KR20040030848A - 감광성 수지 조성물 - Google Patents
감광성 수지 조성물 Download PDFInfo
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- KR20040030848A KR20040030848A KR10-2004-7001011A KR20047001011A KR20040030848A KR 20040030848 A KR20040030848 A KR 20040030848A KR 20047001011 A KR20047001011 A KR 20047001011A KR 20040030848 A KR20040030848 A KR 20040030848A
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- South Korea
- Prior art keywords
- acid
- meth
- acrylate
- compound
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- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 86
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- YCPUOKNBUYXRTB-UHFFFAOYSA-N 2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)-2-[(4-propan-2-ylphenyl)methyl]butan-1-one Chemical compound C=1C=C(N2CCOCC2)C=CC=1C(=O)C(CC)(N(C)C)CC1=CC=C(C(C)C)C=C1 YCPUOKNBUYXRTB-UHFFFAOYSA-N 0.000 claims description 2
- MSRXOZBVYNEKMN-UHFFFAOYSA-N 2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)-2-[(4-propylphenyl)methyl]butan-1-one Chemical compound C1=CC(CCC)=CC=C1CC(CC)(N(C)C)C(=O)C1=CC=C(N2CCOCC2)C=C1 MSRXOZBVYNEKMN-UHFFFAOYSA-N 0.000 claims description 2
- QCOMLQSVINKFDL-UHFFFAOYSA-N 2-(dimethylamino)-2-[(4-ethylphenyl)methyl]-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C1=CC(CC)=CC=C1CC(CC)(N(C)C)C(=O)C1=CC=C(N2CCOCC2)C=C1 QCOMLQSVINKFDL-UHFFFAOYSA-N 0.000 claims description 2
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- ZQKDXHPMNUKDGF-UHFFFAOYSA-N 2-[(4-butylphenyl)methyl]-2-(dimethylamino)-1-(4-morpholin-4-ylphenyl)butan-1-one Chemical compound C1=CC(CCCC)=CC=C1CC(CC)(N(C)C)C(=O)C1=CC=C(N2CCOCC2)C=C1 ZQKDXHPMNUKDGF-UHFFFAOYSA-N 0.000 claims description 2
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- AXLMPTNTPOWPLT-UHFFFAOYSA-N prop-2-enyl 3-oxobutanoate Chemical compound CC(=O)CC(=O)OCC=C AXLMPTNTPOWPLT-UHFFFAOYSA-N 0.000 description 1
- ZQMAPKVSTSACQB-UHFFFAOYSA-N prop-2-enyl dodecanoate Chemical compound CCCCCCCCCCCC(=O)OCC=C ZQMAPKVSTSACQB-UHFFFAOYSA-N 0.000 description 1
- HAFZJTKIBGEQKT-UHFFFAOYSA-N prop-2-enyl hexadecanoate Chemical compound CCCCCCCCCCCCCCCC(=O)OCC=C HAFZJTKIBGEQKT-UHFFFAOYSA-N 0.000 description 1
- HPCIWDZYMSZAEZ-UHFFFAOYSA-N prop-2-enyl octadecanoate Chemical compound CCCCCCCCCCCCCCCCCC(=O)OCC=C HPCIWDZYMSZAEZ-UHFFFAOYSA-N 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- KIDHWZJUCRJVML-UHFFFAOYSA-N putrescine Chemical compound NCCCCN KIDHWZJUCRJVML-UHFFFAOYSA-N 0.000 description 1
- KXXXUIKPSVVSAW-UHFFFAOYSA-K pyranine Chemical compound [Na+].[Na+].[Na+].C1=C2C(O)=CC(S([O-])(=O)=O)=C(C=C3)C2=C2C3=C(S([O-])(=O)=O)C=C(S([O-])(=O)=O)C2=C1 KXXXUIKPSVVSAW-UHFFFAOYSA-K 0.000 description 1
- JUJWROOIHBZHMG-UHFFFAOYSA-O pyridinium Chemical compound C1=CC=[NH+]C=C1 JUJWROOIHBZHMG-UHFFFAOYSA-O 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 150000004053 quinones Chemical class 0.000 description 1
