JP5013045B2 - ポリマーの製造方法 - Google Patents
ポリマーの製造方法 Download PDFInfo
- Publication number
- JP5013045B2 JP5013045B2 JP2005517076A JP2005517076A JP5013045B2 JP 5013045 B2 JP5013045 B2 JP 5013045B2 JP 2005517076 A JP2005517076 A JP 2005517076A JP 2005517076 A JP2005517076 A JP 2005517076A JP 5013045 B2 JP5013045 B2 JP 5013045B2
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- JP
- Japan
- Prior art keywords
- group
- polycarbosilane
- acid
- propoxysilane
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 229920000642 polymer Polymers 0.000 title claims description 67
- 238000004519 manufacturing process Methods 0.000 title claims description 30
- -1 silane compound Chemical class 0.000 claims description 78
- 229920003257 polycarbosilane Polymers 0.000 claims description 70
- 150000001875 compounds Chemical class 0.000 claims description 43
- 125000005843 halogen group Chemical group 0.000 claims description 20
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 19
- 229910000077 silane Inorganic materials 0.000 claims description 19
- 125000003545 alkoxy group Chemical group 0.000 claims description 14
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 13
- 239000003960 organic solvent Substances 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
- 229910052731 fluorine Inorganic materials 0.000 claims description 10
- 125000000217 alkyl group Chemical group 0.000 claims description 9
- 239000003638 chemical reducing agent Substances 0.000 claims description 9
- 239000000178 monomer Substances 0.000 claims description 9
- 125000003118 aryl group Chemical group 0.000 claims description 8
- 230000003301 hydrolyzing effect Effects 0.000 claims description 8
- 229910052783 alkali metal Inorganic materials 0.000 claims description 6
- 150000001340 alkali metals Chemical class 0.000 claims description 6
- 229910052784 alkaline earth metal Inorganic materials 0.000 claims description 6
- 150000001342 alkaline earth metals Chemical class 0.000 claims description 6
- 125000001153 fluoro group Chemical group F* 0.000 claims description 6
- 150000007524 organic acids Chemical class 0.000 claims description 6
- 125000004430 oxygen atom Chemical group O* 0.000 claims description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 3
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 3
- 125000003055 glycidyl group Chemical group C(C1CO1)* 0.000 claims description 3
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 3
- 125000002723 alicyclic group Chemical group 0.000 claims description 2
- 125000001931 aliphatic group Chemical group 0.000 claims description 2
- 239000000243 solution Substances 0.000 description 52
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 39
- 238000006243 chemical reaction Methods 0.000 description 38
- 125000005595 acetylacetonate group Chemical group 0.000 description 37
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 29
- 239000000203 mixture Substances 0.000 description 28
- 229910052719 titanium Inorganic materials 0.000 description 27
- 239000010936 titanium Substances 0.000 description 27
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 26
- 238000000576 coating method Methods 0.000 description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 24
- 239000011248 coating agent Substances 0.000 description 24
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 22
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 20
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 20
- 229910052726 zirconium Inorganic materials 0.000 description 20
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 18
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 18
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 17
- 229920006254 polymer film Polymers 0.000 description 16
- 230000015572 biosynthetic process Effects 0.000 description 14
- 239000002904 solvent Substances 0.000 description 14
- 239000007983 Tris buffer Substances 0.000 description 13
- 235000014113 dietary fatty acids Nutrition 0.000 description 13
- 229930195729 fatty acid Natural products 0.000 description 13
- 239000000194 fatty acid Substances 0.000 description 13
- 125000000962 organic group Chemical group 0.000 description 13
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 12
- 239000003054 catalyst Substances 0.000 description 12
- 238000000034 method Methods 0.000 description 12
- 239000004094 surface-active agent Substances 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- LDMRLRNXHLPZJN-UHFFFAOYSA-N 3-propoxypropan-1-ol Chemical compound CCCOCCCO LDMRLRNXHLPZJN-UHFFFAOYSA-N 0.000 description 11
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 11
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 11
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 10
- 229910052786 argon Inorganic materials 0.000 description 10
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 9
- 239000012295 chemical reaction liquid Substances 0.000 description 9
- 238000011156 evaluation Methods 0.000 description 9
- 238000003756 stirring Methods 0.000 description 9
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 8
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 8
- 239000013522 chelant Substances 0.000 description 8
- 239000007789 gas Substances 0.000 description 8
- 230000007062 hydrolysis Effects 0.000 description 8
- 238000006460 hydrolysis reaction Methods 0.000 description 8
- 239000000377 silicon dioxide Substances 0.000 description 8
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 7
- 230000000052 comparative effect Effects 0.000 description 7
- 239000011229 interlayer Substances 0.000 description 7
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 239000007787 solid Substances 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 6
- WWZKQHOCKIZLMA-UHFFFAOYSA-N Caprylic acid Natural products CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 6
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 6
- 229910052749 magnesium Inorganic materials 0.000 description 6
- 239000011777 magnesium Substances 0.000 description 6
- 229920001296 polysiloxane Polymers 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 6
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 5
- 150000005215 alkyl ethers Chemical class 0.000 description 5
- 229940125904 compound 1 Drugs 0.000 description 5
- 229940125782 compound 2 Drugs 0.000 description 5
- 238000001704 evaporation Methods 0.000 description 5
- 230000008020 evaporation Effects 0.000 description 5
- 239000011259 mixed solution Substances 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 150000003839 salts Chemical class 0.000 description 5
- PUPZLCDOIYMWBV-UHFFFAOYSA-N (+/-)-1,3-Butanediol Chemical compound CC(O)CCO PUPZLCDOIYMWBV-UHFFFAOYSA-N 0.000 description 4
- QQZOPKMRPOGIEB-UHFFFAOYSA-N 2-Oxohexane Chemical compound CCCCC(C)=O QQZOPKMRPOGIEB-UHFFFAOYSA-N 0.000 description 4
- YIWUKEYIRIRTPP-UHFFFAOYSA-N 2-ethylhexan-1-ol Chemical compound CCCCC(CC)CO YIWUKEYIRIRTPP-UHFFFAOYSA-N 0.000 description 4
- QPRQEDXDYOZYLA-UHFFFAOYSA-N 2-methylbutan-1-ol Chemical compound CCC(C)CO QPRQEDXDYOZYLA-UHFFFAOYSA-N 0.000 description 4
- SVTBMSDMJJWYQN-UHFFFAOYSA-N 2-methylpentane-2,4-diol Chemical compound CC(O)CC(C)(C)O SVTBMSDMJJWYQN-UHFFFAOYSA-N 0.000 description 4
- ALYNCZNDIQEVRV-UHFFFAOYSA-N 4-aminobenzoic acid Chemical compound NC1=CC=C(C(O)=O)C=C1 ALYNCZNDIQEVRV-UHFFFAOYSA-N 0.000 description 4
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 4
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- RZKSECIXORKHQS-UHFFFAOYSA-N Heptan-3-ol Chemical compound CCCCC(O)CC RZKSECIXORKHQS-UHFFFAOYSA-N 0.000 description 4
- 229910010082 LiAlH Inorganic materials 0.000 description 4
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 4
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 4
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 4
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 4
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 description 4
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical compound CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 description 4
- DTQVDTLACAAQTR-UHFFFAOYSA-N Trifluoroacetic acid Chemical compound OC(=O)C(F)(F)F DTQVDTLACAAQTR-UHFFFAOYSA-N 0.000 description 4
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 4
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 4
- 239000005456 alcohol based solvent Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- OBETXYAYXDNJHR-UHFFFAOYSA-N alpha-ethylcaproic acid Natural products CCCCC(CC)C(O)=O OBETXYAYXDNJHR-UHFFFAOYSA-N 0.000 description 4
- 150000001412 amines Chemical class 0.000 description 4
- YZXBAPSDXZZRGB-DOFZRALJSA-N arachidonic acid Chemical compound CCCCC\C=C/C\C=C/C\C=C/C\C=C/CCCC(O)=O YZXBAPSDXZZRGB-DOFZRALJSA-N 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 4
- KBPLFHHGFOOTCA-UHFFFAOYSA-N caprylic alcohol Natural products CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 239000007795 chemical reaction product Substances 0.000 description 4
- ITKVLPYNJQOCPW-UHFFFAOYSA-N chloro-(chloromethyl)-dimethylsilane Chemical compound C[Si](C)(Cl)CCl ITKVLPYNJQOCPW-UHFFFAOYSA-N 0.000 description 4
- 238000009833 condensation Methods 0.000 description 4
- 230000005494 condensation Effects 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- SWXVUIWOUIDPGS-UHFFFAOYSA-N diacetone alcohol Chemical compound CC(=O)CC(C)(C)O SWXVUIWOUIDPGS-UHFFFAOYSA-N 0.000 description 4
- JAYBZWYBCUJLNQ-UHFFFAOYSA-N dichloro-(chloromethyl)-methylsilane Chemical compound C[Si](Cl)(Cl)CCl JAYBZWYBCUJLNQ-UHFFFAOYSA-N 0.000 description 4
- JXTHNDFMNIQAHM-UHFFFAOYSA-N dichloroacetic acid Chemical compound OC(=O)C(Cl)Cl JXTHNDFMNIQAHM-UHFFFAOYSA-N 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- 239000001530 fumaric acid Substances 0.000 description 4
- LNTHITQWFMADLM-UHFFFAOYSA-N gallic acid Chemical compound OC(=O)C1=CC(O)=C(O)C(O)=C1 LNTHITQWFMADLM-UHFFFAOYSA-N 0.000 description 4
- ZSIAUFGUXNUGDI-UHFFFAOYSA-N hexan-1-ol Chemical compound CCCCCCO ZSIAUFGUXNUGDI-UHFFFAOYSA-N 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 4
- ZWRUINPWMLAQRD-UHFFFAOYSA-N nonan-1-ol Chemical compound CCCCCCCCCO ZWRUINPWMLAQRD-UHFFFAOYSA-N 0.000 description 4
- FBUKVWPVBMHYJY-UHFFFAOYSA-N nonanoic acid Chemical compound CCCCCCCCC(O)=O FBUKVWPVBMHYJY-UHFFFAOYSA-N 0.000 description 4
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 4
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 4
- 229920002503 polyoxyethylene-polyoxypropylene Polymers 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 4
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 4
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 150000005846 sugar alcohols Polymers 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 4
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 4
- POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004793 Polystyrene Substances 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical compound C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- FYTPGBJPTDQJCG-UHFFFAOYSA-N Trichloro(chloromethyl)silane Chemical compound ClC[Si](Cl)(Cl)Cl FYTPGBJPTDQJCG-UHFFFAOYSA-N 0.000 description 3
- 229940022663 acetate Drugs 0.000 description 3
- 239000003377 acid catalyst Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 239000000010 aprotic solvent Substances 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 229920001400 block copolymer Polymers 0.000 description 3
- ZDOBWJOCPDIBRZ-UHFFFAOYSA-N chloromethyl(triethoxy)silane Chemical compound CCO[Si](CCl)(OCC)OCC ZDOBWJOCPDIBRZ-UHFFFAOYSA-N 0.000 description 3
- 239000003759 ester based solvent Substances 0.000 description 3
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 3
- 239000004210 ether based solvent Substances 0.000 description 3
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 3
- 229940093858 ethyl acetoacetate Drugs 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- 238000005227 gel permeation chromatography Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000005453 ketone based solvent Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- 239000012299 nitrogen atmosphere Substances 0.000 description 3
- 235000006408 oxalic acid Nutrition 0.000 description 3
- PGMYKACGEOXYJE-UHFFFAOYSA-N pentyl acetate Chemical compound CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 3
- 238000005191 phase separation Methods 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 229920000233 poly(alkylene oxides) Polymers 0.000 description 3
- 229920002223 polystyrene Polymers 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- OBETXYAYXDNJHR-SSDOTTSWSA-M (2r)-2-ethylhexanoate Chemical compound CCCC[C@@H](CC)C([O-])=O OBETXYAYXDNJHR-SSDOTTSWSA-M 0.000 description 2
- OYHQOLUKZRVURQ-NTGFUMLPSA-N (9Z,12Z)-9,10,12,13-tetratritiooctadeca-9,12-dienoic acid Chemical compound C(CCCCCCC\C(=C(/C\C(=C(/CCCCC)\[3H])\[3H])\[3H])\[3H])(=O)O OYHQOLUKZRVURQ-NTGFUMLPSA-N 0.000 description 2
- WRIDQFICGBMAFQ-UHFFFAOYSA-N (E)-8-Octadecenoic acid Natural products CCCCCCCCCC=CCCCCCCC(O)=O WRIDQFICGBMAFQ-UHFFFAOYSA-N 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- LZDKZFUFMNSQCJ-UHFFFAOYSA-N 1,2-diethoxyethane Chemical compound CCOCCOCC LZDKZFUFMNSQCJ-UHFFFAOYSA-N 0.000 description 2
- 229940058015 1,3-butylene glycol Drugs 0.000 description 2
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 2
- FEWLNYSYJNLUOO-UHFFFAOYSA-N 1-Piperidinecarboxaldehyde Chemical compound O=CN1CCCCC1 FEWLNYSYJNLUOO-UHFFFAOYSA-N 0.000 description 2
- KDISMIMTGUMORD-UHFFFAOYSA-N 1-acetylpiperidine Chemical compound CC(=O)N1CCCCC1 KDISMIMTGUMORD-UHFFFAOYSA-N 0.000 description 2
- GYSCBCSGKXNZRH-UHFFFAOYSA-N 1-benzothiophene-2-carboxamide Chemical compound C1=CC=C2SC(C(=O)N)=CC2=C1 GYSCBCSGKXNZRH-UHFFFAOYSA-N 0.000 description 2
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 2
- RWNUSVWFHDHRCJ-UHFFFAOYSA-N 1-butoxypropan-2-ol Chemical compound CCCCOCC(C)O RWNUSVWFHDHRCJ-UHFFFAOYSA-N 0.000 description 2
- PPNCOQHHSGMKGI-UHFFFAOYSA-N 1-cyclononyldiazonane Chemical compound C1CCCCCCCC1N1NCCCCCCC1 PPNCOQHHSGMKGI-UHFFFAOYSA-N 0.000 description 2
- NFDXQGNDWIPXQL-UHFFFAOYSA-N 1-cyclooctyldiazocane Chemical compound C1CCCCCCC1N1NCCCCCC1 NFDXQGNDWIPXQL-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- PAMIQIKDUOTOBW-UHFFFAOYSA-N 1-methylpiperidine Chemical compound CN1CCCCC1 PAMIQIKDUOTOBW-UHFFFAOYSA-N 0.000 description 2
- OJVAMHKKJGICOG-UHFFFAOYSA-N 2,5-hexanedione Chemical compound CC(=O)CCC(C)=O OJVAMHKKJGICOG-UHFFFAOYSA-N 0.000 description 2
- ZKCAGDPACLOVBN-UHFFFAOYSA-N 2-(2-ethylbutoxy)ethanol Chemical compound CCC(CC)COCCO ZKCAGDPACLOVBN-UHFFFAOYSA-N 0.000 description 2
- GZMAAYIALGURDQ-UHFFFAOYSA-N 2-(2-hexoxyethoxy)ethanol Chemical compound CCCCCCOCCOCCO GZMAAYIALGURDQ-UHFFFAOYSA-N 0.000 description 2
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
- DJCYDDALXPHSHR-UHFFFAOYSA-N 2-(2-propoxyethoxy)ethanol Chemical compound CCCOCCOCCO DJCYDDALXPHSHR-UHFFFAOYSA-N 0.000 description 2
- XYVAYAJYLWYJJN-UHFFFAOYSA-N 2-(2-propoxypropoxy)propan-1-ol Chemical compound CCCOC(C)COC(C)CO XYVAYAJYLWYJJN-UHFFFAOYSA-N 0.000 description 2
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- LCZVSXRMYJUNFX-UHFFFAOYSA-N 2-[2-(2-hydroxypropoxy)propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)CO LCZVSXRMYJUNFX-UHFFFAOYSA-N 0.000 description 2
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 2
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 2
- TZYRSLHNPKPEFV-UHFFFAOYSA-N 2-ethyl-1-butanol Chemical compound CCC(CC)CO TZYRSLHNPKPEFV-UHFFFAOYSA-N 0.000 description 2
- CETWDUZRCINIHU-UHFFFAOYSA-N 2-heptanol Chemical compound CCCCCC(C)O CETWDUZRCINIHU-UHFFFAOYSA-N 0.000 description 2
- UPGSWASWQBLSKZ-UHFFFAOYSA-N 2-hexoxyethanol Chemical compound CCCCCCOCCO UPGSWASWQBLSKZ-UHFFFAOYSA-N 0.000 description 2
- PFNHSEQQEPMLNI-UHFFFAOYSA-N 2-methyl-1-pentanol Chemical compound CCCC(C)CO PFNHSEQQEPMLNI-UHFFFAOYSA-N 0.000 description 2
- MSXVEPNJUHWQHW-UHFFFAOYSA-N 2-methylbutan-2-ol Chemical compound CCC(C)(C)O MSXVEPNJUHWQHW-UHFFFAOYSA-N 0.000 description 2
- BSKHPKMHTQYZBB-UHFFFAOYSA-N 2-methylpyridine Chemical compound CC1=CC=CC=N1 BSKHPKMHTQYZBB-UHFFFAOYSA-N 0.000 description 2
- QCDWFXQBSFUVSP-UHFFFAOYSA-N 2-phenoxyethanol Chemical compound OCCOC1=CC=CC=C1 QCDWFXQBSFUVSP-UHFFFAOYSA-N 0.000 description 2
- YEYKMVJDLWJFOA-UHFFFAOYSA-N 2-propoxyethanol Chemical compound CCCOCCO YEYKMVJDLWJFOA-UHFFFAOYSA-N 0.000 description 2
- LQJBNNIYVWPHFW-UHFFFAOYSA-N 20:1omega9c fatty acid Natural products CCCCCCCCCCC=CCCCCCCCC(O)=O LQJBNNIYVWPHFW-UHFFFAOYSA-N 0.000 description 2
- BRRVXFOKWJKTGG-UHFFFAOYSA-N 3,3,5-trimethylcyclohexanol Chemical compound CC1CC(O)CC(C)(C)C1 BRRVXFOKWJKTGG-UHFFFAOYSA-N 0.000 description 2
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 2
- WADSJYLPJPTMLN-UHFFFAOYSA-N 3-(cycloundecen-1-yl)-1,2-diazacycloundec-2-ene Chemical compound C1CCCCCCCCC=C1C1=NNCCCCCCCC1 WADSJYLPJPTMLN-UHFFFAOYSA-N 0.000 description 2
- CFEJDOAXJGDWAQ-UHFFFAOYSA-N 3-bromoprop-1-enyl(dichloro)silane Chemical compound BrCC=C[SiH](Cl)Cl CFEJDOAXJGDWAQ-UHFFFAOYSA-N 0.000 description 2
- GIRPPJJOPBKDLV-UHFFFAOYSA-N 3-bromoprop-1-enyl(diethoxy)silane Chemical compound BrCC=C[SiH](OCC)OCC GIRPPJJOPBKDLV-UHFFFAOYSA-N 0.000 description 2
- QDQFFNSCRDFLTD-UHFFFAOYSA-N 3-bromoprop-1-enyl(dimethoxy)silane Chemical compound BrCC=C[SiH](OC)OC QDQFFNSCRDFLTD-UHFFFAOYSA-N 0.000 description 2
- SEIPPNILOGRBQM-UHFFFAOYSA-N 3-chloroprop-1-enyl(diethoxy)silane Chemical compound ClCC=C[SiH](OCC)OCC SEIPPNILOGRBQM-UHFFFAOYSA-N 0.000 description 2
- RNUMKVKPTDSHDA-UHFFFAOYSA-N 3-chloroprop-1-enyl(dimethoxy)silane Chemical compound ClCC=C[SiH](OC)OC RNUMKVKPTDSHDA-UHFFFAOYSA-N 0.000 description 2
- JSGVZVOGOQILFM-UHFFFAOYSA-N 3-methoxy-1-butanol Chemical compound COC(C)CCO JSGVZVOGOQILFM-UHFFFAOYSA-N 0.000 description 2
- AMUZLNGQQFNPTQ-UHFFFAOYSA-J 3-oxohexanoate zirconium(4+) Chemical compound [Zr+4].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O AMUZLNGQQFNPTQ-UHFFFAOYSA-J 0.000 description 2
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- MQWCXKGKQLNYQG-UHFFFAOYSA-N 4-methylcyclohexan-1-ol Chemical compound CC1CCC(O)CC1 MQWCXKGKQLNYQG-UHFFFAOYSA-N 0.000 description 2
- AWQSAIIDOMEEOD-UHFFFAOYSA-N 5,5-Dimethyl-4-(3-oxobutyl)dihydro-2(3H)-furanone Chemical compound CC(=O)CCC1CC(=O)OC1(C)C AWQSAIIDOMEEOD-UHFFFAOYSA-N 0.000 description 2
- QSBYPNXLFMSGKH-UHFFFAOYSA-N 9-Heptadecensaeure Natural products CCCCCCCC=CCCCCCCCC(O)=O QSBYPNXLFMSGKH-UHFFFAOYSA-N 0.000 description 2
- DLFVBJFMPXGRIB-UHFFFAOYSA-N Acetamide Chemical compound CC(N)=O DLFVBJFMPXGRIB-UHFFFAOYSA-N 0.000 description 2
- WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 2
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 2
- ATYUKIGQFAGPOB-UHFFFAOYSA-N CCOC(OCC)[SiH2]C[Si](OCC)(OCC)OCC Chemical compound CCOC(OCC)[SiH2]C[Si](OCC)(OCC)OCC ATYUKIGQFAGPOB-UHFFFAOYSA-N 0.000 description 2
- 239000004215 Carbon black (E152) Substances 0.000 description 2
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 2
- GHVNFZFCNZKVNT-UHFFFAOYSA-N Decanoic acid Natural products CCCCCCCCCC(O)=O GHVNFZFCNZKVNT-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 2
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 2
- HXQPUEQDBSPXTE-UHFFFAOYSA-N Diisobutylcarbinol Chemical compound CC(C)CC(O)CC(C)C HXQPUEQDBSPXTE-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- NIQCNGHVCWTJSM-UHFFFAOYSA-N Dimethyl phthalate Chemical compound COC(=O)C1=CC=CC=C1C(=O)OC NIQCNGHVCWTJSM-UHFFFAOYSA-N 0.000 description 2
- ROSDSFDQCJNGOL-UHFFFAOYSA-N Dimethylamine Chemical compound CNC ROSDSFDQCJNGOL-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- ATHHXGZTWNVVOU-UHFFFAOYSA-N N-methylformamide Chemical compound CNC=O ATHHXGZTWNVVOU-UHFFFAOYSA-N 0.000 description 2
- 239000005642 Oleic acid Substances 0.000 description 2
- ZQPPMHVWECSIRJ-UHFFFAOYSA-N Oleic acid Natural products CCCCCCCCC=CCCCCCCCC(O)=O ZQPPMHVWECSIRJ-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- GLUUGHFHXGJENI-UHFFFAOYSA-N Piperazine Chemical compound C1CNCCN1 GLUUGHFHXGJENI-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 229920001214 Polysorbate 60 Polymers 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 2
- IUGGRDVCAVUMLN-UHFFFAOYSA-K [Zr+3].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O Chemical compound [Zr+3].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O IUGGRDVCAVUMLN-UHFFFAOYSA-K 0.000 description 2
- GOIMHNOVDKMBEW-UHFFFAOYSA-M [Zr+].C(C)CC(CC(=O)[O-])=O Chemical compound [Zr+].C(C)CC(CC(=O)[O-])=O GOIMHNOVDKMBEW-UHFFFAOYSA-M 0.000 description 2
- VPLIEAVLKBXZCM-UHFFFAOYSA-N [diethoxy(methyl)silyl]-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)[Si](C)(OCC)OCC VPLIEAVLKBXZCM-UHFFFAOYSA-N 0.000 description 2
- BOXVSHDJQLZMFJ-UHFFFAOYSA-N [dimethoxy(methyl)silyl]-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)[Si](C)(OC)OC BOXVSHDJQLZMFJ-UHFFFAOYSA-N 0.000 description 2
- JWVHPGDCFVOYMQ-UHFFFAOYSA-N [dimethoxy(methyl)silyl]oxy-dimethoxy-methylsilane Chemical compound CO[Si](C)(OC)O[Si](C)(OC)OC JWVHPGDCFVOYMQ-UHFFFAOYSA-N 0.000 description 2
- ZEJSBRIMTYSOIH-UHFFFAOYSA-N [dimethoxy(phenyl)silyl]-dimethoxy-phenylsilane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)[Si](OC)(OC)C1=CC=CC=C1 ZEJSBRIMTYSOIH-UHFFFAOYSA-N 0.000 description 2
- KCCVBXQGWAXUSD-UHFFFAOYSA-N [dimethoxy(phenyl)silyl]oxy-dimethoxy-phenylsilane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)O[Si](OC)(OC)C1=CC=CC=C1 KCCVBXQGWAXUSD-UHFFFAOYSA-N 0.000 description 2
- 125000000218 acetic acid group Chemical group C(C)(=O)* 0.000 description 2
- 239000001361 adipic acid Substances 0.000 description 2
- 235000011037 adipic acid Nutrition 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000000304 alkynyl group Chemical group 0.000 description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 2
- DTOSIQBPPRVQHS-PDBXOOCHSA-N alpha-linolenic acid Chemical compound CC\C=C/C\C=C/C\C=C/CCCCCCCC(O)=O DTOSIQBPPRVQHS-PDBXOOCHSA-N 0.000 description 2
- 235000020661 alpha-linolenic acid Nutrition 0.000 description 2
- 229960004050 aminobenzoic acid Drugs 0.000 description 2
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 2
- RDOXTESZEPMUJZ-UHFFFAOYSA-N anisole Chemical compound COC1=CC=CC=C1 RDOXTESZEPMUJZ-UHFFFAOYSA-N 0.000 description 2
- 229940114079 arachidonic acid Drugs 0.000 description 2
- 235000021342 arachidonic acid Nutrition 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- SRSXLGNVWSONIS-UHFFFAOYSA-N benzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1 SRSXLGNVWSONIS-UHFFFAOYSA-N 0.000 description 2
- 229940092714 benzenesulfonic acid Drugs 0.000 description 2
- QOAJCSFSLUUCDS-UHFFFAOYSA-N benzhydryloxy(chloromethyl)silane Chemical compound ClC[SiH2]OC(C1=CC=CC=C1)C1=CC=CC=C1 QOAJCSFSLUUCDS-UHFFFAOYSA-N 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- 229960004365 benzoic acid Drugs 0.000 description 2
- QUKGYYKBILRGFE-UHFFFAOYSA-N benzyl acetate Chemical compound CC(=O)OCC1=CC=CC=C1 QUKGYYKBILRGFE-UHFFFAOYSA-N 0.000 description 2
- GONOPSZTUGRENK-UHFFFAOYSA-N benzyl(trichloro)silane Chemical compound Cl[Si](Cl)(Cl)CC1=CC=CC=C1 GONOPSZTUGRENK-UHFFFAOYSA-N 0.000 description 2
- 125000005997 bromomethyl group Chemical group 0.000 description 2
