201038457 六、發明說明： 【發明所屬之技術領域】 本發明，是有關於清淨搬運（Clean Material Handling )等的領域所使用的基板昇降移送裝置及基板處 理移送系統。 【先前技術】 0 在清淨搬運的領域，有使用在被配設在下階樓層的第 1基板處理裝置及被配設在上階樓層的第2基板處理裝置 之間，進行玻璃基板等的基板的昇降移送的基板昇降移送 裝置。一般的基板昇降移送裝置的結構等，是如以下者。 即，在第1基板處理裝置的附近，設有朝上下方向延 伸的昇降導引，在此昇降導引中，將基板支撐的昇降載置 台是可昇降地被設置。且，在昇降導引的適宜位置中’設 有將昇降載置台昇降的昇降用馬達。在此，昇降載置台， 〇 是在對應第1基板處理裝置的高度，對於第1基板處理裝 置可將基板拉出及送出。且，昇降載置台，是在對應第2 基板處理裝置的高度，對於第2基板處理裝置可將基板拉 出及送出。 因此，藉由昇降用馬達的驅動使昇降體下降，使昇降 體位於對應第1基板處理裝置的高度。接著，基板是從第 1基板處理裝置朝昇降載置台被拉出。且，藉由昇降用馬 達的驅動使昇降體上昇，使昇降體位於對應第2基板處理 裝置的高度。進一步，使基板從昇降載置台朝第2基板處 -5- 201038457 理裝置被送出。 如此，進行從第1基板處理裝置朝第2基板處理裝置 的基板的昇降移送。且，藉由使基板昇降移送裝置進行前 述動作的相反的動作，進行從前述第2基板處理裝置朝前 述第1基板處理裝置的基板的昇降移送。 又，關連於本發明的先行技術，是如下述專利文獻1 [先行技術文獻] [專利文獻] [專利文獻1]日本特開平1 -3 1 8247號公報 【發明內容】 (本發明所欲解決的課題） 但是，在上述的一般的基板昇降移送裝置中，將基板 支撐的昇降載置台因爲是可昇降地被設置在昇降導引，所 以成爲將基板保持呈倒伏（水平）姿勢的方式進行昇降。 因此，基板昇降移送裝置的占有平面積（設置平面積）是 成爲需要至少基板一枚分的平面積以上。因此，基板昇降 移送裝置的占有平面積增大，工場內空間的有效利用是有 困難。特別是，近年來，基板的大型化急速進行，此問題 更顯著。 在此，本發明的目的是提供一種新穎構成的基板昇降 移送裝置及基板處理移送系統，可以解決前述的問題。 -6 - 201038457 (用以解決課題的手段） 本發明的基板昇降移送裝置，是一種基板昇降移送裝 置，是在：被配設在下階供進行對於基板的處理的第1基 板處理裝置、及被配設在上階供進行對於在與基板的處理 的第2基板處理裝置之間，進行基板的昇降移送，其特徵 爲，具備：第1姿勢切換構件，在前述第1基板處理裝置 的一側朝水平的軸心周圍可擺動地被設置，具備將基板保 Q 持用的第1姿勢切換用保持具，將基板的姿勢切換至倒伏 姿勢及立起姿勢；及第1姿勢切換用致動器，供將前述第 1姿勢切換構件擺動用；及第2姿勢切換構件，在前述第 2基板處理裝置的一側朝水平的軸心周圍可擺動地被設置 ，具備將基板保持的第2姿勢切換用保持具，將基板的姿 勢切換至倒伏姿勢及立起姿勢；及第2姿勢切換用致動器 ，供將前述第2姿勢切換構件擺動用；及環形狀構件，朝 上下方向延伸且可循環行走地被設置在被立設於前述第1 〇 姿勢切換構件的一側的支撐框架；及行走用致動器，使前 述環形狀構件循環行走；及複數昇降用保持具，在周方向 隔有間隔被設置在前述環形狀構件，保持立起姿勢的基板 〇 又’在此’ 「設置」，是指直接地設置的情況以外， 也包含透過介在構件間接地設置的情況。同樣地，「配設 」，是指直接地設置的情況以外，也包含透過介在構件間 接地設置的情況。且，「基板的處理」，是包含基板的搬 運處理、基板的程序處理、基板的保管處理等，在程序處 201038457 理中包含蝕刻處理、CVD處理、PVD處理等。 依據本發明的基板昇降移送裝置，位於前述第1基板 處理裝置的預定位置的基板，是藉由前述第1姿勢切換用 保持具被保持。接著，使前述第1姿勢切換用致動器被驅 動使前述第1姿勢切換構件被擺動，使基板的姿勢從倒伏 姿勢朝立起姿勢切換。且，立起姿勢的基板，是藉由位於 對應前述第1基板處理裝置的高度的前述昇降用保持具被 保持，使由前述第1姿勢切換用保持具所産生的保持狀態 被解除。進一步，使前述行走致動器被驅動使前述環形狀 構件朝一方向循環行走，保持在立起姿勢且使基板上昇。 前述的動作是藉由被反覆進行，使複數基板從前述第1基 板處理裝置朝前述基板昇降移送裝置被送出。 將基板保持的前述昇降用保持具是位於對應前述第2 基板處理裝置的高度之後，藉由前述第2姿勢切換用保持 具使基板被保持，使由前述昇降用保持具所産生的保持狀 態被解除。且，將前述第2姿勢切換用致動器驅動使前述 第2姿勢切換構件被擺動，從立起姿勢朝倒伏姿勢切換基 板的姿勢，使由前述第2姿勢切換用保持具所産生的保持 狀態被解除。前述的動作是藉由被反覆進行，使複數基板 從前述基板昇降移送裝置朝前述第2基板處理裝置被送出 〇 如此，進行從前述第1基板處理裝置朝前述第2基板 處理裝置的基板的昇降移送。且，進行藉由前述動作的相 反的動作，進行從前述第2基板處理裝置朝前述第1基板 -8- 201038457 處理裝置的基板的昇降移送。 總而言之，在本發明中’因爲具有前述第1姿勢切換 用保持具的前述第1姿勢切換構件，是朝水平的軸心周圍 可擺動地設在前述第1基板處理裝置的—側；具有前述第 2姿勢切換用保持具的前述第2姿勢切換構件，是朝水平 的軸心周圍可擺動地設在前述第2基板處理裝置的一側； 複數前述昇降用保持具，是在周方向隔有間隔被設置在前 0 述環形狀構件，所以如上述，可以將立起姿勢保持且將基 板昇降，可以將前述基板昇降移送裝置的占有平面積抑制 在基板一枚分的平面積未滿。 且，因爲朝上下方向延伸的前述環形狀構件，是可循 環行走地設在前述支撐框架；複數前述昇降用保持具，是 在周方向隔有間隔被設置在前述環形狀構件，所以可以從 前述第1基板處理裝置朝前述第2基板處理裝置，或是從 前述第2基板處理裝置朝前述第1基板處理裝置，將複數 Q 基板連續地昇降移送。 本發明的基板昇降移送裝置，是進行對於基板的處理 及基板的昇降移送，具備：被配設在下階，進行對於基板 的處理的第1基板處理裝置；及被配設在上階，進行對於 基板的處理的第2基板處理裝置；及在前述第1基板處理 裝置及前述第2基板處理裝置之間進行基板的昇降移送的 上述基板昇降移送裝置。 依據本發明的基板昇降移送裝置，就可達成與由上述 基板昇降移送裝置所産生的作用同樣的作用。 -9- 201038457 [發明的效果] 依據本發明，可以將前述基板昇降移送裝置的占有平 面積抑制在基板一枚分的平面積未滿，可以將前述基板昇 降移送裝置的占有平面積充分地削減，可以達成工場內空 間的有效利用。 且，因爲可以從前述第1基板處理裝置朝前述第2基 板處理裝置，或是從前述第2基板處理裝置朝前述第2基 板處理裝置，將複數基板連續地昇降移送，所以基板的昇 降移送的周期時間（節拍時間（tact time ))可以縮短， 可以提高有關於基板的一連的作業能率。 【實施方式】 一邊參照第1圖〜第7圖一邊說明本發明的一實施例 。又’圖面中，「FF」是前方向，「FR」是後方向，「L 」是左方向，「R」是指示右方向。 如第1圖所示，本實施例的基板處理移送系統1，是 進行對於玻璃基板等的基板W的搬運處理（基板的處理 )及昇降移送的系統。且，基板處理移送系統1，是具備 :被配設在下階樓層LF，進行基板W的搬運處理的第1 基板搬運處理裝置（第1基板處理裝置）3:及被配設在 上階樓層UF’對於基板W進行搬運處理的第2基板搬運 處理裝置（第2基板處理裝置）5;及在第1基板搬運處 理裝置3及第2基板搬運處理裝置5之間進行基板％的 昇降移送的基板昇降移送裝置7。 -10- 201038457 說明第1基板搬運處理裝置3的結構。 如第1圖所示，在下階樓層LF中，設有第1處理裝 置本體9。第1處理裝置本體9，是構成第1基板搬運處 理裝置3的基座。且，如第4圖所示，在第1處理裝置本 體9中，設有藉由空氣的壓力將基板W浮上用的複數第1 浮上組件1 1。在各第1浮上組件1 1的上面，形成有將空 氣噴出的框狀的噴嘴lln。各噴嘴lln，是如日本國日本 0 特開2006- 1 825 63號公報所示，對於鉛直方向朝組件中心 側傾斜的方式構成。 又，可取代框狀的噴嘴lln，使複數圓孔狀的噴嘴形 成於各第1浮上組件11的上面也可以。 在第1處理裝置本體9中，朝搬運方向（左右方向） 延伸的一對的第1滾子支撐構件13，是在搬運寬度方向 (前後方向）隔離地被設置。在各第1滾子支撐構件13 中，將基板W可搬運地支撐的複數第1搬運滾子15，是 〇 在搬運方向隔有間隔地被設置。各第1搬運滾子15，是 朝水平的軸心周圍可旋轉。且，在各第1滾子支撐構件 13的適宜位置中，各別設有將複數第1搬運滾子15旋轉 的第1搬運用馬達17。各第1搬運用馬達17的輸出軸（ 圖不省略），是透過由蝸輪及滾輪（worm screw and worm gear wheel )等所構成的連動機構（圖示省略），與 複數第1搬運滾子15的旋轉軸（圖示省略）連動連結。 說明第2基板搬運處理裝置5的結構。 如第1圖所示，在上階樓層UF中，設有第2處理裝 -11 - 201038457 置本體19。第2處理裝置本體19，是構成第2基板 處理裝置5的基座。且，如第5圖所示，在第2處理 本體19中’設有藉由空氣的壓力將基板…浮上的複 2浮上組件21。在各第2浮上組件21的上面，與第 i：'組件1 1同樣地，形成有將空氣噴出的框狀的噴嘴 〇 在第2處理裝置本體19中，朝搬運方向延伸的 的第2滾子支撐構件23，是在搬運寬度方向隔離地 置。在各第2滾子支撐構件23中，將基板W可搬運 撐的複數第2搬運滾子25，是在搬運方向隔有間隔 設置。各第2搬運滾子25，是朝水平的軸心周圍可 。且’在各第2滾子支撐構件23的適宜位置中，各 有將複數第2搬運滾子25旋轉的第2搬運用馬達27 第2搬運用馬達27的輸出軸（圖示省略），是透過 輪及滾輪等所構成的連動機構（圖示省略），與複數 搬運滾子25的旋轉軸（圖示省略）連動連結。 說明基板昇降移送裝置7的具體的構成。 如第1圖所示，在第1基板搬運處理裝置3的第 理裝置本體9的左側附近中，設有將基板W的姿勢 至立起（垂直）姿勢（第1圖中假想線所示的姿勢） 伏（水平）姿勢（第1圖中實線所示的姿勢）的第1 切換構件29。第1姿勢切換構件29，是透過一對的 3 1朝水平的軸心周圍可擺動（可轉動）。且’如第 所示，第丨姿勢切換構件29,是具備：第1擺動軸 搬運 裝置 數第 1浮 2 1η 一對 被設 地支 地被 旋轉 別設 。各 由蝸 第2 1處 切換 及倒 姿勢 托架 4圖 33、 -12- 201038457 及平行地延伸的一對的第1擺動臂35、及將基板w的背 面吸著的複數第1姿勢切換用吸著墊片（第1姿勢切換用 保持具）37。第1擺動軸33，是在第1處理裝置本體9 的左側附近透過一對的托架31可旋轉地被設置。一對的 第1擺動臂35,是與第1擺動軸33的外周面一體地形成 。複數第1姿勢切換用吸著墊片37，是在長度方向隔有 間隔被設置在各第1擺動臂3 5。 0 且，在一方的托架31中，設有將第1姿勢切換構件 29擺動的第1姿勢切換用馬達（第1姿勢切換用致動器 )39。第1姿勢切換用馬達39的輸出軸（圖示省略）， 是透過聯接器（接頭、圖示省略）等，與第1擺動軸33 連動連結。在此，第1姿勢切換構件29即使擺動。一對 的第1擺動臂35也不會與第1浮上組件11干渉。 又，可取代第1擺動臂35上的第1姿勢切換用吸著 墊片37，第1姿勢切換用保持具，是設有：將基板W的 Ο 背面由非接觸保持的第1姿勢切換用柏努利挾盤（ Bernoulli chuck)(圖示省略）、和將基板W的端部把持 (保持）的第1姿勢切換用夾具（圖示省略）也可以。 如第1圖及第3圖所示，在第2基板搬運處理裝置5 的第2處理裝置本體19的左側附近中，設有將基板w的 姿勢切換至立起姿勢（第3圖前假想線所示的姿勢）及倒 伏姿勢（第3圖中實線所示的姿勢）的第2姿勢切換構件 41。第2姿勢切換構件41，是透過一對的托架43朝水平 的軸心周圍可擺動（可轉動）。且，如第5圖所示，第2 -13- 201038457 姿勢切換構件41，是具備：第2擺動軸45、及平行地延 伸的一對的第2擺動臂47、及將基板W的背面吸著的複 數第2姿勢切換用吸著墊片（第2姿勢切換用保持具）49 。第2擺動軸45，是透過一對的托架43可旋轉地被設置 在第2處理裝置本體19的左側附近。一對的第2擺動臂 47，是在第2擺動軸45的外周面一體形成。