- 238000003847 radiation curing Methods 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000007763 reverse roll coating Methods 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000003384 small molecules Chemical class 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 235000019795 sodium metasilicate Nutrition 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229940075554 sorbate Drugs 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- VQQDHBUBOPTRBY-UHFFFAOYSA-N st50307358 Chemical compound C1CC(C)(C)C2=C(OC(C(C(=O)OCC)=C3)=O)C3=CC3=C2N1CCC3(C)C VQQDHBUBOPTRBY-UHFFFAOYSA-N 0.000 description 1
- 230000004936 stimulating effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- RWSOTUBLDIXVET-UHFFFAOYSA-O sulfonium Chemical compound [SH3+] RWSOTUBLDIXVET-UHFFFAOYSA-O 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- 238000010345 tape casting Methods 0.000 description 1
- BWSZXUOMATYHHI-UHFFFAOYSA-N tert-butyl octaneperoxoate Chemical compound CCCCCCCC(=O)OOC(C)(C)C BWSZXUOMATYHHI-UHFFFAOYSA-N 0.000 description 1
- CIHOLLKRGTVIJN-UHFFFAOYSA-N tert‐butyl hydroperoxide Chemical compound CC(C)(C)OO CIHOLLKRGTVIJN-UHFFFAOYSA-N 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- UFDHBDMSHIXOKF-UHFFFAOYSA-N tetrahydrophthalic acid Natural products OC(=O)C1=C(C(O)=O)CCCC1 UFDHBDMSHIXOKF-UHFFFAOYSA-N 0.000 description 1
- 238000007669 thermal treatment Methods 0.000 description 1
- CBDKQYKMCICBOF-UHFFFAOYSA-N thiazoline Chemical compound C1CN=CS1 CBDKQYKMCICBOF-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 125000000101 thioether group Chemical group 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical class CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- 238000005809 transesterification reaction Methods 0.000 description 1
- AYNNSCRYTDRFCP-UHFFFAOYSA-N triazene Chemical compound NN=N AYNNSCRYTDRFCP-UHFFFAOYSA-N 0.000 description 1
- KKFOMYPMTJLQGA-UHFFFAOYSA-N tribenzyl phosphite Chemical compound C=1C=CC=CC=1COP(OCC=1C=CC=CC=1)OCC1=CC=CC=C1 KKFOMYPMTJLQGA-UHFFFAOYSA-N 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- KEROTHRUZYBWCY-UHFFFAOYSA-N tridecyl 2-methylprop-2-enoate Chemical compound CCCCCCCCCCCCCOC(=O)C(C)=C KEROTHRUZYBWCY-UHFFFAOYSA-N 0.000 description 1
- XOALFFJGWSCQEO-UHFFFAOYSA-N tridecyl prop-2-enoate Chemical compound CCCCCCCCCCCCCOC(=O)C=C XOALFFJGWSCQEO-UHFFFAOYSA-N 0.000 description 1
- IVIIAEVMQHEPAY-UHFFFAOYSA-N tridodecyl phosphite Chemical compound CCCCCCCCCCCCOP(OCCCCCCCCCCCC)OCCCCCCCCCCCC IVIIAEVMQHEPAY-UHFFFAOYSA-N 0.000 description 1
- BDZBKCUKTQZUTL-UHFFFAOYSA-N triethyl phosphite Chemical compound CCOP(OCC)OCC BDZBKCUKTQZUTL-UHFFFAOYSA-N 0.000 description 1
- 239000013638 trimer Substances 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- CNUJLMSKURPSHE-UHFFFAOYSA-N trioctadecyl phosphite Chemical compound CCCCCCCCCCCCCCCCCCOP(OCCCCCCCCCCCCCCCCCC)OCCCCCCCCCCCCCCCCCC CNUJLMSKURPSHE-UHFFFAOYSA-N 0.000 description 1
- LENZDBCJOHFCAS-UHFFFAOYSA-N tris Chemical compound OCC(N)(CO)CO LENZDBCJOHFCAS-UHFFFAOYSA-N 0.000 description 1