- BKAQKQAIAZTYQA-UHFFFAOYSA-N bromomethyl(trichloro)silane Chemical compound Cl[Si](Cl)(Cl)CBr BKAQKQAIAZTYQA-UHFFFAOYSA-N 0.000 description 2
- QGHLTGVNDIVBDK-UHFFFAOYSA-N bromomethyl(triethoxy)silane Chemical compound CCO[Si](CBr)(OCC)OCC QGHLTGVNDIVBDK-UHFFFAOYSA-N 0.000 description 2
- SPQZWICZZVMTBO-UHFFFAOYSA-N bromomethyl(trimethoxy)silane Chemical compound CO[Si](CBr)(OC)OC SPQZWICZZVMTBO-UHFFFAOYSA-N 0.000 description 2
- CAURZYXCQQWBJO-UHFFFAOYSA-N bromomethyl-chloro-dimethylsilane Chemical compound C[Si](C)(Cl)CBr CAURZYXCQQWBJO-UHFFFAOYSA-N 0.000 description 2
- YGVZXZYIKIYSDZ-UHFFFAOYSA-N bromomethyl-dichloro-methylsilane Chemical compound C[Si](Cl)(Cl)CBr YGVZXZYIKIYSDZ-UHFFFAOYSA-N 0.000 description 2
- AOIHZRBXZRWRBG-UHFFFAOYSA-N bromomethyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(CBr)OCC AOIHZRBXZRWRBG-UHFFFAOYSA-N 0.000 description 2
- JEFOTZCFGJHGGX-UHFFFAOYSA-N bromomethyl-diethoxy-phenylsilane Chemical compound CCO[Si](CBr)(OCC)C1=CC=CC=C1 JEFOTZCFGJHGGX-UHFFFAOYSA-N 0.000 description 2
- OOTYXUYBOQGTCY-UHFFFAOYSA-N bromomethyl-dimethoxy-phenylsilane Chemical compound CO[Si](CBr)(OC)C1=CC=CC=C1 OOTYXUYBOQGTCY-UHFFFAOYSA-N 0.000 description 2
- FKYUNOGVWJPFCX-UHFFFAOYSA-N bromomethyl-methoxy-di(propan-2-yl)silane Chemical compound CO[Si](CBr)(C(C)C)C(C)C FKYUNOGVWJPFCX-UHFFFAOYSA-N 0.000 description 2
- SGEIZEOCYMDFJP-UHFFFAOYSA-N bromomethyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CBr SGEIZEOCYMDFJP-UHFFFAOYSA-N 0.000 description 2
- NIRMFZFVNYILNK-UHFFFAOYSA-N bromomethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CBr)(OC(C)C)OC(C)C NIRMFZFVNYILNK-UHFFFAOYSA-N 0.000 description 2
- HQABUPZFAYXKJW-UHFFFAOYSA-N butan-1-amine Chemical compound CCCCN HQABUPZFAYXKJW-UHFFFAOYSA-N 0.000 description 2
- 235000019437 butane-1,3-diol Nutrition 0.000 description 2
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N butyl acetate Chemical compound CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 description 2
- DCFKHNIGBAHNSS-UHFFFAOYSA-N chloro(triethyl)silane Chemical compound CC[Si](Cl)(CC)CC DCFKHNIGBAHNSS-UHFFFAOYSA-N 0.000 description 2
- SOKTZNMKXXQIFS-UHFFFAOYSA-N chloro-(chloromethyl)-bis(ethenyl)silane Chemical compound ClC[Si](Cl)(C=C)C=C SOKTZNMKXXQIFS-UHFFFAOYSA-N 0.000 description 2
- KQIADDMXRMTWHZ-UHFFFAOYSA-N chloro-tri(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(C(C)C)C(C)C KQIADDMXRMTWHZ-UHFFFAOYSA-N 0.000 description 2
- FOCAUTSVDIKZOP-UHFFFAOYSA-N chloroacetic acid Chemical compound OC(=O)CCl FOCAUTSVDIKZOP-UHFFFAOYSA-N 0.000 description 2
- PIJQBRGKTBSLFM-UHFFFAOYSA-N chloromethyl(penta-1,4-dien-3-yloxy)silane Chemical compound ClC[SiH2]OC(C=C)C=C PIJQBRGKTBSLFM-UHFFFAOYSA-N 0.000 description 2
- FPOSCXQHGOVVPD-UHFFFAOYSA-N chloromethyl(trimethoxy)silane Chemical compound CO[Si](CCl)(OC)OC FPOSCXQHGOVVPD-UHFFFAOYSA-N 0.000 description 2
- MLJHGPJYDGBIFS-UHFFFAOYSA-N chloromethyl-diethoxy-ethylsilane Chemical compound CCO[Si](CC)(CCl)OCC MLJHGPJYDGBIFS-UHFFFAOYSA-N 0.000 description 2
- XGLLBUISUZEUMW-UHFFFAOYSA-N chloromethyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(CCl)OCC XGLLBUISUZEUMW-UHFFFAOYSA-N 0.000 description 2
- WHVOPZVHCPLYOG-UHFFFAOYSA-N chloromethyl-diethoxy-phenylsilane Chemical compound CCO[Si](CCl)(OCC)C1=CC=CC=C1 WHVOPZVHCPLYOG-UHFFFAOYSA-N 0.000 description 2
- ZXZMFKUGAPMMCJ-UHFFFAOYSA-N chloromethyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(CCl)OC ZXZMFKUGAPMMCJ-UHFFFAOYSA-N 0.000 description 2
- QMBUWQNAJVPKHS-UHFFFAOYSA-N chloromethyl-dimethoxy-phenylsilane Chemical compound CO[Si](CCl)(OC)C1=CC=CC=C1 QMBUWQNAJVPKHS-UHFFFAOYSA-N 0.000 description 2
- HPNKKQGYJBEYFT-UHFFFAOYSA-N chloromethyl-ethoxy-diethylsilane Chemical compound CCO[Si](CC)(CC)CCl HPNKKQGYJBEYFT-UHFFFAOYSA-N 0.000 description 2
- IGMQAYXTTRYCPZ-UHFFFAOYSA-N chloromethyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)CCl IGMQAYXTTRYCPZ-UHFFFAOYSA-N 0.000 description 2
- ZCSLOBFDVTWIBL-UHFFFAOYSA-N chloromethyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CCl ZCSLOBFDVTWIBL-UHFFFAOYSA-N 0.000 description 2
- SAKYAANYXZKYEK-UHFFFAOYSA-N chloromethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CCl)(OC(C)C)OC(C)C SAKYAANYXZKYEK-UHFFFAOYSA-N 0.000 description 2
- HNEGQIOMVPPMNR-IHWYPQMZSA-N citraconic acid Chemical compound OC(=O)C(/C)=C\C(O)=O HNEGQIOMVPPMNR-IHWYPQMZSA-N 0.000 description 2
- 229940018557 citraconic acid Drugs 0.000 description 2
- 229940126214 compound 3 Drugs 0.000 description 2
- 125000000753 cycloalkyl group Chemical group 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- 239000012973 diazabicyclooctane Substances 0.000 description 2
- OMDLIAQYEYTYAT-UHFFFAOYSA-N dichloro(3-chloroprop-1-enyl)silane Chemical compound ClCC=C[SiH](Cl)Cl OMDLIAQYEYTYAT-UHFFFAOYSA-N 0.000 description 2
- BYLOHCRAPOSXLY-UHFFFAOYSA-N dichloro(diethyl)silane Chemical compound CC[Si](Cl)(Cl)CC BYLOHCRAPOSXLY-UHFFFAOYSA-N 0.000 description 2
- RFDRHLPSLJEXSY-UHFFFAOYSA-N dichloro-(chloromethyl)-ethylsilane Chemical compound CC[Si](Cl)(Cl)CCl RFDRHLPSLJEXSY-UHFFFAOYSA-N 0.000 description 2
- OEQIEAZLCJWDRM-UHFFFAOYSA-N dichloro-(chloromethyl)-phenylsilane Chemical compound ClC[Si](Cl)(Cl)C1=CC=CC=C1 OEQIEAZLCJWDRM-UHFFFAOYSA-N 0.000 description 2
- 229960005215 dichloroacetic acid Drugs 0.000 description 2
- ZMAPKOCENOWQRE-UHFFFAOYSA-N diethoxy(diethyl)silane Chemical compound CCO[Si](CC)(CC)OCC ZMAPKOCENOWQRE-UHFFFAOYSA-N 0.000 description 2
- ZZNQQQWFKKTOSD-UHFFFAOYSA-N diethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)C1=CC=CC=C1 ZZNQQQWFKKTOSD-UHFFFAOYSA-N 0.000 description 2
- NYROPPYCYUGLLK-UHFFFAOYSA-N diethoxymethyl(diethoxymethylsilylmethyl)silane Chemical compound CCOC(OCC)[SiH2]C[SiH2]C(OCC)OCC NYROPPYCYUGLLK-UHFFFAOYSA-N 0.000 description 2
- FLKPEMZONWLCSK-UHFFFAOYSA-N diethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(=O)OCC FLKPEMZONWLCSK-UHFFFAOYSA-N 0.000 description 2
- VSYLGGHSEIWGJV-UHFFFAOYSA-N diethyl(dimethoxy)silane Chemical compound CC[Si](CC)(OC)OC VSYLGGHSEIWGJV-UHFFFAOYSA-N 0.000 description 2
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 2
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 2
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 2
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 2
- AHUXYBVKTIBBJW-UHFFFAOYSA-N dimethoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)C1=CC=CC=C1 AHUXYBVKTIBBJW-UHFFFAOYSA-N 0.000 description 2
- CNMKFNVCPOVSIU-UHFFFAOYSA-N dimethoxymethyl-[2-(dimethoxymethylsilyl)ethyl]silane Chemical compound COC(OC)[SiH2]CC[SiH2]C(OC)OC CNMKFNVCPOVSIU-UHFFFAOYSA-N 0.000 description 2
- YYLGKUPAFFKGRQ-UHFFFAOYSA-N dimethyldiethoxysilane Chemical compound CCO[Si](C)(C)OCC YYLGKUPAFFKGRQ-UHFFFAOYSA-N 0.000 description 2
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 2
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 2
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 2
- 150000002170 ethers Chemical class 0.000 description 2
- GPCIFOPQYZCLTR-UHFFFAOYSA-N ethoxy-[ethoxy(diphenyl)silyl]-diphenylsilane Chemical compound C=1C=CC=CC=1[Si]([Si](OCC)(C=1C=CC=CC=1)C=1C=CC=CC=1)(OCC)C1=CC=CC=C1 GPCIFOPQYZCLTR-UHFFFAOYSA-N 0.000 description 2
- QRZBTGCXOVMETC-UHFFFAOYSA-N ethoxy-[ethoxy(diphenyl)silyl]oxy-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(OCC)O[Si](OCC)(C=1C=CC=CC=1)C1=CC=CC=C1 QRZBTGCXOVMETC-UHFFFAOYSA-N 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- SBRXLTRZCJVAPH-UHFFFAOYSA-N ethyl(trimethoxy)silane Chemical compound CC[Si](OC)(OC)OC SBRXLTRZCJVAPH-UHFFFAOYSA-N 0.000 description 2
- ZVQNVYMTWXEMSF-UHFFFAOYSA-N ethyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](CC)(OC(C)(C)C)OC(C)(C)C ZVQNVYMTWXEMSF-UHFFFAOYSA-N 0.000 description 2
- 235000019253 formic acid Nutrition 0.000 description 2
- 229940074391 gallic acid Drugs 0.000 description 2
- 235000004515 gallic acid Nutrition 0.000 description 2
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 2
- 238000001879 gelation Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- NGAZZOYFWWSOGK-UHFFFAOYSA-N heptan-3-one Chemical compound CCCCC(=O)CC NGAZZOYFWWSOGK-UHFFFAOYSA-N 0.000 description 2
- XVEOUOTUJBYHNL-UHFFFAOYSA-N heptane-2,4-diol Chemical compound CCCC(O)CC(C)O XVEOUOTUJBYHNL-UHFFFAOYSA-N 0.000 description 2
- QNVRIHYSUZMSGM-UHFFFAOYSA-N hexan-2-ol Chemical compound CCCCC(C)O QNVRIHYSUZMSGM-UHFFFAOYSA-N 0.000 description 2
- OHMBHFSEKCCCBW-UHFFFAOYSA-N hexane-2,5-diol Chemical compound CC(O)CCC(C)O OHMBHFSEKCCCBW-UHFFFAOYSA-N 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 239000012433 hydrogen halide Substances 0.000 description 2
- 229910000039 hydrogen halide Inorganic materials 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 239000005457 ice water Substances 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- QXJSBBXBKPUZAA-UHFFFAOYSA-N isooleic acid Natural products CCCCCCCC=CCCCCCCCCC(O)=O QXJSBBXBKPUZAA-UHFFFAOYSA-N 0.000 description 2
- BMFVGAAISNGQNM-UHFFFAOYSA-N isopentylamine Chemical compound CC(C)CCN BMFVGAAISNGQNM-UHFFFAOYSA-N 0.000 description 2
- JMMWKPVZQRWMSS-UHFFFAOYSA-N isopropyl acetate Chemical compound CC(C)OC(C)=O JMMWKPVZQRWMSS-UHFFFAOYSA-N 0.000 description 2
- KQQKGWQCNNTQJW-UHFFFAOYSA-N linolenic acid Natural products CC=CCCC=CCC=CCCCCCCCC(O)=O KQQKGWQCNNTQJW-UHFFFAOYSA-N 0.000 description 2
- 229960004488 linolenic acid Drugs 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 2
- 239000001630 malic acid Substances 0.000 description 2
- 235000011090 malic acid Nutrition 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- HNEGQIOMVPPMNR-NSCUHMNNSA-N mesaconic acid Chemical compound OC(=O)C(/C)=C/C(O)=O HNEGQIOMVPPMNR-NSCUHMNNSA-N 0.000 description 2
- CWGBHCIGKSXFED-UHFFFAOYSA-N methoxy-[methoxy(dimethyl)silyl]-dimethylsilane Chemical compound CO[Si](C)(C)[Si](C)(C)OC CWGBHCIGKSXFED-UHFFFAOYSA-N 0.000 description 2
- XKINWJBZPLWKCW-UHFFFAOYSA-N methoxy-[methoxy(dimethyl)silyl]oxy-dimethylsilane Chemical compound CO[Si](C)(C)O[Si](C)(C)OC XKINWJBZPLWKCW-UHFFFAOYSA-N 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- RJMRIDVWCWSWFR-UHFFFAOYSA-N methyl(tripropoxy)silane Chemical compound CCCO[Si](C)(OCCC)OCCC RJMRIDVWCWSWFR-UHFFFAOYSA-N 0.000 description 2
- HLXDKGBELJJMHR-UHFFFAOYSA-N methyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(OC(C)C)OC(C)C HLXDKGBELJJMHR-UHFFFAOYSA-N 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- HNEGQIOMVPPMNR-UHFFFAOYSA-N methylfumaric acid Natural products OC(=O)C(C)=CC(O)=O HNEGQIOMVPPMNR-UHFFFAOYSA-N 0.000 description 2
- ZIYVHBGGAOATLY-UHFFFAOYSA-N methylmalonic acid Chemical compound OC(=O)C(C)C(O)=O ZIYVHBGGAOATLY-UHFFFAOYSA-N 0.000 description 2
- LCEDQNDDFOCWGG-UHFFFAOYSA-N morpholine-4-carbaldehyde Chemical compound O=CN1CCOCC1 LCEDQNDDFOCWGG-UHFFFAOYSA-N 0.000 description 2
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N n-hexanoic acid Natural products CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 2
- SJWFXCIHNDVPSH-UHFFFAOYSA-N octan-2-ol Chemical compound CCCCCCC(C)O SJWFXCIHNDVPSH-UHFFFAOYSA-N 0.000 description 2
- WYNVIVRXHYGNRT-UHFFFAOYSA-N octane-3,5-diol Chemical compound CCCC(O)CC(O)CC WYNVIVRXHYGNRT-UHFFFAOYSA-N 0.000 description 2
- ZQPPMHVWECSIRJ-KTKRTIGZSA-N oleic acid Chemical compound CCCCCCCC\C=C/CCCCCCCC(O)=O ZQPPMHVWECSIRJ-KTKRTIGZSA-N 0.000 description 2
- 229960002969 oleic acid Drugs 0.000 description 2
- 235000021313 oleic acid Nutrition 0.000 description 2
- 229920000620 organic polymer Polymers 0.000 description 2
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 2
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 2
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 2
- JYVLIDXNZAXMDK-UHFFFAOYSA-N pentan-2-ol Chemical compound CCCC(C)O JYVLIDXNZAXMDK-UHFFFAOYSA-N 0.000 description 2
- XNLICIUVMPYHGG-UHFFFAOYSA-N pentan-2-one Chemical compound CCCC(C)=O XNLICIUVMPYHGG-UHFFFAOYSA-N 0.000 description 2
- FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
- GTCCGKPBSJZVRZ-UHFFFAOYSA-N pentane-2,4-diol Chemical compound CC(O)CC(C)O GTCCGKPBSJZVRZ-UHFFFAOYSA-N 0.000 description 2
- 229940100684 pentylamine Drugs 0.000 description 2
- 229960005323 phenoxyethanol Drugs 0.000 description 2
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- NSFXUCGTDFXHRK-UHFFFAOYSA-N propyl 3-oxohexaneperoxoate;titanium Chemical compound [Ti].CCCOOC(=O)CC(=O)CCC.CCCOOC(=O)CC(=O)CCC NSFXUCGTDFXHRK-UHFFFAOYSA-N 0.000 description 2
- PDWJQUIPTZSMQV-UHFFFAOYSA-N propyl 3-oxohexaneperoxoate;zirconium Chemical compound [Zr].CCCOOC(=O)CC(=O)CCC.CCCOOC(=O)CC(=O)CCC PDWJQUIPTZSMQV-UHFFFAOYSA-N 0.000 description 2
- YKYONYBAUNKHLG-UHFFFAOYSA-N propyl acetate Chemical compound CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 2
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- WGYKZJWCGVVSQN-UHFFFAOYSA-N propylamine Chemical compound CCCN WGYKZJWCGVVSQN-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 239000011541 reaction mixture Substances 0.000 description 2
- 229960004889 salicylic acid Drugs 0.000 description 2
- JXOHGGNKMLTUBP-HSUXUTPPSA-N shikimic acid Chemical compound O[C@@H]1CC(C(O)=O)=C[C@@H](O)[C@H]1O JXOHGGNKMLTUBP-HSUXUTPPSA-N 0.000 description 2
- JXOHGGNKMLTUBP-JKUQZMGJSA-N shikimic acid Natural products O[C@@H]1CC(C(O)=O)=C[C@H](O)[C@@H]1O JXOHGGNKMLTUBP-JKUQZMGJSA-N 0.000 description 2
- 150000003377 silicon compounds Chemical class 0.000 description 2
- 239000011734 sodium Substances 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- 239000000600 sorbitol Substances 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 239000008117 stearic acid Substances 0.000 description 2
- 229960004274 stearic acid Drugs 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000006228 supernatant Substances 0.000 description 2
- 239000011975 tartaric acid Substances 0.000 description 2
- 235000002906 tartaric acid Nutrition 0.000 description 2
- VDZOOKBUILJEDG-UHFFFAOYSA-M tetrabutylammonium hydroxide Chemical compound [OH-].CCCC[N+](CCCC)(CCCC)CCCC VDZOOKBUILJEDG-UHFFFAOYSA-M 0.000 description 2
- BRGJIIMZXMWMCC-UHFFFAOYSA-N tetradecan-2-ol Chemical compound CCCCCCCCCCCCC(C)O BRGJIIMZXMWMCC-UHFFFAOYSA-N 0.000 description 2
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 2
- 125000003944 tolyl group Chemical group 0.000 description 2
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 2
- CAPIMQICDAJXSB-UHFFFAOYSA-N trichloro(1-chloroethyl)silane Chemical compound CC(Cl)[Si](Cl)(Cl)Cl CAPIMQICDAJXSB-UHFFFAOYSA-N 0.000 description 2
- SNYHRPNTNQYJMD-UHFFFAOYSA-N trichloro(1-chloropropyl)silane Chemical compound CCC(Cl)[Si](Cl)(Cl)Cl SNYHRPNTNQYJMD-UHFFFAOYSA-N 0.000 description 2
- YNJBWRMUSHSURL-UHFFFAOYSA-N trichloroacetic acid Chemical compound OC(=O)C(Cl)(Cl)Cl YNJBWRMUSHSURL-UHFFFAOYSA-N 0.000 description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
- 239000005052 trichlorosilane Substances 0.000 description 2
- IZRJPHXTEXTLHY-UHFFFAOYSA-N triethoxy(2-triethoxysilylethyl)silane Chemical compound CCO[Si](OCC)(OCC)CC[Si](OCC)(OCC)OCC IZRJPHXTEXTLHY-UHFFFAOYSA-N 0.000 description 2
- DENFJSAFJTVPJR-UHFFFAOYSA-N triethoxy(ethyl)silane Chemical compound CCO[Si](CC)(OCC)OCC DENFJSAFJTVPJR-UHFFFAOYSA-N 0.000 description 2
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 2
- JCVQKRGIASEUKR-UHFFFAOYSA-N triethoxy(phenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1 JCVQKRGIASEUKR-UHFFFAOYSA-N 0.000 description 2
- AKYUXYJGXHZKLL-UHFFFAOYSA-N triethoxy(triethoxysilyl)silane Chemical compound CCO[Si](OCC)(OCC)[Si](OCC)(OCC)OCC AKYUXYJGXHZKLL-UHFFFAOYSA-N 0.000 description 2
- NIINUVYELHEORX-UHFFFAOYSA-N triethoxy(triethoxysilylmethyl)silane Chemical compound CCO[Si](OCC)(OCC)C[Si](OCC)(OCC)OCC NIINUVYELHEORX-UHFFFAOYSA-N 0.000 description 2
- MRBRVZDGOJHHFZ-UHFFFAOYSA-N triethoxy-(3-triethoxysilylphenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC([Si](OCC)(OCC)OCC)=C1 MRBRVZDGOJHHFZ-UHFFFAOYSA-N 0.000 description 2
- YYJNCOSWWOMZHX-UHFFFAOYSA-N triethoxy-(4-triethoxysilylphenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=C([Si](OCC)(OCC)OCC)C=C1 YYJNCOSWWOMZHX-UHFFFAOYSA-N 0.000 description 2
- GYTROFMCUJZKNA-UHFFFAOYSA-N triethyl triethoxysilyl silicate Chemical compound CCO[Si](OCC)(OCC)O[Si](OCC)(OCC)OCC GYTROFMCUJZKNA-UHFFFAOYSA-N 0.000 description 2
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 2
- ZNOCGWVLWPVKAO-UHFFFAOYSA-N trimethoxy(phenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1 ZNOCGWVLWPVKAO-UHFFFAOYSA-N 0.000 description 2
- LMQGXNPPTQOGDG-UHFFFAOYSA-N trimethoxy(trimethoxysilyl)silane Chemical compound CO[Si](OC)(OC)[Si](OC)(OC)OC LMQGXNPPTQOGDG-UHFFFAOYSA-N 0.000 description 2
- DJYGUVIGOGFJOF-UHFFFAOYSA-N trimethoxy(trimethoxysilylmethyl)silane Chemical compound CO[Si](OC)(OC)C[Si](OC)(OC)OC DJYGUVIGOGFJOF-UHFFFAOYSA-N 0.000 description 2
- KBFAHPBJNNSTGX-UHFFFAOYSA-N trimethoxy-(3-trimethoxysilylphenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC([Si](OC)(OC)OC)=C1 KBFAHPBJNNSTGX-UHFFFAOYSA-N 0.000 description 2
- YIRZROVNUPFFNZ-UHFFFAOYSA-N trimethoxy-(4-trimethoxysilylphenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=C([Si](OC)(OC)OC)C=C1 YIRZROVNUPFFNZ-UHFFFAOYSA-N 0.000 description 2
- XOAJIYVOSJHEQB-UHFFFAOYSA-N trimethyl trimethoxysilyl silicate Chemical compound CO[Si](OC)(OC)O[Si](OC)(OC)OC XOAJIYVOSJHEQB-UHFFFAOYSA-N 0.000 description 2
- BZIXIRYKSIMLOB-UHFFFAOYSA-N tripropoxy(tripropoxysilylmethyl)silane Chemical compound CCCO[Si](OCCC)(OCCC)C[Si](OCCC)(OCCC)OCCC BZIXIRYKSIMLOB-UHFFFAOYSA-N 0.000 description 2
- NBAPKCYEEBMZDW-UHFFFAOYSA-N tripropoxy-(2-tripropoxysilylphenyl)silane Chemical compound CCCO[Si](OCCC)(OCCC)C1=CC=CC=C1[Si](OCCC)(OCCC)OCCC NBAPKCYEEBMZDW-UHFFFAOYSA-N 0.000 description 2
- YMAKWPVRMIUZBP-UHFFFAOYSA-N tripropoxy-(3-tripropoxysilylphenyl)silane Chemical compound CCCO[Si](OCCC)(OCCC)C1=CC=CC([Si](OCCC)(OCCC)OCCC)=C1 YMAKWPVRMIUZBP-UHFFFAOYSA-N 0.000 description 2
- FOUOZDXPXSKVEL-UHFFFAOYSA-N tripropoxy-(4-tripropoxysilylphenyl)silane Chemical compound CCCO[Si](OCCC)(OCCC)C1=CC=C([Si](OCCC)(OCCC)OCCC)C=C1 FOUOZDXPXSKVEL-UHFFFAOYSA-N 0.000 description 2
- YFTHZRPMJXBUME-UHFFFAOYSA-N tripropylamine Chemical compound CCCN(CCC)CCC YFTHZRPMJXBUME-UHFFFAOYSA-N 0.000 description 2
- XMUJIPOFTAHSOK-UHFFFAOYSA-N undecan-2-ol Chemical compound CCCCCCCCCC(C)O XMUJIPOFTAHSOK-UHFFFAOYSA-N 0.000 description 2
- LHXDLQBQYFFVNW-OIBJUYFYSA-N (-)-Fenchone Chemical compound C1C[C@@]2(C)C(=O)C(C)(C)[C@@H]1C2 LHXDLQBQYFFVNW-OIBJUYFYSA-N 0.000 description 1
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- LLDKVCWYFIVHFV-UHFFFAOYSA-N 1,1,1,3,3,5-hexafluoroheptane-2,4-dione Chemical compound FC(C(C(C(C(F)(F)F)=O)(F)F)=O)CC LLDKVCWYFIVHFV-UHFFFAOYSA-N 0.000 description 1
- CFCRODHVHXGTPC-UHFFFAOYSA-N 1,1,2,2,3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,11,11,12,12,12-pentacosafluorododecane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F CFCRODHVHXGTPC-UHFFFAOYSA-N 0.000 description 1
- KMMOLDZBACYVIN-UHFFFAOYSA-N 1,1,2,2,3,3-hexafluoro-1-[2-[2-[2-[2-[2-[2-(1,1,2,2,3,3-hexafluoropentoxy)propoxy]propoxy]propoxy]propoxy]propoxy]propoxy]pentane Chemical compound CCC(F)(F)C(F)(F)C(F)(F)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)OCC(C)OC(F)(F)C(F)(F)C(F)(F)CC KMMOLDZBACYVIN-UHFFFAOYSA-N 0.000 description 1
- FWFUGQANHCJOAR-UHFFFAOYSA-N 1,1,2,2,3,3-hexafluorodecane Chemical compound CCCCCCCC(F)(F)C(F)(F)C(F)F FWFUGQANHCJOAR-UHFFFAOYSA-N 0.000 description 1
- NHMQIIWXKSTTCZ-UHFFFAOYSA-N 1,1,2,2,8,8,9,9,10,10-decafluorododecane Chemical compound CCC(F)(F)C(F)(F)C(F)(F)CCCCCC(F)(F)C(F)F NHMQIIWXKSTTCZ-UHFFFAOYSA-N 0.000 description 1
- MKNKAWHZNOFVLS-UHFFFAOYSA-N 1,1,2,2-tetrafluoro-1-(1,1,2,2-tetrafluoropropoxy)octane Chemical compound CCCCCCC(F)(F)C(F)(F)OC(F)(F)C(C)(F)F MKNKAWHZNOFVLS-UHFFFAOYSA-N 0.000 description 1
- RIZMPBJZAHNFGY-UHFFFAOYSA-N 1,1,2,2-tetrafluoro-1-hexoxyoctane Chemical compound CCCCCCOC(F)(F)C(F)(F)CCCCCC RIZMPBJZAHNFGY-UHFFFAOYSA-N 0.000 description 1
- VPBZZPOGZPKYKX-UHFFFAOYSA-N 1,2-diethoxypropane Chemical compound CCOCC(C)OCC VPBZZPOGZPKYKX-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- RXYPXQSKLGGKOL-UHFFFAOYSA-N 1,4-dimethylpiperazine Chemical compound CN1CCN(C)CC1 RXYPXQSKLGGKOL-UHFFFAOYSA-N 0.000 description 1
- GDXHBFHOEYVPED-UHFFFAOYSA-N 1-(2-butoxyethoxy)butane Chemical compound CCCCOCCOCCCC GDXHBFHOEYVPED-UHFFFAOYSA-N 0.000 description 1
- QMGJMGFZLXYHCR-UHFFFAOYSA-N 1-(2-butoxypropoxy)butane Chemical compound CCCCOCC(C)OCCCC QMGJMGFZLXYHCR-UHFFFAOYSA-N 0.000 description 1
- OXHNLMTVIGZXSG-UHFFFAOYSA-N 1-Methylpyrrole Chemical compound CN1C=CC=C1 OXHNLMTVIGZXSG-UHFFFAOYSA-N 0.000 description 1
- AGRIQBHIKABLPJ-UHFFFAOYSA-N 1-Pyrrolidinecarboxaldehyde Chemical compound O=CN1CCCC1 AGRIQBHIKABLPJ-UHFFFAOYSA-N 0.000 description 1
- UOWSVNMPHMJCBZ-UHFFFAOYSA-N 1-[2-(2-butoxypropoxy)propoxy]butane Chemical compound CCCCOCC(C)OCC(C)OCCCC UOWSVNMPHMJCBZ-UHFFFAOYSA-N 0.000 description 1
- FUWDFGKRNIDKAE-UHFFFAOYSA-N 1-butoxypropan-2-yl acetate Chemical compound CCCCOCC(C)OC(C)=O FUWDFGKRNIDKAE-UHFFFAOYSA-N 0.000 description 1
- IGJCAOPFRLDFRQ-UHFFFAOYSA-N 1-chloropropoxy(trimethyl)silane Chemical compound CCC(Cl)O[Si](C)(C)C IGJCAOPFRLDFRQ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- ZIKLJUUTSQYGQI-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxypropoxy)propane Chemical compound CCOCC(C)OCC(C)OCC ZIKLJUUTSQYGQI-UHFFFAOYSA-N 0.000 description 1
- CNJRPYFBORAQAU-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxyethoxy)ethane Chemical compound CCOCCOCCOC CNJRPYFBORAQAU-UHFFFAOYSA-N 0.000 description 1
- JXFITNNCZLPZNX-UHFFFAOYSA-N 1-ethoxy-2-(2-methoxypropoxy)propane Chemical compound CCOCC(C)OCC(C)OC JXFITNNCZLPZNX-UHFFFAOYSA-N 0.000 description 1
- CAQYAZNFWDDMIT-UHFFFAOYSA-N 1-ethoxy-2-methoxyethane Chemical compound CCOCCOC CAQYAZNFWDDMIT-UHFFFAOYSA-N 0.000 description 1
- LIPRQQHINVWJCH-UHFFFAOYSA-N 1-ethoxypropan-2-yl acetate Chemical compound CCOCC(C)OC(C)=O LIPRQQHINVWJCH-UHFFFAOYSA-N 0.000 description 1
- NVJUHMXYKCUMQA-UHFFFAOYSA-N 1-ethoxypropane Chemical compound CCCOCC NVJUHMXYKCUMQA-UHFFFAOYSA-N 0.000 description 1
- VPUAYOJTHRDUTK-UHFFFAOYSA-N 1-ethylpyrrole Chemical compound CCN1C=CC=C1 VPUAYOJTHRDUTK-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- MCTWTZJPVLRJOU-UHFFFAOYSA-N 1-methyl-1H-imidazole Chemical compound CN1C=CN=C1 MCTWTZJPVLRJOU-UHFFFAOYSA-N 0.000 description 1
- GGYVTHJIUNGKFZ-UHFFFAOYSA-N 1-methylpiperidin-2-one Chemical compound CN1CCCCC1=O GGYVTHJIUNGKFZ-UHFFFAOYSA-N 0.000 description 1
- HUUPVABNAQUEJW-UHFFFAOYSA-N 1-methylpiperidin-4-one Chemical compound CN1CCC(=O)CC1 HUUPVABNAQUEJW-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- KYWXRBNOYGGPIZ-UHFFFAOYSA-N 1-morpholin-4-ylethanone Chemical compound CC(=O)N1CCOCC1 KYWXRBNOYGGPIZ-UHFFFAOYSA-N 0.000 description 1
- DMFAHCVITRDZQB-UHFFFAOYSA-N 1-propoxypropan-2-yl acetate Chemical compound CCCOCC(C)OC(C)=O DMFAHCVITRDZQB-UHFFFAOYSA-N 0.000 description 1
- LNWWQYYLZVZXKS-UHFFFAOYSA-N 1-pyrrolidin-1-ylethanone Chemical compound CC(=O)N1CCCC1 LNWWQYYLZVZXKS-UHFFFAOYSA-N 0.000 description 1
- HVFCFLAGRSHDLR-UHFFFAOYSA-N 2,2-dicyclohexylethoxy(iodomethyl)silane Chemical compound IC[SiH2]OCC(C1CCCCC1)C1CCCCC1 HVFCFLAGRSHDLR-UHFFFAOYSA-N 0.000 description 1
- LTMRRSWNXVJMBA-UHFFFAOYSA-L 2,2-diethylpropanedioate Chemical compound CCC(CC)(C([O-])=O)C([O-])=O LTMRRSWNXVJMBA-UHFFFAOYSA-L 0.000 description 1