複數第2姿 勢切換用吸著墊片49，是在長度方向隔有間隔被設置在 各第2擺動臂47。 且，在一方的托架43中，設有將第2姿勢切換構件 41擺動的第2姿勢切換用馬達（第2姿勢切換用致動器 )51。第2姿勢切換用馬達51的輸出軸（圖示省略）， 是透過聯接器（圖示省略）等，與第2擺動軸45連動連 結。在此，第2姿勢切換構件41即使擺動，一對的第2 擺動臂47也不會與第2浮上組件21干渉。 又，可取代第2擺動臂47上的第2姿勢切換用吸著 墊片49’第2姿勢切換用保持具，是設有：將基板W的 背面由非接觸保持的第2姿勢切換用柏努利挾盤（圖示省 略）、和將基板W的端部把持（保持）的第2姿勢切換 用夾具（圖示省略）也可以。 如箄丨圖、第4圖及第5圖所示，在第1姿勢切換構 件2 9的左側附近，立設有朝上下方向延伸的一對的支撐 框架53。一對的支撐框架53，是前後遠離地位置，且’ 與一體的連結。在各支撐框架53的上部中，上部帶輪或 是上部鏈輪等的一對的上部旋轉車55，是透過共通的上 -14- 201038457 部旋轉軸57可旋轉地被設置。且，在各支撐框架53的下 部中’下部帶輪或是下部鏈輪等的一對的下部旋轉車59 ，是透過共通的下部旋轉軸61可旋轉地被設置。 進一步，朝上下方向延伸的可循環行走的環形皮帶或 是環形鏈條等的環形狀構件63，是從對應關係中的上部 旋轉車55橫跨下部旋轉車59捲繞。換言之，一對的環形 狀構件63’是透過上部旋轉車55及下部旋轉車59，在一 0 對的支撐框架5 3之間可循環行走地被設置。且，將一對 的環形狀構件63循環行走的行走用馬達（行走用致動器 )65，是設在一方的支撐框架53的上部的適宜位置。行 走用馬達65的輸出軸（圖示省略），是透過聯接器（圖 示省略），與上部旋轉軸57連動連結。 如第1圖、第6圖及第7圖所示，朝前後方向延伸的 複數連結桿67，是將一對的環形狀構件63連結的方式， 在環形狀構件63的周方向隔有間隔被設置。在各連結桿 〇 67的兩端部中，設有將立起姿勢的基板W的端部把持的 昇降用夾具（昇降用保持具）69。即，複數昇降用夾具 69，是透過複數連結桿67 ’在周方向隔有間隔地設有一 對的環形狀構件63。 各昇降用夾具69’是具備：夾具本體71、及固定挾 持爪73、及可動挾持爪77、及作動操作桿79、及彈簧81 。夾具本體71，是設在連結桿67。固定挾持爪73，是與 夾具本體71 —體設置（形成）。可動挾持爪77，是設在 夾具本體71’透過挾持銷75朝挾持方向/鬆開方向可擺動 -15- 201038457 (轉動）。且，可動挾持爪77，是與固定挾持爪73協動 將基板W的端部把持。作動操作桿79，是與可動挾持爪 77的基部一體設置。彈簧8 1，是位於連結桿67及作動操 作桿79之間的方式，設在夾具本體71。且，彈簧81，是 將可動挾持爪77朝挾持方向推迫。 第1鬆開用氣壓缸（第1鬆開用致動器）83，是透過 上部安裝臂85，設在各支撐框架53的下部的適宜位置。 第1鬆開用氣壓缸8 3，是將位於對應第1基板搬運處理 裝置3的高度的昇降用夾具69的作動操作桿79推壓，抵 抗彈簧81的推迫力將可動挾持爪77朝鬆開方向擺動（移 動）。同樣地，第2鬆開用氣壓缸（第2鬆開用致動器） 87，是透過下部安裝臂89，設在各支撐框架53的上部的 適宜位置。第2鬆開用氣壓缸87，是將位於對應第2基 板搬運處理裝置5的高度的昇降用夾具69的作動操作桿 79推壓，抵抗彈簧81的推迫力將可動挾持爪77朝鬆開 方向擺動。 又，可取代昇降用夾具69透過連結桿67設於一對的 環形狀構件63，其他的昇降用保持具，是使將基板W的 表面吸著的昇降用吸著墊片（圖示省略）透過連結桿67 等設置也可以。 接著，說明本實施例的作用及效果。 藉由從複數第1浮上組件11的噴嘴lln將空氣噴出 ，且將一對的第1搬運用馬達17驅動將複數第1搬運滾 子15旋轉，將基板W朝左方向浮上搬運，使基板W位在 -16- 201038457 待機的一對的第1擺動臂35的上側（第1基板搬運處理 裝置3的預定位置）（第4圖參照）。 將基板W位在待機的一對的第1擺動臂3 5的上側之 後，由複數第1姿勢切換用吸著墊片37將基板W的背面 吸著。且，如第1圖所示’將第1鬆開用氣壓缸83驅動 將位於對應第1基板搬運處理裝置3的高度的昇降用夾具 69的可動挾持爪77抵抗彈簧81的推迫力朝鬆開方向擺 0 動（第7圖參照）。接著’如第1圖所示’將第1姿勢切 換用馬達39驅動將第1姿勢切換構件29擺動’將基板W 的姿勢從倒伏姿勢朝立起姿勢切換。 且，停止各第1鬆開用氣壓缸83的驅動將立起姿勢 的基板W的端部由昇降用夾具69把持，將由複數第1姿 勢切換用吸著墊片37所産生的吸著狀態解除。進一步’ 如第2圖所示，將行走用馬達65驅動使環形狀構件63朝 一方向循環行走，將立起姿勢保持且將基板W上昇。藉 〇 由反覆進行前述的動作，可以將複數基板W從第1基板 搬運處理裝置3朝基板昇降移送裝置7依序送出。 如第3圖所示，將基板W的端部把持的昇降用夾具 69是上昇直到對應第2基板搬運處理裝置5的高度爲止 的話，停止環形狀構件63的循環行走。接著，由複數第 2姿勢切換用吸著墊片49將基板W的背面吸著。將各第 2鬆開用氣壓缸87驅動將位於對應第2基板搬運處理裝 置5的高度的昇降用夾具69的可動挾持爪77抵抗彈簧 81的推迫力朝鬆開方向擺動，將由昇降用夾具69所産生 -17- 201038457 的把持狀態解除（第7圖參照）。 且，如第3圖所示，將第2姿勢切換用馬達5 1驅動 將第2姿勢切換構件41擺動使基板W的姿勢從立起姿勢 朝倒伏姿勢切換，將由複數第2姿勢切換用吸著墊片49 所産生的吸著狀態解除。藉由反覆進行前述的動作，可以 將複數基板W從基板昇降移送裝置7朝第2基板搬運處 理裝置5依序送出。 解除由複數第2姿勢切換用吸著墊片49所産生的吸 著狀態之後，從複數第2浮上組件21的噴嘴2 1 η將空氣 噴出，且藉由將一對的第2搬運用馬達27驅動將複數第 2搬運滾子25旋轉使基板W朝右方向浮上搬運，使基板 W位在第2基板搬運處理裝置5的預定置位置（第5圖參 照）。 如以上說明，由第1基板搬運處理裝置3所産生的基 板W的搬運處理、及從第1基板搬運處理裝置3朝第2 基板搬運處理裝置5的基板W的昇降移送、及由第2基 板搬運處理裝置5所産生的基板W的搬運處理，可以依 序地進行。且’藉由前述動作的相反的動作，由第2基板 搬運處理裝置5所産生的基板W的搬運處理、及從第2 基板搬運處理裝置5朝第1基板搬運處理裝置3的基板W 的昇降移送、及由第1基板搬運處理裝置3將所産生的基 板W的搬運處理可以依序進行。 總而言之，在本實施例中，因爲：i)具有複數第1 姿勢切換用吸著墊片37的第1姿勢切換構件29，是朝水 -18- 201038457 平的軸心周圍可擺動地設在第1基板搬運處理裝置 側附近，Π )具有複數第2姿勢切換用吸著墊片49 姿勢切換構件41，是朝水平的軸心周圍可擺動地設 基板搬運處理裝置5的左側附近’ Hi)複數昇降 69，是在周方向隔有間隔被設置在一對的環形狀釋 ，所以如上述，可以將立起姿勢保持且將基板W 可以將基板昇降移送裝置7的占有平面積抑制在^ 0 —枚分的平面積未滿。 且，在本實施例中，因爲：iV)朝上下方向延 對的環形狀構件6 3，是可循環行走地設在一對的 架53，v)複數昇降用夾具69，是在周方向隔有間 置在一對的環形狀構件6 3，所以可以從第1基板 理裝置3朝第2基板搬運處理裝置5，或是從第2 運處理裝置5朝第1基板搬運處理裝置3，將複數 連續地昇降移送。 〇 因此，因爲可以將基板昇降移送裝置7的占有 抑制在基板W —枚分的平面積未滿，所以可以將 降移送裝置7的占有平面積充分地削減，可以達成 空間的有效利用。 且，因爲從第1基板搬運處理裝置3朝第2基 處理裝置5，或是從第2基板搬運處理裝置5朝第 搬運處理裝置3將複數基板w連續地昇降移送， 板W的昇降移送的周期時間可以縮短，可以提高 基板W的一連的作業能率。 3的左 的第2 在第2 用夾具 I件63 昇降， 塞板 W 伸的一 支撐框 隔被設 搬運處 基板搬 基板W 平面積 基板昇 工場內 板搬運 1基板 所以基 有關於 -19- 201038457 進一步，下階樓層LF及上階樓層UF的高度間隔大 的情況時，可以增加昇降用夾具69的個數，作爲保管多 數的基板W的裝置可以利用基板昇降移送裝置7。 又，本發明不限定前述的實施例的說明，可由各種態 樣實施。且，本發明所包含的權利範圍不限定於這些的實 施例。 【圖式簡單說明】 [第1圖]顯示本發明的基板處理移送系統的實施例的 側剖面圖。 [第2圖]顯示前述基板處理移送系統的動作的側剖面 圖。 [第3圖]顯示前述基板處理移送系統的動作的側剖面 圖。 [第4圖]第1圖中的沿著IV -1V線的平剖面圖。 [第5圖]第1圖中的沿著V-V線的平剖面圖。 [第6圖]昇降用夾具周邊的立體圖。 [第7圖]顯示昇降用夾具的鬆開動作的側剖面圖。 【主要元件符號說明】 LF :下階樓層 UF :上階樓層 W :基板 1 :基板處理移送系統 -20- 201038457 3:第1基板搬運處理裝置 5:第2基板搬運處理裝置 7:基板昇降移送裝置 1 1 :第1浮上組件 1 5 :第1搬運滾子 1 7 :第1搬運用馬達 21 :第2浮上組件 0 25:第2搬運滾子 27 :第2搬運用馬達 29 :第1姿勢切換構件 33 :第1擺動軸 3 5 :第1擺動臂 37:第1姿勢切換用吸著墊片 39:第1姿勢切換用馬達 41:第2姿勢切換構件 Q 45 :第2擺動軸 47 :第2擺動臂 49:第2姿勢切換用吸著墊片 51:第2姿勢切換用馬達 5 3 :支撐框架 5 5 :上部旋轉車 59 :下部旋轉車 63 :環形（無端）狀構件 65 :行走用馬達 -21 - 201038457 67 :連結桿 69 :昇降用夾具 71 :夾具本體 73 :固定挾持爪 77 :可動挾持爪 79 :作動操作桿 8 1 :彈簧 8 3 :第1鬆開用氣壓缸 87 :第2鬆開用氣壓缸 -22 -[Technical Field] The present invention relates to a substrate lifting and transferring device and a substrate processing transfer system used in the field of clean material handling (Clean Material Handling) and the like. [Prior Art] 0 In the field of clean transportation, a substrate such as a glass substrate is used between a first substrate processing apparatus disposed on a lower floor and a second substrate processing apparatus disposed on an upper floor. A substrate lifting transfer device for lifting and lowering. The structure and the like of a general substrate lifting and lowering device are as follows. In other words, in the vicinity of the first substrate processing apparatus, a lifting guide that extends in the vertical direction is provided, and in this lifting and lowering, the elevating stage on which the substrate is supported is vertically movable. Further, in the appropriate position of the lifting guide, a lifting motor for raising and lowering the lifting platform is provided. Here, the elevating stage, 〇 is at a height corresponding to