- WGKLOLBTFWFKOD-UHFFFAOYSA-N tris(2-nonylphenyl) phosphite Chemical compound CCCCCCCCCC1=CC=CC=C1OP(OC=1C(=CC=CC=1)CCCCCCCCC)OC1=CC=CC=C1CCCCCCCCC WGKLOLBTFWFKOD-UHFFFAOYSA-N 0.000 description 1
- GRPURDFRFHUDSP-UHFFFAOYSA-N tris(prop-2-enyl) benzene-1,2,4-tricarboxylate Chemical compound C=CCOC(=O)C1=CC=C(C(=O)OCC=C)C(C(=O)OCC=C)=C1 GRPURDFRFHUDSP-UHFFFAOYSA-N 0.000 description 1
- XHGIFBQQEGRTPB-UHFFFAOYSA-N tris(prop-2-enyl) phosphate Chemical compound C=CCOP(=O)(OCC=C)OCC=C XHGIFBQQEGRTPB-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 1
- 235000019801 trisodium phosphate Nutrition 0.000 description 1
- 150000004670 unsaturated fatty acids Chemical class 0.000 description 1
- 235000021122 unsaturated fatty acids Nutrition 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- KOZCZZVUFDCZGG-UHFFFAOYSA-N vinyl benzoate Chemical compound C=COC(=O)C1=CC=CC=C1 KOZCZZVUFDCZGG-UHFFFAOYSA-N 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 238000004383 yellowing Methods 0.000 description 1
- PAPBSGBWRJIAAV-UHFFFAOYSA-N ε-Caprolactone Chemical compound O=C1CCCCCO1 PAPBSGBWRJIAAV-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
- C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
- C07D295/112—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/12—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms
- C07D295/135—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by singly or doubly bound nitrogen atoms with the ring nitrogen atoms and the substituent nitrogen atoms separated by carbocyclic rings or by carbon chains interrupted by carbocyclic rings
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Materials For Photolithography (AREA)
- Macromonomer-Based Addition Polymer (AREA)
- Optical Filters (AREA)
- Polymerisation Methods In General (AREA)
Abstract
Description
광개시제 | 농도[중량부] | 현상 시간[sec] |
없음 | - | 80 |
(1)(1) | 2.46.0 | 115115 |
(2)(2) | 2.46.0 | 115120 |
(3)(3) | 2.46.0 | 9090 |
(4)(4) | 2.46.0 | 95100 |
광개시제 | 농도[중량부] | 4000J/cm2의 노출 후 단계의 수 |
(2)(2)(2)(2) | 7.511.015.020.0 | 3557 |
(4)(4)(4)(4) | 7.511.015.020.0 | 3556 |
Claims (17)
- 분자 내에 하나 이상의 카복실산 그룹을 함유하고 분자량이 200,000 이하인 올리고머 또는 중합체(A),하나 이상의 화학식 I의 광개시제 화합물(B) 및하나 이상의 올레핀계 이중 결합을 갖는 단량체성, 올리고머성 또는 중합체성 화합물(C)을 포함하는 감광성 조성물.화학식 I위의 화학식 I에서,R1은 직쇄 또는 측쇄 C1-C12알킬이고,R2는 직쇄 또는 측쇄 C1-C4알킬이고,R3및 R4는 서로 독립적으로 직쇄 또는 측쇄 C1-C8알킬이다.
- 제1항에 있어서, 광개시제 화합물이, R1이 직쇄 또는 측쇄 C1-C4알킬이고 R2가 메틸, 에틸 또는 프로필, 특히 에틸이고 R3및 R4가 서로 독립적으로 직쇄 또는 측쇄 C1-C4알킬, 특히 메틸인 화학식 I의 화합물인 감광성 조성물.
- 제1항에 있어서, 화학식 I의 화합물이 1-[4-모르폴리노페닐]-2-디메틸아미노-2-(4-메틸벤질)-부탄-1-온, 1-[4-모르폴리노페닐]-2-디메틸아미노-2-(4-에틸벤질)-부탄-1-온, 1-[4-모르폴리노페닐]-2-디메틸아미노-2-(4-이소프로필벤질)-부탄-1-온, 1-[4-모르폴리노페닐]-2-디메틸아미노-2-(4-n-프로필벤질)-부탄-1-온, 1-[4-모르폴리노페닐]-2-디메틸아미노-2-[4-(2-메틸프로프-1-일)-벤질]-부탄-1-온, 1-[4-모르폴리노페닐]-2-디메틸아미노-2-(4-n-부틸벤질)-부탄-1-온, 특히 1-[4-모르폴리노페닐]-2-디메틸아미노-2-(4-메틸벤질)-부탄-1-온인 감광성 조성물.
- 제1항에 있어서, 성분(A)의 분자량이 2,000 내지 150,000인 감광성 조성물.
