KR20030045153A - 탄탈륨 또는 텅스텐 타겟트-동합금제 배킹 플레이트조립체 및 그 제조방법 - Google Patents
탄탈륨 또는 텅스텐 타겟트-동합금제 배킹 플레이트조립체 및 그 제조방법 Download PDFInfo
- Publication number
- KR20030045153A KR20030045153A KR10-2003-7005916A KR20037005916A KR20030045153A KR 20030045153 A KR20030045153 A KR 20030045153A KR 20037005916 A KR20037005916 A KR 20037005916A KR 20030045153 A KR20030045153 A KR 20030045153A
- Authority
- KR
- South Korea
- Prior art keywords
- backing plate
- target
- tantalum
- aluminum
- thickness
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12736—Al-base component
- Y10T428/12743—Next to refractory [Group IVB, VB, or VIB] metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
- Y10T428/12819—Group VB metal-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12771—Transition metal-base component
- Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
- Y10T428/12826—Group VIB metal-base component
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Pressure Welding/Diffusion-Bonding (AREA)
Abstract
Description
Claims (2)
- 탄탈륨 또는 텅스텐 타겟트와 동합금제 배킹 플레이트가 두께 0.5mm 이상의 알루미늄 또는 알루미늄 합금판의 삽입재를 넣어서 확산접합되어 있고, 각각의 재료 사이에서 확산접합 계면을 구비하는 것을 특징으로 하는 탄탈륨 또는 텅스텐 타겟트-동(銅)합금제 배킹 플레이트 조립체
- 두께 0.5mm 이상의 알루미늄 또는 알루미늄 합금판을 삽입재로 하여 탄탈륨 혹은 텅스텐 타겟트와 동합금 배킹 플레이트를 진공 하에서 400℃부터 548℃ 사이의 온도 및 1∼20kg/mm2의 압력조건으로 확산접합하는 것을 특징으로 하는 탄탈륨 또는 텅스텐 타겟트-동합금제 배킹 플레이트 조립체의 제조방법
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JPJP-P-2000-00332159 | 2000-10-31 | ||
JP2000332159A JP3905301B2 (ja) | 2000-10-31 | 2000-10-31 | タンタル又はタングステンターゲット−銅合金製バッキングプレート組立体及びその製造方法 |
PCT/JP2001/006553 WO2002036848A1 (fr) | 2000-10-31 | 2001-07-30 | Ensemble cible en tantale ou tungstène sur plaque-support en alliage de cuivre, et procédé de production |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20030045153A true KR20030045153A (ko) | 2003-06-09 |
KR100528888B1 KR100528888B1 (ko) | 2005-11-15 |
Family
ID=18808400
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR10-2003-7005916A KR100528888B1 (ko) | 2000-10-31 | 2001-07-30 | 탄탈륨 또는 텅스텐 타겟트-동합금제 배킹 플레이트조립체 및 그 제조방법 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6759143B2 (ko) |
EP (1) | EP1331283B1 (ko) |
JP (1) | JP3905301B2 (ko) |
KR (1) | KR100528888B1 (ko) |
DE (1) | DE60107280T2 (ko) |
TW (1) | TW554060B (ko) |
WO (1) | WO2002036848A1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190129228A (ko) * | 2018-05-10 | 2019-11-20 | 재단법인 포항산업과학연구원 | 스퍼터링 폐타겟으로부터 유가금속 회수방법 및 공정 부산물 재활용 방법 |
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WO2003052161A1 (fr) * | 2001-12-19 | 2003-06-26 | Nikko Materials Company, Limited | Procede pour assembler une cible en substance magnetique avec une plaque dorsale, et cible en substance magnetique |
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WO2004036626A2 (en) * | 2002-10-18 | 2004-04-29 | The Regents Of The University Of California | Isostatic pressure assisted wafer bonding method |
JP4263900B2 (ja) * | 2002-11-13 | 2009-05-13 | 日鉱金属株式会社 | Taスパッタリングターゲット及びその製造方法 |
CN103966561A (zh) * | 2003-04-01 | 2014-08-06 | Jx日矿日石金属株式会社 | 钽溅射靶及其制造方法 |
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DE102004020404B4 (de) * | 2004-04-23 | 2007-06-06 | H. C. Starck Gmbh & Co. Kg | Trägerplatte für Sputtertargets, Verfahren zu ihrer Herstellung und Einheit aus Trägerplatte und Sputtertarget |
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DE202015100433U1 (de) | 2014-01-30 | 2015-02-09 | Fhr Anlagenbau Gmbh | Fügeverbindung zwischen zwei Elementen |
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JPWO2020195030A1 (ja) * | 2019-03-28 | 2021-09-13 | Jx金属株式会社 | スパッタリングターゲット製品及びスパッタリングターゲット製品の再生品を製造する方法 |
CN112122764A (zh) * | 2020-09-16 | 2020-12-25 | 宁波江丰电子材料股份有限公司 | 一种钨靶材与铜锌合金背板的扩散焊接方法 |
CN112935512A (zh) * | 2021-03-26 | 2021-06-11 | 宁波江丰电子材料股份有限公司 | 一种钴靶材与铜铬合金背板的扩散焊接方法 |
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-
2000
- 2000-10-31 JP JP2000332159A patent/JP3905301B2/ja not_active Expired - Lifetime
-
2001
- 2001-07-30 DE DE60107280T patent/DE60107280T2/de not_active Expired - Lifetime
- 2001-07-30 EP EP01955543A patent/EP1331283B1/en not_active Expired - Lifetime
- 2001-07-30 KR KR10-2003-7005916A patent/KR100528888B1/ko active IP Right Grant
- 2001-07-30 US US10/297,266 patent/US6759143B2/en not_active Expired - Lifetime
- 2001-07-30 WO PCT/JP2001/006553 patent/WO2002036848A1/ja active IP Right Grant
- 2001-10-16 TW TW090125515A patent/TW554060B/zh not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20190129228A (ko) * | 2018-05-10 | 2019-11-20 | 재단법인 포항산업과학연구원 | 스퍼터링 폐타겟으로부터 유가금속 회수방법 및 공정 부산물 재활용 방법 |
Also Published As
Publication number | Publication date |
---|---|
DE60107280T2 (de) | 2005-11-03 |
JP2002129316A (ja) | 2002-05-09 |
EP1331283A1 (en) | 2003-07-30 |
EP1331283B1 (en) | 2004-11-17 |
WO2002036848A1 (fr) | 2002-05-10 |
DE60107280D1 (de) | 2004-12-23 |
JP3905301B2 (ja) | 2007-04-18 |
EP1331283A4 (en) | 2004-04-28 |
US20030134143A1 (en) | 2003-07-17 |
KR100528888B1 (ko) | 2005-11-15 |
TW554060B (en) | 2003-09-21 |
US6759143B2 (en) | 2004-07-06 |
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