- LFUSPEHMXXXZBF-UHFFFAOYSA-N 2,2-diphenylethoxy(iodomethyl)silane Chemical compound IC[SiH2]OCC(C1=CC=CC=C1)C1=CC=CC=C1 LFUSPEHMXXXZBF-UHFFFAOYSA-N 0.000 description 1
- WIONDTHSGUPTOT-UHFFFAOYSA-N 2,2-diphenylethyl-(iodomethyl)-methoxysilane Chemical compound IC[SiH](OC)CC(C1=CC=CC=C1)C1=CC=CC=C1 WIONDTHSGUPTOT-UHFFFAOYSA-N 0.000 description 1
- ZVSIWOMYOYBBAP-UHFFFAOYSA-N 2,2-diphenylethyl-(iodomethyl)-propoxysilane Chemical compound IC[SiH](OCCC)CC(C1=CC=CC=C1)C1=CC=CC=C1 ZVSIWOMYOYBBAP-UHFFFAOYSA-N 0.000 description 1
- ITWKAGJWLCURRS-UHFFFAOYSA-N 2,2-diphenylethyl-ethoxy-(iodomethyl)silane Chemical compound IC[SiH](OCC)CC(C1=CC=CC=C1)C1=CC=CC=C1 ITWKAGJWLCURRS-UHFFFAOYSA-N 0.000 description 1
- KFBXUKHERGLHLG-UHFFFAOYSA-N 2,4-Nonanedione Chemical compound CCCCCC(=O)CC(C)=O KFBXUKHERGLHLG-UHFFFAOYSA-N 0.000 description 1
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 1
- CKCGJBFTCUCBAJ-UHFFFAOYSA-N 2-(2-ethoxypropoxy)propyl acetate Chemical compound CCOC(C)COC(C)COC(C)=O CKCGJBFTCUCBAJ-UHFFFAOYSA-N 0.000 description 1
- BJINVQNEBGOMCR-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethyl acetate Chemical compound COCCOCCOC(C)=O BJINVQNEBGOMCR-UHFFFAOYSA-N 0.000 description 1
- DRLRGHZJOQGQEC-UHFFFAOYSA-N 2-(2-methoxypropoxy)propyl acetate Chemical compound COC(C)COC(C)COC(C)=O DRLRGHZJOQGQEC-UHFFFAOYSA-N 0.000 description 1
- NOMOPRKYOOSZKV-UHFFFAOYSA-N 2-(diethoxymethylsilyl)ethyl-triethoxysilane Chemical compound CCOC(OCC)[SiH2]CC[Si](OCC)(OCC)OCC NOMOPRKYOOSZKV-UHFFFAOYSA-N 0.000 description 1
- VIKZXMQZDHWCNW-UHFFFAOYSA-N 2-(dipropoxymethylsilyl)ethyl-tripropoxysilane Chemical compound CCCOC(OCCC)[SiH2]CC[Si](OCCC)(OCCC)OCCC VIKZXMQZDHWCNW-UHFFFAOYSA-N 0.000 description 1
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 1
- HQLKZWRSOHTERR-UHFFFAOYSA-N 2-Ethylbutyl acetate Chemical compound CCC(CC)COC(C)=O HQLKZWRSOHTERR-UHFFFAOYSA-N 0.000 description 1
- GQKZRWSUJHVIPE-UHFFFAOYSA-N 2-Pentanol acetate Chemical compound CCCC(C)OC(C)=O GQKZRWSUJHVIPE-UHFFFAOYSA-N 0.000 description 1
- SDHQGBWMLCBNSM-UHFFFAOYSA-N 2-[2-(2-methoxyethoxy)ethoxy]ethyl acetate Chemical compound COCCOCCOCCOC(C)=O SDHQGBWMLCBNSM-UHFFFAOYSA-N 0.000 description 1
- MAUGGXUAHNSMKF-UHFFFAOYSA-N 2-[2-[2-[2-[2-[2-(1,1,2,2,3,3-hexafluoropentoxy)ethoxy]ethoxy]ethoxy]ethoxy]ethoxy]ethanol Chemical compound CCC(F)(F)C(F)(F)C(F)(F)OCCOCCOCCOCCOCCOCCO MAUGGXUAHNSMKF-UHFFFAOYSA-N 0.000 description 1
- ZZEANNAZZVVPKU-UHFFFAOYSA-N 2-[2-[2-[2-[2-[2-[2-(2-hydroxypropoxy)propoxy]propoxy]propoxy]propoxy]propoxy]propoxy]propan-1-ol Chemical compound CC(O)COC(C)COC(C)COC(C)COC(C)COC(C)COC(C)COC(C)CO ZZEANNAZZVVPKU-UHFFFAOYSA-N 0.000 description 1
- ZSHXCNNCEOGSAN-UHFFFAOYSA-N 2-[bis[(2-methylpropan-2-yl)oxy]methylsilyl]ethyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)OC(OC(C)(C)C)[SiH2]CC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C ZSHXCNNCEOGSAN-UHFFFAOYSA-N 0.000 description 1
- HITBDIPWYKTHIH-UHFFFAOYSA-N 2-[diethoxy(methyl)silyl]ethyl-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)CC[Si](C)(OCC)OCC HITBDIPWYKTHIH-UHFFFAOYSA-N 0.000 description 1
- WJFWBHCVVQJRGB-UHFFFAOYSA-N 2-ethenylbut-3-enoxy(iodomethyl)silane Chemical compound IC[SiH2]OCC(C=C)C=C WJFWBHCVVQJRGB-UHFFFAOYSA-N 0.000 description 1
- ZKCCKKDTLQTPKF-UHFFFAOYSA-N 2-ethoxy-1-methoxypropane Chemical compound CCOC(C)COC ZKCCKKDTLQTPKF-UHFFFAOYSA-N 0.000 description 1
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- WOYWLLHHWAMFCB-UHFFFAOYSA-N 2-ethylhexyl acetate Chemical compound CCCCC(CC)COC(C)=O WOYWLLHHWAMFCB-UHFFFAOYSA-N 0.000 description 1
- CRWNQZTZTZWPOF-UHFFFAOYSA-N 2-methyl-4-phenylpyridine Chemical compound C1=NC(C)=CC(C=2C=CC=CC=2)=C1 CRWNQZTZTZWPOF-UHFFFAOYSA-N 0.000 description 1
- 125000000094 2-phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001494 2-propynyl group Chemical group [H]C#CC([H])([H])* 0.000 description 1
- PKNKULBDCRZSBT-UHFFFAOYSA-N 3,4,5-trimethylnonan-2-one Chemical compound CCCCC(C)C(C)C(C)C(C)=O PKNKULBDCRZSBT-UHFFFAOYSA-N 0.000 description 1
- XBIUWALDKXACEA-UHFFFAOYSA-N 3-[bis(2,4-dioxopentan-3-yl)alumanyl]pentane-2,4-dione Chemical compound CC(=O)C(C(C)=O)[Al](C(C(C)=O)C(C)=O)C(C(C)=O)C(C)=O XBIUWALDKXACEA-UHFFFAOYSA-N 0.000 description 1
- FMUGJGVGEWHETE-UHFFFAOYSA-N 3-bicyclo[2.2.1]heptanyl(trichloro)silane Chemical compound C1CC2C([Si](Cl)(Cl)Cl)CC1C2 FMUGJGVGEWHETE-UHFFFAOYSA-N 0.000 description 1
- XRFPPNWNTQXEMU-UHFFFAOYSA-N 3-bicyclo[2.2.1]heptanyl(triiodo)silane Chemical compound C1CC2C([Si](I)(I)I)CC1C2 XRFPPNWNTQXEMU-UHFFFAOYSA-N 0.000 description 1
- KQESUORBLOPVDC-UHFFFAOYSA-N 3-bromoprop-1-enyl(dipropoxy)silane Chemical compound BrCC=C[SiH](OCCC)OCCC KQESUORBLOPVDC-UHFFFAOYSA-N 0.000 description 1
- BPYBSAYDWYIOGQ-UHFFFAOYSA-N 3-bromoprop-1-enyl-di(propan-2-yloxy)silane Chemical compound BrCC=C[SiH](OC(C)C)OC(C)C BPYBSAYDWYIOGQ-UHFFFAOYSA-N 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- MOBXUBBMIQVHAL-UHFFFAOYSA-N 3-chloroprop-1-enyl(dipropoxy)silane Chemical compound ClCC=C[SiH](OCCC)OCCC MOBXUBBMIQVHAL-UHFFFAOYSA-N 0.000 description 1
- DENQIEQINCYJNY-UHFFFAOYSA-N 3-chloroprop-1-enyl-di(propan-2-yloxy)silane Chemical compound ClCC=C[SiH](OC(C)C)OC(C)C DENQIEQINCYJNY-UHFFFAOYSA-N 0.000 description 1
- 125000006041 3-hexenyl group Chemical group 0.000 description 1
- UTSDXSFVQFPWGI-UHFFFAOYSA-N 3-iodoprop-1-enyl(dimethoxy)silane Chemical compound ICC=C[SiH](OC)OC UTSDXSFVQFPWGI-UHFFFAOYSA-N 0.000 description 1
- CYEZVIWOYIILSR-UHFFFAOYSA-N 3-iodoprop-1-enyl(dipropoxy)silane Chemical compound ICC=C[SiH](OCCC)OCCC CYEZVIWOYIILSR-UHFFFAOYSA-N 0.000 description 1
- PRMWDTLZKSMHQY-UHFFFAOYSA-N 3-iodoprop-1-enyl-di(propan-2-yloxy)silane Chemical compound ICC=C[SiH](OC(C)C)OC(C)C PRMWDTLZKSMHQY-UHFFFAOYSA-N 0.000 description 1
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 1
- VATRWWPJWVCZTA-UHFFFAOYSA-N 3-oxo-n-[2-(trifluoromethyl)phenyl]butanamide Chemical compound CC(=O)CC(=O)NC1=CC=CC=C1C(F)(F)F VATRWWPJWVCZTA-UHFFFAOYSA-N 0.000 description 1
- IBEWEPDJZBCHBL-UHFFFAOYSA-K 3-oxohexanoate titanium(3+) Chemical compound [Ti+3].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O IBEWEPDJZBCHBL-UHFFFAOYSA-K 0.000 description 1
- ZABMJAAATCDODB-UHFFFAOYSA-L 3-oxohexanoate;titanium(2+) Chemical compound [Ti+2].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O ZABMJAAATCDODB-UHFFFAOYSA-L 0.000 description 1
- CQKOAJVBVFKQOO-UHFFFAOYSA-L 3-oxohexanoate;zirconium(2+) Chemical compound [Zr+2].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O CQKOAJVBVFKQOO-UHFFFAOYSA-L 0.000 description 1
- JVQIKJMSUIMUDI-UHFFFAOYSA-N 3-pyrroline Chemical compound C1NCC=C1 JVQIKJMSUIMUDI-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 1
- FGQBGDBLZZPFCM-UHFFFAOYSA-N 4-methylmorpholin-3-one Chemical compound CN1CCOCC1=O FGQBGDBLZZPFCM-UHFFFAOYSA-N 0.000 description 1
- KHZGUWAFFHXZLC-UHFFFAOYSA-N 5-methylhexane-2,4-dione Chemical compound CC(C)C(=O)CC(C)=O KHZGUWAFFHXZLC-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-N Betaine Natural products C[N+](C)(C)CC([O-])=O KWIUHFFTVRNATP-UHFFFAOYSA-N 0.000 description 1
- ATUSVJUJOCTTOR-UHFFFAOYSA-N BrC[SiH2]OC(C1=CC=C(C=C1)OCC)C1=CC=C(C=C1)OCC Chemical compound BrC[SiH2]OC(C1=CC=C(C=C1)OCC)C1=CC=C(C=C1)OCC ATUSVJUJOCTTOR-UHFFFAOYSA-N 0.000 description 1
- WHLISDASGYQCIE-UHFFFAOYSA-N BrC[SiH2]OCC(C1=CC=C(C=C1)OCC)C1=CC=C(C=C1)OCC Chemical compound BrC[SiH2]OCC(C1=CC=C(C=C1)OCC)C1=CC=C(C=C1)OCC WHLISDASGYQCIE-UHFFFAOYSA-N 0.000 description 1
- ZSTIXLNBSYUGHH-UHFFFAOYSA-N BrC[SiH](Cl)CC(C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound BrC[SiH](Cl)CC(C1=CC=CC=C1)C1=CC=CC=C1 ZSTIXLNBSYUGHH-UHFFFAOYSA-N 0.000 description 1
- BKMIDQWTECVOSV-UHFFFAOYSA-N BrC[Si](Cl)(Cl)CCC.BrC[Si](Cl)(Cl)CC Chemical compound BrC[Si](Cl)(Cl)CCC.BrC[Si](Cl)(Cl)CC BKMIDQWTECVOSV-UHFFFAOYSA-N 0.000 description 1
- MRABAEUHTLLEML-UHFFFAOYSA-N Butyl lactate Chemical compound CCCCOC(=O)C(C)O MRABAEUHTLLEML-UHFFFAOYSA-N 0.000 description 1
- PAHTUVYJFZEZAL-UHFFFAOYSA-N C(=C)C(C(CC)(O[Si](OC(C)CC)(OC(C)CC)C=C)OCCCC)(OCCCC)OCCCC Chemical compound C(=C)C(C(CC)(O[Si](OC(C)CC)(OC(C)CC)C=C)OCCCC)(OCCCC)OCCCC PAHTUVYJFZEZAL-UHFFFAOYSA-N 0.000 description 1
- COHOYRFLNKELLL-UHFFFAOYSA-N C(C)(=O)CC(=O)OOC(C)CC.C(C)(=O)CC(=O)OOC(C)CC Chemical compound C(C)(=O)CC(=O)OOC(C)CC.C(C)(=O)CC(=O)OOC(C)CC COHOYRFLNKELLL-UHFFFAOYSA-N 0.000 description 1
- KVLMHAZSJUQHGF-UHFFFAOYSA-N C(C)(=O)O.C(C)CC(CC(=O)OOC(C)(C)C)=O.C(C)CC(CC(=O)OOC(C)(C)C)=O Chemical compound C(C)(=O)O.C(C)CC(CC(=O)OOC(C)(C)C)=O.C(C)CC(CC(=O)OOC(C)(C)C)=O KVLMHAZSJUQHGF-UHFFFAOYSA-N 0.000 description 1
- WATMHVGZNGYHKK-UHFFFAOYSA-N C(C)(CC)OC(OC(C)CC)[SiH2]C[SiH2]C(OC(C)CC)OC(C)CC.C(CCC)OC(OCCCC)[SiH2]C[SiH2]C(OCCCC)OCCCC Chemical compound C(C)(CC)OC(OC(C)CC)[SiH2]C[SiH2]C(OC(C)CC)OC(C)CC.C(CCC)OC(OCCCC)[SiH2]C[SiH2]C(OCCCC)OCCCC WATMHVGZNGYHKK-UHFFFAOYSA-N 0.000 description 1
- OMSXLDKDBUFAFW-UHFFFAOYSA-M C(C)CC(CC(=O)[O-])=O.[Ti+] Chemical compound C(C)CC(CC(=O)[O-])=O.[Ti+] OMSXLDKDBUFAFW-UHFFFAOYSA-M 0.000 description 1
- BVWILHXAQUGBDT-UHFFFAOYSA-N C(C)OC(OCC)[SiH2]CC[Si](OCC)(OCC)OCC.COC(OC)[SiH2]CC[Si](OC)(OC)OC Chemical compound C(C)OC(OCC)[SiH2]CC[Si](OCC)(OCC)OCC.COC(OC)[SiH2]CC[Si](OC)(OC)OC BVWILHXAQUGBDT-UHFFFAOYSA-N 0.000 description 1
- PZYJWHBHEQDELK-MKWAYWHRSA-N C(CC)/C(/C(=O)O)=C/C(=O)O.C(C(C)O)O Chemical compound C(CC)/C(/C(=O)O)=C/C(=O)O.C(C(C)O)O PZYJWHBHEQDELK-MKWAYWHRSA-N 0.000 description 1
- BAQWRKDVKLSDKG-LNKPDPKZSA-N C(\C=C/C(=O)O)(=O)OCCC.C(C(C)O)O Chemical compound C(\C=C/C(=O)O)(=O)OCCC.C(C(C)O)O BAQWRKDVKLSDKG-LNKPDPKZSA-N 0.000 description 1
- FWLDZZHRJXUANL-UHFFFAOYSA-N C12C(CC(CC1)C2)[SiH](Br)Br Chemical compound C12C(CC(CC1)C2)[SiH](Br)Br FWLDZZHRJXUANL-UHFFFAOYSA-N 0.000 description 1
- YLFWBWMXGDKFKN-UHFFFAOYSA-N CC(C)(C)OC(OC(C)(C)C)[SiH2]C[SiH2]C(OC(C)(C)C)OC(C)(C)C Chemical compound CC(C)(C)OC(OC(C)(C)C)[SiH2]C[SiH2]C(OC(C)(C)C)OC(C)(C)C YLFWBWMXGDKFKN-UHFFFAOYSA-N 0.000 description 1
- DXPGPQOTKBQMME-UHFFFAOYSA-N CCCCOC(OCCCC)[SiH2]CC[SiH2]C(OCCCC)OCCCC Chemical compound CCCCOC(OCCCC)[SiH2]CC[SiH2]C(OCCCC)OCCCC DXPGPQOTKBQMME-UHFFFAOYSA-N 0.000 description 1
- FTSXNQAMKOCDOV-UHFFFAOYSA-N CCCCOC(OCCCC)[SiH2]CC[Si](OCCCC)(OCCCC)OCCCC Chemical compound CCCCOC(OCCCC)[SiH2]CC[Si](OCCCC)(OCCCC)OCCCC FTSXNQAMKOCDOV-UHFFFAOYSA-N 0.000 description 1
- XSQIIUIRFLIGDK-UHFFFAOYSA-N CCCOC(OCCC)[SiH2]C[SiH2]C(OCCC)OCCC Chemical compound CCCOC(OCCC)[SiH2]C[SiH2]C(OCCC)OCCC XSQIIUIRFLIGDK-UHFFFAOYSA-N 0.000 description 1
- YRUQEAHQMALSGC-UHFFFAOYSA-N CCCOC(OCCC)[SiH2]C[Si](OCCC)(OCCC)OCCC Chemical compound CCCOC(OCCC)[SiH2]C[Si](OCCC)(OCCC)OCCC YRUQEAHQMALSGC-UHFFFAOYSA-N 0.000 description 1
- YSSSBLWXPKRDTH-UHFFFAOYSA-N COC(OC)[SiH2]CC[Si](OC)(OC)OC Chemical compound COC(OC)[SiH2]CC[Si](OC)(OC)OC YSSSBLWXPKRDTH-UHFFFAOYSA-N 0.000 description 1
- YNFUAKFWSCDJLB-UHFFFAOYSA-N ClC(C)O[Si](OCC)(C)CCCC Chemical compound ClC(C)O[Si](OCC)(C)CCCC YNFUAKFWSCDJLB-UHFFFAOYSA-N 0.000 description 1
- FHEUTCKMUGHCFE-UHFFFAOYSA-N ClC(CC)(CC)[SiH](Cl)C Chemical compound ClC(CC)(CC)[SiH](Cl)C FHEUTCKMUGHCFE-UHFFFAOYSA-N 0.000 description 1
- HMVWZRLARSAGQV-UHFFFAOYSA-N ClCCCO[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C Chemical compound ClCCCO[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C HMVWZRLARSAGQV-UHFFFAOYSA-N 0.000 description 1
- FNHMECNCIOTWND-UHFFFAOYSA-N ClC[SiH](Cl)CC(C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound ClC[SiH](Cl)CC(C1=CC=CC=C1)C1=CC=CC=C1 FNHMECNCIOTWND-UHFFFAOYSA-N 0.000 description 1
- NSTRUJLBJDQBBC-UHFFFAOYSA-N ClC[SiH](OC(C)C)CC(C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound ClC[SiH](OC(C)C)CC(C1=CC=CC=C1)C1=CC=CC=C1 NSTRUJLBJDQBBC-UHFFFAOYSA-N 0.000 description 1
- JNQCFNJLWQJJCN-UHFFFAOYSA-N ClC[SiH](OCC)CC(C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound ClC[SiH](OCC)CC(C1=CC=CC=C1)C1=CC=CC=C1 JNQCFNJLWQJJCN-UHFFFAOYSA-N 0.000 description 1
- JFFTZQIITZNYKT-UHFFFAOYSA-N ClC[SiH](OCCC)CC(C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound ClC[SiH](OCCC)CC(C1=CC=CC=C1)C1=CC=CC=C1 JFFTZQIITZNYKT-UHFFFAOYSA-N 0.000 description 1
- FMFJFCLERIGDMP-UHFFFAOYSA-N ClC[Si](OC(C)C)(C1=CC=CC=C1)C1=CC=CC=C1.ClC[Si](OC(C)C)(C=C)C=C Chemical compound ClC[Si](OC(C)C)(C1=CC=CC=C1)C1=CC=CC=C1.ClC[Si](OC(C)C)(C=C)C=C FMFJFCLERIGDMP-UHFFFAOYSA-N 0.000 description 1
- YYLLIJHXUHJATK-UHFFFAOYSA-N Cyclohexyl acetate Chemical compound CC(=O)OC1CCCCC1 YYLLIJHXUHJATK-UHFFFAOYSA-N 0.000 description 1
- ZAFNJMIOTHYJRJ-UHFFFAOYSA-N Diisopropyl ether Chemical compound CC(C)OC(C)C ZAFNJMIOTHYJRJ-UHFFFAOYSA-N 0.000 description 1
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical class C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 1
- JWMLBTPNKTWAAZ-UHFFFAOYSA-N IC(C)O[Si](OCC)(CCC1=CC=CC=C1)C Chemical compound IC(C)O[Si](OCC)(CCC1=CC=CC=C1)C JWMLBTPNKTWAAZ-UHFFFAOYSA-N 0.000 description 1
- YCIFPFJWHLKBGF-UHFFFAOYSA-N IC=C[Si](Cl)(C=C)C Chemical compound IC=C[Si](Cl)(C=C)C YCIFPFJWHLKBGF-UHFFFAOYSA-N 0.000 description 1
- YRRMOWXSASMDCO-UHFFFAOYSA-N ICC(C(C)(O[Si](OC(C)C)(OC(C)C)OC(C)C)C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound ICC(C(C)(O[Si](OC(C)C)(OC(C)C)OC(C)C)C1=CC=CC=C1)C1=CC=CC=C1 YRRMOWXSASMDCO-UHFFFAOYSA-N 0.000 description 1
- QBPJCOZGKSJTQS-UHFFFAOYSA-N ICC(C(C)(O[Si](OC(C)C)(OC(C)C)OC(C)C)C1CCCCC1)C1CCCCC1 Chemical compound ICC(C(C)(O[Si](OC(C)C)(OC(C)C)OC(C)C)C1CCCCC1)C1CCCCC1 QBPJCOZGKSJTQS-UHFFFAOYSA-N 0.000 description 1
- DPLIPVRONXFFHT-UHFFFAOYSA-N ICC(C(C)(O[Si](OC(C)C)(OC(C)C)OC(C)C)C=C)C=C Chemical compound ICC(C(C)(O[Si](OC(C)C)(OC(C)C)OC(C)C)C=C)C=C DPLIPVRONXFFHT-UHFFFAOYSA-N 0.000 description 1
- NZNNJGGTEGYZFR-UHFFFAOYSA-N ICCC(C)(O[Si](OC(C)C)(OC(C)C)OC(C)C)CC(C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound ICCC(C)(O[Si](OC(C)C)(OC(C)C)OC(C)C)CC(C1=CC=CC=C1)C1=CC=CC=C1 NZNNJGGTEGYZFR-UHFFFAOYSA-N 0.000 description 1
- LHQDEPAFPRBMBQ-UHFFFAOYSA-N ICCCO[Si](C=C)(C=C)C Chemical compound ICCCO[Si](C=C)(C=C)C LHQDEPAFPRBMBQ-UHFFFAOYSA-N 0.000 description 1
- VXBYCFQYYUWRKK-UHFFFAOYSA-N IC[SiH](Cl)CC(C1=CC=CC=C1)C1=CC=CC=C1 Chemical compound IC[SiH](Cl)CC(C1=CC=CC=C1)C1=CC=CC=C1 VXBYCFQYYUWRKK-UHFFFAOYSA-N 0.000 description 1
- MTOAAWRHPRRKBI-UHFFFAOYSA-N IC[Si](OC)(C(C)(C)C)C(C)(C)C.IC[Si](OC)(CCCC)CCCC Chemical compound IC[Si](OC)(C(C)(C)C)C(C)(C)C.IC[Si](OC)(CCCC)CCCC MTOAAWRHPRRKBI-UHFFFAOYSA-N 0.000 description 1
- SWPNQHBRTNDIAT-UHFFFAOYSA-N IC[Si](OCC)(C(C)(C)C)C(C)(C)C.IC[Si](OCC)(CCCC)CCCC Chemical compound IC[Si](OCC)(C(C)(C)C)C(C)(C)C.IC[Si](OCC)(CCCC)CCCC SWPNQHBRTNDIAT-UHFFFAOYSA-N 0.000 description 1
- BNIJDYREXQJPJW-UHFFFAOYSA-N IC[Si](OCC)(OCC)CC.IC[Si](OCC)(OCC)C Chemical compound IC[Si](OCC)(OCC)CC.IC[Si](OCC)(OCC)C BNIJDYREXQJPJW-UHFFFAOYSA-N 0.000 description 1
- 239000004166 Lanolin Substances 0.000 description 1
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- WRQNANDWMGAFTP-UHFFFAOYSA-N Methylacetoacetic acid Chemical compound COC(=O)CC(C)=O WRQNANDWMGAFTP-UHFFFAOYSA-N 0.000 description 1
- KWIUHFFTVRNATP-UHFFFAOYSA-O N,N,N-trimethylglycinium Chemical compound C[N+](C)(C)CC(O)=O KWIUHFFTVRNATP-UHFFFAOYSA-O 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- SEMFALABIAPQNF-UHFFFAOYSA-N N,N-diethylacetamide N-ethylacetamide Chemical compound CCNC(C)=O.CCN(CC)C(C)=O SEMFALABIAPQNF-UHFFFAOYSA-N 0.000 description 1
- FFDGPVCHZBVARC-UHFFFAOYSA-N N,N-dimethylglycine Chemical compound CN(C)CC(O)=O FFDGPVCHZBVARC-UHFFFAOYSA-N 0.000 description 1
- SUAKHGWARZSWIH-UHFFFAOYSA-N N,N‐diethylformamide Chemical compound CCN(CC)C=O SUAKHGWARZSWIH-UHFFFAOYSA-N 0.000 description 1
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 1
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 1
- UEEJHVSXFDXPFK-UHFFFAOYSA-N N-dimethylaminoethanol Chemical compound CN(C)CCO UEEJHVSXFDXPFK-UHFFFAOYSA-N 0.000 description 1
- HTLZVHNRZJPSMI-UHFFFAOYSA-N N-ethylpiperidine Chemical compound CCN1CCCCC1 HTLZVHNRZJPSMI-UHFFFAOYSA-N 0.000 description 1
- OHLUUHNLEMFGTQ-UHFFFAOYSA-N N-methylacetamide Chemical compound CNC(C)=O OHLUUHNLEMFGTQ-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- JKRZOJADNVOXPM-UHFFFAOYSA-N Oxalic acid dibutyl ester Chemical compound CCCCOC(=O)C(=O)OCCCC JKRZOJADNVOXPM-UHFFFAOYSA-N 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 229930040373 Paraformaldehyde Natural products 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- GOOHAUXETOMSMM-UHFFFAOYSA-N Propylene oxide Chemical group CC1CO1 GOOHAUXETOMSMM-UHFFFAOYSA-N 0.000 description 1
- 229910020175 SiOH Inorganic materials 0.000 description 1
- 229930182558 Sterol Natural products 0.000 description 1
- 229930006000 Sucrose Natural products 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 description 1
- GSCOPSVHEGTJRH-UHFFFAOYSA-J [Ti+4].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O Chemical compound [Ti+4].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O GSCOPSVHEGTJRH-UHFFFAOYSA-J 0.000 description 1
- OUFYDWUSSNDJMC-UHFFFAOYSA-N [diethoxy(ethyl)silyl] triethyl silicate Chemical compound CCO[Si](CC)(OCC)O[Si](OCC)(OCC)OCC OUFYDWUSSNDJMC-UHFFFAOYSA-N 0.000 description 1
- CAGQGWQXRKAJFX-UHFFFAOYSA-N [diethoxy(ethyl)silyl]-diethoxy-ethylsilane Chemical compound CCO[Si](CC)(OCC)[Si](CC)(OCC)OCC CAGQGWQXRKAJFX-UHFFFAOYSA-N 0.000 description 1
- LTKGRHTYZMRFDC-UHFFFAOYSA-N [diethoxy(ethyl)silyl]oxy-diethoxy-ethylsilane Chemical compound CCO[Si](CC)(OCC)O[Si](CC)(OCC)OCC LTKGRHTYZMRFDC-UHFFFAOYSA-N 0.000 description 1
- RWJOZDOPYLCIII-UHFFFAOYSA-N [diethoxy(methyl)silyl] triethyl silicate Chemical compound CCO[Si](C)(OCC)O[Si](OCC)(OCC)OCC RWJOZDOPYLCIII-UHFFFAOYSA-N 0.000 description 1
- OPHLEQJKSDAYRR-UHFFFAOYSA-N [diethoxy(methyl)silyl]oxy-diethoxy-methylsilane Chemical compound CCO[Si](C)(OCC)O[Si](C)(OCC)OCC OPHLEQJKSDAYRR-UHFFFAOYSA-N 0.000 description 1
- DCEBXHSHURUJAY-UHFFFAOYSA-N [diethoxy(phenyl)silyl]-diethoxy-phenylsilane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)[Si](OCC)(OCC)C1=CC=CC=C1 DCEBXHSHURUJAY-UHFFFAOYSA-N 0.000 description 1
- ADGIGASJNRINPY-UHFFFAOYSA-N [diethoxy(phenyl)silyl]oxy-diethoxy-phenylsilane Chemical compound C=1C=CC=CC=1[Si](OCC)(OCC)O[Si](OCC)(OCC)C1=CC=CC=C1 ADGIGASJNRINPY-UHFFFAOYSA-N 0.000 description 1
- KVOXQFWXJQZCJO-UHFFFAOYSA-N [diethyl(methoxy)silyl]-diethyl-methoxysilane Chemical compound CC[Si](CC)(OC)[Si](CC)(CC)OC KVOXQFWXJQZCJO-UHFFFAOYSA-N 0.000 description 1
- ZXTUPVQBBCBASF-UHFFFAOYSA-N [diethyl(phenoxy)silyl]-diethyl-phenoxysilane Chemical compound C=1C=CC=CC=1O[Si](CC)(CC)[Si](CC)(CC)OC1=CC=CC=C1 ZXTUPVQBBCBASF-UHFFFAOYSA-N 0.000 description 1
- HCASOGIIUWUYBT-UHFFFAOYSA-N [diethyl(phenoxy)silyl]oxy-diethyl-phenoxysilane Chemical compound C=1C=CC=CC=1O[Si](CC)(CC)O[Si](CC)(CC)OC1=CC=CC=C1 HCASOGIIUWUYBT-UHFFFAOYSA-N 0.000 description 1
- KAYBCXGMQWDTPM-UHFFFAOYSA-N [dimethoxy(methyl)silyl] trimethyl silicate Chemical compound CO[Si](C)(OC)O[Si](OC)(OC)OC KAYBCXGMQWDTPM-UHFFFAOYSA-N 0.000 description 1
- OCOJQBCZDTYVGH-UHFFFAOYSA-N [dimethoxy(phenyl)silyl] trimethyl silicate Chemical compound CO[Si](OC)(OC)O[Si](OC)(OC)C1=CC=CC=C1 OCOJQBCZDTYVGH-UHFFFAOYSA-N 0.000 description 1
- FJBYKPPJPGSLFX-UHFFFAOYSA-N [dimethyl(phenoxy)silyl]-dimethyl-phenoxysilane Chemical compound C=1C=CC=CC=1O[Si](C)(C)[Si](C)(C)OC1=CC=CC=C1 FJBYKPPJPGSLFX-UHFFFAOYSA-N 0.000 description 1
- RJPCFFMEJWSVLK-UHFFFAOYSA-N [dimethyl(phenoxy)silyl]oxy-dimethyl-phenoxysilane Chemical compound C=1C=CC=CC=1O[Si](C)(C)O[Si](C)(C)OC1=CC=CC=C1 RJPCFFMEJWSVLK-UHFFFAOYSA-N 0.000 description 1
- KGRRVFJMOKKXHY-UHFFFAOYSA-N [diphenoxy(phenyl)silyl] triphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)C=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 KGRRVFJMOKKXHY-UHFFFAOYSA-N 0.000 description 1
- GWDZTOMELWYJAW-UHFFFAOYSA-N [diphenoxy(phenyl)silyl]-diphenoxy-phenylsilane Chemical compound C=1C=CC=CC=1O[Si]([Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)C=1C=CC=CC=1)(C=1C=CC=CC=1)OC1=CC=CC=C1 GWDZTOMELWYJAW-UHFFFAOYSA-N 0.000 description 1
- JPMDJMXICBMIIB-UHFFFAOYSA-N [diphenoxy(phenyl)silyl]oxy-diphenoxy-phenylsilane Chemical compound C=1C=CC=CC=1O[Si](C=1C=CC=CC=1)(O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)C=1C=CC=CC=1)OC1=CC=CC=C1 JPMDJMXICBMIIB-UHFFFAOYSA-N 0.000 description 1
- GTERMDKMZQCDRP-UHFFFAOYSA-N [ethyl(dimethoxy)silyl] trimethyl silicate Chemical compound CC[Si](OC)(OC)O[Si](OC)(OC)OC GTERMDKMZQCDRP-UHFFFAOYSA-N 0.000 description 1
- ZLFZYLXOXHCFLI-UHFFFAOYSA-N [ethyl(diphenoxy)silyl] triphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC=1C=CC=CC=1)(CC)OC1=CC=CC=C1 ZLFZYLXOXHCFLI-UHFFFAOYSA-N 0.000 description 1
- OTEZVXDZQVSYNT-UHFFFAOYSA-N [methyl(diphenoxy)silyl] triphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC=1C=CC=CC=1)(C)OC1=CC=CC=C1 OTEZVXDZQVSYNT-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- XRLHGXGMYJNYCR-UHFFFAOYSA-N acetic acid;2-(2-hydroxypropoxy)propan-1-ol Chemical compound CC(O)=O.CC(O)COC(C)CO XRLHGXGMYJNYCR-UHFFFAOYSA-N 0.000 description 1
- 238000005903 acid hydrolysis reaction Methods 0.000 description 1
- 125000004423 acyloxy group Chemical group 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000003570 air Substances 0.000 description 1
- 150000003973 alkyl amines Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- MQPPCKJJFDNPHJ-UHFFFAOYSA-K aluminum;3-oxohexanoate Chemical compound [Al+3].CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O.CCCC(=O)CC([O-])=O MQPPCKJJFDNPHJ-UHFFFAOYSA-K 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 239000002280 amphoteric surfactant Substances 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 239000003849 aromatic solvent Substances 0.000 description 1
- 150000003851 azoles Chemical class 0.000 description 1
- IWRPVZROAXUNHU-UHFFFAOYSA-N benzhydryloxy(bromomethyl)silane Chemical compound BrC[SiH2]OC(C1=CC=CC=C1)C1=CC=CC=C1 IWRPVZROAXUNHU-UHFFFAOYSA-N 0.000 description 1
- PZWCMDONFQDORZ-UHFFFAOYSA-N benzhydryloxy(iodomethyl)silane Chemical compound IC[SiH2]OC(C1=CC=CC=C1)C1=CC=CC=C1 PZWCMDONFQDORZ-UHFFFAOYSA-N 0.000 description 1
- TWBUZCYRSGERMA-UHFFFAOYSA-N benzo[a]anthracen-1-yl(silyloxy)silane Chemical compound C1(=CC=CC2=CC=C3C=C4C=CC=CC4=CC3=C12)[SiH2]O[SiH3] TWBUZCYRSGERMA-UHFFFAOYSA-N 0.000 description 1
- 229940007550 benzyl acetate Drugs 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- 229960003237 betaine Drugs 0.000 description 1
- 150000001602 bicycloalkyls Chemical group 0.000 description 1
- ABJHVFFERIZNNC-UHFFFAOYSA-N bis(3-bicyclo[2.2.1]heptanyl)-dichlorosilane Chemical compound C1C(C2)CCC2C1[Si](Cl)(Cl)C1C(C2)CCC2C1 ABJHVFFERIZNNC-UHFFFAOYSA-N 0.000 description 1
- MYTLTFJZLSNUJK-UHFFFAOYSA-N bis(3-bicyclo[2.2.1]heptanyl)-diiodosilane Chemical compound C1C(C2)CCC2C1[Si](I)(I)C1C(C2)CCC2C1 MYTLTFJZLSNUJK-UHFFFAOYSA-N 0.000 description 1
- DTNFZDAFPVYRPI-UHFFFAOYSA-N bis(ethenyl)-diiodosilane Chemical compound C=C[Si](I)(I)C=C DTNFZDAFPVYRPI-UHFFFAOYSA-N 0.000 description 1
- GEVFICDEOWFKDU-UHFFFAOYSA-N bis[(2-methylpropan-2-yl)oxy]-di(propan-2-yl)silane Chemical compound CC(C)(C)O[Si](C(C)C)(OC(C)(C)C)C(C)C GEVFICDEOWFKDU-UHFFFAOYSA-N 0.000 description 1
- UQFDPFMHQDISLB-UHFFFAOYSA-N bis[(2-methylpropan-2-yl)oxy]-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](OC(C)(C)C)(OC(C)(C)C)C1=CC=CC=C1 UQFDPFMHQDISLB-UHFFFAOYSA-N 0.000 description 1
