1272229 (1) 玖、發明說明 【發明所屬之技術領域】 本發明係關於製造濾色鏡等之板狀製品的生產線系統 ’尤其是，和利用可收容複數片基板（板狀材料）之卡匣來 製造板狀製品之生產線系統及用於該系統之各種物流裝置 (堆高式起重機方式之自動倉庫、以及基板收容裝置及基 板排出裝置）相關。 【先前技術】 濾色鏡之製造步驟上，含有（1)鉻成膜、（2)黑矩陣之 形成、（3)具有特定圖案之各色（紅色、綠色、及藍色）之著 色層的形成、（4)保護層之形成、（5)柱狀體之形成、 (6)IT0層之形成等多數處理步驟。 此時，以實現此種製造步驟爲目的之生產線系統方面 ，傳統上，一般係採用將實現上述各處理步驟之複數條處 理線方式配置成直線狀的直插型生產線系統。又，濾色鏡 之製造上有各種方法，而最一般的製造方法就是利用光刻 法者，此時，上述之（2)〜（5)的處理步驟係以含有微影製 程在內之處理步驟（製版步驟）來實現。又，製版步驟中’ 需要光阻劑（著色感光材料）之塗布、乾燥、預烘烤、曝光 、顯影、漂洗、乾燥、以及顯影後烘烤等複雜過程。 然而，利手光刻法之濾色鏡製造步驟中，含有複數含 微影製程在內之處理步驟的製版步驟’而且往往必須對應 如製造濾色鏡之製品種類，而變更以實現這些複數製版步 -5- 1272229 (2) 驟爲目的之複數製版線的配置構成等。亦即，近年來之濾 色鏡，各製品具有不同的規格（黑矩陣之有無、黑矩陣之 種類（鉻或樹脂）、保護層之有無、柱狀體之有無、IT〇層 之有無寺）’以问一生產線系統製造追些製品時，必須更 替製造步驟中含有之複數製版步驟的順序、或刪除特定之 製版步驟。又，最近之濾色鏡亦存在M VA之障層上立設 著柱狀體之複雜形狀的製品，以和通常製品相同之生產線 系統來製造此種製品時，即必須在製造步驟中追加新的製 φ 版步驟。 然而，上述之傳統直插型生產線系統時，因實現各處 理步驟之複數條處理線係直列連結，而有實現製版步驟之 複數製版線的配置構成等無法輕易變更之問題。又，此時 雖然可以利用在各製版線間配置適當旁通路徑來對應，然 而，此時必須增加追加之旁通路徑的設置面積，而有使生 產線系統整體之佔有面積過於龐大的問題。 又，利用光刻法之濾色鏡的製造步驟中，含有微影製 H 程在內之處理步驟（製版步驟），一般而言，會因爲異物附 著於光遮罩等而導致製品缺陷（共同缺陷等）之發生或裝置 之故障，往往必須暫停實現製版步驟之製版線的運轉。又 ’製版步驟在製造不同規格（使用感光材料、線寬、膜厚 等）之製品時，必須事先決定過程條件（有時亦會因爲感光 材料批號等而有微妙不同，故亦需每日確認當日之過程條 件），實現製版步驟之製版線上，必須在前一製品之製造 完全結束後另行實施以決定下一製品之過程條件爲目的之 -6- 1272229 (3) 處理。又，製版步驟通常需要較多處理時間，對生產線系 統整體而言，很容易成爲速度決定步驟。 然而，上述之直插型生產線系統時，因爲實現各處理 步驟之複數條處理線係直列連結，實現特定製版步驟之製 版線停止、或執行以決定該製版線之過程條件爲目的之處 理而使該製版線成爲速度決定步驟時，故有會對全部處理 線造成影響而使生產線系統之整體運轉率降低的問題。 又，利用光刻法之濾色鏡的製造步驟，如上所述，係 φ 由多數之複雜過程所構成，而有其中某一個過程（尤其是 製版步驟中之各過程）容易發生製品缺陷之問題。尤其是 ，近年來之濾色鏡的尺寸變得極爲大型化，而有製品之良 品率容易降低之問題。 傳統上，此種濾色鏡之製造步驟上，爲了提升製品之 良品率，一般會採用改善各過程使用裝置之使用條件等的 過程改善手法，然而，其改善程度有一定之限度，製造尺 寸較大之濾色鏡製造時，會有無法充分提升製品之良品率 € 的問題。因此，傳統上會以例如在生產線系統中組合檢査 機，再利用檢査機剔除檢測到缺陷之不良品，藉以提高製 品之良品率（參照日本特開平7-281 171號公報）。 然而，上述日本特開平7-281171號公報之手法雖然可 將製品之良品率提高至某種程度，然而，其檢査內容主要 係以個別缺陷爲前提，故有其提升程度有一定之限度的問 題。又，組合著檢査機之生產線系統，因係直列連結複數 處理步驟之構成，利用檢査機檢測缺陷時，爲了究明或排 -7- 1272229 (4) 除缺陷之發生原因等，往往需要暫時停止生產線系統整體 ，而有生產線無法維持高運轉率的問題。 【發明內容】 爲了解決前述問題，本發明之目的，係在提供可彈性 變更實現含微影製程在內之處理步驟（製版步驟）的複數製 版線之配置構成等而可實現高運轉率之生產線系統。 又’本發明之目的，係在提供可使生產線維持高運轉 φ 率並大幅提升製品之良品率的生產線系統。 又，本發明之目的，係在提供可有效防止製造過程之 基板破損等且可彈性對應基板之尺寸變更的生產線系統。 又，本發明之目的，係在提供生產線系統可應用之自 動倉庫，亦即，提供可縮短卡匣之入出庫作業的流程時間 且構成簡單而使裝置之配置限制較小的自動倉庫。 又，本發明之目的，係在提供一種生產線系統可使用 之基板收容裝置及基板排出裝置，亦即可縮短基板之收容 _ 或排出作業之流程時間的基板收容裝置及基板排出裝置。 本發明之第1解決手段係提供一種生產線系統，係利 用收容複數片基板之卡匣來製造濾色鏡之生產線系統，其 特徵爲，具備有：用以保管已收容有複數片基板之複數個 卡匣、或空卡匣，具有用以保管複數個卡匣之存放機、及 具有在該存放機內之複數個進出位置及任意之卡匣保管位 置間搬運保管於該存放機內之卡匣的堆高式起重機之核心 裝置；連結於前述核心裝置之前述各進出位置，針對收容 -8 - 1272229 (5) 保管於前述核心裝置內之已收容基板之卡匣內的基板實施 以製造濾色鏡爲目的之各種處理的複數條處理線；以及配 設對應於前述核心裝置之前述各進出位置，從位於該各進 出位置之已收容基板之卡匣將基板逐片排出至對應該各進 出位置之各處理線、或將經過該各處理線處理之已處理基 板逐片收容於位於該各進出位置之空卡匣內的基板進出機 構；且，前述複數條處理線係含有實現含微影製程在內之 處理步驟的複數條主製版線在內。 又，上述第1解決手段中，前述複數條處理線應含實 現和前述各主製版線相同之處理步驟的預備製版線在內。 又，上述第1解決手段中，在前述複數條處理線含有 之前述複數條主製版線當中之至少1線上，應組合著用以 檢測發生於處理對象之複數個基板的同一位置上之共同缺 陷的共同缺陷檢查機。 又，上述第1解決手段中，前述複數條處理線應包含 使利用在前述主製版線含有之前述共同缺陷檢査機檢測到 共同缺陷之基板獲得重生之基板重生線在內。 又，上述第1解決手段中，前述複數條處理線應含有 以檢查利用該各處理線執行處理之已處理基板的基板檢査 線，該基板檢査線則應具有以檢測發生於複數個基板之不 同位置上之個別缺陷爲目的之個別缺陷檢査機。此時，前 述基板檢査線若能具有用以修正利用前述個別缺陷檢査機 檢測到之前述各基板之個別缺陷的基板修正裝置則更佳。 又，上述第1解決手段中，前述複數條處理線應含有 -9- 1272229 · (6) 用以使利用在前述主製版線含有之前述共同缺陷檢査機、 或在前述基板檢査線含有之前述個別缺陷檢査機檢測到共 同缺陷或個別缺陷之基板獲得重生之基板重生線。 又，上述第1解決手段中，前述核心裝置應具有複數 個前述存放機及前述堆高式起重機，在前述各存放機應配 置至少1台堆高式起重機，前述各存放機應以配置於該各 存放機之堆高式起重機間隔著授受卡匣之授受裝置互相連 結。此時，前述授受裝置應爲具有可成爲配置於前述各存 Φ 放機之堆高式起重機之替代機之機能的堆高式起重機。又 ，前述複數個存放機應爲雁行狀配置。 本發明之第2解決手段係提供一種生產線系統，係利 用收容複數片基板之卡匣來製造板狀製品之生產線系統， 其特徵爲，具備有：用以保管已收容有複數片基板之複數 個卡匣、或空卡匣，具有用以保管複數個卡匣之存放機、 及具有在該存放機內之複數個進出位置及任意之卡匣保管 位置間搬運保管於該存放機內之卡匣的堆高式起重機之核 _ 心裝置；連結於前述核心裝置之前述各進出位置，針對收 容保管於前述核心裝置內之已收容基板之卡匣內的基板實 施各種處理之複數條處理線；以及配設對應於前述核心裝 置之前述各進出位置，從位於該各進出位置之已收容基板 之卡匣將基板逐片排出至對應該各進出位置之各處理線、 或將經過該各處理線處理之已處理基板逐片收容於位於該 各進出位置之空卡匣內的基板進出機構；且，由前述核心 裝置實施保管及搬運之前述卡匣，具有左右之側面框架、 -10· 1272229 (7) 及懸掛於這些左右之側面框架間且使複數片基板以水平狀 態獲得支持而沿著不同高度的複數段沿水平面延伸之複數 條框線。 又，上述第2解決手段中，前述複數條處理線應爲用 以製造濾色鏡之各種處理。 本發明之第3解決手段係提供一種自動倉庫，係處理 收容複數片基板之卡匣的自動倉庫，其特徵爲，具備有： 用以保管複數個卡匣之存放機；在該存放機內之進出位置 φ 及任意之卡匣保管位置間搬運保管於前述存放機內之卡匣 的堆高式起重機；配設對應於前述存放機之前述進出位置 ，針對在基板搬運機構間之從卡匣排出基板或將基板收容 卡匣之前述基板搬運機構而將該卡匣定位的卡匣定位機構 ;以及在前述存放機及前述卡匣定位機構間搬運卡匣之卡 匣搬運機構；且，前述存放機之前述進出位置具有用以從 存放機搬出卡匣之出庫位置、及用以將卡匣搬入存放機之 和前述出庫位置獨立之入庫位置，前述卡匣定位機構會移 β 動至對應於前述存放機之前述出庫位置的卡匣供應位置、 及對應於前述入庫位置之卡匣排出位置的其中任一之位置 ，在前述卡匣供應位置實施從前述卡匣搬運機構移入卡匣 ，且在前述卡匣排出位置將卡匣送出至前述卡匣搬運機構 又，上述第3解決手段中，前述卡匣應係以水平狀態 收容前述複數片基板，前述卡匣定位機構應係以對應基板 之收容間隔的間隙昇降前述卡匣之卡匣昇降裝置。 -11 - 1272229 (8) 本發明之第4解決手段係提供一種基板收容裝置，係 將基板收容於卡匣之基板收容裝置’其特徵爲，具備有： 使卡匣移動至供應卡匣之卡匣供應位置、將基板收容於卡 匣之基板收容位置、以及回收卡匣之卡匣回收位置當中之 其中任一位置的卡匣移動機構；及將基板收容於由前述卡 匣移動機構執行定位之前述基板收容位置上之卡匣的基板 搬入機構。 本發明之第5解決手段係提供一種基板排出裝置，係 φ 將基板從卡匣排出之基板排出裝置，其特徵爲，具備有： 使卡匣移動至供應卡匣之卡匣供應位置、從卡匣排出基板 之基板排出位置、以及回收卡匣之卡匣回收位置當中之其 中任一位置的卡匣移動機構；及將基板從由前述卡匣移動 機構執行定位之前述基板排出位置上之卡匣排出之基板搬 出機構。 依據本發明第1解決手段，因保管著收容複數片玻璃 基板之複數個卡匣的堆高式起重機方式核心裝置，係經由 _ 基板進出機構連結於用以製造濾色鏡之各種處理的複數條 處理線’實現含用以黑矩陣之形成及各色著色層之形成等 微影製程在內之處理步驟（製版步驟）的複數製版線之配置 構成等之變更會更爲容易，而可對應製造之濾色鏡的製品 種類’更替這些複數製版步驟之順序，追加或刪除特定之 製版步驟。 又’依據本發明第1解決手段，因爲堆高式起重機方 式之核心裝置連結著可賓現和各主製版線相同之處理步驟 -12· 1272229 (9) 的預備製版線，即使在含微影製程在內之處理步驟（製版 步驟）發生製品缺陷（共同缺陷等）而必須暫時停止實現該 製版步驟之製版線時，可在預備製版線上繼續該製版步驟 ’而可防止生產線系統之整體運轉率的降低。又，因係利 用預備製版線決定製版步驟上必要之過程條件，而可在製 造前一製品時，同時決定下一製品之過程條件，而可利用 該預備製版線繼續下一製品之製造，進而防止生產線系統 之整體運轉率的降低。又，成爲速度決定步驟之製版線可 φ 實現之製版步驟以該製版線及預備製版線同時實現，可消 除速度決定步驟，而防止生產線系統之整體運轉率的降低 〇 又，依據本發明第1解決手段，利用生產線之處理線 當中之實現含微影製程在內之處理步驟的處理線（製版線） 上’組合用以檢測發生於處理對象之複數個玻璃基板的同 一位置上之共同缺陷的共同缺陷檢査機，可及早檢測到大 量不良品發生之原因的共同缺陷，而提昇製品之良品率。 _ 此時’依據本發明第1解決手段，因保管著收容複數片玻 璃基板之複數個卡匣的堆高式起重機方式核心裝置，係經 由基板進出機構連結於生產線之處理線，即使在含黑矩陣 之形成或各色著色層之形成等微影製程在內之處理步驟（ 製版步驟）當中的之其中任一步驟因異物附著於光遮罩等 而發生共同缺陷時，除了可儘速只停止發生該共同缺陷之 處理步驟並解決問題以外，其他處理步驟則可利用保管於 核心裝置之存放機內已實施至前一處理步驟爲止之已處理 -13- (10) 1272229 玻璃基板來繼續製造。因此，可維持生產線之高運轉率並 提升製品之良品率。 又，依據本發明第1解決手段，因核心裝置連結著用 以檢查經過生產線之處理線的處理之已處理玻璃基板的處 理線（基板檢査線），而可利用個別缺陷檢査機來檢測發生 於複數個玻璃基板之不同位置上的個別缺陷，故可適當排 除和共同缺陷不同之個別缺陷的發生原因，進一步提升製 品之良品率。又，利用在處理線（基板檢査線）以基板修正 Φ 裝置修正個別缺陷檢査機檢測到之各玻璃基板的個別缺陷 ，故可改善製品之實質廢料率。 又，依據本發明第1解決手段，因核心裝置連結著用 以重生利用共同缺陷檢査機或個別缺陷檢査機檢測到之共 同缺陷或個別缺陷之玻璃基板的處理線（基板重生線），即 使個別缺陷檢査機檢測到基板修正裝置無法修正之個別缺 陷時，亦可利用處理線（基板重生線）之基板重生裝置使該 玻璃基板重生，而改善製品之實質廢料率。又，即使共同 缺陷檢査機檢測到共同缺陷時，利用處理線（基板重生線） 之基板重生裝置使該玻璃基板重生，而改善製品之實質廢 料率。又，因不會將最後會成爲不良品之玻璃基板移送至 後步驟，可防止後步驟承受到不必要之負荷，故可提升生 產線系統之整體實質運轉率。 又，依據本發明第1解決手段，堆高式起重機方式核 心裝置係由經由授受卡匣之授受裝置互相連結之複數個存 放機所構成，設置面積不同之處理線可以最小之必要設備 -14- (11) 1272229 且任意之配置構成來實施彈性配置。又，授受裝置若採用 具有配置於各存放機之堆高式起重機之代替機能的堆高式 起重機，則即使堆高式起重機發生故障，利用該具有代替 機能之堆高式起重機可繼續各存放機之處理，而提升生產 線系統之整體安定性。 依據本發明第2解決手段，因生產線系統之核心裝置 實施保管及搬運之卡匣係採用以懸掛於左右側面框架間之 複數條框線使基板以水平狀態獲得支持之框線式卡匣，故 以核心裝置之堆高式起重機等搬運卡匣時之振動可有效被 框線吸收，即使以大型基板製造濾色鏡等時，亦可防止收 容於卡匣內之基板發生破損或受損。又，因爲可以收容至 卡匣可收容之最大尺寸爲止之任意尺寸的基板，即使以同 一生產線系統製造複數種類之濾色鏡等時，無需配合基板 之尺寸更換卡匣，可有效對應少量多品種之製造。又，和 銷式卡匣等相比，可收容更大量之基板，而進一步提升具 有核心裝置之生產線系統的優點，亦即，可進一步提升針 對暫停處理步驟之對應能力。 依據本發明第3解決手段，可應用於生產線系統之自 動倉庫中，爲了使基板搬運機構可從卡匣排出基板或將基 板收容於卡匣而使該卡匣移至相對於基板搬運機構之定位 上的卡匣定位機構，在對應存放機之出庫位置之卡匣供應 位置、及對應入庫位置之卡匣排出位置間移動，在卡匣供 應位置可將卡匣從卡匣搬運機構取入，同時，在卡匣排出 位置可將卡匣轉移給卡匣搬運機構，故對卡匣執行基板之 -15- 1272229 (12) 排出或收容之期間，可使下一卡匣以鄰接方式待機，而縮 短卡匣之入出庫作業的流程時間。又，因對應存放機之出 庫位置的卡匣供應位置、及對應入庫位置之卡匣排出位置 間係利用卡匣定位機構之移動來實施卡匣之授受，而無需 以改變卡匣之移動方向爲目的之特別的方向轉換機構，又 ’覆蓋區只要對應於和卡匣供應位置及卡匣排出位置對應 之2個位置份即可，構成十分簡單且裝置之配置限制亦較 小。又，因實施卡匣之授受而在卡匣供應位置及卡匣排出 φ 位置間移動之卡匣定位機構的構成上，係在和基板搬運帶 相同之架台上實施相對移動，和以直接連結卡匣搬運機構 及基板搬運帶來避免兩者之干涉時相比，構成上更爲簡易 ，且可提升維修性。 依據本發明第4解決手段，可應用於生產線系統之基 板收容裝置中，係利用卡匣移動機構使卡匣在卡匣供應位 置、基板收容位置、及卡匣回收位置當中之其中任一位置 上移動，位於基板收容位置時，會利用基板搬入機構將基 儀 板收容於已被卡匣移動機構定位之卡匣。因此，將基板收 容至卡匣的動作只有在卡匣移動期間才會停止，又，結束 將基板收容至卡匣之時點，卡匣會從基板收容位置移至卡 匣回收位置，同時，卡匣會從卡匣供應位置移至基板收容 位置，而可縮短基板之收容作業的流程時間。 依據本發明第5解決手段，可應用於生產線系統之基 板排出裝置中，係利用卡匣移動機構使卡匣在卡匣供應位 置、基板排出位置、及卡匣回收位置當中之其中任一位置 -16- (13) 1272229 上移動，位於基板排出位置時，會利用基板搬出機構從已 被卡匣移動機構定位之卡匣排出基板。因此，從卡匣排出 基板之動作只有在卡匣移動期間才會停止，又，結束從卡 匣排出基板之時點，卡匣會從基板排出位置移至卡匣回收 位置，同時，卡匣會從卡匣供應位置移至基板排出位置， 而可縮短基板之排出作業的流程時間。 【實施方式】 以下，參照圖面針對本發明實施形態進行說明。 第1實施形態 如第1圖所示，本發明第1實施形態之生產線系統1具 有：用以保管已收容複數片玻璃基板之複數已收容基板之 卡匣或空卡匣的堆高式起重機方式核心裝置10;及分別連 結於核心裝置10之複數個進出位置（搬出位置C1及搬入位 置C2)，用以針對收容於核心裝置10保管之已收容基板之 卡匣內之玻璃基板執行以製造濾色鏡爲目的之各種處理的 複數條處理線20、30、…、70、90。又，核心裝置10之設 置上，係在水平設置面上之直線狀延伸，各處理線2 0、3 0 、…、70、90之設置上，係在設置面上以從核心裝置1〇之 側部朝橫向呈倒U字狀突出。 首先，利用第1圖針對處理線20、3 0 ..... 70、90之 構成進行說明。如第1圖所示，各處理線20、30、…、70 、9 0具有由以水平狀態搬運玻璃基板之搬運帶等所構成之 -17- (14) 1272229 搬運路1 5、及配設於該搬運路1 5上之各種處理裝置2 1、3 1 、…、9 6 〇 其中，處理線20係在玻璃基板上實施鉻成模之處理線 ，處理裝置（鉻成膜裝置21)配設於搬運路15上。 處理線3 0係用以實施形成於玻璃基板上之鉻膜的圖案 化並形成黑矩陣之處理線，搬運路1 5上配設著處理裝置（ 光阻劑塗布裝置31、預烘烤裝置32、曝光裝置33、顯影裝 置3 4、洗淨裝置3 5、蝕刻裝置3 6、剝離裝置3 7、以及顯影 馨 後烘烤裝置3 8)。又，黑矩陣若由樹脂所構成，利用光阻 劑塗布裝置31、預烘烤裝置32、曝光裝置33、顯影裝置34 、洗淨裝置3 5、以及顯影後烘烤裝置3 8來執行處理。又， 處理線30會構成後述之處理線40R、40G、40B、50、60、 以及實現含光刻在內之處理步驟的主製版線。處理線40R 、4 0G、40B係分別用以在玻璃基板上形成具有特定圖案 之各色（紅色、綠色、或藍色）著色層之處理線，搬運路15 上配設著處理裝置（光阻劑（著色感光材料）塗布裝置4 1、 ^ 預烘烤裝置42、曝光裝置43、顯影裝置44、洗淨裝置45、 以及顯影後烘烤裝置46)。 處理線50係用以在玻璃基板上形成保護層之處理線， 和處理線4 0 R、4 0 G、4 0 G相同，搬運路上5上配設著處理 裝置（光阻劑塗布裝置51、預烘烤裝置52、曝光裝置53、 顯影裝置54、洗淨裝置55、以及顯影後烘烤裝置56)。 處理線60係用以在玻璃基板上形成柱狀體之處理線， 和處理線4 0 R、4 0 G、40 B相同，搬運路1 5上配設著處理 -18- (15) 1272229 裝置（光阻劑塗布裝置61、預烘烤裝置62、曝光裝置63、 顯影裝置64、洗淨裝置65、以及顯影後烘烤裝置66)。 處理線70係用以在玻璃基板上形成IT0層之處理線， 搬運路1 5上配設著處理裝置（I τ Ο成膜裝置7 1 )。又，製造 STN類型之濾色鏡時，需要ΙΤΟ層之圖案化，此時，處理 線7 0上只需配設和處理線3 0相同之處理裝置（塗布裝置、 預烘烤裝置、曝光裝置、顯影裝置、洗淨裝置、蝕刻裝置 、剝離裝置、以及顯影後烘烤裝置）即可。 處理線90係用以實現和處理線40R、40G、40Β、50、 60相同之處理步驟的預備製版線，搬運路15上配設著和處 理線40R、40G、40Β、50、60相同之處理裝置（塗布裝置 91、預烘烤裝置92、曝光裝置93、顯影裝置94、洗淨裝置 95、以及顯影後烘烤裝置96)。又，處理線90除了可以成 爲處理線40R、40G、40Β、50、60之代替線以外，亦可當 做在MVA之障層上製造柱狀體之形狀的製品時必須追加 之處理線使用。又，後者時，係利用處理線50、60、90執 行處理。 又，連結於核心裝置之處理線，除了上述處理線20 、30、...、70、90以外，亦可設置以切斷玻璃基板、執行 各種檢査、重生玻璃基板爲目的之其他處理線。 其次，利用第2圖至第5圖’針對第1圖所示之生產線 系統1之核心裝置1 0及基板進出機構（基板搬出機構1 6 a及 基板搬入機構16b)之構成進行說明。 如第2圖所示，核心裝置1 0具有用以保管複數個卡匣 1272229 (16) 81之存放機11、及在該存放機Η內搬運保管於該存放機11 之卡匣81的堆高式起重機12。 此時，存放機11之構造如第3圖及第4圖所示’以上下 2段方式配置著載置卡匣81之複數載架11a。又，堆高式起 重機12除了可在沿著存放機11延伸之軌道13上朝左右方向 移動以外，尙可利用昇降框架（圖上未標示）在上下方向移 動，而可在存放機11內之各進出位置（搬出位置C1及搬入 位置C2)及上下2段之載架11a當中之任意載架（任意卡匣 鲁 保管位置）間搬運卡匣8 1。此時，軌道1 3之單側上設置著1 台存放機1 1，然而，並不限於此，軌道1 3之兩側亦可配置 2台存放機。又，存放機Π之載架11a係配置成上下2段’ 然而，並不限於此，存放機Π之載架11a亦可配置成上下 3段以上。又，軌道13上只有1台堆高式起重機12在移動’ 然而，並不限於此，軌道1 3上亦可有2台以上之堆高式起 重機在移動。 此時，存放機Π內之各進出位置（搬出位置C1及搬入 馨 位置C2)分別配設著基板進出機構（基板搬出機構16a及基 板搬入機構16b)，如第.2圖及第3圖所示，利用各基板搬出 機構1 6 a將玻璃基板8 2逐片從定位於各搬出位置C 1之已收 容基板之卡匣8 1排出至對應各搬出位置C 1之各處理線（搬 運路15)，同時如第2圖及第4圖所示，利用各基板搬入機 構16b將各處理線（搬運路15)已執行處理之已處理玻璃基 板82逐片收容於定位於各搬入位置C2之空卡匣81內。 又，各基板搬出機構16a具有使卡匣81昇降之卡匣昇 -20- (17) 1272229 降裝置17a、及從利用卡匣昇降裝置l7a昇降之已收容基 板之卡匣81將玻璃基板82逐片搬出至搬運路15之基板搬運 帶18a。又，各基板搬出機構16a具有在搬出位置C1之出 庫位置A1或入庫位置B1、以及卡匣昇降裝置17a之間授 受卡匣81之卡匣搬運裝置（圖上未標示）。 又，各基板搬入機構16b具有使卡匣81昇降之卡匣昇 降裝置17b、及從搬運路15將玻璃基板82逐片搬入至利用 卡匣昇降裝置17b昇降之卡匣81之基板搬運帶18b。又， 各基板搬入機構16b具有在搬入位置C2之出庫位置A2或 入庫位置B2、以及卡匣昇降裝置17b之間授受卡匣81之卡 匣搬運裝置（圖上未標示）。 又，如第5圖所示，基板搬運帶18a、18b具有支持框 架87、及設置於支持框架87上之滾柱88。另一方面，卡匣 81具有上板83、下板84、以連結此上板83及下板84之方式 裝設之複數支柱85、以及以左右方向（垂直第5圖之圖面的 方向）懸掛於支柱8 5間之複數條框線8 6，係利用配置於同 一高度之複數條框線8 6而以如第5圖所示之狀態來收容複 數個玻璃基板8 2。又，卡匣8 1係利用卡匣昇降裝置（參照 第2圖）來昇降，經由形成於下板84之開口 84a進入基板搬 運帶18a、18b之滾柱88，會接觸收容於卡匣81內之玻璃 基板82的下面，玻璃基板82會從卡匣81被搬出至搬運路15 、或從搬運路15被搬入至卡匣81。 其次，利用第1圖至第5圖，針對具有此種構成之生產 線系統1的動作進行說明。又，核心裝置1 0及各處理線2 0 -21 - 1272229 (18) 、30.....7〇、90上連結著控制裝置（圖上未標示），會自 動執行以下之動作。 首先，初期狀態假設爲核心裝置1 〇之存放機Π內保管 著收容複數片未處理玻璃基板82之複數已收容基板之卡匣 81及複數空卡匣81。 該狀態下，各處理線2 0、3 0 ..... 7 0、9 0會利用核心 裝置10之堆高式起重機12，從保管於存放機11內之已收容 基板之卡匣81中取出特定之卡匣81(收容著已執行至期望 φ 之處理步驟爲止之玻璃基板的卡匣），並使其定位於搬出 位置 C 1。又，各處理線2 0、3 0、…、7 0、9 0會利用核心 裝置10之堆高式起重機12使保管於存放機I 1內之空卡匣 81定位於搬入位置C2。 此時，濾色鏡之製造上，係利用處理線20、30、…、 70、90依特定順序對玻璃基板62執行處理而實現，各處理 線20、30.....70、90之搬出位置C1上，保管於存放機 11內之已收容基板之卡匣81當中收容著已執行至前一處理 g 步驟爲止之玻璃基板的卡匣8 1會選擇性地就定位。又，利 用處理線2 0、3 0 ..... 7 0、9 0製造濾色鏡時，會依例如 (1)鉻成膜（處理線20)、（2)黑矩陣之形成（處理線30)、（3) 紅色著色層之形成（處理線40R)、（4)綠色著色層之形成（處 理線40G)、（5)藍色著色層之形成（處理線40B)、（6)保護層 之形成（處理線50)、（7)柱狀體之形成（處理線60)、（8)IT0 層之形成（處理線70)之順序執行，此時，各處理線20、30 .....7 0、9 0之搬出位置C 1上，依上述（1 )〜（8 )之順序而 •22- 1272229 (19) 言，保管於存放機Π內之已收容基板之卡匣81當中收容著 已執行至前一處理步驟爲止之玻璃基板的卡匣8 1會選擇性 地就定位。 此時，各處理線2 0、3 0 ..... 7 0、9 0會利用配設於搬 出位置C1之基板搬出機構16a，將玻璃基板82從定位於搬 出位置C1之已收容基板之卡匣81逐片排出至處理線（搬運 路15)，各處理線20、30、…、70、90對玻璃基板82執行 特定處理。 具體而言，如第2圖所示，首先，核心裝置1 0之堆高 式起重機12會將從存放機11之特定載架11a取出之已收容 基板之卡匣8 1，搬運至搬出位置C 1之出庫位置A 1。此時 ，到達出庫位置A1之已收容基板之卡匣81，會被卡匣搬 運裝置（圖上未標示）搬運至卡匣昇降裝置17a。其次，卡 匣昇降裝置1 7a在如第5圖所示之狀態下，使卡匣8 1各下 降1段，同時，基板搬運帶18a之滾柱88會接觸卡匣81內 位於最下段之玻璃基板82的下面，而將玻璃基板82逐片從 卡匣81搬出至搬運路15。又，從卡匣81搬出玻璃基板82之 期間，會將下一應排出玻璃基板82之已收容基板之卡匣81 搬運至出庫位置A1並待機。 又，全部玻璃基板82皆搬出之空卡匣81，會利用卡匣 昇降裝置17a上昇，同時，移至入庫位置B1之前，再由卡 匣搬運裝置（圖上未標示）將其從卡匣昇降裝置17a搬運至 入庫位置B1。其次，被搬至入庫位置B1之空卡匣81會被 當做收容用卡匣，並利用堆高式起重機12保管於存放機1 1 (20) 1272229 內之空載架11a內。 另一方面，各處理線2 0、3 0 ..... 7 0、9 0會利用配設 於搬入位置C2之基板搬入機構16b，將在處理線（搬運路 1 5 )完成處理之已處理玻璃基板8 2逐片收容於定位於搬入 位置C2之空卡匣81內。 具體而言，如第2圖所示，首先，將利用核心裝置1 0 之堆高式起重機12從存放機11之特定載架11a取出之空卡 匣8 1搬運至搬入位置C2之出庫位置A2。此時，到達出庫 φ 位置 A2之空卡匣81，則會被卡匣搬運裝置（圖上未標示） 搬運至卡匣昇降裝置17b。其次，卡匣昇降裝置17b在如 第5圖所示之狀態下，使卡匣8 1各上昇1段，同時，受取從 搬運路上5搬入之玻璃基板82，基板搬運帶18a之滾柱88 會接觸玻璃基板82之下面，而逐片將玻璃基板82從搬運路 15搬入卡匣81。又，將玻璃基板82收容至卡匣81內之期間 ，會將下一應收容玻璃基板8 2之其他空卡匣8 1搬運至出庫 位置A2並待機。 _ 又，已收容全部玻璃基板82之已收容基板之卡匣81， 會由卡匣昇降裝置17b移至入庫位置B2之前，並利用卡匣 搬運裝置（圖上未標示）從卡匣昇降裝置17b搬運至入庫位 置B2。其次，被搬運至入庫位置B2之已收容基板之卡匣 81，會利用堆高式起重機12將其保管於存放機11內之空載 架1 1 a內。 如上所示，依據本發明第1實施形態，因爲保管收容 著複數片玻璃基板82之複數個卡匣81的堆高式起重機方式 -24- (21) 1272229 核心裝置10上，經由基板進出機構（基板搬出機構16a及基 板搬入機構1 6b)，連結著用以製造濾色鏡之各種處理的複 數條處理線20、30、…、70、90，實現含以黑矩陣之形成 、及各色著色層之形成等爲目的之微影製程在內之處理步 驟（製版步驟）的處理線40R、40G、40B、50、60之配置構 成等之變更會更爲容易，而可對應製造之濾色鏡的製品種 類，更替這些複數製版步驟之順序，追加或刪除特定之製 版步驟。 又，依據本發明第1實施形態，因爲堆高式起重機方 式之核心裝置10連接著可實現和處理線（主製版線）40R、 40G、4 0B、50、60相同之處理步驟的處理線（預備製版線 )90，即使在含微影製程在內之處理步驟（製版步驟）發生 製品缺陷（共同缺陷等）而必須暫時停止實現該製版步驟之 製版線時，可在處理線90上繼續該製版步驟，而可防止生 產線系統之整體運轉率的降低。又，因係利用處理線90決 定製版步驟上必要之過程條件，而可在製造前一製品時， 同時決定下一製品之過程條件，而可利用該處理線90繼續 下一製品之製造，進而防止生產線系統之整體運轉率的降 低。又，成爲速度決定步驟之製版線可實現之製版步驟以 該製版線及處理線90同時實現，可消除速度決定步驟，而 防止生產線系統之整體運轉率的降低。 又，依據上述第1實施形態，核心裝置1 〇上只連結著1 條處理線（預備製版線）90，可利用該處理線90配合必要實 現和各製版線40R、40G、40B ' 50、60相同之處理步驟， (22) 1272229 然而，並不限於此，可設置任意數之預備製版線，例如， 在各製版線40R、40G、40B、50、60分別連結預備製版線 ，並利用各預備製版線實現和各製版線40R、40G、40B、 50、60相同之處理步驟亦可。 又，上述第1實施形態中，核心裝置1 0係由1台存放機 1 1所構成，然而，並不限於此，核心裝置1 0亦可由複數個 存放機所構成。 又，上述第1實施形態中，逐片將玻璃基板82從已收 φ 容基板之卡匣81搬出至搬運路15、逐片將玻璃基板82從搬 運路15搬入至卡匣81之基板搬運機構係採用如第5圖所示 之基板搬運帶18a、18b，然而，並不限於此，亦可利用具 有懸臂之機器人等，將玻璃基板82載置於懸臂上，從卡匣 8 1之正面***，將玻璃基板8 2懸臂移至框線8 6，來逐片收 容玻璃基板82，另一方面，則從卡匣8 1之正面***懸臂， 將玻璃基板82從框線86移至懸臂，來逐片排出玻璃基板82 第2實施形態 其次，參照第6圖針對本發明第2實施形態進行說明。 又，本發明第2實施形態除了（1)在實現含微影製程在內之 處理步驟的製版線上，組合著以檢測發生於處理對象之複 數個玻璃基板的同一位置上的共同缺陷爲目的之共同缺陷 檢査機、（2)配設以檢測（必要時執行修正）利用各處理線執 行處理之已處理基板爲目的之基板檢査線、（3)配設以重 -26- 1272229 (23) 生利用製版線含有之共同缺陷檢査機、或基板檢査線含有 之個別缺陷檢査機檢測到共同缺陷或個別缺陷之基板爲目 的之基板重生線之諸點以外，其他和上述第1實施形態大 致相同。本發明第2實施形態中，和上述第1實施形態相同 之部份會附與相同符號並省略詳細說明。 如第6圖所示，本發明第2實施形態之生產線系統1 ’具 有：用以保管已收容複數片玻璃基板之複數已收容基板之 卡匣或空卡匣的堆高式起重機方式核心裝置10;及分別連 φ 結於核心裝置10之複數個進出位置（搬出位置C1及搬入位 置C2)，用以針對收容於核心裝置10保管之已收容基板之 卡匣內之玻璃基板執行各種處理之複數條處理線20、3 0、 , …、70、 90、 100、 110。又，處理線20 ' 30 、…、70 、 90 係執行以製造濾色鏡爲目的之各種處理的生產線，處理線 1〇〇係以檢查利用處理線20、3 0 ..... 70、90執行處理之 已處理玻璃基板爲目的之基板檢査線，處理線1 〇係以重生 檢測到各種缺陷（發生於玻璃基板之同一位置上之共同缺 · 陷、或發生於基板之不同位置上之個別缺陷）之玻璃基板 爲目的之基板重生線。又，核心裝置1 〇之設置上，係在水 平設置面上之直線狀延伸，各處理線20、3 0 ..... 70、90 、10 0、110之設置上，係在設置面上以從核心裝置10之側 部朝橫向呈倒U字狀突出。 首先，利用第6圖針對處理線20、30、…、70、90、 100、110之構成進行說明。如第6圖所示，各處理線20、 30 '…、70、90、100、110具有由以水平狀態搬運玻璃基 -27- (24) 1272229 板之搬運帶等所構成之搬運路1 5、及配設於該搬運路1 5上 之各種處理裝置21、31.....101、102、111。 此時，處理線20、3 0 ..... 70、90之基本構成雖然和 上述第1實施形態相同，然而，處理線30、40R、40G、 4 0 B、5 0、6 0、7 0之搬運路1 5上，組合著以檢測發生於處 理對象之複數個玻璃基板之同一位置上之共同缺陷爲目的 之共同缺陷檢査機39、47、57、67、77。 其中，組合於以黑矩陣之形成爲目的之處理線30的共 φ 同缺陷檢査機3 9，會執行特定檢査項目（端面尺寸、透射 率、及外觀檢査等）相關之全數檢査。又，外觀檢査係利 用圖像處理裝置等以比較鄰接像素圖像差的方式來實施。 又，組合於以各色（紅色、藍色、或綠色）著色層之形 成爲目的之處理線40R、40G、40B上之共同缺陷檢査機 47，會執行特定檢査項目（外觀檢査等）相關之抽樣檢査（ 例如，1 〇片：1片之比率）。又，外觀檢査係利用圖像處理 裝置等以比較鄰接之相當於矩陣部份的圖像差的方式來實 · 施。 又，組合於以保護層之形成爲目的之處理線50之共同 缺陷檢査機57，會執行特定檢査項目（不均檢査及共同缺 陷檢査等）相關之全數檢査或抽樣檢査。又，不均檢査係 利用圖像處理裝置等以實施反射光及透射光之AD轉換並 比較大面積（長期周期）之鄰接部圖像之差的方式來實施。 又，共同缺陷檢査係利用圖像處理裝置等以實施反射光及 透射光之AD轉換並比較一像素程度之小面積（短期周期） -28- 1272229 (25) 之鄰接部圖像之差的方式來實施。 又’組合於以柱狀體之形成爲目的之處理線6 0之共同 缺陷檢査機67，會執行特定檢査項目（尺寸檢査及柱狀體 之脫落檢査等）之全數檢査或抽樣檢査。又，柱狀體之脫 落檢査係利用圖像處理裝置等以比較鄰接柱狀體之圖像之 差的方式來實施。 又，組合於以ITO層之形成爲目的之處理線70之共同 缺陷檢査機77，會執行特定檢査項目（針孔之形成狀態、 從特定位置之偏離、分光特性、表單電阻及膜厚等）之全 數檢査或抽樣檢査。 又，利用共同缺陷檢査機3 9、4 7、5 7、6 7、7 7獲得之 檢査結果，在控制裝置（圖上未標示）上會以對應各玻璃基 板之形式進行管理，並依據該檢査結果，決定各玻璃基板 之後一處理（處理之繼續或玻璃基板之重生等）。此時，會 依據檢査結果停止發生共同缺陷之處理線，並究明或排除 共同缺陷之發生原因等。具體而言，例如，以用以形成 I TO層之處理線70爲例來進行說明，實施以製造STN類型 濾色鏡爲目的之圖案形成時，會實施光遮罩之洗淨及更換 。又，實施以製造TFT類型濾色鏡爲目的之圖案形成（顯 示部在膜全面之電極取出部以外之外圍部未形成ITO之圖 案形成）時，會執行ΙΤ0成膜時所使用之載體的洗淨及更換 〇 另一方面，處理線1 〇 〇則係以檢查經過處理線20、3 0 、…、70、90處理之已處理玻璃基板爲目的之基板檢査線 -29- 1272229 (26) ，搬運路1 5上配設著處理裝置（以檢測發生於複數個玻璃 基板之不同位置上之個別缺陷爲目的之個別缺陷檢査機 1 〇 1、及以修正個別缺陷檢査機1 0 1檢測到之各玻璃基板之 個別缺陷爲目的之基板修正裝置1 02)。 此時，處理線1 0 1之個別缺陷檢査機1 0 1會針對特定檢 査項目（不均檢査、外觀檢査、缺陷高度檢測、座標查核） 執行個別檢査。 各檢査項目之詳細如下所示。 (1) 不均檢査：利用圖像處理裝置等檢取單色（同色）圖 像，針對1像素之共同缺陷檢査無法檢測之濃淡缺陷實施 檢測。又，變更檢査方法、以及比較區域之面積及方向（ 縱及橫），可檢測從小缺陷至不均缺陷爲止之缺陷。 (2) 外觀檢査：利用圖像處理裝置檢出透射光圖像， 以比較同色鄰接像素圖像之差，檢測白點及異物、黑矩陣 缺陷、背面玻璃傷痕、背面玻璃污染等。又，利用圖像處 理裝置等檢出反射光圖像，以比較同色鄰接像素圖像之差 ，檢測突起及膜面剝離等。 (3) 缺陷高度檢測：以觸針式檢測裝置檢測上述（2)之 外觀檢査中檢測到之突起（反射光圖像時，突起會因亂反 射而呈現黑色）高度。 (4) 座標查核：依據上述（2)之外觀檢査的檢測結果， 以顯微鏡檢査判斷必要檢測之缺陷及部位的座標。利用此 方式，可決定其後之處理（無需修正、必要修正、及無法 修正等）。 •30- 1272229 (27) 處理線11 〇係以重生共同缺陷檢査機3 9、4 7、5 7、6 7 、7 7或個別缺陷檢査機1 〇 1檢測到共同缺陷或個別缺陷之 玻璃基板爲目的之基板重生線，搬運路15上配設著處理裝 置（重生檢測到共同缺陷或個別缺陷之玻璃基板的基板重 生裝置111)。 又，連結於核心裝置1 〇之處理線除了上述之處理線2 0 、30、...、70、90、100、110以外，尙設置著以切斷玻璃 基板爲目的之其他處理線。 此時，具有此種構成之生產線系統1’的動作和上述第 1形態時相同，在連結於核心裝置1〇及各處理線2〇、30、 ...、70、90、100、110之控制裝置（圖上未標示）的控制下 ，自動執行濾色鏡之製造、檢査、及重生等相關各種處理 〇 具體而言，濾色鏡之製造係利用生產線之處理線20、 30、...、70依特定順序對玻璃基板82執行處理來實現，各 處理線20、3 0 ..... 70之搬出位置C1上，保管於存放機 11內之已收容基板之卡匣81當中收容著已執行至前一處理 步驟爲止之玻璃基板的卡匣8 1會選擇性地就定位。又，利 用處理線2 0、3 0 ..... 7 0製造濾色鏡時，會依例如（1)鉻 成膜（處理線20)、（2)黑矩陣之形成（處理線30)、（3)紅色著 色層之形成（處理線40R)、（4)綠色著色層之形成（處理線 40G)、（5)藍色著色層之形成（處理線40Β)、（6)保護層之形 成（處理線50)、（7)柱狀體之形成（處理線60)、（8)1Τ0層之 形成（處理線70)之順序執行。 1272229 (28) 又，生產線之處理線20、3 0 ..... 70當中實現含微影 製程之處理步驟在內之處理線（製版線）40R、40G、40B、 50、60上，組合著以檢測發生於處理對象之複數個玻璃基 板82之同一位置上的共同缺陷爲目的之共同缺陷檢査機39 、47、57、67，並依據上述特定檢査項目執行檢査。其次 ，依據該檢査結果，停止發生共同缺陷之處理線，究明及 排除共同缺陷之發生原因等。此時，停止之處理線以外之 處理線，會利用保管於核心裝置1 〇之存放機1 1內之已執行 φ 至前一處理步驟爲止之處理的已處理玻璃基板82來繼續製 造。 又，生產線之處理線20、30、…、70的處理全部結束 後、或其途中，已經過處理線20、3 0 ..... 70之處理的已 處理玻璃基板82會被送至處理線（基板檢査線）100。其次 ，利用個別缺陷檢査機1 01，依上述特定檢査項目檢測發 生於複數個玻璃基板82之不同位置上之個別缺陷，必要時 ，利用基板修正裝置1 02修正以個別缺陷檢査機1 0 1檢測到 _ 之各玻璃基板8 2的個別缺陷。 又，生產線之處理線20、30 ..... 70的處理全部結束 後、或其途中，由共同缺陷檢査機39、47、57、67、77或 個別缺陷檢査機1 〇 1檢測到共同缺陷或個別缺陷之玻璃基 板82會被送至基板重生線（處理線110)。其次，利用基板 重生裝置111，將形成於玻璃基板82上之各種層以浸漬於 酸及鹼溶液等去除，使玻璃基板82重生。 如上所示，依據本發明第2實施形態，因爲生產線之 -32- 1272229 (29) 處理線20、30、…、70當中實現含微影製程在內之處理步 驟的處理線（製版線）30、40R、40G、40B、50、60、70上 ，組合著以檢測發生於處理對象之複數個玻璃基板82之同 一位置上之共同缺陷爲目的之共同缺陷檢査機3 9、4 7、5 7 、6 7、7 7，可及早檢測到發生大量不良品之原因的共同缺 陷，而提升製品之良品率。此時，依據本發明第2實施形 態，因爲保管收容著複數片玻璃基板82之複數個卡匣81的 堆高式起重機方式核心裝置10上，經由基板進出機構（基 鲁 板搬出機構16a及基板搬入機構16b)連結著生產線之處理 線20、30..... 70，即使含以黑矩陣之形成及各色著色層 之形成等爲目的之微影製程在內之處理步驟（製版步驟）當 中之之其中任一處理發生由光遮罩上有異物附著等而導致 之共同缺陷時，亦可迅速只停止發生該共同缺陷之處理步 驟並解決問題，且其他處理步驟可利用保管於核心裝置1 〇 之存放機11內之已執行至前一處理步驟爲止之處理的已處 理玻璃基板82來繼續製造。因此，可維持生產線之高運轉 · 率且提升製品之良品率。 又，依據本發明第2實施形態，因爲核心裝置1 〇上連 結著以檢查經過生產線之處理線20、3 0 ..... 70之處理的 已處理玻璃基板82爲目的之處理線（基板檢査線）1〇〇，而 可利用個別缺陷檢査機1 0 1發生於複數個玻璃基板82之不 同位置上之個別缺陷，故可適當地排除和共同缺陷不同之 個別缺陷的發生原因，而進一步提升製品之良品率。又， 處理線（基板檢査線）1 00上，因爲會利用基板修正裝置102 -33- (30) 1272229 修正個別缺陷檢査機1 0 1檢測到之各玻璃基板8 2的個別缺 陷，而可改善製品之實質廢料率。 又，依據本發明第2實施形態，因爲核心裝置1 0上連 結著以重生共同缺陷檢査機39、47、57、67、77或個別缺 陷檢査機1 0 1檢測到共同缺陷或個別缺陷之玻璃基板82爲 目的之處理線（基板重生線）1 1 0，即使個別缺陷檢査機1 0 1 檢測到基板修正裝置1 02無法修正之個別缺陷時，亦可利 用處理線（基板重生線）1 1 0之基板重生裝置1 1 1使該玻璃基 φ 板82重生，而改善製品之實質廢料率。又，即使共同缺陷 檢査機39、47、57、67、77檢測到共同缺陷時，亦可利用 處理線（基板重生線）110之基板重生裝置111使該玻璃基板 82重生，而改善製品之實質廢料率。此時，因不會將最後 會成爲不良品之玻璃基板82移送至後步驟，可防止後步驟 承受到不必要之負荷，故可提升生產線系統之整體實質運 轉率。 又’上述第1及第2實施形態時，可以如下之配置設計 · 將第1圖及第6圖所示之生產線系統1、1，實際導入至工廠 。以下’係以第6圖所示之生產線系統1，爲例進行說明。 第7圖及第8圖係將第6圖所示之生產線系統1，實際導 入工廠時之配置設計實例圖。又，第7圖及第8圖中，係只 將第6圖所示之處理線20、30..... 70、90、100、110當 中之鉻成膜線2 0、黑矩陣形成線3 0、著色層形成線4 0 R、 40G、40B、保護層形成線50、柱狀體形成線60、基板檢 査線1〇〇、以及基板重生線110配置於工廠之地板50上時。 -34- (31) 1272229 如第7圖所示，實施生產線系統丨，之配置設計時，必 須依據必要之儲存容量等來決定核心裝置10之存放機Π的 尺寸’且在考慮地板5 0之面積及形狀的情形下，決定處理 線20、30、…、60、100、110之配置構成。 此時，處理線20、30、…、60、1〇〇、110之設置面積 會因其種類而不同，又，即使同樣爲製版線之處理線30、 …、60，例如，黑矩陣形成線30需要之設置面積會大於著 色層形成線40R、40G、40B需要之設置面積。又，除了 肇 以製造濾色鏡爲目的之生產線的處理線20、30、…、60以 外，尙連結著以執行檢査及修正處理爲目的之基板檢査線 1 〇〇、及以重生玻璃基板爲目的之基板重生線11 〇等其他處 理線。 因此，想要將此種具有不同設置面積之全部處理線20 、30、…、60、100、110連結於由1台存放機11所構成之 核心裝置1 〇時，因無法只利用第2圖所示之基板進出機構（ 基板搬出機構16a及基板搬入機構16b)直接連結於部份處 β 理線（黑矩陣形成線3 0及基板重生線1 1 0)及核心裝置1 〇之 間，並發生利用AGV、RGV、及CV等之搬運台車來搬運 玻璃基板之非必要搬運路徑（參照121、122)，故無法採用 第7圖所示之配置設計。 相對於此，若以複數個存放機構成核心裝置1 〇，設置 面積不同之處理線20、30、…、60、100、110可以最小之 必要設備且任意之配置構成來實施彈性設置。具體而言， 如第8圖所示，利用將複數個存放機1 1、Π ’配置成雁行狀 -35- (32) 1272229 (前後落差狀），只需第2圖所示之基板進出機構（基板搬出 機構16a及基板搬入機構16b)即可直接連結含黑矩陣形成 線3 0及重生線1 1〇在內之全部處理線20、30、…、60、100 、Π0及核心裝置1〇。 此時，第8圖所示之核心裝置1 0之各存放機1 1、1 1 ’分 別配置著1台堆高式起重機12、12’。又，存放機11、11’ 之連結部份上則配置著以在堆高式起重機1 2、1 2 ’間實施 卡匣之授受爲目的之堆高式起重機（授受裝置）19。又，此 φ 種授受裝置可以採用任意之裝置，然而，若採用具有可成 爲堆高式起重機12、12’之代替機之機能的堆高式起重機 1 9，則在堆高式起重機1 2、1 2 ’發生故障時，亦可利用代 替機之堆高式起重機19來繼續各存放機11、11’之處理。 又，第8圖所示之核心裝置1 0係將複數個存放機1 1、 1 1 ’配置成雁行狀（前後落差狀），然而，亦可對應地板之 形狀及處理線數等而爲任意之配置構成，如第9圖及第1 0 圖所示，亦可利用授受裝置130將複數個存放機11、11’、 _ 11”配置成T字形等。 