the first substrate processing apparatus, and the substrate can be pulled out and sent out by the first substrate processing apparatus. Further, the elevating stage is at a height corresponding to the second substrate processing apparatus, and the second substrate processing apparatus can pull and eject the substrate. Therefore, the elevating body is lowered by the driving of the elevating motor, and the elevating body is positioned at a height corresponding to the first substrate processing apparatus. Next, the substrate is pulled out from the first substrate processing apparatus toward the elevating stage. Further, the lifter is raised by the driving of the lifter and the lifter is positioned at a height corresponding to the second substrate processing apparatus. Further, the substrate is sent out from the elevating mount to the second substrate -5 - 201038457. In this manner, the lifting and lowering of the substrate from the first substrate processing apparatus to the second substrate processing apparatus is performed. Then, the substrate lifting and lowering device performs the reverse operation of the above-described operation, and the substrate transfer from the second substrate processing device to the substrate of the first substrate processing device is performed. In addition, the prior art which is related to the present invention is as follows: Patent Document 1 [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Laid-Open Patent Publication No. Hei No. Hei. However, in the above-described general substrate lifting and lowering device, since the elevating table supported by the substrate is provided on the elevating guide so as to be movable up and down, the lifting and lowering of the substrate is performed in a vertically (upward) posture. . Therefore, the flat area (the flat area) of the substrate lifting and lowering device is required to be at least a flat area of at least one part of the substrate. Therefore, the area occupied by the substrate lifting and lowering device is increased, and it is difficult to effectively utilize the space in the worksite. In particular, in recent years, the size of the substrate has been rapidly increased, and this problem has become more remarkable. SUMMARY OF THE INVENTION Accordingly, it is an object of the present invention to provide a substrate lifting and lowering device and a substrate processing transfer system which are novel in construction and which solve the aforementioned problems. -6 - 201038457 (Means for Solving the Problem) The substrate lifting and lowering device of the present invention is a substrate lifting and lowering device which is disposed in the lower stage to perform processing on the substrate, and is In the upper stage, the substrate is lifted and transferred between the second substrate processing apparatus for processing the substrate, and the first posture switching member is provided on one side of the first substrate processing apparatus. The first posture switching holder for holding the substrate is provided so as to be swingable around the horizontal axis, and the posture of the substrate is switched to the lodging posture and the standing posture; and the first posture switching actuator And the second posture switching member is swingably provided around the horizontal axis of the second substrate processing device, and includes a second posture for holding the substrate. Switching the posture of the substrate to the lodging posture and the standing posture with the holder; and the second posture switching actuator for swinging the second posture switching member; and the ring-shaped member a support frame that is extended in the vertical direction and circulates on a side that is erected on the first cymbal switching member; and a travel actuator that circulates the ring-shaped member; and a plurality of lifts The holder is provided in the ring-shaped member at intervals in the circumferential direction, and the substrate 保持 that is held in the upright position is "in this case", and is disposed indirectly, and is also provided indirectly through the member. Case. Similarly, the term "arrangement" refers to the case where the device is directly disposed, and the case where the device is grounded between the members. In addition, the "processing of the substrate" includes a substrate handling process, a substrate process, a substrate storage process, and the like. The program 201038457 includes an etching process, a CVD process, a PVD process, and the like. According to the substrate lifting and lowering device of the present invention, the substrate located at a predetermined position of the first substrate processing device is held by the first posture switching holder. Then, the first posture switching actuator is driven to swing the first posture switching member, and the posture of the substrate is switched from the lodging posture to the standing posture. In addition, the substrate for standing up is held by the lifting and lowering holder at a height corresponding to the first substrate processing apparatus, and the holding state by the first posture switching holder is released. Further, the traveling actuator is driven to circulate the ring-shaped member in one direction, and is held in the standing posture to raise the