- NZJRLFDIDIUMPD-UHFFFAOYSA-N bis[(2-methylpropan-2-yl)oxy]-dipropylsilane Chemical compound CCC[Si](CCC)(OC(C)(C)C)OC(C)(C)C NZJRLFDIDIUMPD-UHFFFAOYSA-N 0.000 description 1
- DMAVYNCFCVFOQF-UHFFFAOYSA-N bis[(2-methylpropan-2-yl)oxy]methyl-[2-[bis[(2-methylpropan-2-yl)oxy]methylsilyl]ethyl]silane Chemical compound CC(C)(C)OC(OC(C)(C)C)[SiH2]CC[SiH2]C(OC(C)(C)C)OC(C)(C)C DMAVYNCFCVFOQF-UHFFFAOYSA-N 0.000 description 1
- ZYFYSGNGFCIFNT-UHFFFAOYSA-N bis[(2-methylpropan-2-yl)oxy]methylsilylmethyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)OC(OC(C)(C)C)[SiH2]C[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C ZYFYSGNGFCIFNT-UHFFFAOYSA-N 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- NIRUTWLZGUITFB-UHFFFAOYSA-N bromo(tributyl)silane Chemical compound CCCC[Si](Br)(CCCC)CCCC NIRUTWLZGUITFB-UHFFFAOYSA-N 0.000 description 1
- UMEZMIPAUCMHAL-UHFFFAOYSA-N bromo(tricyclohexyl)silane Chemical compound C1CCCCC1[Si](C1CCCCC1)(Br)C1CCCCC1 UMEZMIPAUCMHAL-UHFFFAOYSA-N 0.000 description 1
- UCKORWKZRPKRQE-UHFFFAOYSA-N bromo(triethyl)silane Chemical compound CC[Si](Br)(CC)CC UCKORWKZRPKRQE-UHFFFAOYSA-N 0.000 description 1
- IYYIVELXUANFED-UHFFFAOYSA-N bromo(trimethyl)silane Chemical compound C[Si](C)(C)Br IYYIVELXUANFED-UHFFFAOYSA-N 0.000 description 1
- VSCMNSZBNLOXNR-UHFFFAOYSA-N bromo(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(Br)C1=CC=CC=C1 VSCMNSZBNLOXNR-UHFFFAOYSA-N 0.000 description 1
- ODVTYMXHGWDQQC-UHFFFAOYSA-N bromo(tripropyl)silane Chemical compound CCC[Si](Br)(CCC)CCC ODVTYMXHGWDQQC-UHFFFAOYSA-N 0.000 description 1
- RFTYXVFXDBUXTD-UHFFFAOYSA-N bromo(tritert-butyl)silane Chemical compound CC(C)(C)[Si](Br)(C(C)(C)C)C(C)(C)C RFTYXVFXDBUXTD-UHFFFAOYSA-N 0.000 description 1
- SBSLQTZCZRAGDL-UHFFFAOYSA-N bromo-tri(propan-2-yl)silane Chemical compound CC(C)[Si](Br)(C(C)C)C(C)C SBSLQTZCZRAGDL-UHFFFAOYSA-N 0.000 description 1
- RCDRXEORMYCSKZ-UHFFFAOYSA-N bromo-tris(ethenyl)silane Chemical compound C=C[Si](Br)(C=C)C=C RCDRXEORMYCSKZ-UHFFFAOYSA-N 0.000 description 1
- GDANJLBBMYCWED-UHFFFAOYSA-N bromomethyl(2,2-dicyclohexylethoxy)silane Chemical compound BrC[SiH2]OCC(C1CCCCC1)C1CCCCC1 GDANJLBBMYCWED-UHFFFAOYSA-N 0.000 description 1
- YBLDHBVPQLMZJT-UHFFFAOYSA-N bromomethyl(2,2-diphenylethoxy)silane Chemical compound BrC[SiH2]OCC(C1=CC=CC=C1)C1=CC=CC=C1 YBLDHBVPQLMZJT-UHFFFAOYSA-N 0.000 description 1
- DLMGVJVICHFHND-UHFFFAOYSA-N bromomethyl(2-ethenylbut-3-enoxy)silane Chemical compound BrC[SiH2]OCC(C=C)C=C DLMGVJVICHFHND-UHFFFAOYSA-N 0.000 description 1
- CSMVDMSMUKICAN-UHFFFAOYSA-N bromomethyl(penta-1,4-dien-3-yloxy)silane Chemical compound BrC[SiH2]OC(C=C)C=C CSMVDMSMUKICAN-UHFFFAOYSA-N 0.000 description 1
- STQCQRWPIQGJMG-UHFFFAOYSA-N bromomethyl(tripropoxy)silane Chemical compound CCCO[Si](CBr)(OCCC)OCCC STQCQRWPIQGJMG-UHFFFAOYSA-N 0.000 description 1
- UDUYKKOSNBQVCL-UHFFFAOYSA-N bromomethyl-(2,2-diphenylethyl)-propan-2-yloxysilane Chemical compound BrC[SiH](OC(C)C)CC(C1=CC=CC=C1)C1=CC=CC=C1 UDUYKKOSNBQVCL-UHFFFAOYSA-N 0.000 description 1
- GZFRFMARGMVCGZ-UHFFFAOYSA-N bromomethyl-(2,2-diphenylethyl)-propoxysilane Chemical compound BrC[SiH](OCCC)CC(C1=CC=CC=C1)C1=CC=CC=C1 GZFRFMARGMVCGZ-UHFFFAOYSA-N 0.000 description 1
- YGJMPOYXAAQHHN-UHFFFAOYSA-N bromomethyl-(2-phenylethyl)-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CBr)(OC(C)C)CCC1=CC=CC=C1 YGJMPOYXAAQHHN-UHFFFAOYSA-N 0.000 description 1
- NFMULOCBNQVCTQ-UHFFFAOYSA-N bromomethyl-(2-phenylethyl)-dipropoxysilane Chemical compound CCCO[Si](CBr)(OCCC)CCC1=CC=CC=C1 NFMULOCBNQVCTQ-UHFFFAOYSA-N 0.000 description 1
- AZTACQMAYGKPCR-UHFFFAOYSA-N bromomethyl-bis(ethenyl)-propan-2-yloxysilane Chemical compound CC(C)O[Si](CBr)(C=C)C=C AZTACQMAYGKPCR-UHFFFAOYSA-N 0.000 description 1
- BQUMUESJHPFQOP-UHFFFAOYSA-N bromomethyl-bis(ethenyl)-propoxysilane Chemical compound CCCO[Si](CBr)(C=C)C=C BQUMUESJHPFQOP-UHFFFAOYSA-N 0.000 description 1
- SOBNQBHGYLZNLD-UHFFFAOYSA-N bromomethyl-bis(ethenyl)silane Chemical compound BrC[SiH](C=C)C=C SOBNQBHGYLZNLD-UHFFFAOYSA-N 0.000 description 1
- XLTXGAGVCQOKPB-UHFFFAOYSA-N bromomethyl-butyl-di(propan-2-yloxy)silane Chemical compound CCCC[Si](CBr)(OC(C)C)OC(C)C XLTXGAGVCQOKPB-UHFFFAOYSA-N 0.000 description 1
- HESRLKOCFOLOKJ-UHFFFAOYSA-N bromomethyl-butyl-diethoxysilane Chemical compound CCCC[Si](CBr)(OCC)OCC HESRLKOCFOLOKJ-UHFFFAOYSA-N 0.000 description 1
- QDLQKGWBVZKFTC-UHFFFAOYSA-N bromomethyl-butyl-dimethoxysilane Chemical compound CCCC[Si](CBr)(OC)OC QDLQKGWBVZKFTC-UHFFFAOYSA-N 0.000 description 1
- NZQSWNNDKOBKOK-UHFFFAOYSA-N bromomethyl-butyl-dipropoxysilane Chemical compound CCCC[Si](CBr)(OCCC)OCCC NZQSWNNDKOBKOK-UHFFFAOYSA-N 0.000 description 1
- WGFARCVOJOELIW-UHFFFAOYSA-N bromomethyl-chloro-bis(ethenyl)silane Chemical compound BrC[Si](Cl)(C=C)C=C WGFARCVOJOELIW-UHFFFAOYSA-N 0.000 description 1
- QANCTHLUTBRMDY-UHFFFAOYSA-N bromomethyl-chloro-di(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(CBr)C(C)C QANCTHLUTBRMDY-UHFFFAOYSA-N 0.000 description 1
- HJLGNZUGZNUOLU-UHFFFAOYSA-N bromomethyl-chloro-dicyclohexylsilane Chemical compound C1CCCCC1[Si](CBr)(Cl)C1CCCCC1 HJLGNZUGZNUOLU-UHFFFAOYSA-N 0.000 description 1
- LHUZHBGVHXGBAK-UHFFFAOYSA-N bromomethyl-chloro-diethylsilane Chemical compound CC[Si](Cl)(CC)CBr LHUZHBGVHXGBAK-UHFFFAOYSA-N 0.000 description 1
- GZWGXQIBZKTCBX-UHFFFAOYSA-N bromomethyl-chloro-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](CBr)(Cl)C1=CC=CC=C1 GZWGXQIBZKTCBX-UHFFFAOYSA-N 0.000 description 1
- FLKQGZMZFXLPRX-UHFFFAOYSA-N bromomethyl-chloro-dipropylsilane Chemical compound CCC[Si](Cl)(CBr)CCC FLKQGZMZFXLPRX-UHFFFAOYSA-N 0.000 description 1
- UPYWNNGXZXPTNF-UHFFFAOYSA-N bromomethyl-cyclohexyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CBr)(OC(C)C)C1CCCCC1 UPYWNNGXZXPTNF-UHFFFAOYSA-N 0.000 description 1
- DMUZCJNQHDRSBI-UHFFFAOYSA-N bromomethyl-cyclohexyl-diethoxysilane Chemical compound CCO[Si](CBr)(OCC)C1CCCCC1 DMUZCJNQHDRSBI-UHFFFAOYSA-N 0.000 description 1
- VYWDALKXVBDMHZ-UHFFFAOYSA-N bromomethyl-cyclohexyl-dimethoxysilane Chemical compound CO[Si](CBr)(OC)C1CCCCC1 VYWDALKXVBDMHZ-UHFFFAOYSA-N 0.000 description 1
- FQMLWWGDDLZLHM-UHFFFAOYSA-N bromomethyl-cyclohexyl-dipropoxysilane Chemical compound CCCO[Si](CBr)(OCCC)C1CCCCC1 FQMLWWGDDLZLHM-UHFFFAOYSA-N 0.000 description 1
- MZQPTXOJEWAOFJ-UHFFFAOYSA-N bromomethyl-di(propan-2-yl)-propan-2-yloxysilane Chemical compound CC(C)O[Si](CBr)(C(C)C)C(C)C MZQPTXOJEWAOFJ-UHFFFAOYSA-N 0.000 description 1
- XTRAGOWCBHESPW-UHFFFAOYSA-N bromomethyl-di(propan-2-yl)-propoxysilane Chemical compound CCCO[Si](CBr)(C(C)C)C(C)C XTRAGOWCBHESPW-UHFFFAOYSA-N 0.000 description 1
- IBZZREFMWRPWEB-UHFFFAOYSA-N bromomethyl-dibutyl-chlorosilane Chemical compound CCCC[Si](Cl)(CBr)CCCC IBZZREFMWRPWEB-UHFFFAOYSA-N 0.000 description 1
- XJJBCCMWILUBFV-UHFFFAOYSA-N bromomethyl-dibutyl-ethoxysilane Chemical compound CCCC[Si](CBr)(OCC)CCCC XJJBCCMWILUBFV-UHFFFAOYSA-N 0.000 description 1
- XGPOKHYXJKKQOP-UHFFFAOYSA-N bromomethyl-dibutyl-methoxysilane Chemical compound CCCC[Si](CBr)(OC)CCCC XGPOKHYXJKKQOP-UHFFFAOYSA-N 0.000 description 1
- JTPZXOFCORUFDP-UHFFFAOYSA-N bromomethyl-dibutyl-propan-2-yloxysilane Chemical compound CCCC[Si](CBr)(OC(C)C)CCCC JTPZXOFCORUFDP-UHFFFAOYSA-N 0.000 description 1
- DCHFXPFLMPCBKX-UHFFFAOYSA-N bromomethyl-dibutyl-propoxysilane Chemical compound CCCC[Si](CBr)(CCCC)OCCC DCHFXPFLMPCBKX-UHFFFAOYSA-N 0.000 description 1
- PVRHYJONQHNZPS-UHFFFAOYSA-N bromomethyl-dichloro-(2-phenylethyl)silane Chemical compound BrC[Si](Cl)(Cl)CCC1=CC=CC=C1 PVRHYJONQHNZPS-UHFFFAOYSA-N 0.000 description 1
- CDUWRABFRIYLKE-UHFFFAOYSA-N bromomethyl-dichloro-cyclohexylsilane Chemical compound BrC[Si](Cl)(Cl)C1CCCCC1 CDUWRABFRIYLKE-UHFFFAOYSA-N 0.000 description 1
- LBCVMUUJVOUZSD-UHFFFAOYSA-N bromomethyl-dichloro-phenylsilane Chemical compound BrC[Si](Cl)(Cl)C1=CC=CC=C1 LBCVMUUJVOUZSD-UHFFFAOYSA-N 0.000 description 1
- PNPMFKSSXMVCLZ-UHFFFAOYSA-N bromomethyl-dichloro-propan-2-ylsilane Chemical compound CC(C)[Si](Cl)(Cl)CBr PNPMFKSSXMVCLZ-UHFFFAOYSA-N 0.000 description 1
- SSCQVPRBRJKREG-UHFFFAOYSA-N bromomethyl-dicyclohexyl-methoxysilane Chemical compound C1CCCCC1[Si](CBr)(OC)C1CCCCC1 SSCQVPRBRJKREG-UHFFFAOYSA-N 0.000 description 1
- QUQNKAOZYKMXDM-UHFFFAOYSA-N bromomethyl-dicyclohexyl-propan-2-yloxysilane Chemical compound C1CCCCC1[Si](CBr)(OC(C)C)C1CCCCC1 QUQNKAOZYKMXDM-UHFFFAOYSA-N 0.000 description 1
- LNMRVQZSKOQDAC-UHFFFAOYSA-N bromomethyl-dicyclohexyl-propoxysilane Chemical compound C1CCCCC1[Si](CBr)(OCCC)C1CCCCC1 LNMRVQZSKOQDAC-UHFFFAOYSA-N 0.000 description 1
- JZRKKPXUALCOSE-UHFFFAOYSA-N bromomethyl-diethoxy-(2-phenylethyl)silane Chemical compound CCO[Si](CBr)(OCC)CCC1=CC=CC=C1 JZRKKPXUALCOSE-UHFFFAOYSA-N 0.000 description 1
- VIRHYWMKEJKKID-UHFFFAOYSA-N bromomethyl-diethoxy-ethylsilane Chemical compound CCO[Si](CC)(CBr)OCC VIRHYWMKEJKKID-UHFFFAOYSA-N 0.000 description 1
- NSUZHSVRVUKQKL-UHFFFAOYSA-N bromomethyl-diethoxy-propan-2-ylsilane Chemical compound CCO[Si](CBr)(C(C)C)OCC NSUZHSVRVUKQKL-UHFFFAOYSA-N 0.000 description 1
- GCXDIVPKJQSVJB-UHFFFAOYSA-N bromomethyl-diethoxy-propylsilane Chemical compound CCC[Si](CBr)(OCC)OCC GCXDIVPKJQSVJB-UHFFFAOYSA-N 0.000 description 1
- CGYFVZHLRKYDFX-UHFFFAOYSA-N bromomethyl-diethyl-methoxysilane Chemical compound CC[Si](CC)(CBr)OC CGYFVZHLRKYDFX-UHFFFAOYSA-N 0.000 description 1
- DSLPCKBGCBIILS-UHFFFAOYSA-N bromomethyl-diethyl-propoxysilane Chemical compound CCCO[Si](CC)(CC)CBr DSLPCKBGCBIILS-UHFFFAOYSA-N 0.000 description 1
- XSKOBJMKDYEYJI-UHFFFAOYSA-N bromomethyl-dimethoxy-(2-phenylethyl)silane Chemical compound CO[Si](CBr)(OC)CCC1=CC=CC=C1 XSKOBJMKDYEYJI-UHFFFAOYSA-N 0.000 description 1
- LRHAJOGWNWDFPH-UHFFFAOYSA-N bromomethyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(CBr)OC LRHAJOGWNWDFPH-UHFFFAOYSA-N 0.000 description 1
- YZHPCYDBQAEYLB-UHFFFAOYSA-N bromomethyl-dimethoxy-propan-2-ylsilane Chemical compound CO[Si](CBr)(OC)C(C)C YZHPCYDBQAEYLB-UHFFFAOYSA-N 0.000 description 1
- GNMSDTGFXMVVNF-UHFFFAOYSA-N bromomethyl-dimethyl-propan-2-yloxysilane Chemical compound CC(C)O[Si](C)(C)CBr GNMSDTGFXMVVNF-UHFFFAOYSA-N 0.000 description 1
- HIUWKNXBWCPNRF-UHFFFAOYSA-N bromomethyl-dimethyl-propoxysilane Chemical compound CCCO[Si](C)(C)CBr HIUWKNXBWCPNRF-UHFFFAOYSA-N 0.000 description 1
- DQVGEVQWXQGGCA-UHFFFAOYSA-N bromomethyl-diphenyl-propan-2-yloxysilane Chemical compound C=1C=CC=CC=1[Si](CBr)(OC(C)C)C1=CC=CC=C1 DQVGEVQWXQGGCA-UHFFFAOYSA-N 0.000 description 1
- NWJNWEJKZBAJSS-UHFFFAOYSA-N bromomethyl-diphenyl-propoxysilane Chemical compound C=1C=CC=CC=1[Si](CBr)(OCCC)C1=CC=CC=C1 NWJNWEJKZBAJSS-UHFFFAOYSA-N 0.000 description 1
- XMKHFUNFDBRZQR-UHFFFAOYSA-N bromomethyl-dipropoxy-propylsilane Chemical compound CCCO[Si](CBr)(CCC)OCCC XMKHFUNFDBRZQR-UHFFFAOYSA-N 0.000 description 1
- UCYMHBKHEFILCW-UHFFFAOYSA-N bromomethyl-ditert-butyl-chlorosilane Chemical compound CC(C)(C)[Si](Cl)(CBr)C(C)(C)C UCYMHBKHEFILCW-UHFFFAOYSA-N 0.000 description 1
- SUAUDMZQZIORRX-UHFFFAOYSA-N bromomethyl-ditert-butyl-ethoxysilane Chemical compound CCO[Si](CBr)(C(C)(C)C)C(C)(C)C SUAUDMZQZIORRX-UHFFFAOYSA-N 0.000 description 1
- RUSXUJNVDAWHIR-UHFFFAOYSA-N bromomethyl-ditert-butyl-methoxysilane Chemical compound CO[Si](CBr)(C(C)(C)C)C(C)(C)C RUSXUJNVDAWHIR-UHFFFAOYSA-N 0.000 description 1
- QVJYFTUENYXBPF-UHFFFAOYSA-N bromomethyl-ditert-butyl-propan-2-yloxysilane Chemical compound CC(C)O[Si](CBr)(C(C)(C)C)C(C)(C)C QVJYFTUENYXBPF-UHFFFAOYSA-N 0.000 description 1
- GODMINXISRFHRW-UHFFFAOYSA-N bromomethyl-ditert-butyl-propoxysilane Chemical compound CCCO[Si](CBr)(C(C)(C)C)C(C)(C)C GODMINXISRFHRW-UHFFFAOYSA-N 0.000 description 1
- NLDZLNVTOMEFAM-UHFFFAOYSA-N bromomethyl-ethoxy-di(propan-2-yl)silane Chemical compound CCO[Si](CBr)(C(C)C)C(C)C NLDZLNVTOMEFAM-UHFFFAOYSA-N 0.000 description 1
- SCJYCCKLVFQPBC-UHFFFAOYSA-N bromomethyl-ethoxy-diethylsilane Chemical compound CCO[Si](CC)(CC)CBr SCJYCCKLVFQPBC-UHFFFAOYSA-N 0.000 description 1
- CNTRZROSTQPQPP-UHFFFAOYSA-N bromomethyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)CBr CNTRZROSTQPQPP-UHFFFAOYSA-N 0.000 description 1
- NVSZGEJAJFMBNE-UHFFFAOYSA-N bromomethyl-ethoxy-dipropylsilane Chemical compound CCC[Si](CBr)(CCC)OCC NVSZGEJAJFMBNE-UHFFFAOYSA-N 0.000 description 1
- SCWMEZQNCKEMPL-UHFFFAOYSA-N bromomethyl-ethyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CBr)(CC)OC(C)C SCWMEZQNCKEMPL-UHFFFAOYSA-N 0.000 description 1
- QWVKNWOOBYOZQR-UHFFFAOYSA-N bromomethyl-ethyl-dimethoxysilane Chemical compound CC[Si](CBr)(OC)OC QWVKNWOOBYOZQR-UHFFFAOYSA-N 0.000 description 1
- UBFGGDRKEIGVOF-UHFFFAOYSA-N bromomethyl-ethyl-dipropoxysilane Chemical compound CCCO[Si](CC)(CBr)OCCC UBFGGDRKEIGVOF-UHFFFAOYSA-N 0.000 description 1
- GKKZIEMPNZPDHB-UHFFFAOYSA-N bromomethyl-methoxy-dipropylsilane Chemical compound CCC[Si](CBr)(OC)CCC GKKZIEMPNZPDHB-UHFFFAOYSA-N 0.000 description 1
- PGVNUIXWSLRGFW-UHFFFAOYSA-N bromomethyl-methyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(CBr)OC(C)C PGVNUIXWSLRGFW-UHFFFAOYSA-N 0.000 description 1
- AWVFSODIYYIRDQ-UHFFFAOYSA-N bromomethyl-methyl-dipropoxysilane Chemical compound CCCO[Si](C)(CBr)OCCC AWVFSODIYYIRDQ-UHFFFAOYSA-N 0.000 description 1
- BBJJBZKXFXZEQL-UHFFFAOYSA-N bromomethyl-phenyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CBr)(OC(C)C)C1=CC=CC=C1 BBJJBZKXFXZEQL-UHFFFAOYSA-N 0.000 description 1
- KTWVBHNXSQVZRS-UHFFFAOYSA-N bromomethyl-phenyl-dipropoxysilane Chemical compound CCCO[Si](CBr)(OCCC)C1=CC=CC=C1 KTWVBHNXSQVZRS-UHFFFAOYSA-N 0.000 description 1
- ZIBWGWGZHKZRQS-UHFFFAOYSA-N bromomethyl-propan-2-yl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CBr)(C(C)C)OC(C)C ZIBWGWGZHKZRQS-UHFFFAOYSA-N 0.000 description 1
- DKCLLMKXIJEKRC-UHFFFAOYSA-N bromomethyl-propan-2-yl-dipropoxysilane Chemical compound CCCO[Si](CBr)(C(C)C)OCCC DKCLLMKXIJEKRC-UHFFFAOYSA-N 0.000 description 1
- STLYYKUEFWXUDF-UHFFFAOYSA-N bromomethyl-propan-2-yloxy-dipropylsilane Chemical compound CCC[Si](CBr)(CCC)OC(C)C STLYYKUEFWXUDF-UHFFFAOYSA-N 0.000 description 1
- YSALXSKQRFQMAA-UHFFFAOYSA-N bromomethyl-propoxy-dipropylsilane Chemical compound CCCO[Si](CBr)(CCC)CCC YSALXSKQRFQMAA-UHFFFAOYSA-N 0.000 description 1
- IXCYWXXLJVJBGU-UHFFFAOYSA-N bromomethyl-tert-butyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CBr)(C(C)(C)C)OC(C)C IXCYWXXLJVJBGU-UHFFFAOYSA-N 0.000 description 1
- PWLDPMVUPXRZCL-UHFFFAOYSA-N bromomethyl-tert-butyl-dichlorosilane Chemical compound CC(C)(C)[Si](Cl)(Cl)CBr PWLDPMVUPXRZCL-UHFFFAOYSA-N 0.000 description 1
- AHNLMXFUFMYBJA-UHFFFAOYSA-N bromomethyl-tert-butyl-diethoxysilane Chemical compound CCO[Si](CBr)(C(C)(C)C)OCC AHNLMXFUFMYBJA-UHFFFAOYSA-N 0.000 description 1
- HOBSZFAIWRXCOO-UHFFFAOYSA-N bromomethyl-tert-butyl-dimethoxysilane Chemical compound CO[Si](CBr)(OC)C(C)(C)C HOBSZFAIWRXCOO-UHFFFAOYSA-N 0.000 description 1
- YPPWVSBYSIJTAB-UHFFFAOYSA-N bromomethyl-tert-butyl-dipropoxysilane Chemical compound CCCO[Si](CBr)(C(C)(C)C)OCCC YPPWVSBYSIJTAB-UHFFFAOYSA-N 0.000 description 1
- 125000004799 bromophenyl group Chemical group 0.000 description 1
- DZYAEFOBWNGVMJ-UHFFFAOYSA-N butan-2-yl 3-oxohexaneperoxoate;titanium Chemical compound [Ti].CCCC(=O)CC(=O)OOC(C)CC.CCCC(=O)CC(=O)OOC(C)CC DZYAEFOBWNGVMJ-UHFFFAOYSA-N 0.000 description 1
- XYYWGXUKGRATGR-UHFFFAOYSA-N butan-2-yl 3-oxohexaneperoxoate;zirconium Chemical compound [Zr].CCCC(=O)CC(=O)OOC(C)CC.CCCC(=O)CC(=O)OOC(C)CC XYYWGXUKGRATGR-UHFFFAOYSA-N 0.000 description 1
- LVTRKEHNNCDSFT-UHFFFAOYSA-N butan-2-yl(tributoxy)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C(C)CC LVTRKEHNNCDSFT-UHFFFAOYSA-N 0.000 description 1
- LQJIYGHLYACICO-UHFFFAOYSA-N butan-2-yl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C(C)CC LQJIYGHLYACICO-UHFFFAOYSA-N 0.000 description 1
- AMSAPKJTBARTTR-UHFFFAOYSA-N butan-2-yl(trimethoxy)silane Chemical compound CCC(C)[Si](OC)(OC)OC AMSAPKJTBARTTR-UHFFFAOYSA-N 0.000 description 1
- DNYVMXJXGNLANE-UHFFFAOYSA-N butan-2-yl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)C(C)CC DNYVMXJXGNLANE-UHFFFAOYSA-N 0.000 description 1
- WZOUXCVLNZOLFT-UHFFFAOYSA-N butan-2-yl-tri(butan-2-yloxy)silane Chemical compound CCC(C)O[Si](OC(C)CC)(OC(C)CC)C(C)CC WZOUXCVLNZOLFT-UHFFFAOYSA-N 0.000 description 1
- TWWATCWHACTGNY-UHFFFAOYSA-N butan-2-yl-tri(propan-2-yloxy)silane Chemical compound CCC(C)[Si](OC(C)C)(OC(C)C)OC(C)C TWWATCWHACTGNY-UHFFFAOYSA-N 0.000 description 1
- MTJISXQZLVVFLZ-UHFFFAOYSA-N butan-2-yl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CCC(C)[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C MTJISXQZLVVFLZ-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- ZTWFYPYDXBYIAY-UHFFFAOYSA-N butyl 3-oxohexaneperoxoate;titanium Chemical compound [Ti].CCCCOOC(=O)CC(=O)CCC.CCCCOOC(=O)CC(=O)CCC ZTWFYPYDXBYIAY-UHFFFAOYSA-N 0.000 description 1
- LLJNVGRIQKGYCB-UHFFFAOYSA-N butyl 3-oxohexaneperoxoate;zirconium Chemical compound [Zr].CCCCOOC(=O)CC(=O)CCC.CCCCOOC(=O)CC(=O)CCC LLJNVGRIQKGYCB-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- BTMVHUNTONAYDX-UHFFFAOYSA-N butyl propionate Chemical compound CCCCOC(=O)CC BTMVHUNTONAYDX-UHFFFAOYSA-N 0.000 description 1
- FQEKAFQSVPLXON-UHFFFAOYSA-N butyl(trichloro)silane Chemical compound CCCC[Si](Cl)(Cl)Cl FQEKAFQSVPLXON-UHFFFAOYSA-N 0.000 description 1
- XGZGKDQVCBHSGI-UHFFFAOYSA-N butyl(triethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)OCC XGZGKDQVCBHSGI-UHFFFAOYSA-N 0.000 description 1
- ZZZTWYAOPYYLPZ-UHFFFAOYSA-N butyl(triiodo)silane Chemical compound CCCC[Si](I)(I)I ZZZTWYAOPYYLPZ-UHFFFAOYSA-N 0.000 description 1
- SXPLZNMUBFBFIA-UHFFFAOYSA-N butyl(trimethoxy)silane Chemical compound CCCC[Si](OC)(OC)OC SXPLZNMUBFBFIA-UHFFFAOYSA-N 0.000 description 1
- OGCNPMTZBJEZKT-UHFFFAOYSA-N butyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(CCCC)OC1=CC=CC=C1 OGCNPMTZBJEZKT-UHFFFAOYSA-N 0.000 description 1
- GNRBSDIBKIHSJH-UHFFFAOYSA-N butyl(tripropoxy)silane Chemical compound CCCC[Si](OCCC)(OCCC)OCCC GNRBSDIBKIHSJH-UHFFFAOYSA-N 0.000 description 1
- KYAQHPLCUMBVBS-UHFFFAOYSA-N butyl-(chloromethyl)-di(propan-2-yloxy)silane Chemical compound CCCC[Si](CCl)(OC(C)C)OC(C)C KYAQHPLCUMBVBS-UHFFFAOYSA-N 0.000 description 1
- GEFMCDVNCPXLQZ-UHFFFAOYSA-N butyl-(chloromethyl)-dimethoxysilane Chemical compound CCCC[Si](CCl)(OC)OC GEFMCDVNCPXLQZ-UHFFFAOYSA-N 0.000 description 1
- KARRVKQNNKOGNW-UHFFFAOYSA-N butyl-(chloromethyl)-dipropoxysilane Chemical compound CCCC[Si](CCl)(OCCC)OCCC KARRVKQNNKOGNW-UHFFFAOYSA-N 0.000 description 1
- QUCICCVJFUOUOX-UHFFFAOYSA-N butyl-(iodomethyl)-di(propan-2-yloxy)silane Chemical compound CCCC[Si](CI)(OC(C)C)OC(C)C QUCICCVJFUOUOX-UHFFFAOYSA-N 0.000 description 1
- ZWZBYDPNMURCPV-UHFFFAOYSA-N butyl-(iodomethyl)-dimethoxysilane Chemical compound CCCC[Si](CI)(OC)OC ZWZBYDPNMURCPV-UHFFFAOYSA-N 0.000 description 1
- WJGLDLSDDVVYMG-UHFFFAOYSA-N butyl-(iodomethyl)-dipropoxysilane Chemical compound CCCC[Si](CI)(OCCC)OCCC WJGLDLSDDVVYMG-UHFFFAOYSA-N 0.000 description 1
- SCONKBXXBNJVGG-UHFFFAOYSA-N butyl-dichloro-(chloromethyl)silane Chemical compound CCCC[Si](Cl)(Cl)CCl SCONKBXXBNJVGG-UHFFFAOYSA-N 0.000 description 1
- VMTGEWHJIDTQII-UHFFFAOYSA-N butyl-dichloro-(iodomethyl)silane Chemical compound CCCC[Si](Cl)(Cl)CI VMTGEWHJIDTQII-UHFFFAOYSA-N 0.000 description 1
- VTJHYHJSGHWADV-UHFFFAOYSA-N butyl-diethoxy-(iodomethyl)silane Chemical compound CCCC[Si](CI)(OCC)OCC VTJHYHJSGHWADV-UHFFFAOYSA-N 0.000 description 1
- OOWHVJAPAMPBEX-UHFFFAOYSA-N butyl-tri(propan-2-yloxy)silane Chemical compound CCCC[Si](OC(C)C)(OC(C)C)OC(C)C OOWHVJAPAMPBEX-UHFFFAOYSA-N 0.000 description 1
- ZOKYFXXILHWZHP-UHFFFAOYSA-N butyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CCCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C ZOKYFXXILHWZHP-UHFFFAOYSA-N 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- UANDAQWXKUOGLV-UHFFFAOYSA-N chloro(tricyclohexyl)silane Chemical compound C1CCCCC1[Si](C1CCCCC1)(Cl)C1CCCCC1 UANDAQWXKUOGLV-UHFFFAOYSA-N 0.000 description 1
- MNKYQPOFRKPUAE-UHFFFAOYSA-N chloro(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(Cl)C1=CC=CC=C1 MNKYQPOFRKPUAE-UHFFFAOYSA-N 0.000 description 1
- ACTAPAGNZPZLEF-UHFFFAOYSA-N chloro(tripropyl)silane Chemical compound CCC[Si](Cl)(CCC)CCC ACTAPAGNZPZLEF-UHFFFAOYSA-N 0.000 description 1
- QWZHBTLWWJPWAQ-UHFFFAOYSA-N chloro-(1-chlorobutyl)-dimethylsilane Chemical compound CCCC(Cl)[Si](C)(C)Cl QWZHBTLWWJPWAQ-UHFFFAOYSA-N 0.000 description 1
- LDTNXTQIYVWANW-UHFFFAOYSA-N chloro-(1-chloroethyl)-dimethylsilane Chemical compound CC(Cl)[Si](C)(C)Cl LDTNXTQIYVWANW-UHFFFAOYSA-N 0.000 description 1
- CIWYLONAKPLWST-UHFFFAOYSA-N chloro-(1-chloroprop-2-enyl)-dimethylsilane Chemical compound C[Si](C)(Cl)C(Cl)C=C CIWYLONAKPLWST-UHFFFAOYSA-N 0.000 description 1
- MSDBSKFBKSORJY-UHFFFAOYSA-N chloro-(2-chlorobutan-2-yl)-dimethylsilane Chemical compound CCC(C)(Cl)[Si](C)(C)Cl MSDBSKFBKSORJY-UHFFFAOYSA-N 0.000 description 1
- ABLIUKLRISBYTB-UHFFFAOYSA-N chloro-(2-chloropropan-2-yl)-dimethylsilane Chemical compound CC(C)(Cl)[Si](C)(C)Cl ABLIUKLRISBYTB-UHFFFAOYSA-N 0.000 description 1
- CDETWOVJOOKBBK-UHFFFAOYSA-N chloro-(3-chloropentan-3-yl)-dimethylsilane Chemical compound CCC(Cl)(CC)[Si](C)(C)Cl CDETWOVJOOKBBK-UHFFFAOYSA-N 0.000 description 1
- KJDLVQITZPNRLY-UHFFFAOYSA-N chloro-(chloromethyl)-di(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(CCl)C(C)C KJDLVQITZPNRLY-UHFFFAOYSA-N 0.000 description 1
- QVEHHXPAYFHWOZ-UHFFFAOYSA-N chloro-(chloromethyl)-dicyclohexylsilane Chemical compound C1CCCCC1[Si](Cl)(CCl)C1CCCCC1 QVEHHXPAYFHWOZ-UHFFFAOYSA-N 0.000 description 1
- PQUOVFXWJWTLSC-UHFFFAOYSA-N chloro-(chloromethyl)-diethylsilane Chemical compound CC[Si](Cl)(CC)CCl PQUOVFXWJWTLSC-UHFFFAOYSA-N 0.000 description 1
- ASLUIKYXXGPKHH-UHFFFAOYSA-N chloro-(chloromethyl)-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](Cl)(CCl)C1=CC=CC=C1 ASLUIKYXXGPKHH-UHFFFAOYSA-N 0.000 description 1
- DUNRPBMGBOKDGU-UHFFFAOYSA-N chloro-(chloromethyl)-dipropylsilane Chemical compound CCC[Si](Cl)(CCl)CCC DUNRPBMGBOKDGU-UHFFFAOYSA-N 0.000 description 1
- OICVMMJHLFRGHF-UHFFFAOYSA-N chloro-(dichloromethyl)-dimethylsilane Chemical compound C[Si](C)(Cl)C(Cl)Cl OICVMMJHLFRGHF-UHFFFAOYSA-N 0.000 description 1
- OBAUBYNEXAARTD-UHFFFAOYSA-N chloro-(iodomethyl)-di(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(CI)C(C)C OBAUBYNEXAARTD-UHFFFAOYSA-N 0.000 description 1
- KGWOKUZTARGSFO-UHFFFAOYSA-N chloro-(iodomethyl)-dimethylsilane Chemical compound C[Si](C)(Cl)CI KGWOKUZTARGSFO-UHFFFAOYSA-N 0.000 description 1
- SEVRFMAQVMVAPM-UHFFFAOYSA-N chloro-(iodomethyl)-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](CI)(Cl)C1=CC=CC=C1 SEVRFMAQVMVAPM-UHFFFAOYSA-N 0.000 description 1
- FQOJTYOMMCEGGN-UHFFFAOYSA-N chloro-(iodomethyl)-dipropylsilane Chemical compound CCC[Si](Cl)(CI)CCC FQOJTYOMMCEGGN-UHFFFAOYSA-N 0.000 description 1
- CKNVNQHQPPZERM-UHFFFAOYSA-N chloro-bis(chloromethyl)-methylsilane Chemical compound ClC[Si](Cl)(C)CCl CKNVNQHQPPZERM-UHFFFAOYSA-N 0.000 description 1
- UDWIRYNMYXLRHU-UHFFFAOYSA-N chloro-dicyclohexyl-(iodomethyl)silane Chemical compound C1CCCCC1[Si](CI)(Cl)C1CCCCC1 UDWIRYNMYXLRHU-UHFFFAOYSA-N 0.000 description 1
- MSXWJXDJWDYPGC-UHFFFAOYSA-N chloro-diethyl-(iodomethyl)silane Chemical compound CC[Si](Cl)(CC)CI MSXWJXDJWDYPGC-UHFFFAOYSA-N 0.000 description 1
- OUQQOFBDJVVMIF-UHFFFAOYSA-N chloro-dimethyl-(trichloromethyl)silane Chemical compound C[Si](C)(Cl)C(Cl)(Cl)Cl OUQQOFBDJVVMIF-UHFFFAOYSA-N 0.000 description 1
- NNKJLYMBVRDUEI-UHFFFAOYSA-N chloro-tris(ethenyl)silane Chemical compound C=C[Si](Cl)(C=C)C=C NNKJLYMBVRDUEI-UHFFFAOYSA-N 0.000 description 1