第3實施形態 其次，參照第1 1圖至第1 5圖，針對本發明第3實施形 態進行說明。又，本發明第3實施形態除了核心裝置之構 成不同以外，其他和上述第1及第2實施形態相同。本發明 第3實施形態中，和上述第1及第2實施形態相同之部份會 附與相同符號並省略詳細說明。 -36- 1272229 (33) 上述第1及第2實施形態之生產線系統1、1 ’中，利用 核心裝置1〇保管及搬運之卡匣81 ’亦可採用以從左右側面 框架向水平方向突出之複數支持銷來支持基板使其成水平 狀態之所謂銷式卡匣。又’銷式卡匣上設置複數段之支持 銷列，前述支持銷列係在同一高度從左右側面框架朝內側 突出，利用同一段之複數支持銷將1片玻璃基板支持成水 平狀態之方式來收容複數個玻璃基板。 然而，銷式卡匣時，因爲以核心裝置之堆高式起重機 Φ .等搬運卡匣時會使卡匣產生很大的振動，而有收容於卡匣 內之基板容易發生破損或受損之問題。尤其是，近年來製 造之濾色鏡等製品愈來愈大型化，上述問題亦隨著重量之 增大而變得更爲明顯。 又，銷式卡匣時，因爲支持銷之長度等會決定可收容 之基板尺寸範圍，對於超過該範圍之尺寸的基板，有必須 配合基板尺寸更換卡匣之問題。尤其是，近年來製造之濾 色鏡等製品的種類極多，而使上述問題更爲明顯。 Φ 本發明第3實施形態之主要目的即在解決此種問題， 和上述第1及第2實施形態時相同，由核心裝置1 0保管及搬 運之卡匣8 1，採用以懸掛於左右側面框架間之複數條框線 使基板支持於水平狀態之框線式卡匣。 以下，參照第1 1圖至第1 5圖，針對本發明第3實施形 態之生產線系統1，，之核心裝置1 0及基板進出機構（基板搬 出機構216a及基板搬入機構21 6b)之構成進行說明。 如第1 1圖所示，核心裝置1 0具有以保管複數個卡匣8 1 -37- 1272229 (34) 爲目的之存放機211、及在該存放機211內搬運保管於該存 放機211內之卡匣81的堆高式起重機212。 此時，存放機211之構造上係沿堆高式起重機212之移 動路兩側延伸，存放機2 1 1之各列配置著上下2段用以載置 卡匣81之複數載架21 la(參照第13圖）。 又，堆高式起重機2 1 2則如第1 2圖及第1 3圖所示，係 在載置著卡匣8 1之狀態沿著存放機2 1 1移動者，利用使昇 降框架213在上下方向移動，可在存放機211內之各進出位 φ 置（搬出位置C1及搬入位置C2)及上下2段之載架211a當 中之任一載架（任意之卡匣保管位置）間搬運卡匣81。 此時，由核心裝置1 〇保管及搬運之卡匣8 1，如第1 2圖 及第13圖所示，具有上板183、立設於上板183上之左右側 面框架184、185、以及懸掛於左右側面框架184、185間之 複數條框線186。此時，複數條框線186係在不同高度之複 數段水平面上延伸，利用同一段之複數條框線1 86支持玻 璃基板82使其處於水平狀態。又，如第14圖及第15圖所示 _ ，左右側面框架1 84、1 8 5具有以螺栓等分別固定於上板 183之8支支柱18軸、185a，這些支柱184a、185a當中互相 相對之支柱會以複數撐柱187互相連結。又，框線186若爲 具有以將玻璃基板82支持成水平狀態爲目的之充分張力者 ，亦可以採用合成樹脂製或金屬製等之任意材質。又，框 線186之水平面內之條數方面，只要可充分支持玻璃基板 82且使其保持水平面之範圍，可以爲任意條數。又，框線 186之垂直方向的條數，只要可在玻璃基板82間不會發生 -38- (35) 1272229 互相干涉狀態下收容期望之玻璃基板8 2的範圍’可以爲 意條數。 又，存放機211內之各進出位置（搬出位置C1及搬 位置C2)上，分別配設著基板進出機構（基板搬出機構21 及基板搬入機構2 1 6b)，如第1 1圖所示，可利用各基板 出機構21 6a從定位於各搬出位置C1之已收容基板之卡 8 1將玻璃基板8 2逐片排出至對應各搬出位置C 1之各處 線（搬運路15)，同時，可利用各基板搬入機構216b將經 各處理線（搬運路15)之處理的已處理玻璃基板82逐片收 於定位於各搬入位置C2之空卡匣81內。 此時，基本上，各基板搬出機構216a及各基板搬 機構216b具有相同構成，如第14圖所示，具有：具有 觸收容於卡匣81內之玻璃基板82下面之複數滾輪190的 板搬運帶2 1 8、及爲了改變卡匣8 1及基板搬運帶2 1 8之相 位置關係而昇降卡匣81之卡匣昇降裝置217(圖上未標示 動機構）。又，如第1 1圖所示，搬出位置C 1上，卡匣8 1 被卡匣搬運裝置（圖上未標示）從出庫位置 A1搬運至各 板搬出機構216a，同時，從各基板搬出機構216a搬運 入庫位置B1。又，搬入位置C2上，卡匣81會被卡匣搬 裝置（圖上未標示）從出庫位置 A2搬運至各基板搬入機 216b，同時，從各基板搬入機構21 6b搬運至入庫位置 〇 又，如第14圖所示，各基板搬出機構216a及各基 搬入機構216b之基板搬運帶218具有：固定於設置面上 任 入 6 a 搬 匣 理 過 容 入 接 基 對 驅 會 基 至 運 構 B2 板 •39- 1272229 (36) 設之支柱1 9 1的上端，同時，以從兩側夾住卡匣8 1之方式 配置之左右支持框架188、188;以及以可自由轉動之方式 裝設於左右支持框架188、188上之複數支軸189。又，各 支軸189上以等間隔配置著6個滾輪190。又，這些支軸189 上裝設著驅動機構（圖上未標示），使各支軸189朝期望之 方向轉動。 在此種基板搬出機構216a及基板搬入機構21 6b內， 卡匣昇降裝置217可昇降卡匣81，利用卡匣昇降裝置217使 φ 卡匣81各下降1段時，基板搬運帶218之滾輪190會接觸到 收容於卡匣81內之最下方玻璃基板82之下面，而可將收容 於卡匣8 1內之各段的玻璃基板8 2排出至搬運路1 5 (參照第 1 4圖之實線箭頭）。又，利用卡匣昇降裝置2 1 7使卡匣8 1各 上昇1段時，基板搬運帶21 8之滾輪190會接觸到從搬運路 15被搬入之玻璃基板82之下面，而將玻璃基板82收容於卡 匣8 1之各段（參照第1 4圖之虛線箭頭）。 又，第14圖所示之各基板搬出機構21 6a及各基板搬 · 入機構216b內，會固定基板搬運帶218，並利用卡匣昇降 裝置2 17來昇降卡匣81，然而，只要能改變卡匣81及基板 搬運帶2 1 8之相對位置關係者，其構成上並未限定爲昇降 卡匣8 1側，亦可爲昇降基板搬運帶2 1 8側之昇降構成，亦 可爲同時昇降基板搬運帶218及卡匣81雙方之昇降構成。 又，各基板搬出機構216a及各基板搬入機構21 6b除 了如第1 4圖所示之構成以外，亦可以爲如第1 5圖所示之構 成，亦即，從卡匣昇降裝置217’（圖上未標示驅動機構）之 -40- (37) 1272229 下方進入基板搬運帶218’之構成。又，第15圖所示之基板 搬運帶2 1 8 ’具有配設於設置面上之支持框1 92、利用橫板 193固定於支持框192上之複數 字形框架194、以及以可 自由轉動之方式裝設於框架194之成對前端部194a、194b 的複數支軸189。又，各支軸189上，以等間隔配置著6個 滾輪190。又，這些支軸189上裝設著驅動機構之馬達195 、傳動支軸196a、196b、以及齒輪197等，各支軸189可朝 期望之方向轉動。 φ 此時，具有此種構成之生產線系統1”之動作，係和上 述第1及第2形態時相同，在連結於核心裝置1 0及各處理線 20、30、…、70之控制裝置（圖上未標示）的控制下，可自 動執行濾色鏡之製造、檢査、及重生等相關各種處理。 如上所示，依據本發明第3實施形態，因爲生產線系 統1之核心裝置1 0保管及搬運之卡匣8 1，係採用以懸掛於 左右側面框架184、185間之複數條框線186來支持玻璃基 板82並使其保持水平狀態之框線式卡匣，可利用框線1 86 φ 有效吸收以核心裝置1 0之堆高式起重機2 1 2搬運卡匣8 1時 所產生之振動，即使利用大型玻璃基板（例如特大尺寸 meter size)(厚度〇.7//m程度）之玻璃基板）製造濾色鏡等 時，可防止收容於卡匣81內之玻璃基板8 2破損或受損。 又，依據本發明第3實施形態，因爲由生產線系統1” 之核心裝置1 〇保管及搬運之卡匣8 1係上述之框線式卡匣， 可收容至該卡匣81可收容之最大尺寸爲止之任意尺寸的玻 璃基板，即使以同一生產線系統製造複數種類之濾色鏡等 -41 - 1272229 (38) 時，亦無需配合玻璃基板尺寸而更換卡匣，可有效對應少 量多品種之製造。 又，依據本發明第3實施形態，因爲由生產線系統1，， 之核心裝置1 〇保管及搬運之卡匣8 1係上述之框線式卡匣， 和銷式卡匣等相比，可收容大量之玻璃基板，可進一步發 揮具有核心裝置之生產線系統的優點，提昇暫停處理步驟 時之對應能力。 第4實施形態 其次，參照第1 6圖至第1 9圖，針對本發明第4實施形 態進行說明。 上述第1至第3實施形態之生產線系統1、1 ’、1”上， 核心裝置10在存放機11、211內具有複數個進出位置（搬出 位置C1及搬入位置C2)，針對定位於搬出位置C1或搬入 位置C2之卡匣81，利用基板進出機構（基板搬出機構16a 及基板搬入機構16b)將玻璃基板82逐片收容至卡匣81、或 將玻璃基板82從卡匣81逐片排出。又，核心裝置1〇之存放 機11、211內之搬出位置C1或搬入位置C2分別具有分別 獨立配置之出庫位置Al、A2及入庫位置Bl、B2。 此時，上述第1至第3實施形態之生產線系統1、1 ’、 1 ”之核心裝置1 〇內，存放機1 1、2 1 1之卡匣8 1的出庫位置 Al、A2及入庫位置Bl、B2會互相不同，因爲利用基板進 出機構（基板搬出機構16a及基板搬入機構16b)實施之將玻 璃基板8 2收容於卡匣8 1之收容作業、及從卡匣8 1排出玻璃 (39) 1272229 基板82之排出作業係分別獨立實施，可縮短更換卡匣81上 必要之流程時間，而縮短玻璃基板8 2停留在各處理線2 0、 3〇.....70、90、100、110之搬運路15上的時間。 然而’具有此種構成之核心裝置1 0上，必須在基板搬 出機構16a設置具有以在搬出位置ci之出庫位置A1或入 庫位置B1、及卡匣昇降裝置17a間實施卡匣81之授受爲目 的之方向轉換機構等之卡匣搬運裝置（圖上未標示）。又， 同樣的，必須在基板搬入機構1 6 b設置具有以在搬入位置 · C2之出庫位置A2或入庫位置B2、及卡匣昇降裝置17b間 實施卡匣81之授受爲目的之方向轉換機構等之卡匣搬運裝 置（圖上未標示）。因此，會有卡匣搬運裝置之機械機構會 較爲複雜且裝置配置之限制較大的問題。 本發明第4實施形態之目的即在解決此種問題，而將 上述第1至第3實施形態之生產線系統1、1 ’、1 ”之核心裝 置10的構成進行變更。 如第1 6圖至第1 9圖所示，核心裝置1 0係處理收容複數 φ 片玻璃基板82之卡匣81的自動倉庫，具有以保管複數個卡 匣81爲目的之存放機11、在該存放機11內搬運保管於該存 放機Π內之卡匣81的堆高式起重機12。 此時，存放機1 1之構造上，係配置著上下2段之用以 載置卡匣81之複數載架11a。又，堆高式起重機12除了在 左右方向上而於沿著存放機11延伸之軌道13上移動以外， 尙利用使昇降框架（圖上未標示）在上下方向移動，而可在 存放機11內之各進出位置（搬出位置C1及搬入位置C2)及 -43- (40) 1272229 上下2段之載架11a當中之任意載架（任意卡匣保管位置）間 搬運卡匣81。此時，軌道13之單側上設置著1台存放機11 ，然而，並不限於此，軌道1 3之兩側亦可配置著2台存放 機。又，存放機Π之載架Π a係配置成上下2段，然而， 並不限於此，存放機Π之載架1 1 a亦可配置成上下3段以 上。又，軌道13上只有1台堆高式起重機12在移動，然而 ，並不限於此，軌道13上亦可有2台以上之堆高式起重機 在移動。 φ 此種核心裝置1 〇之存放機1 1的搬出位置C 1外側，如 圖16及第17圖所示，配置著卡匣昇降裝置（卡匣定位機構 )3 17，前述卡匣昇降裝置（卡匣定位機構）31可針對基板搬 運帶（基板搬運機構）等之搬運路15使卡匣81以對應於玻璃 基板82之收容間隔的間隙而在上下方向（垂直圖面之方向） 昇降，且可從卡匣81將玻璃基板82排出至和其鄰接配置之 搬運路15。又，存放機11及卡匣昇降裝置317之間，配設 著以在兩者之間搬運卡匣之卡匣搬運帶（卡匣搬運機構 鲁 )318 、 319 。 此時，存放機Π內之搬出位置C 1上，具有以從存放 機11搬出卡匣81爲目的之出庫位置A1、及將卡匣81搬入 存放機Π爲目的而和出庫位置A1分別獨立之入庫位置B1 。又，卡匣昇降裝置31 7係配置於卡匣移動部316，可在對 應存放機11之出庫位置A1的卡匣供應位置D1、及對應入 庫位置B1的卡匣排出位置E1之其中任一位置移動，在卡 匣供應位置D1上，可將卡匣81從卡匣搬運帶31 8拉入，同 -44- 1272229 (41) 時，在卡匣排出位置El上，可將卡匣81送出至卡匣搬運 帶 318。 另一方面，核心裝置10之存放機11的搬入位置C2外 側，如第1 8圖及第1 9圖所示，配置著卡匣昇降裝置（卡匣 定位機構）317，前述卡匣昇降裝置（卡匣定位機構）317可 針對基板搬運帶（基板搬運機構）等之搬運路15使卡匣81在 上下方向（垂直圖面之方向）昇降，且可將和其鄰接配置之 搬運路15所供應之玻璃基板82收容至卡匣81。又，存放機 φ 11及卡匣昇降裝置317之間，配置著以在兩者之間搬運卡 匣之卡匣搬運帶（卡匣搬運機構）318、319。 此時，存放機11內之搬入位置C2上，具有以從存放 機11搬出卡匣81爲目的之出庫位置A2、及將卡匣81搬入 存放機11爲目的而和出庫位置A2分別獨立之入庫位置B2 。又，卡匣昇降裝置317係配置於卡匣移動部316，可在對 應存放機1 1之出庫位置A2的卡匣供應位置D2、及對應入 庫位置B2的卡便排出位置E2之其中任一位置移動，在卡 匣供應位置D2上，可將卡匣81從卡匣搬運帶318拉入，同 時，在卡匣排出位置E2上，可將卡匣81送出至卡匣搬運 帶 3 1 8。 又，如第16圖及第18圖所示，出庫位置A1及入庫位 置B1之位置關係係和出庫位置A2及入庫位置B2之位置 關係相反。 其次，參照第1 6圖及第1 7圖，針對從收容著玻璃基板 之已收容基板之卡匣81排出玻璃基板82的動作進行說明。 -45- (42) 1272229 此時，首先，保管於存放機11之載架11a內的已收容 基板之卡匣81會被堆高式起重機12搬運至存放機11內之搬 出位置C1的出庫位置A1。 其次，到達出庫位置 A1之卡匣81，會被卡匣搬運帶 3 18搬運至定位於卡匣供應位置D1之卡匣昇降裝置317。 如上所示，已收容基板之卡匣8 1定位於卡匣供應位置 D 1後，會從已收容基板之卡匣8 1排出玻璃基板82。此時 ，卡匣昇降裝置31 7會使已收容基板之卡匣81各下降1段， φ 並由基板搬運帶（圖上未標示）等將玻璃基板82逐片從卡匣 81搬出至搬運路15。 又，如上所示，排出玻璃基板82之同時，下一個排出 玻璃基板之其他已收容基板之卡匣8 1已移至卡匣供應位置 D 1之前方位置待機。 其後，結束玻璃基板82之排出且已成爲空無一物之卡 匣81，會在卡匣移動部316中以卡匣昇降裝置31 7使其上昇 至特定高度爲止，同時移至卡匣排出位置E1。如上所示 鲁 ，移至卡匣排出位置E1之空卡匣81，會被從卡匣昇降裝 置317送出至卡匣搬運帶319，而被搬至存放機11之入庫位 置B 1。又，如上所示，到達入庫位置B 1之空卡匣8 1，會 被堆高式起重機12視爲收容用卡匣而保管於存放機11內之 空載架1 la內。 另一方面，卡匣昇降裝置317會回到卡匣供應位置D1 ’其次，將應排出玻璃基板之已收容基板之卡匣8 1從卡匣 搬運帶318拉入。 -46- 1272229 (43) 以後，重複執行上述動作。 其次，參照第18圖及第19圖，針對將玻璃基板82收容 至空卡匣8 1之動作進行說明。 此時，首先會利用堆高式起重機1 2將保管於存放機1 1 之載架11a內的空卡匣81搬至存放機11內之搬入位置C2的 出庫位置A 2。 其次，到達出庫位置 A2之卡匣81，會被卡匣搬運帶 318搬至定位於卡匣供應位置D2之卡匣昇降裝置317。 其後，當空卡匣81配置於卡匣昇降裝置317後，卡匣 移動部316中，會利用卡匣昇降裝置317使卡匣81下降至特 定高度爲止，同時將其移至卡匣排出位置E2。 如上所示，空卡匣81定位於卡匣排出位置E2後，玻 璃基板82會被收容於空卡匣81。此時，卡匣昇降裝置317 會使空卡匣81各下降1段，然後利用基板搬運帶（圖上未標 示）等逐片將玻璃基板82從搬運路15搬入至卡匣81。 又，如上所示，收容玻璃基板82之同時，下一個收容 玻璃基板之其他空卡匣81已移至卡匣供應位置D2之前方 位置待機。 其後，結束玻璃基板82之收容而成爲已收容基板之卡 匣81，會被從卡匣昇降裝置317送出至卡匣搬運帶319，同 時移至存放機1 1之入庫位置B2。又，如上所示，到達入 庫位置B2之已收容基板之卡匣81，會被利用堆高式起重 機12移至存放機11內之空載架11a內進行保管。 另一方面，卡匣昇降裝置317會回到卡匣供應位置D2 -47- 1272229 (44) ’其次，將應收容玻璃基板之空卡匣8 1從卡匣搬運帶3 1 8 拉入。 以後，重複執行上述動作。 如上所示，依據本發明第4實施形態，因爲上述第1至 第3實施形態之生產線系統1、1 ’、1 ”所使用之核心裝置1 〇 中，爲了在和基板搬運帶（基板搬運機構）等搬運路15間實 施從卡匣81排出玻璃基板82、或將玻璃基板82收容於卡匣 81，可相對於搬運路15而使該卡匣81昇降之卡匣昇降裝置 317，會在對應存放機11之出庫位置Al、A2的卡匣供應位 置D1、D2、及對應入庫位置B1、B2的卡匣排出位置E1 、E2間移動，在卡匣供應位置Dl、D2會從卡匣搬運帶 3 18將卡匣81拉入，同時，在卡匣排出位置El、E2則會將 卡匣81送出至卡匣搬運帶319，因此，針對卡匣81實施玻 璃基板82之收容或排出的期間，下一卡匣81已鄰接待機， 故可縮短卡匣8 1之入出庫作業的流程時間。又，因係利用 對應存放機11之出庫位置Al、A2的卡匣供應位置Dl、D2 φ 、及對應入庫位置Bl、Β2的卡匣排出位置El、Ε2間之卡 匣昇降裝置317的移動來執行卡匣81之授受，無需以轉換 卡匣81之移動方向爲目的之特別的方向轉換機構，又，覆 蓋區亦只需要對應於卡匣供應位置D1、D2及卡匣排出位 置El、E2之2個位置份即可，故可簡化構成且減少裝置配 置之限制。又，在實施卡匣81之授受之卡匣供應位置D1 、D2及卡匣排出位置El、E2間移動之卡匣昇降裝置317的 構成上，因係在基板搬運帶（基板搬運機構）等搬運路15之 •48- (45) 1272229 同一架台上相對移動，和以直接連結卡匣搬運帶318、319 及基板搬運帶（基板搬運機構）等搬運路15來避免兩者之干 涉時相比，構成較爲簡單，故亦可提昇維修性。 又，上述第4實施形態中，利用核心裝置1 0保管及搬 運之卡匣8 1，除了可採用以懸掛於左右側面框架間之複數 條框線使基板支持於水平狀態之框線式卡匣以外，亦可採 用以從左右側面框架向水平方向突出之複數支持銷來支持 基板使其成水平狀態之銷式卡匣。 又，上述第4實施形態中，用以在存放機1 1及卡匣昇 降裝置3 1 7之間搬運卡匣8 1之卡匣搬運機構，係使用卡匣 搬運帶318、319，然而，只要可實施卡匣之搬運者，亦可 採用AGV、RGV、CV等任意搬運機構。 又，上述第4實施形態之核心裝置係應用於上述第1至 第3實施形態之生產線系統1、1 ’、1”，然而，並未受限於 此，亦可廣泛應用於處理收容著複數片基板之卡匣的堆高 式起重機方式自動倉庫等。 第5實施形態 其次，參照第20圖，針對本發明第5實施形態進行說 明。 上述第1至第4實施形態之生產線系統1、1 ’、1 ”上， 會針對定位於進出位置（搬出位置C1或搬入位置C2)之卡 匣81，由基板進出機構（基板搬出機構16a及基板搬入機構 16b)實施逐片將玻璃基板82收容於卡匣81、或從卡匣81逐 1272229 (46) 片排出玻璃基板82。 然而，具有此種構成之基板進出機構（基板搬出機構 16a及基板搬入機構16b)，供應卡匣81之卡匣供應位置、 實施將玻璃基板82收容於卡匣8 1或從卡匣8 1排出玻璃基板 82之基板進出位置、以及回收卡匣81之卡匣回收位置並非 分別獨立，係在1個位置上實施卡匣8 1之供應、玻璃基板 82之收容或排出、以及卡匣81之回收。因此，有玻璃基板 82之收容或排出作業之流程時間較長的問題。 本發明第5實施形態之主要目的即在解決上述問題， 而將上述第1至第4實施形態之生產線系統1、1 ’、1 ”之基 板進出機構（尤其是基板搬入機構16b)的構成進行變更， 提供可收容薄板狀材料之玻璃基板的基板收容裝置4 1 6。 如第20圖所示，本發明第5實施形態之基板收容裝置 416具有卡匣移動機構419、卡匣昇降裝置417、以及玻璃 基板移動裝置4 1 8。 其中，卡匣移動機構419可使卡匣81在卡匣供應位置 F 1、基板收容位置G 1、及卡匣回收位置Η 1之其中任一位 置移動。 又，卡匣供應位置F 1係供應卡匣8 1之位置。因此， 對該位置供應之卡匣81通常爲未收容玻璃基板82之空卡匣 。基板收容位置G1係將玻璃基板82收容至卡匣81之位置 。因此，配置於該位置之卡匣8 1係正在收容玻璃基板8 2之 卡匣。卡匣回收位置Η1係回收收容玻璃基板82後轉送過 來之卡匣81的位置。因此，從該位置回收之卡匣.81通常爲 -50- (47) 1272229 已完成玻璃基板82收容之已收容基板之卡匣。又，卡匣供 應位置F 1、基板收容位置G 1、及卡匣回收位置Η 1之配置 上，係互相鄰接且排成一列。 如第20圖所示，卡匣移動機構419會將供應給卡匣供 應位置F 1之空卡匣8 1從卡匣供應位置F 1移至基板收容位 置G1。利用此方式，移動至基板收容位置G1之空卡匣81 會成爲正在收容玻璃基板82之卡匣。 其後，當卡匣81結束收容玻璃基板82時，收容中之卡 φ 匣81會變成已收容玻璃基板82之已收容基板之卡匣。此時 ，卡匣移動機構41 9會將該已收容基板之卡匣81從基板收 容位置G 1移至卡匣回收位置Η 1。 位於卡匣回收位置Η1之已收容基板之卡匣81會在卡 匣回收位置Η 1被回收。 如上所示，卡匣移動機構4 1 9會將位於卡匣供應位置 F1之空卡匣81從卡匣供應位置F1移至基板收容位置G1， 且將位於基板收容位置G1之收容中的卡匣81移至卡匣回 鲁 收位置Η1。 又，如上所述之卡匣移動機構41 9的2種移動，可以爲 獨立之個別移動。但，其前提條件係移動目的地之位置（ 基板收容位置G 1或卡匣回收位置Η 1 )已經空出來。 又，如上所述之卡匣移動機構41 9的2種移動，可以爲 相關之連動移動。例如，同時移動2個卡匣8 1，使基板收 容位置G1形成空區域，同時，將位於卡匣供應位置F1之 卡匣8 1移至該空區域。但，此時之前提條件亦爲移動目的 -51 - 1272229 (48) 地之卡匣回收位置HI已空出來。 又，卡匣昇降裝置41 7會使在基板收容位置GI上利用 卡匣移動機構419實施定位之卡匣81以對應於玻璃基板82 之收容間隔的間隙在上下方向（垂直圖面之方向）昇降，而 使卡匣81之玻璃基板82的收容位置（複數收容場所之其中 之一）、及基板搬運帶等搬運路（圖上未標示）上之玻璃基 板82的供應位置一致。 又，玻璃基板移動裝置41 8會在基板收容位置G1上利 φ 用卡匣昇降裝置417使卡匣81之玻璃基板82的收容位置、 及基板搬運帶等搬運路（圖上未標示）上之玻璃基板82的供 應位置一致之狀態下，將基板搬運帶等搬運路（圖上未標 示）供應之玻璃基板82朝卡匣81移動而將其收容至該卡匣 8 1 〇 又，利用卡匣昇降裝置41 7及玻璃基板移動裝置41 8構 成基板搬入機構。 其次，參照第20圖，針對具有此種構成之基板收容裝 _ 置416的動作進行說明。又，第20圖中，箭頭 「+」係卡 匣之移動方向，箭頭 「=>」係玻璃基板之供應方向。 如第20圖所示，玻璃基板82之收容作業中，將玻璃基 板8 2收容於卡匣8 1之期間，會實施位於卡匣回收位置Η 1 之卡匣8 1的回收。 又，結束將玻璃基板82收容於基板收容位置G1之卡 匣8 1的時點，會利用卡匣移動機構4 1 9將位於基板收容位 置G1之卡匣81移至空出來之卡匣回收位置Η1。 -52- (49) 1272229 另一方面，利用此種移動，可將位於卡匣供應位置 F1之卡匣81移至空出來之基板收容位置G1。 此時，基板搬入機構之卡匣昇降裝置417及玻璃基板 移動裝置418在位於卡匣供應位置F1之卡匣81被移至基板 收容位置G1之時點，會立即開始實施將玻璃基板82收容 於卡匣8 1。 又，其間，會對空出來之卡匣供應位置F 1供應空卡 匣8 1。 如上所示，依據本發明第5實施形態，利用卡匣移動 機構4 1 9將卡匣8 1移至卡匣供應位置 F 1、基板收容位置 G 1、及卡匣回收位置Η 1之其中任一位置，而在基板收容 位置G1上，則會利用基板搬入機構之卡匣昇降裝置41 7及 玻璃基板移動裝置418，將玻璃基板82收容於利用卡匣移 動機構41 9實施定位之卡匣81。因此，將玻璃基板82收容 於卡匣81之作業，只有卡匣81移動期間才會停止，又，因 爲結束將玻璃基板82收容至卡匣81之時點，會將卡匣81從 基板收容位置G1移至卡匣回收位置Η1，同時，將卡匣81 從卡匣供應位置F 1移至基板收容位置G 1，故可縮短玻璃 基板82之收容作業的流程時間。 第6實施形態 其次，參照第2 1圖針對本發明第6實施形態進行說明 〇 本發明第6實施形態之目的，係在解決和上述第5實施 -53- (50) 1272229 形態相同之問題，而將上述第1至第4實施形態之生產線系 統1、1’、1”之基板進出機構（尤其是基板搬出機構16a)的 構成進行變更，提供可排出薄板狀材料之玻璃基板的基板 排出裝置5 1 6。 如第2 1圖所示，本發明第6實施形態之基板排出裝置 516具有卡匣移動機構519、卡匣昇降裝置517、以及玻璃 基板移動裝置5 1 8。 其中，卡匣移動機構519可使卡匣81在卡匣供應位置 φ F2、基板收容位置G2、及卡匣回收位置H2之其中任一位 置移動。 又，卡匣供應位置F2係供應卡匣81之位置。因此， 對該位置供應之卡匣81通常爲已收容著玻璃基板82之已收 容基板之卡匣。基板排出位置G2係從卡匣8 1排出玻璃基 板82之位置。因此，配置於該位置之卡匣81係正排出玻璃 基板82之卡匣。卡匣回收位置H2係回收排出玻璃基板82 後轉送過來之卡匣8 1的位置。因此，從該位置回收之卡匣 · 81通常爲未收容玻璃基板82之空卡匣。又，卡匣供應位置 F2、基板排出位置G2、及卡匣回收位置H2之配置上，係 互相鄰接且排成一列。 如第2 1圖所示，卡匣移動機構5 1 9會將供應給卡匣供 應位置F2之已收容基板之卡匣81從卡匣供應位置F2移至 基板排出位置G2。利用此方式，被移至基板排出位置G2 之已收容基板之卡匣81會成爲正在排出玻璃基板82之卡匣 -54- (51) 1272229 其後，結束從卡匣81排出玻璃基板82時，正在排出中 之卡匣81會成爲未收容玻璃基板82之空卡匣。此時，卡匣 移動機構519會將該空卡匣81從基板排出位置G2移至卡匣 回收位置H2。 位於卡匣回收位置H2之空卡匣8 1會從卡匣回收位置 H2被回收。 如上所示，卡匣移動機構5 1 9會將位於卡匣供應位置 F2之已收容基板之卡匣81從卡匣供應位置F2移至基板排 φ 出位置G2，而將位於基板排出位置G2之排出中的卡匣81 移至卡匣回收位置H2。 又，如上所述之卡匣移動機構519的2種移動，可以爲 獨立之個別移動。但，其前提條件係移動目的地之位置（ 基板收容位置G2或卡匣回收位置H2)已經空出來。 又，如上所述之卡匣移動機構519的2種移動，可以爲 相關之連動移動。例如，同時移動2個卡匣8 1，使基板排 出位置G2形成空區域，同時，將位於卡匣供應位置F2之 φ 卡匣8 1移至該空區域。但，此時之前提條件亦爲移動目的 地之卡匣回收位置H2已空出來。 又，卡匣昇降裝置517會使在基板排出位置G2上利用 卡匣移動機構519實施定位之卡匣81以對應於玻璃基板82 之收容間隔的間隙在上下方向（垂直圖面之方向）昇降，而 使卡匣81之玻璃基板82的收容位置（複數收容場所之其中 之一）、及基板搬運帶等搬運路（圖上未標示）上之玻璃基 板82的排出位置一致。 -55- (52) 1272229 又，玻璃基板移動裝置518會在基板排出位置G2上利 用卡匣昇降裝置517使卡匣81之玻璃基板82的收容位置、 及基板搬運帶等搬運路（圖上未標示）上之玻璃基板82的排 出位置一致之狀態下，將收容於卡匣81內之玻璃基板82從 卡匣81移至基板搬運帶等搬運路（圖上未標示），而從該卡 匣8 1排出。 又，利用卡匣昇降裝置517及玻璃基板移動裝置518構 成基板搬出機構。 其次，參照第2 1圖，針對具有此種構成之基板排出裝 置5 1 6的動作進行說明。又，第2 1圖中，箭頭「》>」係卡 匣之移動方向，箭頭 「=>」係玻璃基板之排出方向。 如第21圖所示，玻璃基板82之排出作業中，從卡匣81 排出玻璃基板82之期間，會實施位於卡匣回收位置H2之 卡匣8 1的回收。 又，結束從基板排出位置G2之卡匣8 1排出玻璃基板 82之時點，會利用卡匣移動機構519將位於位於基板排出 位置G2之卡匣81移至空出來之卡匣回收位置H2。 另一方面，利用此種移動，可將位於卡匣供應位置 F2之卡匣81移至空出來之基板排出位置G2。 此時，基板搬出機構之卡匣昇降裝置517及玻璃基板 移動裝置518在位於卡匣供應位置F2之卡匣81被移至基板 排出位置G2之時點，會立即開始實施從卡匣8 1排出玻璃 基板82。 又，其間，會對空出來之卡匣供應位置F2供應空卡 1272229 (53) 匣8 1。 如上所示，依據本發明第6實施形態，利用卡匣移動 機構5 1 9將卡匣8 1移至卡匣供應位置F2、基板排出位置 G2、及卡匣回收位置H2之其中任一位置，而在基板排出 位置G2上，則會利用基板搬出機構之卡匣昇降裝置517及 玻璃基板移動裝置5 1 8，從利用卡匣移動機構5 1 9實施定位 之卡匣81排出玻璃基板82。因此，從卡匣81排出玻璃基板 82之作業，只有卡匣81移動期間才會停止，又，因爲結束 從卡匣8 1排出玻璃基板82之時點·，會將卡匣8 1從基板排出 位置G2移至卡匣回收位置G2，同時，將卡匣81從卡匣供 應位置F2移至基板排出位置G2，故可縮短玻璃基板82之 排出作業的流程時間。 又，上述第5及第6實施形態中，利用基板收容裝置 4 1 6及基板排出裝置5 1 6處理之卡匣8 1除了可採用以懸掛於 左右側面框架間之複數條框線使基板支持於水平狀態之框 線式卡匣以外，亦可採用以從左右側面框架向水平方向突 出之複數支持銷來支持基板使其成水平狀態之銷式卡匣。 又，上述第5及第6實施形態之基板收容裝置41 6及基 板排出裝置5 1 6係應用於上述第1至第4實施形態者，然而 ，並未受限於此，亦可廣泛應用於將基板收容至卡匣之基 板收容裝置、及從卡匣排出基板之基板排出裝置。 又，上述第5及第6實施形態之基板收容裝置4 1 6及基 板排出裝置5 1 6係以收容於卡匣8 1之薄板狀材料爲玻璃基 板時爲例來進行說明，然而，並不限於此，只要爲可收容 -57- (54) 1272229 於卡匣8 1內之薄板狀材料皆可。 【圖式簡單說明】 第1圖係本發明第1實施形態之生產線系統的整體構成 槪略圖。 第2圖係第1圖所示之生產線系統之重要部位的構成槪 略平面圖。 c、第3圖係第2圖所示之生產線系統之III-III線的槪略 剖面圖。 ' ^' . / 第4 .屬第2圖所示之生產線系統之Jl- IV線的槪略剖 y 面圖。 第5圖係第2圖所示之生產線系統之基板搬運帶的動作 說明圖。 第6圖係本發明第2實施形態之生產線系統的整體構成 槪略圖。 第7圖係第1圖及第6圖所示之生產線系統的配置設計 實例圖。 第8圖係第1圖及第6圖所示之生產線系統的配置設計 之其他實例圖。 第9圖及第10圖係第8圖所示之核心裝置（具有複數個 存放機之核心裝置）之存放機間的連結形態之其他實例圖 〇 第Π圖係本發明第3實施形態之生產線系統之重要部 位的構成槪略平面圖 -58· (55) 1272229 第1 2圖係第1 1圖所示之生產線系統之堆高式起重機' 及收容著玻璃基板之卡匣的詳細側面圖。 第13圖係第12圖所示之堆高式起重機的正面剖面圖。 第1 4圖係第1 1圖所示之生產線系統之基板進出機構之 實例的斜視圖。 第1 5圖係第1 1圖所示之生產線系統之基板進出機構之 其他實例的斜視圖。 第1 6圖係本發明第4實施形態之自動倉庫、及搬出玻 璃基板時之槪略平面圖。 第1 7圖係第1 6圖所示之自動倉庫的槪略側面圖。 第1 8圖係本發明第4實施形態之自動倉庫、及搬入玻 璃基板時之槪略平面圖。 第19圖係第18圖所示之自動倉庫的槪略側面圖。 第2 0圖係本發明第5實施形態之基板收容裝置、及搬 入玻璃基板時之槪略平面圖。 第2 1圖係本發明第6實施形態之基板排出裝置、及搬 出玻璃基板時之槪略平面圖。 [圖號說明] A 1 出庫位置 A2 出庫位置 B 1 入庫位置 B 2 入庫位置 C 1 搬出位置 -59- (56)1272229 C2 搬 入 位 置 D 1 卡 匣 供 應 位 置 D2 卡 匣 供 應 位 置 El 卡 匣 排 出 位 置 E2 卡 匣 排 出 位 置 FI 卡 匣 供 應 位 置 F2 卡 匣 供 應 位 置 G 1 基 板 收 容 位 置 G2 基 板 收 容 位 置 HI 卡 匣 回 收 位 置 H2 卡 匣 回 收 位 置 1 生 產 線 系 統 1， 生 產 線 系 統 1，， 生 產 線 系 統 10 核 心 裝 置 11 存 放 機 1 1 7 存 放 機 11，， 存 放 機 11a 載 架 12 堆 局 式 起 重 機 12’ 堆 高 式 起 重 機 13 軌 道 1 5 搬 運 路 16a 基 板 搬 出 機 構 -60- (57)1272229 16b 基 板 搬 入 機 構 17a 卡 匣 昇 降 裝 置 17b 卡 匣 昇 降 裝 置 18a 基 板 搬 運 帶 18b 基 板 搬 運 帶 19 授 受 裝 置 20 處 理 線 2 1 鉻 成 膜 裝 置 30 處 理 線 3 1 塗 布 裝 置 32 預 烘 烤 裝 置 33 曝 光 裝 置 34 顯 影 裝 置 35 洗 淨 裝 置 36 蝕 刻 裝 置 37 剝 離 裝 置 3 8 顯 影 後 烘 烤 裝 置 39 共 同 缺 陷 檢 査 -HR 機 40B 處 理 線 40G 處 理 線 40R 處 理 線 41 塗 布 裝 置 42 預 烘 烤 裝 置 43 曝 光 裝 置1272229 (1) Technical Field of the Invention The present invention relates to a production line system for manufacturing a plate-shaped product such as a color filter, in particular, and a card which can accommodate a plurality of substrates (sheet materials). A production line system for a plate-shaped product and various logistics devices for the system (automatic warehouse for stacking cranes, and substrate storage devices and substrate discharge devices). [Prior Art] The manufacturing process of the color filter includes (1) formation of a chromium film, (2) formation of a black matrix, and (3) formation of a color layer of each color (red, green, and blue) having a specific pattern, ( 4) Most processing steps such as formation of a protective layer, (5) formation of a columnar body, and (6) formation of an IT0 layer. At this time, in the production line system for the purpose of realizing such a manufacturing step, conventionally, a linear in-line type production line system in which a plurality of processing lines for realizing the above-described respective processing steps are arranged in a straight line is generally employed. Moreover, there are various methods for manufacturing the color filter, and the most common manufacturing method is to use photolithography. In this case, the processing steps of (2) to (5) above are processed by a process including a lithography process ( Plate making step) to achieve. Further, in the plate making step, a complicated process such as coating, drying, prebaking, exposure, development, rinsing, drying, and post-development baking of a photoresist (colored photosensitive material) is required. However, in the color filter manufacturing step of the lithography method, the plate making step including the processing steps including the lithography process is often required to correspond to the type of the article such as the color filter, and the change is made to realize the plural plate-making step-5- 1272229 (2) The configuration of the complex plate making line for the purpose of the purpose. That is to say, in recent years, the color filters have different specifications (the presence or absence of a black matrix, the type of a black matrix (chromium or resin), the presence or absence of a protective layer, the presence or absence of a columnar body, and the presence or absence of an IT layer). When a production line system manufactures a product, it is necessary to replace the order of the plural plate making steps contained in the manufacturing step, or to delete a specific plate making step. Further, in the recent color filter, there is also a product in which the columnar body has a complicated shape on the barrier layer of the MVA, and when the product is manufactured in the same line system as the normal product, it is necessary to add a new system in the manufacturing step. Step φ. However, in the above-described conventional in-line type production line system, since a plurality of processing lines for realizing various steps are connected in series, there is a problem that the configuration of the plurality of plate making lines for realizing the plate making step cannot be easily changed. Further, in this case, it is possible to arrange an appropriate bypass path between the respective plate-making lines. However, in this case, it is necessary to increase the installation area of the additional bypass path, and there is a problem that the occupied area of the entire production line system is too large. Further, in the manufacturing process of the color filter by the photolithography method, the processing step (plate making step) including the lithography H process generally causes product defects (common defects, etc. due to adhesion of foreign matter to the light mask or the like). The occurrence of the device or the failure of the device often necessitates the operation of the plate making line for the plate making step. In the 'plate making step', when manufacturing products of different specifications (using photosensitive materials, line widths, film thicknesses, etc.), the process conditions must be determined in advance (sometimes because of the subtle difference in the number of photosensitive materials, etc., so daily confirmation is required. In the process conditions of the day, the plate making line for the plate making step must be separately processed after the manufacture of the previous product to determine the process conditions of the next product, -6-1272229 (3). Moreover, the plate making step usually requires more processing time, and it is easy to become a speed determining step for the entire production line system. However, in the above-described in-line type production line system, since the plurality of processing lines for realizing the respective processing steps are connected in series, the plate making line for the specific plate making step is stopped, or the processing for determining the process conditions of the plate making line is performed. When the plate making line becomes the speed determining step, there is a problem that the entire processing line is affected and the overall operating rate of the line system is lowered. Further, the manufacturing steps of the color