substrate. The above operation is performed by repeating, and the plurality of substrates are fed from the first substrate processing apparatus to the substrate lifting and lowering device. After the height of the second substrate processing apparatus is maintained, the substrate for holding the substrate is held by the second posture switching holder, and the holding state by the lifting holder is Lifted. The second posture switching actuator is driven to swing the second posture switching member, and the posture of the substrate is switched from the standing posture to the falling posture to maintain the holding state by the second posture switching holder. Was released. In the above-described operation, the plurality of substrates are ejected from the substrate elevating transfer device to the second substrate processing device, and the substrate is lifted from the first substrate processing device to the second substrate processing device. Transfer. Then, the lifting operation of the substrate from the second substrate processing apparatus to the first substrate -8-201038457 processing apparatus is performed by the reverse operation of the above operation. In the present invention, the first posture switching member having the first posture switching holder is provided so as to be swingable around the horizontal axis center on the side of the first substrate processing apparatus; The second posture switching member of the posture switching holder is provided on one side of the second substrate processing apparatus so as to be swingable around a horizontal axis; and the plurality of lifting holders are spaced apart in the circumferential direction. Since it is provided in the front ring-shaped member, as described above, the standing posture can be maintained and the substrate can be raised and lowered, and the flat area occupied by the substrate lifting and lowering device can be suppressed from being less than the flat area of one portion of the substrate. Further, since the ring-shaped member extending in the vertical direction is rotatably provided in the support frame, the plurality of lifting and lowering holders are provided in the ring-shaped member at intervals in the circumferential direction, so that the above-described ring-shaped member can be provided. The first substrate processing apparatus continuously and vertically transports the plurality of Q substrates toward the second substrate processing apparatus or the second substrate processing apparatus toward the first substrate processing apparatus. In the substrate lifting and lowering device of the present invention, the substrate is processed and the substrate is lifted and transferred, and the first substrate processing device is disposed on the lower stage to perform processing on the substrate, and is disposed on the upper stage to perform A second substrate processing apparatus for processing the substrate; and the substrate lifting and transferring device for performing the lifting and lowering of the substrate between the first substrate processing device and the second substrate processing device. According to the substrate lifting and lowering device of the present invention, the same effect as that produced by the above-described substrate lifting and conveying device can be achieved. -9-201038457 [Effects of the Invention] According to the present invention, the flat area of the substrate lifting and lowering device can be suppressed from being less than the flat area of the substrate, and the flat area of the substrate lifting and lowering device can be sufficiently reduced. It can achieve effective use of space in the workshop. In addition, since the plurality of substrates can be continuously moved up and down from the first substrate processing apparatus to the second substrate processing apparatus or the second substrate processing apparatus to the second substrate processing apparatus, the substrate can be transferred up and down. The cycle time (tact time) can be shortened, and the operating energy rate with respect to the substrate can be improved. [Embodiment] An embodiment of the present invention will be described with reference to Figs. 1 to 7 . In the drawing, "FF" is the front direction, "FR" is the rear direction, "L" is the left direction, and "R" is the right direction. As shown in Fig. 1, the substrate processing transfer system 1 of the present embodiment is a system for performing a transfer process (process of a substrate) and a lift transfer of a substrate W such as a glass substrate. In addition, the substrate processing transfer system 1 includes a first substrate transfer processing device (first substrate processing device) 3 that is disposed on the lower floor LF and transports the substrate W: and is disposed on the upper floor UF. a second substrate transfer processing device (second substrate processing device) 5 that performs a transfer process on the substrate W, and a substrate that performs lift transfer of the substrate between the first substrate transfer processing device 3 and the second substrate transfer processing device 5 Lifting and transferring device 7. -10-201038457 The configuration of the first substrate transport processing device 3 will be described. As shown in Fig. 1, the first processing apparatus