JPS63188938U - - Google Patents

Info

Publication number
JPS63188938U
JPS63188938U JP8132087U JP8132087U JPS63188938U JP S63188938 U JPS63188938 U JP S63188938U JP 8132087 U JP8132087 U JP 8132087U JP 8132087 U JP8132087 U JP 8132087U JP S63188938 U JPS63188938 U JP S63188938U
Authority
JP
Japan
Prior art keywords
wafer
exposure apparatus
light source
shielding plate
mounting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8132087U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP8132087U priority Critical patent/JPS63188938U/ja
Publication of JPS63188938U publication Critical patent/JPS63188938U/ja
Pending legal-status Critical Current

Links

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図、第２図は本考案による露光装置の概略
の断面図、第３図は本考案による露光装置にてレ
ジスト露光したウエハーを示す図、第４図ａ，ｂ
，ｃは従来の露光装置にてレジスト露光したウエ
ハーを示す図である。 １…光源、２…ブラインド、３…露光用フオト
マスク、４…レンズ、５…レジスト膜、６…ウエ
ハー、７…遮蔽板、７ａ…開口部、８…ウエハー
ステージ。 1 and 2 are schematic cross-sectional views of the exposure apparatus according to the present invention, FIG. 3 is a diagram showing a wafer subjected to resist exposure using the exposure apparatus according to the present invention, and FIGS. 4 a and b.
, c are diagrams showing wafers subjected to resist exposure using a conventional exposure apparatus. DESCRIPTION OF SYMBOLS 1... Light source, 2... Blind, 3... Photomask for exposure, 4... Lens, 5... Resist film, 6... Wafer, 7... Shielding plate, 7a... Opening, 8... Wafer stage.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 半導体装置用露光装置において、光源とウエハ
ー搭載用ウエハーステージとの間に、該ウエハー
の口径よりも小さな開口部をもつ遮蔽板を設けた
ことを特徴とする半導体装置用露光装置。 1. An exposure apparatus for semiconductor devices, characterized in that a shielding plate having an opening smaller than the diameter of the wafer is provided between a light source and a wafer stage for mounting a wafer.
JP8132087U 1987-05-28 1987-05-28 Pending JPS63188938U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8132087U JPS63188938U (en) 1987-05-28 1987-05-28

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8132087U JPS63188938U (en) 1987-05-28 1987-05-28

Publications (1)

Publication Number Publication Date
JPS63188938U true JPS63188938U (en) 1988-12-05

Family

ID=30932952

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8132087U Pending JPS63188938U (en) 1987-05-28 1987-05-28

Country Status (1)

Country Link
JP (1) JPS63188938U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02278814A (en) * 1989-04-20 1990-11-15 Fujitsu Ltd Exposure of wafer
JP2008258634A (en) * 2007-04-05 2008-10-23 Asml Netherlands Bv Lithography device and method for masking substrate

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02278814A (en) * 1989-04-20 1990-11-15 Fujitsu Ltd Exposure of wafer
JP2008258634A (en) * 2007-04-05 2008-10-23 Asml Netherlands Bv Lithography device and method for masking substrate

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