filter by the photolithography method are as described above, and the system φ is composed of a plurality of complicated processes, and there is a problem that one of the processes (especially the processes in the plate making step) is liable to cause product defects. In particular, in recent years, the size of the color filter has become extremely large, and the yield of the product is liable to be lowered. Conventionally, in order to improve the yield of the product, in order to improve the yield of the product, a process for improving the use conditions of the devices used in each process is generally used. However, the degree of improvement is limited, and the manufacturing size is large. When the color filter is manufactured, there is a problem that the yield of the product cannot be sufficiently increased. For this reason, the inspection machine is combined, for example, in the production line system, and the defect product is detected by the inspection machine, thereby improving the yield of the product (refer to Japanese Laid-Open Patent Publication No. Hei 7-281 171). However, the above-mentioned Japanese Patent Application Laid-Open No. Hei 7-281171 can increase the yield of the product to a certain extent. However, the inspection content is mainly based on individual defects, so there is a problem that the degree of improvement has a certain limit. . Moreover, in combination with the production line system of the inspection machine, it is necessary to temporarily stop the production line in order to detect or eliminate the defect by using the inspection machine to detect the defect. The system as a whole, and there is a problem that the production line cannot maintain a high operation rate. SUMMARY OF THE INVENTION In order to solve the above problems, an object of the present invention is to provide a production line capable of realizing a high operation rate by providing a configuration of a plurality of plate-making lines which can be elastically changed to realize a processing step (plate making step) including a lithography process. system. Further, the object of the present invention is to provide a production line system which can maintain a high operating rate of the production line and greatly increase the yield of the product. Further, an object of the present invention is to provide a production line system which can effectively prevent the substrate from being damaged during the manufacturing process and which can elastically change the size of the substrate. Further, the object of the present invention is to provide an automatic warehouse to which a production line system can be applied, that is, to provide an automatic warehouse which can shorten the flow time of the loading and unloading operation of the cassette and which is simple in configuration and has a small configuration restriction of the apparatus. Further, an object of the present invention is to provide a substrate housing device and a substrate discharge device which can be used in a production line system, and a substrate storage device and a substrate discharge device which can shorten the storage time of the substrate or the discharge operation. The first solution of the present invention provides a production line system which is a production line system for manufacturing a color filter by using a cassette for accommodating a plurality of substrates, and is characterized in that: a plurality of cassettes for storing a plurality of substrates are accommodated. Or an empty cassette having a storage unit for storing a plurality of cassettes, and a stack having cassettes stored in the storage unit between a plurality of entry and exit locations and any of the cassette storage locations in the storage unit The core device of the high-rise crane; the above-mentioned respective entry and exit positions connected to the core device, for the purpose of manufacturing the color filter for the substrate in the cassette of the received substrate stored in the core device, -8 - 12722229 (5) And processing the plurality of processing lines corresponding to the core device; and disposing the substrate from the cassettes of the received substrate at the respective ingress and ejecting positions to the processing lines corresponding to the respective in and out positions Or the substrate in and out of the processed substrate processed by the processing lines in a blank cassette located in each of the in and out positions Moreover, the plurality of processing lines include a plurality of master lines that implement processing steps including a lithography process. Further, in the first solving means, the plurality of processing lines should include a preparatory plate line for realizing the same processing steps as the respective mastering lines. Further, in the first solving means, at least one of the plurality of main plate-making lines included in the plurality of processing lines is combined with a common defect for detecting the same position of the plurality of substrates to be processed. Common defect inspection machine. Further, in the first solution, the plurality of processing lines include a substrate regenerating line in which a substrate in which a common defect is detected by the common defect inspection machine included in the main plate-making line is regenerated. Further, in the first solving means, the plurality of processing lines should include a substrate inspection line for inspecting a processed substrate which is processed by the processing lines, and the substrate inspection line should have a difference in detecting occurrence of the plurality of substrates. Individual defect inspection machines for the purpose of individual defects in position. In this case, it is more preferable that the substrate inspection line has a substrate correction device for correcting individual defects of the respective substrates detected by the individual defect inspection machine. Further, in the first solution, the plurality of processing lines should include -9-1272229 (6) for using the common defect inspection machine included in the main plate line or the aforementioned substrate inspection line. The individual defect inspection machine detects that the substrate of the common defect or the individual defect obtains the regenerated substrate regeneration line. Further, in the first solution, the core device includes a plurality of the storage machines and the stacker crane, and at least one stacker crane is disposed in each of the storage machines, and each of the storage machines is disposed in the storage device. The stacker cranes of each storage machine are connected to each other by a receiving device that accepts the card. In this case, the above-mentioned transfer device should be a stacking crane having a function as an alternative to the stacker of the above-described stacker. Moreover, the plurality of storage machines described above should be in a geese-like configuration. The second solution of the present invention provides a production line system which is a production line system for manufacturing a plate-shaped product by using a cassette for accommodating a plurality of substrates, and is characterized in that: a plurality of substrates for storing a plurality of substrates are accommodated a cassette or an empty cassette having a storage unit for storing a plurality of cassettes, and a cassette having a plurality of in-and-out positions in the storage unit and any cassette storage locations stored in the storage unit a core of a stacker crane, a core device, and a plurality of processing lines for performing various processes on a substrate stored in a cassette of a substrate to be stored in the core device; Providing the respective in-and-out positions corresponding to the core device, and discharging the substrate piece by piece from the cassettes of the received substrate at the respective in-and-out positions to the processing lines corresponding to the respective in-and-out positions, or processing through the processing lines The processed substrate is housed one by one in a substrate loading and unloading mechanism located in the empty cassette of each of the ingress and ejecting positions; and is stored by the core device And the aforementioned cassette having the left and right side frames, -10· 1272229 (7) and suspended between the left and right side frames and supporting the plurality of substrates in a horizontal state and extending along a horizontal plane at a plurality of sections of different heights a plurality of lines. Further, in the second means for solving the above, the plurality of processing lines should be various processes for manufacturing the color filter. The third solution of the present invention provides an automatic warehouse, which is an automatic warehouse for processing a cassette for accommodating a plurality of substrates, and is characterized in that: a storage machine for storing a plurality of cassettes; and a storage machine for storing a plurality of cassettes; a stacking crane that transports the cassettes stored in the storage unit between the entry and exit position φ and any of the cassette storage positions; and arranges the inlet and outlet positions corresponding to the storage unit to discharge from the cassettes between the substrate transfer mechanisms a substrate or a cassette positioning mechanism for positioning the cassette by the substrate, and a cassette transporting mechanism for transporting the cassette between the storage unit and the cassette positioning mechanism; and the storage unit The loading and unloading position has a storage position for carrying out the cassette from the storage machine, and a storage position for moving the cassette into the storage machine and the storage position independently, and the positioning mechanism of the cassette is moved to correspond to the storage. Any of the card storage positions of the aforementioned delivery location and the card ejection position corresponding to the aforementioned storage location, in the card The supply position is carried out from the cassette transport mechanism into the cassette, and the cassette is sent to the cassette transport mechanism at the cassette discharge position. In the third solution, the cassette should accommodate the plurality of sheets in a horizontal state. In the sheet substrate, the cassette positioning mechanism should lift and lower the cassette lifting device at a gap corresponding to the receiving interval of the substrate. -11 - 1272229 (8) The fourth solution of the present invention provides a substrate housing device which is a substrate housing device for housing a substrate in a cassette, and is characterized in that: a card for moving the cassette to the supply cassette a cassette moving position, a cassette moving position for accommodating the substrate in the substrate storage position of the cassette, and a cassette recovery position of the cassette; and accommodating the substrate in the positioning by the cassette moving mechanism The substrate carrying mechanism of the cassette at the substrate receiving position. According to a fifth aspect of the present invention, there is provided a substrate discharge device which is a substrate discharge device for discharging a substrate from a cassette, and is characterized in that: a card supply position for moving the cassette to the supply cassette, and a slave card a cassette moving position of the substrate discharge position of the discharge substrate and a cassette recovery position of the recovery cassette; and a cassette for ejecting the substrate from the substrate discharge position where positioning is performed by the cassette moving mechanism The substrate carrying out mechanism that is discharged. According to the first solution of the present invention, the stacker type core device for storing a plurality of cassettes for accommodating a plurality of glass substrates is connected to a plurality of processing lines for performing various processes of the color filter via the substrate transfer mechanism. It is easier to change the configuration of the complex plate making line including the processing steps (plate making step) including the formation of the black matrix and the formation of the colored layers of the respective colors, and it is possible to correspond to the manufactured color filter. The product type 'replaces the order of these plural plate making steps, adding or deleting specific plate making steps. In addition, according to the first solution of the present invention, the core device of the stacking crane method is connected with the preparatory plate line of the same processing step -12· 1272229 (9), which is even in the lithography. When the processing steps (plate making step) of the process occur, product defects (common defects, etc.) occur, and the plate making line of the plate making step must be temporarily stopped, the plate making step can be continued on the preparatory plate making line to prevent the overall operation rate of the production line system. The reduction. Moreover, since the preparatory plate making line determines the necessary process conditions in the plate making step, the process conditions of the next product can be determined at the same time when the former product is manufactured, and the preparatory plate making line can be used to continue the manufacture of the next product. Prevent the overall operating rate of the production line system from decreasing. Moreover, the plate making step which is the speed determining step can be realized by the plate making line and the preparatory plate making line at the same time, the speed determining step can be eliminated, and the overall running rate of the line system can be prevented from being lowered. Further, according to the first aspect of the present invention The solution means, by using a processing line (plate making line) for realizing a processing step including a lithography process among the processing lines of the production line, the combination is used to detect a common defect occurring at the same position of the plurality of glass substrates of the processing object. The common defect inspection machine can detect the common defects of the causes of a large number of defective products at an early stage, and improve the yield rate of the products. _ In this case, according to the first solution of the present invention, the stacker type core device for storing a plurality of cassettes for accommodating a plurality of glass substrates is connected to the processing line of the production line via the substrate inlet/outlet mechanism, even in the case of black When any one of the processing steps (plate making step), such as the formation of a matrix or the formation of a colored layer of a color, is caused by foreign matter adhering to a light mask or the like, a common defect occurs, except that it can be stopped as soon as possible. In addition to the processing steps of the common defect and solving the problem, the other processing steps can be continued by using the processed-13-(10) 1272229 glass substrate that has been stored in the storage device of the core device and has been implemented to the previous processing step. Therefore, the high operating rate of the production line can be maintained and the yield of the product can be improved. Further, according to the first means of the present invention, the processing line (substrate inspection line) of the processed glass substrate for inspecting the processing line passing through the processing line is connected to the core device, and the detection can be performed by the individual defect inspection machine. Individual defects at different positions of a plurality of glass substrates can be appropriately excluded from the occurrence of individual defects different from the common defects, thereby further improving the yield of the product. Further, by correcting the individual defects of the respective glass substrates detected by the individual defect inspection machine by the substrate correction Φ device on the processing line (substrate inspection line), the substantial scrap rate of the product can be improved. Further, according to the first solution of the present invention, the core device is connected to the processing line (substrate re-energizing line) for regenerating the glass substrate of the common defect or the individual defect detected by the common defect inspection machine or the individual defect inspection machine, even if individual When the defect inspection machine detects an individual defect that cannot be corrected by the substrate correction device, the substrate regeneration device of the processing line (substrate regeneration line) can also regenerate the glass substrate to improve the substantial scrap rate of the product. Further, even if the common defect inspection machine detects a common defect, the substrate reproducing device using the processing line (substrate reproduction line) regenerates the glass substrate to improve the substantial waste rate of the product. Further, since the glass substrate which will eventually become a defective product is not transferred to the subsequent step, the subsequent step can be prevented from being subjected to an unnecessary load, so that the overall substantial operation rate of the production line system can be improved. Moreover, according to the first solution of the present invention, the core device of the stacking crane system is composed of a plurality of storage machines connected to each other via a receiving and receiving device, and the processing equipment with different installation areas can be the smallest necessary equipment-14- (11) 1272229 and any configuration is configured to implement elastic configuration. In addition, if the stacking and lowering crane having the replacement function of the stacker mounted on each storage machine is used, the stacker can continue to use the stacker with the replacement function even if the stacker fails. The treatment improves the overall stability of the production line system. According to the second solution of the present invention, the card which is stored and transported by the core device of the production line system is a frame type card which is supported by a plurality of frame lines suspended between the left and right side frames to obtain a support in a horizontal state. When the cassette is transported by a stacker of a core device or the like, the vibration can be effectively absorbed by the frame. Even when a color filter or the like is manufactured on a large substrate, the substrate accommodated in the cassette can be prevented from being damaged or damaged. Moreover, since it is possible to accommodate a substrate of any size up to the maximum size that can be accommodated in the cassette, even when a plurality of types of color filters are manufactured by the same production line system, it is not necessary to replace the cassette with the size of the substrate, and it is possible to effectively cope with a small number of types of manufacturing. . Further, compared with the pin type cassette, etc., a larger number of substrates can be accommodated, and the advantage of the line system having the core device can be further improved, that is, the corresponding ability to suspend the processing steps can be further improved. According to the third solution of the present invention, it can be applied to an automatic warehouse of a production line system, in order to allow the substrate transport mechanism to discharge the substrate from the cassette or to accommodate the substrate in the cassette to move the cassette to the position relative to the substrate transport mechanism. The upper locking mechanism moves between the card feeding position corresponding to the storage position of the storage machine and the card discharging position corresponding to the storage position, and the cassette can be taken in from the cassette carrying mechanism at the card feeding position, and at the same time The cassette can be transferred to the cassette transport mechanism at the cassette discharge position, so that the next cassette can be standbyd in the adjacent manner during the discharge or storage of the cassette -15-1272229 (12). The process time of the card entry and exit operations. Moreover, since the cassette supply position corresponding to the storage position of the storage machine and the card discharge position corresponding to the storage position are moved by the movement of the cassette positioning mechanism, the movement direction of the cassette is not required to be changed. For the special direction changing mechanism of the purpose, the 'coverage area' only needs to correspond to the two position parts corresponding to the cassette supply position and the cassette discharge position, and the configuration is very simple and the configuration limitation of the device is also small. Further, the card positioning mechanism that moves between the cassette supply position and the cassette discharge position φ by the implementation of the cassette is configured to perform relative movement on the same stage as the substrate conveyance belt, and to directly connect the card.