main body 9 is provided in the lower floor LF. The first processing apparatus main body 9 is a susceptor that constitutes the first substrate transport processing apparatus 3. Further, as shown in Fig. 4, the first processing apparatus body 9 is provided with a plurality of first floating upper assemblies 1 1 for floating the substrate W by the pressure of air. A frame-shaped nozzle 11n for ejecting air is formed on the upper surface of each of the first floating upper assemblies 1 1. Each of the nozzles 11n is configured such that it is inclined toward the center side of the module in the vertical direction as shown in Japanese Laid-Open Patent Publication No. Hei. No. 2006- 1 825 63. Further, instead of the frame-shaped nozzle 11n, a plurality of nozzles having a circular hole shape may be formed on the upper surface of each of the first floating members 11. In the first processing apparatus main body 9, a pair of first roller supporting members 13 extending in the conveying direction (left-right direction) are provided in isolation in the conveying width direction (front-rear direction). In each of the first roller support members 13, a plurality of first transport rollers 15 that supportably transport the substrate W are provided at intervals in the transport direction. Each of the first conveyance rollers 15 is rotatable around a horizontal axis. Further, at a suitable position of each of the first roller supporting members 13, a first conveying motor 17 that rotates the plurality of first conveying rollers 15 is provided. The output shaft (not shown) of each of the first transport motors 17 passes through an interlocking mechanism (not shown) including a worm screw and a worm gear wheel, and a plurality of first transport rollers 15 The rotation axis (not shown) is linked in series. The configuration of the second substrate transfer processing device 5 will be described. As shown in Fig. 1, in the upper floor UF, the second processing unit -11 - 201038457 is provided with the main body 19. The second processing apparatus main body 19 is a susceptor that constitutes the second substrate processing apparatus 5. Further, as shown in Fig. 5, in the second processing body 19, a double floating assembly 21 in which the substrate is floated by the pressure of air is provided. In the upper surface of each of the second floating members 21, a frame-shaped nozzle that ejects air is placed in the second processing apparatus main body 19, and a second roll that extends in the conveying direction is formed in the same manner as the i-th: The sub-support members 23 are spaced apart in the transport width direction. In each of the second roller supporting members 23, the plurality of second transport rollers 25 that can transport the substrate W are spaced apart from each other in the transport direction. Each of the second transport rollers 25 is provided around a horizontal axis. In the appropriate position of each of the second roller supporting members 23, the second conveying motor 27 that rotates the plurality of second conveying rollers 25 has an output shaft (not shown) of the second conveying motor 27, The interlocking mechanism (not shown) formed by the wheel and the roller is coupled to the rotation shaft (not shown) of the plurality of transport rollers 25. A specific configuration of the substrate lifting and lowering device 7 will be described. As shown in Fig. 1, in the vicinity of the left side of the first unit transport processing device 3, the posture of the substrate W is set to the standing (vertical) posture (the imaginary line shown in Fig. 1). Position) The first switching member 29 in the volt (horizontal) posture (the posture shown by the solid line in Fig. 1). The first posture switching member 29 is swingable (rotatable) around the horizontal axis through a pair of 31. Further, as shown in the above, the second posture switching member 29 is provided with a first swing shaft transporting device number, a first float 2 1n, and a pair of ground support portions being rotated. Each of the first swing arm 35, which is switched by the worm second and the inverted posture brackets, FIG. 33, -12-201038457, and the pair of parallel swinging arms 35, and the plurality of first postures for absorbing the back surface of the substrate w The pad (the first posture switching holder) 37 is sucked. The first swing shaft 33 is rotatably provided through a pair of brackets 31 in the vicinity of the left side of the first processing apparatus main body 9. The pair of first swing arms 35 are integrally formed with the outer peripheral surface of the first swing shaft 33. The plurality of first posture switching suction pads 37 are provided in the respective first swing arms 35 at intervals in the longitudinal direction. In the one bracket 31, a first posture switching motor (first posture switching actuator) 39 that swings the first posture switching member 29 is provided. The output shaft (not shown) of the first posture switching motor 39 is connected to the first swing shaft 33 via a coupling (joint, not shown). Here, the first posture switching member 29 swings. The first swing arm 35 of the pair does not dry up with the first floating upper assembly 11. In addition, the first posture switching holder 37 is provided