- XTIDYLJILLWMIT-UHFFFAOYSA-N chloromethyl(2,2-diphenylethoxy)silane Chemical compound ClC[SiH2]OCC(C1=CC=CC=C1)C1=CC=CC=C1 XTIDYLJILLWMIT-UHFFFAOYSA-N 0.000 description 1
- ANNRLANIIOCZKA-UHFFFAOYSA-N chloromethyl(2-ethenylbut-3-enoxy)silane Chemical compound ClC[SiH2]OCC(C=C)C=C ANNRLANIIOCZKA-UHFFFAOYSA-N 0.000 description 1
- ZLUDTMYEELJPED-UHFFFAOYSA-N chloromethyl(tripropoxy)silane Chemical compound CCCO[Si](CCl)(OCCC)OCCC ZLUDTMYEELJPED-UHFFFAOYSA-N 0.000 description 1
- URGJXCLXVDVHQZ-UHFFFAOYSA-N chloromethyl-(2,2-diphenylethyl)-methoxysilane Chemical compound ClC[SiH](OC)CC(C1=CC=CC=C1)C1=CC=CC=C1 URGJXCLXVDVHQZ-UHFFFAOYSA-N 0.000 description 1
- OXFGBYNFVAFYHC-UHFFFAOYSA-N chloromethyl-(2-phenylethyl)-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CCl)(OC(C)C)CCC1=CC=CC=C1 OXFGBYNFVAFYHC-UHFFFAOYSA-N 0.000 description 1
- VNNPCCZHOUYAHA-UHFFFAOYSA-N chloromethyl-(2-phenylethyl)-dipropoxysilane Chemical compound CCCO[Si](CCl)(OCCC)CCC1=CC=CC=C1 VNNPCCZHOUYAHA-UHFFFAOYSA-N 0.000 description 1
- ZWBBLLHBAULVMR-UHFFFAOYSA-N chloromethyl-bis(ethenyl)-propoxysilane Chemical compound CCCO[Si](CCl)(C=C)C=C ZWBBLLHBAULVMR-UHFFFAOYSA-N 0.000 description 1
- SIWIVBLFGJXQOH-UHFFFAOYSA-N chloromethyl-cyclohexyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CCl)(OC(C)C)C1CCCCC1 SIWIVBLFGJXQOH-UHFFFAOYSA-N 0.000 description 1
- QSIPXEADEPJGDF-UHFFFAOYSA-N chloromethyl-cyclohexyl-diethoxysilane Chemical compound CCO[Si](CCl)(OCC)C1CCCCC1 QSIPXEADEPJGDF-UHFFFAOYSA-N 0.000 description 1
- SFVZVRICRBEKOS-UHFFFAOYSA-N chloromethyl-cyclohexyl-dimethoxysilane Chemical compound CO[Si](CCl)(OC)C1CCCCC1 SFVZVRICRBEKOS-UHFFFAOYSA-N 0.000 description 1
- NTRFIHCJLMQTIZ-UHFFFAOYSA-N chloromethyl-cyclohexyl-dipropoxysilane Chemical compound CCCO[Si](CCl)(OCCC)C1CCCCC1 NTRFIHCJLMQTIZ-UHFFFAOYSA-N 0.000 description 1
- FLSZIVZHKAOSQS-UHFFFAOYSA-N chloromethyl-di(propan-2-yl)-propan-2-yloxysilane Chemical compound CC(C)O[Si](CCl)(C(C)C)C(C)C FLSZIVZHKAOSQS-UHFFFAOYSA-N 0.000 description 1
- CHVRMMFYQKEEQZ-UHFFFAOYSA-N chloromethyl-di(propan-2-yl)-propoxysilane Chemical compound CCCO[Si](CCl)(C(C)C)C(C)C CHVRMMFYQKEEQZ-UHFFFAOYSA-N 0.000 description 1
- JRIGVWJHSYKBJW-UHFFFAOYSA-N chloromethyl-di(propan-2-yloxy)-propylsilane Chemical compound CCC[Si](CCl)(OC(C)C)OC(C)C JRIGVWJHSYKBJW-UHFFFAOYSA-N 0.000 description 1
- DVFJGKXIRDNHBC-UHFFFAOYSA-N chloromethyl-dicyclohexyl-ethoxysilane Chemical compound C1CCCCC1[Si](CCl)(OCC)C1CCCCC1 DVFJGKXIRDNHBC-UHFFFAOYSA-N 0.000 description 1
- BUNNJHPDKFRTHY-UHFFFAOYSA-N chloromethyl-dicyclohexyl-methoxysilane Chemical compound C1CCCCC1[Si](CCl)(OC)C1CCCCC1 BUNNJHPDKFRTHY-UHFFFAOYSA-N 0.000 description 1
- QBDCZJDVUUMHFK-UHFFFAOYSA-N chloromethyl-dicyclohexyl-propan-2-yloxysilane Chemical compound C1CCCCC1[Si](CCl)(OC(C)C)C1CCCCC1 QBDCZJDVUUMHFK-UHFFFAOYSA-N 0.000 description 1
- GOMGMGLSQAABQZ-UHFFFAOYSA-N chloromethyl-dicyclohexyl-propoxysilane Chemical compound C1CCCCC1[Si](CCl)(OCCC)C1CCCCC1 GOMGMGLSQAABQZ-UHFFFAOYSA-N 0.000 description 1
- IYCFKTFLTUHXAD-UHFFFAOYSA-N chloromethyl-diethoxy-(2-phenylethyl)silane Chemical compound CCO[Si](CCl)(OCC)CCC1=CC=CC=C1 IYCFKTFLTUHXAD-UHFFFAOYSA-N 0.000 description 1
- OMXTUFKRKSIKLP-UHFFFAOYSA-N chloromethyl-diethoxy-propan-2-ylsilane Chemical compound CCO[Si](CCl)(C(C)C)OCC OMXTUFKRKSIKLP-UHFFFAOYSA-N 0.000 description 1
- PYUAOEXEVRDIAR-UHFFFAOYSA-N chloromethyl-diethoxy-propylsilane Chemical compound CCC[Si](CCl)(OCC)OCC PYUAOEXEVRDIAR-UHFFFAOYSA-N 0.000 description 1
- VZUYKKFPSUWSLN-UHFFFAOYSA-N chloromethyl-diethyl-methoxysilane Chemical compound CC[Si](CC)(CCl)OC VZUYKKFPSUWSLN-UHFFFAOYSA-N 0.000 description 1
- YWSSATAFNFZVGY-UHFFFAOYSA-N chloromethyl-diethyl-propan-2-yloxysilane Chemical compound CC[Si](CC)(CCl)OC(C)C YWSSATAFNFZVGY-UHFFFAOYSA-N 0.000 description 1
- RHYNIQXSDTTWTG-UHFFFAOYSA-N chloromethyl-diethyl-propoxysilane Chemical compound CCCO[Si](CC)(CC)CCl RHYNIQXSDTTWTG-UHFFFAOYSA-N 0.000 description 1
- OKRNOKCKPYWRGS-UHFFFAOYSA-N chloromethyl-dimethoxy-(2-phenylethyl)silane Chemical compound CO[Si](CCl)(OC)CCC1=CC=CC=C1 OKRNOKCKPYWRGS-UHFFFAOYSA-N 0.000 description 1
- YHQOEGRVMXXOSO-UHFFFAOYSA-N chloromethyl-dimethoxy-propan-2-ylsilane Chemical compound CO[Si](CCl)(OC)C(C)C YHQOEGRVMXXOSO-UHFFFAOYSA-N 0.000 description 1
- JXLSCTQAGQRJON-UHFFFAOYSA-N chloromethyl-dimethoxy-propylsilane Chemical compound CCC[Si](CCl)(OC)OC JXLSCTQAGQRJON-UHFFFAOYSA-N 0.000 description 1
- KOTFCAKXPLOYLN-UHFFFAOYSA-N chloromethyl-dimethyl-propan-2-yloxysilane Chemical compound CC(C)O[Si](C)(C)CCl KOTFCAKXPLOYLN-UHFFFAOYSA-N 0.000 description 1
- IEIHLPASHDRSSR-UHFFFAOYSA-N chloromethyl-dipropoxy-propylsilane Chemical compound CCCO[Si](CCl)(CCC)OCCC IEIHLPASHDRSSR-UHFFFAOYSA-N 0.000 description 1
- HQRMLKQNQSODJV-UHFFFAOYSA-N chloromethyl-ethoxy-di(propan-2-yl)silane Chemical compound CCO[Si](CCl)(C(C)C)C(C)C HQRMLKQNQSODJV-UHFFFAOYSA-N 0.000 description 1
- VDJSDPRMWAFERJ-UHFFFAOYSA-N chloromethyl-ethoxy-dipropylsilane Chemical compound CCC[Si](CCl)(CCC)OCC VDJSDPRMWAFERJ-UHFFFAOYSA-N 0.000 description 1
- WTIZVMXIBMVXEJ-UHFFFAOYSA-N chloromethyl-ethyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CCl)(CC)OC(C)C WTIZVMXIBMVXEJ-UHFFFAOYSA-N 0.000 description 1
- SEMHPFVJBHWDNA-UHFFFAOYSA-N chloromethyl-ethyl-dimethoxysilane Chemical compound CC[Si](CCl)(OC)OC SEMHPFVJBHWDNA-UHFFFAOYSA-N 0.000 description 1
- VXEJARMJIAGBOF-UHFFFAOYSA-N chloromethyl-ethyl-dipropoxysilane Chemical compound CCCO[Si](CC)(CCl)OCCC VXEJARMJIAGBOF-UHFFFAOYSA-N 0.000 description 1
- SLDISRQNMDTBDO-UHFFFAOYSA-N chloromethyl-methoxy-di(propan-2-yl)silane Chemical compound CO[Si](CCl)(C(C)C)C(C)C SLDISRQNMDTBDO-UHFFFAOYSA-N 0.000 description 1
- KXANSEMGSZAWNC-UHFFFAOYSA-N chloromethyl-methoxy-dipropylsilane Chemical compound CCC[Si](CCl)(OC)CCC KXANSEMGSZAWNC-UHFFFAOYSA-N 0.000 description 1
- MBMGVWYVXMKKHZ-UHFFFAOYSA-N chloromethyl-methyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(CCl)OC(C)C MBMGVWYVXMKKHZ-UHFFFAOYSA-N 0.000 description 1
- VSGZNEFWUHPJCQ-UHFFFAOYSA-N chloromethyl-methyl-dipropoxysilane Chemical compound CCCO[Si](C)(CCl)OCCC VSGZNEFWUHPJCQ-UHFFFAOYSA-N 0.000 description 1
- IKDFAPHTXUQMBG-UHFFFAOYSA-N chloromethyl-phenyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CCl)(OC(C)C)C1=CC=CC=C1 IKDFAPHTXUQMBG-UHFFFAOYSA-N 0.000 description 1
- GHYVLUHNYICZML-UHFFFAOYSA-N chloromethyl-phenyl-dipropoxysilane Chemical compound CCCO[Si](CCl)(OCCC)C1=CC=CC=C1 GHYVLUHNYICZML-UHFFFAOYSA-N 0.000 description 1
- NSNDVWMAFGXCNI-UHFFFAOYSA-N chloromethyl-propan-2-yl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CCl)(C(C)C)OC(C)C NSNDVWMAFGXCNI-UHFFFAOYSA-N 0.000 description 1
- KNFWQLSVKYNJMS-UHFFFAOYSA-N chloromethyl-propan-2-yl-dipropoxysilane Chemical compound CCCO[Si](CCl)(C(C)C)OCCC KNFWQLSVKYNJMS-UHFFFAOYSA-N 0.000 description 1
- KOLIDISDUVLFLA-UHFFFAOYSA-N chloromethyl-propan-2-yloxy-dipropylsilane Chemical compound CCC[Si](CCl)(CCC)OC(C)C KOLIDISDUVLFLA-UHFFFAOYSA-N 0.000 description 1
- HRYVNKWBBROQTM-UHFFFAOYSA-N chloromethyl-propoxy-dipropylsilane Chemical compound CCCO[Si](CCl)(CCC)CCC HRYVNKWBBROQTM-UHFFFAOYSA-N 0.000 description 1
- 125000000068 chlorophenyl group Chemical group 0.000 description 1
- 239000007859 condensation product Substances 0.000 description 1
- 238000006482 condensation reaction Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 125000000392 cycloalkenyl group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- FFQYMTMKMLRXLJ-UHFFFAOYSA-N cyclohexanol;phenol Chemical compound OC1CCCCC1.OC1=CC=CC=C1 FFQYMTMKMLRXLJ-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- JBRYJXBKXCCHFV-UHFFFAOYSA-N cyclohexyl(triiodo)silane Chemical compound I[Si](I)(I)C1CCCCC1 JBRYJXBKXCCHFV-UHFFFAOYSA-N 0.000 description 1
- OUGLCFCJCFMLQV-UHFFFAOYSA-N cyclohexyl-(iodomethyl)-dimethoxysilane Chemical compound CO[Si](CI)(OC)C1CCCCC1 OUGLCFCJCFMLQV-UHFFFAOYSA-N 0.000 description 1
- BBDSSXGHAZNAMQ-UHFFFAOYSA-N cyclohexyl-(iodomethyl)-dipropoxysilane Chemical compound CCCO[Si](CI)(OCCC)C1CCCCC1 BBDSSXGHAZNAMQ-UHFFFAOYSA-N 0.000 description 1
- QSKSGWFGAPUVSP-UHFFFAOYSA-N cyclohexyl-diethoxy-(iodomethyl)silane Chemical compound CCO[Si](CI)(OCC)C1CCCCC1 QSKSGWFGAPUVSP-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 1
- INCWXJJLDMUTOS-UHFFFAOYSA-N decan-1-amine nonan-1-amine Chemical compound C(CCCCCCCCC)N.C(CCCCCCCC)N INCWXJJLDMUTOS-UHFFFAOYSA-N 0.000 description 1
- 238000007872 degassing Methods 0.000 description 1
- 239000000412 dendrimer Substances 0.000 description 1
- 229920000736 dendritic polymer Polymers 0.000 description 1
- VTYMPZNKHJYGEH-UHFFFAOYSA-N di(butan-2-yl)-bis[(2-methylpropan-2-yl)oxy]silane Chemical compound CCC(C)[Si](OC(C)(C)C)(OC(C)(C)C)C(C)CC VTYMPZNKHJYGEH-UHFFFAOYSA-N 0.000 description 1
- ZDYWFCBPMBXAJR-UHFFFAOYSA-N di(butan-2-yl)-di(butan-2-yloxy)silane Chemical compound CCC(C)O[Si](C(C)CC)(C(C)CC)OC(C)CC ZDYWFCBPMBXAJR-UHFFFAOYSA-N 0.000 description 1
- SNEGIHORRGJSED-UHFFFAOYSA-N di(butan-2-yl)-di(propan-2-yloxy)silane Chemical compound CCC(C)[Si](OC(C)C)(OC(C)C)C(C)CC SNEGIHORRGJSED-UHFFFAOYSA-N 0.000 description 1
- RHPPDKHKHGQLHP-UHFFFAOYSA-N di(butan-2-yl)-dibutoxysilane Chemical compound CCCCO[Si](C(C)CC)(C(C)CC)OCCCC RHPPDKHKHGQLHP-UHFFFAOYSA-N 0.000 description 1
- VSLASQQLPGVYSK-UHFFFAOYSA-N di(butan-2-yl)-diethoxysilane Chemical compound CCO[Si](OCC)(C(C)CC)C(C)CC VSLASQQLPGVYSK-UHFFFAOYSA-N 0.000 description 1
- HVHRIKGOFGJBFM-UHFFFAOYSA-N di(butan-2-yl)-dimethoxysilane Chemical compound CCC(C)[Si](OC)(OC)C(C)CC HVHRIKGOFGJBFM-UHFFFAOYSA-N 0.000 description 1
- CUNCIGAMQTWZFC-UHFFFAOYSA-N di(butan-2-yl)-diphenoxysilane Chemical compound C=1C=CC=CC=1O[Si](C(C)CC)(C(C)CC)OC1=CC=CC=C1 CUNCIGAMQTWZFC-UHFFFAOYSA-N 0.000 description 1
- LAGUJICBGGFHSR-UHFFFAOYSA-N di(butan-2-yl)-dipropoxysilane Chemical compound CCCO[Si](C(C)CC)(C(C)CC)OCCC LAGUJICBGGFHSR-UHFFFAOYSA-N 0.000 description 1
- NTABREFATMHOMD-UHFFFAOYSA-N di(butan-2-yloxy)-di(propan-2-yl)silane Chemical compound CCC(C)O[Si](C(C)C)(C(C)C)OC(C)CC NTABREFATMHOMD-UHFFFAOYSA-N 0.000 description 1
- BRUBSFJFECVMDK-UHFFFAOYSA-N di(butan-2-yloxy)-dibutylsilane Chemical compound CCCC[Si](CCCC)(OC(C)CC)OC(C)CC BRUBSFJFECVMDK-UHFFFAOYSA-N 0.000 description 1
- UMFDNQISZRRQHX-UHFFFAOYSA-N di(butan-2-yloxy)-diethylsilane Chemical compound CCC(C)O[Si](CC)(CC)OC(C)CC UMFDNQISZRRQHX-UHFFFAOYSA-N 0.000 description 1
- DERJYZOBOMCDCS-UHFFFAOYSA-N di(butan-2-yloxy)-dimethylsilane Chemical compound CCC(C)O[Si](C)(C)OC(C)CC DERJYZOBOMCDCS-UHFFFAOYSA-N 0.000 description 1
- MCTLKEGMWAHKOY-UHFFFAOYSA-N di(butan-2-yloxy)-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](OC(C)CC)(OC(C)CC)C1=CC=CC=C1 MCTLKEGMWAHKOY-UHFFFAOYSA-N 0.000 description 1
- VMIHKBXLARWWKA-UHFFFAOYSA-N di(butan-2-yloxy)-dipropylsilane Chemical compound CCC(C)O[Si](CCC)(CCC)OC(C)CC VMIHKBXLARWWKA-UHFFFAOYSA-N 0.000 description 1
- RLSUVIXGIBHTCN-UHFFFAOYSA-N di(butan-2-yloxy)-ditert-butylsilane Chemical compound CCC(C)O[Si](C(C)(C)C)(C(C)(C)C)OC(C)CC RLSUVIXGIBHTCN-UHFFFAOYSA-N 0.000 description 1
- YYBOVRLSYSVAKE-UHFFFAOYSA-N di(butan-2-yloxy)methyl-[2-[di(butan-2-yloxy)methylsilyl]ethyl]silane Chemical compound CCC(C)OC(OC(C)CC)[SiH2]CC[SiH2]C(OC(C)CC)OC(C)CC YYBOVRLSYSVAKE-UHFFFAOYSA-N 0.000 description 1
- XVCNAZQXIVBYAD-UHFFFAOYSA-N di(propan-2-yl)-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C(C)C)(C(C)C)OC(C)C XVCNAZQXIVBYAD-UHFFFAOYSA-N 0.000 description 1
- LLBLHAHQBJSHED-UHFFFAOYSA-N di(propan-2-yl)-dipropoxysilane Chemical compound CCCO[Si](C(C)C)(C(C)C)OCCC LLBLHAHQBJSHED-UHFFFAOYSA-N 0.000 description 1
- SABOFMXVPLSZCY-UHFFFAOYSA-N dibromo(dibutyl)silane Chemical compound CCCC[Si](Br)(Br)CCCC SABOFMXVPLSZCY-UHFFFAOYSA-N 0.000 description 1
- ATLTUPOAGVFJLN-UHFFFAOYSA-N dibromo(dicyclohexyl)silane Chemical compound C1CCCCC1[Si](Br)(Br)C1CCCCC1 ATLTUPOAGVFJLN-UHFFFAOYSA-N 0.000 description 1
- SRIHMZCTDWKFTQ-UHFFFAOYSA-N dibromo(diethyl)silane Chemical compound CC[Si](Br)(Br)CC SRIHMZCTDWKFTQ-UHFFFAOYSA-N 0.000 description 1
- LIQOCGKQCFXKLF-UHFFFAOYSA-N dibromo(dimethyl)silane Chemical compound C[Si](C)(Br)Br LIQOCGKQCFXKLF-UHFFFAOYSA-N 0.000 description 1
- DBUGVTOEUNNUHR-UHFFFAOYSA-N dibromo(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](Br)(Br)C1=CC=CC=C1 DBUGVTOEUNNUHR-UHFFFAOYSA-N 0.000 description 1
- FACMOIAJYPLXNK-UHFFFAOYSA-N dibromo(dipropyl)silane Chemical compound CCC[Si](Br)(Br)CCC FACMOIAJYPLXNK-UHFFFAOYSA-N 0.000 description 1
- CUFFHDAUJYCESV-UHFFFAOYSA-N dibromo(ditert-butyl)silane Chemical compound CC(C)(C)[Si](Br)(Br)C(C)(C)C CUFFHDAUJYCESV-UHFFFAOYSA-N 0.000 description 1
- ZZMLNUZQBBSGHT-UHFFFAOYSA-N dibromo-bis(ethenyl)silane Chemical compound C=C[Si](Br)(Br)C=C ZZMLNUZQBBSGHT-UHFFFAOYSA-N 0.000 description 1
- DIYXTCJLSUWQKJ-UHFFFAOYSA-N dibromo-di(propan-2-yl)silane Chemical compound CC(C)[Si](Br)(Br)C(C)C DIYXTCJLSUWQKJ-UHFFFAOYSA-N 0.000 description 1
- URSLNVMUSKPBTL-UHFFFAOYSA-N dibutoxy(dibutyl)silane Chemical compound CCCCO[Si](CCCC)(CCCC)OCCCC URSLNVMUSKPBTL-UHFFFAOYSA-N 0.000 description 1
- MGQFVQQCNPBJKC-UHFFFAOYSA-N dibutoxy(diethyl)silane Chemical compound CCCCO[Si](CC)(CC)OCCCC MGQFVQQCNPBJKC-UHFFFAOYSA-N 0.000 description 1
- GQNWJCQWBFHQAO-UHFFFAOYSA-N dibutoxy(dimethyl)silane Chemical compound CCCCO[Si](C)(C)OCCCC GQNWJCQWBFHQAO-UHFFFAOYSA-N 0.000 description 1
- OSMIWEAIYFILPL-UHFFFAOYSA-N dibutoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](OCCCC)(OCCCC)C1=CC=CC=C1 OSMIWEAIYFILPL-UHFFFAOYSA-N 0.000 description 1
- BKGSSPASYNBWRR-UHFFFAOYSA-N dibutoxy(dipropyl)silane Chemical compound CCCCO[Si](CCC)(CCC)OCCCC BKGSSPASYNBWRR-UHFFFAOYSA-N 0.000 description 1
- JKCIXCWGOYSFPF-UHFFFAOYSA-N dibutoxy(ditert-butyl)silane Chemical compound CCCCO[Si](C(C)(C)C)(C(C)(C)C)OCCCC JKCIXCWGOYSFPF-UHFFFAOYSA-N 0.000 description 1
- WOMDWSFYXGEOTE-UHFFFAOYSA-N dibutoxy-di(propan-2-yl)silane Chemical compound CCCCO[Si](C(C)C)(C(C)C)OCCCC WOMDWSFYXGEOTE-UHFFFAOYSA-N 0.000 description 1
- NJKDOKBDBHYMAH-UHFFFAOYSA-N dibutyl(dichloro)silane Chemical compound CCCC[Si](Cl)(Cl)CCCC NJKDOKBDBHYMAH-UHFFFAOYSA-N 0.000 description 1
- DGPFXVBYDAVXLX-UHFFFAOYSA-N dibutyl(diethoxy)silane Chemical compound CCCC[Si](OCC)(OCC)CCCC DGPFXVBYDAVXLX-UHFFFAOYSA-N 0.000 description 1
- IYQUDDDOUFYYGJ-UHFFFAOYSA-N dibutyl(diiodo)silane Chemical compound CCCC[Si](I)(I)CCCC IYQUDDDOUFYYGJ-UHFFFAOYSA-N 0.000 description 1
- YPENMAABQGWRBR-UHFFFAOYSA-N dibutyl(dimethoxy)silane Chemical compound CCCC[Si](OC)(OC)CCCC YPENMAABQGWRBR-UHFFFAOYSA-N 0.000 description 1
- QDMXGHLVHDTPAA-UHFFFAOYSA-N dibutyl(diphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](CCCC)(CCCC)OC1=CC=CC=C1 QDMXGHLVHDTPAA-UHFFFAOYSA-N 0.000 description 1
- VYDQISPYIVQXTM-UHFFFAOYSA-N dibutyl-(iodomethyl)-propan-2-yloxysilane Chemical compound CCCC[Si](CI)(OC(C)C)CCCC VYDQISPYIVQXTM-UHFFFAOYSA-N 0.000 description 1
- NJHBZQNPTRGQRV-UHFFFAOYSA-N dibutyl-(iodomethyl)-propoxysilane Chemical compound CCCC[Si](CI)(CCCC)OCCC NJHBZQNPTRGQRV-UHFFFAOYSA-N 0.000 description 1
- PYWGKTHCDIBIGL-UHFFFAOYSA-N dibutyl-bis[(2-methylpropan-2-yl)oxy]silane Chemical compound CCCC[Si](OC(C)(C)C)(OC(C)(C)C)CCCC PYWGKTHCDIBIGL-UHFFFAOYSA-N 0.000 description 1
- IFOJEKCCCHHVTB-UHFFFAOYSA-N dibutyl-chloro-(iodomethyl)silane Chemical compound CCCC[Si](Cl)(CI)CCCC IFOJEKCCCHHVTB-UHFFFAOYSA-N 0.000 description 1
- VNIJTNBFIJHUCJ-UHFFFAOYSA-N dibutyl-di(propan-2-yloxy)silane Chemical compound CCCC[Si](OC(C)C)(OC(C)C)CCCC VNIJTNBFIJHUCJ-UHFFFAOYSA-N 0.000 description 1
- JQVDAXLFBXTEQA-UHFFFAOYSA-N dibutylamine Chemical compound CCCCNCCCC JQVDAXLFBXTEQA-UHFFFAOYSA-N 0.000 description 1
- WRDFULWNJMORRB-UHFFFAOYSA-N dichloro(3-iodoprop-1-enyl)silane Chemical compound ICC=C[SiH](Cl)Cl WRDFULWNJMORRB-UHFFFAOYSA-N 0.000 description 1
- IESPKCNRKMAVIB-UHFFFAOYSA-N dichloro(dicyclohexyl)silane Chemical compound C1CCCCC1[Si](Cl)(Cl)C1CCCCC1 IESPKCNRKMAVIB-UHFFFAOYSA-N 0.000 description 1
- UOZZKLIPYZQXEP-UHFFFAOYSA-N dichloro(dipropyl)silane Chemical compound CCC[Si](Cl)(Cl)CCC UOZZKLIPYZQXEP-UHFFFAOYSA-N 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- MCEIYMLETGGHIF-UHFFFAOYSA-N dichloro-(1-chlorobutyl)-methylsilane Chemical compound CCCC(Cl)[Si](C)(Cl)Cl MCEIYMLETGGHIF-UHFFFAOYSA-N 0.000 description 1
- DOMFCJHYKYJCCA-UHFFFAOYSA-N dichloro-(1-chloroethyl)-methylsilane Chemical compound CC(Cl)[Si](C)(Cl)Cl DOMFCJHYKYJCCA-UHFFFAOYSA-N 0.000 description 1
- DGYISFYBQNGXHM-UHFFFAOYSA-N dichloro-(1-chloroprop-2-enyl)-methylsilane Chemical compound C[Si](Cl)(Cl)C(Cl)C=C DGYISFYBQNGXHM-UHFFFAOYSA-N 0.000 description 1
- KKJKUOFGPRHBSA-UHFFFAOYSA-N dichloro-(1-chloropropyl)-methylsilane Chemical compound CCC(Cl)[Si](C)(Cl)Cl KKJKUOFGPRHBSA-UHFFFAOYSA-N 0.000 description 1
- ZPRUATUTMDPCBB-UHFFFAOYSA-N dichloro-(2-chlorobutan-2-yl)-methylsilane Chemical compound CCC(C)(Cl)[Si](C)(Cl)Cl ZPRUATUTMDPCBB-UHFFFAOYSA-N 0.000 description 1
- YBVHXNCGCINFQD-UHFFFAOYSA-N dichloro-(2-chloropropan-2-yl)-methylsilane Chemical compound CC(C)(Cl)[Si](C)(Cl)Cl YBVHXNCGCINFQD-UHFFFAOYSA-N 0.000 description 1
- VRTJBZCDEZQBJV-UHFFFAOYSA-N dichloro-(chloromethyl)-(2-phenylethyl)silane Chemical compound ClC[Si](Cl)(Cl)CCC1=CC=CC=C1 VRTJBZCDEZQBJV-UHFFFAOYSA-N 0.000 description 1
- OZTZTXVBNIGKNZ-UHFFFAOYSA-N dichloro-(chloromethyl)-cyclohexylsilane Chemical compound ClC[Si](Cl)(Cl)C1CCCCC1 OZTZTXVBNIGKNZ-UHFFFAOYSA-N 0.000 description 1
- CVEMLWFWUYRHKO-UHFFFAOYSA-N dichloro-(chloromethyl)-propan-2-ylsilane Chemical compound CC(C)[Si](Cl)(Cl)CCl CVEMLWFWUYRHKO-UHFFFAOYSA-N 0.000 description 1
- VTDSXKCWKYUIMK-UHFFFAOYSA-N dichloro-(chloromethyl)-propylsilane Chemical compound CCC[Si](Cl)(Cl)CCl VTDSXKCWKYUIMK-UHFFFAOYSA-N 0.000 description 1
- QHLZAGNHECDRBQ-UHFFFAOYSA-N dichloro-(iodomethyl)-(2-phenylethyl)silane Chemical compound IC[Si](Cl)(Cl)CCC1=CC=CC=C1 QHLZAGNHECDRBQ-UHFFFAOYSA-N 0.000 description 1
- MRORMUJGNIGOKW-UHFFFAOYSA-N dichloro-(iodomethyl)-methylsilane Chemical compound C[Si](Cl)(Cl)CI MRORMUJGNIGOKW-UHFFFAOYSA-N 0.000 description 1
- KAPVAFSSDHAWJE-UHFFFAOYSA-N dichloro-(iodomethyl)-phenylsilane Chemical compound IC[Si](Cl)(Cl)C1=CC=CC=C1 KAPVAFSSDHAWJE-UHFFFAOYSA-N 0.000 description 1
- IHWAAWDVEFWDNJ-UHFFFAOYSA-N dichloro-(iodomethyl)-propan-2-ylsilane Chemical compound CC(C)[Si](Cl)(Cl)CI IHWAAWDVEFWDNJ-UHFFFAOYSA-N 0.000 description 1
- SYXUTPRQLZGOLC-UHFFFAOYSA-N dichloro-(iodomethyl)-propylsilane Chemical compound CCC[Si](Cl)(Cl)CI SYXUTPRQLZGOLC-UHFFFAOYSA-N 0.000 description 1
- COHMKHHPCFCFPA-UHFFFAOYSA-N dichloro-bis(2-phenylethyl)silane Chemical compound C=1C=CC=CC=1CC[Si](Cl)(Cl)CCC1=CC=CC=C1 COHMKHHPCFCFPA-UHFFFAOYSA-N 0.000 description 1
- MAYIDWCWWMOISO-UHFFFAOYSA-N dichloro-bis(ethenyl)silane Chemical compound C=C[Si](Cl)(Cl)C=C MAYIDWCWWMOISO-UHFFFAOYSA-N 0.000 description 1
- BOJMOXSCXJZXFL-UHFFFAOYSA-N dichloro-cyclohexyl-(iodomethyl)silane Chemical compound IC[Si](Cl)(Cl)C1CCCCC1 BOJMOXSCXJZXFL-UHFFFAOYSA-N 0.000 description 1
- GSENNYNYEKCQGA-UHFFFAOYSA-N dichloro-di(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(Cl)C(C)C GSENNYNYEKCQGA-UHFFFAOYSA-N 0.000 description 1
- CWEOQWHWEYGMAL-UHFFFAOYSA-N dichloro-ethyl-(iodomethyl)silane Chemical compound CC[Si](Cl)(Cl)CI CWEOQWHWEYGMAL-UHFFFAOYSA-N 0.000 description 1
- RQURIFHGCYGDMN-UHFFFAOYSA-N dichloro-methyl-(trichloromethyl)silane Chemical compound C[Si](Cl)(Cl)C(Cl)(Cl)Cl RQURIFHGCYGDMN-UHFFFAOYSA-N 0.000 description 1
- ISKDFCWENGPERQ-UHFFFAOYSA-N dicyclohexyl(diiodo)silane Chemical compound C1CCCCC1[Si](I)(I)C1CCCCC1 ISKDFCWENGPERQ-UHFFFAOYSA-N 0.000 description 1
- VZUIBSZKWSMFNV-UHFFFAOYSA-N dicyclohexyl-(iodomethyl)-propoxysilane Chemical compound C1CCCCC1[Si](CI)(OCCC)C1CCCCC1 VZUIBSZKWSMFNV-UHFFFAOYSA-N 0.000 description 1
- PHWNVTCLHRAZDS-UHFFFAOYSA-N dicyclohexylmethoxy(iodomethyl)silane Chemical compound IC[SiH2]OC(C1CCCCC1)C1CCCCC1 PHWNVTCLHRAZDS-UHFFFAOYSA-N 0.000 description 1
- ZBCBWPMODOFKDW-UHFFFAOYSA-N diethanolamine Chemical compound OCCNCCO ZBCBWPMODOFKDW-UHFFFAOYSA-N 0.000 description 1
- QYOYZORSCKKUNE-UHFFFAOYSA-N diethoxy(3-iodoprop-1-enyl)silane Chemical compound ICC=C[SiH](OCC)OCC QYOYZORSCKKUNE-UHFFFAOYSA-N 0.000 description 1
- HZLIIKNXMLEWPA-UHFFFAOYSA-N diethoxy(dipropyl)silane Chemical compound CCC[Si](CCC)(OCC)OCC HZLIIKNXMLEWPA-UHFFFAOYSA-N 0.000 description 1
- CXCHOXOCZPBUOD-UHFFFAOYSA-N diethoxy-(iodomethyl)-phenylsilane Chemical compound CCO[Si](CI)(OCC)C1=CC=CC=C1 CXCHOXOCZPBUOD-UHFFFAOYSA-N 0.000 description 1
- PLGVFKOQZLNQHK-UHFFFAOYSA-N diethoxy-(iodomethyl)-propan-2-ylsilane Chemical compound CCO[Si](CI)(C(C)C)OCC PLGVFKOQZLNQHK-UHFFFAOYSA-N 0.000 description 1
- LVNMVQZXEQKHLE-UHFFFAOYSA-N diethoxy-(iodomethyl)-propylsilane Chemical compound CCC[Si](CI)(OCC)OCC LVNMVQZXEQKHLE-UHFFFAOYSA-N 0.000 description 1
- ORLLLMPDVVUYCB-UHFFFAOYSA-N diethoxy-[ethoxy(diethyl)silyl]-ethylsilane Chemical compound CCO[Si](CC)(CC)[Si](CC)(OCC)OCC ORLLLMPDVVUYCB-UHFFFAOYSA-N 0.000 description 1
- FVGOIYGMTRNIMF-UHFFFAOYSA-N diethoxy-[ethoxy(diethyl)silyl]oxy-ethylsilane Chemical compound CCO[Si](CC)(CC)O[Si](CC)(OCC)OCC FVGOIYGMTRNIMF-UHFFFAOYSA-N 0.000 description 1
- MSGQAOMQUPZKKZ-UHFFFAOYSA-N diethoxy-[ethoxy(dimethyl)silyl]oxy-methylsilane Chemical compound CCO[Si](C)(C)O[Si](C)(OCC)OCC MSGQAOMQUPZKKZ-UHFFFAOYSA-N 0.000 description 1
- ONVNYOKOCHEBLL-UHFFFAOYSA-N diethoxy-[ethoxy(diphenyl)silyl]-phenylsilane Chemical compound C=1C=CC=CC=1[Si](OCC)(C=1C=CC=CC=1)[Si](OCC)(OCC)C1=CC=CC=C1 ONVNYOKOCHEBLL-UHFFFAOYSA-N 0.000 description 1
- VVKJJEAEVBNODX-UHFFFAOYSA-N diethoxy-di(propan-2-yl)silane Chemical compound CCO[Si](C(C)C)(C(C)C)OCC VVKJJEAEVBNODX-UHFFFAOYSA-N 0.000 description 1
- ACWCVISBUXZNGU-UHFFFAOYSA-N diethoxy-ethyl-triethoxysilylsilane Chemical compound CCO[Si](CC)(OCC)[Si](OCC)(OCC)OCC ACWCVISBUXZNGU-UHFFFAOYSA-N 0.000 description 1
- DJLPTEGQDXDGQC-UHFFFAOYSA-N diethoxy-methyl-triethoxysilylsilane Chemical compound CCO[Si](C)(OCC)[Si](OCC)(OCC)OCC DJLPTEGQDXDGQC-UHFFFAOYSA-N 0.000 description 1
- ZKIPWOVPMGZJAE-UHFFFAOYSA-N diethoxy-phenyl-triethoxysilylsilane Chemical compound CCO[Si](OCC)(OCC)[Si](OCC)(OCC)C1=CC=CC=C1 ZKIPWOVPMGZJAE-UHFFFAOYSA-N 0.000 description 1
- CTVMEMAHWVFNPU-UHFFFAOYSA-N diethoxymethyl-[2-(diethoxymethylsilyl)ethyl]silane Chemical compound CCOC(OCC)[SiH2]CC[SiH2]C(OCC)OCC CTVMEMAHWVFNPU-UHFFFAOYSA-N 0.000 description 1
- WYACBZDAHNBPPB-UHFFFAOYSA-N diethyl oxalate Chemical compound CCOC(=O)C(=O)OCC WYACBZDAHNBPPB-UHFFFAOYSA-N 0.000 description 1
- GPTNEHSWPUSHFX-UHFFFAOYSA-N diethyl(diiodo)silane Chemical compound CC[Si](I)(I)CC GPTNEHSWPUSHFX-UHFFFAOYSA-N 0.000 description 1
- UFWOWQYGXPYINE-UHFFFAOYSA-N diethyl(diphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](CC)(CC)OC1=CC=CC=C1 UFWOWQYGXPYINE-UHFFFAOYSA-N 0.000 description 1
- BZCJJERBERAQKQ-UHFFFAOYSA-N diethyl(dipropoxy)silane Chemical compound CCCO[Si](CC)(CC)OCCC BZCJJERBERAQKQ-UHFFFAOYSA-N 0.000 description 1
- KHBBFDQLWRYULG-UHFFFAOYSA-N diethyl-(iodomethyl)-methoxysilane Chemical compound CC[Si](CC)(CI)OC KHBBFDQLWRYULG-UHFFFAOYSA-N 0.000 description 1
- VQGKINQUQGMXJH-UHFFFAOYSA-N diethyl-(iodomethyl)-propan-2-yloxysilane Chemical compound CC[Si](CC)(CI)OC(C)C VQGKINQUQGMXJH-UHFFFAOYSA-N 0.000 description 1
- HCSFPRMQSBZSCL-UHFFFAOYSA-N diethyl-(iodomethyl)-propoxysilane Chemical compound CCCO[Si](CC)(CC)CI HCSFPRMQSBZSCL-UHFFFAOYSA-N 0.000 description 1