匣The transport mechanism and the substrate transport are easier to construct than the interference between the two, and the maintenance performance can be improved. According to the fourth solution of the present invention, the substrate storage device of the production line system can be applied to any one of the cassette supply position, the substrate storage position, and the cassette recovery position by the cassette moving mechanism. When moving, when it is located at the substrate storage position, the substrate loading mechanism is used to accommodate the substrate plate in the cassette that has been positioned by the cassette moving mechanism. Therefore, the operation of accommodating the substrate to the cassette is stopped only during the movement of the cassette, and when the substrate is received into the cassette, the cassette is moved from the substrate storage position to the cassette recovery position, and at the same time, the cassette is jammed. The movement time from the cassette supply position to the substrate storage position is shortened, and the flow time of the substrate storage operation can be shortened. According to the fifth solution of the present invention, it can be applied to a substrate discharge device of a production line system by using a cassette moving mechanism to cause the cassette to be in any one of a cassette supply position, a substrate discharge position, and a cassette recovery position - 16- (13) 1272229 When moving up and at the substrate discharge position, the substrate is ejected from the cassette that has been positioned by the cassette moving mechanism by the substrate carry-out mechanism. Therefore, the action of discharging the substrate from the cassette is stopped only during the movement of the cassette, and when the ejection of the substrate from the cassette is completed, the cassette is moved from the substrate discharge position to the cassette recovery position, and the cassette is removed from the cassette. The cassette supply position is moved to the substrate discharge position, and the flow time of the substrate discharge operation can be shortened. [Embodiment] Hereinafter, embodiments of the present invention will be described with reference to the drawings. According to the first embodiment, the production line system 1 according to the first embodiment of the present invention has a stacker type for storing a cassette or an empty cassette in which a plurality of substrates are accommodated in a plurality of glass substrates. The core device 10; and a plurality of in-and-out positions (the carry-out position C1 and the carry-in position C2) respectively connected to the core device 10 are used to manufacture a color filter for the glass substrate stored in the cassette of the substrate to be stored in the core device 10 A plurality of processing lines 20, 30, ..., 70, 90 for various processes for the purpose. Moreover, the arrangement of the core device 10 is linearly extended on the horizontal setting surface, and the processing lines 20, 30, ..., 70, 90 are disposed on the setting surface to be removed from the core device 1. The side portion protrudes in an inverted U shape toward the lateral direction. First, the first line is used for the processing lines 20, 30. . . . . The composition of 70 and 90 will be explained. As shown in Fig. 1, each of the processing lines 20, 30, ..., 70, and 90 has a -17-(14) 1272229 transport path 15 composed of a transport belt that transports a glass substrate in a horizontal state, and is disposed. In the various processing devices 2 1 , 3 1 , ..., 9 6 on the transport path 15, the processing line 20 is a processing line for performing chromium molding on a glass substrate, and the processing device (chromium film forming device 21) is provided. It is provided on the conveyance path 15. The processing line 30 is a processing line for patterning a chromium film formed on a glass substrate and forming a black matrix, and a processing device (a photoresist coating device 31, a prebaking device 32) is disposed on the transport path 15 And an exposure device 33, a developing device 34, a cleaning device 35, an etching device 36, a peeling device 37, and a developing post-bake device 38). Further, if the black matrix is made of a resin, the processing is performed by the photoresist applying device 31, the prebaking device 32, the exposure device 33, the developing device 34, the cleaning device 35, and the post-development baking device 38. Further, the processing line 30 constitutes processing lines 40R, 40G, 40B, 50, and 60, which will be described later, and a mastering line for realizing a processing step including photolithography. The processing lines 40R, 40G, and 40B are respectively used to form processing lines of colored layers of respective colors (red, green, or blue) on a glass substrate, and processing means (resist means) are disposed on the conveying path 15. (Coloring photosensitive material) coating device 4 1 , ^ prebaking device 42, exposure device 43, developing device 44, cleaning device 45, and post-development baking device 46). The processing line 50 is a processing line for forming a protective layer on a glass substrate, and is identical to the processing lines 40R, 40G, and 40G, and a processing device (a photoresist coating device 51 is disposed on the transport path 5, The prebaking device 52, the exposing device 53, the developing device 54, the cleaning device 55, and the post-development baking device 56). The processing line 60 is a processing line for forming a columnar body on a glass substrate, and is the same as the processing lines 40R, 40G, and 40B, and the processing path -18 is provided with a processing -18-(15) 1272229 device. (Photoresist coating device 61, prebaking device 62, exposure device 63, developing device 64, cleaning device 65, and post-development baking device 66). The processing line 70 is for forming a processing line of the IT0 layer on the glass substrate, and a processing device (I τ Ο film forming apparatus 7 1 ) is disposed on the transport path 15 . Moreover, when the STN type color filter is manufactured, the patterning of the germanium layer is required. At this time, it is only necessary to arrange the processing device (the coating device, the prebaking device, the exposure device, and the developing device) which is the same as the processing line 30 on the processing line 70. The device, the cleaning device, the etching device, the peeling device, and the post-development baking device may be used. The processing line 90 is a preparatory plate making line for performing the same processing steps as the processing lines 40R, 40G, 40A, 50, 60, and the processing line 15 is provided with the same processing as the processing lines 40R, 40G, 40A, 50, and 60. The apparatus (coating apparatus 91, prebaking apparatus 92, exposure apparatus 93, developing apparatus 94, washing apparatus 95, and post-development baking apparatus 96). Further, the processing line 90 may be used as a replacement line for the processing lines 40R, 40G, 40A, 50, 60, or may be used as a processing line for manufacturing a column-shaped product on the barrier layer of the MVA. Further, in the latter case, the processing is performed by the processing lines 50, 60, and 90. Moreover, the processing lines connected to the core device are in addition to the processing lines 20, 30, and the above. . . Other than 70 and 90, other processing lines for cutting the glass substrate, performing various inspections, and regenerating the glass substrate may be provided. Next, the configuration of the core device 10 and the substrate feeding mechanism (the substrate unloading mechanism 1 6 a and the substrate loading mechanism 16b) of the production line system 1 shown in Fig. 1 will be described with reference to Figs. 2 to 5 . As shown in Fig. 2, the core device 10 has a storage machine 11 for storing a plurality of cassettes 1272229 (16) 81 and a stack 81 for transporting the cassette 81 stored in the storage unit 11 in the storage unit. Crane 12. At this time, the structure of the storage machine 11 is arranged as shown in Figs. 3 and 4, and the plurality of carriers 11a on which the cassettes 81 are placed are disposed in the upper and lower stages. Further, the stacker crane 12 can be moved in the vertical direction by using a lifting frame (not shown) in addition to being movable in the left-right direction on the rail 13 extending along the storage machine 11, and can be moved in the storage machine 11 by the lifting frame (not shown). The cassette 8 1 is transported between each of the entry and exit positions (the carry-out position C1 and the carry-in position C2) and any of the carriers 11a of the upper and lower stages (the arbitrary card storage position). At this time, one storage machine 1 is disposed on one side of the track 13, however, the present invention is not limited thereto, and two storage machines may be disposed on both sides of the track 13. Further, the carrier 11a of the storage unit is disposed in two stages. However, the present invention is not limited thereto, and the carrier 11a of the storage unit may be arranged in three or more stages. Further, only one stacker 12 is moving on the rails. However, the present invention is not limited thereto, and two or more stacker cranes may be moved on the rails 13. At this time, the substrate entrance/exit mechanism (the substrate unloading mechanism 16a and the substrate loading mechanism 16b) are disposed in each of the entry and exit positions (the carry-out position C1 and the carry-in position C2) in the storage cassette, as in the first. 2 and 3, the glass substrate 8 2 is discharged one by one from the cassette 8 1 of the received substrate positioned at each of the carry-out positions C 1 to the respective carry-out positions C 1 by the respective substrate carry-out mechanisms 16a. As shown in FIGS. 2 and 4, each of the processing lines (transporting paths 15) accommodates the processed glass substrates 82 processed by the respective processing lines (transporting paths 15) one by one by the respective substrate loading mechanisms 16b. It is placed in the empty cassette 81 of each loading position C2. Further, each of the substrate carrying-out mechanisms 16a has a card-up -20-(17) 1272229 drop device 17a for lifting and lowering the cassette 81, and a cassette 81 for accommodating the substrate that has been lifted and lowered by the cassette lifting device 17a. The sheet is carried out to the substrate conveyance belt 18a of the conveyance path 15. Further, each of the substrate unloading mechanisms 16a has a cassette transporting means (not shown) for receiving the cassette 81 between the delivery position A1 or the storage position B1 of the carry-out position C1 and the cassette lifting and lowering device 17a. Further, each of the substrate loading mechanisms 16b has a cassette elevating device 17b for elevating and lowering the cassette 81, and a substrate carrying belt 18b for carrying the glass substrate 82 one by one from the transport path 15 to the cassette 81 which is lifted and lowered by the cassette elevating unit 17b. Further, each of the substrate loading mechanisms 16b has a card transport device (not shown) for receiving the cassette 81 between the delivery position A2 or the storage position B2 at the loading position C2 and the cassette lifting device 17b. Further, as shown in Fig. 5, the substrate conveyance belts 18a and 18b have a support frame 87 and rollers 85 provided on the support frame 87. On the other hand, the cassette 81 has an upper plate 83, a lower plate 84, a plurality of pillars 85 that are attached to the upper plate 83 and the lower plate 84, and a horizontal direction (a direction perpendicular to the plane of the fifth drawing). The plurality of frame lines 86 which are suspended between the pillars 85 are accommodated in a plurality of glass substrates 8 2 in a state as shown in Fig. 5 by a plurality of frame lines 86 arranged at the same height. Further, the cassette 8 1 is lifted and lowered by the cassette lifting device (see FIG. 2), and enters the rollers 88 of the substrate carrying belts 18a and 18b via the opening 84a formed in the lower plate 84, and is brought into contact with the cassette 81. On the lower surface of the glass substrate 82, the glass substrate 82 is carried out from the cassette 81 to the conveyance path 15 or from the conveyance path 15 to the cassette 81. Next, the operation of the line system 1 having such a configuration will be described with reference to Figs. 1 to 5 . Moreover, the core device 10 and each processing line 2 0 -21 - 1272229 (18), 30. . . . . The control unit (not shown) is connected to the 7〇 and 90, and the following actions are automatically performed. First, in the initial state, it is assumed that the storage unit 核心 of the core device 1 stores a plurality of cassettes 81 and a plurality of empty cassettes 81 for accommodating a plurality of unprocessed glass substrates 82. In this state, each processing line 2 0, 3 0 . . . . . 70, 90 will use the stacker 12 of the core device 10 to take out a specific cassette 81 from the cassette 81 of the stored substrate stored in the storage unit 11 (accommodating the processing steps that have been performed to the desired φ) The cassette of the glass substrate is positioned so as to be positioned at the carry-out position C1. Further, each of the processing lines 20, 30, ..., 70, 90 uses the stacker 12 of the core unit 10 to position the empty cassette 81 stored in the storage unit I 1 at the carry-in position C2. At this time, the manufacture of the color filter is realized by performing processing on the glass substrate 62 in a specific order by the processing lines 20, 30, ..., 70, 90, and each processing line 20, 30. . . . . At the carry-out position C1 of 70, 90, the cassette 81 of the glass substrate 81 which has been stored in the storage unit 11 and which has been subjected to the previous process g step is selectively positioned. Also, the processing lines 2 0, 3 0 are used. . . . . When the color filter is manufactured at 70 and 90, for example, (1) chromium film formation (processing line 20), (2) formation of black matrix (processing line 30), and (3) formation of red colored layer (processing line 40R) (4) Formation of a green colored layer (process line 40G), (5) formation of a blue colored layer (process line 40B), (6) formation of a protective layer (process line 50), and (7) columnar body The formation (processing line 60) and (8) the formation of the IT0 layer (processing line 70) are performed in this order, at this time, each processing line 20, 30. . . . . At the carry-out position C 1 of 70 and 90, in the order of the above (1) to (8), 22-2272229 (19), the cassette 81 stored in the storage unit is housed in the cassette 81. The cassette 8 1 of the glass substrate that has been subjected to the previous processing step is selectively positioned. At this time, each processing line 2 0, 3 0 . . . . . 7 0 and 90, the substrate substrate carrying mechanism 16a disposed at the carry-out position C1 is used to discharge the glass substrate 82 from the cassette 81 of the received substrate positioned at the carry-out position C1 to the processing line (transport path 15). The processing lines 20, 30, ..., 70, 90 perform specific processing on the glass substrate 82. Specifically, as shown in FIG. 2, first, the stacker 12 of the core apparatus 10 transports the cassette 181 of the accommodated substrate taken out from the specific carrier 11a of the storage machine 11 to the carry-out position C. 1 outbound location A 1. At this time, the cassette 81 of the received substrate that has reached the delivery position A1 is transported to the cassette lifting and lowering device 17a by the cassette transporting device (not shown). Next, in the state shown in Fig. 5, the cassette lifting device 17a lowers the cassettes 8 1 by one stage, and at the same time, the rollers 88 of the substrate carrying belt 18a contact the glass in the lowermost stage of the cassette 81. On the lower surface of the substrate 82, the glass substrate 82 is carried out one by one from the cassette 81 to the conveyance path 15. When the glass substrate 82 is carried out from the cassette 81, the cassette 81 of the substrate on which the glass substrate 82 is to be discharged next is transported to the delivery position A1 and stands by. Further, the empty cassette 81 from which all the glass substrates 82 are carried out is lifted by the cassette lifting device 17a, and moved to the storage position B1 before being lifted from the cassette by the cassette conveying device (not shown). The device 17a is transported to the storage location B1. Next, the empty cassette 81 moved to the storage position B1 is used as a storage cassette, and is stored in the empty rack 11a in the storage unit 1 1 (20) 1272229 by the stacker crane 12. On the other hand, each processing line 2 0, 3 0 . . . . . 70 0 and 90 will use the substrate loading mechanism 16b disposed at the loading position C2 to store the processed glass substrate 8 2 processed in the processing line (transporting path 15) one by one in the empty card positioned at the loading position C2.