JPS6181657U - - Google Patents

Info

Publication number
JPS6181657U
JPS6181657U JP1984166348U JP16634884U JPS6181657U JP S6181657 U JPS6181657 U JP S6181657U JP 1984166348 U JP1984166348 U JP 1984166348U JP 16634884 U JP16634884 U JP 16634884U JP S6181657 U JPS6181657 U JP S6181657U
Authority
JP
Japan
Prior art keywords
pattern
light
transmitting
mask
transparent mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1984166348U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1984166348U priority Critical patent/JPS6181657U/ja
Publication of JPS6181657U publication Critical patent/JPS6181657U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の一実施例に係るマスクの断面
図、第2図は投影露光方式による片面露光工程の
断面図で、第3図は同じく両面露光工程の断面図
である。 4…半導体ウエーハ、5,5′…レジスト、6
,6′…凸レンズ、7,7′…光、9…透光性マ
スク、11…パターン、10,12…透光板。
FIG. 1 is a sectional view of a mask according to an embodiment of the present invention, FIG. 2 is a sectional view of a single-sided exposure process using a projection exposure method, and FIG. 3 is a sectional view of a double-sided exposure process. 4...Semiconductor wafer, 5,5'...Resist, 6
, 6'... Convex lens, 7, 7'... Light, 9... Translucent mask, 11... Pattern, 10, 12... Translucent plate.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] レジストを塗布した半導体ウエーハに、不透明
なパターンが印刷されている透光性マスクを対向
・配置し、上記透光性マスクを透過した光をレン
ズを介して上記ウエーハ上に照射し、該ウエーハ
上に上記パターンを縮小して結像させる投影露光
方式による露光工程で用いられる透光性マスクに
おいて、上記パターンを2枚の透光板で挾み込み
サンドイツチ状に形成したことを特徴とするマス
ク。
A transparent mask on which an opaque pattern is printed is placed facing a semiconductor wafer coated with a resist, and the light transmitted through the transparent mask is irradiated onto the wafer through a lens. A light-transmitting mask used in an exposure process using a projection exposure method in which the pattern is reduced in size and formed into an image, characterized in that the pattern is sandwiched between two light-transmitting plates to form a sandwich-like pattern.
JP1984166348U 1984-10-31 1984-10-31 Pending JPS6181657U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1984166348U JPS6181657U (en) 1984-10-31 1984-10-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1984166348U JPS6181657U (en) 1984-10-31 1984-10-31

Publications (1)

Publication Number Publication Date
JPS6181657U true JPS6181657U (en) 1986-05-30

Family

ID=30724169

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1984166348U Pending JPS6181657U (en) 1984-10-31 1984-10-31

Country Status (1)

Country Link
JP (1) JPS6181657U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05134391A (en) * 1991-11-14 1993-05-28 Mitsubishi Electric Corp Mask for exposing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05134391A (en) * 1991-11-14 1993-05-28 Mitsubishi Electric Corp Mask for exposing

Similar Documents

Publication Publication Date Title
JPS6181657U (en)
ES8609752A1 (en) Projected image relief printing plates.
JPS5845533U (en) Illuminance distribution measuring device
JPH01173770U (en)
JPS60104840U (en) photo mask
JPH01145125U (en)
JPS6257260U (en)
JPS6415236U (en)
JPS61140354U (en)
JPS5838445U (en) Laser printing device
JPS63188938U (en)
JPS636456U (en)
JPS63155139U (en)
JPS61185053U (en)
JPS58185850U (en) photomask
JPS6157519U (en)
JPS6390281U (en)
JPS6163834U (en)
JPS62106237U (en)
JPS5871741U (en) exposure equipment
JPS59109349U (en) photomask substrate
JPS59104145U (en) photo mask
JPH0397922U (en)
JPS60140955U (en) Photomask with steps
JPS57176041A (en) Photomask for printing circuit and exposure method using this