JPS57176041A - Photomask for printing circuit and exposure method using this - Google Patents

Photomask for printing circuit and exposure method using this

Info

Publication number
JPS57176041A
JPS57176041A JP5978581A JP5978581A JPS57176041A JP S57176041 A JPS57176041 A JP S57176041A JP 5978581 A JP5978581 A JP 5978581A JP 5978581 A JP5978581 A JP 5978581A JP S57176041 A JPS57176041 A JP S57176041A
Authority
JP
Japan
Prior art keywords
photomask
circuit
printing
holes
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5978581A
Other languages
Japanese (ja)
Inventor
Tsuneo Yoshino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP5978581A priority Critical patent/JPS57176041A/en
Publication of JPS57176041A publication Critical patent/JPS57176041A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

PURPOSE:To enable a large area of photomask to be brought into uniform close contact with a photoreceptor for printing a circuit by evacuation, by using the photomask for circuit printing having through holes in the light-transmitting parts of a circuit printing pattern. CONSTITUTION:A photomask 3 for printing a circuit having through holes 6 in the light-transmitting parts 8 of a circuit printing pattern is overlaid on a photosensitive film 2 for circuit printing, further, a film 7 having fine roughness is overlaid on the face in contact with the photomask 3, and then, it is exposed to light emitted from a sheet-like light source. Since the use of the sheet-like light source does not form the pattern of the holes 6 of the photomask 3 on the photosensitive film, and the holes 6 and the gaps of the fine roughness allow the air to pass, even a large area of photomask can be easily brought into uniform and secure vacuum contact with the photosensitive film for printing a circuit to expose it.
JP5978581A 1981-04-22 1981-04-22 Photomask for printing circuit and exposure method using this Pending JPS57176041A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5978581A JPS57176041A (en) 1981-04-22 1981-04-22 Photomask for printing circuit and exposure method using this

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5978581A JPS57176041A (en) 1981-04-22 1981-04-22 Photomask for printing circuit and exposure method using this

Publications (1)

Publication Number Publication Date
JPS57176041A true JPS57176041A (en) 1982-10-29

Family

ID=13123283

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5978581A Pending JPS57176041A (en) 1981-04-22 1981-04-22 Photomask for printing circuit and exposure method using this

Country Status (1)

Country Link
JP (1) JPS57176041A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63187147U (en) * 1987-05-18 1988-11-30

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63187147U (en) * 1987-05-18 1988-11-30

Similar Documents

Publication Publication Date Title
JPS57176041A (en) Photomask for printing circuit and exposure method using this
EP0517923A4 (en) Method of forming minute resist pattern
JPS55157737A (en) Resist pattern forming method for photofabrication
JPS5623746A (en) Manufacture of semiconductor device
JPS5742043A (en) Photosensitive material
JPS53147465A (en) Forming method of patterns for lift-off
JPS5429976A (en) Manufacture of semiconductor device
JPS5655950A (en) Photographic etching method
JPS57212445A (en) Production of photomask
JPS57122438A (en) Photomask for projection exposure
JPS5555528A (en) Mask aligner
JPS5366375A (en) Manufacture for semiconductor device
JPS53135844A (en) Photochemical etching procee
JPS5299812A (en) Photographic photosensitive material
JPS5616126A (en) Exposing method
JPS57112025A (en) Formation of pattern
JPS5744150A (en) Photomask
JPS5621327A (en) Manufacture of semiconductor device
JPS5382268A (en) Production of mask
JPS5681844A (en) Production of photomask for ic with airflow passage
JPS5648625A (en) Photographic film unit
JPS5437579A (en) Chrome plate
JPS5778040A (en) Pattern transfer method
JPS5746241A (en) Reversal dry developing method
JPS544077A (en) Photo mask for far ultraviolet ray exposure