匣81. Specifically, as shown in FIG. 2, first, the empty cassette 8 1 taken out from the specific carrier 11a of the storage unit 11 by the stacker 12 of the core apparatus 10 is transported to the delivery position A2 of the loading position C2. . At this time, the empty cassette 81 reaching the delivery position φ position A2 is transported to the cassette lifting device 17b by the cassette conveying device (not shown). Next, in the state shown in Fig. 5, the cassette lifting device 17b raises the cassette 8 1 by one step, and receives the glass substrate 82 carried in from the conveyance path 5, and the roller 88 of the substrate carrying belt 18a The glass substrate 82 is carried into the cassette 81 from the conveyance path 15 one by one by contacting the lower surface of the glass substrate 82. Further, while the glass substrate 82 is housed in the cassette 81, the other empty cassette 8 1 for accommodating the glass substrate 8 2 is transported to the delivery position A2 and stands by. Further, the cassette 81 that has accommodated the entire substrate of the glass substrate 82 is moved to the storage position B2 by the cassette lifting device 17b, and is lifted from the cassette lifting device 17b by a cassette conveying device (not shown). Move to storage location B2. Next, the cassette 81 of the substrate which has been transported to the storage position B2 is stored in the empty carrier 1 1 a in the storage unit 11 by the stacker crane 12. As described above, according to the first embodiment of the present invention, the stacking mechanism - 24 - 2172229 core device 10 of a plurality of cassettes 81 storing a plurality of glass substrates 82 is stored via the substrate inlet and outlet mechanism ( The substrate carrying-out mechanism 16a and the substrate loading mechanism 16b) are connected to a plurality of processing lines 20, 30, ..., 70, and 90 for manufacturing various processes of the color filter, and the formation of the black matrix and the formation of the colored layers of the respective colors are realized. It is easier to change the arrangement of the processing lines 40R, 40G, 40B, 50, 60 of the processing steps (plate making steps) for the purpose of the lithography process, and it is possible to replace the type of the manufactured color filter. The order of these plural plate making steps, adding or deleting specific plate making steps. Further, according to the first embodiment of the present invention, the core device 10 of the stacker type is connected to a processing line that can realize the same processing steps as the processing lines (main plate lines) 40R, 40G, 40B, 50, and 60 ( The preparatory plate line 90 can continue on the processing line 90 even if a product defect (common defect, etc.) occurs in the processing step (plate making step) including the lithography process and the plate making line of the plate making step must be temporarily stopped. The plate making step prevents the overall operating rate of the line system from decreasing. Moreover, since the processing conditions necessary for the plate making step are determined by the processing line 90, the process conditions of the next product can be determined at the same time when the former product is manufactured, and the processing line 90 can be used to continue the manufacture of the next product. Prevent the overall operating rate of the production line system from decreasing. Further, the plate making step which is the speed determining step can be realized by simultaneously performing the plate making line and the processing line 90, and the speed determining step can be eliminated, thereby preventing the overall operation rate of the line system from being lowered. Further, according to the first embodiment, only one processing line (preparatory plate line) 90 is connected to the core device 1, and the processing line 90 can be used to realize the respective plate lines 40R, 40G, 40B' 50, 60. The same processing procedure, (22) 1272229 However, the present invention is not limited thereto, and any number of preparatory plate lines may be provided. For example, each of the plate making lines 40R, 40G, 40B, 50, and 60 is connected to the preparatory plate line, and each preparation is utilized. The plate-making line can also be processed in the same manner as the respective plate-making lines 40R, 40G, 40B, 50, and 60. Further, in the above-described first embodiment, the core device 10 is constituted by one storage machine 1 1 . However, the present invention is not limited thereto, and the core device 10 may be constituted by a plurality of storage machines. Further, in the first embodiment, the glass substrate 82 is carried out from the cassette 81 of the φ-capacity substrate to the transport path 15 and the substrate transport mechanism for transporting the glass substrate 82 from the transport path 15 to the cassette 81 one by one. The substrate conveyance belts 18a and 18b shown in Fig. 5 are used. However, the present invention is not limited thereto, and the glass substrate 82 may be placed on the cantilever by a robot having a cantilever or the like, and inserted from the front surface of the cassette 8 1 . The glass substrate 8 2 is cantilevered to the frame line 86 to accommodate the glass substrate 82 one by one. On the other hand, the cantilever is inserted from the front surface of the cassette 8 1 and the glass substrate 82 is moved from the frame line 86 to the cantilever. The glass substrate 82 is discharged one by one. Second Embodiment Next, a second embodiment of the present invention will be described with reference to Fig. 6 . Further, in the second embodiment of the present invention, in addition to (1) a plate-making line for realizing a processing step including a lithography process, a combination of detecting common defects occurring at the same position of a plurality of glass substrates to be processed is combined. The common defect inspection machine and (2) are provided with a substrate inspection line for detecting (if necessary, performing correction) a processed substrate that performs processing by each processing line, and (3) is configured to be heavy -26-1272229 (23) The first embodiment is substantially the same as the above-described first embodiment except that the common defect inspection machine included in the plate-making line or the substrate defect line for detecting the substrate of the common defect or the individual defect is detected by the individual defect inspection machine included in the substrate inspection line. In the second embodiment of the present invention, the same portions as those in the first embodiment will be denoted by the same reference numerals and will not be described in detail. As shown in Fig. 6, a production line system 1' according to a second embodiment of the present invention has a stacker type core device 10 for storing cassettes or empty cassettes of a plurality of substrates on which a plurality of glass substrates are accommodated. And a plurality of in-and-out positions (the carry-out position C1 and the carry-in position C2) that are connected to the core device 10, respectively, for performing various processing on the glass substrate in the cassette of the received substrate stored in the core device 10 Strip processing lines 20, 30, ..., 70, 90, 100, 110. Further, the processing lines 20' 30, ..., 70, 90 perform a production line for various processes for manufacturing a color filter, and the processing line 1 is used to inspect the processing lines 20, 30. . . . . 70, 90 for processing the treated glass substrate for the purpose of the substrate inspection line, the processing line 1 is regenerated to detect various defects (the common defects occurring at the same position of the glass substrate, or occurring at different positions of the substrate) The glass substrate of the above individual defects is a substrate re-growth line for the purpose. Further, the arrangement of the core device 1 is linearly extended on the horizontal setting surface, and each processing line 20, 30. . . . . The arrangement of 70, 90, 100, and 110 is formed on the installation surface so as to protrude in an inverted U shape from the side of the core unit 10 toward the lateral direction. First, the configuration of the processing lines 20, 30, ..., 70, 90, 100, 110 will be described using FIG. As shown in Fig. 6, each of the processing lines 20, 30', ..., 70, 90, 100, and 110 has a conveyance path 15 composed of a conveyance belt that conveys a glass substrate -27-(24) 1272229 in a horizontal state. And various processing devices 21, 31 disposed on the transport path 15. . . . . 101, 102, 111. At this time, the processing lines 20, 30 are processed. . . . . The basic configuration of 70 and 90 is the same as that of the first embodiment. However, the processing lines 30, 40R, 40G, 4 0 B, 50, 60, and 70 are combined on the transport path 15 to detect occurrence. A common defect inspection machine 39, 47, 57, 67, 77 for the purpose of processing common defects at the same position of a plurality of glass substrates of the object. Among them, the total defect inspection machine 3 9 combined with the processing line 30 for the formation of the black matrix performs the full inspection relating to the specific inspection items (end surface size, transmittance, visual inspection, etc.). Further, the visual inspection is performed by an image processing apparatus or the like in order to compare the difference in adjacent pixel images. Further, the common defect inspection machine 47 combined on the processing lines 40R, 40G, and 40B for the formation of colored layers of respective colors (red, blue, or green) performs sampling related to a specific inspection item (appearance inspection, etc.). Check (for example, 1 〇 piece: ratio of 1 piece). Further, the visual inspection is performed by an image processing apparatus or the like to compare image differences corresponding to the adjacent matrix portions. Further, the common defect inspection machine 57 combined with the processing line 50 for the purpose of forming the protective layer performs a full inspection or a sampling inspection relating to a specific inspection item (uneven inspection, common defect inspection, etc.). Further, the unevenness inspection is performed by performing an AD conversion of the reflected light and the transmitted light by an image processing apparatus or the like and comparing the difference between the adjacent portion images of a large area (long-term period). Further, the common defect inspection system uses an image processing device or the like to perform AD conversion of the reflected light and the transmitted light and compares the difference between the adjacent portions of the small area (short term period) -28-1272229 (25) of one pixel. To implement. Further, the common defect inspection machine 67, which is combined with the processing line 60 for the purpose of forming the columnar body, performs a full inspection or a sample inspection of a specific inspection item (dimension inspection, separation of the columnar body, etc.). Further, the detachment inspection of the columnar body is performed by an image processing apparatus or the like to compare the difference between the images of the adjacent columnar bodies. Further, the common defect inspection machine 77 combined with the processing line 70 for forming the ITO layer performs a specific inspection item (the formation state of the pinhole, the deviation from the specific position, the spectral characteristics, the sheet resistance, the film thickness, etc.) Full inspection or sample inspection. Moreover, the inspection results obtained by the common defect inspection machines 3 9 , 4 7 , 5 7 , 6 7 , 7 7 are managed in the form of corresponding glass substrates on the control device (not shown), and The inspection results determine the subsequent treatment of each glass substrate (continuation of the treatment or regeneration of the glass substrate, etc.). At this time, the processing line of the common defect is stopped according to the inspection result, and the cause of the common defect is determined or excluded. Specifically, for example, the processing line 70 for forming the ITO layer will be described as an example. When pattern formation for the purpose of manufacturing an STN type color filter is performed, the light mask is washed and replaced. In addition, when pattern formation for the purpose of manufacturing a TFT type color filter is performed (the display portion is formed in a pattern in which ITO is not formed in the peripheral portion other than the electrode extraction portion of the entire film), the carrier used for film formation in ΙΤ0 is cleaned and On the other hand, the processing line 1 is the substrate inspection line -29-1272229 (26) for the inspection of the processed glass substrate processed by the processing lines 20, 30, ..., 70, 90. 1 5 is provided with a processing device (an individual defect inspection machine 1 for detecting individual defects occurring at different positions of a plurality of glass substrates), and a glass for detecting the individual defect inspection machine 1 0 1 The substrate correction device for the purpose of the individual defects of the substrate is 10). At this time, the individual defect inspection machine 1 0 1 of the processing line 1 0 1 performs an individual inspection for a specific inspection item (uneven inspection, visual inspection, defect height detection, coordinate inspection). The details of each inspection item are as follows. (1) Uneven inspection: A monochrome (same color) image is captured by an image processing device or the like, and a shading defect that cannot be detected by a common defect inspection of one pixel is detected. Further, by changing the inspection method and the area and direction (vertical and horizontal) of the comparison area, it is possible to detect defects from small defects to uneven defects. (2) Visual inspection: The transmitted light image is detected by an image processing device to compare the difference between adjacent pixel images of the same color, and to detect white spots and foreign matter, black matrix defects, back glass scratches, back glass contamination, and the like. Further, the reflected light image is detected by an image processing device or the like to compare the difference between adjacent pixel images of the same color, and the protrusion and the film surface peeling are detected. (3) Defect height detection: The height detected by the above-mentioned (2) in the visual inspection detected by the stylus type detecting device (the projection will be black due to the disordered reflection when the light image is reflected). (4) Coordinate check: According to the test result of the visual inspection of (2) above, the coordinates of the necessary defects and the coordinates of the part are determined by microscopic examination. In this way, the subsequent processing can be determined (no corrections, necessary corrections, no corrections, etc.). • 30- 1272229 (27) Processing line 11 玻璃 The glass substrate with common defects or individual defects detected by the regenerative common defect inspection machine 3 9 , 4 7 , 5 7 , 6 7 , 7 7 or individual defect inspection machine 1 〇1 For the purpose of the substrate regenerating line, a processing device (a substrate reproducing device 111 for regenerating a glass substrate having a common defect or an individual defect) is disposed on the conveying path 15. Moreover, the processing lines connected to the core device 1 are in addition to the processing lines 20, 30, and . . . In addition to 70, 90, 100, and 110, other processing lines for cutting the glass substrate are provided. At this time, the operation of the production line system 1' having such a configuration is the same as that in the first embodiment, and is connected to the core device 1 and the respective processing lines 2, 30, and . . . Under the control of 70, 90, 100, 110 control devices (not shown), various processes such as manufacturing, inspection, and regeneration of the color filter are automatically performed. Specifically, the manufacturing process of the color filter uses the processing line of the production line 20 30. . . 70 is implemented by performing processing on the glass substrate 82 in a specific order, and each processing line 20, 30. . . . . At the carry-out position C1 of 70, the cassette 81 of the glass substrate that has been stored in the storage unit 11 and accommodated the glass substrate that has been subjected to the previous processing step is selectively positioned. Also, the processing lines 2 0, 3 0 are used. . . . . When manufacturing a color filter, for example, (1) chromium film formation (process line 20), (2) formation of a black matrix (process line 30), (3) formation of a red colored layer (process line 40R), (4) Formation of green colored layer (processing line 40G), (5) formation of blue colored layer (processing line 40A), (6) formation of protective layer (processing line 50), (7) formation of columnar body (processing) The formation of lines 60) and (8) 1 Τ 0 layers (processing lines 70) is performed in the order. 1272229 (28) Again, the processing line of the production line 20, 30. . . . . The processing lines (plate making lines) 40R, 40G, 40B, 50, 60 for realizing the processing steps including the lithography process are combined to detect the same position of the plurality of glass substrates 82 occurring in the processing target. The common defect inspection machines 39, 47, 57, 67 for the purpose of the defect are inspected in accordance with the specific inspection items described above. Secondly, according to the inspection result, the processing line of the common defect is stopped, and the cause of the common defect is eliminated. At this time, the processing line other than the processing line to be stopped is continuously manufactured by the processed glass substrate 82 stored in the storage unit 1 1 of the core apparatus 1 and having been subjected to the processing from φ to the previous processing step. Further, after the processing of the processing lines 20, 30, ..., 70 of the production line is completed, or after the processing, the processing lines 20, 30 have passed. . . . . The processed glass substrate 82 processed in 70 is sent to the processing line (substrate inspection line) 100. Next, the individual defect inspection machine 101 is used to detect individual defects occurring at different positions of the plurality of glass substrates 82 according to the specific inspection items, and if necessary, the substrate correction device 102 is used to detect the individual defect inspection machine 1 0 1 Individual defects of each of the glass substrates 8 to _. Also, the processing line of the production line 20, 30. . . . . After the processing of 70 is completed, or on the way, the glass substrate 82 detected by the common defect inspection machine 39, 47, 57, 67, 77 or the individual defect inspection machine 1 〇1 to be co-defective or individual defect is sent to the substrate for regeneration. Line (processing line 110). Then, the various layers formed on the glass substrate 82 are removed by immersion in an acid or an alkali solution or the like by the substrate reproducing apparatus 111 to regenerate the glass substrate 82. As described above, according to the second embodiment of the present invention, the processing line (plate making line) 30 for realizing the processing steps including the lithography process among the processing lines 20, 12,722, 29 (29) of the processing line 20, 30, ..., 70 On the 40R, 40G, 40B, 50, 60, and 70, a common defect inspection machine 3 9 , 4 7 , 5 7 for detecting common defects occurring at the same position of the plurality of glass substrates 82 of the processing target is combined. 6, 7 7, 7 can detect the common defects of the cause of a large number of defective products, and improve the yield of products. At this time, according to the second embodiment of the present invention, the stacking mechanism core device 10 that stores the plurality of cassettes 81 that accommodate the plurality of glass substrates 82 passes through the substrate feeding mechanism (the base plate loading and unloading mechanism 16a and the substrate). The loading mechanism 16b) is connected to the processing line 20, 30 of the production line. . . . . 