JP3460678B2 - レーザ加工方法および加工装置 - Google Patents

レーザ加工方法および加工装置

Info

Publication number
JP3460678B2
JP3460678B2 JP2000165991A JP2000165991A JP3460678B2 JP 3460678 B2 JP3460678 B2 JP 3460678B2 JP 2000165991 A JP2000165991 A JP 2000165991A JP 2000165991 A JP2000165991 A JP 2000165991A JP 3460678 B2 JP3460678 B2 JP 3460678B2
Authority
JP
Japan
Prior art keywords
laser
value
processing
hole
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000165991A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001340980A (ja
Inventor
克一 浮田
和英 伊左次
英昭 永利
秀彦 唐▲崎▼
久 木下
勉 屋野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP2000165991A priority Critical patent/JP3460678B2/ja
Priority to EP01112831.1A priority patent/EP1161126B1/en
Priority to US09/867,621 priority patent/US6694614B2/en
Priority to KR1020010030341A priority patent/KR100864067B1/ko
Priority to CNB011208341A priority patent/CN1198490C/zh
Priority to TW090113376A priority patent/TWI250059B/zh
Priority to NO20012728A priority patent/NO332795B1/no
Publication of JP2001340980A publication Critical patent/JP2001340980A/ja
Application granted granted Critical
Publication of JP3460678B2 publication Critical patent/JP3460678B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03—Observing, e.g. monitoring, the workpiece
    • B23K26/032—Observing, e.g. monitoring, the workpiece using optical means
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0011—Working of insulating substrates or insulating layers
    • H05K3/0017—Etching of the substrate by chemical or physical means
    • H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
    • H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/0266—Marks, test patterns or identification means
    • H05K1/0269—Marks, test patterns or identification means for visual or optical inspection
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/05—Patterning and lithography; Masks; Details of resist
    • H05K2203/0548—Masks
    • H05K2203/0554—Metal used as mask for etching vias, e.g. by laser ablation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/16—Inspection; Monitoring; Aligning
    • H05K2203/163—Monitoring a manufacturing process
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Laser Beam Processing (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
JP2000165991A 2000-06-02 2000-06-02 レーザ加工方法および加工装置 Expired - Fee Related JP3460678B2 (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2000165991A JP3460678B2 (ja) 2000-06-02 2000-06-02 レーザ加工方法および加工装置
EP01112831.1A EP1161126B1 (en) 2000-06-02 2001-05-30 Laser processing method and equipment for printed circuit board
KR1020010030341A KR100864067B1 (ko) 2000-06-02 2001-05-31 레이저 가공 방법 및 가공 장치
US09/867,621 US6694614B2 (en) 2000-06-02 2001-05-31 Laser processing method and equipment for printed circuit board
CNB011208341A CN1198490C (zh) 2000-06-02 2001-06-01 激光加工方法及加工装置
TW090113376A TWI250059B (en) 2000-06-02 2001-06-01 Laser processing method and equipment for printed circuit board
NO20012728A NO332795B1 (no) 2000-06-02 2001-06-01 Fremgangsmate og anordning til laserbehandling av kretskort

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000165991A JP3460678B2 (ja) 2000-06-02 2000-06-02 レーザ加工方法および加工装置

Publications (2)

Publication Number Publication Date
JP2001340980A JP2001340980A (ja) 2001-12-11
JP3460678B2 true JP3460678B2 (ja) 2003-10-27

Family

ID=18669377

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000165991A Expired - Fee Related JP3460678B2 (ja) 2000-06-02 2000-06-02 レーザ加工方法および加工装置

Country Status (7)

