FR2393079A1 - Procede de vaporisation de materiaux dans une installation de depot par evaporation sous vide - Google Patents

Procede de vaporisation de materiaux dans une installation de depot par evaporation sous vide

Info

Publication number
FR2393079A1
FR2393079A1 FR7816221A FR7816221A FR2393079A1 FR 2393079 A1 FR2393079 A1 FR 2393079A1 FR 7816221 A FR7816221 A FR 7816221A FR 7816221 A FR7816221 A FR 7816221A FR 2393079 A1 FR2393079 A1 FR 2393079A1
Authority
FR
France
Prior art keywords
anode
vacuum evaporation
vaporizing materials
deposition
evaporation deposit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7816221A
Other languages
English (en)
Other versions
FR2393079B1 (fr
Inventor
Eberhard Moll
Helmut Daxinger
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
OC Oerlikon Balzers AG
Original Assignee
Balzers AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Balzers AG filed Critical Balzers AG
Publication of FR2393079A1 publication Critical patent/FR2393079A1/fr
Application granted granted Critical
Publication of FR2393079B1 publication Critical patent/FR2393079B1/fr
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

L'invention concerne un procédé de vaporisation de matériaux dans une installation de dépôt par évaporation sous vide. Selon ce procédé, mis en oeuvre dans une chambre 17 de dépôt par vaporisation à l'aide d'une décharge l'électrons 7 entre une cathode 3 et une anode, le matériau à vaporisation 19 sert d'anode et la décharge 7 est dirigée sur l'anode par un champ magnétique produit par des bobines 5 et focalisée sur la surface de l'anode. Application notamment au dépôt de couches métalliques pures sur des substrats.
FR7816221A 1977-06-01 1978-05-31 Procede de vaporisation de materiaux dans une installation de depot par evaporation sous vide Expired FR2393079B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CH668877A CH631743A5 (de) 1977-06-01 1977-06-01 Verfahren zum aufdampfen von material in einer vakuumaufdampfanlage.

Publications (2)

Publication Number Publication Date
FR2393079A1 true FR2393079A1 (fr) 1978-12-29
FR2393079B1 FR2393079B1 (fr) 1985-06-14

Family

ID=4313470

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7816221A Expired FR2393079B1 (fr) 1977-06-01 1978-05-31 Procede de vaporisation de materiaux dans une installation de depot par evaporation sous vide

Country Status (6)

Country Link
US (1) US4197175A (fr)
CH (1) CH631743A5 (fr)
DE (1) DE2823876C2 (fr)
FR (1) FR2393079B1 (fr)
GB (1) GB1589160A (fr)
NL (1) NL179660C (fr)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2425479A1 (fr) * 1978-05-10 1979-12-07 Ulvac Corp Appareil pour le depot par vaporisation du type a reaction d'activation
FR2501725A1 (fr) * 1981-03-13 1982-09-17 Balzers Hochvakuum Procede et dispositif pour l'evaporation d'un materiau sous vide
FR2533103A1 (fr) * 1982-09-10 1984-03-16 Balzers Hochvakuum Procede et dispositif pour le rechauffement uniforme d'un materiau dans un recipient sous vide
FR2544952A1 (fr) * 1983-04-19 1984-10-26 Balzers Hochvakuum Procede de chauffage d'une matiere a chauffer dans un recipient sous vide
FR2545840A1 (fr) * 1983-05-09 1984-11-16 Vac Tec Syst Appareil perfectionne pour la stabilisation d'un arc servant a la vaporisation d'une matiere solide
EP0306612A1 (fr) * 1987-08-26 1989-03-15 Balzers Aktiengesellschaft Procédé de déposition de couches sur des substrats
EP0430873A2 (fr) * 1989-11-22 1991-06-05 Balzers Aktiengesellschaft Rouleau ayant un revêtement dur à frottement et usure réduits et procédé pour fabriquer ce revêtement
EP0430874A1 (fr) * 1989-11-22 1991-06-05 Balzers Aktiengesellschaft Objet pourvu d'une couche décorative
EP0430872A2 (fr) * 1989-11-22 1991-06-05 Balzers Aktiengesellschaft Outil ou instrument ayant un revêtement dur résistant à l'usure pour l'usinage de matériaux organiques
US5192578A (en) * 1989-11-22 1993-03-09 Balzers Ag Method of producing coating using negative dc pulses with specified duty factor
US5246787A (en) * 1989-11-22 1993-09-21 Balzers Aktiengesellschaft Tool or instrument with a wear-resistant hard coating for working or processing organic materials

