JPS61140354U - - Google Patents
Info
- Publication number
- JPS61140354U JPS61140354U JP1985022843U JP2284385U JPS61140354U JP S61140354 U JPS61140354 U JP S61140354U JP 1985022843 U JP1985022843 U JP 1985022843U JP 2284385 U JP2284385 U JP 2284385U JP S61140354 U JPS61140354 U JP S61140354U
- Authority
- JP
- Japan
- Prior art keywords
- wafer
- light
- glass mask
- pattern
- film made
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011521 glass Substances 0.000 claims description 4
- 239000004063 acid-resistant material Substances 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 239000000463 material Substances 0.000 claims 1
- 239000012780 transparent material Substances 0.000 claims 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
Description
第1図は本考案実施例の断面図、第2図は縮小
投影露光法を示す模式的断面図である。
図中、11はウエハ型ガラスマスク、12はシ
リコン窒化膜、13は(Cr+Cr0)膜、をそ
れぞれ示す。
FIG. 1 is a sectional view of an embodiment of the present invention, and FIG. 2 is a schematic sectional view showing a reduction projection exposure method. In the figure, 11 represents a wafer-type glass mask, 12 represents a silicon nitride film, and 13 represents a (Cr+Cr0) film.
Claims (1)
パターンを検査するに用いる当該ウエハと同一寸
法・形状の前記パターンと同一パターンが形成さ
れるガラスマスクであつて、該ガラスマスクの全
面には耐酸性・耐アルカリ性の光に透明な材料の
膜が形成され、前記膜の上に遮光性材料の膜が設
けられてなることを特徴とするウエハ型ガラスマ
スク。 A glass mask on which a pattern identical to the pattern of the same size and shape as the wafer is formed, which is used to inspect a pattern formed on a wafer using a reduction projection exposure method, and the entire surface of the glass mask is coated with an acid-resistant material. 1. A wafer-type glass mask comprising: a film made of a light-transparent material that is resistant to light and alkali; and a film made of a light-shielding material is provided on the film.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985022843U JPS61140354U (en) | 1985-02-20 | 1985-02-20 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1985022843U JPS61140354U (en) | 1985-02-20 | 1985-02-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61140354U true JPS61140354U (en) | 1986-08-30 |
Family
ID=30515520
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1985022843U Pending JPS61140354U (en) | 1985-02-20 | 1985-02-20 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61140354U (en) |
-
1985
- 1985-02-20 JP JP1985022843U patent/JPS61140354U/ja active Pending
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