JP2013527609A5 - - Google Patents

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JP2013527609A5
JP2013527609A5 JP2013508288A JP2013508288A JP2013527609A5 JP 2013527609 A5 JP2013527609 A5 JP 2013527609A5 JP 2013508288 A JP2013508288 A JP 2013508288A JP 2013508288 A JP2013508288 A JP 2013508288A JP 2013527609 A5 JP2013527609 A5 JP 2013527609A5
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processing chamber
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  1. 中央壁の両側に配置された2つの基板ロード位置を有する基板ロードステーションと、
    基板スタッキングモジュールから基板を取り出し、基板ロードステーションに基板を配置するように操作可能なロボットと、
    基板ロードステーションに結合され、中央壁の両側に配置された2つの基板位置を有するロードロックチャンバと、
    ロードロックチャンバに結合され、1以上の処理ソースの両側に配置された2つの基板ロード位置を有する処理チャンバを含む装置。
  2. 2つの基板ロードステーションであって、各基板ロードステーションは、中央壁の両側に配置された2つの基板ロード位置を有する基板ロードステーションと、
    基板スタッキングモジュールから基板を取り出すように操作可能な2つのロボットであって、各ロボットは、各基板ロードステーションに基板を配置するように操作可能なロボットと、
    2つのロードロックチャンバであって、各ロードロックチャンバは、対応する基板ロードステーションに結合され、各ロードロックチャンバは、中央壁の両側に配置された2つの基板位置を有するロードロックチャンバと、
    2つの処理チャンバであって、各処理ステーションは、対応するロードロックチャンバに結合され、各処理チャンバは、1以上の処理ソースの両側に配置された2つの基板ロード位置を有する処理チャンバを含む装置。
  3. 処理チャンバは、2つの蓋を有し、中央壁の両側のそれぞれに対応し、各蓋は、4つの別々の場所で真空源に結合されている請求項1記載の装置。
  4. 処理チャンバは、ロードロックチャンバに対して移動可能であり、これによって処理チャンバが熱膨張によって移動することを可能にする請求項1記載の装置。
  5. 処理チャンバに結合された基板キャリアサービスステーションを更に含む請求項1記載の装置。
  6. 基板ロードステーションは大気内ステーションであり、ロードロックチャンバと処理チャンバは真空チャンバである請求項1記載の装置。
  7. 1つ以上の処理ソースは複数のマイクロ波源を含む請求項1又は2記載の装置。
  8. 各処理チャンバは、2つの蓋を有し、中央壁の両側のそれぞれに対応し、各蓋は、4つの別々の場所で真空源に結合されている請求項2記載の装置。
  9. 2つの蓋は、それぞれ処理チャンバの内部を露出するように中央壁から離れて移動可能であり、処理チャンバを真空源に結合する管は、蓋と共に移動可能である請求項3又は8記載の装置。
  10. 各処理チャンバは、対応するロードロックチャンバに対して移動可能であり、これによって処理チャンバが熱膨張によって移動することを可能にする請求項2記載の装置。
  11. 2つの基板キャリアサービスステーションを更に含み、各基板キャリアサービスステーションは、対応する処理チャンバに結合している請求項2記載の装置。
  12. 各基板ロードステーションは大気内ステーションであり、各ロードロックチャンバと各処理チャンバは真空チャンバである請求項2記載の装置。
  13. 第1ロボットの上に第1基板スタッキングモジュールから第1基板を取り出す工程と、
    第1基板を第1基板ロードステーション内の第1位置に配置する工程と、
    第1ロボットの上に第1基板スタッキングモジュールから第2基板を取り出す工程と、
    第2基板を第1基板ロードステーションとは別の第2基板ロードステーション内の第2位置に配置する工程と、
    第2ロボットの上に第2基板スタッキングモジュールから第3基板を取り出す工程と、
    第3基板を第1基板ロードステーション内の第1位置とは別の第3位置に配置する工程と、
    第2ロボットの上に第2基板スタッキングモジュールから第4基板を取り出す工程と、
    第4基板を第2基板ロードステーション内の第2位置とは別の第4位置に配置する工程を含む方法。
  14. 第1基板を第1基板ロードステーションに配置する工程は、第1基板キャリアの上に第1基板を配置する工程を含み、
    第2基板を第2基板ロードステーションに配置する工程は、第2基板キャリアの上に第2基板を配置する工程を含み、
    第3基板を第1基板ロードステーションに配置する工程は、第1基板と第3基板が第1基板キャリアと第3基板キャリアによって離間するように、第3基板キャリアの上に第3基板を配置する工程を含み、
    第4基板を第2基板ロードステーションに配置する工程は、第2基板と第4基板が第2基板キャリアと第4基板キャリアによって離間するように、第4基板キャリアの上に第4基板を配置する工程を含む請求項13記載の方法。
  15. 第1ロボットと第2ロボットは、共通のトラックに沿って移動し、
    第1基板を取り出す工程は、第1方向を有する第1位置から第1基板を取り出す工程を含み、
    第1基板を第1基板ロードステーション内に配置する工程は、第1位置と実質的に垂直な第2方向を有する第1基板ロードステーション内の第2位置に基板を配置する工程を含む請求項13記載の方法。
  16. マイクロ波源のピッチを考慮して、複数のマイクロ波源の前で振動するように構成された基板フレームを含む請求項7記載の装置。
  17. 処理システム内で基板を処理する方法であって、前記処理システムは、
    処理チャンバ内に配置された複数のマイクロ波源であって、各マイクロ波源が処理チャンバの上部から処理チャンバの底部まで垂直に延びるマイクロ波源と、
    処理チャンバ内に配置された複数のガス源と、
    処理チャンバ内外へ移動するように構成された基板キャリアを含み、前記方法は、
    マイクロ波源のピッチを考慮して、複数のマイクロ波源の前で基板キャリアを振動させる工程を含む方法。
JP2013508288A 2010-04-30 2011-04-29 縦型インラインcvdシステム Pending JP2013527609A (ja)

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US33029610P 2010-04-30 2010-04-30
US61/330,296 2010-04-30
US35423010P 2010-06-13 2010-06-13
US61/354,230 2010-06-13
US41653210P 2010-11-23 2010-11-23
US61/416,532 2010-11-23
PCT/US2011/034619 WO2011137371A2 (en) 2010-04-30 2011-04-29 Vertical inline cvd system

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