Families Citing this family (52)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT385058B (de) * 1946-07-17 1988-02-10 Vni Instrument Inst Verfahren zur verfestigung von schneidwerkzeugen
CH619344B (de) * 1977-12-23 Balzers Hochvakuum Verfahren zur herstellung goldfarbener ueberzuege.
CH641063A5 (de) * 1979-12-06 1984-02-15 Balzers Hochvakuum Verfahren zum ueberziehen eines oberflaechenteiles eines elastischen koerpers mit einer zusammenhaengenden schicht.
JPS5779169A (en) * 1980-11-06 1982-05-18 Sumitomo Electric Ind Ltd Physical vapor deposition method
US4537794A (en) * 1981-02-24 1985-08-27 Wedtech Corp. Method of coating ceramics
US4596719A (en) * 1981-02-24 1986-06-24 Wedtech Corp. Multilayer coating method and apparatus
JPS581067A (ja) * 1981-06-26 1983-01-06 Toshiba Corp 装飾用金属窒化物皮膜の形成法
US4407712A (en) * 1982-06-01 1983-10-04 The United States Of America As Represented By The Secretary Of The Army Hollow cathode discharge source of metal vapor
US4420386A (en) * 1983-04-22 1983-12-13 White Engineering Corporation Method for pure ion plating using magnetic fields
US4559121A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Method and apparatus for evaporation arc stabilization for permeable targets
US4622452A (en) * 1983-07-21 1986-11-11 Multi-Arc Vacuum Systems, Inc. Electric arc vapor deposition electrode apparatus
US4559125A (en) * 1983-09-12 1985-12-17 Vac-Tec Systems, Inc. Apparatus for evaporation arc stabilization during the initial clean-up of an arc target
US4556471A (en) * 1983-10-14 1985-12-03 Multi-Arc Vacuum Systems Inc. Physical vapor deposition apparatus
US5096558A (en) * 1984-04-12 1992-03-17 Plasco Dr. Ehrich Plasma - Coating Gmbh Method and apparatus for evaporating material in vacuum
DE3413891A1 (de) * 1984-04-12 1985-10-17 Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich Verfahren und vorrichtung zum verdampfen von material in vakuum
JPS6137960A (ja) * 1984-07-28 1986-02-22 Tadanobu Okubo 金属表面加工方法
US4566937A (en) * 1984-10-10 1986-01-28 The United States Of America As Represented By The United States Department Of Energy Electron beam enhanced surface modification for making highly resolved structures
CH664163A5 (de) * 1985-03-01 1988-02-15 Balzers Hochvakuum Verfahren zum reaktiven aufdampfen von schichten aus oxiden, nitriden, oxynitriden und karbiden.
US4839245A (en) * 1985-09-30 1989-06-13 Union Carbide Corporation Zirconium nitride coated article and method for making same
US4929322A (en) * 1985-09-30 1990-05-29 Union Carbide Corporation Apparatus and process for arc vapor depositing a coating in an evacuated chamber
US4895765A (en) * 1985-09-30 1990-01-23 Union Carbide Corporation Titanium nitride and zirconium nitride coating compositions, coated articles and methods of manufacture
US5084151A (en) * 1985-11-26 1992-01-28 Sorin Biomedica S.P.A. Method and apparatus for forming prosthetic device having a biocompatible carbon film thereon
DE3615361C2 (de) * 1986-05-06 1994-09-01 Santos Pereira Ribeiro Car Dos Vorrichtung zur Oberflächenbehandlung von Werkstücken
DE3832693A1 (de) * 1988-09-27 1990-03-29 Leybold Ag Vorrichtung zum aufbringen dielektrischer oder metallischer werkstoffe
DE58907191D1 (de) * 1989-02-09 1994-04-14 Balzers Hochvakuum Verfahren zum Zentrieren eines Elektronenstrahles.
US5234560A (en) * 1989-08-14 1993-08-10 Hauzer Holdings Bv Method and device for sputtering of films
DE4006457C2 (de) * 1990-03-01 1993-09-30 Balzers Hochvakuum Verfahren zum Verdampfen von Material in einer Vakuumaufdampfanlage sowie Anlage derselben