instead of the first posture switching holder 37, and the first posture switching holder is provided for switching the first posture of the substrate W by non-contact holding. A Bernoulli chuck (not shown) and a first posture switching jig (not shown) for holding (holding) the end portion of the substrate W may be used. As shown in FIG. 1 and FIG. 3, in the vicinity of the left side of the second processing apparatus main body 19 of the second substrate transport processing apparatus 5, the posture of the substrate w is switched to the standing posture (the imaginary line before the third drawing). The second posture switching member 41 in the posture shown) and the posture in the lodging position (the posture shown by the solid line in FIG. 3). The second posture switching member 41 is swingable (rotatable) around the horizontal axis through the pair of brackets 43. Further, as shown in FIG. 5, the second to third-to-201038457 posture switching members 41 include a second swing shaft 45 and a pair of second swing arms 47 extending in parallel, and suctioning the back surface of the substrate W. The second type of posture switching suction pad (second posture switching holder) 49 is used. The second swing shaft 45 is rotatably provided in the vicinity of the left side of the second processing apparatus main body 19 through a pair of brackets 43. The pair of second swing arms 47 are integrally formed on the outer peripheral surface of the second swing shaft 45. The plurality of second-position-importing suction pads 49 are provided in the respective second swing arms 47 at intervals in the longitudinal direction. Further, the one of the brackets 43 is provided with a second posture switching motor (second posture switching actuator) 51 that swings the second posture switching member 41. The output shaft (not shown) of the second posture switching motor 51 is connected to the second swing shaft 45 via a coupling (not shown) or the like. Here, even if the second posture switching member 41 is swung, the pair of second swing arms 47 do not dry up with the second floating upper assembly 21. In addition, in place of the second posture switching absorbing pad 49' on the second oscillating arm 47, the second posture switching holder is provided with a cypress that switches the second posture of the back surface of the substrate W by non-contact. The Nuoli disk (not shown) and the second posture switching jig (not shown) for holding (holding) the end portion of the substrate W may be used. As shown in the drawings, Fig. 4, and Fig. 5, a pair of support frames 53 extending in the vertical direction are provided in the vicinity of the left side of the first posture switching member 29. The pair of support frames 53 are located forward and backward away from each other and are integrally connected. In the upper portion of each of the support frames 53, an upper pulley or a pair of upper rotary carts 55 such as an upper sprocket are rotatably provided through a common upper-14-201038457-part rotating shaft 57. Further, a pair of lower rotating vehicles 59 such as a lower pulley or a lower sprocket in the lower portion of each of the support frames 53 are rotatably provided through the common lower rotating shaft 61. Further, a loop-shaped endless belt extending in the up-and-down direction or a ring-shaped member 63 such as an endless chain is wound around the lower rotating cart 59 from the upper rotating cart 55 in the corresponding relationship. In other words, the pair of annular members 63' are disposed through the upper rotating cart 55 and the lower rotating cart 59 so as to be rotatable between a pair of support frames 53. Further, a traveling motor (traveling actuator) 65 that circulates the pair of ring-shaped members 63 is provided at an appropriate position on the upper portion of one of the support frames 53. The output shaft (not shown) of the traveling motor 65 is coupled to the upper rotating shaft 57 via a coupling (not shown). As shown in FIG. 1 , FIG. 6 , and FIG. 7 , the plurality of connecting rods 67 extending in the front-rear direction are connected to each other by a pair of ring-shaped members 63 , and are spaced apart from each other in the circumferential direction of the ring-shaped member 63 . Settings. In the both end portions of the connecting rods 〇 67, a lifting jig (elevating holder) 69 for holding the end portion of the substrate W in the standing posture is provided. In other words, the plurality of lifting jigs 69 are provided with a pair of ring-shaped members 63 spaced apart in the circumferential direction by the plurality of connecting rods 67'. Each of the lifting jigs 69' includes a jig main body 71, a fixed holding claw 73, a movable gripping claw 77, an actuating operation lever 79, and a spring 81. The jig body 71 is provided on the connecting rod 67. The fixing claws 73 are integrally formed (formed) with the jig body 71. The movable grip claws 77 are provided so that the jig body 71' can be swung by the gripping pin 75 in the holding/releasing direction -15-201038457 (rotation). Further, the movable grip claws 77 are engaged with the fixed grip claws 73 to hold the end portions of the substrate W. The actuating lever 79 is integrally provided with the base of the movable gripping claw 77. The