70, even if any one of the processing steps (plate making steps) including the formation of the black matrix and the formation of the colored layers for the purpose of the formation of the colored layers is caused by foreign matter adhering to the light mask or the like In the case of a common defect, the processing steps of the common defect can be quickly stopped and the problem can be solved, and the other processing steps can be performed by the processing in the storage device 11 of the core device 1 that has been executed until the previous processing step. The glass substrate 82 has been processed to continue manufacturing. Therefore, the high operating rate of the production line can be maintained and the yield of the product can be improved. Further, according to the second embodiment of the present invention, the core unit 1 is connected to check the processing lines 20 and 30 passing through the production line. . . . . The treated glass substrate 82 processed for 70 is a target processing line (substrate inspection line) 1 〇〇, and the individual defects inspection machine 1 0 1 can be used to generate individual defects at different positions of the plurality of glass substrates 82. Properly eliminate the occurrence of individual defects that are different from the common defects, and further improve the yield of the product. Further, in the processing line (substrate inspection line) 100, the individual defects of the respective glass substrates 8 2 detected by the individual defect inspection machine 110 can be corrected by the substrate correction devices 102-33-(30) 1272229, and can be improved. The actual scrap rate of the product. Further, according to the second embodiment of the present invention, since the core device 10 is connected to the glass which detects the common defect or the individual defect by the regenerative common defect inspection machine 39, 47, 57, 67, 77 or the individual defect inspection machine 101. The substrate 82 is a target processing line (substrate re-energizing line) 110, and even if the individual defect inspection machine 1 0 1 detects an individual defect that the substrate correction device 102 cannot correct, the processing line (substrate regeneration line) 1 1 can be utilized. The substrate regenerative device 1 1 1 regenerates the glass-based φ plate 82 to improve the substantial scrap rate of the article. Further, even if the common defect inspection machines 39, 47, 57, 67, 77 detect a common defect, the substrate regeneration device 111 of the processing line (substrate regeneration line) 110 can be used to regenerate the glass substrate 82, thereby improving the essence of the product. Scrap rate. At this time, since the glass substrate 82 which will eventually become a defective product is not transferred to the subsequent step, the subsequent step can be prevented from being subjected to an unnecessary load, so that the overall substantial operation rate of the production line system can be improved. Further, in the first and second embodiments described above, the layout can be designed as follows. The production line systems 1 and 1 shown in Figs. 1 and 6 are actually introduced to the factory. Hereinafter, the production line system 1 shown in Fig. 6 will be described as an example. Fig. 7 and Fig. 8 are diagrams showing an example of the configuration of the production line system 1 shown in Fig. 6 when it is actually introduced into the factory. Moreover, in Figures 7 and 8, only the processing lines 20, 30 shown in Figure 6 are used. . . . . The chromium film forming line 20, the black matrix forming line 30, the colored layer forming line 4 0 R, 40G, 40B, the protective layer forming line 50, the columnar body forming line 60, and the substrate inspection among 70, 90, 100, and 110 The line 1〇〇 and the substrate regeneration line 110 are disposed on the floor 50 of the factory. -34- (31) 1272229 As shown in Fig. 7, when the production line system is implemented, the configuration of the storage unit must be determined according to the necessary storage capacity, etc., and the floor 50 is considered. In the case of the area and shape, the arrangement of the processing lines 20, 30, ..., 60, 100, 110 is determined. At this time, the installation areas of the processing lines 20, 30, ..., 60, 1〇〇, 110 may differ depending on the type thereof, and even if the processing lines 30, ..., 60 which are also the plate making lines, for example, the black matrix forming lines The required installation area of 30 is larger than the required installation area of the colored layer forming lines 40R, 40G, and 40B. In addition to the processing lines 20, 30, ..., 60 of the production line for the purpose of manufacturing the color filter, the substrate inspection line 1 for performing inspection and correction processing, and the purpose of regenerating the glass substrate are connected. Substrate regeneration line 11 〇 and other processing lines. Therefore, when all the processing lines 20, 30, ..., 60, 100, and 110 having different installation areas are connected to the core device 1 constituted by the one storage unit 11, it is impossible to use only the second drawing. The substrate in-and-out mechanism (the substrate unloading mechanism 16a and the substrate loading mechanism 16b) is directly connected between the portion of the β-wire (the black matrix forming line 30 and the substrate re-energizing line 110) and the core device 1 ,, and The unnecessary transport path (see 121, 122) for transporting the glass substrate by the transport trolleys such as AGV, RGV, and CV occurs, so the layout design shown in Fig. 7 cannot be used. On the other hand, if the core device 1 is constituted by a plurality of storage machines, the processing lines 20, 30, ..., 60, 100, and 110 having different areas are provided with the minimum necessary equipment and arbitrarily arranged to perform elastic setting. Specifically, as shown in FIG. 8, by arranging a plurality of storage machines 1 1 and Π 'in a geese-like shape - 35- (32) 1272229 (front-rear difference), only the substrate access mechanism shown in FIG. 2 is required. (The substrate carrying-out mechanism 16a and the substrate loading mechanism 16b) can directly connect all the processing lines 20, 30, ..., 60, 100, Π0, and the core device 1 including the black matrix forming line 30 and the re-birth line 1 1〇. . At this time, each of the storage machines 1 1 and 1 1 ' of the core device 10 shown in Fig. 8 is provided with one stacker 12, 12'. Further, a stacking crane (receiving device) 19 for the purpose of carrying out the jamming between the stacking cranes 1 2, 1 2 ' is disposed in the connecting portion of the storage machines 11 and 11'. Further, the φ type of transfer device may be any device. However, if a stacking crane 179 having a function as a substitute for the stacking crane 12, 12' is used, the stack crane 1 2 is used. 1 2 'When a failure occurs, the stacker 19 of the replacement machine can also be used to continue the processing of the storage machines 11, 11'. Further, the core device 10 shown in Fig. 8 is configured such that a plurality of storage machines 1 1 and 1 1 ' are arranged in a geese shape (front and rear drop shape), but may be arbitrary depending on the shape of the floor, the number of processing lines, and the like. As shown in FIG. 9 and FIG. 10, the plurality of storage machines 11, 11', and _11" may be arranged in a T shape by the transfer device 130. In the third embodiment, reference is made to the first embodiment. 1 to 5, the third embodiment of the present invention will be described. The third embodiment of the present invention is the same as the first and second embodiments except for the configuration of the core device. In the embodiment, the same portions as those in the first and second embodiments will be denoted by the same reference numerals and will not be described in detail. -36- 1272229 (33) In the production line systems 1, 1 ' of the first and second embodiments described above The cassette 81' that is stored and transported by the core device 1' can also be a so-called pin type card that supports the substrate in a horizontal state by a plurality of support pins protruding in the horizontal direction from the left and right side frames. Set up support pins for multiple segments The support pins are protruded inward from the left and right side frames at the same height, and a plurality of glass substrates are accommodated in a horizontal state by a plurality of support pins of the same segment. However, when the pin type is stuck, Stacking crane with core device Φ. When the cassette is handled, the cassette may be greatly vibrated, and the substrate contained in the cassette may be damaged or damaged. In particular, in recent years, products such as color filters manufactured have become larger and larger, and the above problems have become more apparent as the weight has increased. Further, in the case of the pin type card, the length of the support pin determines the range of the substrate size that can be accommodated, and the substrate having a size exceeding the range has a problem that the card size must be replaced with the substrate size. In particular, the number of products such as color filters manufactured in recent years is extremely large, and the above problems are more apparent. Φ The main object of the third embodiment of the present invention is to solve such a problem. In the same manner as in the first and second embodiments, the cassette 181 stored and transported by the core device 10 is suspended from the left and right side frames. The plurality of lines of the frame support the substrate in a horizontal state. In the production line system 1 according to the third embodiment of the present invention, the configuration of the core device 10 and the substrate feeding mechanism (the substrate unloading mechanism 216a and the substrate loading mechanism 216b) will be described below with reference to the first to fifth embodiments. Description. As shown in Fig. 1, the core device 10 has a storage unit 211 for storing a plurality of cassettes 8 1 - 37 - 1272229 (34), and is stored in the storage unit 211 in the storage unit 211. The stacker crane 212 of the cassette 81. At this time, the storage machine 211 is structurally extended along both sides of the moving path of the stacker crane 212, and each row of the storage machine 21 is disposed with two upper and lower sections for loading the plurality of carriers 21 la of the cassette 81 ( Refer to Figure 13). Further, as shown in Figs. 1 and 2 and Fig. 3, the stacker crane 2 1 2 is moved along the storage machine 2 1 1 while the cassette 8 1 is placed, and the lifting frame 213 is used. Moving in the up and down direction, the card can be transported between any of the carry-in positions φ (the carry-out position C1 and the carry-in position C2) in the storage unit 211 and any of the carriers 211a of the upper and lower stages (any cassette storage position)匣81. At this time, the cassette 8 1 stored and transported by the core device 1 has an upper plate 183, left and right side frames 184 and 185 which are erected on the upper plate 183, and as shown in FIGS. 2 and 13 . A plurality of frame lines 186 suspended between the left and right side frames 184, 185. At this time, the plurality of frame lines 186 extend at a plurality of horizontal planes of different heights, and the glass substrate 82 is supported in a horizontal state by a plurality of frame lines 186 of the same segment. Further, as shown in Figs. 14 and 15 , the left and right side frames 1 84 and 185 have eight pillars 18 and 185a which are respectively fixed to the upper plate 183 by bolts or the like, and the pillars 184a and 185a are opposed to each other. The pillars are connected to each other by a plurality of pillars 187. Further, the frame wire 186 may have any sufficient material for the purpose of supporting the glass substrate 82 in a horizontal state, and may be any material such as synthetic resin or metal. Further, the number of the lines in the horizontal plane of the frame line 186 may be any number as long as the glass substrate 82 can be sufficiently supported and maintained in the horizontal plane. Further, the number of the vertical direction of the frame line 186 may be a range in which the desired glass substrate 8 2 may be accommodated in a state in which -38-(35) 1272229 interferes with each other between the glass substrates 82. Further, in each of the entry and exit positions (the carry-out position C1 and the transfer position C2) in the storage unit 211, a substrate feeding mechanism (the substrate unloading mechanism 21 and the substrate loading mechanism 2 16b) are disposed, as shown in FIG. The substrate substrate 21 6a can discharge the glass substrate 8 2 one by one to the respective lines (transport paths 15) corresponding to the respective carry-out positions C 1 from the card 8 1 of the received substrate positioned at each of the carry-out positions C1, and at the same time, The processed glass substrate 82 processed by each processing line (transporting path 15) can be collected one by one by the substrate carrying mechanism 216b in the empty cassette 81 positioned at each loading position C2. At this time, basically, each of the substrate carrying-out mechanism 216a and each of the substrate-carrying mechanisms 216b has the same configuration, and as shown in FIG. 14, has a plate transporting with a plurality of rollers 190 that are placed under the glass substrate 82 in the cassette 81. The belt 2 208 and the cassette lifting and lowering device 217 (not shown) are provided for elevating the cassette 81 in order to change the positional relationship between the cassette 8 1 and the substrate carrying belt 2 1 8 . Further, as shown in FIG. 1 , at the carry-out position C 1 , the cassette 8 1 is transported from the stocking position A1 to the respective sheet carry-out mechanisms 216a by the cassette transport device (not shown), and the substrate transport mechanism is removed from each other. 216a carries the storage location B1. Further, at the loading position C2, the cassette 81 is transported from the delivery position A2 to the respective substrate loading machines 216b by the cassette transporting device (not shown), and is transported from the respective substrate loading mechanisms 21 6b to the storage position. As shown in Fig. 14, the substrate carrying-out mechanism 216 of each of the substrate carrying-out mechanism 216a and each of the base-loading mechanisms 216b has a fixed surface on the installation surface, and is placed on the installation surface, and is accommodated in the substrate to the transport B2 board. • 39- 1272229 (36) The upper end of the pillar 191 is provided, and the left and right support frames 188, 188 are disposed so as to sandwich the cassette 8 1 from both sides; and are rotatably mounted to the left and right A plurality of fulcrums 189 on the frames 188, 188 are supported. Further, six rollers 190 are arranged at equal intervals on each of the support shafts 189. Further, these support shafts 189 are provided with drive mechanisms (not shown) to rotate the respective support shafts 189 in a desired direction. In the substrate carrying-out mechanism 216a and the substrate loading mechanism 21 6b, the cassette lifting/lowering device 217 can lift the cassette 81, and when the φ cassette 81 is lowered by one step by the cassette lifting/lowering device 217, the roller 190 of the substrate carrying belt 218 The glass substrate 8 2 of each segment accommodated in the cassette 81 can be discharged to the conveyance path 15 by contacting the lower surface of the lowermost glass substrate 82 accommodated in the cassette 81 (refer to FIG. Line arrow). Further, when the cassettes 8 1 are each raised by one step by the cassette lifting device 2 1 7 , the rollers 190 of the substrate conveyance belt 21 contact the lower surface of the glass substrate 82 loaded from the conveyance path 15 , and the glass substrate 82 is placed. It is housed in each section of the cassette 8 (see the dotted arrow in Figure 14). Further, in each of the substrate carrying-out mechanism 216a and the substrate loading/receiving mechanism 216b shown in Fig. 14, the substrate carrying belt 218 is fixed, and the cassette lifting device 2 17 is used to lift the cassette 81. However, as long as it can be changed The relative positional relationship between the cassette 81 and the substrate conveyance belt 2 18 is not limited to the side of the lifting cassette 8 1 , and may be a lifting structure of the lifting board conveying belt 2 1 8 side, or may be simultaneously raised and lowered. The substrate conveyance belt 218 and the cassette 81 are both raised and lowered. Further, each of the substrate carrying-out mechanism 216a and each of the substrate carrying-in mechanisms 21 6b may have a configuration as shown in Fig. 14 in addition to the configuration shown in Fig. 14, that is, from the cassette lifting device 217' ( The structure of the substrate carrying belt 218' is shown below the -40-(37) 1272229, which is not shown in the figure. Further, the substrate carrying belt 2 18 ' shown in Fig. 15 has a support frame 129 disposed on the installation surface, a complex digital frame 194 fixed to the support frame 192 by the horizontal plate 193, and freely rotatable. The method is mounted on a plurality of fulcrums 189 of the pair of front end portions 194a, 194b of the frame 194. Further, six rollers 190 are arranged at equal intervals on each of the support shafts 189. Further, these support shafts 189 are provided with a motor 195 for driving mechanisms, transmission support shafts 196a and 196b, and gears 197, etc., and each of the support shafts 189 is rotatable in a desired direction. φ At this time, the operation of the production line system 1" having such a configuration is the same as that of the first and second embodiments, and is connected to the control device of the core device 10 and the processing lines 20, 30, ..., 70 ( Under the control of the drawing, the various processes related to the manufacture, inspection, and regeneration of the color filter can be automatically performed. As described above, according to the third embodiment of the present invention, the core device 10 of the production line system 1 is stored and transported. The cassette 8 1 is a frame type cassette which supports the glass substrate 82 and is horizontally held by a plurality of frame lines 186 suspended between the left and right side frames 184 and 185, and can be effectively absorbed by the frame line 1 86 φ The vibration generated when the cassette 8 1 is handled by the stacking crane 2 1 2 of the core device 10, even if a large glass substrate (for example, a large size meter size) is used (thickness 〇. When a color filter or the like is manufactured for a glass substrate of 7/m level), the glass substrate 8 2 accommodated in the cassette 81 can be prevented from being damaged or damaged. According to the third embodiment of the present invention, since the cassette 8 1 stored and transported by the core unit 1 of the line system 1" is the above-described frame type cassette, the maximum size that can be accommodated in the cassette 81 can be accommodated. Even if a glass substrate of any size is manufactured in the same line system, when a plurality of types of color filters, such as -41 - 1272229 (38), are produced, it is not necessary to replace the cassette with the size of the glass substrate, and it is possible to effectively cope with a small number of types of manufacturing. According to the third embodiment of the present invention, the cassette 8 1 stored and transported by the core unit 1 of the production line system 1 is the above-described frame type cassette, and can accommodate a large number of the cassette type cassettes and the like. The glass substrate can further exhibit the advantages of the production line system having the core device and improve the corresponding ability in the process of suspending the process. Fourth Embodiment Next, a fourth embodiment of the present invention will be described with reference to Figs. 6 to 9 In the production line systems 1, 1 ', 1" of the first to third embodiments, the core device 10 has a plurality of entry and exit positions in the storage machines 11 and 211 (the carry-out position C1). At the loading position C2), the glass substrate 82 is accommodated in the cassette 81 or the glass by the substrate feeding mechanism (the substrate unloading mechanism 16a and the substrate loading mechanism 16b) for the cassette 81 positioned at the carry-out position C1 or the carry-in position C2. The substrate 82 is discharged from the cassette 81 piece by piece. Further, the carry-out position C1 or the carry-in position C2 in the storage machines 11 and 211 of the core apparatus 1 respectively have the separate storage positions A1 and A2 and the storage positions B1 and B2. At this time, in the core device 1 of the production line systems 1, 1 ', 1" of the first to third embodiments, the storage positions A1, A2 and the storage positions of the cassettes 8 1 of the storage machines 1 1 and 2 1 1 are located. Bl and B2 are different from each other, and the glass substrate 8 2 is housed in the cassette 8 1 and the glass is discharged from the cassette 8 by the substrate feeding mechanism (substrate carrying-out mechanism 16a and substrate carrying mechanism 16b). 