US5238546A (en) * 1990-03-01 1993-08-24 Balzers Aktiengesellschaft Method and apparatus for vaporizing materials by plasma arc discharge
US5250779A (en) * 1990-11-05 1993-10-05 Balzers Aktiengesellschaft Method and apparatus for heating-up a substrate by means of a low voltage arc discharge and variable magnetic field
DE4035131C2 (de) * 1990-11-05 1995-09-21 Balzers Hochvakuum Verfahren und Vorrichtung zum gleichmäßigen Erwärmen von Heizgut, insbes. von zu beschichtenden Substraten, in einer Vakuumkammer
FR2670218B1 (fr) * 1990-12-06 1993-02-05 Innovatique Sa Procede de traitement de metaux par depot de matiere, et pour la mise en óoeuvre dudit procede.
CA2065581C (fr) 1991-04-22 2002-03-12 Andal Corp. Methode de deposition physique en phase vapeur activee par plasma, et appareil connexe
US5490910A (en) * 1992-03-09 1996-02-13 Tulip Memory Systems, Inc. Circularly symmetric sputtering apparatus with hollow-cathode plasma devices
CH687111A5 (de) * 1992-05-26 1996-09-13 Balzers Hochvakuum Verfahren zum Erzeugen einer Niederspannungsentladung, Vakuumbehandlungsanlage hierfuer sowie Anwendung des Verfahrens.
DE69310493T2 (de) * 1992-08-14 1997-12-18 Hughes Aircraft Co Oberflächepräparation und beschichtungs-methode für titannitrid auf gusseisen
US5346600A (en) * 1992-08-14 1994-09-13 Hughes Aircraft Company Plasma-enhanced magnetron-sputtered deposition of materials
WO1994014996A1 (fr) * 1992-12-23 1994-07-07 Balzers Aktiengesellschaft Procede et installation de depot de couche
EP0616050B1 (fr) * 1993-03-16 1997-08-13 Balzers Aktiengesellschaft Procédé d'augmentation de résistance des outils et outils avec revêtement anti-usure
US5457298A (en) * 1993-07-27 1995-10-10 Tulip Memory Systems, Inc. Coldwall hollow-cathode plasma device for support of gas discharges
DE4336680C2 (de) * 1993-10-27 1998-05-14 Fraunhofer Ges Forschung Verfahren zum Elektronenstrahlverdampfen
DE4409761B4 (de) * 1994-03-22 2007-12-27 Vtd Vakuumtechnik Dresden Gmbh Einrichtung zur plasmagestützten Verdampfung in einem Bogenentladungsplasma
US5656091A (en) * 1995-11-02 1997-08-12 Vacuum Plating Technology Corporation Electric arc vapor deposition apparatus and method
DE19623701A1 (de) * 1996-06-14 1997-12-18 Leybold Systems Gmbh Vorrichtung und Verfahren zum Elektronenstrahlverdampfen
DE19724996C1 (de) * 1997-06-13 1998-09-03 Fraunhofer Ges Forschung Verfahren zum plasmaaktivierten Elektronenstrahlverdampfen und Einrichtung zur Durchführung des Verfahrens
DE19725930C2 (de) * 1997-06-16 2002-07-18 Eberhard Moll Gmbh Dr Verfahren und Anlage zum Behandeln von Substraten mittels Ionen aus einer Niedervoltbogenentladung
US6012830A (en) * 1998-06-23 2000-01-11 Valeo Sylvania L.L.C. Light shield for a vehicle headlamp
DE50115410D1 (de) 2000-09-05 2010-05-12 Oerlikon Trading Ag Vakuumanlage mit koppelbarem Werkstückträger
US7033679B2 (en) * 2001-01-25 2006-04-25 Kyocera Optec Co., Ltd. Metal film and metal film-coated member, metal oxide film and metal oxide film-coated member, thin film forming apparatus and thin film forming method for producing metal film and metal oxide film
US7771836B2 (en) * 2005-03-31 2010-08-10 Citizen Holdings Co., Ltd. Golden ornament and process for producing the same
EP2148939B1 (fr) * 2007-05-25 2017-06-14 Oerlikon Surface Solutions AG, Pfäffikon Installation et procédé de traitement sous vide
KR101039638B1 (ko) * 2009-08-10 2011-06-09 휴비트 주식회사 치열교정용 브래킷의 표면 코팅 방법
DE102017106985A1 (de) * 2017-03-31 2018-10-04 Technische Hochschule Wildau (Fh) Vorrichtung zur elektronenunterstützten Beschichtung von Substraten sowie ein entsprechendes Verfahren

