down from the first substrate transfer processing device 3 to the second substrate transfer processing device 5 or from the second substrate transfer processing device 5 to the first substrate transfer processing device 3, the substrate W is transferred. The cycle time of the lift transfer can be shortened, and the continuous work energy rate with respect to the substrate W can be improved.
進一步，下階樓層LF及上階樓層UF的高度間隔大的情況時，可以增加昇降用夾具69的個數，作為保管多數的基板W的裝置可以利用基板昇降移送裝置7。Further, when the height interval between the lower floor LF and the upper floor UF is large, the number of the lifting jigs 69 can be increased, and the substrate lifting and lowering device 7 can be used as a device for storing a plurality of substrates W.
又，本發明不限定前述的實施例的說明，可由各種態樣實施。且，本發明所包含的權利範圍不限定於這些的實施例。Further, the present invention is not limited to the description of the foregoing embodiments, and can be implemented in various aspects. Further, the scope of the invention is not limited to the embodiments.
LF．．．下階樓層LF. . . Lower floor
UF．．．上階樓層UF. . . Upper floor
W．．．基板W. . . Substrate
1．．．基板處理移送系統1. . . Substrate processing transfer system
3．．．第1基板搬運處理裝置3. . . First substrate transfer processing device
5．．．第2基板搬運處理裝置5. . . Second substrate transfer processing device
7．．．基板昇降移送裝置7. . . Substrate lifting and transferring device
11．．．第1浮上組件11. . . First floating component
15．．．第1搬運滾子15. . . First carrying roller
17．．．第1搬運用馬達17. . . First transport motor
21．．．第2浮上組件twenty one. . . 2nd floating component
25．．．第2搬運滾子25. . . 2nd carrying roller
27．．．第2搬運用馬達27. . . Second transport motor
29．．．第1姿勢切換構件29. . . First posture switching member
33．．．第1擺動軸33. . . First swing axis
35．．．第1擺動臂35. . . First swing arm
37．．．第1姿勢切換用吸著墊片37. . . The first posture switching suction pad
39．．．第1姿勢切換用馬達39. . . First posture switching motor
41．．．第2姿勢切換構件41. . . Second posture switching member
45．．．第2擺動軸45. . . 2nd swing axis
47．．．第2擺動臂47. . . Second swing arm
49．．．第2姿勢切換用吸著墊片49. . . The second posture switching suction pad
51．．．第2姿勢切換用馬達51. . . Second posture switching motor
53．．．支撐框架53. . . Support frame
55．．．上部旋轉車55. . . Upper car
59．．．下部旋轉車59. . . Lower rotating car
63．．．環形(無端)狀構件63. . . Annular (endless) member
65．．．行走用馬達65. . . Travel motor
67．．．連結桿67. . . Connecting rod
69．．．昇降用夾具69. . . Lifting fixture
71．．．夾具本體71. . . Fixture body
73．．．固定挾持爪73. . . Fixed holding claw
77．．．可動挾持爪77. . . Movable claw
79．．．作動操作桿79. . . Actuating lever
81．．．彈簧81. . . spring
83．．．第1鬆開用氣壓缸83. . . 1st release pneumatic cylinder
87．．．第2鬆開用氣壓缸87. . . 2nd release pneumatic cylinder
[第1圖]顯示本發明的基板處理移送系統的實施例的側剖面圖。[Fig. 1] A side cross-sectional view showing an embodiment of a substrate processing transfer system of the present invention.
[第2圖]顯示前述基板處理移送系統的動作的側剖面圖。[Fig. 2] A side cross-sectional view showing the operation of the substrate processing transfer system.
[第3圖]顯示前述基板處理移送系統的動作的側剖面圖。[Fig. 3] A side cross-sectional view showing the operation of the substrate processing transfer system.
[第4圖]第1圖中的沿著IV-IV線的平剖面圖。[Fig. 4] A plan sectional view taken along line IV-IV in Fig. 1.
[第5圖]第1圖中的沿著V-V線的平剖面圖。[Fig. 5] A plan sectional view taken along line V-V in Fig. 1.
[第6圖]昇降用夾具周邊的立體圖。[Fig. 6] A perspective view of the periphery of the lifting jig.
[第7圖]顯示昇降用夾具的鬆開動作的側剖面圖。[Fig. 7] A side cross-sectional view showing the releasing operation of the lifting jig.
LF．．．下階樓層LF. . . Lower floor
UF．．．上階樓層UF. . . Upper floor
W．．．基板W. . . Substrate
1．．．基板處理移送系統1. . . Substrate processing transfer system
3．．．第1基板搬運處理裝置3. . . First substrate transfer processing device
5．．．第2基板搬運處理裝置5. . . Second substrate transfer processing device
7．．．基板昇降移送裝置7. . . Substrate lifting and transferring device
9．．．第1處理裝置本體9. . . First processing device body
19．．．第2處理裝置本體19. . . Second processing device body
29．．．第1姿勢切換構件29. . . First posture switching member
31．．．托架31. . . bracket
33．．．第1擺動軸33. . . First swing axis
35．．．第1擺動臂35. . . First swing arm
37．．．第1姿勢切換用吸著墊片37. . . The first posture switching suction pad
41．．．第2姿勢切換構件41. . . Second posture switching member
43．．．托架43. . . bracket
45．．．第2擺動軸45. . . 2nd swing axis
47．．．第2擺動臂47. . . Second swing arm
49．．．第2姿勢切換用吸著墊片49. . . The second posture switching suction pad
53．．．支撐框架53. . . Support frame
55．．．上部旋轉車55. . . Upper car
57．．．上部旋轉軸57. . . Upper rotary axis
59．．．下部旋轉車59. . . Lower rotating car
61．．．下部旋轉軸61. . . Lower rotation axis
63．．．環形(無端)狀構件63. . . Annular (endless) member
67．．．連結桿67. . . Connecting rod
69．．．昇降用夾具69. . . Lifting fixture
83．．．第1鬆開用氣壓缸83. . . 1st release pneumatic cylinder
85．．．上部安裝臂85. . . Upper mounting arm
87．．．第2鬆開用氣壓缸87. . . 2nd release pneumatic cylinder
89．．．下部安裝臂89. . . Lower mounting arm
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| JP2009082699A JP5347652B2 (en) | 2009-03-30 | 2009-03-30 | Substrate lifting / lowering transfer apparatus and substrate processing / transfer system |
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| JP (1) | JP5347652B2 (en) |
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| CN102931120B (en) * | 2012-10-25 | 2017-09-29 | 上海集成电路研发中心有限公司 | Work-piece transmission system |
| CN110775863A (en) * | 2019-09-17 | 2020-02-11 | 苏州晶洲装备科技有限公司 | Lifting system for OLED panel display cleaning equipment |
| CN114346406B (en) * | 2022-02-14 | 2023-08-01 | 福建骏鹏智能制造有限公司 | Connecting device for welding battery energy storage box |
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| JP2002147022A (en) * | 2000-11-08 | 2002-05-22 | Sekisui Chem Co Ltd | Architectural column material carrying device to upper floor |
| JP2006206263A (en) * | 2005-01-28 | 2006-08-10 | Mitsubishi Materials Techno Corp | Transporting and delivering device of falling type |
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| CN101853799A (en) | 2010-10-06 |
| JP5347652B2 (en) | 2013-11-20 |
| CN101853799B (en) | 2012-02-22 |
| TW201038457A (en) | 2010-11-01 |
| JP2010238764A (en) | 2010-10-21 |
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