- 제1항에 있어서, 성분(A), 성분(B) 및 성분(C)에 추가하여, 하나 이상의 감광제 화합물(E), 특히 벤조페논 및 이의 유도체, 티오크산톤 및 이의 유도체, 안트라퀴논 및 이의 유도체, 및 쿠마린 및 이의 유도체로 이루어진 그룹으로부터 선택된 화합물을 포함하는 감광성 조성물.
- 제1항에 있어서, 성분(A), 성분(B) 및 성분(C)에 추가하여, 열경화성 성분(F)로서 에폭시 그룹을 갖는 하나 이상의 화합물과, 바람직하게는 하나의 에폭시 경화 촉진제(G2)를 포함하는 감광성 조성물.
- 제1항에 있어서, 성분(A), 성분(B) 및 성분(C)에 추가하여, 하나 이상의 UV 흡수제 또는 광 안정화제 화합물(G3)을 포함하는 감광성 조성물.
- 제1항에 있어서, 무기 충전재, 착색제, 분산제, 열 중합 개시제, 증점제, 소포제 및 균전제, 특히 무기 충전재로 이루어진 그룹으로부터 선택된 첨가제(G)를 포함하는 감광성 조성물.
- 제1항에 있어서, 성분(A) 100중량부를 기준으로 하여, 광개시제(B)를 0.015 내지 100중량부, 바람직하게는 0.03 내지 80중량부 포함하는 감광성 조성물.
- 제1항 내지 제9항 중의 어느 한 항에 따르는 조성물을 190 내지 600nm 범위의 전자기 방사선, 전자 빔 또는 X선으로 조사함을 포함하는, 에틸렌계 불포화 이중 결합 함유 화합물의 광중합방법.
- 착색되거나 착색되지 않은 도료 및 니스(varnish), 분말 피복물, 광 섬유 피복물, 인쇄 잉크, 인쇄판, 접착제, 치과용 조성물, 전기도금 내식막과 같은 전자기기용 광내식막, 에치 내식막(etch resist), 액체 및 무수 필름 둘 다, 땜납 내식막 제조용, 각종 디스플레이 용품용 컬러 필터 제조 또는 플라즈마-디스플레이 패널의 제조공정에서의 구조물 생성용 내식막, 전기발광 디스플레이 및 LCD, 컬러 필터 물질, 복합 조성물로서, 전기 및 전자 부품 캡슐화용 조성물로서, 자기 기록 물질, 마이크로공학 부품, 도파관, 광 스위치, 도금 마스크, 에치 마스크, 색 가공 시스템, 유리 섬유 케이블 피복물, 스크린 인쇄 스텐실 제조용, 광조형법(stereolithography)을 통한 3차원 물체 제조용, 특히 홀로그라피 기록용 화상 기록 물질, 마이크로전자 회로, 탈색 물질, 화상 기록 물질용 탈색 물질로서, 마이크로캡슐을 사용하는 화상 기록 물질을 위해서, UV 및 가시광선 레이저 직접 화상 시스템용 광내식막 물질로서 및 인쇄 회로판의 순차 축적 층에서 유전 층을 형성시키는 데 사용되는 광내식막 물질로서의, 제1항 내지 제9항 중의 어느 한 항에 따르는 감광성 조성물의 용도.
- 제10항에 있어서, 착색되거나 착색되지 않은 도료 및 니스, 분말 피복물, 광 섬유 피복물, 인쇄 잉크, 인쇄판, 접착제, 치과용 조성물, 전기도금 내식막과 같은 전자기기용 광내식막, 에치 내식막, 액체 및 무수 필름 둘 다, 땜납 내식막 제조, 각종 디스플레이 용품용 컬러 필터 제조 또는 플라즈마-디스플레이 패널의 제조공정에서의 구조물 생성용 내식막, 전기발광 디스플레이 및 LCD, 복합 조성물, 컬러 필터 물질의 제조, 전기 및 전자 부품 캡슐화용 조성물, 자기 기록 물질, 마이크로공학 부품, 도파관, 광 스위치, 도금 마스크, 에치 마스크, 색 가공 시스템, 유리 섬유 케이블 피복물, 스크린 인쇄 스텐실 제조, 마이크로리소그래피(microlithography), 도금 및 광조형법을 통한 3차원 물체 제조, 특히 홀로그라피 기록용 화상 기록 물질, 마이크로전자 회로, 탈색 물질, 화상기록 물질용 탈색 물질, 마이크로캡슐을 사용하는 화상 기록 물질용 탈색 물질의 제조, 인쇄 회로판의 순차 축적 층에서 유전 층의 형성, 및 UV 및 가시광선 레이저를 직접 화상 기술의 광 공급원으로서 사용하는 공정을 위한 방법.