- SVEAHWYNNUEDST-UHFFFAOYSA-N diethyl-[ethyl(dimethoxy)silyl]-methoxysilane Chemical compound CC[Si](CC)(OC)[Si](CC)(OC)OC SVEAHWYNNUEDST-UHFFFAOYSA-N 0.000 description 1
- DBOVDBUCEBDCHO-UHFFFAOYSA-N diethyl-[ethyl(dimethoxy)silyl]oxy-methoxysilane Chemical compound CC[Si](CC)(OC)O[Si](CC)(OC)OC DBOVDBUCEBDCHO-UHFFFAOYSA-N 0.000 description 1
- IBJXDSONJWUISJ-UHFFFAOYSA-N diethyl-[ethyl(diphenoxy)silyl]-phenoxysilane Chemical compound C=1C=CC=CC=1O[Si](CC)(OC=1C=CC=CC=1)[Si](CC)(CC)OC1=CC=CC=C1 IBJXDSONJWUISJ-UHFFFAOYSA-N 0.000 description 1
- BOYJSEYGDJFASU-UHFFFAOYSA-N diethyl-[ethyl(diphenoxy)silyl]oxy-phenoxysilane Chemical compound C=1C=CC=CC=1O[Si](CC)(OC=1C=CC=CC=1)O[Si](CC)(CC)OC1=CC=CC=C1 BOYJSEYGDJFASU-UHFFFAOYSA-N 0.000 description 1
- HKAGYJNZCWXVCS-UHFFFAOYSA-N diethyl-bis[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](CC)(CC)OC(C)(C)C HKAGYJNZCWXVCS-UHFFFAOYSA-N 0.000 description 1
- ZWPNXHXXRLYCHZ-UHFFFAOYSA-N diethyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CC)(CC)OC(C)C ZWPNXHXXRLYCHZ-UHFFFAOYSA-N 0.000 description 1
- HPNMFZURTQLUMO-UHFFFAOYSA-N diethylamine Chemical compound CCNCC HPNMFZURTQLUMO-UHFFFAOYSA-N 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- IJKVHSBPTUYDLN-UHFFFAOYSA-N dihydroxy(oxo)silane Chemical compound O[Si](O)=O IJKVHSBPTUYDLN-UHFFFAOYSA-N 0.000 description 1
- UYZARHCMSBEPFF-UHFFFAOYSA-N diiodo(dimethyl)silane Chemical compound C[Si](C)(I)I UYZARHCMSBEPFF-UHFFFAOYSA-N 0.000 description 1
- KWQLWADBJUQKBZ-UHFFFAOYSA-N diiodo(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](I)(I)C1=CC=CC=C1 KWQLWADBJUQKBZ-UHFFFAOYSA-N 0.000 description 1
- MUAXQVZLKVIQRR-UHFFFAOYSA-N diiodo(dipropyl)silane Chemical compound CCC[Si](I)(I)CCC MUAXQVZLKVIQRR-UHFFFAOYSA-N 0.000 description 1
- VIKLEVQDBPBDQS-UHFFFAOYSA-N diiodo-di(propan-2-yl)silane Chemical compound CC(C)[Si](I)(I)C(C)C VIKLEVQDBPBDQS-UHFFFAOYSA-N 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- JVUVKQDVTIIMOD-UHFFFAOYSA-N dimethoxy(dipropyl)silane Chemical compound CCC[Si](OC)(OC)CCC JVUVKQDVTIIMOD-UHFFFAOYSA-N 0.000 description 1
- YAMJSWINAOIAEK-UHFFFAOYSA-N dimethoxy(penta-1,4-dien-3-yloxy)silane Chemical compound C(=C)C(O[SiH](OC)OC)C=C YAMJSWINAOIAEK-UHFFFAOYSA-N 0.000 description 1
- ZYKMXPLFVHNTTQ-UHFFFAOYSA-N dimethoxy-[methoxy(dimethyl)silyl]-methylsilane Chemical compound CO[Si](C)(C)[Si](C)(OC)OC ZYKMXPLFVHNTTQ-UHFFFAOYSA-N 0.000 description 1
- OODQPDAIYZQAPM-UHFFFAOYSA-N dimethoxy-[methoxy(dimethyl)silyl]oxy-methylsilane Chemical compound CO[Si](C)(C)O[Si](C)(OC)OC OODQPDAIYZQAPM-UHFFFAOYSA-N 0.000 description 1
- UFVKUKOQUJOABJ-UHFFFAOYSA-N dimethoxy-[methoxy(diphenyl)silyl]-phenylsilane Chemical compound C=1C=CC=CC=1[Si](OC)(C=1C=CC=CC=1)[Si](OC)(OC)C1=CC=CC=C1 UFVKUKOQUJOABJ-UHFFFAOYSA-N 0.000 description 1
- ZBLIADCAEOVUFG-UHFFFAOYSA-N dimethoxy-[methoxy(diphenyl)silyl]oxy-phenylsilane Chemical compound C=1C=CC=CC=1[Si](OC)(OC)O[Si](OC)(C=1C=CC=CC=1)C1=CC=CC=C1 ZBLIADCAEOVUFG-UHFFFAOYSA-N 0.000 description 1
- VHPUZTHRFWIGAW-UHFFFAOYSA-N dimethoxy-di(propan-2-yl)silane Chemical compound CO[Si](OC)(C(C)C)C(C)C VHPUZTHRFWIGAW-UHFFFAOYSA-N 0.000 description 1
- ISRAHSWMKHSHAG-UHFFFAOYSA-N dimethoxy-methyl-trimethoxysilylsilane Chemical compound CO[Si](C)(OC)[Si](OC)(OC)OC ISRAHSWMKHSHAG-UHFFFAOYSA-N 0.000 description 1
- BRCDYPNDQTUZSL-UHFFFAOYSA-N dimethoxy-phenyl-trimethoxysilylsilane Chemical compound CO[Si](OC)(OC)[Si](OC)(OC)C1=CC=CC=C1 BRCDYPNDQTUZSL-UHFFFAOYSA-N 0.000 description 1
- ZPILIIPBPKDNTR-UHFFFAOYSA-N dimethoxymethyl(dimethoxymethylsilylmethyl)silane Chemical compound COC(OC)[SiH2]C[SiH2]C(OC)OC ZPILIIPBPKDNTR-UHFFFAOYSA-N 0.000 description 1
- AKPOQTZQHIWYJM-UHFFFAOYSA-N dimethoxymethylsilylmethyl(trimethoxy)silane Chemical compound COC(OC)[SiH2]C[Si](OC)(OC)OC AKPOQTZQHIWYJM-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- FBSAITBEAPNWJG-UHFFFAOYSA-N dimethyl phthalate Natural products CC(=O)OC1=CC=CC=C1OC(C)=O FBSAITBEAPNWJG-UHFFFAOYSA-N 0.000 description 1
- SWLVAJXQIOKFSJ-UHFFFAOYSA-N dimethyl(diphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](C)(C)OC1=CC=CC=C1 SWLVAJXQIOKFSJ-UHFFFAOYSA-N 0.000 description 1
- ZIDTUTFKRRXWTK-UHFFFAOYSA-N dimethyl(dipropoxy)silane Chemical compound CCCO[Si](C)(C)OCCC ZIDTUTFKRRXWTK-UHFFFAOYSA-N 0.000 description 1
- OAXCVGVJXLYDKZ-UHFFFAOYSA-N dimethyl-[methyl(diphenoxy)silyl]-phenoxysilane Chemical compound C=1C=CC=CC=1O[Si](C)(OC=1C=CC=CC=1)[Si](C)(C)OC1=CC=CC=C1 OAXCVGVJXLYDKZ-UHFFFAOYSA-N 0.000 description 1
- JWXBGUAFHMLIRL-UHFFFAOYSA-N dimethyl-[methyl(diphenoxy)silyl]oxy-phenoxysilane Chemical compound C=1C=CC=CC=1O[Si](C)(OC=1C=CC=CC=1)O[Si](C)(C)OC1=CC=CC=C1 JWXBGUAFHMLIRL-UHFFFAOYSA-N 0.000 description 1
- BGPNEHJZZDIFND-UHFFFAOYSA-N dimethyl-bis[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](C)(C)OC(C)(C)C BGPNEHJZZDIFND-UHFFFAOYSA-N 0.000 description 1
- BPXCAJONOPIXJI-UHFFFAOYSA-N dimethyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(C)OC(C)C BPXCAJONOPIXJI-UHFFFAOYSA-N 0.000 description 1
- LIKFHECYJZWXFJ-UHFFFAOYSA-N dimethyldichlorosilane Chemical compound C[Si](C)(Cl)Cl LIKFHECYJZWXFJ-UHFFFAOYSA-N 0.000 description 1
- 108700003601 dimethylglycine Proteins 0.000 description 1
- 229960001826 dimethylphthalate Drugs 0.000 description 1
- XGPLWQBOVSAHMV-UHFFFAOYSA-N dimethylsilyl-ethoxy-methylsilane Chemical compound C(C)O[SiH]([SiH](C)C)C XGPLWQBOVSAHMV-UHFFFAOYSA-N 0.000 description 1
- YLDKQPMORVEBRU-UHFFFAOYSA-N diphenoxy(diphenyl)silane Chemical compound C=1C=CC=CC=1O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)OC1=CC=CC=C1 YLDKQPMORVEBRU-UHFFFAOYSA-N 0.000 description 1
- JFCVQVCWZYWWPV-UHFFFAOYSA-N diphenoxy(dipropyl)silane Chemical compound C=1C=CC=CC=1O[Si](CCC)(CCC)OC1=CC=CC=C1 JFCVQVCWZYWWPV-UHFFFAOYSA-N 0.000 description 1
- ZCLLMMBZLXTPCO-UHFFFAOYSA-N diphenoxy-[phenoxy(diphenyl)silyl]-phenylsilane Chemical compound C=1C=CC=CC=1O[Si]([Si](OC=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)(C=1C=CC=CC=1)OC1=CC=CC=C1 ZCLLMMBZLXTPCO-UHFFFAOYSA-N 0.000 description 1
- RBAMITFFOYXHFR-UHFFFAOYSA-N diphenoxy-[phenoxy(diphenyl)silyl]oxy-phenylsilane Chemical compound C=1C=CC=CC=1O[Si](C=1C=CC=CC=1)(O[Si](OC=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)OC1=CC=CC=C1 RBAMITFFOYXHFR-UHFFFAOYSA-N 0.000 description 1
- JPKFEPIUGPNLAR-UHFFFAOYSA-N diphenoxy-di(propan-2-yl)silane Chemical compound C=1C=CC=CC=1O[Si](C(C)C)(C(C)C)OC1=CC=CC=C1 JPKFEPIUGPNLAR-UHFFFAOYSA-N 0.000 description 1
- SLAYMDSSGGBWQB-UHFFFAOYSA-N diphenyl(dipropoxy)silane Chemical compound C=1C=CC=CC=1[Si](OCCC)(OCCC)C1=CC=CC=C1 SLAYMDSSGGBWQB-UHFFFAOYSA-N 0.000 description 1
- QAPWZQHBOVKNHP-UHFFFAOYSA-N diphenyl-di(propan-2-yloxy)silane Chemical compound C=1C=CC=CC=1[Si](OC(C)C)(OC(C)C)C1=CC=CC=C1 QAPWZQHBOVKNHP-UHFFFAOYSA-N 0.000 description 1
- AASUFOVSZUIILF-UHFFFAOYSA-N diphenylmethanone;sodium Chemical compound [Na].C=1C=CC=CC=1C(=O)C1=CC=CC=C1 AASUFOVSZUIILF-UHFFFAOYSA-N 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- AVBCBOQFOQZNFK-UHFFFAOYSA-N dipropoxy(dipropyl)silane Chemical compound CCCO[Si](CCC)(CCC)OCCC AVBCBOQFOQZNFK-UHFFFAOYSA-N 0.000 description 1
- PCCKJULOKAICID-UHFFFAOYSA-N dipropoxymethyl-[2-(dipropoxymethylsilyl)ethyl]silane Chemical compound CCCOC(OCCC)[SiH2]CC[SiH2]C(OCCC)OCCC PCCKJULOKAICID-UHFFFAOYSA-N 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- PZPGRFITIJYNEJ-UHFFFAOYSA-N disilane Chemical compound [SiH3][SiH3] PZPGRFITIJYNEJ-UHFFFAOYSA-N 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- PDYPRPVKBUOHDH-UHFFFAOYSA-N ditert-butyl(dichloro)silane Chemical compound CC(C)(C)[Si](Cl)(Cl)C(C)(C)C PDYPRPVKBUOHDH-UHFFFAOYSA-N 0.000 description 1
- GWCASPKBFBALDG-UHFFFAOYSA-N ditert-butyl(diethoxy)silane Chemical compound CCO[Si](C(C)(C)C)(C(C)(C)C)OCC GWCASPKBFBALDG-UHFFFAOYSA-N 0.000 description 1
- VBAHTDAXXJGECL-UHFFFAOYSA-N ditert-butyl(diiodo)silane Chemical compound CC(C)(C)[Si](I)(I)C(C)(C)C VBAHTDAXXJGECL-UHFFFAOYSA-N 0.000 description 1
- OANIYCQMEVXZCJ-UHFFFAOYSA-N ditert-butyl(dimethoxy)silane Chemical compound CO[Si](OC)(C(C)(C)C)C(C)(C)C OANIYCQMEVXZCJ-UHFFFAOYSA-N 0.000 description 1
- WOMHHBWXYINIPW-UHFFFAOYSA-N ditert-butyl(diphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](C(C)(C)C)(C(C)(C)C)OC1=CC=CC=C1 WOMHHBWXYINIPW-UHFFFAOYSA-N 0.000 description 1
- AUSJIUIFKLDCQZ-UHFFFAOYSA-N ditert-butyl(dipropoxy)silane Chemical compound CCCO[Si](C(C)(C)C)(C(C)(C)C)OCCC AUSJIUIFKLDCQZ-UHFFFAOYSA-N 0.000 description 1
- MJWZJCJHAHFBID-UHFFFAOYSA-N ditert-butyl-(chloromethyl)-ethoxysilane Chemical compound CCO[Si](CCl)(C(C)(C)C)C(C)(C)C MJWZJCJHAHFBID-UHFFFAOYSA-N 0.000 description 1
- NZIJIIKMWJNTAD-UHFFFAOYSA-N ditert-butyl-(chloromethyl)-methoxysilane Chemical compound CO[Si](CCl)(C(C)(C)C)C(C)(C)C NZIJIIKMWJNTAD-UHFFFAOYSA-N 0.000 description 1
- NHTLGFGIKIFUBA-UHFFFAOYSA-N ditert-butyl-(chloromethyl)-propan-2-yloxysilane Chemical compound CC(C)O[Si](CCl)(C(C)(C)C)C(C)(C)C NHTLGFGIKIFUBA-UHFFFAOYSA-N 0.000 description 1
- WRFFTQLWRBCOHI-UHFFFAOYSA-N ditert-butyl-(chloromethyl)-propoxysilane Chemical compound CCCO[Si](CCl)(C(C)(C)C)C(C)(C)C WRFFTQLWRBCOHI-UHFFFAOYSA-N 0.000 description 1
- GTUZVGSXMKJQLO-UHFFFAOYSA-N ditert-butyl-(iodomethyl)-propoxysilane Chemical compound CCCO[Si](CI)(C(C)(C)C)C(C)(C)C GTUZVGSXMKJQLO-UHFFFAOYSA-N 0.000 description 1
- KDYNFDMKJXYFHQ-UHFFFAOYSA-N ditert-butyl-bis[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](C(C)(C)C)(C(C)(C)C)OC(C)(C)C KDYNFDMKJXYFHQ-UHFFFAOYSA-N 0.000 description 1
- QCQLFLQIULKCNT-UHFFFAOYSA-N ditert-butyl-chloro-(chloromethyl)silane Chemical compound CC(C)(C)[Si](Cl)(CCl)C(C)(C)C QCQLFLQIULKCNT-UHFFFAOYSA-N 0.000 description 1
- WGGXUZPISFTBNY-UHFFFAOYSA-N ditert-butyl-chloro-(iodomethyl)silane Chemical compound CC(C)(C)[Si](Cl)(CI)C(C)(C)C WGGXUZPISFTBNY-UHFFFAOYSA-N 0.000 description 1
- HZTYWQHBJNMFSW-UHFFFAOYSA-N ditert-butyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C(C)(C)C)(C(C)(C)C)OC(C)C HZTYWQHBJNMFSW-UHFFFAOYSA-N 0.000 description 1
- GUVUOGQBMYCBQP-UHFFFAOYSA-N dmpu Chemical compound CN1CCCN(C)C1=O GUVUOGQBMYCBQP-UHFFFAOYSA-N 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 125000004185 ester group Chemical group 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- TYEBJKYPUJAKHX-UHFFFAOYSA-N ethenyl(iodo)silane Chemical compound C(=C)[SiH2]I TYEBJKYPUJAKHX-UHFFFAOYSA-N 0.000 description 1
- UUZDTMQNDHYEFF-UHFFFAOYSA-N ethenyl(triiodo)silane Chemical compound I[Si](I)(I)C=C UUZDTMQNDHYEFF-UHFFFAOYSA-N 0.000 description 1
- FEHYCIQPPPQNMI-UHFFFAOYSA-N ethenyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C=C)OC1=CC=CC=C1 FEHYCIQPPPQNMI-UHFFFAOYSA-N 0.000 description 1
- NNBRCHPBPDRPIT-UHFFFAOYSA-N ethenyl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)C=C NNBRCHPBPDRPIT-UHFFFAOYSA-N 0.000 description 1
- MABAWBWRUSBLKQ-UHFFFAOYSA-N ethenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C=C MABAWBWRUSBLKQ-UHFFFAOYSA-N 0.000 description 1
- BQRPSOKLSZSNAR-UHFFFAOYSA-N ethenyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C=C BQRPSOKLSZSNAR-UHFFFAOYSA-N 0.000 description 1
- KSBYKJVWZQZLGZ-UHFFFAOYSA-N ethoxy-(iodomethyl)-di(propan-2-yl)silane Chemical compound CCO[Si](CI)(C(C)C)C(C)C KSBYKJVWZQZLGZ-UHFFFAOYSA-N 0.000 description 1
- HWMXYXHNKFBQES-UHFFFAOYSA-N ethoxy-(iodomethyl)-dimethylsilane Chemical compound CCO[Si](C)(C)CI HWMXYXHNKFBQES-UHFFFAOYSA-N 0.000 description 1
- NMTNGOJVJZKOTD-UHFFFAOYSA-N ethoxy-(iodomethyl)-dipropylsilane Chemical compound CCC[Si](CI)(CCC)OCC NMTNGOJVJZKOTD-UHFFFAOYSA-N 0.000 description 1
- OFZOXQUFSGKMDQ-UHFFFAOYSA-N ethoxy-[ethoxy(diethyl)silyl]-diethylsilane Chemical compound CCO[Si](CC)(CC)[Si](CC)(CC)OCC OFZOXQUFSGKMDQ-UHFFFAOYSA-N 0.000 description 1
- VWDZMQBFSAGPQS-UHFFFAOYSA-N ethoxy-[ethoxy(diethyl)silyl]oxy-diethylsilane Chemical compound CCO[Si](CC)(CC)O[Si](CC)(CC)OCC VWDZMQBFSAGPQS-UHFFFAOYSA-N 0.000 description 1
- GWIVSKPSMYHUAK-UHFFFAOYSA-N ethoxy-[ethoxy(dimethyl)silyl]-dimethylsilane Chemical compound CCO[Si](C)(C)[Si](C)(C)OCC GWIVSKPSMYHUAK-UHFFFAOYSA-N 0.000 description 1
- NPOYZXWZANURMM-UHFFFAOYSA-N ethoxy-[ethoxy(dimethyl)silyl]oxy-dimethylsilane Chemical compound CCO[Si](C)(C)O[Si](C)(C)OCC NPOYZXWZANURMM-UHFFFAOYSA-N 0.000 description 1
- INDRGPROLHTLDG-UHFFFAOYSA-N ethoxy-diethyl-(iodomethyl)silane Chemical compound CCO[Si](CC)(CC)CI INDRGPROLHTLDG-UHFFFAOYSA-N 0.000 description 1
- HVGIQNNACBDEAJ-UHFFFAOYSA-N ethyl 3-oxohexaneperoxoate zirconium Chemical compound [Zr].C(C)CC(CC(=O)OOCC)=O.C(C)CC(CC(=O)OOCC)=O HVGIQNNACBDEAJ-UHFFFAOYSA-N 0.000 description 1
- FVEFSACGFKYRDG-UHFFFAOYSA-N ethyl 3-oxohexaneperoxoate;titanium Chemical compound [Ti].CCCC(=O)CC(=O)OOCC.CCCC(=O)CC(=O)OOCC FVEFSACGFKYRDG-UHFFFAOYSA-N 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- RXBOMHDFBHOQHF-UHFFFAOYSA-N ethyl(triiodo)silane Chemical compound CC[Si](I)(I)I RXBOMHDFBHOQHF-UHFFFAOYSA-N 0.000 description 1
- HGWSCXYVBZYYDK-UHFFFAOYSA-N ethyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(CC)OC1=CC=CC=C1 HGWSCXYVBZYYDK-UHFFFAOYSA-N 0.000 description 1
- KUCGHDUQOVVQED-UHFFFAOYSA-N ethyl(tripropoxy)silane Chemical compound CCCO[Si](CC)(OCCC)OCCC KUCGHDUQOVVQED-UHFFFAOYSA-N 0.000 description 1
- XVRBACGPCMTNKW-UHFFFAOYSA-N ethyl-(iodomethyl)-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CI)(CC)OC(C)C XVRBACGPCMTNKW-UHFFFAOYSA-N 0.000 description 1
- FAUIMQXFMONAAW-UHFFFAOYSA-N ethyl-(iodomethyl)-dimethoxysilane Chemical compound CC[Si](CI)(OC)OC FAUIMQXFMONAAW-UHFFFAOYSA-N 0.000 description 1
- BJMIATPKNZFVOF-UHFFFAOYSA-N ethyl-(iodomethyl)-dipropoxysilane Chemical compound CCCO[Si](CC)(CI)OCCC BJMIATPKNZFVOF-UHFFFAOYSA-N 0.000 description 1
- IFIOAMBFOHEANZ-UHFFFAOYSA-N ethyl-[ethyl(dimethoxy)silyl]-dimethoxysilane Chemical compound CC[Si](OC)(OC)[Si](CC)(OC)OC IFIOAMBFOHEANZ-UHFFFAOYSA-N 0.000 description 1
- VRMVHGLYIBKVFI-UHFFFAOYSA-N ethyl-[ethyl(dimethoxy)silyl]oxy-dimethoxysilane Chemical compound CC[Si](OC)(OC)O[Si](CC)(OC)OC VRMVHGLYIBKVFI-UHFFFAOYSA-N 0.000 description 1
- ZNKNMONNHUJINA-UHFFFAOYSA-N ethyl-[ethyl(diphenoxy)silyl]-diphenoxysilane Chemical compound C=1C=CC=CC=1O[Si]([Si](CC)(OC=1C=CC=CC=1)OC=1C=CC=CC=1)(CC)OC1=CC=CC=C1 ZNKNMONNHUJINA-UHFFFAOYSA-N 0.000 description 1
- POASXXWXGJJVQL-UHFFFAOYSA-N ethyl-[ethyl(diphenoxy)silyl]oxy-diphenoxysilane Chemical compound C=1C=CC=CC=1O[Si](O[Si](CC)(OC=1C=CC=CC=1)OC=1C=CC=CC=1)(CC)OC1=CC=CC=C1 POASXXWXGJJVQL-UHFFFAOYSA-N 0.000 description 1
- WTPUCDKHSSJFKA-UHFFFAOYSA-N ethyl-dimethoxy-trimethoxysilylsilane Chemical compound CC[Si](OC)(OC)[Si](OC)(OC)OC WTPUCDKHSSJFKA-UHFFFAOYSA-N 0.000 description 1
- CJEBOFHQMBHCKC-UHFFFAOYSA-N ethyl-diphenoxy-triphenoxysilylsilane Chemical compound C=1C=CC=CC=1O[Si]([Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC=1C=CC=CC=1)(CC)OC1=CC=CC=C1 CJEBOFHQMBHCKC-UHFFFAOYSA-N 0.000 description 1
- MYEJNNDSIXAGNK-UHFFFAOYSA-N ethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CC)(OC(C)C)OC(C)C MYEJNNDSIXAGNK-UHFFFAOYSA-N 0.000 description 1
- 235000019197 fats Nutrition 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- JKGQTAALIDWBJK-UHFFFAOYSA-N fluoro(trimethoxy)silane Chemical compound CO[Si](F)(OC)OC JKGQTAALIDWBJK-UHFFFAOYSA-N 0.000 description 1
- KXWNKQIEBQHIAV-UHFFFAOYSA-N fluoro(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(F)OC1=CC=CC=C1 KXWNKQIEBQHIAV-UHFFFAOYSA-N 0.000 description 1
- HSHMTXSGXWYRNS-UHFFFAOYSA-N fluoro-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](F)(OC(C)(C)C)OC(C)(C)C HSHMTXSGXWYRNS-UHFFFAOYSA-N 0.000 description 1
- 125000003709 fluoroalkyl group Chemical group 0.000 description 1
- 125000001207 fluorophenyl group Chemical group 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- ILPNRWUGFSPGAA-UHFFFAOYSA-N heptane-2,4-dione Chemical compound CCCC(=O)CC(C)=O ILPNRWUGFSPGAA-UHFFFAOYSA-N 0.000 description 1
- DGCTVLNZTFDPDJ-UHFFFAOYSA-N heptane-3,5-dione Chemical compound CCC(=O)CC(=O)CC DGCTVLNZTFDPDJ-UHFFFAOYSA-N 0.000 description 1
- GNOIPBMMFNIUFM-UHFFFAOYSA-N hexamethylphosphoric triamide Chemical compound CN(C)P(=O)(N(C)C)N(C)C GNOIPBMMFNIUFM-UHFFFAOYSA-N 0.000 description 1
- NDOGLIPWGGRQCO-UHFFFAOYSA-N hexane-2,4-dione Chemical compound CCC(=O)CC(C)=O NDOGLIPWGGRQCO-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 125000002346 iodo group Chemical group I* 0.000 description 1
- NNRANHIFAQDLRA-UHFFFAOYSA-N iodo(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(I)C1=CC=CC=C1 NNRANHIFAQDLRA-UHFFFAOYSA-N 0.000 description 1
- WXRXBEDEJGBDOF-UHFFFAOYSA-N iodomethyl(penta-1,4-dien-3-yloxy)silane Chemical compound IC[SiH2]OC(C=C)C=C WXRXBEDEJGBDOF-UHFFFAOYSA-N 0.000 description 1
- WWRSUSXZSPZJTA-UHFFFAOYSA-N iodomethyl(trimethoxy)silane Chemical compound CO[Si](CI)(OC)OC WWRSUSXZSPZJTA-UHFFFAOYSA-N 0.000 description 1
- NYFDXSDWKPDPEC-UHFFFAOYSA-N iodomethyl(tripropoxy)silane Chemical compound CCCO[Si](CI)(OCCC)OCCC NYFDXSDWKPDPEC-UHFFFAOYSA-N 0.000 description 1
- NLLZQYKZLKQBJO-UHFFFAOYSA-N iodomethyl-(2-phenylethyl)-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CI)(OC(C)C)CCC1=CC=CC=C1 NLLZQYKZLKQBJO-UHFFFAOYSA-N 0.000 description 1
- VDDUILKIQQCEDR-UHFFFAOYSA-N iodomethyl-(2-phenylethyl)-dipropoxysilane Chemical compound CCCO[Si](CI)(OCCC)CCC1=CC=CC=C1 VDDUILKIQQCEDR-UHFFFAOYSA-N 0.000 description 1
- QRDVRKUMFKUNIR-UHFFFAOYSA-N iodomethyl-di(propan-2-yl)-propan-2-yloxysilane Chemical compound CC(C)O[Si](CI)(C(C)C)C(C)C QRDVRKUMFKUNIR-UHFFFAOYSA-N 0.000 description 1
- UCLANQUEJQMORH-UHFFFAOYSA-N iodomethyl-di(propan-2-yloxy)-propylsilane Chemical compound CCC[Si](CI)(OC(C)C)OC(C)C UCLANQUEJQMORH-UHFFFAOYSA-N 0.000 description 1
- TUXUWRKYHBAUNM-UHFFFAOYSA-N iodomethyl-dimethoxy-(2-phenylethyl)silane Chemical compound CO[Si](CI)(OC)CCC1=CC=CC=C1 TUXUWRKYHBAUNM-UHFFFAOYSA-N 0.000 description 1
- FJPYMZLMTMLZFM-UHFFFAOYSA-N iodomethyl-dimethoxy-methylsilane Chemical compound CO[Si](C)(CI)OC FJPYMZLMTMLZFM-UHFFFAOYSA-N 0.000 description 1
- QXQGSABNHNDGAO-UHFFFAOYSA-N iodomethyl-dimethoxy-phenylsilane Chemical compound CO[Si](CI)(OC)C1=CC=CC=C1 QXQGSABNHNDGAO-UHFFFAOYSA-N 0.000 description 1
- RLWSYAPMAMHKLI-UHFFFAOYSA-N iodomethyl-dimethoxy-propan-2-ylsilane Chemical compound CO[Si](CI)(OC)C(C)C RLWSYAPMAMHKLI-UHFFFAOYSA-N 0.000 description 1
- OVGYAONXHYPLMI-UHFFFAOYSA-N iodomethyl-dimethoxy-propylsilane Chemical compound CCC[Si](CI)(OC)OC OVGYAONXHYPLMI-UHFFFAOYSA-N 0.000 description 1
- IHYPEZFAEWCQPG-UHFFFAOYSA-N iodomethyl-dimethyl-propan-2-yloxysilane Chemical compound CC(C)O[Si](C)(C)CI IHYPEZFAEWCQPG-UHFFFAOYSA-N 0.000 description 1
- SHNZEEBRQHHWQG-UHFFFAOYSA-N iodomethyl-dimethyl-propoxysilane Chemical compound CCCO[Si](C)(C)CI SHNZEEBRQHHWQG-UHFFFAOYSA-N 0.000 description 1
- KORCTWHLJMVJGS-UHFFFAOYSA-N iodomethyl-diphenyl-propoxysilane Chemical compound C=1C=CC=CC=1[Si](CI)(OCCC)C1=CC=CC=C1 KORCTWHLJMVJGS-UHFFFAOYSA-N 0.000 description 1
- XZUMXIFVVCUOBB-UHFFFAOYSA-N iodomethyl-dipropoxy-propylsilane Chemical compound CCCO[Si](CI)(CCC)OCCC XZUMXIFVVCUOBB-UHFFFAOYSA-N 0.000 description 1
- IEQQTMOMLCKSSW-UHFFFAOYSA-N iodomethyl-methoxy-di(propan-2-yl)silane Chemical compound CO[Si](CI)(C(C)C)C(C)C IEQQTMOMLCKSSW-UHFFFAOYSA-N 0.000 description 1
- BZJCWVVDHBNPBN-UHFFFAOYSA-N iodomethyl-methoxy-dimethylsilane Chemical compound CO[Si](C)(C)CI BZJCWVVDHBNPBN-UHFFFAOYSA-N 0.000 description 1
- TWJOHCKMWUETHY-UHFFFAOYSA-N iodomethyl-methoxy-dipropylsilane Chemical compound CCC[Si](CI)(OC)CCC TWJOHCKMWUETHY-UHFFFAOYSA-N 0.000 description 1
- WQFXMLBEZCFFTM-UHFFFAOYSA-N iodomethyl-methyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](C)(CI)OC(C)C WQFXMLBEZCFFTM-UHFFFAOYSA-N 0.000 description 1
- USMKEGDGFLDHGW-UHFFFAOYSA-N iodomethyl-methyl-dipropoxysilane Chemical compound CCCO[Si](C)(CI)OCCC USMKEGDGFLDHGW-UHFFFAOYSA-N 0.000 description 1
- BSCKPHHPCWJOKN-UHFFFAOYSA-N iodomethyl-phenyl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CI)(OC(C)C)C1=CC=CC=C1 BSCKPHHPCWJOKN-UHFFFAOYSA-N 0.000 description 1
- FKIPJFDBLHTRSR-UHFFFAOYSA-N iodomethyl-phenyl-dipropoxysilane Chemical compound CCCO[Si](CI)(OCCC)C1=CC=CC=C1 FKIPJFDBLHTRSR-UHFFFAOYSA-N 0.000 description 1
- HGMRHZBRXZWZGT-UHFFFAOYSA-N iodomethyl-propan-2-yl-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CI)(C(C)C)OC(C)C HGMRHZBRXZWZGT-UHFFFAOYSA-N 0.000 description 1
- QUUUAQIMZCGVIE-UHFFFAOYSA-N iodomethyl-propan-2-yl-dipropoxysilane Chemical compound CCCO[Si](CI)(C(C)C)OCCC QUUUAQIMZCGVIE-UHFFFAOYSA-N 0.000 description 1
- RXDDGCHPABBUMS-UHFFFAOYSA-N iodomethyl-propan-2-yloxy-dipropylsilane Chemical compound CCC[Si](CI)(CCC)OC(C)C RXDDGCHPABBUMS-UHFFFAOYSA-N 0.000 description 1
- QJVKCKXHTZJDTQ-UHFFFAOYSA-N iodomethyl-propoxy-dipropylsilane Chemical compound CCCO[Si](CI)(CCC)CCC QJVKCKXHTZJDTQ-UHFFFAOYSA-N 0.000 description 1
- JJMZWZIZAABQFO-UHFFFAOYSA-N iodomethyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CI)(OC(C)C)OC(C)C JJMZWZIZAABQFO-UHFFFAOYSA-N 0.000 description 1
- CXHHAWACKSPTFF-UHFFFAOYSA-N iodomethylcyclohexane Chemical compound ICC1CCCCC1 CXHHAWACKSPTFF-UHFFFAOYSA-N 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 229940039717 lanolin Drugs 0.000 description 1
- 235000019388 lanolin Nutrition 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- CEXMDIMEZILRLH-UHFFFAOYSA-N methoxy-[methoxy(diphenyl)silyl]-diphenylsilane Chemical compound C=1C=CC=CC=1[Si]([Si](OC)(C=1C=CC=CC=1)C=1C=CC=CC=1)(OC)C1=CC=CC=C1 CEXMDIMEZILRLH-UHFFFAOYSA-N 0.000 description 1
- CDHRQJOOOVAAFQ-UHFFFAOYSA-N methoxy-[methoxy(diphenyl)silyl]oxy-diphenylsilane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(OC)O[Si](OC)(C=1C=CC=CC=1)C1=CC=CC=C1 CDHRQJOOOVAAFQ-UHFFFAOYSA-N 0.000 description 1
- UZKWTJUDCOPSNM-UHFFFAOYSA-N methoxybenzene Substances CCCCOC=C UZKWTJUDCOPSNM-UHFFFAOYSA-N 0.000 description 1
- IMXBRVLCKXGWSS-UHFFFAOYSA-N methyl 2-cyclohexylacetate Chemical compound COC(=O)CC1CCCCC1 IMXBRVLCKXGWSS-UHFFFAOYSA-N 0.000 description 1
- CRVGTESFCCXCTH-UHFFFAOYSA-N methyl diethanolamine Chemical compound OCCN(C)CCO CRVGTESFCCXCTH-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- DRXHEPWCWBIQFJ-UHFFFAOYSA-N methyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C)OC1=CC=CC=C1 DRXHEPWCWBIQFJ-UHFFFAOYSA-N 0.000 description 1
- PFAPVFASCCOTID-UHFFFAOYSA-N methyl-[methyl(diphenoxy)silyl]-diphenoxysilane Chemical compound C=1C=CC=CC=1O[Si]([Si](C)(OC=1C=CC=CC=1)OC=1C=CC=CC=1)(C)OC1=CC=CC=C1 PFAPVFASCCOTID-UHFFFAOYSA-N 0.000 description 1
- GGTRGAJZTXLYAO-UHFFFAOYSA-N methyl-[methyl(diphenoxy)silyl]oxy-diphenoxysilane Chemical compound C=1C=CC=CC=1O[Si](O[Si](C)(OC=1C=CC=CC=1)OC=1C=CC=CC=1)(C)OC1=CC=CC=C1 GGTRGAJZTXLYAO-UHFFFAOYSA-N 0.000 description 1
- MFSRIWJYYDYFOH-UHFFFAOYSA-N methyl-diphenoxy-triphenoxysilylsilane Chemical compound C=1C=CC=CC=1O[Si]([Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC=1C=CC=CC=1)(C)OC1=CC=CC=C1 MFSRIWJYYDYFOH-UHFFFAOYSA-N 0.000 description 1
- AHQDZKRRVNGIQL-UHFFFAOYSA-N methyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](C)(OC(C)(C)C)OC(C)(C)C AHQDZKRRVNGIQL-UHFFFAOYSA-N 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- IYIAWAACGTUPCC-UHFFFAOYSA-N n-(diethylsulfamoyl)-n-ethylethanamine Chemical compound CCN(CC)S(=O)(=O)N(CC)CC IYIAWAACGTUPCC-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 229940017144 n-butyl lactate Drugs 0.000 description 1
- KERBAAIBDHEFDD-UHFFFAOYSA-N n-ethylformamide Chemical compound CCNC=O KERBAAIBDHEFDD-UHFFFAOYSA-N 0.000 description 1
