JPS61140354U - - Google Patents

Info

Publication number
JPS61140354U
JPS61140354U JP1985022843U JP2284385U JPS61140354U JP S61140354 U JPS61140354 U JP S61140354U JP 1985022843 U JP1985022843 U JP 1985022843U JP 2284385 U JP2284385 U JP 2284385U JP S61140354 U JPS61140354 U JP S61140354U
Authority
JP
Japan
Prior art keywords
wafer
light
glass mask
pattern
film made
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1985022843U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985022843U priority Critical patent/JPS61140354U/ja
Publication of JPS61140354U publication Critical patent/JPS61140354U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本考案実施例の断面図、第2図は縮小
投影露光法を示す模式的断面図である。 図中、11はウエハ型ガラスマスク、12はシ
リコン窒化膜、13は(Cr+Cr0)膜、をそ
れぞれ示す。
FIG. 1 is a sectional view of an embodiment of the present invention, and FIG. 2 is a schematic sectional view showing a reduction projection exposure method. In the figure, 11 represents a wafer-type glass mask, 12 represents a silicon nitride film, and 13 represents a (Cr+Cr0) film.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ウエハ上に縮小投影露光法を用いて形成された
パターンを検査するに用いる当該ウエハと同一寸
法・形状の前記パターンと同一パターンが形成さ
れるガラスマスクであつて、該ガラスマスクの全
面には耐酸性・耐アルカリ性の光に透明な材料の
膜が形成され、前記膜の上に遮光性材料の膜が設
けられてなることを特徴とするウエハ型ガラスマ
スク。
A glass mask on which a pattern identical to the pattern of the same size and shape as the wafer is formed, which is used to inspect a pattern formed on a wafer using a reduction projection exposure method, and the entire surface of the glass mask is coated with an acid-resistant material. 1. A wafer-type glass mask comprising: a film made of a light-transparent material that is resistant to light and alkali; and a film made of a light-shielding material is provided on the film.
JP1985022843U 1985-02-20 1985-02-20 Pending JPS61140354U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985022843U JPS61140354U (en) 1985-02-20 1985-02-20

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985022843U JPS61140354U (en) 1985-02-20 1985-02-20

Publications (1)

Publication Number Publication Date
JPS61140354U true JPS61140354U (en) 1986-08-30

Family

ID=30515520

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985022843U Pending JPS61140354U (en) 1985-02-20 1985-02-20

Country Status (1)

Country Link
JP (1) JPS61140354U (en)

Similar Documents

Publication Publication Date Title
JPS61140354U (en)
JPS6257260U (en)
JPS6181657U (en)
JPS6157519U (en)
JPH01173770U (en)
JPS62106237U (en)
JPS6017907Y2 (en) photo mask
JPH0324601U (en)
JPS63188938U (en)
JPS6265654U (en)
JPS5655950A (en) Photographic etching method
JPH0413949U (en)
JPS636456U (en)
JPS6415236U (en)
JPS62161250U (en)
JPH0247649U (en)
JPS62149043U (en)
JPH0373428U (en)
JPS6321943U (en)
JPS6390281U (en)
JPS60104840U (en) photo mask
JPS59109349U (en) photomask substrate
JPS61185053U (en)
JPS60154959U (en) photo mask pattern
JPS6294335U (en)