Country Link
US (1) US6694614B2 (zh)
EP (1) EP1161126B1 (zh)
JP (1) JP3460678B2 (zh)
KR (1) KR100864067B1 (zh)
CN (1) CN1198490C (zh)
NO (1) NO332795B1 (zh)
TW (1) TWI250059B (zh)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6947802B2 (en) * 2000-04-10 2005-09-20 Hypertherm, Inc. Centralized control architecture for a laser materials processing system
US7916388B2 (en) 2007-12-20 2011-03-29 Cymer, Inc. Drive laser for EUV light source
US6690692B2 (en) * 2002-01-29 2004-02-10 Hans Laser Technology Co., Ltd. Third harmonic laser system
US7186947B2 (en) 2003-03-31 2007-03-06 Hypertherm, Inc. Process monitor for laser and plasma materials processing of materials
JP2005125359A (ja) * 2003-10-23 2005-05-19 Honda Motor Co Ltd レーザビームによる溝の加工方法
US20060163220A1 (en) 2005-01-27 2006-07-27 Brandt Aaron D Automatic gas control for a plasma arc torch
JP2006305608A (ja) * 2005-04-28 2006-11-09 Toshiba Corp レーザ加工装置、及びレーザ加工方法
JP2007206550A (ja) * 2006-02-03 2007-08-16 Toshiba Corp 液晶パネルの欠陥画素修正装置
US7945087B2 (en) * 2006-06-26 2011-05-17 Orbotech Ltd. Alignment of printed circuit board targets
JP5090690B2 (ja) * 2006-08-28 2012-12-05 三菱電機株式会社 半導体薄膜の製造方法、薄膜トランジスタの製造方法、及び半導体薄膜の製造装置
JP5132911B2 (ja) * 2006-10-03 2013-01-30 浜松ホトニクス株式会社 レーザ加工方法
JP5029804B2 (ja) * 2006-11-02 2012-09-19 澁谷工業株式会社 脆性材料の割断方法
TW200936287A (en) * 2007-11-26 2009-09-01 Nat Inst Of Advanced Ind Scien Mold removing method
US8284247B2 (en) * 2008-02-15 2012-10-09 Enerize Corporation Method and apparatus for detecting and inspecting through-penetrating defects in foils and films
US9390172B2 (en) * 2009-12-03 2016-07-12 Microsoft Technology Licensing, Llc Communication channel between web application and process outside browser
JP6425368B2 (ja) * 2012-04-27 2018-11-21 株式会社ディスコ レーザー加工装置及びレーザー加工方法
JP5967122B2 (ja) * 2014-03-20 2016-08-10 トヨタ自動車株式会社 レーザー溶接装置及びレーザー溶接方法
JP2016019997A (ja) * 2014-07-15 2016-02-04 ファナック株式会社 被加工物をレーザ加工するレーザ加工システム
JP6423812B2 (ja) * 2016-02-29 2018-11-14 ファナック株式会社 反射光を抑制しつつレーザ加工を開始できるレーザ加工装置
TWI571761B (zh) * 2016-03-08 2017-02-21 國立勤益科技大學 印刷電路板之裝配排程最佳化方法
CN109365410B (zh) * 2018-10-17 2020-09-18 北京航天控制仪器研究所 一种实现高效激光清洗的加工头装置及清洗方法
JP6983369B1 (ja) * 2021-04-05 2021-12-17 三菱電機株式会社 レーザ加工装置、学習装置、および推論装置
JP2023008089A (ja) * 2021-07-05 2023-01-19 浜松ホトニクス株式会社 レーザ加工装置及びレーザ加工方法
CN113618837B (zh) * 2021-08-09 2023-03-24 金宝电子(铜陵)有限公司 自动化覆铜箔层压板加工方法、***及其装置
WO2024024579A1 (ja) * 2022-07-28 2024-02-01 パナソニックＩｐマネジメント株式会社 レーザ溶接モニタリング装置

Family Cites Families (15)

* Cited by examiner, † Cited by third party
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JPS5645715B2 (zh) * 1973-06-29 1981-10-28
US4328410A (en) * 1978-08-24 1982-05-04 Slivinsky Sandra H Laser skiving system
US4519064A (en) * 1980-10-27 1985-05-21 Nippon Columbia Kabushikikaisha Optical record disc
US4412743A (en) * 1981-09-08 1983-11-01 Discovision Associates Off-axis light beam defect detector
JPH0785128B2 (ja) * 1986-01-14 1995-09-13 三晃技研工業株式会社 細孔内壁内視方法およびその装置
JPH0292482A (ja) * 1988-09-30 1990-04-03 Hitachi Ltd レーザ穿孔装置
US5310986A (en) * 1992-04-28 1994-05-10 Mitsubishi Denki Kabushiki Kaisha Laser machining apparatus
US5317141A (en) * 1992-08-14 1994-05-31 National Semiconductor Corporation Apparatus and method for high-accuracy alignment
US5726443A (en) * 1996-01-18 1998-03-10 Chapman Glenn H Vision system and proximity detector
US6037103A (en) * 1996-12-11 2000-03-14 Nitto Denko Corporation Method for forming hole in printed board
US6040552A (en) * 1997-01-30 2000-03-21 Jain; Kanti High-speed drilling system for micro-via pattern formation, and resulting structure
JP3346263B2 (ja) * 1997-04-11 2002-11-18 イビデン株式会社 プリント配線板及びその製造方法
JP3794120B2 (ja) * 1997-09-02 2006-07-05 松下電器産業株式会社 レーザ孔加工方法および装置
TW436357B (en) * 1997-12-12 2001-05-28 Matsushita Electric Ind Co Ltd Laser drilling equipment and control method
JP3011173B2 (ja) * 1998-01-27 2000-02-21 日本電気株式会社 半導体装置のホール開口検査方法とそのための装置

Also Published As

Publication number Publication date
TWI250059B (en) 2006-03-01
EP1161126A2 (en) 2001-12-05
US20020008093A1 (en) 2002-01-24
NO20012728D0 (no) 2001-06-01
US6694614B2 (en) 2004-02-24
EP1161126A3 (en) 2003-01-22
CN1198490C (zh) 2005-04-20
KR20010110150A (ko) 2001-12-12
JP2001340980A (ja) 2001-12-11
NO332795B1 (no) 2013-01-14
NO20012728L (no) 2001-12-03
EP1161126B1 (en) 2013-11-20
CN1326837A (zh) 2001-12-19
KR100864067B1 (ko) 2008-10-16

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