- QJQAMHYHNCADNR-UHFFFAOYSA-N n-methylpropanamide Chemical compound CCC(=O)NC QJQAMHYHNCADNR-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 235000013557 nattō Nutrition 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- WSGCRAOTEDLMFQ-UHFFFAOYSA-N nonan-5-one Chemical compound CCCCC(=O)CCCC WSGCRAOTEDLMFQ-UHFFFAOYSA-N 0.000 description 1
- HWWGUUIGLJQLQD-UHFFFAOYSA-N nonane-3,5-dione Chemical compound CCCCC(=O)CC(=O)CC HWWGUUIGLJQLQD-UHFFFAOYSA-N 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 125000002868 norbornyl group Chemical group C12(CCC(CC1)C2)* 0.000 description 1
- GLZWNFNQMJAZGY-UHFFFAOYSA-N octaethylene glycol Chemical compound OCCOCCOCCOCCOCCOCCOCCOCCO GLZWNFNQMJAZGY-UHFFFAOYSA-N 0.000 description 1
- IOQPZZOEVPZRBK-UHFFFAOYSA-N octan-1-amine Chemical compound CCCCCCCCN IOQPZZOEVPZRBK-UHFFFAOYSA-N 0.000 description 1
- GJYXGIIWJFZCLN-UHFFFAOYSA-N octane-2,4-dione Chemical compound CCCCC(=O)CC(C)=O GJYXGIIWJFZCLN-UHFFFAOYSA-N 0.000 description 1
- PJEPOHXMGDEIMR-UHFFFAOYSA-N octane-3,5-dione Chemical compound CCCC(=O)CC(=O)CC PJEPOHXMGDEIMR-UHFFFAOYSA-N 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- AICOOMRHRUFYCM-ZRRPKQBOSA-N oxazine, 1 Chemical compound C([C@@H]1[C@H](C(C[C@]2(C)[C@@H]([C@H](C)N(C)C)[C@H](O)C[C@]21C)=O)CC1=CC2)C[C@H]1[C@@]1(C)[C@H]2N=C(C(C)C)OC1 AICOOMRHRUFYCM-ZRRPKQBOSA-N 0.000 description 1
- DLRJIFUOBPOJNS-UHFFFAOYSA-N phenetole Chemical compound CCOC1=CC=CC=C1 DLRJIFUOBPOJNS-UHFFFAOYSA-N 0.000 description 1
- ZVTLOJDICJWNPQ-UHFFFAOYSA-N phenoxy-[phenoxy(diphenyl)silyl]-diphenylsilane Chemical compound C=1C=CC=CC=1[Si]([Si](OC=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)(C=1C=CC=CC=1)OC1=CC=CC=C1 ZVTLOJDICJWNPQ-UHFFFAOYSA-N 0.000 description 1
- JULIZFWJALMDGQ-UHFFFAOYSA-N phenoxy-[phenoxy(diphenyl)silyl]oxy-diphenylsilane Chemical compound C=1C=CC=CC=1O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)OC1=CC=CC=C1 JULIZFWJALMDGQ-UHFFFAOYSA-N 0.000 description 1
- FABOKLHQXVRECE-UHFFFAOYSA-N phenyl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)C1=CC=CC=C1 FABOKLHQXVRECE-UHFFFAOYSA-N 0.000 description 1
- VPLNCHFJAOKWBT-UHFFFAOYSA-N phenyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C1=CC=CC=C1 VPLNCHFJAOKWBT-UHFFFAOYSA-N 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- 239000005054 phenyltrichlorosilane Substances 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 238000013001 point bending Methods 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000412 polyarylene Polymers 0.000 description 1
- 229920001748 polybutylene Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 229920000223 polyglycerol Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920005597 polymer membrane Polymers 0.000 description 1
- 238000000710 polymer precipitation Methods 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920000193 polymethacrylate Polymers 0.000 description 1
- 229920006324 polyoxymethylene Polymers 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- FPRHEIIWBBYAEN-UHFFFAOYSA-N propan-2-yloxy(dipropyl)silane Chemical compound C(CC)[SiH](OC(C)C)CCC FPRHEIIWBBYAEN-UHFFFAOYSA-N 0.000 description 1
- 125000004368 propenyl group Chemical group C(=CC)* 0.000 description 1
- ZMYXZXUHYAGGKG-UHFFFAOYSA-N propoxysilane Chemical compound CCCO[SiH3] ZMYXZXUHYAGGKG-UHFFFAOYSA-N 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- AIFMYMZGQVTROK-UHFFFAOYSA-N silicon tetrabromide Chemical compound Br[Si](Br)(Br)Br AIFMYMZGQVTROK-UHFFFAOYSA-N 0.000 description 1
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 1
- CFTHARXEQHJSEH-UHFFFAOYSA-N silicon tetraiodide Chemical compound I[Si](I)(I)I CFTHARXEQHJSEH-UHFFFAOYSA-N 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 150000003432 sterols Chemical class 0.000 description 1
- 235000003702 sterols Nutrition 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000005720 sucrose Substances 0.000 description 1
- 125000001174 sulfone group Chemical group 0.000 description 1
- NVQCTSGVFRPZCZ-UHFFFAOYSA-N tert-butyl 3-oxohexaneperoxoate;zirconium Chemical compound [Zr].CCCC(=O)CC(=O)OOC(C)(C)C.CCCC(=O)CC(=O)OOC(C)(C)C NVQCTSGVFRPZCZ-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- MOOUPSHQAMJMSL-UHFFFAOYSA-N tert-butyl(trichloro)silane Chemical compound CC(C)(C)[Si](Cl)(Cl)Cl MOOUPSHQAMJMSL-UHFFFAOYSA-N 0.000 description 1
- ASEHKQZNVUOPRW-UHFFFAOYSA-N tert-butyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C(C)(C)C ASEHKQZNVUOPRW-UHFFFAOYSA-N 0.000 description 1
- MEZBMAOYBCEKPZ-UHFFFAOYSA-N tert-butyl(triiodo)silane Chemical compound CC(C)(C)[Si](I)(I)I MEZBMAOYBCEKPZ-UHFFFAOYSA-N 0.000 description 1
- HXLWJGIPGJFBEZ-UHFFFAOYSA-N tert-butyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C(C)(C)C HXLWJGIPGJFBEZ-UHFFFAOYSA-N 0.000 description 1
- YBCWQJZHAOTDLY-UHFFFAOYSA-N tert-butyl(triphenoxy)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(C(C)(C)C)OC1=CC=CC=C1 YBCWQJZHAOTDLY-UHFFFAOYSA-N 0.000 description 1
- UTIRVQGNGQSJNF-UHFFFAOYSA-N tert-butyl(tripropoxy)silane Chemical compound CCCO[Si](OCCC)(OCCC)C(C)(C)C UTIRVQGNGQSJNF-UHFFFAOYSA-N 0.000 description 1
- VMJIXANYDQPYPU-UHFFFAOYSA-N tert-butyl-(chloromethyl)-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CCl)(C(C)(C)C)OC(C)C VMJIXANYDQPYPU-UHFFFAOYSA-N 0.000 description 1
- AZWJKWJFAHCSAS-UHFFFAOYSA-N tert-butyl-(chloromethyl)-diethoxysilane Chemical compound CCO[Si](CCl)(C(C)(C)C)OCC AZWJKWJFAHCSAS-UHFFFAOYSA-N 0.000 description 1
- XMDNCXJUXMWGDW-UHFFFAOYSA-N tert-butyl-(chloromethyl)-dimethoxysilane Chemical compound CO[Si](CCl)(OC)C(C)(C)C XMDNCXJUXMWGDW-UHFFFAOYSA-N 0.000 description 1
- KINVROKQEPWGJJ-UHFFFAOYSA-N tert-butyl-(chloromethyl)-dipropoxysilane Chemical compound CCCO[Si](CCl)(C(C)(C)C)OCCC KINVROKQEPWGJJ-UHFFFAOYSA-N 0.000 description 1
- VAQCKYPQZADANJ-UHFFFAOYSA-N tert-butyl-(iodomethyl)-di(propan-2-yloxy)silane Chemical compound CC(C)O[Si](CI)(C(C)(C)C)OC(C)C VAQCKYPQZADANJ-UHFFFAOYSA-N 0.000 description 1
- KATJXEHQWPIWPL-UHFFFAOYSA-N tert-butyl-(iodomethyl)-dimethoxysilane Chemical compound CO[Si](CI)(OC)C(C)(C)C KATJXEHQWPIWPL-UHFFFAOYSA-N 0.000 description 1
- HQGVGCFRRIKVKV-UHFFFAOYSA-N tert-butyl-dichloro-(chloromethyl)silane Chemical compound CC(C)(C)[Si](Cl)(Cl)CCl HQGVGCFRRIKVKV-UHFFFAOYSA-N 0.000 description 1
- VYNOIONADYFEON-UHFFFAOYSA-N tert-butyl-dichloro-(iodomethyl)silane Chemical compound CC(C)(C)[Si](Cl)(Cl)CI VYNOIONADYFEON-UHFFFAOYSA-N 0.000 description 1
- JNAFDZYRRSNHIE-UHFFFAOYSA-N tert-butyl-diethoxy-(iodomethyl)silane Chemical compound CCO[Si](CI)(C(C)(C)C)OCC JNAFDZYRRSNHIE-UHFFFAOYSA-N 0.000 description 1
- HVEXJEOBOQONBC-UHFFFAOYSA-N tert-butyl-tri(propan-2-yloxy)silane Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)C(C)(C)C HVEXJEOBOQONBC-UHFFFAOYSA-N 0.000 description 1
- ULXGRUZMLVGCGL-UHFFFAOYSA-N tert-butyl-tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C(C)(C)C ULXGRUZMLVGCGL-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 150000005622 tetraalkylammonium hydroxides Chemical class 0.000 description 1
- OQTSOKXAWXRIAC-UHFFFAOYSA-N tetrabutan-2-yl silicate Chemical compound CCC(C)O[Si](OC(C)CC)(OC(C)CC)OC(C)CC OQTSOKXAWXRIAC-UHFFFAOYSA-N 0.000 description 1
- UQMOLLPKNHFRAC-UHFFFAOYSA-N tetrabutyl silicate Chemical compound CCCCO[Si](OCCCC)(OCCCC)OCCCC UQMOLLPKNHFRAC-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- ADLSSRLDGACTEX-UHFFFAOYSA-N tetraphenyl silicate Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 ADLSSRLDGACTEX-UHFFFAOYSA-N 0.000 description 1
- ZUEKXCXHTXJYAR-UHFFFAOYSA-N tetrapropan-2-yl silicate Chemical compound CC(C)O[Si](OC(C)C)(OC(C)C)OC(C)C ZUEKXCXHTXJYAR-UHFFFAOYSA-N 0.000 description 1
- ZQZCOBSUOFHDEE-UHFFFAOYSA-N tetrapropyl silicate Chemical compound CCCO[Si](OCCC)(OCCC)OCCC ZQZCOBSUOFHDEE-UHFFFAOYSA-N 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- BCLLLHFGVQKVKL-UHFFFAOYSA-N tetratert-butyl silicate Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C BCLLLHFGVQKVKL-UHFFFAOYSA-N 0.000 description 1
- FHYUCVWDMABHHH-UHFFFAOYSA-N toluene;1,2-xylene Chemical group CC1=CC=CC=C1.CC1=CC=CC=C1C FHYUCVWDMABHHH-UHFFFAOYSA-N 0.000 description 1
- IVRXTRZVBJSOLZ-UHFFFAOYSA-N tri(butan-2-yloxy)-[2-tri(butan-2-yloxy)silylphenyl]silane Chemical compound CCC(C)O[Si](OC(C)CC)(OC(C)CC)C1=CC=CC=C1[Si](OC(C)CC)(OC(C)CC)OC(C)CC IVRXTRZVBJSOLZ-UHFFFAOYSA-N 0.000 description 1
- SGZJOYFOVHWDFY-UHFFFAOYSA-N tri(butan-2-yloxy)-[3-tri(butan-2-yloxy)silylphenyl]silane Chemical compound CCC(C)O[Si](OC(C)CC)(OC(C)CC)C1=CC=CC([Si](OC(C)CC)(OC(C)CC)OC(C)CC)=C1 SGZJOYFOVHWDFY-UHFFFAOYSA-N 0.000 description 1
- OHGMZEITXQWDLR-UHFFFAOYSA-N tri(butan-2-yloxy)-[4-tri(butan-2-yloxy)silylphenyl]silane Chemical compound CCC(C)O[Si](OC(C)CC)(OC(C)CC)C1=CC=C([Si](OC(C)CC)(OC(C)CC)OC(C)CC)C=C1 OHGMZEITXQWDLR-UHFFFAOYSA-N 0.000 description 1
- FURAZISLABARIL-UHFFFAOYSA-N tri(butan-2-yloxy)-[di(butan-2-yloxy)methylsilylmethyl]silane Chemical compound CCC(C)OC(OC(C)CC)[SiH2]C[Si](OC(C)CC)(OC(C)CC)OC(C)CC FURAZISLABARIL-UHFFFAOYSA-N 0.000 description 1
- IKCSBNRFPJTRMT-UHFFFAOYSA-N tri(butan-2-yloxy)-[tri(butan-2-yloxy)silylmethyl]silane Chemical compound CCC(C)O[Si](OC(C)CC)(OC(C)CC)C[Si](OC(C)CC)(OC(C)CC)OC(C)CC IKCSBNRFPJTRMT-UHFFFAOYSA-N 0.000 description 1
- HKALKJRBIYJXJT-UHFFFAOYSA-N tri(butan-2-yloxy)-butylsilane Chemical compound CCCC[Si](OC(C)CC)(OC(C)CC)OC(C)CC HKALKJRBIYJXJT-UHFFFAOYSA-N 0.000 description 1
- SGHZCASSRKVVCL-UHFFFAOYSA-N tri(butan-2-yloxy)-ethylsilane Chemical compound CCC(C)O[Si](CC)(OC(C)CC)OC(C)CC SGHZCASSRKVVCL-UHFFFAOYSA-N 0.000 description 1
- RJNDDRZGJNVASH-UHFFFAOYSA-N tri(butan-2-yloxy)-methylsilane Chemical compound CCC(C)O[Si](C)(OC(C)CC)OC(C)CC RJNDDRZGJNVASH-UHFFFAOYSA-N 0.000 description 1
- PCDRXIBYKFIRQR-UHFFFAOYSA-N tri(butan-2-yloxy)-phenylsilane Chemical compound CCC(C)O[Si](OC(C)CC)(OC(C)CC)C1=CC=CC=C1 PCDRXIBYKFIRQR-UHFFFAOYSA-N 0.000 description 1
- ZARIZDBUWOPYMT-UHFFFAOYSA-N tri(butan-2-yloxy)-propylsilane Chemical compound CCC(C)O[Si](CCC)(OC(C)CC)OC(C)CC ZARIZDBUWOPYMT-UHFFFAOYSA-N 0.000 description 1
- JKJUOACCVYNCDI-UHFFFAOYSA-N tri(butan-2-yloxy)-tert-butylsilane Chemical compound CCC(C)O[Si](OC(C)CC)(OC(C)CC)C(C)(C)C JKJUOACCVYNCDI-UHFFFAOYSA-N 0.000 description 1
- COKLPZSYWJNYBJ-UHFFFAOYSA-N tri(butan-2-yloxy)silane Chemical compound CCC(C)O[SiH](OC(C)CC)OC(C)CC COKLPZSYWJNYBJ-UHFFFAOYSA-N 0.000 description 1
- MQVCTPXBBSKLFS-UHFFFAOYSA-N tri(propan-2-yloxy)-propylsilane Chemical compound CCC[Si](OC(C)C)(OC(C)C)OC(C)C MQVCTPXBBSKLFS-UHFFFAOYSA-N 0.000 description 1
- JGABXROLARSPEN-UHFFFAOYSA-N tri(propan-2-yloxy)silane Chemical compound CC(C)O[SiH](OC(C)C)OC(C)C JGABXROLARSPEN-UHFFFAOYSA-N 0.000 description 1
- DGTSXRWJKSHSCG-UHFFFAOYSA-N tribromo(1-tribromosilylethyl)silane Chemical compound Br[Si](Br)(Br)C(C)[Si](Br)(Br)Br DGTSXRWJKSHSCG-UHFFFAOYSA-N 0.000 description 1
- PFWMXXGPKFIEAA-UHFFFAOYSA-N tribromo(2-phenylethyl)silane Chemical compound Br[Si](Br)(Br)CCC1=CC=CC=C1 PFWMXXGPKFIEAA-UHFFFAOYSA-N 0.000 description 1
- HCSBZSDRJAJWHR-UHFFFAOYSA-N tribromo(butyl)silane Chemical compound CCCC[Si](Br)(Br)Br HCSBZSDRJAJWHR-UHFFFAOYSA-N 0.000 description 1
- OABHNYSMYGIZRF-UHFFFAOYSA-N tribromo(cyclohexyl)silane Chemical compound Br[Si](Br)(Br)C1CCCCC1 OABHNYSMYGIZRF-UHFFFAOYSA-N 0.000 description 1
- BZAROSBWJASVBU-UHFFFAOYSA-N tribromo(ethenyl)silane Chemical compound Br[Si](Br)(Br)C=C BZAROSBWJASVBU-UHFFFAOYSA-N 0.000 description 1
- KVENDAGPVNAYLY-UHFFFAOYSA-N tribromo(ethyl)silane Chemical compound CC[Si](Br)(Br)Br KVENDAGPVNAYLY-UHFFFAOYSA-N 0.000 description 1
- KBSUPJLTDMARAI-UHFFFAOYSA-N tribromo(methyl)silane Chemical compound C[Si](Br)(Br)Br KBSUPJLTDMARAI-UHFFFAOYSA-N 0.000 description 1
- HPTIEXHGTPSFDC-UHFFFAOYSA-N tribromo(phenyl)silane Chemical compound Br[Si](Br)(Br)C1=CC=CC=C1 HPTIEXHGTPSFDC-UHFFFAOYSA-N 0.000 description 1
- MHOVTIVXUNGWHW-UHFFFAOYSA-N tribromo(propan-2-yl)silane Chemical compound CC(C)[Si](Br)(Br)Br MHOVTIVXUNGWHW-UHFFFAOYSA-N 0.000 description 1
- RWRKNKVDHIEKHS-UHFFFAOYSA-N tribromo(propyl)silane Chemical compound CCC[Si](Br)(Br)Br RWRKNKVDHIEKHS-UHFFFAOYSA-N 0.000 description 1
- QWBBTCQPNIEDSP-UHFFFAOYSA-N tribromo(tert-butyl)silane Chemical compound CC(C)(C)[Si](Br)(Br)Br QWBBTCQPNIEDSP-UHFFFAOYSA-N 0.000 description 1
- ASWZNPOTXAXUPB-UHFFFAOYSA-N tribromo(tribromosilyl)silane Chemical compound Br[Si](Br)(Br)[Si](Br)(Br)Br ASWZNPOTXAXUPB-UHFFFAOYSA-N 0.000 description 1
- NMWWUBJEHVDRJB-UHFFFAOYSA-N tribromo(tribromosilylmethyl)silane Chemical compound Br[Si](Br)(Br)C[Si](Br)(Br)Br NMWWUBJEHVDRJB-UHFFFAOYSA-N 0.000 description 1
- PWVUSFVRYWVBDM-UHFFFAOYSA-N tribromo(tribromosilyloxy)silane Chemical compound Br[Si](Br)(Br)O[Si](Br)(Br)Br PWVUSFVRYWVBDM-UHFFFAOYSA-N 0.000 description 1
- IBOKZQNMFSHYNQ-UHFFFAOYSA-N tribromosilane Chemical compound Br[SiH](Br)Br IBOKZQNMFSHYNQ-UHFFFAOYSA-N 0.000 description 1
- DEKZKCDJQLBBRA-UHFFFAOYSA-N tributoxy(butyl)silane Chemical compound CCCCO[Si](CCCC)(OCCCC)OCCCC DEKZKCDJQLBBRA-UHFFFAOYSA-N 0.000 description 1
- CQLAZINSWMHWAQ-UHFFFAOYSA-N tributoxy(dibutoxymethylsilylmethyl)silane Chemical compound CCCCOC(OCCCC)[SiH2]C[Si](OCCCC)(OCCCC)OCCCC CQLAZINSWMHWAQ-UHFFFAOYSA-N 0.000 description 1
- GIHPVQDFBJMUAO-UHFFFAOYSA-N tributoxy(ethyl)silane Chemical compound CCCCO[Si](CC)(OCCCC)OCCCC GIHPVQDFBJMUAO-UHFFFAOYSA-N 0.000 description 1
- GYZQBXUDWTVJDF-UHFFFAOYSA-N tributoxy(methyl)silane Chemical compound CCCCO[Si](C)(OCCCC)OCCCC GYZQBXUDWTVJDF-UHFFFAOYSA-N 0.000 description 1
- INUOIYMEJLOQFN-UHFFFAOYSA-N tributoxy(phenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C1=CC=CC=C1 INUOIYMEJLOQFN-UHFFFAOYSA-N 0.000 description 1
- WAAWAIHPWOJHJJ-UHFFFAOYSA-N tributoxy(propyl)silane Chemical compound CCCCO[Si](CCC)(OCCCC)OCCCC WAAWAIHPWOJHJJ-UHFFFAOYSA-N 0.000 description 1
- MVXBTESZGSNIIB-UHFFFAOYSA-N tributoxy(tert-butyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C(C)(C)C MVXBTESZGSNIIB-UHFFFAOYSA-N 0.000 description 1
- JXXQPVMVSMWLGZ-UHFFFAOYSA-N tributoxy(tributoxysilylmethyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C[Si](OCCCC)(OCCCC)OCCCC JXXQPVMVSMWLGZ-UHFFFAOYSA-N 0.000 description 1
- ZYXLOEAJFSQDQG-UHFFFAOYSA-N tributoxy-(2-tributoxysilylphenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C1=CC=CC=C1[Si](OCCCC)(OCCCC)OCCCC ZYXLOEAJFSQDQG-UHFFFAOYSA-N 0.000 description 1
- UYZUVKDKSJFNIN-UHFFFAOYSA-N tributoxy-(3-tributoxysilylphenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C1=CC=CC([Si](OCCCC)(OCCCC)OCCCC)=C1 UYZUVKDKSJFNIN-UHFFFAOYSA-N 0.000 description 1
- YBNXDKRALACDIA-UHFFFAOYSA-N tributoxy-(4-tributoxysilylphenyl)silane Chemical compound CCCCO[Si](OCCCC)(OCCCC)C1=CC=C([Si](OCCCC)(OCCCC)OCCCC)C=C1 YBNXDKRALACDIA-UHFFFAOYSA-N 0.000 description 1
- UCSBCWBHZLSFGC-UHFFFAOYSA-N tributoxysilane Chemical compound CCCCO[SiH](OCCCC)OCCCC UCSBCWBHZLSFGC-UHFFFAOYSA-N 0.000 description 1
- JSQJUDVTRRCSRU-UHFFFAOYSA-N tributyl(chloro)silane Chemical compound CCCC[Si](Cl)(CCCC)CCCC JSQJUDVTRRCSRU-UHFFFAOYSA-N 0.000 description 1
- RYHGFALZTBTGDK-UHFFFAOYSA-N tributyl(iodo)silane Chemical compound CCCC[Si](I)(CCCC)CCCC RYHGFALZTBTGDK-UHFFFAOYSA-N 0.000 description 1
- RPWIVYRJUHMXOQ-UHFFFAOYSA-N trichloro(1-chlorobutyl)silane Chemical compound CCCC(Cl)[Si](Cl)(Cl)Cl RPWIVYRJUHMXOQ-UHFFFAOYSA-N 0.000 description 1
- KGTMHSVVFJZNOD-UHFFFAOYSA-N trichloro(1-chloroprop-2-enyl)silane Chemical compound C=CC(Cl)[Si](Cl)(Cl)Cl KGTMHSVVFJZNOD-UHFFFAOYSA-N 0.000 description 1
- QPYFKHDLAURNJO-UHFFFAOYSA-N trichloro(2-chlorobutan-2-yl)silane Chemical compound CCC(C)(Cl)[Si](Cl)(Cl)Cl QPYFKHDLAURNJO-UHFFFAOYSA-N 0.000 description 1
- PPQQGGUAEQVKHK-UHFFFAOYSA-N trichloro(2-chloropropan-2-yl)silane Chemical compound CC(C)(Cl)[Si](Cl)(Cl)Cl PPQQGGUAEQVKHK-UHFFFAOYSA-N 0.000 description 1
- FMYXZXAKZWIOHO-UHFFFAOYSA-N trichloro(2-phenylethyl)silane Chemical compound Cl[Si](Cl)(Cl)CCC1=CC=CC=C1 FMYXZXAKZWIOHO-UHFFFAOYSA-N 0.000 description 1
- WDVUXWDZTPZIIE-UHFFFAOYSA-N trichloro(2-trichlorosilylethyl)silane Chemical compound Cl[Si](Cl)(Cl)CC[Si](Cl)(Cl)Cl WDVUXWDZTPZIIE-UHFFFAOYSA-N 0.000 description 1
- QDPYNKGKKGQJBF-UHFFFAOYSA-N trichloro(3-chloropentan-3-yl)silane Chemical compound CCC(Cl)(CC)[Si](Cl)(Cl)Cl QDPYNKGKKGQJBF-UHFFFAOYSA-N 0.000 description 1
- SIPHWXREAZVVNS-UHFFFAOYSA-N trichloro(cyclohexyl)silane Chemical compound Cl[Si](Cl)(Cl)C1CCCCC1 SIPHWXREAZVVNS-UHFFFAOYSA-N 0.000 description 1
- LQUJCRPJNSUWKY-UHFFFAOYSA-N trichloro(dichloromethyl)silane Chemical compound ClC(Cl)[Si](Cl)(Cl)Cl LQUJCRPJNSUWKY-UHFFFAOYSA-N 0.000 description 1
- GQIUQDDJKHLHTB-UHFFFAOYSA-N trichloro(ethenyl)silane Chemical compound Cl[Si](Cl)(Cl)C=C GQIUQDDJKHLHTB-UHFFFAOYSA-N 0.000 description 1
- ZOYFEXPFPVDYIS-UHFFFAOYSA-N trichloro(ethyl)silane Chemical compound CC[Si](Cl)(Cl)Cl ZOYFEXPFPVDYIS-UHFFFAOYSA-N 0.000 description 1
- INXHVQVFSBWEHS-UHFFFAOYSA-N trichloro(iodomethyl)silane Chemical compound Cl[Si](Cl)(Cl)CI INXHVQVFSBWEHS-UHFFFAOYSA-N 0.000 description 1
- ORVMIVQULIKXCP-UHFFFAOYSA-N trichloro(phenyl)silane Chemical compound Cl[Si](Cl)(Cl)C1=CC=CC=C1 ORVMIVQULIKXCP-UHFFFAOYSA-N 0.000 description 1
- GPWLZOISJZHVHX-UHFFFAOYSA-N trichloro(propan-2-yl)silane Chemical compound CC(C)[Si](Cl)(Cl)Cl GPWLZOISJZHVHX-UHFFFAOYSA-N 0.000 description 1
- DOEHJNBEOVLHGL-UHFFFAOYSA-N trichloro(propyl)silane Chemical compound CCC[Si](Cl)(Cl)Cl DOEHJNBEOVLHGL-UHFFFAOYSA-N 0.000 description 1
- YWUUHVWMPSPGQO-UHFFFAOYSA-N trichloro(trichloromethyl)silane Chemical compound ClC(Cl)(Cl)[Si](Cl)(Cl)Cl YWUUHVWMPSPGQO-UHFFFAOYSA-N 0.000 description 1
- LXEXBJXDGVGRAR-UHFFFAOYSA-N trichloro(trichlorosilyl)silane Chemical compound Cl[Si](Cl)(Cl)[Si](Cl)(Cl)Cl LXEXBJXDGVGRAR-UHFFFAOYSA-N 0.000 description 1
- ABDDAHLAEXNYRC-UHFFFAOYSA-N trichloro(trichlorosilylmethyl)silane Chemical compound Cl[Si](Cl)(Cl)C[Si](Cl)(Cl)Cl ABDDAHLAEXNYRC-UHFFFAOYSA-N 0.000 description 1
- QHAHOIWVGZZELU-UHFFFAOYSA-N trichloro(trichlorosilyloxy)silane Chemical compound Cl[Si](Cl)(Cl)O[Si](Cl)(Cl)Cl QHAHOIWVGZZELU-UHFFFAOYSA-N 0.000 description 1
- WXZOJKGGVNTBBY-UHFFFAOYSA-N tricyclohexyl(iodo)silane Chemical compound C1CCCCC1[Si](C1CCCCC1)(I)C1CCCCC1 WXZOJKGGVNTBBY-UHFFFAOYSA-N 0.000 description 1
- XVYIJOWQJOQFBG-UHFFFAOYSA-N triethoxy(fluoro)silane Chemical compound CCO[Si](F)(OCC)OCC XVYIJOWQJOQFBG-UHFFFAOYSA-N 0.000 description 1
- ALFJOLYGZMCHHC-UHFFFAOYSA-N triethoxy(iodomethyl)silane Chemical compound CCO[Si](CI)(OCC)OCC ALFJOLYGZMCHHC-UHFFFAOYSA-N 0.000 description 1
- NBXZNTLFQLUFES-UHFFFAOYSA-N triethoxy(propyl)silane Chemical compound CCC[Si](OCC)(OCC)OCC NBXZNTLFQLUFES-UHFFFAOYSA-N 0.000 description 1
- JIOGKDWMNMIDEY-UHFFFAOYSA-N triethoxy-(2-triethoxysilylphenyl)silane Chemical compound CCO[Si](OCC)(OCC)C1=CC=CC=C1[Si](OCC)(OCC)OCC JIOGKDWMNMIDEY-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- PPLMQFARLJLZAO-UHFFFAOYSA-N triethyl(iodo)silane Chemical compound CC[Si](I)(CC)CC PPLMQFARLJLZAO-UHFFFAOYSA-N 0.000 description 1
- GBUPQQVBBMOHMJ-UHFFFAOYSA-N triiodo(1-triiodosilylethyl)silane Chemical compound I[Si](I)(I)C(C)[Si](I)(I)I GBUPQQVBBMOHMJ-UHFFFAOYSA-N 0.000 description 1
- OWPIUELMEJJOEM-UHFFFAOYSA-N triiodo(2-phenylethyl)silane Chemical compound I[Si](I)(I)CCC1=CC=CC=C1 OWPIUELMEJJOEM-UHFFFAOYSA-N 0.000 description 1
- ARIHFGQDMNMGQJ-UHFFFAOYSA-N triiodo(methyl)silane Chemical compound C[Si](I)(I)I ARIHFGQDMNMGQJ-UHFFFAOYSA-N 0.000 description 1
- HBVCQKOZPHBDAR-UHFFFAOYSA-N triiodo(phenyl)silane Chemical compound I[Si](I)(I)C1=CC=CC=C1 HBVCQKOZPHBDAR-UHFFFAOYSA-N 0.000 description 1
- GVSZXOJERRZCHO-UHFFFAOYSA-N triiodo(propan-2-yl)silane Chemical compound CC(C)[Si](I)(I)I GVSZXOJERRZCHO-UHFFFAOYSA-N 0.000 description 1
- GTLPSNWPFBXKQA-UHFFFAOYSA-N triiodo(propyl)silane Chemical compound CCC[Si](I)(I)I GTLPSNWPFBXKQA-UHFFFAOYSA-N 0.000 description 1
- HWTOQUMCTOJBIS-UHFFFAOYSA-N triiodo(triiodosilylmethyl)silane Chemical compound I[Si](I)(I)C[Si](I)(I)I HWTOQUMCTOJBIS-UHFFFAOYSA-N 0.000 description 1
- DNAPJAGHXMPFLD-UHFFFAOYSA-N triiodosilane Chemical compound I[SiH](I)I DNAPJAGHXMPFLD-UHFFFAOYSA-N 0.000 description 1
- JCGDCINCKDQXDX-UHFFFAOYSA-N trimethoxy(2-trimethoxysilylethyl)silane Chemical compound CO[Si](OC)(OC)CC[Si](OC)(OC)OC JCGDCINCKDQXDX-UHFFFAOYSA-N 0.000 description 1
- HQYALQRYBUJWDH-UHFFFAOYSA-N trimethoxy(propyl)silane Chemical compound CCC[Si](OC)(OC)OC HQYALQRYBUJWDH-UHFFFAOYSA-N 0.000 description 1
- KNYWDHFOQZZIDQ-UHFFFAOYSA-N trimethoxy-(2-trimethoxysilylphenyl)silane Chemical compound CO[Si](OC)(OC)C1=CC=CC=C1[Si](OC)(OC)OC KNYWDHFOQZZIDQ-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- PZJJKWKADRNWSW-UHFFFAOYSA-N trimethoxysilicon Chemical group CO[Si](OC)OC PZJJKWKADRNWSW-UHFFFAOYSA-N 0.000 description 1
- CSRZQMIRAZTJOY-UHFFFAOYSA-N trimethylsilyl iodide Chemical compound C[Si](C)(C)I CSRZQMIRAZTJOY-UHFFFAOYSA-N 0.000 description 1
- IXJNGXCZSCHDFE-UHFFFAOYSA-N triphenoxy(phenyl)silane Chemical compound C=1C=CC=CC=1O[Si](C=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 IXJNGXCZSCHDFE-UHFFFAOYSA-N 0.000 description 1
- AMUIJRKZTXWCEA-UHFFFAOYSA-N triphenoxy(propyl)silane Chemical compound C=1C=CC=CC=1O[Si](OC=1C=CC=CC=1)(CCC)OC1=CC=CC=C1 AMUIJRKZTXWCEA-UHFFFAOYSA-N 0.000 description 1
- MUCRQDBOUNQJFE-UHFFFAOYSA-N triphenoxy(triphenoxysilyl)silane Chemical compound C=1C=CC=CC=1O[Si]([Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 MUCRQDBOUNQJFE-UHFFFAOYSA-N 0.000 description 1
- YRUALOZSEADDBR-UHFFFAOYSA-N triphenyl triphenoxysilyl silicate Chemical compound C=1C=CC=CC=1O[Si](O[Si](OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC=1C=CC=CC=1)(OC=1C=CC=CC=1)OC1=CC=CC=C1 YRUALOZSEADDBR-UHFFFAOYSA-N 0.000 description 1
- QDOHRQCMIFOPEY-UHFFFAOYSA-N tripropoxy(2-tripropoxysilylethyl)silane Chemical compound CCCO[Si](OCCC)(OCCC)CC[Si](OCCC)(OCCC)OCCC QDOHRQCMIFOPEY-UHFFFAOYSA-N 0.000 description 1
- VUWVDNLZJXLQPT-UHFFFAOYSA-N tripropoxy(propyl)silane Chemical compound CCCO[Si](CCC)(OCCC)OCCC VUWVDNLZJXLQPT-UHFFFAOYSA-N 0.000 description 1
- OZWKZRFXJPGDFM-UHFFFAOYSA-N tripropoxysilane Chemical compound CCCO[SiH](OCCC)OCCC OZWKZRFXJPGDFM-UHFFFAOYSA-N 0.000 description 1
- ORBIWUVSNQKBNY-UHFFFAOYSA-N tris(3-bicyclo[2.2.1]heptanyl)-bromosilane Chemical compound C1C(C2)CCC2C1[Si](Br)(C1C2CCC(C2)C1)C1C(C2)CCC2C1 ORBIWUVSNQKBNY-UHFFFAOYSA-N 0.000 description 1
- DMFPULBEKRWMBR-UHFFFAOYSA-N tris(3-bicyclo[2.2.1]heptanyl)-chlorosilane Chemical compound C1C(C2)CCC2C1[Si](Cl)(C1C2CCC(C2)C1)C1C(C2)CCC2C1 DMFPULBEKRWMBR-UHFFFAOYSA-N 0.000 description 1
- YHRZMJOTERBNEE-UHFFFAOYSA-N tris(3-bicyclo[2.2.1]heptanyl)-iodosilane Chemical compound C1C(C2)CCC2C1[Si](I)(C1C2CCC(C2)C1)C1C(C2)CCC2C1 YHRZMJOTERBNEE-UHFFFAOYSA-N 0.000 description 1
- ZZEMYLNHCSTIPH-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-[2-[tris[(2-methylpropan-2-yl)oxy]silyl]phenyl]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C1=CC=CC=C1[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C ZZEMYLNHCSTIPH-UHFFFAOYSA-N 0.000 description 1
- NNKMRNUOGTXRCM-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-[3-[tris[(2-methylpropan-2-yl)oxy]silyl]phenyl]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C1=CC=CC([Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C)=C1 NNKMRNUOGTXRCM-UHFFFAOYSA-N 0.000 description 1