- 제1항에 따르는 조성물이 하나 이상의 표면 위에 피복되어 있는, 피복된 기판.
- 제13항에 따르는 피복된 기판을 화상식 노출(imagewise exposure)시킨 후, 노출되지 않은 부분을 현상제로 제거하는, 릴리프 화상(relief image)의 사진석판 제조방법.
- 제1항에 따르는 조성물을 포함하는 광내식막.
- 제1항에 따르는 조성물을 포함하는 컬러 필터 내식막.
- 적색, 녹색 및 청색 화소 및 흑색 매트릭스(이들 모두는 감광성 수지와 안료를 포함한다)를 투명 기판 위에 제공하고, 기판의 표면 또는 컬러 필터 층의 표면 위에 투명 전극을 제공함으로써 제조된 컬러 필터로서, 감광성 수지가 다관능성 아크릴레이트 단량체, 유기 중합체 결합제 및 제1항에서 정의한 화학식 I의 광중합 개시제를 포함함을 특징으로 하는 컬러 필터.
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PCT/EP2002/007989 WO2003010602A1 (en) | 2001-07-26 | 2002-07-18 | Photosensitive resin composition |
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- 2002-07-18 CA CA002453237A patent/CA2453237A1/en not_active Abandoned
- 2002-07-18 US US10/484,357 patent/US7247659B2/en not_active Expired - Lifetime
- 2002-07-18 JP JP2003515915A patent/JP4312598B2/ja not_active Expired - Lifetime
- 2002-07-18 EP EP02758358A patent/EP1410109B1/en not_active Expired - Lifetime
- 2002-07-18 CN CNB028146387A patent/CN1327293C/zh not_active Expired - Lifetime
- 2002-07-18 KR KR1020047001011A patent/KR100908795B1/ko active IP Right Grant
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Cited By (7)
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KR101370431B1 (ko) * | 2005-07-01 | 2014-03-05 | 이터널 케미칼 컴퍼니 리미티드 | 광이미지화 조성물 |
KR101306153B1 (ko) * | 2006-08-25 | 2013-09-10 | 주식회사 동진쎄미켐 | 감광성 수지 조성물 |
KR100973644B1 (ko) * | 2007-07-18 | 2010-08-02 | 동우 화인켐 주식회사 | 착색 감광성 수지 조성물, 컬러필터 및 이를 구비한액정표시장치 |
KR100825420B1 (ko) * | 2007-10-24 | 2008-04-29 | 주식회사 코오롱 | 자외선 및 열 경화형 액정디스플레이 패널용 접착제의제조방법 |
KR101442393B1 (ko) * | 2008-03-26 | 2014-09-22 | 다이요 홀딩스 가부시키가이샤 | 감광성 수지 조성물, 그의 경화물 및 그의 경화물로 이루어지는 솔더 레지스트층을 갖는 인쇄 배선 기판 |
KR20100014142A (ko) * | 2008-07-31 | 2010-02-10 | 제이에스알 가부시끼가이샤 | 착색층 형성용 감방사선성 조성물, 컬러 필터 및 컬러 액정 표시 소자 |
KR20220105322A (ko) | 2021-01-20 | 2022-07-27 | 엑시노 주식회사 | 감광성 조성물을 위한 수지 |
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WO2003010602A1 (en) | 2003-02-06 |
WO2003010602A8 (en) | 2003-08-07 |
JP2004536352A (ja) | 2004-12-02 |
CA2453237A1 (en) | 2003-02-06 |
ES2375471T3 (es) | 2012-03-01 |
EP1410109B1 (en) | 2011-10-26 |
US7247659B2 (en) | 2007-07-24 |
ATE530951T1 (de) | 2011-11-15 |
KR100908795B1 (ko) | 2009-07-22 |
US20040192804A1 (en) | 2004-09-30 |
JP4312598B2 (ja) | 2009-08-12 |
CN1547683A (zh) | 2004-11-17 |
EP1410109A1 (en) | 2004-04-21 |
US20070259278A1 (en) | 2007-11-08 |
US7556843B2 (en) | 2009-07-07 |
US7425585B2 (en) | 2008-09-16 |
CN1327293C (zh) | 2007-07-18 |
US20070249748A1 (en) | 2007-10-25 |
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