1272229 The discharge operation of the substrate 82 is independently implemented, and the necessary process time for replacing the cassette 81 can be shortened, and the glass substrate 8 2 is shortened to stay on each processing line 20, 3〇. . . . . The time on the transport path 15 of 70, 90, 100, 110. However, in the core device 10 having such a configuration, it is necessary to provide the substrate carrying-out mechanism 16a with the purpose of performing the transfer of the cassette 81 between the delivery position A1 or the storage position B1 at the carry-out position ci and the cassette lifting device 17a. A card transfer device such as a direction changing mechanism (not shown). In addition, in the same manner, it is necessary to provide a direction conversion mechanism for the purpose of performing the transfer of the cassette 81 between the delivery position A2 or the storage position B2 of the loading position C2 and the cassette lifting/lowering device 17b in the substrate loading mechanism 1 6 b. The card handling device (not shown). Therefore, there is a problem that the mechanical mechanism of the cassette handling device is complicated and the arrangement of the device is large. In order to solve such a problem, the fourth embodiment of the present invention has been modified to change the configuration of the core device 10 of the production line systems 1, 1 ', 1" of the first to third embodiments. As shown in Fig. 9, the core device 10 is an automatic warehouse for processing the cassette 81 for accommodating a plurality of φ piece glass substrates 82, and has a storage machine 11 for storing a plurality of cassettes 81, and is transported in the storage unit 11. The stacker 12 of the cassette 81 stored in the storage box is placed. At this time, the structure of the storage unit 1 is arranged in a plurality of upper and lower stages 11a for loading the cassette 81. In addition to moving in the left-right direction on the rail 13 extending along the storage machine 11, the stacking crane 12 is movable in the vertical direction by moving the lifting frame (not shown) in the storage machine 11. Each of the entry and exit positions (the carry-out position C1 and the carry-in position C2) and the -43- (40) 1272229 transport the cassette 81 between any of the carriers 11a (the arbitrary cassette storage position) of the upper and lower stages of the carrier 11a. At this time, the track 13 One storage machine 11 is provided on one side, however, it is not limited to this. Two storage machines can be arranged on both sides of the track 13. Further, the storage frame of the storage machine is configured to be up and down. However, it is not limited thereto, and the carrier of the storage machine is also 1 1 a. It can be arranged in three or more stages. Further, only one stacker 12 is moving on the rail 13, however, it is not limited thereto, and two or more stack cranes on the rail 13 may be moved. φ As shown in FIGS. 16 and 17, a cassette lifting device (click positioning mechanism) 3, the aforementioned cassette lifting device (card) is disposed outside the carrying position C1 of the storage device 1 1 of the core device 1 The positioning mechanism 31 can raise and lower the cassette 81 in the vertical direction (the direction of the vertical plane) with respect to the conveyance path 15 such as the substrate conveyance belt (substrate conveyance mechanism), and can be moved from the gap corresponding to the accommodation interval of the glass substrate 82. The cassette 81 discharges the glass substrate 82 to the conveyance path 15 disposed adjacent thereto. Further, between the storage machine 11 and the cassette lifting and lowering device 317, a cassette carrying belt for transporting the cassette between the two is disposed ( The cassette handling mechanism Lu) 318, 319. At this time, the carrying position in the storage box The C1 has a storage position A1 for the purpose of removing the cassette 81 from the storage unit 11, and a storage position B1 independent of the delivery position A1 for the purpose of loading the cassette 81 into the storage unit. The device 31 7 is disposed in the cassette moving unit 316, and is movable at any one of the cassette supply position D1 corresponding to the delivery position A1 of the storage unit 11 and the cassette discharge position E1 corresponding to the storage position B1. At the supply position D1, the cassette 81 can be pulled from the cassette carrying belt 31 8 and, at the same time as -44-1272229 (41), the cassette 81 can be fed to the cassette carrying belt 318 at the cassette discharge position E1. . On the other hand, outside the loading position C2 of the storage unit 11 of the core device 10, as shown in Figs. 18 and 19, a cassette lifting device (click positioning mechanism) 317, the above-described cassette lifting device ( The cassette positioning mechanism 317 can raise and lower the cassette 81 in the vertical direction (the direction of the vertical plane) with respect to the conveyance path 15 such as the substrate conveyance belt (substrate conveyance mechanism), and can supply the conveyance path 15 disposed adjacent thereto. The glass substrate 82 is housed in the cassette 81. Further, between the storage machine φ 11 and the cassette elevating device 317, cassette carrying belts (click transport mechanisms) 318 and 319 for transporting cassettes therebetween are disposed. At this time, the loading position C2 in the storage machine 11 has a storage position A2 for the purpose of carrying out the cassette 81 from the storage machine 11, and a storage unit A2 for the purpose of loading the cassette 81 into the storage unit 11 and the storage position A2. Location B2. Further, the cassette lifting device 317 is disposed in the cassette moving portion 316, and can be located at any one of the cassette supply position D2 corresponding to the delivery position A2 of the storage unit 1 and the card discharge position E2 corresponding to the storage position B2. Moving, at the cassette supply position D2, the cassette 81 can be pulled in from the cassette carrying belt 318, and at the cassette discharge position E2, the cassette 81 can be fed out to the cassette carrying belt 31. Further, as shown in Figs. 16 and 18, the positional relationship between the delivery position A1 and the storage position B1 is opposite to the positional relationship between the delivery position A2 and the storage position B2. Next, the operation of discharging the glass substrate 82 from the cassette 81 that accommodates the substrate on which the glass substrate is housed will be described with reference to FIGS. 16 and 17 . -45- (42) 1272229 At this time, first, the cassette 81 of the stored substrate stored in the carrier 11a of the storage unit 11 is transported by the stacker 12 to the delivery position of the carry-out position C1 in the storage unit 11. A1. Next, the cassette 81 reaching the delivery position A1 is transported by the cassette carrying belt 3 18 to the cassette lifting device 317 positioned at the cassette supply position D1. As described above, after the cassette 8 1 in which the substrate has been placed is positioned at the cassette supply position D 1 , the glass substrate 82 is ejected from the cassette 8 1 in which the substrate has been accommodated. At this time, the cassette lifting device 31 7 lowers the cassette 81 of the substrate to be stored one by one, and φ carries the glass substrate 82 one by one from the cassette 81 to the conveyance path by the substrate conveyance belt (not shown) or the like. 15. Further, as described above, while the glass substrate 82 is being discharged, the cassette 8 1 of the other substrate on which the next glass substrate is discharged has moved to the position before the cassette supply position D 1 to stand by. Thereafter, the cassette 81, which has been discharged from the glass substrate 82 and has become empty, is lifted to a certain height by the cassette lifting unit 317 in the cassette moving portion 316, and is moved to the cassette discharge. Location E1. As shown above, the empty cassette 81 moved to the cassette ejecting position E1 is sent from the cassette elevating unit 317 to the cassette carrying belt 319, and is moved to the storage position B1 of the storage unit 11. Further, as described above, the empty cassette 8 1 that has reached the storage position B 1 is stored in the empty carriage 1 la in the storage unit 11 by the stacker 12 as a storage cassette. On the other hand, the cassette elevating device 317 returns to the cassette supply position D1', and the cassette 8 1 of the accommodated substrate on which the glass substrate is to be ejected is pulled from the cassette carrying belt 318. -46- 1272229 (43) Repeat the above actions later. Next, an operation of accommodating the glass substrate 82 to the empty cassette 8 1 will be described with reference to Figs. 18 and 19 . At this time, the empty cassette 81 stored in the carrier 11a of the storage unit 1 1 is first transported to the storage position A 2 of the loading position C2 in the storage unit 11 by the stacking crane 1 2 . Next, the cassette 81 reaching the delivery position A2 is moved by the cassette carrying belt 318 to the cassette lifting device 317 positioned at the cassette supply position D2. Thereafter, when the empty cassette 81 is disposed in the cassette lifting device 317, the cassette moving portion 316 lowers the cassette 81 to a specific height by the cassette lifting device 317, and moves it to the cassette ejecting position E2. . As described above, after the empty cassette 81 is positioned at the cassette discharge position E2, the glass substrate 82 is accommodated in the empty cassette 81. At this time, the cassette elevating device 317 lowers the empty cassette 81 by one step, and then the glass substrate 82 is carried from the transport path 15 to the cassette 81 piece by piece by a substrate carrying belt (not shown). Further, as described above, while the glass substrate 82 is housed, the other empty cassette 81 of the next accommodating glass substrate is moved to the position before the cassette supply position D2. Thereafter, the cassette 81, which has been placed in the glass substrate 82 and has been accommodated, is sent from the cassette elevating device 317 to the cassette carrying belt 319, and is moved to the storage position B2 of the storage unit 1 1 . Further, as described above, the cassette 81 that has received the substrate at the storage position B2 is moved to the empty rack 11a in the storage unit 11 by the stacker hoisting machine 12 for storage. On the other hand, the cassette elevating device 317 returns to the cassette supply position D2 - 47 - 1272229 (44)'. Next, the empty cassette 8 1 for accommodating the glass substrate is pulled in from the cassette carrying belt 3 1 8 . In the future, the above actions are repeated. As described above, according to the fourth embodiment of the present invention, in the core device 1 used in the production line systems 1, 1 ', 1" of the first to third embodiments, the substrate transporting belt (the substrate transporting mechanism) The transport path 15 is configured such that the glass substrate 82 is discharged from the cassette 81 or the glass substrate 82 is received in the cassette 81, and the cassette lifting and lowering device 317 can be moved up and down with respect to the transport path 15. The cassette supply positions D1, D2 of the storage positions A1 and A2 of the storage machine 11 and the cassette discharge positions E1 and E2 corresponding to the storage positions B1 and B2 move between the cassette supply positions D1 and D2 from the cassette conveyance position. 3 18, the cassette 81 is pulled in, and the cassette 81 is sent to the cassette conveyance belt 319 at the cassette discharge positions E1 and E2. Therefore, during the storage or discharge of the glass substrate 82 by the cassette 81, The next cassette 81 is adjacent to the standby, so that the flow time of the loading and unloading operation of the cassette 8 1 can be shortened. Further, since the cassette supply positions D1, D2 φ and the corresponding storage positions 11 and A2 of the storage unit 11 are used, Corresponding positions El, Ε2 corresponding to the storage locations B1, Β2 The movement of the cassette lifting device 317 to perform the transfer of the cassette 81 does not require a special direction changing mechanism for the purpose of switching the direction of movement of the cassette 81. Moreover, the coverage area only needs to correspond to the cassette supply position D1. The two positions of the D2 and the cassette discharge positions El and E2 are sufficient, so that the configuration can be simplified and the arrangement of the apparatus can be reduced. Further, the cassette supply positions D1 and D2 and the cassette discharge position of the cassette 81 can be implemented. The configuration of the cassette elevating device 317 that moves between El and E2 is relatively moved on the same gantry of the transport path 15 such as the substrate transport belt (substrate transport mechanism), and the card is directly connected. When the conveyance path 15 such as the conveyance belts 318 and 319 and the substrate conveyance belt (substrate conveyance mechanism) is used to avoid interference between the two, the configuration is simple, and the maintainability can be improved. Further, in the fourth embodiment, the fourth embodiment is utilized. The cassette 8 1 for storing and transporting the core device 10 may be a frame-type cassette that supports the substrate in a horizontal state by a plurality of frame lines suspended between the left and right side frames, and may be used to frame from the left and right sides. A plurality of support pins protruding in the horizontal direction support the substrate to be in a horizontal state. The fourth embodiment is for carrying a card between the storage unit 1 1 and the cassette lifting device 3 1 7 The cassette transporting mechanism of the 匣8 1 uses the cassette transport belts 318 and 319. However, any transport mechanism such as AGV, RGV, or CV may be used as long as the carrier of the cassette can be implemented. The core device is applied to the production line systems 1, 1 ', 1" of the above-described first to third embodiments. However, the present invention is not limited thereto, and can be widely applied to a stack for processing cassettes accommodating a plurality of substrates. High-rise cranes, automatic warehouses, etc. Fifth Embodiment Next, a fifth embodiment of the present invention will be described with reference to Fig. 20. In the production line systems 1, 1 ', 1" of the first to fourth embodiments, the substrate insertion/removal mechanism (the substrate loading and unloading mechanism 16a) is applied to the cassette 81 positioned at the entry and exit position (the carry-out position C1 or the carry-in position C2). The substrate loading mechanism 16b) is configured to receive the glass substrate 82 in the cassette 81 one by one or to discharge the glass substrate 82 from the cassette 81 to the 1272229 (46) sheet. However, the substrate feeding mechanism (the substrate carrying-out mechanism 16a and the structure) having such a configuration The substrate loading mechanism 16b) supplies the cassette supply position of the cassette 81, and performs the substrate entry and exit position for accommodating the glass substrate 82 on the cassette 81 or the glass substrate 82 from the cassette 81, and the cassette of the recovery cassette 81. The recovery positions are not independent, and the supply of the cassettes 81, the storage or discharge of the glass substrate 82, and the recovery of the cassettes 81 are performed at one position. Therefore, the flow time of the storage or discharge operation of the glass substrate 82 is relatively small. The main object of the fifth embodiment of the present invention is to solve the above problems, and to provide the substrate entry and exit mechanism of the production line systems 1, 1 ', 1" of the first to fourth embodiments (especially Plate loading mechanism 16b) for changing the configuration, the receiving substrate may be a glass substrate to provide a thin plate-like material of the receiving apparatus 416. As shown in Fig. 20, the substrate housing device 416 according to the fifth embodiment of the present invention has a cassette moving mechanism 419, a cassette lifting and lowering device 417, and a glass substrate moving unit 4 1 8 . Here, the cassette moving mechanism 419 can move the cassette 81 at any of the cassette supply position F1, the substrate housing position G1, and the cassette recovery position Η1. Further, the cassette supply position F 1 is the position at which the cassette 8 1 is supplied. Therefore, the cassette 81 supplied to the position is usually an empty cassette that does not accommodate the glass substrate 82. The substrate housing position G1 accommodates the glass substrate 82 to the cassette 81. Therefore, the cassette 8 1 disposed at this position is a cassette that accommodates the glass substrate 8 2 . The cassette recovery position Η1 is a position at which the cassette 81 is transferred after the storage glass substrate 82 is collected. Therefore, the card recovered from this location. 81 is usually -50-(47) 1272229 The cassette of the accommodated substrate accommodated in the glass substrate 82 has been completed. Further, the arrangement of the cassette supply position F1, the substrate housing position G1, and the cassette recovery position Η 1 are adjacent to each other and arranged in a line. As shown in Fig. 20, the cassette moving mechanism 419 moves the empty cassette 8 1 supplied to the cassette supply position F 1 from the cassette supply position F 1 to the substrate housing position G1. In this manner, the empty cassette 81 that has moved to the substrate accommodating position G1 becomes a cassette that is accommodating the glass substrate 82. Thereafter, when the cassette 81 finishes accommodating the glass substrate 82, the card φ 匣 81 during storage becomes a cassette in which the substrate of the glass substrate 82 has been accommodated. At this time, the cassette moving mechanism 41 9 moves the cassette 81 of the accommodated substrate from the substrate accommodation position G 1 to the cassette recovery position Η 1 . The cassette 81 of the accommodated substrate located at the cassette recovery position Η1 is collected at the cassette recovery position Η 1. As described above, the cassette moving mechanism 419 moves the empty cassette 81 at the cassette supply position F1 from the cassette supply position F1 to the substrate housing position G1, and the cassette in the housing receiving position G1 is accommodated. 