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH551497A (de) * 1971-10-06 1974-07-15 Balzers Patent Beteilig Ag Anordnung zur zerstaeubung von stoffen mittels einer elektrischen niederspannungsentladung.
FR2218652B1 (fr) * 1973-02-20 1976-09-10 Thomson Csf
US3984581A (en) * 1973-02-28 1976-10-05 Carl Zeiss-Stiftung Method for the production of anti-reflection coatings on optical elements made of transparent organic polymers
CH610013A5 (fr) * 1975-11-19 1979-03-30 Battelle Memorial Institute

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2425479A1 (fr) * 1978-05-10 1979-12-07 Ulvac Corp Appareil pour le depot par vaporisation du type a reaction d'activation
FR2501725A1 (fr) * 1981-03-13 1982-09-17 Balzers Hochvakuum Procede et dispositif pour l'evaporation d'un materiau sous vide
FR2533103A1 (fr) * 1982-09-10 1984-03-16 Balzers Hochvakuum Procede et dispositif pour le rechauffement uniforme d'un materiau dans un recipient sous vide
FR2544952A1 (fr) * 1983-04-19 1984-10-26 Balzers Hochvakuum Procede de chauffage d'une matiere a chauffer dans un recipient sous vide
FR2545840A1 (fr) * 1983-05-09 1984-11-16 Vac Tec Syst Appareil perfectionne pour la stabilisation d'un arc servant a la vaporisation d'une matiere solide
NL8400053A (nl) * 1983-05-09 1984-12-03 Vac Tec Syst Werkwijze voor verdampingsboogstabilisatie en inrichting voor het toepassen van deze werkwijze.
EP0306612A1 (fr) * 1987-08-26 1989-03-15 Balzers Aktiengesellschaft Procédé de déposition de couches sur des substrats
EP0430873A2 (fr) * 1989-11-22 1991-06-05 Balzers Aktiengesellschaft Rouleau ayant un revêtement dur à frottement et usure réduits et procédé pour fabriquer ce revêtement
EP0430874A1 (fr) * 1989-11-22 1991-06-05 Balzers Aktiengesellschaft Objet pourvu d'une couche décorative
EP0430872A2 (fr) * 1989-11-22 1991-06-05 Balzers Aktiengesellschaft Outil ou instrument ayant un revêtement dur résistant à l'usure pour l'usinage de matériaux organiques
EP0430873A3 (en) * 1989-11-22 1991-11-06 Balzers Aktiengesellschaft Roller with a friction- and wear-reducing hard coating and process for producing the coating
EP0430872A3 (en) * 1989-11-22 1991-11-06 Balzers Aktiengesellschaft Tool or instrument with a wear-resistant hard layer for working or processing of organic material
US5192578A (en) * 1989-11-22 1993-03-09 Balzers Ag Method of producing coating using negative dc pulses with specified duty factor
US5246787A (en) * 1989-11-22 1993-09-21 Balzers Aktiengesellschaft Tool or instrument with a wear-resistant hard coating for working or processing organic materials

Also Published As

Publication number Publication date
DE2823876C2 (de) 1984-04-19
NL179660C (nl) 1986-10-16
FR2393079B1 (fr) 1985-06-14
DE2823876A1 (de) 1979-01-04
NL179660B (nl) 1986-05-16
NL7707659A (nl) 1978-12-05
US4197175A (en) 1980-04-08
GB1589160A (en) 1981-05-07
CH631743A5 (de) 1982-08-31

Similar Documents

Publication Publication Date Title
FR2393079A1 (fr) Procede de vaporisation de materiaux dans une installation de depot par evaporation sous vide
US4828872A (en) Method and apparatus for the reactive vapor depositing of metal compounds
US6787010B2 (en) Non-thermionic sputter material transport device, methods of use, and materials produced thereby
EP0383301A3 (fr) Procédé et appareillage de formation d'un film
ES2022946B3 (es) Proceso de aplicacion de capas sobre sustratos e instalaciones de recubrimiento en capas al vacio para la realizacion del proceso
US6337005B2 (en) Depositing device employing a depositing zone and reaction zone
EP0278494A2 (fr) Canon à cathode creuse et dispositif de dépôt pour procédé de revêtement ionique
Weissmantel et al. Ion beam sputtering and its application for the deposition of semiconducting films
JPH079062B2 (ja) スパツタ装置
CA2194742A1 (fr) Procede et dispositif pour revetir un substrat
US4476000A (en) Method of making a magnetic film target for sputtering
JPS61272367A (ja) 薄膜形成装置
Schiller et al. High‐rate vapor deposition and large systems for coating processes
JPH0236673B2 (fr)
Franks et al. Ion enhanced film bonding
JP2603919B2 (ja) 立方晶系窒化ホウ素の結晶粒を含む窒化ホウ素膜の作製方法
Schiller et al. Plasma-activated high-rate electron-beam evaporation for coating metal strips
JPH07122131B2 (ja) ア−ク式蒸発源
KR950000010B1 (ko) 이온도금법 및 그 방법을 위한 장치
RU2055099C1 (ru) Способ получения пленок и покрытий из легкоплавких неметаллических материалов в вакууме, преимущественно селена
Rao et al. A versatile broad‐beam ion source
JPS5992995A (ja) 高融点金属シリサイド膜の形成方法
JPH0229746B2 (ja) Fukusunojohatsugenosonaetaionpureeteingusochi
Vacuum Engineering Company Incorporated VENCO high-vacuum evaporator
Balzers High Vacuum Limited Electron-beam evaporation