spring 181 is disposed between the connecting rod 67 and the actuating lever 79, and is provided in the jig body 71. Further, the spring 81 urges the movable holding claw 77 in the holding direction. The first release pneumatic cylinder (first release actuator) 83 is transmitted through the upper attachment arm 85 at an appropriate position in the lower portion of each support frame 53. The first release cylinder 8 3 presses the actuation lever 79 of the elevation jig 69 corresponding to the height of the first substrate conveyance processing device 3, and releases the movable gripper 77 against the biasing force of the spring 81. The direction swings (moves). Similarly, the second release pneumatic cylinder (second release actuator) 87 is provided at a suitable position on the upper portion of each support frame 53 through the lower attachment arm 89. The second release pneumatic cylinder 87 presses the actuating operation lever 79 of the elevating jig 69 corresponding to the height of the second substrate transport processing device 5, and moves the movable gripping claw 77 toward the loosening direction against the biasing force of the spring 81. swing. Further, instead of the lifting jig 69, the pair of ring-shaped members 63 are provided through the connecting rod 67, and the other lifting and lowering holders are lifting and lowering suction pads for absorbing the surface of the substrate W (not shown). It can also be set by the connecting rod 67 or the like. Next, the action and effect of the present embodiment will be described. The air is ejected from the nozzles 11 n of the plurality of first floating assemblies 11 , and the first transport rollers 17 are driven to rotate the plurality of first transport rollers 15 to transport the substrate W in the left direction to transport the substrate W. The upper side of the first swing arm 35 (the predetermined position of the first substrate conveyance processing device 3) (see FIG. 4) of the pair of the first swing arm 35 that is in standby at -16-201038457. After the substrate W is positioned on the upper side of the pair of standby first swing arms 35, the back surface of the substrate W is sucked by the plurality of first posture switching suction pads 37. As shown in Fig. 1, the movable gripping claws 77 of the elevating jig 69 located at the height corresponding to the first substrate transporting processing device 3 are driven by the first releasing pneumatic cylinder 83 to be released against the biasing force of the spring 81. The direction is 0 (refer to Figure 7). Then, as shown in Fig. 1, the first posture switching motor 39 is driven to swing the first posture switching member 29, and the posture of the substrate W is switched from the lodging posture to the standing posture. The end of the substrate W in which the driving of each of the first release cylinders 83 is stopped in the upright position is gripped by the lifting/lowering jig 69, and the suction state by the plurality of first posture switching suction pads 37 is released. . Further, as shown in Fig. 2, the traveling motor 65 is driven to circulate the ring-shaped member 63 in one direction, and the standing posture is held and the substrate W is raised. By repeating the above-described operations, the plurality of substrates W can be sequentially sent from the first substrate transfer processing device 3 to the substrate lift transfer device 7. As shown in Fig. 3, the lifting jig 69 for gripping the end portion of the substrate W is raised until the height of the second substrate conveyance processing device 5 is reached, and the circulation of the ring-shaped member 63 is stopped. Next, the back surface of the substrate W is sucked by the plurality of second posture switching suction pads 49. The second gripping cylinders 87 drive the movable gripping claws 77 of the elevating jig 69 located at the height corresponding to the second substrate transporting processing device 5 to swing in the loosening direction against the biasing force of the spring 81, and the lifting jig 69 is lifted. The holding state of -17-201038457 is released (refer to Figure 7). As shown in FIG. 3, the second posture switching motor 51 is driven to swing the second posture switching member 41, and the posture of the substrate W is switched from the standing posture to the falling posture, and the second posture switching is performed. The absorbing state generated by the spacer 49 is released. By repeating the above-described operations, the plurality of substrates W can be sequentially sent from the substrate lifting and lowering device 7 to the second substrate transporting device 5. After the absorbing state by the plurality of second posture switching absorbing pads 49 is released, the air is ejected from the nozzles 2 1 η of the plurality of second floating members 21, and the pair of second conveying motors 27 are released. The plurality of second transport rollers 25 are rotated to drive the substrate W to the right direction, and the substrate W is placed at a predetermined position of the second substrate transport processing device 5 (see FIG. 5). As described above, the conveyance process of the substrate W by the first substrate transfer processing device 3 and the transfer of the substrate W from the first