81 Move to the card back to the collection position Η1. Further, the two types of movement of the cassette moving mechanism 419 as described above may be independent individual movements. However, the precondition is that the position of the moving destination (the substrate housing position G 1 or the cassette recovery position Η 1 ) is vacant. Further, the two types of movement of the cassette moving mechanism 419 as described above may be associated interlocking movement. For example, moving the two cassettes 8 1 at the same time causes the substrate accommodation position G1 to form an empty area, and at the same time, the cassette 8 1 at the cassette supply position F1 is moved to the empty area. However, at this time, the condition for the purpose of moving is also -51 - 1272229 (48). Further, the cassette elevating device 41 7 raises and lowers the cassette 81 which is positioned by the cassette moving mechanism 419 at the substrate storage position GI in the vertical direction (the direction of the vertical plane) in accordance with the gap corresponding to the accommodation interval of the glass substrate 82. The storage position of the glass substrate 82 of the cassette 81 (one of the plurality of storage places) and the supply position of the glass substrate 82 on the conveyance path (not shown) such as the substrate conveyance belt are matched. Further, the glass substrate moving device 418 is placed on the substrate accommodating position G1 by the cassette elevating device 417, and the storage position of the glass substrate 82 of the cassette 81 and the conveyance path (not shown) of the substrate conveyance belt are used. In a state where the supply positions of the glass substrates 82 are the same, the glass substrate 82 supplied from the conveyance path (not shown) such as the substrate conveyance belt is moved toward the cassette 81 to be accommodated in the cassette 81, and the cassette is used. The lifting device 41 7 and the glass substrate moving device 4 8 constitute a substrate loading mechanism. Next, the operation of the substrate housing device 416 having such a configuration will be described with reference to Fig. 20. Further, in Fig. 20, the arrow "+" is the moving direction of the card, and the arrow "=>" is the supply direction of the glass substrate. As shown in Fig. 20, during the storage operation of the glass substrate 82, the glass substrate 8 2 is stored in the cassette 8 1 and the cassette 8 1 located at the cassette recovery position Η 1 is collected. When the glass substrate 82 is received in the cassette 8 1 of the substrate storage position G1, the cassette 81 located at the substrate housing position G1 is moved to the empty cassette recovery position by the cassette moving mechanism 4 1 9 . -52- (49) 1272229 On the other hand, with this movement, the cassette 81 at the cassette supply position F1 can be moved to the empty substrate storage position G1. At this time, when the cassette 81 of the substrate loading mechanism and the glass substrate moving device 418 are moved to the substrate storage position G1 at the cassette supply position F1, the glass substrate 82 is immediately placed in the card.匣 8 1. Further, during this time, an empty card 匣 8 1 is supplied to the empty card supply position F 1 . As described above, according to the fifth embodiment of the present invention, the cassette 8 1 is moved to the cassette supply position F 1 , the substrate storage position G 1 , and the cassette recovery position Η 1 by the cassette moving mechanism 4 1 9 . At one position, at the substrate accommodating position G1, the glass substrate 82 is housed in the cassette 81 which is positioned by the cassette moving mechanism 41 9 by the cassette lifting and lowering device 41 7 and the glass substrate moving unit 418 of the substrate carrying mechanism. . Therefore, the operation of accommodating the glass substrate 82 in the cassette 81 is stopped only during the movement of the cassette 81, and when the glass substrate 82 is received in the cassette 81, the cassette 81 is removed from the substrate storage position G1. Moving to the cassette recovery position Η1, and moving the cassette 81 from the cassette supply position F1 to the substrate storage position G1, the flow time of the storage operation of the glass substrate 82 can be shortened. Sixth Embodiment Next, a sixth embodiment of the present invention will be described with reference to Fig. 2, and an object of the sixth embodiment of the present invention is to solve the same problem as the fifth embodiment-53-(50) 1272229. In addition, the configuration of the substrate feeding mechanism (particularly, the substrate carrying-out mechanism 16a) of the production line systems 1, 1', and 1" of the first to fourth embodiments is changed, and a substrate discharge device that can discharge a glass substrate of a thin plate-shaped material is provided. 5: 6. As shown in Fig. 2, the substrate discharge device 516 according to the sixth embodiment of the present invention has a cassette moving mechanism 519, a cassette lifting and lowering unit 517, and a glass substrate moving unit 5 1 8 . The mechanism 519 can move the cassette 81 at any of the cassette supply position φ F2, the substrate accommodating position G2, and the cassette recovery position H2. Further, the cassette supply position F2 supplies the position of the cassette 81. The cassette 81 supplied to the position is generally a cassette in which the substrate of the glass substrate 82 is accommodated. The substrate discharge position G2 is a position at which the glass substrate 82 is discharged from the cassette 81. Therefore, it is disposed at the position. The cassette 81 is for discharging the cassette of the glass substrate 82. The cassette recovery position H2 is for collecting the position of the cassette 81 that is transferred after the glass substrate 82 is discharged. Therefore, the cassette 81 recovered from the position is usually not accommodated. The empty tray of the glass substrate 82. Further, the arrangement of the cassette supply position F2, the substrate discharge position G2, and the cassette recovery position H2 are adjacent to each other and arranged in a row. As shown in Fig. 2, the cassette moves. The mechanism 519 moves the cassette 81 of the accommodated substrate supplied to the cassette supply position F2 from the cassette supply position F2 to the substrate discharge position G2. In this manner, the substrate that has been moved to the substrate discharge position G2 is accommodated. The cassette 81 is a cassette-54-(51) 1272229 that is discharging the glass substrate 82. Then, when the glass substrate 82 is discharged from the cassette 81, the cassette 81 being ejected becomes empty without the glass substrate 82. At this time, the cassette moving mechanism 519 moves the empty cassette 81 from the substrate discharge position G2 to the cassette recovery position H2. The empty cassette 8 1 located at the cassette recovery position H2 will recover the position H2 from the cassette. It is recycled. As shown above, the cassette moving mechanism 5 1 9 moves the cassette 81 of the accommodated substrate at the cassette supply position F2 from the cassette supply position F2 to the substrate row φ output position G2, and moves the cassette 81 located in the discharge of the substrate discharge position G2 to the card.匣Receiving position H2. The two types of movement of the cassette moving mechanism 519 as described above may be independent individual movements. However, the precondition is the position of the movement destination (substrate storage position G2 or cassette recovery position H2). Further, the two kinds of movements of the cassette moving mechanism 519 as described above may be related to the interlocking movement. For example, two cassettes 8 are moved at the same time to make the substrate discharge position G2 form an empty area, and at the same time, Move the φ cassette 8 1 at the cassette supply position F2 to the empty area. However, at this time, the condition for the moving destination is also that the card recovery position H2 is vacant. Further, the cassette elevating device 517 raises and lowers the cassette 81 which is positioned by the cassette moving mechanism 519 at the substrate discharge position G2 in the vertical direction (the direction of the vertical plane) in accordance with the gap corresponding to the accommodation interval of the glass substrate 82. The storage position of the glass substrate 82 of the cassette 81 (one of the plurality of storage places) and the discharge position of the glass substrate 82 on the conveyance path (not shown) such as the substrate conveyance belt are matched. -55- (52) 1272229 Further, the glass substrate moving device 518 causes the storage position of the glass substrate 82 of the cassette 81 and the conveyance path of the substrate conveyance belt by the cassette lifting device 517 at the substrate discharge position G2 (not shown) In a state in which the discharge positions of the glass substrates 82 are the same, the glass substrate 82 accommodated in the cassette 81 is moved from the cassette 81 to a conveyance path (not shown) such as a substrate conveyance belt, and the card is removed from the cassette. 8 1 discharge. Further, the cassette ejecting mechanism is constituted by the cassette elevating device 517 and the glass substrate moving unit 518. Next, the operation of the substrate discharge device 516 having such a configuration will be described with reference to Fig. 2 . Further, in Fig. 2, the arrow "">" is the moving direction of the card, and the arrow "=>" is the discharge direction of the glass substrate. As shown in Fig. 21, during the discharge operation of the glass substrate 82, the cassette 8 1 at the cassette recovery position H2 is recovered while the glass substrate 82 is being ejected from the cassette 81. When the cassette 匣 8 1 from the substrate discharge position G2 is discharged, the cassette 81 at the substrate discharge position G2 is moved to the vacant cassette recovery position H2 by the cassette moving mechanism 519. On the other hand, with this movement, the cassette 81 at the cassette supply position F2 can be moved to the empty substrate discharge position G2. At this time, when the cassette lifting device 517 and the glass substrate moving device 518 of the substrate carrying-out mechanism are moved to the substrate discharge position G2 at the cassette loading position F2, the discharge of the glass from the cassette 8 1 is immediately started. Substrate 82. In addition, an empty card 1272229 (53) 匣 8 1 is supplied to the empty card supply position F2. As described above, according to the sixth embodiment of the present invention, the cassette 8 1 is moved to any one of the cassette supply position F2, the substrate discharge position G2, and the cassette recovery position H2 by the cassette moving mechanism 51. At the substrate discharge position G2, the glass substrate 82 is discharged from the cassette 81 which is positioned by the cassette moving mechanism 51 by the cassette elevating device 517 and the glass substrate moving unit 518 of the substrate ejecting mechanism. Therefore, the operation of discharging the glass substrate 82 from the cassette 81 is stopped only during the movement of the cassette 81, and since the end of the discharge of the glass substrate 82 from the cassette 81 is completed, the cassette 8 1 is ejected from the substrate. G2 is moved to the cassette recovery position G2, and at the same time, the cassette 81 is moved from the cassette supply position F2 to the substrate discharge position G2, so that the flow time of the discharge operation of the glass substrate 82 can be shortened. Further, in the fifth and sixth embodiments, the cassette 8 1 processed by the substrate housing device 4 16 and the substrate discharge device 5 16 can be supported by a plurality of frame lines suspended between the left and right side frames. In addition to the frame-type cassette in the horizontal state, a pin type cassette in which the substrate is supported in a horizontal state by a plurality of support pins protruding in the horizontal direction from the left and right side frames may be used. Further, the substrate storage device 416 and the substrate discharge device 5 16 of the fifth and sixth embodiments are applied to the first to fourth embodiments described above, but are not limited thereto and can be widely applied. The substrate housing device that accommodates the substrate to the cassette and the substrate discharge device that discharges the substrate from the cassette. Further, the substrate storage device 4 16 and the substrate discharge device 5 16 of the fifth and sixth embodiments are described as an example in which the thin plate-shaped material accommodated in the cassette 8 1 is a glass substrate. However, In addition, as long as it is a thin plate material which can accommodate -57-(54) 1272229 in the cassette 8 1 . BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing the overall configuration of a production line system according to a first embodiment of the present invention. Fig. 2 is a schematic plan view showing the configuration of important parts of the production line system shown in Fig. 1. c. Figure 3 is a schematic cross-sectional view of line III-III of the production line system shown in Figure 2. ' ^' . / 4th . It is a schematic cross-sectional view of the J1-IV line of the production line system shown in Fig. 2. Fig. 5 is an explanatory view of the operation of the substrate conveyance belt of the production line system shown in Fig. 2. Fig. 6 is a schematic view showing the overall configuration of a production line system according to a second embodiment of the present invention. Fig. 7 is a diagram showing an example of the configuration of the production line system shown in Figs. 1 and 6. Fig. 8 is a view showing another example of the configuration of the production line system shown in Figs. 1 and 6. FIG. 9 and FIG. 10 are other examples of the connection form between the storage devices of the core device (the core device having a plurality of storage machines) shown in FIG. 8 and FIG. 10 is a production line of the third embodiment of the present invention. Outline of the structure of important parts of the system -58· (55) 1272229 The first and second figures are detailed side views of the stacking crane of the production line system shown in Fig. 1 and the cassette containing the glass substrate. Figure 13 is a front cross-sectional view of the stacker crane shown in Figure 12. Fig. 14 is a perspective view showing an example of a substrate feeding mechanism of the production line system shown in Fig. 11. Fig. 15 is a perspective view showing another example of the substrate feeding mechanism of the line system shown in Fig. 11. Fig. 16 is a schematic plan view showing the automatic warehouse and the glass substrate of the fourth embodiment of the present invention. Figure 17 is a schematic side view of the automated warehouse shown in Figure 16. Fig. 18 is a schematic plan view showing the automatic warehouse of the fourth embodiment of the present invention and the loading of the glass substrate. Figure 19 is a schematic side view of the automated warehouse shown in Figure 18. Fig. 20 is a schematic plan view showing a substrate housing device according to a fifth embodiment of the present invention and a glass substrate. Fig. 2 is a schematic plan view showing a substrate discharge device according to a sixth embodiment of the present invention and a glass substrate. [Description of the figure] A 1 Outbound position A2 Outbound position B 1 Inbound position B 2 Inbound position C 1 Carry out position -59- (56) 1272229 C2 Carry in position D 1 Cartridge supply position D2 Cartridge supply position El Cartridge discharge position E2 cassette discharge position FI cassette supply position F2 cassette supply position G 1 substrate storage position G2 substrate storage position HI cassette recovery position H2 cassette recovery position 1 production line system 1, production line system 1, production line system 10 core unit 11 Storage machine 1 1 7 Storage machine 11, storage machine 11a Carrier 12 Stacking crane 12' Stacking crane 13 Track 1 5 Transport path 16a Substrate unloading mechanism - 60- (57) 1272229 16b Substrate loading mechanism 17a Lifting device 17b cassette lifting device 18a substrate carrying belt 18b substrate carrying belt 19 receiving device 20 processing line 2 1 chromium film forming device 30 processing line 3 1 coating device 32 Prebaking device 33 Exposure device 34 Developing device 35 Cleaning device 36 Etching device 37 Stripping device 3 8 Post-development baking device 39 Common defect inspection - HR machine 40B Processing line 40G Processing line 40R Processing line 41 Coating device 42 Pre-bake Baking device 43 exposure device
-61 - 1272229 (58) 44 顯 影 裝 置 45 洗 淨 裝 置 46 影 後 烘 烤 裝 置 47 共 同 缺 陷 檢 査 機 50 處 理 線 5 1 塗 布 裝 置 52 預 烘 烤 裝 置 53 曝 光 裝 置 54 顯 影 裝 置 55 洗 淨 裝 置 56 顯 影 後 烘 烤 裝 置 57 共 同 缺 陷 檢 査 機 60 處 理 線 6 1 塗 布 裝 置 62 預 烘 烤 裝 置 63 曝 光 裝 置 64 顯 影 裝 置 65 洗 淨 裝 置 66 顯 影 後 烘 烤 裝 置 67 共 同 缺 陷 檢 査 機 70 處 理 線 71 ITO 成 膜 裝 置 77 共 同 缺 陷 檢 査 機 8 1 卡 匣-61 - 1272229 (58) 44 Developing device 45 Cleaning device 46 Shadow baking device 47 Common defect inspection machine 50 Processing line 5 1 Coating device 52 Pre-baking device 53 Exposure device 54 Developing device 55 Cleaning device 56 After development Baking device 57 Common defect inspection machine 60 Processing line 6 1 Coating device 62 Pre-baking device 63 Exposure device 64 Developing device 65 Cleaning device 66 Developing post-baking device 67 Common defect inspection machine 70 Processing line 71 ITO film forming device 77 Common defect inspection machine 8 1 card
-62- 1272229 (59) 82 玻 璃 基 板 83 上 板 84 下 板 84a 開 □ 85 支 柱 86 框 線 87 支 持 框 架 88 滾 柱 90 處 理 線 9 1 塗 布 裝 置 92 預 烘 烤 裝 置 93 曝 光 裝 置 94 顯 影 裝 置 95 洗 淨 裝 置 96 顯 影 後 烘 烤 裝 置 100 處 理 線 10 1 個 別 缺 陷 檢 査 機 102 基 板 修 正 裝 置 110 基 板 重 生 線 111 基 板 重 生 裝 置 12 1 搬 運 路 徑 122 搬 運 路 徑 130 授 受 裝 置 183 上 板-62- 1272229 (59) 82 Glass substrate 83 Upper plate 84 Lower plate 84a Opening □ 85 Post 86 Frame line 87 Support frame 88 Roller 90 Processing line 9 1 Coating device 92 Pre-baking device 93 Exposure device 94 Developing device 95 Washing Cleaning device 96 Developing and baking device 100 Processing line 10 1 Individual defect inspection machine 102 Substrate correction device 110 Substrate regeneration line 111 Substrate regeneration device 12 1 Transportation path 122 Transportation path 130 Receiving device 183 Upper plate
63- 1272229 (60) 184 側面框架 1 84a 支柱 185 側面框架 185a 支柱 1 86 框線 1 87 撐柱 1 88 支持框架63- 1272229 (60) 184 Side frame 1 84a Pillar 185 Side frame 185a Pillar 1 86 Frame line 1 87 Bracket 1 88 Support frame
189 支軸 190 滾輪 19 1 支柱 192 支持框 193 橫板 194 框架 194a 前端部 194b 前端部189 Support shaft 190 Roller 19 1 Pillar 192 Support frame 193 Cross plate 194 Frame 194a Front end 194b Front end
195 馬達 196a 傳動支軸 1 9 6 b 傳動支軸 197 齒輪 21 1 存放機 211a 載架 212 堆高式起重機 213 昇降框架 216a 基板搬出機構 -64 - 1272229 (61) 216a’基板搬出機構 216b 基板搬入機構 216b’基板搬入機構 217 卡匣昇降裝置 217’ 卡匣昇降裝置 218 基板搬運帶 2 18’ 基板搬運帶 316 卡匣移動部 317 卡匣昇降裝置 318 卡匣搬運帶 3 19 卡匣搬運帶 416 基板收容裝置 417 卡匣昇降裝置 418 玻璃基板移動裝置 419 卡匣移動機構 516 基板排出裝置 517 卡匣昇降裝置 518 玻璃基板移動裝置 519 卡匣移動機構 -65-195 Motor 196a Transmission support shaft 1 9 6 b Transmission support shaft 197 Gear 21 1 Storage machine 211a Carrier 212 Stacker crane 213 Lifting frame 216a Substrate carrying-out mechanism -64 - 1272229 (61) 216a' Substrate carrying-out mechanism 216b Substrate carrying-in mechanism 216b' substrate loading mechanism 217 cassette lifting device 217' cassette lifting device 218 substrate carrying belt 2 18' substrate carrying belt 316 cassette moving portion 317 cassette lifting device 318 cassette carrying belt 3 19 cassette carrying belt 416 substrate housing Device 417 cassette lifting device 418 glass substrate moving device 419 cassette moving mechanism 516 substrate discharging device 517 cassette lifting device 518 glass substrate moving device 519 cassette moving mechanism - 65-