- PITXUFPLSLHXRV-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-[4-[tris[(2-methylpropan-2-yl)oxy]silyl]phenyl]silane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C1=CC=C([Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C)C=C1 PITXUFPLSLHXRV-UHFFFAOYSA-N 0.000 description 1
- KGOOITCIBGXHJO-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-phenylsilane Chemical compound CC(C)(C)O[Si](OC(C)(C)C)(OC(C)(C)C)C1=CC=CC=C1 KGOOITCIBGXHJO-UHFFFAOYSA-N 0.000 description 1
- DIZPPYBTFPZSGK-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]-propylsilane Chemical compound CCC[Si](OC(C)(C)C)(OC(C)(C)C)OC(C)(C)C DIZPPYBTFPZSGK-UHFFFAOYSA-N 0.000 description 1
- QCKKBOHAYRLMQP-UHFFFAOYSA-N tris[(2-methylpropan-2-yl)oxy]silane Chemical compound CC(C)(C)O[SiH](OC(C)(C)C)OC(C)(C)C QCKKBOHAYRLMQP-UHFFFAOYSA-N 0.000 description 1
- DJECDCLXTNZYDL-UHFFFAOYSA-N tritert-butyl(chloro)silane Chemical compound CC(C)(C)[Si](Cl)(C(C)(C)C)C(C)(C)C DJECDCLXTNZYDL-UHFFFAOYSA-N 0.000 description 1
- FUGWOYOEVNYBJX-UHFFFAOYSA-N tritert-butyl(iodo)silane Chemical compound CC(C)(C)[Si](I)(C(C)(C)C)C(C)(C)C FUGWOYOEVNYBJX-UHFFFAOYSA-N 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 239000005050 vinyl trichlorosilane Substances 0.000 description 1
- 239000003643 water by type Substances 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/48—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
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- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/14—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers in which at least two but not all the silicon atoms are connected by linkages other than oxygen atoms
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Description
1種以上の(A)ポリカルボシランの存在下、(B)加水分解性基含有シランモノマーを加水分解縮合することを含み、
前記(A)ポリカルボシランのうち少なくとも1種が、以下のポリカルボシラン(I)である。
R1 mY3−mSiCR2 nX3−n ・・・・・(1)
(式中、R1,R2は同一または異なり、それぞれ1価の有機基または水素原子を示し、Xはハロゲン原子を示し、Yはハロゲン原子またはアルコキシ基を示し、kは0〜3の整数を示し、mおよびnは同一または異なり、0〜2の整数を示す。)
(式中、R3は水素原子,フッ素原子または1価の有機基を示し、Xはハロゲン原子あるいはアルコキシ基を示し、aは0〜3の整数を示す。)
R4 bY3−bSi−(R6)d−SiZ3−cR5 c ・・・・・(3)
(式中、R4,R5は同一または異なり、それぞれ1価の有機基を示し、bおよびcは同一または異なり、0〜2の整数を示し、R6は酸素原子,フェニレン基または−(CH2)e−で表される基(ここで、eは1〜6の整数である)を示し、YおよびZは同一または異なり、ハロゲン原子またはアルコキシ基を示し、dは0または1を示す。)
本発明のポリマーは、1種以上の(A)ポリカルボシランの存在下、(B)加水分解性基含有シランモノマーを加水分解縮合するによって得られる。
本発明のポリマーにおいては、(A)ポリカルボシランのうち少なくとも1種が、以下のポリカルボシラン(I)である。
R1 mY3−mSiCR2 nX3−n ・・・・・(1)
(式中、R1,R2は同一または異なり、それぞれ1価の有機基または水素原子を示し、Xはハロゲン原子を示し、Yはハロゲン原子またはアルコキシ基を示し、mおよびnは同一または異なり、0〜2の整数を示す。)
一般式(1)において、R1,R2は同一または異なり、水素原子、または1価の有機基である。R1,R2の具体例としては、アルキル基、アルケニル基、アルキニル基などの炭素数1〜10の直鎖状または分岐鎖状脂肪族基;シクロアルキル基、シクロアルケニル基、ビシクロアルキル基などの炭素数が3〜20の脂環式基;炭素数が6〜20のアリール基;および炭素数が6〜20のアラルキル基を挙げることができる。
(1−クロロエチル)トリクロロシラン、(1−クロロプロピル)トリクロロシラン、(2−クロロ−2−プロピル)トリクロロシラン、(1−クロロブチル)トリクロロシラン、(2−クロロ−2−ブチル)トリクロロシラン、(3−クロロ−3−ペンチル)トリクロロシラン、(1−クロロ−2−プロペニル)トリクロロシラン、(α−クロロベンジル)トリクロロシラン、ジクロロメチルトリクロロシラン、トリクロロメチルトリクロロシラン、(1−クロロエチル)メチルジクロロシラン、(1−クロロプロピル)メチルジクロロシラン、(2−クロロ−2−プロピル)メチルジクロロシラン、(1−クロロブチル)メチルジクロロシラン、(2−クロロ−2−ブチル)メチルジクロロシラン、(3−クロロ−3−ペンチル)メチルジクロロシラン、(1−クロロ−2−プロペニル)メチルジクロロシラン、(α−クロロベンジル)メチルジクロロシラン、ジクロロメチルメチルジクロロシラン、トリクロロメチルメチルジクロロシラン、(1−クロロエチル)ジメチルクロロシラン、(1−クロロプロピル)ジメチルクロロシラン、(2−クロロ−2−プロピル)ジメチルクロロシラン、(1−クロロブチル)ジメチルクロロシラン、(2−クロロ−2−ブチル)ジメチルクロロシラン、(3−クロロ−3−ペンチル)ジメチルクロロシラン、(1−クロロ−2−プロペニル)ジメチルクロロシラン、(α−クロロベンジル)ジメチルクロロシラン、ジクロロメチルジメチルクロロシラン、トリクロロメチルジメチルクロロシランなど;
クロロメチルトリメトキシシラン、ブロモメチルトリメトキシシラン、ヨードメチルトリメトキシシラン、クロロメチルメチルジメトキシシラン、クロロメチルエチルジメトキシシラン、クロロメチル−n−プロピルジメトキシシラン、クロロメチルイソプロピルジメトキシシラン、クロロメチル−n−ブチルジメトキシシラン、クロロメチル−t−ブチルジメトキシシラン、クロロメチルシクロヘキシルジメトキシシラン、クロロメチルフェネチルジメトキシシラン、クロロメチルビニルジメトキシシラン、クロロメチルフェニルジメトキシシラン、ブロモメチルメチルジメトキシシラン、ブロモメチルエチルジメトキシシラン、ブロモメチル−n−プロピルジメトキシシラン、ブロモメチルイソプロピルジメトキシシラン、ブロモメチル−n−ブチルジメトキシシラン、ブロモメチル−t−ブチルジメトキシシラン、ブロモメチルシクロヘキシルジメトキシシラン、ブロモメチルフェネチルジメトキシシラン、ブロモメチルビニルジメトキシシラン、ブロモメチルフェニルジメトキシシラン、ヨードメチルメチルジメトキシシラン、ヨードメチルエチルジメトキシシラン、ヨードメチル−n−プロピルジメトキシシラン、ヨードメチルイソプロピルジメトキシシラン、ヨードメチル−n−ブチルジメトキシシラン、ヨードメチル−t−ブチルジメトキシシラン、ヨードメチルシクロヘキシルジメトキシシラン、ヨードメチルフェネチルジメトキシシラン、ヨードメチルビニルジメトキシシラン、ヨードメチルフェニルジメトキシシラン、クロロメチルジメチルメトキシシラン、クロロメチルジエチルメトキシシラン、クロロメチルジ−n−プロピルメトキシシラン、クロロメチルジイソプロピルメトキシシラン、クロロメチル−n−ジブチルメトキシシラン、クロロメチルジ−t−ブチルメトキシシラン、クロロメチルジシクロヘキシルメトキシシラン、クロロメチルジフェネチルメトキシシラン、クロロメチルジビニルメトキシシラン、クロロメチルジフェニルメトキシシラン、ブロモメチルジメチルメトキシシラン、ブロモメチルジエチルメトキシシラン、ブロモメチルジ−n−プロピルメトキシシラン、ブロモメチルジイソプロピルメトキシシラン、ブロモメチルジ−n−ブチルメトキシシラン、ブロモメチルジ−t−ブチルメトキシシラン、ブロモメチルジシクロヘキシルメトキシシラン、ブロモメチルジフェネチルメトキシシラン、ブロモメチルジビニルメトキシシラン、ブロモメチルジフェニルメトキシシラン、ヨードメチルジメチルメトキシシラン、ヨードメチルジエチルメトキシシラン、ヨードメチルジ−n−プロピルメトキシシラン、ヨードメチルジイソプロピルメトキシシラン、ヨードメチルジ−n−ブチルメトキシシラン、ヨードメチルジ−t−ブチルメトキシシラン、ヨードメチルジシクロヘキシルメトキシシラン、ヨードメチルジフェネチルメトキシシラン、ヨードメチルジビニルメトキシシラン、ヨードメチルジフェニルメトキシシランなど;
クロロメチルトリエトキシシラン、ブロモメチルトリエトキシシラン、ヨードメチルトリエトキシシラン、クロロメチルメチルジエトキシシラン、クロロメチルエチルジエトキシシラン、クロロメチル−n−プロピルジエトキシシラン、クロロメチルイソプロピルジエトキシシラン、クロロメチル−n−ブチルジエトキシシラン、クロロメチル−t−ブチルジエトキシシラン、クロロメチルシクロヘキシルジエトキシシラン、クロロメチルフェネチルジエトキシシラン、クロロメチルビニルジエトキシシラン、クロロメチルフェニルジエトキシシラン、ブロモメチルメチルジエトキシシラン、ブロモメチルエチルジエトキシシラン、ブロモメチル−n−プロピルジエトキシシラン、ブロモメチルイソプロピルジエトキシシラン、ブロモメチル−n−ブチルジエトキシシラン、ブロモメチル−t−ブチルジエトキシシラン、ブロモメチルシクロヘキシルジエトキシシラン、ブロモメチルフェネチルジエトキシシラン、ブロモメチルビニルジエトキシシラン、ブロモメチルフェニルジエトキシシラン、ヨードメチルメチルジエトキシシラン、ヨードメチルエチルジエトキシシラン、ヨードメチル−n−プロピルジエトキシシラン、ヨードメチルイソプロピルジエトキシシラン、ヨードメチル−n−ブチルジエトキシシラン、ヨードメチル−t−ブチルジエトキシシラン、ヨードメチルシクロヘキシルジエトキシシラン、ヨードメチルフェネチルジエトキシシラン、ヨードメチルビニルジエトキシシラン、ヨードメチルフェニルジエトキシシラン、クロロメチルジメチルエトキシシラン、クロロメチルジエチルエトキシシラン、クロロメチルジ−n−プロピルエトキシシラン、クロロメチルジイソプロピルエトキシシラン、クロロメチル−n−ジブチルエトキシシラン、クロロメチルジ−t−ブチルエトキシシラン、クロロメチルジシクロヘキシルエトキシシラン、クロロメチルジフェネチルエトキシシラン、クロロメチルジビニルエトキシシラン、クロロメチルジフェニルエトキシシラン、ブロモメチルジメチルエトキシシラン、ブロモメチルジエチルエトキシシラン、ブロモメチルジ−n−プロピルエトキシシラン、ブロモメチルジイソプロピルエトキシシラン、ブロモメチルジ−n−ブチルエトキシシラン、ブロモメチルジ−t−ブチルエトキシシラン、ブロモメチルジシクロヘキシルエトキシシラン、ブロモメチルジフェネチルエトキシシラン、ブロモメチルジビニルエトキシシラン、ブロモメチルジフェニルエトキシシラン、ヨードメチルジメチルエトキシシラン、ヨードメチルジエチルエトキシシラン、ヨードメチルジ−n−プロピルエトキシシラン、ヨードメチルジイソプロピルエトキシシラン、ヨードメチルジ−n−ブチルエトキシシラン、ヨードメチルジ−t−ブチルエトキシシラン、ヨードメチルジシクロヘキシルエトキシシラン、ヨードメチルジフェネチルエトキシシラン、ヨードメチルジビニルエトキシシラン、ヨードメチルジフェニルエトキシシランなど;
クロロメチルトリ−n−プロポキシシラン、ブロモメチルトリ−n−プロポキシシラン、ヨードメチルトリ−n−プロポキシシラン、クロロメチルメチルジ−n−プロポキシシラン、クロロメチルエチルジ−n−プロポキシシラン、クロロメチル−n−プロピルジ−n−プロポキシシラン、クロロメチルイソプロピルジ−n−プロポキシシラン、クロロメチル−n−ブチルジ−n−プロポキシシラン、クロロメチル−t−ブチルジ−n−プロポキシシラン、クロロメチルシクロヘキシルジ−n−プロポキシシラン、クロロメチルフェネチルジ−n−プロポキシシラン、クロロメチルビニルジ−n−プロポキシシラン、クロロメチルフェニルジ−n−プロポキシシラン、ブロモメチルメチルジ−n−プロポキシシラン、ブロモメチルエチルジ−n−プロポキシシラン、ブロモメチル−n−プロピルジ−n−プロポキシシラン、ブロモメチルイソプロピルジ−n−プロポキシシラン、ブロモメチル−n−ブチルジ−n−プロポキシシラン、ブロモメチル−t−ブチルジ−n−プロポキシシラン、ブロモメチルシクロヘキシルジ−n−プロポキシシラン、ブロモメチルフェネチルジ−n−プロポキシシラン、ブロモメチルビニルジ−n−プロポキシシラン、ブロモメチルフェニルジ−n−プロポキシシラン、ヨードメチルメチルジ−n−プロポキシシラン、ヨードメチルエチルジ−n−プロポキシシラン、ヨードメチル−n−プロピルジ−n−プロポキシシラン、ヨードメチルイソプロピルジ−n−プロポキシシラン、ヨードメチル−n−ブチルジ−n−プロポキシシラン、ヨードメチル−t−ブチルジ−n−プロポキシシラン、ヨードメチルシクロヘキシルジ−n−プロポキシシラン、ヨードメチルフェネチルジ−n−プロポキシシラン、ヨードメチルビニルジ−n−プロポキシシラン、ヨードメチルフェニルジ−n−プロポキシシラン、クロロメチルジメチル−n−プロポキシシラン、クロロメチルジエチル−n−プロポキシシラン、クロロメチルジ−n−プロピル−n−プロポキシシラン、クロロメチルジイソプロピル−n−プロポキシシラン、クロロメチル−n−ジブチル−n−プロポキシシラン、クロロメチルジ−t−ブチル−n−プロポキシシラン、クロロメチルジシクロヘキシル−n−プロポキシシラン、クロロメチルジフェネチル−n−プロポキシシラン、クロロメチルジビニル−n−プロポキシシラン、クロロメチルジフェニル−n−プロポキシシラン、ブロモメチルジメチル−n−プロポキシシラン、ブロモメチルジエチル−n−プロポキシシラン、ブロモメチルジ−n−プロピル−n−プロポキシシラン、ブロモメチルジイソプロピル−n−プロポキシシラン、ブロモメチルジ−n−ブチル−n−プロポキシシラン、ブロモメチルジ−t−ブチル−n−プロポキシシラン、ブロモメチルジシクロヘキシル−n−プロポキシシラン、ブロモメチルジフェネチル−n−プロポキシシラン、ブロモメチルジビニル−n−プロポキシシラン、ブロモメチルジフェニル−n−プロポキシシラン、ヨードメチルジメチル−n−プロポキシシラン、ヨードメチルジエチル−n−プロポキシシラン、ヨードメチルジ−n−プロピル−n−プロポキシシラン、ヨードメチルジイソプロピル−n−プロポキシシラン、ヨードメチルジ−n−ブチル−n−プロポキシシラン、ヨードメチルジ−t−ブチル−n−プロポキシシラン、ヨードメチルジシクロヘキシル−n−プロポキシシラン、ヨードメチルジフェネチル−n−プロポキシシラン、ヨードメチルジビニル−n−プロポキシシラン、ヨードメチルジフェニル−n−プロポキシシランなど;
クロロメチルトリイソプロポキシシラン、ブロモメチルトリイソプロポキシシラン、ヨードメチルトリイソプロポキシシラン、クロロメチルメチルジイソプロポキシシラン、クロロメチルエチルジイソプロポキシシラン、クロロメチル−n−プロピルジイソプロポキシシラン、クロロメチルイソプロピルジイソプロポキシシラン、クロロメチル−n−ブチルジイソプロポキシシラン、クロロメチル−t−ブチルジイソプロポキシシラン、クロロメチルシクロヘキシルジイソプロポキシシラン、クロロメチルフェネチルジイソプロポキシシラン、クロロメチルビニルジイソプロポキシシラン、クロロメチルフェニルジイソプロポキシシラン、ブロモメチルメチルジイソプロポキシシラン、ブロモメチルエチルジイソプロポキシシラン、ブロモメチル−n−プロピルジイソプロポキシシラン、ブロモメチルイソプロピルジイソプロポキシシラン、ブロモメチル−n−ブチルジイソプロポキシシラン、ブロモメチル−t−ブチルジイソプロポキシシラン、ブロモメチルシクロヘキシルジイソプロポキシシラン、ブロモメチルフェネチルジイソプロポキシシラン、ブロモメチルビニルジイソプロポキシシラン、ブロモメチルフェニルジイソプロポキシシラン、ヨードメチルメチルジイソプロポキシシラン、ヨードメチルエチルジイソプロポキシシラン、ヨードメチル−n−プロピルジイソプロポキシシラン、ヨードメチルイソプロピルジイソプロポキシシラン、ヨードメチル−n−ブチルジイソプロポキシシラン、ヨードメチル−t−ブチルジイソプロポキシシラン、ヨードメチルシクロヘキシルジイソプロポキシシラン、ヨードメチルフェネチルジイソプロポキシシラン、ヨードメチルビニルジイソプロポキシシラン、ヨードメチルフェニルジイソプロポキシシラン、クロロメチルジメチルイソプロポキシシラン、クロロメチルジエチルイソプロポキシシラン、クロロメチルジ−n−プロピルイソプロポキシシラン、クロロメチルジイソプロピルイソプロポキシシラン、クロロメチル−n−ジブチルイソプロポキシシラン、クロロメチルジ−t−ブチルイソプロポキシシラン、クロロメチルジシクロヘキシルイソプロポキシシラン、クロロメチルジフェネチルイソプロポキシシラン、クロロメチルジビニルイソプロポキシシラン、クロロメチルジフェニルイソプロポキシシラン、ブロモメチルジメチルイソプロポキシシラン、ブロモメチルジエチルイソプロポキシシラン、ブロモメチルジ−n−プロピルイソプロポキシシラン、ブロモメチルジイソプロピルイソプロポキシシラン、ブロモメチルジ−n−ブチルイソプロポキシシラン、ブロモメチルジ−t−ブチルイソプロポキシシラン、ブロモメチルジシクロヘキシルイソプロポキシシラン、ブロモメチルジフェネチルイソプロポキシシラン、ブロモメチルジビニルイソプロポキシシラン、ブロモメチルジフェニルイソプロポキシシラン、ヨードメチルジメチルイソプロポキシシラン、ヨードメチルジエチルイソプロポキシシラン、ヨードメチルジ−n−プロピルイソプロポキシシラン、ヨードメチルジイソプロピルイソプロポキシシラン、ヨードメチルジ−n−ブチルイソプロポキシシラン、ヨードメチルジ−t−ブチルイソプロポキシシラン、ヨードメチルジシクロヘキシルイソプロポキシシラン、ヨードメチルジフェネチルイソプロポキシシラン、ヨードメチルジビニルイソプロポキシシラン、ヨードメチルジフェニルイソプロポキシシランなどのケイ素化合物を挙げることができる。
ポリカルボシラン(I)は、「1.ポリマー」の欄で説明したように、化合物1をアルカリ金属およびアルカリ土類金属の少なくとも一方の存在下に反応させて得られる。
本発明で使用できるアルカリ金属としてはリチウム、カリウム、ナトリウムが、アルカリ土類金属としてはマグネシウムが挙げられるが、本発明においてはマグネシウムを使用することが最も好ましい。
エチレングリコール、1,2−プロピレングリコール、1,3−ブチレングリコール、2,4−ペンタンジオール、2−メチル−2,4−ペンタンジオール、2,5−ヘキサンジオール、2,4−ヘプタンジオール、2−エチル−1,3−ヘキサンジオール、ジエチレングリコール、ジプロピレングリコール、トリエチレングリコール、トリプロピレングリコールなどの多価アルコール;
エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテル、エチレングリコールモノヘキシルエーテル、エチレングリコールモノフェニルエーテル、エチレングリコールモノ−2−エチルブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノプロピルエーテル、ジエチレングリコールモノブチルエーテル、ジエチレングリコールモノヘキシルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノブチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノプロピルエーテルなどの多価アルコール部分エーテル系;
などを挙げることができる。
本発明で用いるポリカルボシラン(I)の重量平均分子量は500以上、好ましくは700以上、特に好ましくは500〜30000である。この重量平均分子量が500未満であると、加水分解縮合反応時に急激な高分子化によるゲル化を伴ったり、結晶性の高い低分子化合物を形成し、異物の原因となったりする場合がある。
本発明のポリマーの製造方法において、上記1.の(A)ポリカルボシランの存在下、(B)加水分解性基含有シランモノマーとして、下記一般式(2)で表される化合物および下記一般式(3)で表される化合物の群から選ばれた少なくとも1種のシラン化合物を、有機溶媒中で触媒の存在下、加水分解縮合して得ることができる。
(式中、R3は水素原子,フッ素原子または1価の有機基を示し、Xはハロゲン原子あるいはアルコキシ基を示し、aは0〜3の整数を示す。)
R4 bY3−bSi−(R6)d−SiZ3−cR5 c ・・・・・(3)
(式中、R4,R5は同一または異なり、それぞれ1価の有機基を示し、bおよびcは同一または異なり、0〜2の整数を示し、R6は酸素原子,フェニレン基または−(CH2)e−で表される基(ここで、eは1〜6の整数である)を示し、YおよびZは同一または異なり、ハロゲン原子またはアルコキシ基を示し、dは0または1を示す。)
前記一般式(2)において、R3は水素原子,フッ素原子または1価の有機基である。1価の有機基としては、アルキル基、アリール基、アリル基、グリシジル基、ビニル基などを挙げることができる。また、一般式(2)において、R3は1価の有機基、特にアルキル基またはフェニル基であることが好ましい。
メチルトリメトキシシラン、メチルトリエトキシシラン、メチルトリ−n−プロポキシシラン、メチルトリ−iso−プロポキシシラン、メチルトリ−n−ブトキシシラン、メチルトリ−sec−ブトキシシラン、メチルトリ−tert−ブトキシシラン、メチルトリフェノキシシラン、エチルトリメトキシシラン、エチルトリエトキシシラン、エチルトリ−n−プロポキシシラン、エチルトリ−iso−プロポキシシラン、エチルトリ−n−ブトキシシラン、エチルトリ−sec−ブトキシシラン、エチルトリ−tert−ブトキシシラン、エチルトリフェノキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、ビニルトリ−n−プロポキシシラン、ビニルトリ−iso−プロポキシシラン、ビニルトリ−n−ブトキシシラン、ビニルトリ−sec−ブトキシシラン、ビニルトリ−tert−ブトキシシラン、ビニルトリフェノキシシラン、n−プロピルトリメトキシシラン、n−プロピルトリエトキシシラン、n−プロピルトリ−n−プロポキシシラン、n−プロピルトリ−iso−プロポキシシラン、n−プロピルトリ−n−ブトキシシラン、n−プロピルトリ−sec−ブトキシシラン、n−プロピルトリ−tert−ブトキシシラン、n−プロピルトリフェノキシシラン、i−プロピルトリメトキシシラン、i−プロピルトリエトキシシラン、i−プロピルトリ−n−プロポキシシラン、i−プロピルトリ−iso−プロポキシシラン、i−プロピルトリ−n−ブトキシシラン、i−プロピルトリ−sec−ブトキシシラン、i−プロピルトリ−tert−ブトキシシラン、i−プロピルトリフェノキシシラン、n−ブチルトリメトキシシラン、n−ブチルトリエトキシシラン、n−ブチルトリ−n−プロポキシシラン、n−ブチルトリ−iso−プロポキシシラン、n−ブチルトリ−n−ブトキシシラン、n−ブチルトリ−sec−ブトキシシラン、n−ブチルトリ−tert−ブトキシシラン、n−ブチルトリフェノキシシラン、sec−ブチルトリメトキシシラン、sec−ブチルトリエトキシシラン、sec−ブチル−トリ−n−プロポキシシラン、sec−ブチル−トリ−iso−プロポキシシラン、sec−ブチル−トリ−n−ブトキシシラン、sec−ブチル−トリ−sec−ブトキシシラン、sec−ブチル−トリ−tert−ブトキシシラン、sec−ブチル−トリフェノキシシラン、t−ブチルトリメトキシシラン、t−ブチルトリエトキシシラン、t−ブチルトリ−n−プロポキシシラン、t−ブチルトリ−iso−プロポキシシラン、t−ブチルトリ−n−ブトキシシラン、t−ブチルトリ−sec−ブトキシシラン、t−ブチルトリ−tert−ブトキシシラン、t−ブチルトリフェノキシシラン、フェニルトリメトキシシラン、フェニルトリエトキシシラン、フェニルトリ−n−プロポキシシラン、フェニルトリ−iso−プロポキシシラン、フェニルトリ−n−ブトキシシラン、フェニルトリ−sec−ブトキシシラン、フェニルトリ−tert−ブトキシシラン、フェニルトリフェノキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、γ−アミノプロピルトリメトキシシラン、γ−アミノプロピルトリエトキシシラン、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン、γ−トリフロロプロピルトリメトキシシラン、γ−トリフロロプロピルトリエトキシシランなど;
ジメチルジメトキシシラン、ジメチルジエトキシシラン、ジメチル−ジ−n−プロポキシシラン、ジメチル−ジ−iso−プロポキシシラン、ジメチル−ジ−n−ブトキシシラン、ジメチル−ジ−sec−ブトキシシラン、ジメチル−ジ−tert−ブトキシシラン、ジメチルジフェノキシシラン、ジエチルジメトキシシラン、ジエチルジエトキシシラン、ジエチル−ジ−n−プロポキシシラン、ジエチル−ジ−iso−プロポキシシラン、ジエチル−ジ−n−ブトキシシラン、ジエチル−ジ−sec−ブトキシシラン、ジエチル−ジ−tert−ブトキシシラン、ジエチルジフェノキシシラン、ジ−n−プロピルジメトキシシラン、ジ−n−プロピルジエトキシシラン、ジ−n−プロピル−ジ−n−プロポキシシラン、ジ−n−プロピル−ジ−iso−プロポキシシラン、ジ−n−プロピル−ジ−n−ブトキシシラン、ジ−n−プロピル−ジ−sec−ブトキシシラン、ジ−n−プロピル−ジ−tert−ブトキシシラン、ジ−n−プロピル−ジ−フェノキシシラン、ジ−iso−プロピルジメトキシシラン、ジ−iso−プロピルジエトキシシラン、ジ−iso−プロピル−ジ−n−プロポキシシラン、ジ−iso−プロピル−ジ−iso−プロポキシシラン、ジ−iso−プロピル−ジ−n−ブトキシシラン、ジ−iso−プロピル−ジ−sec−ブトキシシラン、ジ−iso−プロピル−ジ−tert−ブトキシシラン、ジ−iso−プロピル−ジ−フェノキシシラン、ジ−n−ブチルジメトキシシラン、ジ−n−ブチルジエトキシシラン、ジ−n−ブチル−ジ−n−プロポキシシラン、ジ−n−ブチル−ジ−iso−プロポキシシラン、ジ−n−ブチル−ジ−n−ブトキシシラン、ジ−n−ブチル−ジ−sec−ブトキシシラン、ジ−n−ブチル−ジ−tert−ブトキシシラン、ジ−n−ブチル−ジ−フェノキシシラン、ジ−sec−ブチルジメトキシシラン、ジ−sec−ブチルジエトキシシラン、ジ−sec−ブチル−ジ−n−プロポキシシラン、ジ−sec−ブチル−ジ−iso−プロポキシシラン、ジ−sec−ブチル−ジ−n−ブトキシシラン、ジ−sec−ブチル−ジ−sec−ブトキシシラン、ジ−sec−ブチル−ジ−tert−ブトキシシラン、ジ−sec−ブチル−ジ−フェノキシシラン、ジ−tert−ブチルジメトキシシラン、ジ−tert−ブチルジエトキシシラン、ジ−tert−ブチル−ジ−n−プロポキシシラン、ジ−tert−ブチル−ジ−iso−プロポキシシラン、ジ−tert−ブチル−ジ−n−ブトキシシラン、ジ−tert−ブチル−ジ−sec−ブトキシシラン、ジ−tert−ブチル−ジ−tert−ブトキシシラン、ジ−tert−ブチル−ジ−フェノキシシラン、ジフェニルジメトキシシラン、ジフェニル−ジ−エトキシシラン、ジフェニル−ジ−n−プロポキシシラン、ジフェニル−ジ−iso−プロポキシシラン、ジフェニル−ジ−n−ブトキシシラン、ジフェニル−ジ−sec−ブトキシシラン、ジフェニル−ジ−tert−ブトキシシラン、ジフェニルジフェノキシシラン、ジビニルトリメトキシシランなど;
テトラクロロシラン、テトラブロモシラン、テトラヨードシラン、トリクロロシラン、トリブロモシラン、トリヨードシラン、メチルトリクロロシラン、エチルトリクロロシラン、n−プロピルトリクロロシラン、イソプロピルトリクロロシラン、n−ブチルトリクロロシラン、t−ブチルトリクロロシラン、シクロヘキシルトリクロロシラン、フェネチルトリクロロシラン、2−ノルボルニルトリクロロシラン、ビニルトリクロロシラン、フェニルトリクロロシラン、メチルトリブロモシラン、エチルトリブロモシラン、n−プロピルトリブロモシラン、イソプロピルトリブロモシラン、n−ブチルトリブロモシラン、t−ブチルトリブロモシラン、シクロヘキシルトリブロモシラン、フェネチルトリブロモシラン、2−ノルボルニルトリブロモシラン、ビニルトリブロモシラン、フェニルトリブロモシラン、メチルトリヨードシラン、エチルトリヨードシラン、n−プロピルトリヨードシラン、イソプロピルトリヨードシラン、n−ブチルトリヨードシラン、t−ブチルトリヨードシラン、シクロヘキシルトリヨードシラン、フェネチルトリヨードシラン、2−ノルボルニルトリヨードシラン、ビニルトリヨードシラン、フェニルトリヨードシラン、ジメチルジクロロシラン、ジエチルジクロロシラン、ジ−n−プロピルジクロロシラン、ジイソプロピルジクロロシラン、ジ−n−ブチルジクロロシラン、ジ−t−ブチルジクロロシラン、ジシクロヘキシルジクロロシラン、ジフェネチルジクロロシラン、ジ−2−ノルボルニルジクロロシラン、ジビニルジクロロシラン、ジフェニルジクロロシラン、ジメチルジブロモシラン、ジエチルジブロモシラン、ジ−n−プロピルジブロモシラン、ジイソプロピルジブロモシラン、ジ−n−ブチルジブロモシラン、ジ−t−ブチルジブロモシラン、ジシクロヘキシルジブロモシラン、ジフェネチルジブロモシラン、ジ−2−ノルボルニルジブロモシラン、ジビニルジブロモシラン、ジフェニルジブロモシラン、ジメチルジヨードシラン、ジエチルジヨードシラン、ジ−n−プロピルジヨードシラン、ジイソプロピルジヨードシラン、ジ−n−ブチルジヨードシラン、ジ−t−ブチルジヨードシラン、ジシクロヘキシルジヨードシラン、ジフェネチルジヨードシラン、ジ−2−ノルボルニルジヨードシラン、ジビニルジヨードシラン、ジフェニルジヨードシラン、トリメチルクロロシラン、トリエチルクロロシラン、トリ−n−プロピルクロロシラン、トリイソプロピルクロロシラン、トリ−n−ブチルクロロシラン、トリ−t−ブチルクロロシラン、トリシクロヘキシルクロロシラン、トリフェネチルクロロシラン、トリ−2−ノルボルニルクロロシラン、トリビニルクロロシラン、トリフェニルクロロシラン、トリメチルブロモシラン、トリエチルブロモシラン、トリ−n−プロピルブロモシラン、トリイソプロピルブロモシラン、トリ−n−ブチルブロモシラン、トリ−t−ブチルブロモシラン、トリシクロヘキシルブロモシラン、トリフェネチルブロモシラン、トリ−2−ノルボルニルブロモシラン、トリビニルブロモシラン、トリフェニルブロモシラン、トリメチルヨードシラン、トリエチルヨードシラン、トリ−n−プロピルヨードシラン、トリイソプロピルヨードシラン、トリ−n−ブチルヨードシラン、トリ−t−ブチルヨードシラン、トリシクロヘキシルヨードシラン、トリフェネチルヨードシラン、トリ−2−ノルボルニルヨードシラン、トリビニルヨードシラン、トリフェニルヨードシランなどのケイ素化合物を挙げることができる。これらの化合物は1種単独でも使用できるし、2種以上を混合して使用することもできる。
前記一般式(3)において、R4,R5で表される1価の有機基としては、先の一般式(2)と同様の有機基を挙げることができる。
トリエトキシ・モノ(アセチルアセトナート)ジルコニウム、トリ−n−プロポキシ・モノ(アセチルアセトナート)ジルコニウム、トリ−i−プロポキシ・モノ(アセチルアセトナート)ジルコニウム、トリ−n−ブトキシ・モノ(アセチルアセトナート)ジルコニウム、トリ−sec−ブトキシ・モノ(アセチルアセトナート)ジルコニウム、トリ−t−ブトキシ・モノ(アセチルアセトナート)ジルコニウム、ジエトキシ・ビス(アセチルアセトナート)ジルコニウム、ジ−n−プロポキシ・ビス(アセチルアセトナート)ジルコニウム、ジ−i−プロポキシ・ビス(アセチルアセトナート)ジルコニウム、ジ−n−ブトキシ・ビス(アセチルアセトナート)ジルコニウム、ジ−sec−ブトキシ・ビス(アセチルアセトナート)ジルコニウム、ジ−t−ブトキシ・ビス(アセチルアセトナート)ジルコニウム、モノエトキシ・トリス(アセチルアセトナート)ジルコニウム、モノ−n−プロポキシ・トリス(アセチルアセトナート)ジルコニウム、モノ−i−プロポキシ・トリス(アセチルアセトナート)ジルコニウム、モノ−n−ブトキシ・トリス(アセチルアセトナート)ジルコニウム、モノ−sec−ブトキシ・トリス(アセチルアセトナート)ジルコニウム、モノ−t−ブトキシ・トリス(アセチルアセトナート)ジルコニウム、テトラキス(アセチルアセトナート)ジルコニウム、トリエトキシ・モノ(エチルアセトアセテート)ジルコニウム、トリ−n−プロポキシ・モノ(エチルアセトアセテート)ジルコニウム、トリ−i−プロポキシ・モノ(エチルアセトアセテート)ジルコニウム、トリ−n−ブトキシ・モノ(エチルアセトアセテート)ジルコニウム、トリ−sec−ブトキシ・モノ(エチルアセトアセテート)ジルコニウム、トリ−t−ブトキシ・モノ(エチルアセトアセテート)ジルコニウム、ジエトキシ・ビス(エチルアセトアセテート)ジルコニウム、ジ−n−プロポキシ・ビス(エチルアセトアセテート)ジルコニウム、ジ−i−プロポキシ・ビス(エチルアセトアセテート)ジルコニウム、ジ−n−ブトキシ・ビス(エチルアセトアセテート)ジルコニウム、ジ−sec−ブトキシ・ビス(エチルアセトアセテート)ジルコニウム、ジ−t−ブトキシ・ビス(エチルアセトアセテート)ジルコニウム、モノエトキシ・トリス(エチルアセトアセテート)ジルコニウム、モノ−n−プロポキシ・トリス(エチルアセトアセテート)ジルコニウム、モノ−i−プロポキシ・トリス(エチルアセトアセテート)ジルコニウム、モノ−n−ブトキシ・トリス(エチルアセトアセテート)ジルコニウム、モノ−sec−ブトキシ・トリス(エチルアセトアセテート)ジルコニウム、モノ−t−ブトキシ・トリス(エチルアセトアセテート)ジルコニウム、テトラキス(エチルアセトアセテート)ジルコニウム、モノ(アセチルアセトナート)トリス(エチルアセトアセテート)ジルコニウム、ビス(アセチルアセトナート)ビス(エチルアセトアセテート)ジルコニウム、トリス(アセチルアセトナート)モノ(エチルアセトアセテート)ジルコニウムなどのジルコニウムキレート化合物;
トリス(アセチルアセトナート)アルミニウム、トリス(エチルアセトアセテート)アルミニウムなどのアルミニウムキレート化合物;
などを挙げることができ、好ましくはチタンまたはアルミニウムのキレート化合物、特に好ましくはチタンのキレート化合物を挙げることができる。これらの金属キレート触媒は、1種あるいは2種以上を同時に使用しても良い。
酢酸、プロピオン酸、ブタン酸、ペンタン酸、ヘキサン酸、ヘプタン酸、オクタン酸、ノナン酸、デカン酸、シュウ酸、マレイン酸、メチルマロン酸、アジピン酸、セバシン酸、没食子酸、酪酸、メリット酸、アラキドン酸、シキミ酸、2−エチルヘキサン酸、オレイン酸、ステアリン酸、リノール酸、リノレイン酸、サリチル酸、安息香酸、p−アミノ安息香酸、p−トルエンスルホン酸、ベンゼンスルホン酸、モノクロロ酢酸、ジクロロ酢酸、トリクロロ酢酸、トリフルオロ酢酸、ギ酸、マロン酸、スルホン酸、フタル酸、フマル酸、クエン酸、酒石酸、コハク酸、フマル酸、イタコン酸、メサコン酸、シトラコン酸、リンゴ酸、グルタル酸の加水分解物、無水マレイン酸の加水分解物、無水フタル酸の加水分解物などの有機酸を挙げることができ、有機カルボン酸をより好ましい例として挙げることができる。これらの酸触媒は、1種あるいは2種以上を同時に使用してもよい。
本発明のポリマー膜形成用組成物(絶縁膜形成用組成物)には、本発明のポリマーに加え、有機ポリマー、界面活性剤などの成分を添加してもよい。
−(X’)j−(Y’)k−(X’)1−
(式中、X’は−CH2CH2O−で表される基を、Y’は−CH2CH(CH3)O−で表される基を示し、jは1〜90、kは10〜99、lは0〜90の数を示す。)
エチレングリコール、1,2−プロピレングリコール、1,3−ブチレングリコール、2,4−ペンタンジオール、2−メチル−2,4−ペンタンジオール、2,5−ヘキサンジオール、2,4−ヘプタンジオール、2−エチル−1,3−ヘキサンジオール、ジエチレングリコール、ジプロピレングリコール、トリエチレングリコール、トリプロピレングリコールなどの多価アルコール系溶媒;
エチレングリコールモノメチルエーテル、エチレングリコールモノエチルエーテル、エチレングリコールモノプロピルエーテル、エチレングリコールモノブチルエーテル、エチレングリコールモノヘキシルエーテル、エチレングリコールモノフェニルエーテル、エチレングリコールモノ−2−エチルブチルエーテル、ジエチレングリコールモノメチルエーテル、ジエチレングリコールモノエチルエーテル、ジエチレングリコールモノプロピルエーテル、ジエチレングリコールモノブチルエーテル、ジエチレングリコールモノヘキシルエーテル、プロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテル、プロピレングリコールモノプロピルエーテル、プロピレングリコールモノブチルエーテル、ジプロピレングリコールモノメチルエーテル、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノプロピルエーテルなどの多価アルコール部分エーテル系溶媒;
などを挙げることができる。これらのアルコール系溶媒は、1種あるいは2種以上を同時に使用してもよい。
本発明のポリマー膜は、上記絶縁膜形成用組成物を塗布して塗膜を形成した後、塗膜を加熱することによって得られる。
以下、本発明を、実施例を挙げてさらに具体的に説明する。本発明は以下の実施例に限定されるものではない。なお、実施例および比較例中の「部」および「%」は、特記しない限り、それぞれ重量部および重量%であることを示している。
各種の評価は、次のようにして行なった。
下記条件によるゲルパーミエーションクロマトグラフィー(GPC)法により測定した。
カラム:昭和電工(株)製のSHODEX A−80M(長さ50cm)
測定温度:40℃
流速:1cc/分
得られたポリマー膜に対して蒸着法によりアルミニウム電極パターンを形成させ、比誘電率測定用サンプルを作成した。該サンプルを周波数100kHzの周波数で、横河・ヒューレットパッカード(株)製、HP16451B電極およびHP4284AプレシジョンLCRメータを用いてCV法により室温における当該塗膜の比誘電率を測定した。
得られたポリマー膜を、ナノインデンターXP(ナノインスツルメント社製)を用いて、連続剛性測定法により測定した。
得られたポリマー膜上にスパッタ法でSiO2膜を400nm形成し、これを適当な大きさに切断し、そのウエハ片上に同じ大きさのブランクシリコンウエハをエポキシ樹脂を用いて接着し、オーブン中135℃で2時間加熱した。これを、ダイシングマシンで小片に切り分け、それぞれに対して4点曲げ密着力測定法による、剥離試験を行った。結果は以下のように示す。
B:密着エネルギーが3.0ジュール毎平方メートル未満のもの
ポリマー膜の断面を、集束イオンビーム法で観察用に加工し、TEMを用いて18000倍にて外観を調べた。判断結果を以下のようにして示す。
B:塗膜に海島状のドメイン相分離が確認される。
4.2.1.合成例1
温度計、冷却コンデンサー、滴下ロートおよび攪拌装置を取り付けた内容量が3Lの4つ口フラスコ内をアルゴンガスで置換した後、乾燥したテトラヒドロフラン1Lおよび金属マグネシウム60gを仕込み、アルゴンガスでバブリングした。これに、20℃で攪拌しながらクロロメチルジメチルクロロシラン143gおよびクロロメチルメチルジクロロシラン82gの混合物を滴下ロートよりゆっくり添加した。
温度計、冷却コンデンサー、滴下ロートおよび攪拌装置を取り付けた内容量が3Lの4つ口フラスコ内をアルゴンガスで置換した後、乾燥したテトラヒドロフラン1Lおよび金属マグネシウム60gを仕込み、アルゴンガスでバブリングした。これに、20℃で攪拌しながらクロロメチルジメチルクロロシラン72gおよびクロロメチルメチルジクロロシラン163gの混合物を滴下ロートよりゆっくり添加した。
温度計、冷却コンデンサー、滴下ロートおよび攪拌装置を取り付けた内容量が3Lの4つ口フラスコ内をアルゴンガスで置換した後、乾燥したテトラヒドロフラン1Lおよび金属マグネシウム60gを仕込み、アルゴンガスでバブリングした。これに、20℃で攪拌しながらクロロメチルトリクロロシラン79gを滴下ロートよりゆっくり添加した。滴下終了後、45℃でさらに3時間攪拌を続けた。この反応系をろ過して無機塩を除去し、ろ液は減圧濃縮、真空乾燥をおこなった。
温度計、冷却コンデンサー、滴下ロートおよび攪拌装置を取り付けた内容量が4 Lの4つ口フラスコ内をアルゴンガスで置換した後、乾燥したテトラヒドロフラン1.5Lおよび金属マグネシウム71gを仕込み、アルゴンガスでバブリングした。これに、これに、20℃で攪拌しながら、クロロメチルトリエトキシシラン500gを滴下ロートからゆっくり添加した。
4.3.1.実施例1
石英製セパラブルフラスコ中で、合成例1で得たポリマー(1)5.0g、メチルトリメトキシシラン22g、テトラエトキシシラン28g、およびトリエチルアミン0.0029gをメタノール249gに溶解させたのち、スリーワンモーターで攪拌させ、溶液温度を55℃に安定させた。次に、イオン交換水50.1gおよびプロピレングリコールモノエチルエーテル202gの混合溶液を1時間かけて溶液に添加した。その後、55℃で4時間反応させたのち、酢酸の10%プロピレングリコールモノプロピルエーテル溶液10gを添加し、さらに30分間反応させ、反応液を室温まで冷却した。反応液からメタノールおよび水を含む溶液299gを50℃にてエバポレーションで除去し、反応液Aを得た。このようにして得られた縮合物の重量平均分子量は、22,000であった。
石英製セパラブルフラスコ中で、合成例2で得たポリマー(2)5.0gおよびメチルトリメトキシシラン51gをメタノール252gに溶解させた後、スリーワンモーターで攪拌させて、溶液温度を55℃に安定させた。次に、イオン交換水50.2g、プロピレングリコールモノエチルエーテル200g、およびテトラメチルアンモニウムハイドロオキサイド25%水溶液0.0112gの混合溶液を1時間かけて溶液に添加した。その後、55℃で4時間反応させたのち、酢酸の10%プロピレングリコールモノプロピルエーテル溶液10gを添加し、さらに30分間反応させて、反応液を室温まで冷却した。反応液からメタノールおよび水を含む溶液298gを50℃にてエバポレーションで除去し、反応液Bを得た。このようにして得られた縮合物の重量平均分子量は、12,000であった。
石英製セパラブルフラスコ中で、合成例1で得たポリマー(1)5.0gおよびテトラエトキシシラン50gを、メタノール250gに溶解させたのち、スリーワンモーターで攪拌させ、溶液温度を55℃に安定させた。次に、イオン交換水50.3g、プロピレングリコールモノエチルエーテル201g、およびメチルアミン40%水溶液0.0080gの混合溶液を1時間かけて溶液に添加した。その後、55℃で4時間反応させたのち、酢酸の10%プロピレングリコールモノプロピルエーテル溶液10gを添加し、さらに30分間反応させ、反応液を室温まで冷却した。
石英製セパラブルフラスコ中で、合成例2で得たポリマー(2)5.0g、テトラエトキシシラン51g、およびトリエチルアミン0.0029gをメタノール250gに溶解させたのち、スリーワンモーターで攪拌させ、溶液温度を55℃に安定させた。次に、イオン交換水50.0gおよびプロピレングリコールモノエチルエーテル201gの混合溶液を1時間かけて溶液に添加した。
石英製セパラブルフラスコ中で、合成例3で得たポリマー(3)4.6g、メチルトリメトキシシラン53g、およびトリエチルアミン0.0054gをメタノール246gに溶解させたのち、スリーワンモーターで攪拌させ、溶液温度を55℃に安定させた。次に、イオン交換水51.4gおよびプロピレングリコールモノエチルエーテル201gの混合溶液を1時間かけて溶液に添加した。
実施例1で得られた反応液Aを0.2μm孔径のテフロン(登録商標)製フィルターでろ過を行い、本発明の絶縁膜形成用組成物を得た。
実施例6において、それぞれ反応液B,C,D,Eを使用した以外は実施例6と同様にシリカ系膜を形成し、その評価を行った。評価結果を表1に示す。
合成例1で得られたポリマー(1)1.0gを、プロピレングリコールモノプロピルエーテル4.0gで溶解した反応液Fを塗布溶液として使用した以外は実施例6と同様にしてシリカ系膜を形成し、その評価を行った。評価結果を表1に示す。
石英製セパラブルフラスコに、蒸留エタノール430g、イオン交換水211gと25%テトラメチルアンモニウムハイドロオキサイド水溶液15.2gを入れ、均一に攪拌した。この溶液にメチルトリメトキシシラン40.0gおよびテトラエトキシシラン61.1gの混合物を添加した。溶液を60℃に保ったまま、2時間反応を行った。この溶液にプロピレングリコールモノプロピルエーテル300gを加え、その後、50℃のエバポレーターを用いて溶液を20%(完全加水分解縮合物換算)となるまで濃縮し、その後、マレイン酸の10%プロピレングリコールモノプロピルエーテル溶液20gを添加し、反応液Gを得た。この反応液Gを使用した以外は実施例6と同様にしてシリカ系膜を形成し、その評価を行った。評価結果を表1に示す。
式−[Si(CH3)(H)−CH2]−で表される繰り返し単位からなる重量平均分子量20,000のポリカルボシランのプロピレングリコールモノプロピルエーテル25%溶液(以下反応液Jという)と比較例2の反応液Eとを、J:E=2:8の重量比で混合した液を調製し、反応液Fを得た。この反応液Fを使用した以外は実施例6と同様にしてシリカ系膜を形成し、その評価を行った。評価結果を表1に併せて示す。
合成例4で得られたポリマー(4)9g、メチルトリメトキシシラン30.0g、およびテトラメトキシシラン3.4gをテトラヒドロフラン60mlに混合し、この混合液を0℃にした後、0.01Nの硝酸37mlを徐々に添加して30分間反応させた。次に、70℃まで昇温して16時間還流させながら反応させた。次いで、反応液を放冷後、ジエチルエーテル250mlで希釈してから、pHが中性になるまで蒸留水で3〜4回洗浄した。この溶液にプロピレングリコールモノプロピルエーテル200gを加え、その後、50℃のエバポレーターを用いて溶液を20%(完全加水分解縮合物換算)となるまで濃縮し、その後、マレイン酸の10%プロピレングリコールモノプロピルエーテル溶液20gを添加し、反応液Iを得た。この反応液Iを使用した以外は実施例6と同様にしてシリカ系膜を形成し、その評価を行った。評価結果を表1に示す。
Claims (4)
- 1種以上の(A)ポリカルボシランの存在下、(B)加水分解性基含有シランモノマーを加水分解縮合することを含み、
前記(A)ポリカルボシランのうち少なくとも1種が、以下のポリカルボシラン(I)であり、
重量平均分子量が1,500〜500,000である、ポリマーの製造方法。
(I)下記一般式(1)で表される化合物をアルカリ金属およびアルカリ土類金属の少なくとも一方の存在下に反応させて得られる、重量平均分子量500〜30,000のポリカルボシラン(I):
R1 mY3−mSiCR2 nX3−n ・・・・・(1)
(式中、R1,R2は同一または異なり、それぞれ直鎖状または分岐鎖状脂肪族基、脂環式基、アリール基、アラルキル基または水素原子を示し、Xはハロゲン原子を示し、Yはハロゲン原子またはアルコキシ基を示し、kは0〜3の整数を示し、mおよびnは同一または異なり、0〜2の整数を示す。) - 請求項1において、
前記(A)ポリカルボシランとして、前記ポリカルボシラン(I)に加えて、さらにポリカルボシラン(II)を含み、
前記ポリカルボシラン(II)は、前記ポリカルボシラン(I)をさらに有機溶媒中でアルコールまたは有機酸と反応させて得られる、ポリマーの製造方法。 - 請求項2において、
前記(A)ポリカルボシランとして、前記ポリカルボシラン(I)および前記ポリカルボシラン(II)に加えて、さらにポリカルボシラン(III)を含み、
前記ポリカルボシラン(III)は、前記ポリカルボシラン(I)および前記ポリカルボシラン(II)の少なくとも一方を、さらに有機溶媒中で還元剤を反応させて得られる、ポリマーの製造方法。 - 請求項1ないし3のいずれかにおいて、
前記(B)加水分解性基含有シランモノマーが、下記一般式(2)で表される化合物および下記一般式(3)で表される化合物の群から選ばれた少なくとも1種のシラン化合物である、ポリマーの製造方法。
R3 aSiX4−a ・・・・・(2)
(式中、R3は水素原子,フッ素原子アルキル基、アリール基、アリル基、グリシジル基またはビニル基を示し、Xはハロゲン原子あるいはアルコキシ基を示し、aは0〜3の整数を示す。)
R4 bY3−bSi−(R6)d−SiZ3−cR5 c ・・・・・(3)
(式中、R4,R5は同一または異なり、それぞれアルキル基、アリール基、アリル基、グリシジル基またはビニル基を示し、bおよびcは同一または異なり、0〜2の整数を示し、R6は酸素原子,フェニレン基または−(CH2)e−で表される基(ここで、eは1〜6の整数である)を示し、YおよびZは同一または異なり、ハロゲン原子またはアルコキシ基を示し、dは0または1を示す。)
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Also Published As
Publication number | Publication date |
---|---|
US20070021580A1 (en) | 2007-01-25 |
WO2005068538A1 (ja) | 2005-07-28 |
US20070015892A1 (en) | 2007-01-18 |
EP1705207A4 (en) | 2009-06-24 |
EP1705207B1 (en) | 2012-10-24 |
US7528207B2 (en) | 2009-05-05 |
EP1705207A1 (en) | 2006-09-27 |
TWI265172B (en) | 2006-11-01 |
KR20060123548A (ko) | 2006-12-01 |
EP1705206A4 (en) | 2009-06-24 |
TW200538490A (en) | 2005-12-01 |
KR20060123549A (ko) | 2006-12-01 |
TW200536621A (en) | 2005-11-16 |
JPWO2005068538A1 (ja) | 2007-12-27 |
TWI292349B (ja) | 2008-01-11 |
JPWO2005068539A1 (ja) | 2007-12-27 |
KR101129875B1 (ko) | 2012-03-28 |
JP5110243B2 (ja) | 2012-12-26 |
EP1705206A1 (en) | 2006-09-27 |
WO2005068539A1 (ja) | 2005-07-28 |
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