JP6601360B2 - 物品搬送設備 - Google Patents
物品搬送設備 Download PDFInfo
- Publication number
- JP6601360B2 JP6601360B2 JP2016193915A JP2016193915A JP6601360B2 JP 6601360 B2 JP6601360 B2 JP 6601360B2 JP 2016193915 A JP2016193915 A JP 2016193915A JP 2016193915 A JP2016193915 A JP 2016193915A JP 6601360 B2 JP6601360 B2 JP 6601360B2
- Authority
- JP
- Japan
- Prior art keywords
- port
- cleaning
- container
- article
- cleaning port
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G1/00—Storing articles, individually or in orderly arrangement, in warehouses or magazines
- B65G1/02—Storage devices
- B65G1/04—Storage devices mechanical
- B65G1/0407—Storage devices mechanical using stacker cranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G1/00—Storing articles, individually or in orderly arrangement, in warehouses or magazines
- B65G1/02—Storage devices
- B65G1/04—Storage devices mechanical
- B65G1/0478—Storage devices mechanical for matrix-arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67727—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using a general scheme of a conveying path within a factory
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Mathematical Physics (AREA)
- Warehouses Or Storage Devices (AREA)
- Cleaning By Liquid Or Steam (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016193915A JP6601360B2 (ja) | 2016-09-30 | 2016-09-30 | 物品搬送設備 |
TW106131409A TWI741028B (zh) | 2016-09-30 | 2017-09-13 | 物品搬送設備 |
KR1020170124957A KR102419509B1 (ko) | 2016-09-30 | 2017-09-27 | 물품 반송 설비 |
CN201710907212.1A CN107878983B (zh) | 2016-09-30 | 2017-09-29 | 物品搬运设备 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2016193915A JP6601360B2 (ja) | 2016-09-30 | 2016-09-30 | 物品搬送設備 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2018052724A JP2018052724A (ja) | 2018-04-05 |
JP6601360B2 true JP6601360B2 (ja) | 2019-11-06 |
Family
ID=61781035
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2016193915A Active JP6601360B2 (ja) | 2016-09-30 | 2016-09-30 | 物品搬送設備 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP6601360B2 (zh) |
KR (1) | KR102419509B1 (zh) |
CN (1) | CN107878983B (zh) |
TW (1) | TWI741028B (zh) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6835031B2 (ja) * | 2018-04-27 | 2021-02-24 | 株式会社ダイフク | 物品搬送設備 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR0179405B1 (ko) * | 1993-04-12 | 1999-04-15 | 마스다 쇼오이치로오 | 크린장치가 부착된 하물보관설비 |
JPH07122531A (ja) * | 1993-10-22 | 1995-05-12 | Dainippon Screen Mfg Co Ltd | 基板処理液収容装置およびそれを備えた基板処理装置 |
JP3143700B2 (ja) * | 1995-06-27 | 2001-03-07 | 東京エレクトロン株式会社 | 位置合せ装置 |
JP3682170B2 (ja) * | 1998-09-09 | 2005-08-10 | 株式会社東芝 | カセット搬送システム、半導体露光装置、及びレチクル運搬方法 |
DE19922936B4 (de) * | 1999-05-19 | 2004-04-29 | Infineon Technologies Ag | Anlage zur Bearbeitung von Wafern |
JP3911624B2 (ja) * | 2001-11-30 | 2007-05-09 | 東京エレクトロン株式会社 | 処理システム |
TWI272229B (en) * | 2002-07-22 | 2007-02-01 | Dainippon Printing Co Ltd | Production line system and automated warehouse used in the system |
JP2004303835A (ja) * | 2003-03-28 | 2004-10-28 | Fasl Japan 株式会社 | 基板保管装置 |
JP4493955B2 (ja) * | 2003-09-01 | 2010-06-30 | 東京エレクトロン株式会社 | 基板処理装置及び搬送ケース |
CN100413047C (zh) * | 2005-01-28 | 2008-08-20 | 大日本网目版制造株式会社 | 基板处理装置 |
JP4744426B2 (ja) * | 2006-12-27 | 2011-08-10 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
JP2009057117A (ja) * | 2007-08-29 | 2009-03-19 | Sharp Corp | 搬送制御システム、搬送制御方法、及び搬送制御プログラム |
JP5545498B2 (ja) * | 2011-12-21 | 2014-07-09 | 株式会社ダイフク | 物品保管設備及び物品保管設備におけるメンテナンス方法 |
JP5610009B2 (ja) * | 2013-02-26 | 2014-10-22 | 東京エレクトロン株式会社 | 基板処理装置 |
-
2016
- 2016-09-30 JP JP2016193915A patent/JP6601360B2/ja active Active
-
2017
- 2017-09-13 TW TW106131409A patent/TWI741028B/zh active
- 2017-09-27 KR KR1020170124957A patent/KR102419509B1/ko active IP Right Grant
- 2017-09-29 CN CN201710907212.1A patent/CN107878983B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
JP2018052724A (ja) | 2018-04-05 |
KR102419509B1 (ko) | 2022-07-08 |
CN107878983A (zh) | 2018-04-06 |
TWI741028B (zh) | 2021-10-01 |
CN107878983B (zh) | 2021-05-14 |
TW201814815A (zh) | 2018-04-16 |
KR20180036576A (ko) | 2018-04-09 |
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