substrate transfer processing device 3 to the second substrate transfer processing device 5 and the second substrate are performed. The conveyance process of the substrate W by the conveyance processing apparatus 5 can be performed sequentially. In the reverse operation of the above-described operation, the transport processing of the substrate W by the second substrate transport processing device 5 and the lifting and lowering of the substrate W from the second substrate transport processing device 5 to the first substrate transport processing device 3 The transfer and the conveyance processing of the generated substrate W by the first substrate transfer processing device 3 can be sequentially performed. In the present embodiment, the first posture switching member 29 having the plurality of first posture switching suction pads 37 is swingably provided around the axis of the water -18-201038457. In the vicinity of the substrate transport processing device side, the second posture switching absorbing pad 49 is provided with the posture switching member 41, and the left side of the substrate transport processing device 5 is oscillated around the horizontal axis. Since the lifts 69 are arranged in a ring shape in which a pair is provided at intervals in the circumferential direction, as described above, the standing posture can be maintained and the substrate W can suppress the occupied flat area of the substrate lift transfer device 7 at 0 — The flat area of the part is not full. Further, in the present embodiment, the ring-shaped member 63 which is extended in the up-and-down direction by iV) is a frame 53 which is rotatably provided in a pair, and v) a plurality of lifting jigs 69 are spaced in the circumferential direction. Since the pair of ring-shaped members 633 are disposed between the first substrate processing device 3 and the second substrate transfer processing device 5, or from the second transport processing device 5 to the first substrate transfer processing device 3, The plurality of consecutively lifted and lowered. Therefore, since the occupation of the substrate lifting/lowering device 7 can be suppressed, the flat area of the substrate W is not sufficiently filled, so that the occupied flat area of the descending transfer device 7 can be sufficiently reduced, and space can be effectively utilized. In addition, the plurality of substrates w are continuously moved up and down from the first substrate transfer processing device 3 to the second base processing device 5 or from the second substrate transfer processing device 5 to the first transfer processing device 3, and the plate W is lifted and lowered. The cycle time can be shortened, and the continuous work energy rate of the substrate W can be improved. The 2nd left of the 3 is lifted and lowered by the 2nd clamp I piece 63, and the support frame of the plug W is extended by the conveyance board|substrate board|substrate board|substrate W flat area substrate board|substrate board conveys 1 board|substrate, and it is about -19- Further, when the height interval between the lower floor LF and the upper floor UF is large, the number of the lifting jigs 69 can be increased, and the substrate lifting and lowering device 7 can be used as a device for storing a plurality of substrates W. Further, the present invention is not limited to the description of the foregoing embodiments, and can be implemented in various aspects. Further, the scope of the invention encompassed by the invention is not limited to the embodiments. BRIEF DESCRIPTION OF THE DRAWINGS [Fig. 1] A side cross-sectional view showing an embodiment of a substrate processing transfer system of the present invention. [Fig. 2] A side cross-sectional view showing the operation of the substrate processing transfer system. [Fig. 3] A side cross-sectional view showing the operation of the substrate processing transfer system. [Fig. 4] A plan sectional view taken along line IV - 1 V in Fig. 1. [Fig. 5] A plan sectional view taken along line V-V in Fig. 1. [Fig. 6] A perspective view of the periphery of the lifting jig. [Fig. 7] A side cross-sectional view showing the releasing operation of the lifting jig. [Description of main component symbols] LF: Lower floor UF: Upper floor W: Substrate 1: Substrate processing transfer system -20- 201038457 3: First substrate transfer processing device 5: Second substrate transfer processing device 7: Substrate transfer transfer The first transporting roller 21: the first transporting roller 21: the second transporting roller 27: the second transporting roller 27: the second transporting motor 29: the first posture The switching member 33: the first swinging arm 35: the first swinging arm 37: the first posture switching suction pad 39: the first posture switching motor 41: the second posture switching member Q45: the second swinging shaft 47: Second swing arm 49: second posture switching suction pad 51: second posture switching motor 5 3 : support frame 5 5 : upper rotating car 59 : lower rotating car 63 : annular (endless) member 65 : walking Motor 21 - 201038457 67 : Connecting rod 69 : Lifting jig 71 : Fixing body 73 : Fixing grip claw 77 : Movable grip claw 79 : Actuating lever 8 1 : Spring 8 3 : First release pneumatic cylinder 87 : 2nd release pneumatic cylinder-22 -