JPH01145125U - - Google Patents
Info
- Publication number
- JPH01145125U JPH01145125U JP4055888U JP4055888U JPH01145125U JP H01145125 U JPH01145125 U JP H01145125U JP 4055888 U JP4055888 U JP 4055888U JP 4055888 U JP4055888 U JP 4055888U JP H01145125 U JPH01145125 U JP H01145125U
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- sample
- light source
- lens group
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 claims 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims 1
- 229910052753 mercury Inorganic materials 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
- 239000002985 plastic film Substances 0.000 claims 1
- 229920006255 plastic film Polymers 0.000 claims 1
- 229910052724 xenon Inorganic materials 0.000 claims 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 1
Description
第1図は本考案の露光装置の外観図、第2図は
第1図の試料、レンズ群、フオトマスク、照射源
の位置関係を示す図、第3図は従来の露光装置の
外観図である。
1……試料、2……レンズ群、3……フオトマ
スク、4……照射源、5……駆動機構。
Figure 1 is an external view of the exposure apparatus of the present invention, Figure 2 is a diagram showing the positional relationship of the sample, lens group, photomask, and irradiation source in Figure 1, and Figure 3 is an external view of a conventional exposure apparatus. . 1... Sample, 2... Lens group, 3... Photomask, 4... Irradiation source, 5... Drive mechanism.
Claims (1)
面に形成した矩形状の試料と、透明な硝子板又は
プラスチツクフイルムの一面に該試料に転写すべ
きパターンを形成したフオトマスクと、該試料と
該フオトマスクとの間に位置し、該フオトマスク
のパターンを該試料表面に結像させるレンズ群と
、水銀灯、キセノンランプ等の光源及び該光源か
らの光を平行にするレンズを内部に備え、その先
を該フオトマスク、該レンズ群を通して試料に照
射する照射源と、該フオトマスクと該試料とを光
源の照射方向に対し、直角に平行移動させる駆動
機構とを備えたことを特徴とする露光装置。 A rectangular sample on which a photoresist with a thickness of several μm to more than 10 μm is formed; a photomask with a pattern to be transferred to the sample formed on one side of a transparent glass plate or plastic film; A lens group located between the photomask and the image of the photomask pattern on the sample surface, a light source such as a mercury lamp or a xenon lamp, and a lens that parallelizes the light from the light source are provided inside. An exposure apparatus comprising: an irradiation source that irradiates a sample through the photomask and the lens group; and a drive mechanism that moves the photomask and the sample in parallel at right angles to the irradiation direction of the light source.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4055888U JPH01145125U (en) | 1988-03-28 | 1988-03-28 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4055888U JPH01145125U (en) | 1988-03-28 | 1988-03-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01145125U true JPH01145125U (en) | 1989-10-05 |
Family
ID=31267027
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4055888U Pending JPH01145125U (en) | 1988-03-28 | 1988-03-28 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01145125U (en) |
-
1988
- 1988-03-28 JP JP4055888U patent/JPH01145125U/ja active Pending
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