JPH01145125U - - Google Patents

Info

Publication number
JPH01145125U
JPH01145125U JP4055888U JP4055888U JPH01145125U JP H01145125 U JPH01145125 U JP H01145125U JP 4055888 U JP4055888 U JP 4055888U JP 4055888 U JP4055888 U JP 4055888U JP H01145125 U JPH01145125 U JP H01145125U
Authority
JP
Japan
Prior art keywords
photomask
sample
light source
lens group
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4055888U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP4055888U priority Critical patent/JPH01145125U/ja
Publication of JPH01145125U publication Critical patent/JPH01145125U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案の露光装置の外観図、第2図は
第1図の試料、レンズ群、フオトマスク、照射源
の位置関係を示す図、第3図は従来の露光装置の
外観図である。 1……試料、2……レンズ群、3……フオトマ
スク、4……照射源、5……駆動機構。
Figure 1 is an external view of the exposure apparatus of the present invention, Figure 2 is a diagram showing the positional relationship of the sample, lens group, photomask, and irradiation source in Figure 1, and Figure 3 is an external view of a conventional exposure apparatus. . 1... Sample, 2... Lens group, 3... Photomask, 4... Irradiation source, 5... Drive mechanism.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 数μm〜十数μmの厚さのフオトレジストを表
面に形成した矩形状の試料と、透明な硝子板又は
プラスチツクフイルムの一面に該試料に転写すべ
きパターンを形成したフオトマスクと、該試料と
該フオトマスクとの間に位置し、該フオトマスク
のパターンを該試料表面に結像させるレンズ群と
、水銀灯、キセノンランプ等の光源及び該光源か
らの光を平行にするレンズを内部に備え、その先
を該フオトマスク、該レンズ群を通して試料に照
射する照射源と、該フオトマスクと該試料とを光
源の照射方向に対し、直角に平行移動させる駆動
機構とを備えたことを特徴とする露光装置。
A rectangular sample on which a photoresist with a thickness of several μm to more than 10 μm is formed; a photomask with a pattern to be transferred to the sample formed on one side of a transparent glass plate or plastic film; A lens group located between the photomask and the image of the photomask pattern on the sample surface, a light source such as a mercury lamp or a xenon lamp, and a lens that parallelizes the light from the light source are provided inside. An exposure apparatus comprising: an irradiation source that irradiates a sample through the photomask and the lens group; and a drive mechanism that moves the photomask and the sample in parallel at right angles to the irradiation direction of the light source.
JP4055888U 1988-03-28 1988-03-28 Pending JPH01145125U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4055888U JPH01145125U (en) 1988-03-28 1988-03-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4055888U JPH01145125U (en) 1988-03-28 1988-03-28

Publications (1)

Publication Number Publication Date
JPH01145125U true JPH01145125U (en) 1989-10-05

Family

ID=31267027

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4055888U Pending JPH01145125U (en) 1988-03-28 1988-03-28

Country Status (1)

Country Link
JP (1) JPH01145125U (en)

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