JPH0397922U

JPH0397922U -

Info

Publication number: JPH0397922U
Application number: JP591790U
Authority: JP
Priority date: 1990-01-24
Filing date: 1990-01-24
Publication date: 1991-10-09

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図乃至第３図は本考案Ｘ線マスクの一つの
実施例を説明するためのもので、第１図はＸ線露
光装置の斜視図、第２図はダミーマスクと、露光
マスクと、被露光体の断面図、第３図はダミーマ
スクと、露光マスクと、被露光体の斜視図、第４
図は本考案Ｘ線マスクの第２の実施例の平面図、
第５図は第４図のＸ線マスクと比較されるところ
のＸ線マスクの従来例の平面図、第６図Ａ，Ｂは
本考案Ｘ線マスクの第３の実施例を示すもので、
同図Ａは断面図、同図Ｂは平面図、第７図Ａ，Ｂ
は第６図のＸ線マスクと比較されるところのＸ線
マスクの別の従来例を示すもので、同図Ａは断面
図、同図Ｂは平面図、第８図は従来の場合におけ
る温度及び歪分布図、第９図及び第１０図は本考
案の背景技術を説明するためのもので、第９図は
Ｘ線露光装置の斜視図、第１０図は露光マスクと
被露光体の断面図、第１１図は考案が解決しよう
とする問題点を説明するための光透過材の光透過
特性図である。符号の説明、６……Ｘ線マスク（露光マスク）
、８……光透過材、９……光吸収膜、１２……Ｘ
線マスク（ダミーマスク）、１３……光透過材、
１４……光吸収膜、１５……マスクパターン、１
６……微小光吸収膜、１７……間隙。 1 to 3 are for explaining one embodiment of the X-ray mask of the present invention, FIG. 1 is a perspective view of an X-ray exposure device, FIG. 2 is a dummy mask, an exposure mask, FIG. 3 is a cross-sectional view of the exposed object, and FIG. 4 is a perspective view of the dummy mask, exposure mask, and exposed object.
The figure is a plan view of the second embodiment of the X-ray mask of the present invention.
FIG. 5 is a plan view of a conventional example of an X-ray mask to be compared with the X-ray mask of FIG. 4, and FIGS. 6A and 6B show a third embodiment of the X-ray mask of the present invention.
Figure A is a cross-sectional view, Figure B is a plan view, Figures 7A and B
6 shows another conventional example of an X-ray mask compared with the X-ray mask shown in FIG. 6, in which A is a cross-sectional view, B is a plan view, and FIG. 9 and 10 are for explaining the background technology of the present invention. FIG. 9 is a perspective view of an X-ray exposure device, and FIG. 10 is a cross-section of an exposure mask and an exposed object. 11A and 11B are diagrams showing the light transmission characteristics of the light transmission material for explaining the problems to be solved by the invention. Explanation of symbols, 6...X-ray mask (exposure mask)
, 8...Light transmitting material, 9...Light absorption film, 12...X
Line mask (dummy mask), 13...light transmitting material,
14...Light absorption film, 15...Mask pattern, 1
6...Microlight absorption film, 17...Gap.

Claims

【実用新案登録請求の範囲】 (1) Ｘ線を発生する光源と被露光体との間に配
置されるところの光透過材の表面に光吸収膜から
なるマスクパターンを形成した露光マスクの光源
側にダミーマスクとして配置されるＸ線マスクで
あつて、光透過材の表面の上記露光マスクの光吸収膜と
重なる位置に光吸収膜を形成してなることを特徴とするＸ線マスク。 (2) Ｘ線を発生する光源と被露光体との間に配
置されるところの光透過材の表面に光吸収膜から
なるマスクパターンを形成した露光マスクとして
用いられるＸ線マスクであつて、上記マスクパターンが微小な間隔を置いて群成
せしめられた微小光吸収膜により構成されてなることを特徴とするＸ線マスク。[Scope of Claim for Utility Model Registration] (1) A light source for an exposure mask in which a mask pattern made of a light-absorbing film is formed on the surface of a light-transmitting material placed between a light source that generates X-rays and an object to be exposed. 1. An X-ray mask that is placed as a dummy mask on the side of the X-ray mask, characterized in that a light-absorbing film is formed on the surface of a light-transmitting material at a position overlapping with the light-absorbing film of the exposure mask. (2) An X-ray mask used as an exposure mask in which a mask pattern made of a light-absorbing film is formed on the surface of a light-transmitting material placed between a light source that generates X-rays and an exposed object, An X-ray mask characterized in that the mask pattern is composed of minute light absorption films grouped at minute intervals.